JP2019081215A - 基板処理装置 - Google Patents
基板処理装置 Download PDFInfo
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- JP2019081215A JP2019081215A JP2017209864A JP2017209864A JP2019081215A JP 2019081215 A JP2019081215 A JP 2019081215A JP 2017209864 A JP2017209864 A JP 2017209864A JP 2017209864 A JP2017209864 A JP 2017209864A JP 2019081215 A JP2019081215 A JP 2019081215A
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- 238000012545 processing Methods 0.000 title claims abstract description 39
- 238000005498 polishing Methods 0.000 claims abstract description 127
- 238000001514 detection method Methods 0.000 claims abstract description 88
- 238000003825 pressing Methods 0.000 claims abstract description 56
- 238000007517 polishing process Methods 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims description 2
- 230000008859 change Effects 0.000 abstract description 5
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- 238000003860 storage Methods 0.000 description 2
- 238000004073 vulcanization Methods 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- 229920002943 EPDM rubber Polymers 0.000 description 1
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- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
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Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/013—Devices or means for detecting lapping completion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
- B24B37/105—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30625—With simultaneous mechanical treatment, e.g. mechanico-chemical polishing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
Abstract
Description
15 制御装置
40 研磨ユニット
41 トップリング
43 研磨テーブル
49 リテーナリング
82,84〜87,90〜93 たわみ検出デバイス
82a,90a,91a,92a,93a 支持部材
82b,90b,91b,92b,93b 被押圧部
82c,90c,91c,92c,93c 圧力検出部
W ウェーハ
Claims (9)
- 基板を研磨する基板研磨装置であって、
前記基板の外周を支持する環状のリテーナリングと、
前記リテーナリングの内部に設けられ、研磨処理中の前記基板が前記リテーナリングを押圧する押圧力を検出する第1センサ部材と、を備えたことを特徴とする基板処理装置。 - 基板を研磨する基板研磨装置であって、
前記基板の外周を支持する環状のリテーナリングと、
前記リテーナリングの内部に設けられ、研磨処理中の前記基板が前記リテーナリングを押圧する押圧力を検出する第1センサ部材と、
前記第1センサ部材にて検出された押圧力の変動量が所定範囲から外れたことを検出したときに前記基板への処理が終了したと判定する制御部と、を備えたことを特徴とする基板処理装置。 - 前記第1センサ部材は、研磨処理中の前記基板により押圧されることでたわみが生じる被押圧部と、前記被押圧部と隣接して配置され、前記被押圧部のたわみ量を前記押圧力として検出する圧力検出部と、前記被押圧部及び前記圧力検出部を支持する支持部材とを備えるたわみ検出デバイスであることを特徴とする、請求項2記載の基板処理装置。
- 前記被押圧部は、その一端が前記支持部材により支持されていないことを特徴とする、請求項3記載の基板処理装置。
- 前記被押圧部及び前記圧力検出部は、前記支持部材の内部に埋め込まれていることを特徴とする、請求項3記載の基板処理装置。
- 前記被押圧部は前記支持部材の内部に埋め込まれており、前記被押圧部は前記支持部材の外表面に取り付けられていることを特徴とする、請求項3記載の基板処理装置。
- 前記被押圧部と前記圧力検出部との間に配置され、前記被押圧部が前記基板から受けた押圧力を前記圧力検出部に伝達する圧力伝達部材を備えたことを特徴とする、請求項3記載の基板処理装置。
- 前記たわみ検出部は前記リテーナリングの複数の箇所に配置されており、前記制御部は複数の前記たわみ検出部からの押圧力の情報に基づき、前記判定する処理を行うことを特徴とする、請求項3記載の基板処理装置。
- 前記リテーナリングの内部で前記第1センサ部材の近傍に設けられ、前記基板を研磨するための研磨パッドからの押圧力を検出する第2センサ部材をさらに備え、
前記制御部は、前記第2センサ部材からの押圧力の変動量に基づいて、前記リテーナリングを交換すべきかどうかを判定することを特徴とする、請求項2記載の基板処理装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017209864A JP6906425B2 (ja) | 2017-10-31 | 2017-10-31 | 基板処理装置 |
US16/171,505 US20190126427A1 (en) | 2017-10-31 | 2018-10-26 | Substrate processing apparatus |
SG10201809586QA SG10201809586QA (en) | 2017-10-31 | 2018-10-30 | Substrate processing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017209864A JP6906425B2 (ja) | 2017-10-31 | 2017-10-31 | 基板処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019081215A true JP2019081215A (ja) | 2019-05-30 |
JP6906425B2 JP6906425B2 (ja) | 2021-07-21 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2017209864A Active JP6906425B2 (ja) | 2017-10-31 | 2017-10-31 | 基板処理装置 |
Country Status (3)
Country | Link |
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US (1) | US20190126427A1 (ja) |
JP (1) | JP6906425B2 (ja) |
SG (1) | SG10201809586QA (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6357260B2 (ja) | 2016-09-30 | 2018-07-11 | 株式会社荏原製作所 | 研磨装置、及び研磨方法 |
CN110315421B (zh) * | 2019-08-20 | 2023-12-26 | 江苏集萃精凯高端装备技术有限公司 | 一种晶体材料均一化抛光装置及使用方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10100065A (ja) * | 1996-09-27 | 1998-04-21 | Mitsubishi Materials Corp | ウェーハ研磨装置およびウェーハの研磨方法 |
JPH11860A (ja) * | 1997-06-12 | 1999-01-06 | Mitsubishi Materials Corp | ウェーハ研磨装置 |
JP2000127024A (ja) * | 1998-10-27 | 2000-05-09 | Toshiba Corp | ポリッシング装置及び研磨加工方法 |
JP2001009712A (ja) * | 1999-06-22 | 2001-01-16 | Mitsubishi Materials Corp | ウェーハ研磨装置及びウェーハ製造方法 |
JP2001129756A (ja) * | 1999-11-02 | 2001-05-15 | Mitsubishi Materials Corp | ウェーハ研磨装置及び研磨状態検出方法 |
JP2001358102A (ja) * | 2000-04-21 | 2001-12-26 | Agere Systems Guardian Corp | キャリヤ・ヘッドの研磨 |
-
2017
- 2017-10-31 JP JP2017209864A patent/JP6906425B2/ja active Active
-
2018
- 2018-10-26 US US16/171,505 patent/US20190126427A1/en not_active Abandoned
- 2018-10-30 SG SG10201809586QA patent/SG10201809586QA/en unknown
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10100065A (ja) * | 1996-09-27 | 1998-04-21 | Mitsubishi Materials Corp | ウェーハ研磨装置およびウェーハの研磨方法 |
JPH11860A (ja) * | 1997-06-12 | 1999-01-06 | Mitsubishi Materials Corp | ウェーハ研磨装置 |
JP2000127024A (ja) * | 1998-10-27 | 2000-05-09 | Toshiba Corp | ポリッシング装置及び研磨加工方法 |
JP2001009712A (ja) * | 1999-06-22 | 2001-01-16 | Mitsubishi Materials Corp | ウェーハ研磨装置及びウェーハ製造方法 |
JP2001129756A (ja) * | 1999-11-02 | 2001-05-15 | Mitsubishi Materials Corp | ウェーハ研磨装置及び研磨状態検出方法 |
JP2001358102A (ja) * | 2000-04-21 | 2001-12-26 | Agere Systems Guardian Corp | キャリヤ・ヘッドの研磨 |
Also Published As
Publication number | Publication date |
---|---|
US20190126427A1 (en) | 2019-05-02 |
SG10201809586QA (en) | 2019-05-30 |
JP6906425B2 (ja) | 2021-07-21 |
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