JP2019084468A - Washer - Google Patents

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JP2019084468A
JP2019084468A JP2017212182A JP2017212182A JP2019084468A JP 2019084468 A JP2019084468 A JP 2019084468A JP 2017212182 A JP2017212182 A JP 2017212182A JP 2017212182 A JP2017212182 A JP 2017212182A JP 2019084468 A JP2019084468 A JP 2019084468A
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liquid storage
liquid
storage portion
baffle plate
cleaning
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JP7012938B2 (en
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俊郎 佐伯
Toshiro Saeki
俊郎 佐伯
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Miura Co Ltd
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Miura Co Ltd
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Abstract

To provide a washer which can reduce used amounts of water and a chemical solution while preventing air entrainment in a pump with a simple structure.SOLUTION: A washer includes: a washing tank 2 which houses cleaned objects; washing nozzles 3, each of which jets a liquid to the cleaned object in the washing tank 2; and a liquid storage part 4 connected to a bottom surface of the washing tank 2. A baffle plate 5 is provided in an opening part of the liquid storage part 4 and spaced a predetermined distance away from an opening edge of the liquid storage part 4. The bottom surface of the washing tank 2 inclines downward toward the opening edge of the liquid storage part 4. It is preferable to provide the baffle plate 5 in a manner that the baffle plate 5 faces an entire periphery or entire side of the opening edge of the liquid storage part 4.SELECTED DRAWING: Figure 1

Description

本発明は、被洗浄物に液体を噴射して洗浄する洗浄器に関するものである。   TECHNICAL FIELD The present invention relates to a washer that sprays a liquid to be washed to wash it.

従来、下記特許文献1に開示されるように、噴射式の洗浄器が知られている。当該文献の図面に基づき説明すると、洗浄器は、被洗浄物が収納される洗浄槽(211)と、被洗浄物が載置されるラック(30)と、洗浄水の噴射口(341)が設けられてラックの中央部で回転する洗浄ノズル(34)とを備える。送水ポンプ(221)を作動させると、貯水槽(222)の洗浄水は、洗浄ノズル(23,34)へ供給され、洗浄ノズル(23,34)の噴射口(341)から噴射されることで、被洗浄物を洗浄すると共に、洗浄ノズル(23,34)を回転させる。   Heretofore, as disclosed in Patent Document 1 below, a jet cleaner has been known. Describing based on the drawings of the document, the cleaning device includes a cleaning tank (211) in which the object to be cleaned is stored, a rack (30) on which the object to be cleaned is placed, and a jet port (341) of cleaning water. And a wash nozzle (34) provided and rotating at the center of the rack. When the water supply pump (221) is operated, the washing water of the water storage tank (222) is supplied to the washing nozzle (23, 34) and is jetted from the jet port (341) of the washing nozzle (23, 34). Cleaning the object to be cleaned and rotating the cleaning nozzles (23, 34).

特開2010−149013号公報(請求項1、段落[0027]−[0029]、図1−図4)JP, 2010-149013, A (claim 1, paragraph [0027]-[0029], Drawing 1-4)

この種の洗浄器において、洗浄水の使用量を減らすことができれば、単に給水量を削減できるだけでなく、給水に薬液を投入する場合には薬液投入量を削減できる他、給水を加熱して温水とする場合には加熱量を削減することもできる。   In this type of washer, if the amount of washing water used can be reduced, not only can the amount of water supplied be reduced, but if the chemical solution is introduced into the water supply, the amount of chemical solution input can be reduced and If so, the amount of heating can also be reduced.

ところが、洗浄槽下部の液貯留部(貯水槽)の貯水量を単に減らすと、循環ポンプにエアがみを起こすおそれがある。特に、前記特許文献1に開示される洗浄器では、洗浄槽内の下部全体が液貯留部とされ、洗浄ノズルからの噴射液の全量が液面に直に落ちることになり、液貯留部で気泡が生じやすく、その気泡を循環ポンプが吸い込むことでエアがみが生じやすい。そのため、エアがみ防止の観点から、液貯留部の貯水量を削減することができない。   However, if the amount of stored water in the liquid storage portion (water storage tank) at the lower part of the cleaning tank is simply reduced, air may be generated in the circulation pump. In particular, in the cleaning device disclosed in Patent Document 1, the entire lower part in the cleaning tank is a liquid storage portion, and the entire amount of the liquid jetted from the cleaning nozzle falls directly to the liquid level, and the liquid storage portion Air bubbles are easily generated, and the air is likely to be generated when the circulation pump sucks the air bubbles. Therefore, it is not possible to reduce the amount of water stored in the liquid storage unit from the viewpoint of preventing air leakage.

本発明が解決しようとする課題は、簡易な構成で、ポンプでのエアがみを防止しつつ、水や薬液などの使用量を削減できる洗浄器を提供することにある。   The problem to be solved by the present invention is to provide a cleaning device capable of reducing the amount of water, chemical solution, etc. used while preventing air from being drawn by a pump with a simple configuration.

本発明は、前記課題を解決するためになされたもので、請求項1に記載の発明は、被洗浄物が収容される洗浄槽と、この洗浄槽内の被洗浄物へ液体を噴射する洗浄ノズルと、前記洗浄槽の底面と連接された液貯留部とを備え、前記液貯留部の開口部には、前記液貯留部の開口縁から所定間隔をあけてバッフル板が設けられていることを特徴とする洗浄器である。   The present invention has been made to solve the above-mentioned problems, and the invention according to claim 1 is a cleaning tank in which an object to be cleaned is accommodated, and a cleaning method in which a liquid is sprayed to the object to be cleaned in the cleaning tank. A nozzle and a liquid storage unit connected to the bottom surface of the cleaning tank, and an opening of the liquid storage unit is provided with a baffle plate at a predetermined distance from the opening edge of the liquid storage unit. It is a washing machine characterized by the above.

請求項1に記載の発明によれば、洗浄槽の底面に液貯留部が連接されているので、洗浄ノズルから噴射された液体は、洗浄槽の底面を介して液貯留部へ流れ込むことになる。洗浄槽の底面全体が液貯留部とならないので、その分だけ気泡の発生位置を限定することができる。しかも、液貯留部の開口部には、液貯留部の開口縁から所定間隔をあけてバッフル板が設けられているので、洗浄槽の底面を介して液貯留部へ流れ込む液体は、液貯留部への落水位置を制限されることになる。従って、液貯留部内での気泡の発生位置を限定することで、液貯留部での気泡の発生を抑えることができる。このようにして、液貯留部での気泡の発生を抑えることで、ポンプでのエアがみを防止しつつ、液体(水および/または薬液)の使用量を削減することができる。   According to the first aspect of the invention, since the liquid storage portion is connected to the bottom surface of the cleaning tank, the liquid jetted from the cleaning nozzle flows into the liquid storage portion through the bottom surface of the cleaning tank. . Since the entire bottom surface of the cleaning tank does not serve as the liquid reservoir, the generation position of the air bubbles can be limited accordingly. Moreover, since the baffle plate is provided at the opening of the liquid storage portion at a predetermined distance from the opening edge of the liquid storage portion, the liquid flowing into the liquid storage portion through the bottom surface of the cleaning tank is the liquid storage portion. You will be limited the position of the water to the Therefore, the generation of air bubbles in the liquid storage portion can be suppressed by limiting the generation position of the air bubbles in the liquid storage portion. In this way, by suppressing the generation of air bubbles in the liquid storage portion, it is possible to reduce the amount of liquid (water and / or chemical solution) used while preventing air from being drawn by the pump.

請求項2に記載の発明は、前記洗浄槽の底面は、前記液貯留部の開口縁に近づくにつれて下方へ傾斜していることを特徴とする請求項1に記載の洗浄器である。   The invention described in claim 2 is the cleaning device according to claim 1, wherein the bottom surface of the cleaning tank is inclined downward as approaching the opening edge of the liquid storage portion.

請求項2に記載の発明によれば、洗浄槽の底面は、液貯留部の開口縁に近づくにつれて下方へ傾斜しているので、洗浄槽から液貯留部への液体の供給を円滑に行うことができる。そして、傾斜面を設けても、液貯留部の開口部の内側にはバッフル板が設けられているので、傾斜面から液貯留部への落水時の気泡の発生を抑えて、ポンプでのエアがみを防止しつつ、使用液量を削減することができる。   According to the second aspect of the present invention, since the bottom surface of the cleaning tank is inclined downward as it approaches the opening edge of the liquid storage section, the supply of liquid from the cleaning tank to the liquid storage section can be smoothly performed. Can. And, even if the inclined surface is provided, since the baffle plate is provided inside the opening of the liquid storage portion, the generation of air bubbles at the time of water falling from the inclined surface to the liquid storage portion is suppressed, and the air by the pump It is possible to reduce the amount of liquid used while preventing the problem.

請求項3に記載の発明は、前記洗浄槽の底面は、前記液貯留部の開口縁の全周または全辺と連接されており、前記バッフル板は、前記液貯留部の開口縁の全周または全辺と対向して設けられていることを特徴とする請求項1または請求項2に記載の洗浄器である。   In the invention according to claim 3, the bottom surface of the washing tank is connected to the entire periphery or all sides of the opening edge of the liquid storage portion, and the baffle plate is the entire periphery of the opening edge of the liquid storage portion Or it is provided facing all the sides, It is a washer according to claim 1 or claim 2 characterized by the above-mentioned.

請求項3に記載の発明によれば、液貯留部の開口縁の全周または全辺と対向して、バッフル板が設けられているので、液貯留部へ流れ込む液体による気泡の発生を確実に抑えて、ポンプでのエアがみを防止しつつ、使用液量を削減することができる。   According to the third aspect of the present invention, the baffle plate is provided to face the entire circumference or all sides of the opening edge of the liquid storage portion, so that generation of air bubbles by the liquid flowing into the liquid storage portion is ensured. It is possible to reduce the amount of fluid used while suppressing air leakage at the pump.

請求項4に記載の発明は、前記液貯留部の底面の中心より偏心した位置には、前記液貯留部の液体を前記洗浄ノズルへ循環供給する循環口が形成され、前記バッフル板は、前記液貯留部の循環口に近い位置のみ設けられていることを特徴とする請求項1または請求項2に記載の洗浄器である。   In the invention according to claim 4, a circulation port for circulating and supplying the liquid in the liquid storage portion to the cleaning nozzle is formed at a position eccentric to the center of the bottom surface of the liquid storage portion, and the baffle plate It is a washer according to claim 1 or 2 provided only in a position near a circulation port of a fluid storage part.

請求項4に記載の発明によれば、液貯留部の底面には、洗浄ノズルへの液体の循環口が偏心して設けられ、この循環口に近い位置にだけ、バッフル板が設けられる。循環口に近い位置にはバッフル板を設けることで、気泡の発生を抑えて、ポンプでのエアがみを防止することができる。一方、循環口から遠い位置には、バッフル板を設けなくても、循環口へ到達するまでの距離があるので、その間に気泡の消滅が図られる。   According to the fourth aspect of the present invention, the circulation port for the liquid to the cleaning nozzle is eccentrically provided on the bottom surface of the liquid storage portion, and the baffle plate is provided only at the position near the circulation port. By providing the baffle plate at a position close to the circulation port, it is possible to suppress the generation of air bubbles and to prevent the air from being scattered by the pump. On the other hand, even if the baffle plate is not provided at a position far from the circulation port, there is a distance to reach the circulation port, so that the bubbles are eliminated in the meantime.

請求項5に記載の発明は、前記洗浄槽と前記液貯留部との間は、網材または多孔板から構成される仕切材で仕切られ、この仕切材に、前記バッフル板が保持されていることを特徴とする請求項1〜4のいずれか1項に記載の洗浄器である。   In the invention according to claim 5, the space between the washing tank and the liquid storage portion is partitioned by a partition material formed of a mesh material or a porous plate, and the baffle plate is held by the partition material. It is a washer according to any one of claims 1 to 4, characterized in that.

請求項5に記載の発明によれば、洗浄槽と液貯留部との間を、網材または多孔板からなる仕切材で仕切ることで、被洗浄物の液貯留部への落下を防止することができる。そして、仕切材にバッフル板を保持して、液貯留部へのバッフル板の設置を容易に行うことができる。   According to the fifth aspect of the present invention, the separation of the cleaning tank and the liquid storage section by the partition material consisting of a mesh material or a perforated plate prevents the falling of the object to be cleaned to the liquid storage section. Can. And a baffle plate is hold | maintained to a partition material, and installation of the baffle plate to a liquid storage part can be performed easily.

さらに、請求項6に記載の発明は、前記液貯留部には、前記仕切材よりも下方にストレーナが設けられていることを特徴とする請求項5に記載の洗浄器である。   Furthermore, the invention according to claim 6 is the washer according to claim 5, wherein a strainer is provided in the liquid storage section below the partition member.

請求項6に記載の発明によれば、液貯留部には、仕切材よりも下方にストレーナが設けられる。ストレーナを設けることで、液中の夾雑物を除去できると共に、液中の気泡の除去も図ることができる。これにより、ポンプでのエアがみを一層確実に防止しつつ、使用液量を削減することができる。   According to the sixth aspect of the invention, the liquid storage portion is provided with a strainer below the partition member. By providing a strainer, contaminants in the liquid can be removed, and bubbles in the liquid can also be removed. As a result, it is possible to reduce the amount of working fluid while preventing the air from leaking at the pump more reliably.

本発明の洗浄器によれば、簡易な構成で、ポンプでのエアがみを防止しつつ、水や薬液などの使用量を削減することができる。   According to the cleaning device of the present invention, it is possible to reduce the amount of water, chemical solution, etc. used while preventing air from being drawn by the pump with a simple configuration.

本発明の一実施例の洗浄器を示す概略図であり、一部を断面にして示している。It is the schematic which shows the washing device of one Example of this invention, and shows one part in a cross section. 図1の洗浄器の下部を示す正面視の縦断面図である。It is a longitudinal cross-sectional view of the plain view which shows the lower part of the washer of FIG. 図1の洗浄器の下部を示す側面視の縦断面図である。It is a longitudinal cross-sectional view of the side view which shows the lower part of the washer of FIG. 図1の洗浄器の下部のバッフル板を示す概略平面図である。It is a schematic plan view which shows the baffle plate of the lower part of the washer of FIG.

以下、本発明の具体的実施例を図面に基づいて詳細に説明する。
図1は、本発明の一実施例の洗浄器1を示す概略図であり、一部を断面にして示している。また、図2および図3は、図1の洗浄器1の下部を示す概略図であり、図2は正面視の縦断面図、図3は右側面視の縦断面図である。なお、図2および図3では、一部構成を省略して示している。
Hereinafter, specific embodiments of the present invention will be described in detail based on the drawings.
FIG. 1 is a schematic view showing a cleaning device 1 according to an embodiment of the present invention, partially shown in cross section. 2 and 3 are schematic views showing the lower part of the cleaning device 1 of FIG. 1, FIG. 2 is a longitudinal sectional view of a front view, and FIG. 3 is a longitudinal sectional view of a right side view. In addition, in FIG. 2 and FIG. 3, one part structure is abbreviate | omitted and shown.

以下、説明の便宜上、図1における左右方向を洗浄器1の左右方向とし、図1における上下方向を洗浄器1の上下方向とし、図1における紙面と直交方向を洗浄器1の前後方向(手前側が前方)として説明する。   Hereinafter, for convenience of description, the left and right direction in FIG. 1 is taken as the left and right direction of the cleaning device 1, the up and down direction in FIG. 1 is taken as the upper and lower direction of the cleaning device 1, The side is described as forward).

本実施例の洗浄器1は、被洗浄物が収容される洗浄槽2と、この洗浄槽2内の被洗浄物へ液体を噴射する洗浄ノズル3と、洗浄槽2内の底面と連接された液貯留部4と、液貯留部4の開口部に設けられるバッフル板5と、液貯留部4への給水手段6と、液貯留部4からの排水手段7と、液貯留部4への薬液供給手段8と、液貯留部4の液体を洗浄ノズル3へ供給する循環手段9と、液貯留部4の液体を加熱する加熱手段10と、これら各手段6〜10を制御する制御手段(図示省略)とを備える。   The cleaning device 1 of the present embodiment is connected to the cleaning tank 2 in which the object to be cleaned is stored, the cleaning nozzle 3 for injecting the liquid to the object to be cleaned in the cleaning tank 2, and the bottom surface in the cleaning tank 2. Liquid storage portion 4, baffle plate 5 provided at the opening of liquid storage portion 4, water supply means 6 to liquid storage portion 4, drainage means 7 from liquid storage portion 4, and chemical solution to liquid storage portion 4 Supply means 8, circulation means 9 for supplying the liquid of the liquid reservoir 4 to the cleaning nozzle 3, heating means 10 for heating the liquid of the liquid reservoir 4, and control means for controlling these respective means 6 to 10 (shown And (omitted).

被洗浄物は、特に問わないが、たとえば鉗子などの医療器具である。洗浄槽2内には、上下複数段に洗浄ノズル3が設けられるが、被洗浄物は上下の洗浄ノズル3間に配置される。この際、被洗浄物は、格子状または網状の棚(図示省略)に載せられる。また、被洗浄物は、所望によりバスケットなどに収容されていてもよい。   The object to be cleaned is not particularly limited, but is, for example, a medical instrument such as forceps. In the cleaning tank 2, the cleaning nozzles 3 are provided in a plurality of upper and lower stages, but the object to be cleaned is disposed between the upper and lower cleaning nozzles 3. At this time, the objects to be cleaned are placed on a grid or a mesh shelf (not shown). Also, the object to be cleaned may be accommodated in a basket or the like as desired.

洗浄槽2は、被洗浄物が収容される中空容器である。洗浄槽2は、本実施例では略矩形の中空ボックス状である。洗浄槽2は、ドア(図示省略)により開閉可能とされる。ドアを開けることで、洗浄槽2に対し被洗浄物を出し入れすることができる。ドアは、洗浄槽2の正面に設けられるが、洗浄槽2の正面および背面の双方に設けられてもよい。   The cleaning tank 2 is a hollow container in which the object to be cleaned is accommodated. The cleaning tank 2 is in the form of a substantially rectangular hollow box in this embodiment. The cleaning tank 2 can be opened and closed by a door (not shown). By opening the door, the object to be cleaned can be taken in and out of the cleaning tank 2. The door is provided on the front of the washing tank 2, but may be provided on both the front and the back of the washing tank 2.

洗浄ノズル3は、洗浄槽2内の被洗浄物へ液体を噴射する。洗浄ノズル3は、洗浄槽2内に、上下複数段に設けられる。本実施例では、洗浄槽2の前後方向中央部の一側部に、上下複数段にアーム状の支持部材11の基端部が保持され、各支持部材11は、洗浄槽2の一側部から左右方向中央部へ向けて延出する。そして、その延出先端部に、洗浄ノズル3の長手方向中央部が縦軸まわりに回転可能に保持される。   The cleaning nozzle 3 jets the liquid to the object to be cleaned in the cleaning tank 2. The cleaning nozzles 3 are provided in a plurality of upper and lower stages in the cleaning tank 2. In the present embodiment, the base end portions of the arm-like support members 11 are held in a plurality of upper and lower stages at one side portion of the central portion in the front-rear direction of the cleaning tank 2. Extend from the center towards the center in the left-right direction. And the longitudinal direction center part of the washing | cleaning nozzle 3 is rotatably hold | maintained around the longitudinal axis at the extended front-end | tip part.

洗浄ノズル3は、支持部材11内を介して供給される液体を噴射させる噴射口(図示省略)が複数形成されている。支持部材11を介して洗浄ノズル3内に液体が供給されると、その液体は洗浄ノズル3の噴射口から噴射される。この噴流により、洗浄ノズル3が水平方向に回転する。なお、洗浄槽2内の上端部に設けられる洗浄ノズル3は、下方へのみ液体を噴射し、洗浄槽2内の下端部に設けられる洗浄ノズル3は、上方へのみ液体を噴射し、上下両端部以外の洗浄ノズル3は、上下両方へ液体を噴射する。   The cleaning nozzle 3 is formed with a plurality of injection ports (not shown) for ejecting the liquid supplied through the support member 11. When the liquid is supplied into the cleaning nozzle 3 through the support member 11, the liquid is jetted from the jet port of the cleaning nozzle 3. The jet nozzle rotates the cleaning nozzle 3 in the horizontal direction. The cleaning nozzle 3 provided at the upper end in the cleaning tank 2 ejects the liquid only downward, and the cleaning nozzle 3 provided at the lower end in the cleaning tank 2 ejects the liquid only upward, and the upper and lower ends The cleaning nozzles 3 other than the unit inject the liquid to both the upper and lower sides.

ところで、図1において一点鎖線で示すように、洗浄槽2に対し洗浄ラック12を出し入れ可能としてもよい。図示例では、上下両端部に設けられる洗浄ノズル3は、洗浄槽2自体に設けられ、それ以外の洗浄ノズル3は、洗浄ラック12に設けられている。洗浄ラック12には、一側部に配水部材13が設けられており、その配水部材13に上下複数段に支持部材11が設けられ、各支持部材11に洗浄ノズル3が回転可能に保持される。また、洗浄ラック12には、各洗浄ノズル3の上部と洗浄ラック12の下部とに、被洗浄物の載置棚が設けられている。洗浄槽2内に洗浄ラック12を格納すると、後述する循環ポンプ14からの配管が、配水部材13に接続される。   By the way, as shown by a dashed-dotted line in FIG. 1, the cleaning rack 12 may be put in and out of the cleaning tank 2. In the illustrated example, the cleaning nozzles 3 provided at the upper and lower ends are provided in the cleaning tank 2 itself, and the other cleaning nozzles 3 are provided in the cleaning rack 12. A water distribution member 13 is provided on one side of the cleaning rack 12, and support members 11 are provided on the water distribution member 13 in a plurality of upper and lower stages, and the cleaning nozzle 3 is rotatably held by the respective support members 11. . Further, in the cleaning rack 12, mounting shelves for objects to be cleaned are provided at the upper portion of each cleaning nozzle 3 and the lower portion of the cleaning rack 12. When the cleaning rack 12 is stored in the cleaning tank 2, piping from a circulation pump 14 described later is connected to the water distribution member 13.

洗浄槽2の下部には、液貯留部4が連接される。具体的には、洗浄槽2の底面には、下方へ凹んで液貯留部4が形成されている。逆にいえば、液貯留部4は、洗浄槽2の底面に、上方へ開口して設けられている。なお、洗浄槽2の底面は、液貯留部4の開口縁に近づくについて下方へ傾斜して形成されるのが好ましい。   The liquid storage unit 4 is connected to the lower portion of the cleaning tank 2. Specifically, the liquid storage portion 4 is formed on the bottom of the cleaning tank 2 so as to be recessed downward. Conversely, the liquid storage portion 4 is provided on the bottom surface of the cleaning tank 2 so as to open upward. The bottom surface of the cleaning tank 2 is preferably formed so as to be inclined downward toward the opening edge of the liquid storage portion 4.

本実施例では、洗浄槽2の底面は、左右両端部が左右方向内側へ行くに従って下方へ傾斜する傾斜面2a(図2)に形成されると共に、前後両端部が前後方向内側へ行くに従って下方へ傾斜する傾斜面2b(図3)に形成されている。そして、洗浄槽2の左右方向中央部で且つ前後方向中央部には、下方へ略矩形状に凹んで液貯留部4が形成されている。   In the present embodiment, the bottom surface of the cleaning tank 2 is formed as an inclined surface 2a (FIG. 2) which inclines downward as the left and right end parts move inward in the left and right direction. It is formed in the inclined surface 2b (FIG. 3) which inclines. Then, a liquid storage portion 4 is formed in a substantially rectangular shape downward downward at the central portion in the left-right direction and the central portion in the front-rear direction of the cleaning tank 2.

バッフル板5は、液貯留部4の開口部に設けられ、液貯留部4の開口縁から液貯留部4の内側へ所定間隔をあけて設けられる。本実施例では、図2に示すように、洗浄槽2下部の左右の傾斜面2aの下端縁(液貯留部4側の端辺、言い換えれば液貯留部4の左右側面4aの上端縁)から、液貯留部4の左右方向内側へ所定間隔(第一隙間X1)をあけて、液貯留部4の左右に第一バッフル板5Aが設けられる。また、図3に示すように、洗浄槽2下部の前後の傾斜面2bの下端縁(液貯留部4側の端辺、言い換えれば液貯留部4の前後側面4bの上端縁)から、液貯留部4の前後方向内側へ所定間隔(第二隙間X2)をあけて、液貯留部4の前後に第二バッフル板5Bが設けられる。   The baffle plate 5 is provided at the opening of the liquid reservoir 4, and is provided at a predetermined distance from the opening edge of the liquid reservoir 4 to the inside of the liquid reservoir 4. In the present embodiment, as shown in FIG. 2, from the lower end edge of the left and right inclined surfaces 2 a in the lower part of the cleaning tank 2 (the end side on the liquid storage portion 4 side, in other words, the upper end edge of the left and right side surfaces 4 a of the liquid storage portion 4) A first baffle plate 5A is provided on the left and right sides of the liquid storage portion 4 with a predetermined interval (first gap X1) inward in the left-right direction of the liquid storage portion 4. Further, as shown in FIG. 3, the liquid is stored from the lower end edge (the end side on the liquid storage portion 4 side, in other words, the upper end edge of the front and rear side surfaces 4b of the liquid storage portion 4) of the front and rear inclined surfaces 2b of the lower portion of the washing tank 2. A second baffle plate 5B is provided in front of and behind the liquid reservoir 4 with a predetermined interval (second gap X2) inward in the front-rear direction of the portion 4.

なお、洗浄槽2下部における前後左右の各傾斜面2a,2bの傾斜角度は、互いに同一であってもよいし、異なってもよい。また、上述した第一隙間X1と第二隙間X2とは、同じ寸法であってもよいし、異なる寸法であってもよい。しかも、場合により、左右の第一隙間X1同士の大きさを変えたり、前後の第二隙間X2同士の大きさを変えたりしてもよい。   The inclination angles of the front and rear and left and right inclined surfaces 2a and 2b in the lower portion of the cleaning tank 2 may be the same or different. In addition, the first gap X1 and the second gap X2 described above may have the same size or different sizes. Moreover, depending on the case, the sizes of the left and right first gaps X1 may be changed, or the sizes of the front and rear second gaps X2 may be changed.

前後左右の各バッフル板5(5A,5B)は、液貯留部4の前後左右の各側面4a,4bと平行に、液貯留部4の上端縁の高さよりも、上方および/または下方へ延出して設けられる。本実施例では、各バッフル板5は、平板状とされ、液貯留部4の上端縁の高さよりも、上方および下方へ延出して設けられる。   The front and rear baffle plates 5 (5A, 5B) extend above and / or below the upper edge of the liquid storage portion 4 in parallel with the front and rear side surfaces 4a, 4b of the liquid storage portion 4. It is provided out. In the present embodiment, each baffle plate 5 has a flat plate shape, and is provided to extend upward and downward than the height of the upper end edge of the liquid storage portion 4.

図4は、前後左右のバッフル板5(5A,5B)の組立状態の概略平面図である。この図に示すように、左右一対の第一バッフル板5Aと、前後一対の第二バッフル板5Bとにより、全体として略矩形の短筒状の枠体が構成される。この際、第二バッフル板5Bの左右両端部は、第一バッフル板5Aの接続位置よりも左右方向外側へ延出してもよい。言い換えれば、第一バッフル板5Aの前後両端部は、第二バッフル板5Bの左右両端部よりも左右方向内側へ入った位置に接続されてもよい。あるいは、場合により、第一バッフル板5Aの前後両端部は、第二バッフル板5Bの接続位置よりも前後方向外側へ延出してもよい。   FIG. 4 is a schematic plan view of the assembled state of the front and rear left and right baffle plates 5 (5A, 5B). As shown in this figure, a pair of left and right first baffle plates 5A and a pair of front and rear second baffle plates 5B constitute a substantially rectangular short cylindrical frame as a whole. At this time, the left and right end portions of the second baffle plate 5B may extend outward in the left-right direction with respect to the connection position of the first baffle plate 5A. In other words, the front and rear end portions of the first baffle plate 5A may be connected to a position inward in the left-right direction relative to the left and right end portions of the second baffle plate 5B. Alternatively, in some cases, the front and rear end portions of the first baffle plate 5A may extend outward in the front-rear direction beyond the connection position of the second baffle plate 5B.

液貯留部4の開口縁からのバッフル板5の離隔距離(液貯留部4の左右側面4aと第一バッフル板5Aとの間の第一隙間X1の寸法、あるいは液貯留部4の前後側面4bと第二バッフル板5Bとの間の第二隙間X2の寸法)は、次のように設定されるのが好ましい。すなわち、洗浄器1の運転中、洗浄ノズル3からの噴射液は洗浄槽2下部の傾斜面2a,2bを介して液貯留部4へ流れ込むが、傾斜面2a,2bからの液流がバッフル板5(5A,5B)に当たる位置に、バッフル板5を配置(あるいはバッフル板5の大きさを決定)するのが好ましい。これにより、傾斜面2a,2bから液貯留部4へ流れ込む液体は、各バッフル板5と液貯留部4の側面4a,4bとの隙間を介して液貯留部4へ供給されることになる。なお、循環ポンプ14の作動中における液貯留部4の液位に対し、バッフル板5の下端部は、液面よりも下方(つまりバッフル板5の下端部が液中に差し込まれた状態)にあってもよい。   The separation distance of the baffle plate 5 from the opening edge of the liquid storage portion 4 (the dimension of the first gap X1 between the left and right side surfaces 4a of the liquid storage portion 4 and the first baffle plate 5A, or the front and rear side surfaces 4b of the liquid storage portion 4 Of the second gap X2 between the second baffle plate 5B and the second baffle plate 5B is preferably set as follows. That is, during the operation of the washer 1, the jetted liquid from the washing nozzle 3 flows into the liquid storage portion 4 through the inclined surfaces 2a and 2b at the lower part of the washing tank 2, but the liquid flow from the inclined surfaces 2a and 2b is a baffle plate It is preferable to arrange the baffle plate 5 (or to determine the size of the baffle plate 5) at a position where it hits 5 (5A, 5B). As a result, the liquid flowing from the inclined surfaces 2a and 2b into the liquid storage portion 4 is supplied to the liquid storage portion 4 through the gaps between the baffle plates 5 and the side surfaces 4a and 4b of the liquid storage portion 4. The lower end of the baffle plate 5 is lower than the liquid level (that is, the lower end of the baffle plate 5 is inserted into the liquid) with respect to the liquid level of the liquid storage portion 4 during operation of the circulation pump 14 It may be.

洗浄槽2と液貯留部4との間は、網材または多孔板から構成される仕切材15で仕切られるのが好ましい。たとえば、洗浄槽2と液貯留部4とは、金網またはパンチングメタルから構成される仕切材15で仕切られる。この場合、この仕切材15に、バッフル板を保持して設けることができる。具体的には、仕切材15の上面および/または下面に、仕切材15と略垂直に(あるいは傾斜させて)各バッフル板5を固定すればよい。   It is preferable to divide between the washing tank 2 and the liquid storage part 4 by the partition material 15 comprised from a mesh material or a perforated panel. For example, the cleaning tank 2 and the liquid storage unit 4 are partitioned by a partition member 15 formed of a wire mesh or punching metal. In this case, the baffle plate can be held on the partition member 15 and provided. Specifically, each baffle plate 5 may be fixed to the upper surface and / or the lower surface of the partition member 15 substantially perpendicularly (or inclined) to the partition member 15.

液貯留部4には、仕切材15よりも下方に、ストレーナ16が設けられるのが好ましい。ストレーナ16の目の粗さは、仕切材15よりも十分に細かいものが採用される。液貯留部4に設定液位まで給水後、循環手段9を作動させると、液貯留部4の液位は低下するが、その状態において、ストレーナ16は、液面よりも上方にあってもよいし、液面あるいはそれよりも下方(つまり液中)にあってもよい。ストレーナ16を比較的上方に配置する場合、液貯留部4に加熱手段10を設置しやすい。ストレーナ16を比較的下方(特に液中)に設置する場合、循環ポンプ14への液中の気泡を除去しやすい。   Preferably, a strainer 16 is provided in the liquid storage portion 4 below the partition member 15. The mesh size of the strainer 16 is sufficiently finer than that of the partition member 15. When the circulation means 9 is operated after supplying water to the liquid storage part 4 to the set liquid level, the liquid level of the liquid storage part 4 decreases, but in that state, the strainer 16 may be above the liquid level May be at or below the level (ie in the liquid). When the strainer 16 is disposed relatively upward, the heating unit 10 can be easily installed in the liquid storage unit 4. When the strainer 16 is installed relatively downward (in particular, in liquid), air bubbles in the liquid to the circulation pump 14 can be easily removed.

給水手段6は、給水路17を介して、液貯留部4に水を供給する。給水路17には、給水弁18が設けられている。給水弁18を開けることで、液貯留部4に給水することができる。図示例では、洗浄槽2に給水路17を接続することで、給水は洗浄槽2を介して液貯留部4に供給されるが、液貯留部4に給水路17を接続することで、給水は液貯留部4に直接に供給されてもよい。なお、給水手段6は、複数種の水(たとえば水道水、温水、膜濾過水など)から選択された水を供給可能に構成されてもよい。   The water supply unit 6 supplies water to the liquid storage unit 4 through the water supply path 17. A water supply valve 18 is provided in the water supply passage 17. By opening the water supply valve 18, the liquid storage portion 4 can be supplied with water. In the illustrated example, the water supply is supplied to the liquid storage unit 4 via the cleaning tank 2 by connecting the water supply path 17 to the cleaning tank 2, but the water supply is supplied by connecting the water supply path 17 to the liquid storage unit 4. May be supplied directly to the liquid reservoir 4. In addition, the water supply means 6 may be comprised so that supply of the water selected from multiple types of water (for example, tap water, warm water, membrane filtration water etc.) is possible.

排水手段7は、液貯留部4から排水路19を介して水を排出する。排水路19には、排水弁20が設けられている。排水弁20を開けることで、洗浄槽2や液貯留部4から排水することができる。   The drainage means 7 drains water from the liquid storage unit 4 via the drainage path 19. A drainage valve 20 is provided in the drainage channel 19. By opening the drain valve 20, it is possible to drain water from the washing tank 2 and the liquid storage unit 4.

薬液供給手段8は、薬液タンク21から給液路22を介して、液貯留部4に薬液を供給する。給液路22には、薬液ポンプ23が設けられている。薬液ポンプ23を作動させることで、設定量の薬液を液貯留部4に供給することができる。図示例では、液貯留部4に給液路22を接続することで、薬液は液貯留部4に直接に供給されるが、洗浄槽2に給液路22を接続することで、薬液は洗浄槽2を介して液貯留部4に供給されてもよい。なお、薬液供給手段8は、複数種の薬液(たとえばアルカリ性洗剤、酵素配合洗剤、潤滑防錆剤、乾燥促進剤など)から選択された薬液を供給可能に構成されてもよい。   The chemical solution supply unit 8 supplies the chemical solution from the chemical solution tank 21 to the liquid storage unit 4 through the liquid supply path 22. A chemical solution pump 23 is provided in the liquid supply passage 22. By operating the drug solution pump 23, a set amount of drug solution can be supplied to the liquid storage unit 4. In the illustrated example, the chemical solution is supplied directly to the liquid storage unit 4 by connecting the liquid supply passage 22 to the liquid storage unit 4, but the chemical solution is cleaned by connecting the liquid supply passage 22 to the cleaning tank 2. The liquid reservoir 4 may be supplied via the tank 2. The chemical solution supply unit 8 may be configured to be able to supply a chemical solution selected from a plurality of types of chemical solutions (for example, alkaline detergents, enzyme-containing detergents, lubricating rust inhibitors, drying accelerators, etc.).

循環手段9は、液貯留部4の液体を洗浄ノズル3へ循環供給する。具体的には、循環手段9は、循環配管24と循環ポンプ14とを備える。循環配管24は、液貯留部4から各洗浄ノズル3の支持部材11への配管であり、その途中に循環ポンプ14が設けられている。なお、図示例では、循環配管24の内、液貯留部4から循環ポンプ14への配管は、上流側において、排水路19と共通管路とされている。また、循環配管24の内、循環ポンプ14の出口側には、逆止弁25が設けられている。循環ポンプ14を作動させると、液貯留部4の液体を、循環配管24および支持部材11を介して洗浄ノズル3へ供給して噴射し、洗浄槽2下部の液貯留部4へ戻すことができる。   The circulation means 9 circulates and supplies the liquid in the liquid reservoir 4 to the cleaning nozzle 3. Specifically, the circulation means 9 includes a circulation pipe 24 and a circulation pump 14. The circulation pipe 24 is a pipe from the liquid reservoir 4 to the support member 11 of each cleaning nozzle 3, and a circulation pump 14 is provided in the middle thereof. In the illustrated example, in the circulation pipe 24, the pipe from the liquid reservoir 4 to the circulation pump 14 is a common pipe and the drainage path 19 on the upstream side. Further, a check valve 25 is provided on the outlet side of the circulation pump 14 in the circulation pipe 24. When the circulation pump 14 is operated, the liquid in the liquid storage unit 4 can be supplied to the cleaning nozzle 3 via the circulation pipe 24 and the support member 11 and jetted, and can be returned to the liquid storage unit 4 in the lower part of the cleaning tank 2 .

加熱手段10は、本実施例では、液貯留部4に設けられたヒータ26から構成される。ヒータ26は、図示例では電気ヒータであるが、場合により蒸気ヒータであってもよい。電気ヒータの場合、典型的にはオンオフ制御されるが、場合により出力を調整されてもよい。一方、蒸気ヒータの場合、蒸気管内に蒸気が供給可能とされ、蒸気の凝縮水は蒸気トラップを介して外部へ排出される。そして、給蒸路に設けた給蒸弁の開閉または開度が制御される。   The heating means 10 is comprised from the heater 26 provided in the liquid storage part 4 in the present Example. The heater 26 is an electric heater in the illustrated example, but may be a steam heater as the case may be. In the case of an electric heater, on / off control is typically performed, but the output may be adjusted in some cases. On the other hand, in the case of the steam heater, steam can be supplied into the steam pipe, and condensed water of the steam is discharged to the outside through the steam trap. And the opening / closing or opening degree of the steam supply valve provided in the steam supply path is controlled.

液貯留部4には、液位検出器27が設けられる。液位検出器27は、その構成を特に問わないが、たとえば、液貯留部4の底部に設置した圧力センサから構成される。この場合、液貯留部4や洗浄槽2内の液位に応じて、水圧が変わることを利用して液位を把握する。   The liquid reservoir 4 is provided with a liquid level detector 27. The liquid level detector 27 is not particularly limited in its configuration, and is constituted of, for example, a pressure sensor installed at the bottom of the liquid reservoir 4. In this case, according to the liquid level in the liquid storage part 4 or the cleaning tank 2, the liquid level is grasped using the change of the water pressure.

液貯留部4には、温度センサ28が設けられる。温度センサ28の検出温度に基づきヒータ26を制御することで、液貯留部4の貯留液の温度を調整することができる。   The liquid storage unit 4 is provided with a temperature sensor 28. By controlling the heater 26 based on the temperature detected by the temperature sensor 28, the temperature of the stored liquid in the liquid storage portion 4 can be adjusted.

その他、洗浄器1には、所望により、超音波振動子29が設けられる。図示例では、洗浄槽2下部の左右の傾斜面2aに、それぞれ超音波振動子29が設けられている。超音波振動子29は、超音波発振器に接続されて、発振を制御される。被洗浄物を浸漬した状態で超音波振動子29を作動させることで、被洗浄物を超音波洗浄することができる。   In addition, the ultrasonic transducer 29 is provided in the cleaning device 1 as desired. In the illustrated example, ultrasonic transducers 29 are respectively provided on the left and right inclined surfaces 2 a in the lower part of the cleaning tank 2. The ultrasonic transducer 29 is connected to an ultrasonic oscillator to control oscillation. By operating the ultrasonic transducer 29 in a state in which the object to be cleaned is immersed, the object to be cleaned can be ultrasonically cleaned.

制御手段は、前記各手段6〜10の他、液位検出器27および温度センサ28などに接続された制御器(図示省略)である。具体的には、給水弁18、排水弁20、薬液ポンプ23、循環ポンプ14、ヒータ26、超音波発振器(29)、液位検出器27および温度センサ28などは、制御器に接続されている。そして、制御器は、所定の手順(プログラム)に従い、洗浄槽2内の被洗浄物の洗浄を図る。この際、少なくとも、次に述べるシャワー洗浄動作を実行可能とされる。   The control means is a controller (not shown) connected to the liquid level detector 27 and the temperature sensor 28 in addition to the respective means 6 to 10 described above. Specifically, the feed water valve 18, the drainage valve 20, the chemical solution pump 23, the circulation pump 14, the heater 26, the ultrasonic oscillator (29), the liquid level detector 27, the temperature sensor 28, etc. are connected to the controller . Then, the controller cleans the objects to be cleaned in the cleaning tank 2 in accordance with a predetermined procedure (program). At this time, at least a shower cleaning operation described below can be performed.

シャワー洗浄動作では、液貯留部4内に液体を貯留し、その液体を循環手段9により洗浄ノズル3へ循環供給して、洗浄ノズル3から被洗浄物に噴射する。具体的には、まず、液位検出器27が設定水位を検出するまで、給水手段6により液貯留部4に給水する。のちに循環ポンプ14を作動させると水位は下がるので、初期給水時の設定水位は、仕切材15よりも上方にあってもよく、たとえば傾斜面2aの上端縁付近まで給水される。この場合でも、循環ポンプ14の作動中の水位は、液貯留部4内に収まることになる。   In the shower cleaning operation, the liquid is stored in the liquid storage unit 4, and the liquid is circulated and supplied to the cleaning nozzle 3 by the circulation unit 9, and is jetted from the cleaning nozzle 3 to the object to be cleaned. Specifically, water is supplied to the liquid reservoir 4 by the water supply means 6 until the liquid level detector 27 detects the set water level. When the circulation pump 14 is operated later, the water level drops, so the set water level at the time of initial water supply may be above the partition member 15, and for example, water is supplied near the upper end edge of the inclined surface 2a. Even in this case, the water level during operation of the circulation pump 14 falls within the liquid reservoir 4.

液貯留部4への給水後、必要に応じて、薬液供給手段8により液貯留部4に所望の薬液を投入する。薬液供給手段8による薬液は、給水手段6による給水に対し、設定濃度になるように設定量だけ投入される。さらに、同じく必要に応じて、加熱手段10により、液貯留部4内の貯留水を設定温度まで加熱する。薬液の投入や貯留水の加熱は、循環手段9の作動前に限らず、循環手段9の作動中に行ってもよい。   After water supply to the liquid storage unit 4, a desired chemical solution is introduced into the liquid storage unit 4 by the chemical solution supply unit 8 as necessary. The chemical solution supplied by the chemical solution supply means 8 is supplied to the water supply by the water supply means 6 by a set amount so as to have a set concentration. Furthermore, the storage water in the liquid storage unit 4 is heated to the set temperature by the heating unit 10 as needed. The introduction of the chemical solution and the heating of the stored water may be performed not only before the operation of the circulation unit 9 but also during the operation of the circulation unit 9.

いずれにしても、液貯留部4に所望量の液体を貯留した状態で、循環ポンプ14を作動させて、貯留液を循環配管24および支持部材11を介して洗浄ノズル3へ供給して噴射し、洗浄ノズル3を回転させながら被洗浄物を洗浄する。そして、各洗浄ノズル3から噴射された液体は、洗浄槽2下部の液貯留部4へ戻される。所定の終了条件(たとえば設定時間の経過)を満たすと、循環ポンプ14を停止して、液貯留部4内の液体を排水手段7により排出する。   In any case, in a state where a desired amount of liquid is stored in the liquid storage portion 4, the circulating pump 14 is operated to supply the stored liquid to the cleaning nozzle 3 via the circulation pipe 24 and the support member 11 and inject it. The object to be cleaned is cleaned while rotating the cleaning nozzle 3. Then, the liquid ejected from each cleaning nozzle 3 is returned to the liquid storage portion 4 in the lower portion of the cleaning tank 2. When a predetermined termination condition (for example, an elapse of a set time) is satisfied, the circulation pump 14 is stopped, and the liquid in the liquid storage unit 4 is discharged by the drainage means 7.

典型的には、このようなシャワー洗浄動作を繰り返して、被洗浄物を洗浄および濯ぎする。たとえば、薬液を投入しない常温水による予備洗浄、所望により洗剤を投入した温水による本洗浄(典型的には複数回)、所望により濯ぎ剤を投入した温水による濯ぎ洗浄(典型的には複数回)などが順次になされる。   Typically, such shower washing operation is repeated to wash and rinse the material to be washed. For example, pre-washing with cold water without adding chemical solution, main washing with warm water optionally containing detergent (typically multiple times), rinsing with warm water optionally containing rinsing agent (typically multiple times) Etc. are made sequentially.

本実施例の洗浄器1によれば、洗浄ノズル3から噴射された液体は、洗浄槽2下部の傾斜面2a,2bを介して、液貯留部4へ流れ込むことになる。液貯留部4の開口部には、液貯留部4の開口縁から内側へ隙間をあけてバッフル板5が設けられているので、傾斜面2a,2bを介して液貯留部4へ流れ込む液体は、液貯留部4への落水位置を制限されることになる。特に、本実施例では、バッフル板5は液貯留部4の開口縁の全周(全辺)と対向して設けられている(つまり液貯留部4の開口部の内側に連続的に設けられている)ので、各傾斜面2a,2bから液貯留部4へ流れ込む液体による気泡の発生位置は、液貯留部4の壁側に限定されることになる。   According to the washer 1 of the present embodiment, the liquid jetted from the washing nozzle 3 flows into the liquid reservoir 4 through the inclined surfaces 2a and 2b at the lower part of the washing tank 2. Since the baffle plate 5 is provided at the opening of the liquid storage portion 4 with a gap from the opening edge of the liquid storage portion 4 to the inside, the liquid flowing into the liquid storage portion 4 through the inclined surfaces 2a and 2b is The position of the water falling to the liquid storage unit 4 is limited. In particular, in the present embodiment, the baffle plate 5 is provided to face the entire circumference (all sides) of the opening edge of the liquid storage portion 4 (that is, continuously provided inside the opening of the liquid storage portion 4). Therefore, the generation position of air bubbles by the liquid flowing from the inclined surfaces 2 a and 2 b into the liquid storage unit 4 is limited to the wall side of the liquid storage unit 4.

このようにして、液貯留部4内での気泡の発生位置を限定することで、液貯留部4での気泡の発生を抑え、循環ポンプ14でのエアがみを防止することができる。なお、洗浄ノズル3から噴射された液体は、傾斜面2a,2bに落ちる以外に、洗浄槽2の平面視中央部では傾斜面2a,2bを介さずに液貯留部4に落ち得るが、傾斜面2a,2bを流れ落ちる液流ほどの水量はなく、気泡を発生させる要因としては小さい。   Thus, by limiting the generation position of the air bubble in the liquid storage portion 4, the generation of the air bubble in the liquid storage portion 4 can be suppressed, and the air spot in the circulation pump 14 can be prevented. The liquid jetted from the cleaning nozzle 3 may fall to the liquid storage portion 4 without passing through the inclined surfaces 2a and 2b in the central portion in plan view of the cleaning tank 2 other than falling to the inclined surfaces 2a and 2b. There is no amount of water such as liquid flowing down the surfaces 2a and 2b, which is small as a factor for generating air bubbles.

さらに、本実施例では、液貯留部4には、仕切材15よりも下方にストレーナ16が設けられる。ストレーナ16を設けることで、液中の夾雑物を除去できると共に、液中の気泡の除去も図ることができる。これにより、循環ポンプ14でのエアがみを一層確実に防止することができる。   Furthermore, in the present embodiment, the liquid storage portion 4 is provided with a strainer 16 below the partition member 15. By providing the strainer 16, contaminants in the liquid can be removed, and bubbles in the liquid can also be removed. Thus, air leakage at the circulation pump 14 can be more reliably prevented.

このようにして、液貯留部4での気泡の発生を抑えることで、循環ポンプ14に気泡が到達する量を減少させることができる。その分だけ、洗浄器1は、より低水位で運転可能となり、初期給水量(洗浄器1全体の保有水量)を削減することができる。そして、給水量を削減することは、薬液投入量や加熱量の削減にもつながるので、ランニングコストの低減を図ることができる。   Thus, by suppressing the generation of air bubbles in the liquid storage portion 4, the amount of air bubbles reaching the circulation pump 14 can be reduced. By that amount, the washer 1 can be operated at a lower water level, and the initial water supply amount (the amount of water held by the entire washer 1) can be reduced. And since the reduction of the amount of water supply leads to the reduction of the amount of chemical solution input and the amount of heating, the running cost can be reduced.

ところで、液貯留部4の底面には、液貯留部4の液体を洗浄ノズル3へ循環供給する循環口4c(循環ポンプ14の吸込口)が設けられる。この循環口4cは、平面視において、液貯留部4の中心部に設けられてもよいが、中心から偏心した位置に設けられてもよい。偏心して設けられる場合、バッフル板5は、液貯留部4の循環口4cに近い位置のみ設けられてもよい。   By the way, a circulation port 4 c (suction port of the circulation pump 14) for circulating and supplying the liquid of the liquid storage unit 4 to the cleaning nozzle 3 is provided on the bottom of the liquid storage unit 4. The circulation port 4c may be provided at the central portion of the liquid storage portion 4 in a plan view, but may be provided at a position eccentric from the center. If the baffle plate 5 is provided eccentrically, the baffle plate 5 may be provided only at a position close to the circulation port 4 c of the liquid storage portion 4.

たとえば、図3では、循環口4cは、液貯留部4の前方部に設けられる。この場合、液貯留部4の前後に設けられた第二バッフル板5Bの内、循環口4cに近い前方の第二バッフル板5Bは設置するが、循環口4cから遠い後方の第二バッフル板5Bの設置は省略してもよい。また、液貯留部4の左右に設けられた第一バッフル板5Aは、それぞれ前後方向へ沿って設けられるが、循環口4cに近い前方部(たとえば前半分)にのみ設け、循環口4cから遠い後方部(たとえば後半分)の設置は省略してもよい。循環口4cに近い位置にはバッフル板5を設けることで、気泡の発生を抑えて、循環ポンプ14でのエアがみを防止することができる。一方、循環口4cから遠い位置には、バッフル板5を設けなくても、循環口4cへ到達するまでの距離があるので、その間に気泡の消滅が図られる。   For example, in FIG. 3, the circulation port 4 c is provided in the front portion of the liquid reservoir 4. In this case, of the second baffle plates 5B provided on the front and back of the liquid storage portion 4, the second baffle plate 5B in the front near the circulation port 4c is installed, but the second baffle plate 5B in the rear far from the circulation port 4c The installation of may be omitted. The first baffle plates 5A provided on the left and right of the liquid storage portion 4 are provided along the longitudinal direction, but provided only in the front portion (for example, the front half) near the circulation port 4c and far from the circulation port 4c The installation of the rear part (for example the rear half) may be omitted. By providing the baffle plate 5 at a position close to the circulation port 4c, it is possible to suppress the generation of air bubbles and to prevent the air from being scattered by the circulation pump 14. On the other hand, even if the baffle plate 5 is not provided at a position far from the circulation port 4c, since there is a distance to reach the circulation port 4c, the bubbles are eliminated.

本発明の洗浄器1は、前記実施例の構成に限らず適宜変更可能である。特に、被洗浄物が収容される洗浄槽2と、この洗浄槽2内の被洗浄物へ液体を噴射する洗浄ノズル3と、洗浄槽2の底面と連接された液貯留部4とを備え、液貯留部4の開口部には、液貯留部4の開口縁から所定間隔をあけてバッフル板5が設けられているのであれば、その他の構成は、適宜に変更可能である。   The cleaning device 1 of the present invention is not limited to the configuration of the above embodiment, but can be appropriately changed. In particular, it comprises a cleaning tank 2 in which the object to be cleaned is stored, a cleaning nozzle 3 for injecting a liquid onto the object to be cleaned in the cleaning tank 2, and a liquid reservoir 4 connected to the bottom of the cleaning tank 2. If the baffle plate 5 is provided at the opening of the liquid storage portion 4 at a predetermined interval from the opening edge of the liquid storage portion 4, the other configuration can be appropriately changed.

たとえば、洗浄槽2および/または液貯留部4の平面視形状は、略矩形状に限らず、円形または楕円形の他、矩形以外の多角形状などであってもよい。その場合も、好ましくは、洗浄槽2の底面は、液貯留部4の開口縁に近づくにつれて下方へ傾斜すると共に、液貯留部4の開口縁の全周または全辺と連接されている。そして、バッフル板5は、液貯留部4の開口縁の全周または全辺と対向して設けられるのが好ましい。また、液貯留部4の底面の中心より偏心した位置に、洗浄ノズル3への循環口4cを設ける場合には、バッフル板5は、液貯留部4の循環口4cに近い位置のみ設けられてもよい。   For example, the plan view shape of the cleaning tank 2 and / or the liquid storage portion 4 is not limited to a substantially rectangular shape, and may be a circular shape or an elliptical shape, or a polygonal shape other than a rectangular shape. Also in this case, preferably, the bottom surface of the cleaning tank 2 inclines downward as it approaches the opening edge of the liquid storage portion 4 and is connected to the entire circumference or all sides of the opening edge of the liquid storage portion 4. The baffle plate 5 is preferably provided to face the entire periphery or all sides of the opening edge of the liquid storage portion 4. Further, when the circulation port 4c to the cleaning nozzle 3 is provided at a position eccentric to the center of the bottom surface of the liquid storage portion 4, the baffle plate 5 is provided only at a position near the circulation port 4c of the liquid storage portion 4 It is also good.

さらに、前記実施例において、洗浄後の被洗浄物を乾燥可能に、送風機をさらに備えてもよい。この場合、洗浄後の濡れた被洗浄物は、洗浄槽2へ供給される温風により乾燥を図られる。   Furthermore, in the above embodiment, a fan may be further provided so as to be able to dry the washed object. In this case, the wet object to be cleaned after the cleaning can be dried by the warm air supplied to the cleaning tank 2.

1 洗浄器
2 洗浄槽(2a,2b:傾斜面)
3 洗浄ノズル
4 液貯留部(4a:左右側面、4b:前後側面、4c:循環口)
5 バッフル板(5A:第一バッフル板、5B:第二バッフル板)
6 給水手段
7 排水手段
8 薬液供給手段
9 循環手段
10 加熱手段
11 支持部材
12 洗浄ラック
13 配水部材
14 循環ポンプ
15 仕切材
16 ストレーナ
17 給水路
18 給水弁
19 排水路
20 排水弁
21 薬液タンク
22 給液路
23 薬液ポンプ
24 循環配管
25 逆止弁
26 ヒータ
27 液位検出器
28 温度センサ
29 超音波振動子
1 Cleaning device 2 Cleaning tank (2a, 2b: inclined surface)
3 Cleaning nozzle 4 Liquid storage part (4a: left and right side, 4b: front and back side, 4c: circulation port)
5 Baffle plate (5A: first baffle plate, 5B: second baffle plate)
DESCRIPTION OF SYMBOLS 6 Water supply means 7 Drainage means 8 Chemical solution supply means 9 Circulation means 10 Heating means 11 Support member 12 Wash rack 13 Water distribution member 14 Circulation pump 15 Partition material 16 Strainer 17 Water supply passage 18 Water supply valve 19 Drainage passage 20 Drainage valve 20 Chemical solution tank 22 Supply Liquid path 23 Chemical solution pump 24 Circulation piping 25 Check valve 26 Heater 27 Liquid level detector 28 Temperature sensor 29 Ultrasonic transducer

Claims (6)

被洗浄物が収容される洗浄槽と、この洗浄槽内の被洗浄物へ液体を噴射する洗浄ノズルと、前記洗浄槽の底面と連接された液貯留部とを備え、
前記液貯留部の開口部には、前記液貯留部の開口縁から所定間隔をあけてバッフル板が設けられている
ことを特徴とする洗浄器。
A cleaning tank in which the object to be cleaned is accommodated, a cleaning nozzle for injecting a liquid to the object to be cleaned in the cleaning tank, and a liquid storage unit connected to the bottom surface of the cleaning tank;
A baffle plate is provided at an opening of the liquid storage portion at a predetermined interval from an opening edge of the liquid storage portion.
前記洗浄槽の底面は、前記液貯留部の開口縁に近づくにつれて下方へ傾斜している
ことを特徴とする請求項1に記載の洗浄器。
The washer according to claim 1, wherein the bottom surface of the washing tank is inclined downward as it approaches the opening edge of the liquid storage portion.
前記洗浄槽の底面は、前記液貯留部の開口縁の全周または全辺と連接されており、
前記バッフル板は、前記液貯留部の開口縁の全周または全辺と対向して設けられている
ことを特徴とする請求項1または請求項2に記載の洗浄器。
The bottom surface of the cleaning tank is connected to the entire circumference or all sides of the opening edge of the liquid storage section,
The said baffle plate is provided facing the whole circumference or all sides of the opening edge of the said liquid storage part. The washing | cleaning device of Claim 1 or Claim 2 characterized by the above-mentioned.
前記液貯留部の底面の中心より偏心した位置には、前記液貯留部の液体を前記洗浄ノズルへ循環供給する循環口が形成され、
前記バッフル板は、前記液貯留部の循環口に近い位置のみ設けられている
ことを特徴とする請求項1または請求項2に記載の洗浄器。
At a position eccentric to the center of the bottom surface of the liquid storage portion, a circulation port for circulating and supplying the liquid of the liquid storage portion to the cleaning nozzle is formed.
The said baffle plate is provided only in the position near the circulation port of the said liquid storage part. The washing | cleaning device of Claim 1 or Claim 2 characterized by the above-mentioned.
前記洗浄槽と前記液貯留部との間は、網材または多孔板から構成される仕切材で仕切られ、
この仕切材に、前記バッフル板が保持されている
ことを特徴とする請求項1〜4のいずれか1項に記載の洗浄器。
The cleaning tank and the liquid storage portion are partitioned by a partition material made of a mesh material or a porous plate,
The said baffle plate is hold | maintained at this partition material. The washing | cleaning device of any one of the Claims 1-4 characterized by the above-mentioned.
前記液貯留部には、前記仕切材よりも下方にストレーナが設けられている
ことを特徴とする請求項5に記載の洗浄器。
The washer according to claim 5, wherein a strainer is provided in the liquid storage section below the partition member.
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JP2003220005A (en) * 2002-01-30 2003-08-05 Matsushita Electric Ind Co Ltd Dishwasher
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1147064A (en) * 1997-07-31 1999-02-23 Hoshizaki Electric Co Ltd Washing machine
JP2000051135A (en) * 1998-08-06 2000-02-22 Toto Ltd Filter of dishwasher and dishwasher
JP2002000532A (en) * 2000-06-21 2002-01-08 Toto Ltd Dishwasher
JP2003220005A (en) * 2002-01-30 2003-08-05 Matsushita Electric Ind Co Ltd Dishwasher
JP2006204325A (en) * 2005-01-25 2006-08-10 Rinnai Corp Dishwasher and inlet filter
US20160174806A1 (en) * 2013-08-02 2016-06-23 Electrolux Home Products, Inc. Pump plate for conditioning fluid flow in a dishwasher

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