JP2019030232A - Generation method of shiitake mushroom - Google Patents

Generation method of shiitake mushroom Download PDF

Info

Publication number
JP2019030232A
JP2019030232A JP2017152178A JP2017152178A JP2019030232A JP 2019030232 A JP2019030232 A JP 2019030232A JP 2017152178 A JP2017152178 A JP 2017152178A JP 2017152178 A JP2017152178 A JP 2017152178A JP 2019030232 A JP2019030232 A JP 2019030232A
Authority
JP
Japan
Prior art keywords
mycelium
germination
treatment
fungus bed
shiitake
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2017152178A
Other languages
Japanese (ja)
Other versions
JP7032753B2 (en
Inventor
幹朗 深山
Mikiaki Miyama
幹朗 深山
大輔 横張
Daisuke Yokohari
大輔 横張
隆弘 山内
Takahiro Yamauchi
隆弘 山内
信 ▲高▼橋
信 ▲高▼橋
Makoto Takahashi
多佳子 後藤
Takako Goto
多佳子 後藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fukayama Noen Co Ltd
Hokken Co Ltd
Original Assignee
Fukayama Noen Co Ltd
Hokken Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fukayama Noen Co Ltd, Hokken Co Ltd filed Critical Fukayama Noen Co Ltd
Priority to JP2017152178A priority Critical patent/JP7032753B2/en
Publication of JP2019030232A publication Critical patent/JP2019030232A/en
Application granted granted Critical
Publication of JP7032753B2 publication Critical patent/JP7032753B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Mushroom Cultivation (AREA)

Abstract

To provide a generation method in which yield and weight for one mushroom are increased, by applying a novel germination processing in a generation step of shiitake mushroom.SOLUTION: The generation method of shiitake mushroom is configured so that, to a coating sheet formed on a surface of a mushroom bed in a step for inoculating shiitake mushroom and decomposing and decaying a culture medium by mycelium infestation for culturing the shiitake mushroom, germination processing for forming pores having a cross section of 0.5-20 mmreaching a mycelium layer under a surface coating sheet by penetrating a surface coating sheet is executed. A depth of the pore is 10-20 mm, and an interval between pores is 2-6 pieces/10mm.SELECTED DRAWING: Figure 1

Description

本発明は、しいたけの人工栽培、特に菌床栽培におけるしいたけの発生方法に関するものである。 The present invention relates to a method for generating shiitake mushrooms in artificial cultivation of shiitake mushrooms, in particular fungal bed cultivation.

従来、菌床を用いたしいたけの栽培においては、一つの菌床でしいたけを複数回発生させる場合に、その都度、発芽処理を付与する必要があった。
この発芽処理の一般的な方法には、引用文献1〜5にあるように、
1)菌床管理温度を5〜10℃程度の幅で変化させる方法(温度変化法)、2)菌床を水中に浸漬する方法(浸水法)、3)菌床を手や専用器具でたたく方法(打床法)、4)菌床内部に水を注入する方法(注水法)、5)棚の上下などで位置を変える方法(菌床の移動法)、等が知られている。
これに加えて、菌床の上面からのみきのこを発生させる上面栽培においては、6)菌床と栽培袋の間に溜めている水を排水して再び給水する方法(側面水の排給水法)、7)菌床を反転させて上面部分のみを水で満たしたフルーツパックに浸漬する方法(部分浸水法)、等が知られている。
Conventionally, in the cultivation of shiitake mushrooms using a fungus bed, it has been necessary to give a germination treatment each time when shiitake mushrooms are generated several times in one fungus bed.
In general methods of this germination treatment, as described in cited references 1 to 5,
1) Method of changing the fungus bed management temperature in the range of about 5-10 ° C. (temperature change method) 2) Method of immersing the fungus bed in water (immersion method) 3) Tap the fungus bed with hand or special equipment There are known methods (implantation method), 4) a method of injecting water into the inside of the fungus bed (water injection method), 5) a method of changing the position of the shelf up and down, etc. (moving bed method).
In addition to this, in top cultivation where mushrooms are generated from the upper surface of the fungus bed, 6) a method of draining and re-supplying water accumulated between the fungus bed and the cultivation bag (side water drainage method) 7) A method of inverting the fungus bed and immersing only the upper surface portion in a fruit pack filled with water (partial water immersion method) is known.

これら発芽処理方法には、それぞれ効果の大きさや適用の幅などに特徴があり、実栽培では、その特徴にあわせて栽培条件・栽培目的・使用品種などが使い分けられている。しかし、そのいずれにも一長一短があり、時間と労力が必要であることや発芽調整が困難であること等の問題点がある。
例えば、上記2)の浸水や(6)の上面栽培における反転排給水法や、(7)のフルーツパックを利用した部分浸水法では、菌床の運搬や個々の菌床保持が必須であるため、非常に労力が掛かるという問題点がある。
一方、(3)の打床法には、比較的労力が小さいものの、処理を行なう個々の作業員によってバラツキが起きやすいため、発芽調整が難しいという問題点がある。
Each of these germination methods is characterized by the magnitude of the effect and the range of application. In actual cultivation, the cultivation conditions, the purpose of cultivation, the varieties used, etc. are properly used according to the characteristics. However, each of them has advantages and disadvantages, and there are problems such as time and labor required and difficulty in adjusting germination.
For example, in the above-mentioned 2) flooding, (6) the reverse drainage method in top cultivation, and (7) the partial flooding method using fruit packs, it is essential to transport and maintain individual fungal beds. There is a problem that it takes a lot of labor.
On the other hand, although the implantation method of (3) requires relatively little labor, there is a problem in that it is difficult to adjust the germination because variation tends to occur among individual workers performing the treatment.

そこで本発明者が、上記(1)〜(7)の問題点を総合して検討したところ、イ)これらには科学的な立証が不足しており、ロ)又、経験や勘に頼るところが大きい現状があることから、必ずしも適時に適切な処理が為されているわけではないという分析が得られた。
この分析に基づいて、問題点を検討したところ、これらの発芽処理に共通の課題として、「菌床全体を刺激すること」の適否が挙げられた。そして、この「菌床全体を刺激する」ことを前提とすると、下記の(a)、(b)の懸念が指摘されるものとなった。
(a)きのこ原基が十分に準備されている状態の菌床に対して刺激が大きい処理を選択した場合には、集中発生を引き起こしてきのこ一個重が小さくなったり、菌床状態が悪化する懸念が生じる。
具体的には、イ)発生させたくない場所からの発生を誘発し、ロ)出荷可能なきのこの収量が減少し、ハ)上面栽培では菌床の側面および底面から発生したきのこが収穫できず腐敗によって菌床が傷み、ニ)加えて、腐敗したきのこが害菌・害虫を誘引・増殖させる、等の虞が挙げられる。
(b)逆に、きのこ原基の準備が不十分である場合、あるいは、菌体量が減少して活力の低下している菌床に対して、刺激の小さい処理を選択した場合には、きのこが発生しなかったり、ほとんど変化がなかったりする懸念が生じる。
具体的には、ホ)収量の低下や菌床の使用寿命の低下等が引き起こされることが挙げられる。
Therefore, when the present inventor comprehensively examined the problems (1) to (7) above, (a) they lack scientific evidence, and (b) they rely on experience and intuition. Because there is a large current situation, it was analyzed that appropriate processing was not necessarily performed in a timely manner.
Based on this analysis, the problems were examined. As a common issue for these germination treatments, the suitability of “stimulating the entire fungus bed” was cited. Then, assuming that this “stimulates the entire fungus bed”, the following concerns (a) and (b) were pointed out.
(A) When a treatment with a large stimulus is selected for a fungus bed in which the mushroom primordial is sufficiently prepared, the concentration of mushrooms is reduced and the fungus bed condition is deteriorated. Concerns arise.
Specifically, a) Inducing the occurrence from a place that does not want to be generated, b) The yield of mushrooms that can be shipped is reduced, and c) Mushrooms generated from the side and bottom of the fungal bed cannot be harvested in top cultivation. The fungus bed is damaged by rotting, and in addition, there is a possibility that the rotten mushroom attracts and proliferates harmful fungi and pests.
(B) On the contrary, when the preparation of the mushroom primordial is insufficient, or when a treatment with a small stimulus is selected for the fungus bed in which the amount of bacterial cells is reduced and the vitality is reduced, There is concern that mushrooms will not occur or that there will be little change.
Specifically, e) a decrease in yield and a decrease in the service life of the fungus bed can be mentioned.

キノコ栽培全科 大森清寿・小出博志編 農文協Mushroom Cultivating Course Omori Kiyotosu and Koide Hiroshi きのこ栽培指標 長野県ほかMushroom cultivation index Nagano Prefecture and others 改訂版最近きのこ栽培技術 (株)プランツワールドRevised Mushroom Cultivation Technology Plants World Co., Ltd. 2015年夏期セミナー研修会資料 全国サンマッシュ生産協議会・株式会社北研2015 Summer Seminar Workshop Material National Sunmash Production Council, Kitaken Co., Ltd.

特開2005−204603号公報JP-A-2005-204603

以上のことから、しいたけの発芽処理方法にあっては、原基が十分準備された時期に、菌床全体でない局所的な刺激を、全体を考慮しつつ適度な刺激で与えるべきではと、本発明者は考察し、そしてこれを解決すべき手法を模索した結果、菌糸蔓延後に菌床表面に形成される「被膜の存在」に着目し、この「被膜の存在を活用する」ことに腐心して本発明に至ったものである。   From the above, in the Shiitake germination treatment method, when the primordium is sufficiently prepared, local stimulation that is not the entire bacterial bed should be given with moderate stimulation while taking the whole into consideration. As a result of the inventor's consideration and exploration of a method to solve this problem, the inventors focused on the “existence of the coating” that is formed on the surface of the mycelium after the spread of the mycelia, and made an effort to utilize the existence of the coating. The present invention has been achieved.

請求項1記載のしいたけの発生方法は、しいたけ菌を接種し菌糸蔓延で培地を分解腐朽させて培養する過程において菌床表面に形成される被膜に対し、表面被膜を破ってその下の菌糸層まで到達する断面積0.5〜20mmの細孔を穿つ発芽を施すことを特徴とする。 The method for generating shiitake mushroom according to claim 1, wherein the film formed on the surface of the mycelium in the process of inoculating the shiitake fungus and incubating the mycelium with the spread of mycelia and culturing the mycelium, breaks the surface film and the mycelium layer below the surface film Germination is performed by piercing pores having a cross-sectional area of 0.5 to 20 mm 2 that reach up to.

請求項2記載のしいたけの発生方法は、細孔の深さを10〜20mmとし、相互の間隔を2〜6個/10mmとしたことを特徴とする。 The method for generating shiitake according to claim 2 is characterized in that the depth of the pores is set to 10 to 20 mm, and the distance between them is set to 2 to 6/10 4 mm 2 .

請求項3記載のしいたけの発生方法は、表面被膜を破ってその下の菌糸層まで到達する断面直径1〜5mmの細孔を穿つ発芽処理を施した後、6時間〜18時間に該細孔から菌床に水分供給を促すことを特徴とする。   The method for generating shiitake mushrooms according to claim 3 is characterized in that the pores are cut for 6 to 18 hours after sprouting treatment is performed by piercing the pores having a cross-sectional diameter of 1 to 5 mm that breaks the surface coating and reaches the mycelium layer below. It is characterized by urging water supply to the fungus bed.

請求項4記載のしいたけの発生方法は、しいたけ菌を接種し菌糸蔓延で培地を分解腐朽させて培養する過程において菌床表面に形成される被膜に対し、表面被膜を破ってその下の菌糸層まで到達する長さ5〜10mmの切れ目を入れる発芽を施すことを特徴とする。   The method for generating shiitake mushroom according to claim 4, wherein the mycelium layer is formed by breaking the surface film and forming the mycelium layer below the film formed on the surface of the mycelium in the process of inoculating the shiitake fungus and incubating the mycelium by decomposing and decaying the medium. Germination is performed to cut a 5 to 10 mm long cut reaching up to.

請求項5記載のしいたけの発生方法は、切れ目の相互の間隔を2〜6個/10mmとしたことを特徴とする。 The method for generating shiitake according to claim 5 is characterized in that the interval between the cuts is 2 to 6/10 4 mm 2 .

請求項6記載のしいたけの発生方法は、表面被膜を破ってその下の菌糸層まで到達する長さ5〜10mmの切れ目を入れる処理を施した後、6時間〜18時間に該切れ目から菌床に水分供給を促すことを特徴とする。   The method for generating shiitake mushrooms according to claim 6, wherein the treatment is performed from 6 to 18 hours after breaking the surface coating and cutting a 5 to 10 mm long cut reaching the mycelium layer below the surface coating. It is characterized by prompting moisture supply.

請求項1記載のしいたけの発生方法によれば、表面被膜を破ってその下の菌糸層まで到達する断面積0.5〜20mmの細孔を穿つ発芽処理を施すことで、無処理のものと比較して、しいたけの発生個数が増加し、収量としての生重が増大し、しいたけ一個の大きさを問う個重の値も適正値に増大したことが確認された。
その発生位置も、例えば上面栽培においては、側面、底面からの発生は皆無で、すべてが望む上面から発生するという結果が得られた。
According to the method for generating shiitake mushroom according to claim 1, an untreated product is obtained by carrying out a germination treatment by piercing a pore having a cross-sectional area of 0.5 to 20 mm 2 that breaks the surface coating and reaches the mycelium layer below it. Compared with, it was confirmed that the number of shiitake mushrooms increased, the fresh weight as a yield increased, and the value of the individual weight for ascertaining the size of one shiitake mushroom increased to an appropriate value.
As for the generation position, for example, in top cultivation, there was no generation from the side surface and bottom surface, and the result was that all occurred from the desired top surface.

請求項2記載のしいたけの発生方法によれば、細孔を穿つ発芽処理における細孔の刺激の強さが適確で、その刺激が局所的でありながら、適当間隔をおいて菌床全体に及ぶことが確認された。   According to the method for generating shiitake mushrooms according to claim 2, the stimulation intensity of the pores in the germination treatment for piercing the pores is appropriate and the stimulation is local, but the entire bacterial bed is spaced at an appropriate interval. It was confirmed that

請求項3記載のしいたけの発生方法によれば、発芽処理後6時間〜18時間に該細孔から菌床に水分供給を促すことで、発生個数と収量の増大が促され、且つ、その水分吸収の時間が短縮化されることが確認された。   According to the method for generating shiitake mushroom according to claim 3, by increasing the supply of moisture from the pores to the fungus bed from 6 hours to 18 hours after the germination treatment, an increase in the number of generations and yield is promoted, and the moisture content is increased. It was confirmed that the absorption time was shortened.

請求項4記載のしいたけの発生方法によれば、表面被膜を破ってその下の菌糸層まで到達する長さ5〜10mmの切れ目を入れる発芽処理を施すことで、上記請求項1の発明と同様、しいたけの発生個数の増加、収量の増大、一個重の増大が得られ、その発生位置も望む位置からのものとなる。   According to the method for generating shiitake mushroom according to claim 4, a germination treatment is applied to break the surface coating and cut a length of 5 to 10 mm that reaches the mycelium layer below the surface coating, and is similar to the invention of claim 1. Thus, an increase in the number of shiitake mushrooms, an increase in yield, and an increase in single weight can be obtained, and the occurrence position is also from the desired position.

請求項5記載のしいたけの発生方法によれば、切れ目を入れる発芽処理における刺激の強さが適確で、その刺激が局所的でありながら適当間隔をおいて菌床全体に及ぶものとなる。   According to the method for generating shiitake mushrooms according to claim 5, the intensity of the stimulation in the germination treatment for making a cut is appropriate, and the stimulation extends over the entire microbial bed at an appropriate interval while being local.

請求項6記載のしいたけの発生方法によれば、発芽処理後6時間〜18時間に該切れ目から菌床に水分供給を促すことで、発生個数と収量の増大が促され、且つ、その水分吸収の時間が短縮化されるものとなる。   According to the method for generating shiitake mushroom according to claim 6, by increasing the supply of moisture from the cut to the fungus bed from 6 hours to 18 hours after the germination treatment, the generation number and the yield are promoted, and the moisture absorption This shortens the time.

本発明の各工程の流れ示すチャート図である。It is a chart figure which shows the flow of each process of this invention. 本発明の栽培状況を示す斜視図である。It is a perspective view which shows the cultivation condition of this invention. 本発明に使用するスペックで釘体を用いたものを示す斜視図である。It is a perspective view which shows what used the nail body by the specification used for this invention. 本発明に使用するスペックで刃物体を用いたものを示す斜視図である。It is a perspective view which shows what used the blade object by the specification used for this invention.

先ず、本発明の対象とする被膜形成の過程について説明する。
本発明にあっては、先ず、培地にしいたけ菌を接種し、その菌糸が蔓延しつつ培地を分解腐朽させる培養する過程を経る。そして、菌糸が培地全体に蔓延する段階になると、菌床の一部に原基形成が開始される。この原基は、後に菌糸層から発芽し、幼子実体を経て子実体へと熟成し、きのこを生育させる上で重要な役割を果たすものである。
この原基形成が始まると、これに並行して菌床の表面には菌糸塊の形成が開始され、即ち、菌床表面に小さな粒状の凹凸が表れ、そこには菌糸が集合体となった塊、菌糸塊の形成が始まる。そして、菌床表面は、多くの場合原基の形成と同時又は若干遅れた速度で少しづつ茶色に色づけされ、やがては焦げ茶色に着色される褐変化の状態に至る。すると、この表面には一定層の膜の形成されたものとなり、これが本発明の対象とする「被膜」となる。
First, the film formation process which is the subject of the present invention will be described.
In the present invention, first, the medium is inoculated with shiitake mushrooms, and the medium undergoes a culturing process in which the medium is decomposed and decayed while the mycelium spreads. When the mycelium spreads throughout the medium, primordial formation is initiated in a part of the fungal bed. This primordium plays an important role in growing mushrooms by later germination from the mycelium layer, ripening to the fruit body through the juvenile body.
When this primordial formation starts, the formation of mycelium starts on the surface of the fungus bed in parallel with this, that is, small granular irregularities appear on the surface of the fungus bed, and the mycelium becomes an aggregate there Formation of lumps and hyphae begins. In many cases, the fungus bed surface is gradually colored brown at the same time as the formation of the primordia or at a slightly delayed rate, and eventually reaches a state of browning that is colored dark brown. Then, a certain layer of film is formed on this surface, and this becomes the “coating” that is the subject of the present invention.

さて上記培養の過程にあって、しいたけは、一つの菌床を一回限りのきのこ発生で終了させるのでなく、生育したきのこを菌床から刈り取った後、再度その菌床に発芽刺激を付与することで2回目のきのこを生育させる。そして、これを2〜12回程度繰り返す栽培法を採る。即ち、一つの菌床から複数回きのこを発生させる方法となる。
この一つの菌床から複数回の発生にあっては、冒頭に説明した如く、菌床と原基になんらかの刺激を与えないと、発芽が極めて低調となり、やがてきのこが発生しなかったり、又は、その収量が少量で効率の悪いものとなってしまう傾向がある。
Now, in the process of culturing, Shiitake does not end one fungus bed with the occurrence of a one-time mushroom, but reaps the germination of the grown mushrooms from the fungus bed and then gives germination stimuli to the fungus bed again. Grow the second mushroom. And the cultivation method which repeats this about 2 to 12 times is taken. That is, this is a method for generating mushrooms multiple times from one fungus bed.
In the case of multiple occurrences from this one fungus bed, as explained at the beginning, if no stimulation is given to the fungus bed and the primordium, germination becomes extremely low, and no garlic mushroom occurs, or The yield tends to be small and inefficient.

そこで、本発明では、上記問題の解決策として、「被膜」に着目することになるが、この被膜とは、上記の如く、原基形成と並行して進められる、菌床表面の菌糸塊が成長して色の褐変化を伴って一定層に形成される膜をいうものである。
この被膜は、1〜7mm程度の厚みを備えたものとなり、その硬さは、膜としての一定の硬度を備えるものの、過度に硬いものではなく、例えればソフトボール球の表面の如き、比較的柔軟な弾性を備えたものとなる。
この被膜が菌床全面に亘って形成されたものとなる。
Therefore, in the present invention, as a solution to the above problem, attention will be paid to the “coating”. As described above, the coating is a mycelium mass on the surface of the microbial bed that is advanced in parallel with the formation of the primordium. It refers to a film that grows and is formed in a certain layer with a brown color change.
This film has a thickness of about 1 to 7 mm, and its hardness is not excessively hard, although it has a certain hardness as a film. For example, the surface of a softball sphere is relatively It becomes a thing with flexible elasticity.
This film is formed over the entire surface of the fungus bed.

さて斯かる被膜に対し、本発明しいたけの発生方法は、しいたけ菌を接種し菌糸蔓延で培地を分解腐朽させて培養する過程において菌床表面に形成された被膜に対し、表面被膜を破ってその下の菌糸層まで到達する断面積0.5〜20mmの細孔を穿つ処理を施す。
即ち、発芽時における菌床に対し、上記過程で形成される被膜の表面に、被膜を破ってその下の菌糸層まで到達する細孔を穿つ処理を施し、それによって発芽に至る刺激を与えるものとする(以下これを細孔発芽処理という)。
その細孔とは、断面積0.5〜20mm(直径約1〜5mmに相当)の孔体で、それが被膜を破った後、その下の菌糸層まで到達する深さの孔体とする。
この孔体は、円孔が代表的であるが、これに限らず、楕円形、三角形、四角形、星形等を断面形状とする孔体を含む。
The method for generating shiitake mushroom according to the present invention is to break the surface film against the film formed on the surface of the fungus bed in the process of inoculating the shiitake fungus and incubating the mycelium by decomposing and decaying the medium. A process of drilling pores having a cross-sectional area of 0.5 to 20 mm 2 reaching the lower mycelium layer is performed.
That is, the fungus bed at the time of germination is subjected to a treatment that pierces the surface of the film formed in the above process and breaks the film to reach the mycelium layer below it, thereby stimulating the germination (This is hereinafter referred to as pore germination treatment).
The pores are pores having a cross-sectional area of 0.5 to 20 mm 2 (corresponding to a diameter of about 1 to 5 mm), and a pore having a depth that reaches the mycelium layer below it after breaking the coating. To do.
The hole is typically a circular hole, but is not limited thereto, and includes a hole having an elliptical shape, a triangular shape, a quadrangular shape, a star shape, or the like in cross-sectional shape.

具体的には、図3に示す如く、例えば、太さが直径2mmで、長さが150mm程度の釘体1aを6本用意し、これを170mm×90mmの板状盤体2に略等間隔に分散させて打ち付けたスペック3を準備する。
分散の度合いは、170mm×90mmの面積に6本なので、6本/1.53×10mmとなる。これを100mm×100mmの面積に換算すると約4本/10mmとなる。
Specifically, as shown in FIG. 3, for example, six nail bodies 1a having a diameter of 2 mm and a length of about 150 mm are prepared, and these are arranged on a plate-like board body 2 of 170 mm × 90 mm at substantially equal intervals. Prepare Spec 3 that is distributed and struck.
Since the degree of dispersion is 6 in an area of 170 mm × 90 mm, 6 / 1.53 × 10 4 mm 2 is obtained. When this is converted into an area of 100 mm × 100 mm, it is about 4/10 4 mm 2 .

斯かるスペックを用いて、上記段階に至った被膜に対し、菌床の上面から釘体を刺し込み、その先端を被膜下の菌糸層の15mm程度の深さにまで到達させる。
そして、釘体の刺し込みが確認されたら、これを静かに引き抜いて、元の菌床の状態に戻す。
すると、当該菌床の表面被膜には断面直径2mmで深さ15mmの細孔が穿たれたものとなる。
このスペックの上下動は、昇降器具を用いるか、或いは、人の手によるかのいずれであっても良い。
Using such specifications, the nail body is pierced from the upper surface of the fungus bed with respect to the film that has reached the above-described stage, and the tip thereof is made to reach a depth of about 15 mm of the mycelium layer under the film.
When the nail body is confirmed to be pierced, it is gently pulled out to return to the original fungus bed state.
As a result, pores having a cross-sectional diameter of 2 mm and a depth of 15 mm are formed in the surface coating of the fungus bed.
The vertical movement of this specification may be performed either by using a lifting device or by a human hand.

切れ目を入れる発芽処理を施す場合(以下これを切れ目発芽処理という)には、上記釘体に換えて、先端の尖った刃物体(例えばナイフ)を用い、その長さを5〜10mmとすることができる。
具体的には、図4の如くで、幅8mm、厚み0.6mm、長さ150mmの刃物体1bの6本を、上記釘体と同様、170mm×90mmの板状盤体2に等間隔に分散させて立設したスペック3を用いる。
その概要は釘体の場合と同様である。
When performing a germination process for making a cut (hereinafter referred to as a cut germination process), a blade object (for example, a knife) with a sharp tip is used instead of the nail body, and its length is 5 to 10 mm. Can do.
Specifically, as shown in FIG. 4, six blade objects 1b having a width of 8 mm, a thickness of 0.6 mm, and a length of 150 mm are equally spaced on a plate-like plate body 2 of 170 mm × 90 mm as in the case of the nail body. Use Spec 3 standing in a distributed manner.
The outline is the same as that of the nail body.

次いで、細孔発芽処理を施した後、必要に応じて、6時間〜18時間に該細孔から菌床に水分供給を促す操作を加える。
即ち、しいたけの栽培にあっては、発生から収穫の間のいずれかの時点で給水を行わなければならないが、この給水は必ずしも十分な量には足らず、若しくは、その給水に24時間以上の長時間を要するものであった。
そこで、この給水を上記細孔発芽処理と同時期に行った場合、収穫量および一個重等により望ましい結果が得られるものとなる。
具外的には、上記上面栽培で被膜に細孔発芽処理又は切れ目発芽処理を施した菌床に対し、フルーツパックに400ml程度の水を溜め、そこに当該菌床を上下を逆さまにした形態、即ち、細孔発芽処理を施した面が下向きとなる形態で、浸漬させる。
この処理は、給水の時間短縮を図る意味では、20時間以内、望ましくは6時間から18時間の間に行うのが望ましい。
Next, after performing the pore germination treatment, an operation for urging the supply of moisture from the pores to the fungus bed is performed for 6 to 18 hours as necessary.
In other words, in the cultivation of shiitake mushrooms, water must be supplied at any point in time between occurrence and harvest, but this water supply is not always sufficient, or the water supply takes longer than 24 hours. It took time.
Therefore, when this water supply is performed at the same time as the above-mentioned pore germination treatment, a desired result can be obtained depending on the yield and single weight.
More specifically, about 400 ml of water is stored in a fruit pack, and the fungus bed is turned upside down with respect to the fungus bed that has been subjected to pore germination treatment or cut germination treatment in the top surface cultivation. That is, it is immersed in a form in which the surface subjected to the pore germination treatment faces downward.
This treatment is preferably performed within 20 hours, preferably between 6 hours and 18 hours, in order to shorten the time for water supply.

上記細孔発芽処理及び水分供給操作を経て、菌床には幼子実体が生まれ、それが子実体へと生育して、きのこの熟成へと向かい、1回目の刈り取りを終了させる。
そして、再度その菌床に発芽刺激を付与することで2回目以降の複数回きのこの収穫を促すが、このとき、上記本発明発芽処理を加えるものとなる。
尚、本発明発芽処理を加える間隔は、必ずしも複数回に対して毎回行う必要はなく、品種や環境の変化に応じて、回数及び間隔を定めるものとする。
Through the pore germination process and the water supply operation, a young fruit body is born in the fungus bed, grows into a fruit body, and proceeds to maturation of the mushroom, and the first trimming is finished.
Then, by applying germination stimulation to the fungus bed again, the second and subsequent multiple mushroom harvests are promoted. At this time, the above-described germination treatment of the present invention is added.
The intervals at which the germination treatment of the present invention is applied are not necessarily performed each time a plurality of times, and the number and interval are determined according to changes in the variety and environment.

切れ目発芽処理の場合も、上記細孔発芽処理とまったく同様である。 The cut germination treatment is exactly the same as the pore germination treatment.

次いで、本発明の作用及び効果を説明する。
上記しいたけの発生方法によって、表面被膜を破ってその下の菌糸層まで到達する断面積0.5〜20mmの細孔を穿つ発芽処理を施すことで、無処理のものと比較して、しいたけの発生個数を増加させ、収量としての生重を増大させ、しいたけ一個の大きさを問う個重の値も適正値に増大させることができるものとなる。このことが後述する実施例1によって確認された。
これは、細孔を穿つ処理を施すことで、被膜細胞の一部が破壊され、且つ、その細孔付近から外気が導入され、それら刺激に対する防御反応として、発芽反応が活性化されたものと推察される。
Next, functions and effects of the present invention will be described.
By the germination process by piercing the pores with a cross-sectional area of 0.5 to 20 mm 2 that breaks the surface coating and reaches the mycelium layer below the surface by the Shiitake generation method, Shiitake It is possible to increase the number of occurrences, increase the raw weight as a yield, and increase the value of the individual weight asking for the size of a single shiitake. This was confirmed by Example 1 described later.
This is because a part of the coated cell is destroyed by applying a treatment to pierce the pores, and outside air is introduced from the vicinity of the pores, and the germination reaction is activated as a defense reaction against these stimuli. Inferred.

又、その時期的条件にあっても、上記過程において菌床表面に形成される被膜が褐変化する時期は、原基が十分に準備された状態に相当し、なんらかの刺激で発芽の促される準備が整えられた状態と捉えられる。 In addition, the time when the coating formed on the surface of the fungus bed in the above process turns brown, even under the time conditions, corresponds to a state in which the primordial is sufficiently prepared, and preparation for germination is promoted by some stimulus Is considered a state of being arranged.

又、表面被膜を破ってその下の菌糸層まで到達する細孔を穿つ処理を施すことで、菌床全体を均一に刺激することのない局所的な刺激とし、且つ、その細孔の大きさを断面積0.5〜20mmの孔とすることで、その刺激が強すぎず、又、弱すぎない刺激となって、集中発生による一個重の小さなものとなる弊を避けて、一個重の大きく、市場価値の高いものとなった。 In addition, by applying a treatment that breaks the surface coating and pierces the pores that reach the mycelium layer below it, it is a local stimulus that does not uniformly stimulate the entire mycelium bed, and the size of the pores By making a hole with a cross-sectional area of 0.5 to 20 mm 2 , the stimulation is not too strong or too weak, avoiding the disadvantage of becoming a single piece due to concentration occurrence, The market value was large.

その発生位置も、上面栽培においては、側面、底面からの発生は皆無となり、すべてが望む上面から発生するものとなる。このことが、実施例2によって確認された。
これは、上記刺激を望む位置、例えば上面栽培であれば上面方向から与えれば、その刺激に反応して望む位置としての上面から発生するものと推察される。
As for the generation position, in the top surface cultivation, there is no generation from the side surface and the bottom surface, and everything is generated from the desired top surface. This was confirmed by Example 2.
This is presumed to occur from the upper surface as the desired position in response to the stimulus if given from the upper surface direction in the case where the stimulus is desired, for example, in the case of upper surface cultivation.

又、細孔の深さを10〜20mmとし、相互の間隔を2〜6個/10mmとすることで、個重が適切なものとなることが確認された。
これは刺激自体は局所的であるが、それが相互に適当間隔を保つことから、全体に亘って刺激が適正に分散され、一個重が大になったものと推察される。
In addition, it was confirmed that the individual weight would be appropriate by setting the depth of the pores to 10 to 20 mm and the mutual interval to 2 to 6/10 4 mm 2 .
This is because the stimuli themselves are local, but they are kept at an appropriate distance from each other, so that it is presumed that the stimuli are properly distributed throughout and the single weight is increased.

更に、発芽処理後6時間〜18時間に該細孔から菌床に水分供給を促すことで、発生個数と収量の増大が促され、且つ、その水分吸収の時間が短縮化されるものとなる。このことが、実施例3によって確認された。
これは上記発芽処理が、表面被膜を破ってその下の菌糸層まで到達する細孔を穿つものとすれば、その経路を伝って水が浸入し易く、それが菌糸層内部にまで浸透して、短時間で、十分なる水分の供給がなされたものである。
Further, by promoting the supply of moisture from the pores to the fungus bed 6 to 18 hours after the germination treatment, the generation number and the yield are promoted, and the moisture absorption time is shortened. . This was confirmed by Example 3.
This is because if the above germination treatment breaks the surface coating and pierces the pores that reach the underlying mycelium layer, water can easily enter through the path, and it penetrates into the mycelium layer. In a short time, sufficient water has been supplied.

この作用及び効果についても、切れ目発芽処理の場合は上記細孔発芽処理とまったく同様である。 Regarding this action and effect, in the case of the break germination treatment, it is exactly the same as the pore germination treatment.

本実施例においては、上記被膜に細孔発芽処理を施し、きのこの発生個数、生重、個重等を測定し、同処理の有効性を確認した。
先ず、培地組成はコナラのチップとオガコを容量比6:4で混合したものに栄養体としてシイタケ短期栽培用ニューバイデル(株式会社北研)を培地仕上がり重量比10%添加、含水率を60%に調整し、高圧殺菌(118℃・60分)を行なった。放冷後、品種は北研705号(株式会社北研)を接種して20℃で120日間の培養を行なった。発生については菌床の上面からのみきのこを発生させる上面栽培を行ない、発生管理は6ヶ月間とした。
上記条件の下に、対照区と処理区とを設定した。対照区は、菌床への発芽刺激を側面水の温度変化のみとしたものをC1、この温度変化に加え菌床を水を溜めたフルーツパックに浸して内部に浸水させたものをC2とした。一方、上記細孔発芽処理を施したものを処理区とし、バージンの培地からきのこの発生を促したもの(一番発生のもの)をA1とし、一度発生したものから再度の発生を促し4回目に相当するもの(4番発生のもの)をA2とし、同様に6回目に相当するもの(6番発生のもの)をA3とした。菌床の数は各区10個を供試体とした。細孔を穿つ処理は、直径2mm、長さ150mmの先端を尖らせた棒状体(釘)を170mm×90mmの板体に6本の間隔で植設したスペックを作成し、このスペックにて上記菌床の表面に細孔を穿つことで行った。
上記各供試体の、きのこの発生個数、重量としての生重、一個当たりの重量として個重をそれぞれ測定した。
尚、実施例に示す細孔発芽処理を施すスペックは、断面直径が2mmで、150mmの長さの釘体6本を、170mm×90mmの板状盤体に等間隔に分散させて打ち付けものを用いた。
In this example, the film was subjected to pore germination treatment, and the number of mushrooms generated, fresh weight, individual weight, etc. were measured, and the effectiveness of the treatment was confirmed.
First, the composition of the medium is a mixture of corn chips and sawdust mixed at a volume ratio of 6: 4, and a New Videl (Shitaken Co., Ltd.) for short-term cultivation of shiitake mushrooms is added as a nutrient to the medium. % And high-pressure sterilization (118 ° C., 60 minutes) was performed. After cooling, the cultivar was inoculated with Kitaken 705 (Kitaken Co., Ltd.) and cultured at 20 ° C. for 120 days. About the outbreak, the top cultivation which raise | generates a mushroom from the upper surface of a fungus bed was performed, and generation | occurrence | production management was made into 6 months.
Under the above conditions, a control zone and a treatment zone were set. In the control group, the germination stimulation on the fungus bed was made only by the temperature change of the side water, and C1 was made by submerging the fungus bed in a fruit pack containing water in addition to this temperature change and submerging the inside. . On the other hand, the one subjected to the above-mentioned pore germination treatment was defined as a treatment section, and the one that promoted the generation of mushrooms from the virgin medium (the one that occurred most) was designated as A1, and the first occurrence was promoted to the second occurrence. (Corresponding to No. 4) was designated as A2, and similarly, equivalent to the sixth time (corresponding to No. 6) was designated as A3. The number of fungus beds was 10 in each group. The process of drilling the pores is to create a spec with rods (nails) with a pointed tip of 2 mm in diameter and 150 mm in length, planted on a 170 mm x 90 mm plate at six intervals. This was done by drilling pores on the surface of the fungus bed.
The number of mushrooms generated, the fresh weight as the weight, and the individual weight as the weight per one of the above specimens were measured.
In addition, the specs for performing the pore germination treatment shown in the examples are those in which six nails having a cross-sectional diameter of 2 mm and a length of 150 mm are dispersed on a plate-like disk body of 170 mm × 90 mm at equal intervals. Using.

その結果は、下表1に示す如くであった。

Figure 2019030232
The results were as shown in Table 1 below.
Figure 2019030232

穏やかな刺激である温度変化のみで発芽を促したC1区と比較して、フルーツパック浸水を施したC2区にあっては、きのこの発生個数が増加し収量も最も多いものとなった。しかし、発生が局所に集中発生するケースが多く、一個あたりの重量としての生重は減少してしまった。
これに対し、本発明処理を施したA1区〜A3区にあっては、きのこの発生個数及び収量としての生重が増加し、且つ、きのこ個重も増加した。即ち、きのこの発生個数及び全体の収量が増加しただけでなく、一個当たりの個重も増加することが確認された。また、発生期間全般にわたって発生が局所に集中することなく平均的に発生する傾向が認められた。
尚、A1〜A3区を比較すると、A3区で個数及び生重が最も増加し、発生初期〜中期では収量の変動がやや大きかった一方で後期に発生がやや集中する傾向があった。相互を比較するとA3区が好適なものとなったが、これは今回供試体として北研705号を用いたが、異なる品種を用いた場合には適したタイミングが異なる可能性があり、必ずしも6番発生が好適なものとの判断はできないと考えられる。
Compared to the C1 ward, where germination was promoted only by a temperature change that was a mild stimulus, the number of mushrooms increased and the yield was the highest in the C2 ward subjected to fruit pack water immersion. However, there are many cases where the occurrence is concentrated locally, and the raw weight as a weight per piece has decreased.
On the other hand, in the A1 to A3 districts subjected to the treatment of the present invention, the number of mushrooms generated and the raw weight as a yield increased, and the mushroom individual weight also increased. That is, it was confirmed that not only the number of mushrooms generated and the overall yield increased, but also the weight per piece increased. In addition, there was a tendency for the occurrence to occur on average without concentrating the occurrence locally over the entire generation period.
When comparing the A1 to A3 wards, the number and fresh weight increased most in the A3 ward, and there was a tendency for the occurrence to be slightly concentrated in the later stage while the yield fluctuation was slightly large in the early to middle period. Comparing each other, the A3 ward was suitable. However, this time, the Hakken 705 was used as a specimen, but when different varieties were used, the suitable timing may be different, and it is not always 6 It is considered that it is not possible to judge that the number generation is suitable.

本発明処理に基づいて、きのこの発生を希望する部位からの発芽促進効果について検討した。
培養は実施例1と同様で、培地組成はコナラのチップとオガコを容量比6:4で混合したものに栄養体としてシイタケ短期栽培用ニューバイデル(株式会社北研)を培地仕上がり重量比10%添加、含水率を60%に調整し、高圧殺菌(118℃・60分)を行なった。放冷後、品種は北研705号(株式会社北研)を接種して20℃で120日間の培養を行なった。
発生については、菌床の上面から発生させる上面栽培を行い、1回目の発生終了後の菌床に対して温度変化のみで発芽を促したC1区(対照区)、菌床を手でたたいて刺激する打床区をC2区、菌床と栽培袋の間に溜めている水を排水して再び給水する反転排給水区をC3区、菌床を反転させ上面部分のみを水で満たしたフルーツパックに浸漬する部分浸水をC4区とした。
細孔発芽処理は、上記実施例1と同様とした。
各区における、きのこの発生を希望する場所を上面としたとき、その上面及びそれ以外の場所からの発生数を測定した。
Based on the treatment of the present invention, the effect of promoting germination from a site where mushroom generation is desired was examined.
The culture is the same as in Example 1. The composition of the medium is a mixture of corn chips and sawdust in a volume ratio of 6: 4. % Was added, the water content was adjusted to 60%, and high-pressure sterilization (118 ° C., 60 minutes) was performed. After cooling, the cultivar was inoculated with Kitaken 705 (Kitaken Co., Ltd.) and cultured at 20 ° C. for 120 days.
About generation, we perform top surface cultivation to generate from the upper surface of fungus bed and want to germinate only by temperature change with respect to the fungus bed after the end of the first occurrence, we want to tap the fungus bed by hand C2 is the basin area that stimulates, C3 area is the reverse drainage water area that drains the water accumulated between the fungus bed and the cultivation bag, and the water is supplied again. The partial water immersion immersed in the fruit pack was designated as C4.
The pore germination treatment was the same as in Example 1 above.
The number of occurrences of mushrooms in each section from the upper surface and other locations was measured when the location where mushroom generation was desired was defined as the upper surface.

その結果は、下表2に示す通りであった。

Figure 2019030232
The results were as shown in Table 2 below.
Figure 2019030232

その結果、温度変化のみの対照区(C1)及び、打床区(C2)・反転排給水(C3)・フルーツパックを利用した部分浸水(C4)では、菌床側面および底面といった発芽を希望しない場所からの発生がそれぞれ12%、41%、44%、25%を占めた。又、(C3)、(C4)区では処理に掛かる労力が大きい傾向があった。
一方、本発明の細孔発芽処理区(A)にあっては、発生はすべて望む上面からという結果が得られ、希望する場所からの発生が100%となることが判明した。加えて、労力が小さくて済むものであった。
As a result, in the control zone (C1) with only the temperature change, the basin zone (C2), the inverted drainage water (C3), and the partial flooding (C4) using the fruit pack, germination such as the side and bottom of the fungus bed is not desired. Occurrence from the location accounted for 12%, 41%, 44% and 25%, respectively. Moreover, in the (C3) and (C4) sections, there was a tendency that the labor required for the processing was large.
On the other hand, in the pore germination treatment section (A) of the present invention, it was found that all occurrences were obtained from the desired upper surface, and the occurrence from the desired location was 100%. In addition, the labor is small.

(A)
実施例2によって細孔発芽処理の有効性が確認できたが、これに「菌床に水分を供給する操作」を加えた場合、きのこの発生及び収穫等に如何なる影響を与えるかを検証した。
即ち、しいたけの栽培にあっては、発生期間のいずれかの時点で適時給水を行わなければならないが、この給水を上記細孔発芽処理と同時期に行った場合、収穫量および一個重等により望ましい結果が得られるのではないかと予想し、これを検証することとした。
(A)
Although the effectiveness of the pore germination treatment could be confirmed by Example 2, it was verified what effect to the occurrence of mushrooms, harvesting, etc., when “the operation of supplying moisture to the fungus bed” was added thereto.
In other words, when cultivating Shiitake mushrooms, water must be supplied in a timely manner at any point in the generation period, but if this water supply is performed at the same time as the above-mentioned pore germination treatment, depending on the yield and single weight, etc. We anticipated that the desired results would be obtained and decided to verify this.

先ず、細孔発芽処理を行なった後に、「水分の供給操作」を施すにあたって、その細孔発芽処理をおこなった菌床が、どの程度の水分を吸収するかを求めた。
しいたけの培養条件は上記実施例1と同様で、培地組成はコナラのチップとオガコを容量比6:4で混合したものに栄養体としてシイタケ短期栽培用ニューバイデル(株式会社北研)を培地仕上がり重量比10%添加、含水率を60%に調整し、高圧殺菌(118℃・60分)を行なった。放冷後、品種は北研705号(株式会社北研)を接種して20℃で120日間培養を行なった後に、栽培袋を除去して全面栽培で管理を行なった。
発生条件は、13℃と22℃を12時間交替で変化させる条件で行ない、発芽刺激は浸水(4時間)を行なった。初回発生終了後の菌床を用いて無処理の対照区(C)と処理を行なった処理区(A)を設定(各区菌床10個供試)して、散水管理を一日2回30分で3日間行ない、菌床重量の変化を測定した。
First, after performing the pore germination treatment, when performing the “water supply operation”, it was determined how much moisture the bacteria bed that had undergone the pore germination treatment absorbed.
Shiitake culture conditions were the same as in Example 1 above, and the medium composition was a mixture of Quercus chips and sawdust mixed at a volume ratio of 6: 4. The finished weight ratio was 10% added, the water content was adjusted to 60%, and high-pressure sterilization (118 ° C., 60 minutes) was performed. After standing to cool, the cultivar was inoculated with Kitaken 705 (Kitaken Co., Ltd.) and cultured at 20 ° C. for 120 days.
The generation conditions were such that 13 ° C. and 22 ° C. were changed alternately for 12 hours, and germination stimulation was performed by water immersion (4 hours). The untreated control group (C) and the treated group (A) where the treatment was performed using the bacterial bed after the first occurrence was set (10 samples of each bacterial bed were tested), and sprinkling management was performed twice a day 30 The measurement was performed for 3 days, and the change in the bacterial bed weight was measured.

その結果は、下表3に示す通りであった。

Figure 2019030232
The results were as shown in Table 3 below.
Figure 2019030232

この結果、対照区(C)と比較して処理区(A)では、無処理の対照区(C)の重量増加が0.98%であったのに対し、処理区(A)では4.04%の増加となり、顕著な菌床重量の増加が見られた。
従って、先ず、細孔発芽処理と水分の供給操作によって、菌床に水分が十分且つ適正範囲に吸収されることが確認された。
As a result, the weight increase of the untreated control group (C) was 0.98% in the treated group (A) compared to the control group (C), whereas the treated group (A) was 4. The increase was 04%, and a significant increase in the bacterial bed weight was observed.
Therefore, first, it was confirmed that the moisture was sufficiently absorbed in the bacteria bed by the pore germination treatment and the water supply operation.

(B)上記(A)に基づいて、細孔発芽処理によって菌床に十分な水分が吸収されることが確認できたが、その十分な水分が吸収された菌床によってきのこ収量に如何なる影響を与えるかを検証した。
使用した菌床は、前述の実施例と同様に北研705号とした。初回発生後に休養管理(23℃・7日間)を行ない、処理を行なわない対照区(C1)、(C2)と細孔発芽処理に浸水操作を加えた処理区(A1)、(A2)を設定した。操作時間は(C1)、(A1)で6時間、(C2)、(A2)で18時間とした。
(B) Based on the above (A), it was confirmed that sufficient moisture was absorbed into the fungus bed by the pore germination treatment, but what kind of influence was exerted on the yield of mushrooms by the fungus bed in which sufficient moisture was absorbed. I verified it.
The fungus bed used was Kitaken No. 705 as in the previous example. After the first occurrence, rest management (23 ° C, 7 days) is performed, and the control sections (C1) and (C2) where no treatment is performed and the treatment sections (A1) and (A2) in which submerged operation is added to the pore germination treatment are set. did. The operation time was 6 hours for (C1) and (A1) and 18 hours for (C2) and (A2).

その結果は、下表4に示す通りであった。

Figure 2019030232
The results were as shown in Table 4 below.
Figure 2019030232

この結果、6時間操作では、処理のないC1区ではパック浸水前と後で菌床重量の差が55gで、きのこ収量が192g/菌床であったのに対し、細孔発芽処理に浸水操作を加えたA1区ではパック浸水の前後で菌床重量の差が70gで、きのこ収量が192g/菌床であった。18時間処理では、処理のないC2区ではパック浸水前と後で菌床重量の差が80gで、きのこ収量が322g/菌床であったのに対し、処理を施したA2区ではパック浸水の前後で菌床重量の差が168gで、きのこ収量は349g/菌床であった。
即ち、無処理の対照区と処理区とを比較した場合、無処理のC1区及びC2区に対し処理区のA1区及びA2区は、吸水量が多くなると共に、きのこ収量も増加する傾向が認められた。又、操作時間を比較した場合にも、6時間操作のA1区に対して18時間操作のA2区では、吸水量及び収量ともに操作時間の長いA2区が値の高いものであった。
従って、吸水量及び収量をともに高める意味では、処理を施すとともにその操作時間をできる限り長時間に保つことが望ましいものとなる。
一方、その操作時間については、18時間操作したA2区が349g/菌床であったのに対し、6時間操作したA1区は298g/菌床となり、A1区の収量はA2区の約85%に達するものであった。
このことから、6時間以上の浸水操作を施すなら、実効性のある比較的高い吸水量及び収量が確保できることが判明した。
ここから浸水時間(給水時間)を6時間から18時間とすることで、実効性の高い吸水量と収量が期待できるものとなる。
尚、上記6時間及び18時間の処理時間は、通常のきのこ栽培における浸水では24時間以上を要し、この点からも、細孔発芽処理に浸水操作を加えたものは時間短縮と収量増大に効果あることが確認される。
As a result, in 6 hours operation, the difference in the weight of the fungus bed was 55 g before and after the pack soaking in the C1 ward without treatment, and the mushroom yield was 192 g / fungus bed. In the A1 district with the addition of water, the difference in the weight of the fungus bed before and after the flooding of the pack was 70 g, and the yield of mushrooms was 192 g / fungus bed. In the 18-hour treatment, the difference in the weight of the fungus bed was 80 g before and after pack inundation in the C2 district without treatment, and the yield of mushrooms was 322 g / fungus bed, whereas in the A2 district where the treatment was carried out, the pack was flooded. The difference in the weight of the fungus bed between before and after was 168 g, and the yield of mushrooms was 349 g / fungus bed.
That is, when comparing the untreated control group and the treated group, the treated areas A1 and A2 tend to increase the amount of water absorption and increase the mushroom yield compared to the untreated C1 and C2. Admitted. Further, when the operation times were compared, in the A2 section where the operation time was 18 hours compared to the A1 section where the operation was performed for 6 hours, the A2 section where the operation time was long was higher in both the water absorption amount and the yield.
Therefore, in order to increase both the amount of water absorption and the yield, it is desirable to perform the treatment and keep the operation time as long as possible.
On the other hand, regarding the operation time, A2 ward operated for 18 hours was 349 g / bacteria bed, whereas A1 ward operated for 6 hours became 298 g / bacteria bed, and the yield of A1 ward was about 85% of A2 ward. It was something to reach.
From this, it was found that if a water immersion operation for 6 hours or more is performed, an effective and relatively high water absorption amount and yield can be secured.
From here, by setting the immersion time (water supply time) from 6 hours to 18 hours, a highly effective water absorption amount and yield can be expected.
The treatment time of 6 hours and 18 hours described above requires 24 hours or more in the case of water immersion in normal mushroom cultivation, and from this point, the addition of the water immersion operation to the pore germination treatment shortens the time and increases the yield. It is confirmed that there is an effect.

しいたけ菌床栽培において、既存の方法への利用はもちろん、人件費・施設費等の低減がより大きく求められる工場生産においても、本発明を用いることで効率的かつ効果的に細孔発芽処理を行なうことが可能となる。   In Shiitake fungus bed cultivation, the use of existing methods, as well as factory production that requires greater reductions in labor costs, facility costs, etc., enables efficient and effective pore germination treatment by using the present invention. Can be performed.

1a・・ 釘体
1b・・ 刃物体
2・・ 板状盤体
3・・ スペック
3・・ 培地
1a ··· Nail 1b · · Blade object 2 · Plate disc 3 · · Spec 3 · · Medium

Claims (6)

しいたけ菌を接種し菌糸蔓延で培地を分解腐朽させて培養する過程において菌床表面に形成される被膜に対し、表面被膜を破ってその下の菌糸層まで到達する断面積0.5〜20mmの細孔を穿つ発芽処理を施すことを特徴とするしいたけの発生方法。 In contrast to the film formed on the surface of the mycelium in the process of inoculating shiitake fungi and decomposing and decaying the medium with the spread of mycelia, the cross-sectional area that breaks the surface film and reaches the mycelium layer below it is 0.5 to 20 mm 2 A method for generating shiitake mushrooms, characterized by performing a germination treatment to pierce the pores. 細孔の深さを10〜20mmとし、相互の間隔を2〜6個/10mmとしたことを特徴とする請求項1記載のしいたけの発生方法。 2. The method for generating shiitake mushrooms according to claim 1, wherein the depth of the pores is 10 to 20 mm, and the interval between the pores is 2 to 6/10 4 mm 2 . 表面被膜を破ってその下の菌糸層まで到達する断面積0.5〜20mmの細孔を穿つ発芽処理を施した後、6時間〜18時間に該細孔から菌床に水分供給を促すことを特徴とする請求項1、2記載のしいたけの発生方法。 After performing a germination treatment for piercing a pore having a cross-sectional area of 0.5 to 20 mm 2 that breaks the surface coating and reaches the mycelium layer below it, water supply from the pore to the mycelium is promoted from 6 to 18 hours. The method for generating shiitake mushrooms according to claim 1 or 2. しいたけ菌を接種し菌糸蔓延で培地を分解腐朽させて培養する過程において菌床表面に形成される被膜に対し、表面被膜を破ってその下の菌糸層まで到達する長さ5〜10mmの切れ目を入れる発芽処理を施すことを特徴とするしいたけの発生方法。   In the process of inoculating shiitake fungus and culturing by decomposing and decaying the medium with the spread of mycelia, the cut formed on the surface of the mycelium is 5 to 10 mm long to break the surface film and reach the mycelium layer below it A method for generating shiitake mushrooms, characterized by performing a germination treatment. 切れ目の相互の間隔を2〜6個/10mmとしたことを特徴とする請求項4記載のしいたけの発生方法。 5. The method for generating shiitake mushrooms according to claim 4, wherein the interval between the cuts is set to 2 to 6 pieces / 10 4 mm 2 . 表面被膜を破ってその下の菌糸層まで到達する長さ5〜10mmの切れ目を入れる発芽処理を施した後、6時間〜18時間に切れ目から菌床に水分供給を促すことを特徴とする請求項4、5記載のしいたけの発生方法。   A water supply is urged from 6 to 18 hours from the cut to the fungus bed after the germination treatment for breaking the surface coat to reach the mycelium layer below it is performed. Item 5. A method for generating shiitake mushrooms according to item 5.
JP2017152178A 2017-08-07 2017-08-07 How to generate shiitake mushrooms Active JP7032753B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2017152178A JP7032753B2 (en) 2017-08-07 2017-08-07 How to generate shiitake mushrooms

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017152178A JP7032753B2 (en) 2017-08-07 2017-08-07 How to generate shiitake mushrooms

Publications (2)

Publication Number Publication Date
JP2019030232A true JP2019030232A (en) 2019-02-28
JP7032753B2 JP7032753B2 (en) 2022-03-09

Family

ID=65522484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017152178A Active JP7032753B2 (en) 2017-08-07 2017-08-07 How to generate shiitake mushrooms

Country Status (1)

Country Link
JP (1) JP7032753B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111512893A (en) * 2020-06-24 2020-08-11 浙江大学台州研究院 Fungus stick water injection equipment
CN111727817A (en) * 2020-07-14 2020-10-02 三门颜临医疗器械有限公司 All-round automatic piercing mechanism of square fungus bag
CN115413535A (en) * 2022-09-20 2022-12-02 庆元县食用菌产业中心(庆元县食用菌科研中心) Cultivation device and cultivation method for mushroom strains

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02268622A (en) * 1989-04-11 1990-11-02 Kazuki Ono Culture of mushroom
JPH09322649A (en) * 1996-06-06 1997-12-16 Mori Sangyo Kk Mushroom culture and device therefor
JP2003199429A (en) * 2002-01-10 2003-07-15 Hiroichi Fujisawa Method for culturing pleurotus erygii mushroom
JP2004236625A (en) * 2003-02-07 2004-08-26 Takeshi Aso Year-round culture process for shiitake mushroom bed log cultivation
US20110277383A1 (en) * 2010-05-12 2011-11-17 B.T.T.R. Ventures Llc Methods, Devices and Kits for Mushroom Production
JP2013013358A (en) * 2011-07-02 2013-01-24 Hokken Co Ltd Method for culturing shiitake mushroom (lentinus edodes) with high-pressure water spraying

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02268622A (en) * 1989-04-11 1990-11-02 Kazuki Ono Culture of mushroom
JPH09322649A (en) * 1996-06-06 1997-12-16 Mori Sangyo Kk Mushroom culture and device therefor
JP2003199429A (en) * 2002-01-10 2003-07-15 Hiroichi Fujisawa Method for culturing pleurotus erygii mushroom
JP2004236625A (en) * 2003-02-07 2004-08-26 Takeshi Aso Year-round culture process for shiitake mushroom bed log cultivation
US20110277383A1 (en) * 2010-05-12 2011-11-17 B.T.T.R. Ventures Llc Methods, Devices and Kits for Mushroom Production
JP2013013358A (en) * 2011-07-02 2013-01-24 Hokken Co Ltd Method for culturing shiitake mushroom (lentinus edodes) with high-pressure water spraying

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111512893A (en) * 2020-06-24 2020-08-11 浙江大学台州研究院 Fungus stick water injection equipment
CN111727817A (en) * 2020-07-14 2020-10-02 三门颜临医疗器械有限公司 All-round automatic piercing mechanism of square fungus bag
CN115413535A (en) * 2022-09-20 2022-12-02 庆元县食用菌产业中心(庆元县食用菌科研中心) Cultivation device and cultivation method for mushroom strains
CN115413535B (en) * 2022-09-20 2024-04-30 庆元县食用菌产业中心(庆元县食用菌科研中心) Cultivation device and cultivation method for mushroom strains

Also Published As

Publication number Publication date
JP7032753B2 (en) 2022-03-09

Similar Documents

Publication Publication Date Title
Putra et al. Soilless culture system to support water use efficiency and product quality: a review
US6901696B2 (en) Method of plant propagation using root bark-grafting to sections
JP6529711B2 (en) Raising method of seedlings of mountain forest trees cuttings
Boivin et al. Late-season fertilization of Picea mariana seedlings: intensive loading and outplanting response on greenhouse bioassays
CN104871901B (en) A kind of borneol camphor tree method for culturing seedlings
JP6444611B2 (en) Plant cultivation method
JP2019030232A (en) Generation method of shiitake mushroom
Roy et al. Effect of pre plant soaking of corms in growth regulators on sprouting, vegetative growth and corm formation in gladiolus (Gladiolus grandiflorus L.)
CN106212172A (en) Poem beautiful jade leads to cuttage and seedling culture method with a smile
CN104737761B (en) The cuttage breeding method of sinojackia xylocarpa
Parmar et al. Effect of Indole 3-butyric acid (IBA), rooting media and their interaction on different rooting and growth characteristic of air-layers in guava (Psidium guajava L. cv. L-49)
KR101412052B1 (en) Method of germination induction in Pruns yedoensis seeds
CN107197668A (en) Rhizoma Gastrodiae implantation methods
Padhi et al. Growing media, GA3 and thiourea stimulates growth and rooting in gladiolus cormels cv. Tiger Flame
JP6535421B2 (en) Method of producing tomato, tomato and method of imparting resistance
Oliveira et al. Productivity of polyclonal minigarden and rooting of Handroanthus heptaphyllus Mattos minicuttings.
Syamal et al. Effect of methods and time of propagation in bael under different growing conditions
JP2019080587A (en) Method for raising cutting seedlings of forest trees
Singh et al. Effect of growing media, Pgrs and seasonal variability on rooting ability and survival of lemon (Citrus Limon L.) cuttings
CN108718739A (en) Golden Chinese scholartree cuttage and seedling culture method
Chaudhari et al. Effect of rooting hormone and media on root induction in poinsettia (Euphorbia pulcherrima Willd.)
Saha et al. Irrigation strategies for greenhouse tomato production on rockwool
Anne-Laure et al. Application of used hydroponic substrate as soil amendment for crop production
Basant et al. Effect of nutrient management on growth, flowering and flower yield of tuberose (Polianthes tuberose L.) under Chhattisgarh plain condition
SINGH et al. Effect of various growing media, GA3 and thiourea on growth and root characters in gladiolus

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20200623

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20200728

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20210122

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20210123

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20210519

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20210608

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20210705

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20220104

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20220216

R150 Certificate of patent or registration of utility model

Ref document number: 7032753

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350