JP2019026889A - Production method of plating component - Google Patents

Production method of plating component Download PDF

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Publication number
JP2019026889A
JP2019026889A JP2017147007A JP2017147007A JP2019026889A JP 2019026889 A JP2019026889 A JP 2019026889A JP 2017147007 A JP2017147007 A JP 2017147007A JP 2017147007 A JP2017147007 A JP 2017147007A JP 2019026889 A JP2019026889 A JP 2019026889A
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Prior art keywords
plated
plating
film
portions
coating
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Japanese (ja)
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守行 橋本
Moriyuki Hashimoto
守行 橋本
仲谷 幸司
Koji Nakaya
幸司 仲谷
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Toyoda Gosei Co Ltd
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Toyoda Gosei Co Ltd
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Priority to JP2017147007A priority Critical patent/JP2019026889A/en
Priority to US15/988,010 priority patent/US20190032235A1/en
Publication of JP2019026889A publication Critical patent/JP2019026889A/en
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1635Composition of the substrate
    • C23C18/1639Substrates other than metallic, e.g. inorganic or organic or non-conductive
    • C23C18/1641Organic substrates, e.g. resin, plastic
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1646Characteristics of the product obtained
    • C23C18/165Multilayered product
    • C23C18/1653Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2046Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
    • C23C18/2073Multistep pretreatment
    • C23C18/208Multistep pretreatment with use of metal first
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/22Roughening, e.g. by etching
    • C23C18/24Roughening, e.g. by etching using acid aqueous solutions
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/285Sensitising or activating with tin based compound or composition
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/30Activating or accelerating or sensitising with palladium or other noble metal
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • C23C18/36Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/005Contacting devices
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/06Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
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    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02Electroplating of selected surface areas
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    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02Electroplating of selected surface areas
    • C25D5/022Electroplating of selected surface areas using masking means
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    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • C25D5/12Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C25D5/14Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
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    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54Electroplating of non-metallic surfaces
    • C25D5/56Electroplating of non-metallic surfaces of plastics
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    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/623Porosity of the layers

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

To easily produce a plating component having a plurality of to-be-plated parts on which metal films different from each other are formed.SOLUTION: A production method of a plating component 10 comprises: a molding step in which a substrate 12 of non-conducting resin mold is molded, which includes a plurality of to-be-plated parts 14a and 14b having gap therebetween, and connection parts 16 for connecting the plurality of to-be-plated parts 14a and 14b; an electroless plating step in which conductive films are formed on the plurality of to-be-plated parts 14a and 14b; and an electrolytic plating step in which mutually different electrolytic plating treatments are exceptionally performed on to-be-plated parts 14a and 14b on which metal films different from each other are formed among the plurality of to-be-plated parts 14a and 14b.SELECTED DRAWING: Figure 2

Description

本発明は、互いに異なる金属被膜が形成された複数の被めっき部を有するめっき部品の製造方法に関する。   The present invention relates to a method for manufacturing a plated component having a plurality of parts to be plated on which different metal films are formed.

例えば自動車に取り付けられるラジエータグリル、バックパネル、フォグカバー等の金属外観を有する車両用装飾品は、合成樹脂製の基材上に複数層の金属被膜からなる、めっき被膜を形成して製造される。このようなめっき部品を製造する方法として、基材上に無電解めっき処理を施すことにより導電性被膜を形成して導電性を付与した後、電解めっき処理を施すことにより複数層の金属被膜を形成するめっき方法が知られている。   For example, a vehicle decorative article having a metallic appearance such as a radiator grille, a back panel, and a fog cover attached to an automobile is manufactured by forming a plating film composed of a plurality of layers of metal film on a synthetic resin base material. . As a method for producing such a plated component, a conductive film is formed on a base material by applying an electroless plating process to impart conductivity, and then a plurality of layers of metal films are formed by performing an electrolytic plating process. A plating method to be formed is known.

ところで、従来、層構成の互いに異なるめっき被膜が形成された複数の被めっき部を有するめっき部品を製造しようとすると、複数の被めっき部材を格別に成形し、各被めっき部材に対して互いに異なる電解めっき処理を施すことで、層構成の互いに異なるめっき被膜を形成する。そして、自動車等に対して複数の被めっき部材を格別に取り付ける、あるいは、予め各被めっき部材が組み付けられて一体とされた組み付け品を自動車に対して取り付けることとなる。   By the way, conventionally, when it is going to manufacture the plating component which has the some to-be-plated part in which the plating film from which a layer structure mutually differs was formed, a some to-be-plated member is shape | molded exceptionally and it mutually differs with respect to each to-be-plated member By performing the electrolytic plating treatment, plating films having different layer structures are formed. Then, a plurality of members to be plated are specially attached to an automobile or the like, or an assembly product in which each member to be plated is assembled in advance is attached to the automobile.

しかしながら、この場合、部品点数が増えるばかりか、被めっき部材毎に、互いに異なる電解めっき処理を行うための工程が必要となる。また、自動車等に対して複数の被めっき部材を格別に取り付ける等の工程が必要となる。そのため、めっき部品の製造工程が煩雑になるという問題がある。   However, in this case, not only the number of parts increases, but also a process for performing different electroplating processes for each member to be plated is required. Moreover, the process of attaching a some to-be-plated member exceptionally with respect to a motor vehicle etc. is needed. Therefore, there exists a problem that the manufacturing process of plating components becomes complicated.

これに対して、特許文献1に記載の多色めっき法では、基材に対して非化学めっき性絶縁塗料を塗布することにより同基材の表面を2つ以上の非塗装部分に区分する。続いて、非塗装部分に対して化学めっきを施すことにより導体化する。その後、非塗装部分に対して個々に異なる電気めっきを施す。これにより、1つの基材の複数の非塗装部分(被めっき部)に対して、互いに異なる複数の金属被膜が形成される。   On the other hand, in the multicolor plating method described in Patent Document 1, the surface of the base material is divided into two or more non-coating parts by applying a non-chemical plating insulating coating to the base material. Subsequently, the non-painted portion is made into a conductor by chemical plating. Thereafter, different electroplating is applied to each non-painted portion. Thereby, a plurality of different metal coatings are formed on a plurality of non-painted portions (a portion to be plated) of one base material.

特開昭59−126790号公報JP 59-126790 A

ところで、特許文献1に記載の多色めっき方法の場合、複数の被めっき部を区分するために、非化学めっき性絶縁塗料を基材に対して塗布するための工程が必要となる。そのため、上記工程が追加されることで製造工程が煩雑になるという問題がある。   By the way, in the case of the multicolor plating method described in Patent Document 1, a process for applying a non-chemical plating insulating coating to a base material is required in order to classify a plurality of parts to be plated. Therefore, there exists a problem that a manufacturing process becomes complicated by the said process being added.

本発明の目的は、互いに異なる金属被膜が形成された複数の被めっき部を有するめっき部品を容易に製造することのできるめっき部品の製造方法を提供することにある。   The objective of this invention is providing the manufacturing method of the plating component which can manufacture easily the plating component which has the some to-be-plated part in which the metal film which is mutually different was formed.

上記目的を達成するためのめっき部品の製造方法は、空間を隔てて設けられた複数の被めっき部と、前記複数の被めっき部同士を連結する連結部とを有する非導電性の樹脂成形体である基材を成形する成形工程と、前記複数の被めっき部上に導電性被膜を形成することにより導電性を付与する無電解めっき工程と、前記複数の被めっき部のうち互いに異なる金属被膜が形成される予定の被めっき部に対して、互いに異なる電解めっき処理を格別に施す電解めっき工程と、を備える。   A method of manufacturing a plated component for achieving the above object includes a non-conductive resin molded body having a plurality of parts to be plated provided with a space and a connecting part for connecting the parts to be plated. A forming step for forming a base material, an electroless plating step for imparting conductivity by forming a conductive coating on the plurality of portions to be plated, and metal coatings different from each other among the plurality of portions to be plated And an electroplating step in which different electroplating processes are applied to the portion to be plated.

同方法によれば、複数の被めっき部同士が空間を隔てて設けられることにより相互に電気的に絶縁されるため、無電解めっき工程に先立ち絶縁塗料を塗布する工程を省略できる。したがって、互いに異なる金属被膜が形成された複数の被めっき部を有するめっき部品を容易に製造することができる。   According to this method, since a plurality of portions to be plated are provided with a space therebetween, they are electrically insulated from each other, so that the step of applying an insulating coating prior to the electroless plating step can be omitted. Therefore, it is possible to easily manufacture a plated part having a plurality of parts to be plated on which different metal films are formed.

上記めっき部品の製造方法において、前記電解めっき工程は、前記複数の被めっき部のうち第1の被めっき部に対して通電する一方、その他全ての被めっき部に対する通電を遮断した状態で、前記第1の被めっき部に第1の金属被膜を形成する第1の電解めっき処理と、前記複数の被めっき部のうち前記第1の被めっき部とは異なる第2の被めっき部に対して通電する一方、その他全ての被めっき部に対する通電を遮断した状態で、前記第2の被めっき部に第2の金属被膜を形成する第2の電解めっき処理と、を含むことが好ましい。   In the method for manufacturing a plated component, the electrolytic plating step is configured such that the first plated portion of the plurality of plated portions is energized while the energization of all other plated portions is interrupted, A first electrolytic plating process for forming a first metal film on the first plated portion, and a second plated portion different from the first plated portion among the plurality of plated portions. It is preferable to include a second electrolytic plating process in which a second metal film is formed on the second plated portion in a state where energization is interrupted while all the other plated portions are cut off.

同方法によれば、第1の被めっき部に対して第1の金属被膜を形成する一方、第2の被めっき部に対して第2の金属被膜を形成することができる。
上記めっき部品の製造方法において、前記電解めっき工程は、前記複数の被めっき部の全てに対して通電した状態で、前記複数の被めっき部の全てに第1の金属被膜を形成する第1の電解めっき処理と、前記複数の被めっき部のうちの一部の被めっき部に対して通電した状態で、前記一部の被めっき部に前記第1の金属被膜とは異なる第2の金属被膜を形成する第2の電解めっき処理と、を含むことが好ましい。
According to this method, the first metal film can be formed on the first plated portion, while the second metal film can be formed on the second plated portion.
In the method for manufacturing a plated component, the electrolytic plating step includes forming a first metal film on all of the plurality of parts to be plated in a state where all the parts to be plated are energized. A second metal film different from the first metal film on the part to be plated in an electroplating process and in a state where a part of the part to be plated is energized. It is preferable to include the 2nd electroplating process which forms.

同方法によれば、まずは、複数の被めっき部の全てに対して第1の金属被膜が形成される。続いて、各被めっき部のうちの一部の被めっき部に対して第2の金属被膜が形成される。これにより、第1の金属被膜が形成された被めっき部と、第1の金属被膜上に第2の金属被膜が形成された被めっき部とを有するめっき部品を製造することができる。   According to this method, first, the first metal film is formed on all of the plurality of portions to be plated. Then, a 2nd metal film is formed with respect to the to-be-plated part of each to-be-plated part. Thereby, the plated component which has the to-be-plated part in which the 1st metal film was formed, and the to-be-plated part in which the 2nd metal film was formed on the 1st metal film can be manufactured.

本発明によれば、互いに異なる金属被膜が形成された複数の被めっき部を有するめっき部品を容易に製造することができる。   ADVANTAGE OF THE INVENTION According to this invention, the plating component which has several to-be-plated parts in which a mutually different metal coating film was formed can be manufactured easily.

めっき部品の製造方法の第1実施形態について、前処理工程及び電解めっき工程を説明する図。The figure explaining a pre-processing process and an electroplating process about 1st Embodiment of the manufacturing method of plating components. 同実施形態のめっき部品の正面図。The front view of the plating component of the embodiment. (a)は、同実施形態のサテンニッケルめっき工程において用いられる第1のハンガーと基材との関係を示す正面図、(b)は、同実施形態の光沢ニッケルめっき工程において用いられる第2のハンガーと基材との関係を示す正面図。(A) is a front view which shows the relationship between the 1st hanger and base material used in the satin nickel plating process of the embodiment, (b) is the second used in the bright nickel plating process of the embodiment. The front view which shows the relationship between a hanger and a base material. (a)は、第1の被めっき部、導電性被膜、及び第1のめっき被膜の断面図、(b)は、第2の被めっき部、導電性被膜、及び第2のめっき被膜の断面図。(A) is sectional drawing of a 1st to-be-plated part, a conductive film, and a 1st plating film, (b) is a cross section of a 2nd to-be-plated part, a conductive film, and a 2nd plating film. Figure. めっき部品の製造方法の第2実施形態について、前処理工程及び電解めっき工程を説明する図。The figure explaining a pre-processing process and an electroplating process about 2nd Embodiment of the manufacturing method of a plating component. (a)は、同実施形態の3価クロムめっき工程において用いられる第1のハンガーと基材との関係を示す正面図、(b)は、同実施形態のダーク3価クロムめっき工程において用いられる第2のハンガーと基材との関係を示す正面図。(A) is a front view which shows the relationship between the 1st hanger and base material used in the trivalent chromium plating process of the embodiment, (b) is used in the dark trivalent chromium plating process of the embodiment. The front view which shows the relationship between a 2nd hanger and a base material. (a)は、第1の被めっき部、導電性被膜、及び第1のめっき被膜の断面図、(b)は、第2の被めっき部、導電性被膜、及び第2のめっき被膜の断面図。(A) is sectional drawing of a 1st to-be-plated part, a conductive film, and a 1st plating film, (b) is a cross section of a 2nd to-be-plated part, a conductive film, and a 2nd plating film. Figure.

<第1実施形態>
以下、図1〜図4を参照して、第1実施形態におけるめっき部品の製造方法について説明する。
<First Embodiment>
Hereinafter, with reference to FIGS. 1-4, the manufacturing method of the plating component in 1st Embodiment is demonstrated.

図2に示すように、本実施形態のめっき部品10は、自動車のラジエータグリルを構成するものであり、非導電性の樹脂成形体である基材12を有している。なお、本実施形態では、説明を簡単にするために、正面視略長方形状をなす基材12について説明する。また、以降において、基材12の長手方向を単に長手方向Lとし、基材12の短手方向を単に短手方向Sとして説明する。   As shown in FIG. 2, the plated component 10 of the present embodiment constitutes a radiator grill of an automobile and has a base 12 that is a non-conductive resin molded body. In addition, in this embodiment, in order to demonstrate easily, the base material 12 which makes front view substantially rectangular shape is demonstrated. In the following description, the longitudinal direction of the substrate 12 is simply referred to as the longitudinal direction L, and the short direction of the substrate 12 is simply referred to as the short direction S.

図2に示すように、基材12は、互いに同一の波形状をなすとともに長手方向Lにおいて空間を隔てて設けられた複数の被めっき部14a,14bと、長手方向Lにおいて互いに隣り合う一対の被めっき部14a,14b同士を連結する複数の連結部16とを有している。各連結部16は、被めっき部14a,14bにおけるめっき面、すなわち後述する導電性被膜20やめっき被膜30a,30bが形成される面以外の部位同士を連結している。   As shown in FIG. 2, the base material 12 has a pair of adjacent portions in the longitudinal direction L and a plurality of plated parts 14 a and 14 b that have the same wave shape and are spaced apart in the longitudinal direction L. It has the some connection part 16 which connects the to-be-plated parts 14a and 14b. Each connection part 16 has connected parts other than the plating surface in the to-be-plated parts 14a and 14b, ie, the surface in which the conductive film 20 mentioned later and plating film 30a, 30b are formed.

各被めっき部14a,14bは、黒色を呈するABS樹脂からなる。また、各連結部16は、透明なポリカーボネートからなる。各被めっき部14a,14b及び各連結部16は、二色成形により一体形成されている。   Each of the plated portions 14a and 14b is made of a black ABS resin. Each connecting portion 16 is made of transparent polycarbonate. The plated portions 14a and 14b and the connecting portions 16 are integrally formed by two-color molding.

図2に示すように、複数の被めっき部14a,14bは、長手方向Lにおいて一つ置きに設けられた複数の第1の被めっき部14aと、長手方向Lにおいて互いに隣り合う第1の被めっき部14a同士の間に1つずつ設けられた複数の第2の被めっき部14bとを有している。   As shown in FIG. 2, the plurality of to-be-plated portions 14 a and 14 b include a plurality of first to-be-plated portions 14 a provided alternately in the longitudinal direction L and the first to-be-plated portions 14 a adjacent to each other in the longitudinal direction L. A plurality of second plated parts 14b provided one by one between the plated parts 14a.

各第1の被めっき部14aの短手方向Sにおける両端には、第1の接点18aが外側に向けて突出して設けられている。
各第2の被めっき部14bの短手方向Sにおける両端には、第2の接点18bが外側に向けて突出して設けられている。
A first contact 18a is provided at both ends of each first plated portion 14a in the short direction S so as to protrude outward.
At both ends in the short direction S of each second plated portion 14b, second contacts 18b are provided so as to protrude outward.

図4(a)に示すように、第1の被めっき部14a上には、ニッケルからなる導電性被膜20が形成されている。導電性被膜20上には、複数層の金属被膜からなる第1のめっき被膜30aが積層されている。第1のめっき被膜30aは、導電性被膜20側から順に、銅被膜32、半光沢ニッケル被膜34、サテンニッケル被膜36a、マイクロポーラスニッケル被膜(以下、MPニッケル被膜38)、及び3価クロム被膜40(所謂、白3価クロム被膜)が積層されて形成されている。   As shown in FIG. 4A, a conductive film 20 made of nickel is formed on the first plated portion 14a. On the conductive film 20, a first plating film 30a made of a plurality of layers of metal films is laminated. The first plating film 30a includes, in order from the conductive film 20 side, a copper film 32, a semi-bright nickel film 34, a satin nickel film 36a, a microporous nickel film (hereinafter, MP nickel film 38), and a trivalent chromium film 40. (A so-called white trivalent chromium film) is laminated.

図4(b)に示すように、第2の被めっき部14b上には、ニッケルからなる導電性被膜20が形成されている。導電性被膜20上には、複数層の金属被膜からなるとともに、第1のめっき被膜30aとは層構成の異なる第2のめっき被膜30bが積層されている。第2のめっき被膜30bは、導電性被膜20側から順に、銅被膜32、半光沢ニッケル被膜34、光沢ニッケル被膜36b、MPニッケル被膜38、及び3価クロム被膜40が積層されて形成されている。   As shown in FIG. 4B, a conductive film 20 made of nickel is formed on the second plated portion 14b. On the conductive coating 20, a second plating coating 30b made of a plurality of metal coatings and having a layer configuration different from that of the first plating coating 30a is laminated. The second plating film 30b is formed by laminating a copper film 32, a semi-bright nickel film 34, a bright nickel film 36b, an MP nickel film 38, and a trivalent chromium film 40 in this order from the conductive film 20 side. .

すなわち、第1のめっき被膜30aでは、サテンニッケル被膜36aが設けられているのに対して、第2のめっき被膜30bでは、サテンニッケル被膜36aに代えて、光沢ニッケル被膜36bが設けられている。   That is, the first plated film 30a is provided with the satin nickel film 36a, whereas the second plated film 30b is provided with the bright nickel film 36b instead of the satin nickel film 36a.

次に、本実施形態のめっき部品10を製造する手順について説明する。
めっき部品10を製造する際には、まず、上述した基材12を二色成形により一体形成する(成形工程)。
Next, a procedure for manufacturing the plated component 10 of the present embodiment will be described.
When the plated component 10 is manufactured, first, the base material 12 described above is integrally formed by two-color molding (molding process).

次に、図1に示すように、基材12に対して電解めっき工程を施すに先立ち、周知の前処理工程(S101〜105)を施す。
前処理工程においては、まず、脱脂工程(S101)において、基材12を脱脂処理して基材12表面に付着している油脂等を除去する。
Next, as shown in FIG. 1, prior to performing the electrolytic plating process on the base material 12, a known pretreatment process (S 101 to 105) is performed.
In the pretreatment step, first, in the degreasing step (S101), the base material 12 is degreased to remove oils and fats adhering to the surface of the base material 12.

続いて、エッチング工程(S102)において、クロム酸と硫酸溶液でエッチングして基材12のうちABS樹脂により形成されている各被めっき部14a,14bの表面を粗化(凹凸化)する。   Subsequently, in the etching step (S102), the surfaces of the portions to be plated 14a and 14b formed of the ABS resin in the base 12 are roughened (made rough) by etching with chromic acid and a sulfuric acid solution.

続いて、キャタリスト工程(S103)において、導電性被膜20となる無電解ニッケルを析出させるためのPdSn錯体等の触媒を各被めっき部14a,14bの表面に吸着させる。   Subsequently, in the catalyst process (S103), a catalyst such as a PdSn complex for precipitating electroless nickel that becomes the conductive coating 20 is adsorbed on the surfaces of the portions to be plated 14a and 14b.

続いて、アクセレータ工程(S104)において、吸着された触媒を活性化させる。
続いて、無電解ニッケルめっき工程(S105)において、次亜リン酸ナトリウム等の還元剤の存在する無電解ニッケルめっき液中で無電解ニッケルめっき処理をすることにより、非導電性の各被めっき部14a,14bの表面に導電性被膜20としてのニッケル被膜を形成する。本実施形態では、この無電解ニッケルめっき工程が本発明に係る無電解めっき工程に相当する。
Subsequently, the adsorbed catalyst is activated in the accelerator step (S104).
Subsequently, in the electroless nickel plating step (S105), each non-conductive portion to be plated is subjected to electroless nickel plating in an electroless nickel plating solution in which a reducing agent such as sodium hypophosphite is present. A nickel film as the conductive film 20 is formed on the surfaces of 14a and 14b. In the present embodiment, this electroless nickel plating step corresponds to the electroless plating step according to the present invention.

次に、電解めっき工程(S106〜S111)を施す。
電解めっき工程においては、まず、銅めっき工程(S106)において、基材12の全ての接点18a,18bに対してハンガー(図6(a)参照)の端子が接続され、周知の銅めっき液(図示略)に基材12が浸漬されている状態で、上記ハンガーにより全ての接点18a,18bを介して通電する。これにより、各被めっき部14a,14bの導電性被膜20上に銅被膜32を形成する。
Next, an electrolytic plating process (S106 to S111) is performed.
In the electrolytic plating step, first, in the copper plating step (S106), the terminals of the hangers (see FIG. 6A) are connected to all the contacts 18a, 18b of the substrate 12, and a known copper plating solution ( In a state where the base material 12 is immersed in a not-shown state, the hanger is energized through all the contacts 18a and 18b. Thereby, the copper film 32 is formed on the electroconductive film 20 of each to-be-plated part 14a, 14b.

続いて、半光沢ニッケルめっき工程(S107)において、基材12の全ての接点18a,18bに対してハンガー(図6(a)参照)の端子が接続され、周知の半光沢ニッケルめっき液(図示略)に基材12が浸漬されている状態で、上記ハンガーにより全ての接点18a,18bを介して通電する。これにより、各被めっき部14a,14bの銅被膜32上に半光沢ニッケル被膜34を形成する。   Subsequently, in the semi-bright nickel plating step (S107), the terminals of the hangers (see FIG. 6A) are connected to all the contacts 18a and 18b of the substrate 12, and a known semi-bright nickel plating solution (illustrated) is shown. In the state where the base material 12 is immersed in the abbreviation), the hanger is energized through all the contacts 18a and 18b. As a result, a semi-bright nickel coating 34 is formed on the copper coating 32 of each of the portions to be plated 14a, 14b.

続いて、サテンニッケルめっき工程(S108)において、図3(a)に示すように、基材12の各第1の接点18aに対して第1のハンガー51の端子が接続され、周知のサテンニッケルめっき液(図示略)に基材12が浸漬されている状態で、第1のハンガー51により各第1の接点18aを介して通電する。このとき、第1のハンガー51は、第2の接点18bに接続されていないため、第2の被めっき部14bに対しては通電が遮断されている。これにより、各第1の被めっき部14aの半光沢ニッケル被膜34上にのみサテンニッケル被膜36aを形成する。本実施形態では、このサテンニッケルめっき工程が本発明に係る第1の電解めっき処理に相当する。また、サテンニッケル被膜36aが本発明に係る第1の金属被膜に相当する。   Subsequently, in the satin nickel plating step (S108), as shown in FIG. 3A, the terminal of the first hanger 51 is connected to each first contact 18a of the substrate 12, and the well-known satin nickel. In the state in which the base material 12 is immersed in a plating solution (not shown), the first hanger 51 is energized through each first contact 18a. Since the 1st hanger 51 is not connected to the 2nd contact 18b at this time, electricity supply is interrupted | blocked with respect to the 2nd to-be-plated part 14b. As a result, a satin nickel coating 36a is formed only on the semi-bright nickel coating 34 of each first portion 14a to be plated. In the present embodiment, this satin nickel plating step corresponds to the first electrolytic plating process according to the present invention. The satin nickel coating 36a corresponds to the first metal coating according to the present invention.

続いて、光沢ニッケルめっき工程(S109)において、図3(b)に示すように、基材12の各第2の接点18bに対して第2のハンガー52が接続され、周知の光沢ニッケルめっき液(図示略)に基材12が浸漬されている状態で、第2のハンガー52により各第2の接点18bを介して通電する。このとき、第2のハンガー52は、第1の接点18aに接続されていないため、第1の被めっき部14aに対しては通電が遮断されている。これにより、各第2の被めっき部14bの半光沢ニッケル被膜34上にのみ光沢ニッケル被膜36bを形成する。本実施形態では、この光沢ニッケルめっき工程が本発明に係る第2の電解めっき処理に相当する。また、光沢ニッケル被膜36bが本発明に係る第2の金属被膜に相当する。   Subsequently, in the bright nickel plating step (S109), as shown in FIG. 3B, the second hanger 52 is connected to each second contact 18b of the substrate 12, and a well-known bright nickel plating solution. In a state where the base material 12 is immersed in (not shown), the second hanger 52 is energized through each second contact 18b. At this time, since the second hanger 52 is not connected to the first contact 18a, energization is interrupted with respect to the first plated portion 14a. Thus, the bright nickel coating 36b is formed only on the semi-bright nickel coating 34 of each second plated portion 14b. In the present embodiment, this bright nickel plating step corresponds to the second electrolytic plating treatment according to the present invention. The bright nickel coating 36b corresponds to the second metal coating according to the present invention.

続いて、MPニッケルめっき工程(S110)において、基材12の全ての接点18a,18bに対してハンガー(図6(a)参照)が接続され、周知のMPニッケルめっき液(図示略)に基材12が浸漬されている状態で、上記ハンガーにより全ての接点18a,18bを介して通電する。これにより、第1の被めっき部14aのサテンニッケル被膜36a上にMPニッケル被膜38を形成するとともに、第2の被めっき部14bの光沢ニッケル被膜36b上にMPニッケル被膜38を形成する。   Subsequently, in the MP nickel plating step (S110), hangers (see FIG. 6 (a)) are connected to all the contacts 18a and 18b of the substrate 12, and based on a well-known MP nickel plating solution (not shown). In the state where the material 12 is immersed, the hanger is energized through all the contacts 18a and 18b. Thus, the MP nickel coating 38 is formed on the satin nickel coating 36a of the first plated portion 14a, and the MP nickel coating 38 is formed on the bright nickel coating 36b of the second plated portion 14b.

続いて、3価クロムめっき工程(S111)において、基材12の全ての接点18a,18bに対してハンガー(図6(a)参照)が接続され、周知の3価クロムめっき液(いずれも図示略)に基材12が浸漬されている状態で、上記ハンガーにより全ての接点18a,18bを介して通電する。これにより、各被めっき部14a,14bのMPニッケル被膜38上に3価クロム被膜40を形成する。   Subsequently, in the trivalent chrome plating step (S111), hangers (see FIG. 6A) are connected to all the contacts 18a and 18b of the substrate 12, and a known trivalent chrome plating solution (both shown). In the state where the base material 12 is immersed in the abbreviation), the hanger is energized through all the contacts 18a and 18b. Thereby, the trivalent chromium coating 40 is formed on the MP nickel coating 38 of each of the plated portions 14a and 14b.

その後、周知のクロメート工程を施すことにより、めっき部品10が形成される。
なお、これら各工程の間には、各工程で使用した薬剤が次工程に混入しないように、複数回の洗浄工程が適宜設けられている。
Then, the plating component 10 is formed by performing a well-known chromate process.
In addition, between these processes, the washing | cleaning process of multiple times is provided suitably so that the chemical | medical agent used at each process may not mix in the next process.

以上説明した本実施形態に係るめっき部品の製造方法によれば、以下に示す作用効果が得られるようになる。
(1)めっき部品10の製造方法は、空間を隔てて設けられた複数の被めっき部14a,14bと、複数の被めっき部14a,14b同士を連結する連結部16とを有する非導電性の樹脂成形体である基材12を成形する成形工程を備えるようにした。また、複数の被めっき部14a,14b上に導電性被膜20を形成する無電解めっき工程とを備えるようにした。また、複数の被めっき部14a,14bのうち互いに異なる金属被膜(サテンニッケル被膜36a、光沢ニッケル被膜36b)が形成される予定の被めっき部14a,14bに対して、互いに異なる電解めっき処理を格別に施す電解めっき工程を備えるようにした。
According to the method for manufacturing a plated component according to this embodiment described above, the following effects can be obtained.
(1) The manufacturing method of the plated component 10 is a non-conductive having a plurality of parts to be plated 14a and 14b provided with a space and a connecting part 16 connecting the plurality of parts 14a and 14b to be plated. A molding process for molding the substrate 12 which is a resin molded body is provided. In addition, an electroless plating step of forming the conductive film 20 on the plurality of portions to be plated 14a and 14b is provided. Further, different electroplating processes are applied to the portions 14a and 14b to be formed with different metal coatings (satin nickel coating 36a and bright nickel coating 36b) among the plurality of portions 14a and 14b. The electroplating process to be applied to is provided.

こうした方法によれば、複数の被めっき部14a,14b同士が空間を隔てて設けられることで相互に電気的に絶縁されるため、無電解めっき工程に先立ち絶縁塗料を塗布する工程を省略できる。したがって、互いに異なる金属被膜(サテンニッケル被膜36a、光沢ニッケル被膜36b)が形成された複数の被めっき部14a,14bを有するめっき部品10を容易に製造することができる。   According to such a method, since the plurality of portions to be plated 14a and 14b are provided with a space therebetween, they are electrically insulated from each other, so that the step of applying an insulating coating prior to the electroless plating step can be omitted. Therefore, it is possible to easily manufacture the plated component 10 having the plurality of plated portions 14a and 14b on which different metal films (satin nickel film 36a and bright nickel film 36b) are formed.

(2)電解めっき工程は、第1の被めっき部14aに対して通電する一方、第2の被めっき部14bに対する通電を遮断した状態で、第1の被めっき部14aにサテンニッケル被膜36aを形成する第1の電解めっき処理を備えるようにした。また、第2の被めっき部14bに対して通電する一方、第1の被めっき部14aに対する通電を遮断した状態で、第2の被めっき部14bに光沢ニッケル被膜36bを形成する第2の電解めっき処理を備えるようにした。   (2) In the electrolytic plating step, the first plated portion 14a is energized, while the second plated portion 14b is deenergized with the satin nickel coating 36a applied to the first plated portion 14a. A first electrolytic plating process to be formed is provided. Further, the second electrolysis forms a bright nickel coating 36b on the second plated portion 14b while energizing the second plated portion 14b while cutting off the current to the first plated portion 14a. A plating process was provided.

こうした方法によれば、第1の被めっき部14aにのみサテンニッケル被膜36aを形成する一方、第2の被めっき部14bにのみ光沢ニッケル被膜36bを形成することができる。これにより、サテンニッケル被膜36aが形成されることでサテン調外観を発現する第1の被めっき部14aと、光沢ニッケル被膜36bが形成されることで光沢外観を発現する第2の被めっき部14bとを有するめっき部品10を製造することができる。   According to such a method, the satin nickel coating 36a can be formed only on the first plated portion 14a, while the bright nickel coating 36b can be formed only on the second plated portion 14b. Thus, the first plated portion 14a that develops a satin-like appearance when the satin nickel coating 36a is formed, and the second plated portion 14b that develops a glossy appearance when the bright nickel coating 36b is formed. It is possible to manufacture the plated part 10 having the following.

<第2実施形態>
以下、図5〜図7を参照して、第2実施形態について説明する。
本実施形態のめっき部品110の基材12は、第1実施形態と同一である。なお、本実施形態において、第1実施形態と同一の構成については同一の符号を付すことにより重複する説明を省略する。
Second Embodiment
Hereinafter, a second embodiment will be described with reference to FIGS.
The base material 12 of the plated component 110 of this embodiment is the same as that of the first embodiment. In the present embodiment, the same components as those in the first embodiment are denoted by the same reference numerals, and redundant description is omitted.

図7(a)に示すように、第1の被めっき部14a上には、ニッケルからなる導電性被膜20が形成されている。導電性被膜20上には、複数層の金属被膜からなる第1のめっき被膜60aが積層されている。第1のめっき被膜60aは、導電性被膜20側から順に、銅被膜32、半光沢ニッケル被膜34、光沢ニッケル被膜36b、MPニッケル被膜38、3価クロム被膜40、及びダーク3価クロム被膜42が積層されて形成されている。   As shown in FIG. 7A, a conductive film 20 made of nickel is formed on the first plated portion 14a. On the conductive film 20, a first plating film 60a made of a plurality of layers of metal films is laminated. The first plating film 60a includes a copper film 32, a semi-bright nickel film 34, a bright nickel film 36b, an MP nickel film 38, a trivalent chromium film 40, and a dark trivalent chromium film 42 in order from the conductive film 20 side. It is formed by stacking.

図7(b)に示すように、第2の被めっき部14b上には、ニッケルからなる導電性被膜20が形成されている。導電性被膜20上には、複数層の金属被膜からなるとともに、第1のめっき被膜60aとは層構成の異なる第2のめっき被膜60bが積層されている。第2のめっき被膜60bは、導電性被膜20側から順に、銅被膜32、半光沢ニッケル被膜34、光沢ニッケル被膜36b、MPニッケル被膜38、及び3価クロム被膜40が積層されて形成されている。   As shown in FIG. 7B, a conductive film 20 made of nickel is formed on the second plated portion 14b. On the conductive coating 20, a second plating coating 60b made of a plurality of metal coatings and having a layer configuration different from that of the first plating coating 60a is laminated. The second plating film 60b is formed by laminating a copper film 32, a semi-bright nickel film 34, a bright nickel film 36b, an MP nickel film 38, and a trivalent chromium film 40 in this order from the conductive film 20 side. .

すなわち、第1のめっき被膜60aでは、3価クロム被膜40及びダーク3価クロム被膜42の双方が設けられているのに対して、第2のめっき被膜60bでは、3価クロム被膜40のみが設けられている。   That is, in the first plating film 60a, both the trivalent chromium film 40 and the dark trivalent chromium film 42 are provided, whereas in the second plating film 60b, only the trivalent chromium film 40 is provided. It has been.

次に、本実施形態のめっき部品110を製造する手順について説明する。
図5に示すように、基材12に対して電解めっき工程を施すに先立ち、第1実施形態と同一の前処理工程(S101〜S105)を施す。
Next, a procedure for manufacturing the plated component 110 of the present embodiment will be described.
As shown in FIG. 5, the same pretreatment process (S101 to S105) as that in the first embodiment is performed before the electrolytic plating process is performed on the substrate 12.

次に、電解めっき工程(S106,S107,S109a,S110,S111)を施す。
まずは、第1実施形態と同一の方法にて、銅めっき工程(S106)及び半光沢ニッケルめっき工程(S107)を行う。
Next, an electrolytic plating process (S106, S107, S109a, S110, S111) is performed.
First, the copper plating step (S106) and the semi-bright nickel plating step (S107) are performed by the same method as in the first embodiment.

続いて、光沢ニッケルめっき工程(S109a)において、基材12の全ての接点18a,18bに対してハンガー(図6(a)参照)が接続され、周知の光沢ニッケルめっき液(図示略)に基材12が浸漬されている状態で、上記ハンガーにより全ての接点18a,18bを介して通電する。これにより、各被めっき部14a,14bの半光沢ニッケル被膜34上に光沢ニッケル被膜36bを形成する。   Subsequently, in the bright nickel plating step (S109a), hangers (see FIG. 6 (a)) are connected to all the contacts 18a and 18b of the substrate 12, and based on a well-known bright nickel plating solution (not shown). In the state where the material 12 is immersed, the hanger is energized through all the contacts 18a and 18b. Thereby, the bright nickel coating 36b is formed on the semi-bright nickel coating 34 of each of the plated portions 14a and 14b.

続いて、第1実施形態と同一の方法にて、MPニッケルめっき工程(S110)を行う。
続いて、第1実施形態と同一の方法にて、3価クロムめっき工程(S111)を行う。すなわち、図6(a)に示すように、基材12の全ての接点18a,18bに対して第3のハンガー53が接続され、周知の3価クロムめっき液(図示略)に基材12が浸漬されている状態で、第3のハンガー53により全ての接点18a,18bを介して通電する。これにより、各被めっき部14a,14bのMPニッケル被膜38上に3価クロム被膜40を形成する。本実施形態では、この3価クロムめっき工程が本発明に係る第1の電解めっき処理に相当する。また、3価クロム被膜40が本発明に係る第1の金属被膜に相当する。
Subsequently, the MP nickel plating step (S110) is performed by the same method as in the first embodiment.
Subsequently, a trivalent chromium plating step (S111) is performed by the same method as in the first embodiment. That is, as shown in FIG. 6A, the third hanger 53 is connected to all the contacts 18a, 18b of the substrate 12, and the substrate 12 is attached to a known trivalent chromium plating solution (not shown). In the immersed state, the third hanger 53 is energized through all the contacts 18a, 18b. Thereby, the trivalent chromium coating 40 is formed on the MP nickel coating 38 of each of the plated portions 14a and 14b. In the present embodiment, this trivalent chromium plating step corresponds to the first electrolytic plating treatment according to the present invention. The trivalent chromium film 40 corresponds to the first metal film according to the present invention.

続いて、ダーク3価クロムめっき工程(S112)において、図6(b)に示すように、基材12の各第1の接点18aに対して第1のハンガー51が接続され、周知のダーク3価クロムめっき液(図示略)に基材12が浸漬されている状態で、第1のハンガー51により各第1の接点18aを介して通電する。ダーク3価クロムめっき液は、3価クロムめっき液にチオシアン酸塩等の化合物が添加されたものである。このとき、第1のハンガー51は、第2の接点18bに接続されていないため、第2の被めっき部14bに対しては通電が遮断されている。これにより、各第1の被めっき部14aの3価クロム被膜40上にのみダーク3価クロム被膜42を形成する。本実施形態において、このダーク3価クロムめっき工程が本発明に係る第2の電解めっき処理に相当する。また、ダーク3価クロム被膜42が第2の金属被膜に相当する。   Subsequently, in the dark trivalent chromium plating step (S112), as shown in FIG. 6B, the first hanger 51 is connected to each first contact 18a of the substrate 12, and the known dark 3 In the state in which the base 12 is immersed in a valent chromium plating solution (not shown), the first hanger 51 is energized through each first contact 18a. The dark trivalent chromium plating solution is obtained by adding a compound such as thiocyanate to the trivalent chromium plating solution. Since the 1st hanger 51 is not connected to the 2nd contact 18b at this time, electricity supply is interrupted | blocked with respect to the 2nd to-be-plated part 14b. As a result, the dark trivalent chromium coating 42 is formed only on the trivalent chromium coating 40 of each first plated portion 14a. In the present embodiment, this dark trivalent chromium plating step corresponds to the second electrolytic plating process according to the present invention. Further, the dark trivalent chromium film 42 corresponds to the second metal film.

その後、周知のクロメート工程を施すことにより、めっき部品110が形成される。
なお、これら各工程の間には、各工程で使用した薬剤が次工程に混入しないように、複数回の洗浄工程が適宜設けられている。
Then, the plating component 110 is formed by performing a well-known chromate process.
In addition, between these processes, the washing | cleaning process of multiple times is provided suitably so that the chemical | medical agent used at each process may not mix in the next process.

以上説明した本実施形態に係るめっき部品の製造方法によれば、以下に示す作用効果が得られるようになる。
(3)電解めっき工程は、複数の被めっき部14a,14bの全てに対して通電した状態で、複数の被めっき部14a,14bの全てに3価クロム被膜40を形成する第1の電解めっき処理を備えるようにした。また、第1の被めっき部14aに対して通電した状態で、第1の被めっき部14aにダーク3価クロム被膜42を形成する第2の電解めっき処理を備えるようにした。
According to the method for manufacturing a plated component according to this embodiment described above, the following effects can be obtained.
(3) The electrolytic plating step is a first electrolytic plating in which the trivalent chromium coating 40 is formed on all of the plurality of to-be-plated parts 14a and 14b in a state where all of the to-be-plated parts 14a and 14b are energized. A process was prepared. In addition, a second electrolytic plating process for forming a dark trivalent chromium coating 42 on the first plated portion 14a in a state where current is supplied to the first plated portion 14a is provided.

こうした方法によれば、まずは、複数の被めっき部14a,14bの全てに対して3価クロム被膜40が形成される。続いて、第1の被めっき部14aのみに対してダーク3価クロム被膜42が形成される。これにより、3価クロム被膜40が形成されることで白色光沢外観を発現する第2の被めっき部14bと、3価クロム被膜40上にダーク3価クロム被膜42が形成されることで黒色光沢外観を発現する第1の被めっき部14aとを有するめっき部品10を製造することができる。   According to such a method, first, the trivalent chromium coating 40 is formed on all of the plurality of portions to be plated 14a, 14b. Subsequently, a dark trivalent chromium coating 42 is formed only on the first portion 14a to be plated. As a result, the formation of the trivalent chromium coating 40 forms the second plated portion 14b that exhibits a white glossy appearance, and the formation of the dark trivalent chromium coating 42 on the trivalent chromium coating 40 results in black gloss. The plated component 10 having the first portion 14a to be plated that exhibits an appearance can be manufactured.

<変形例>
なお、上記実施形態は、例えば以下のように変更することもできる。
・例えば第2実施形態において、3価クロムめっき工程(S111)を行った後に、全ての第2の接点18bを切除するようにしてもよい。この場合、その後のダーク3価クロムめっき工程(S112)においても、第3のハンガー53を引き続き用いることができる。このため、ハンガーを交換する手間を省略することができる。
<Modification>
In addition, the said embodiment can also be changed as follows, for example.
For example, in the second embodiment, after the trivalent chromium plating step (S111) is performed, all the second contacts 18b may be removed. In this case, the third hanger 53 can be continuously used in the subsequent dark trivalent chromium plating step (S112). For this reason, the trouble of replacing the hanger can be omitted.

・本発明に係るめっき部品は、自動車のラジエータグリルに限定されるものではなく、バックパネルやフォグカバーなどの他の外装品としてめっき部品を具体化することもできる。また、内装品や、車両用装飾品に対して本発明を適用することもできる。   -The plating component which concerns on this invention is not limited to the radiator grille of a motor vehicle, A plating component can also be actualized as other exterior goods, such as a back panel and a fog cover. Further, the present invention can also be applied to interior parts and vehicle decorations.

10…めっき部品、12…基材、14a,14b…被めっき部、16…連結部、18a,18b…接点、20…導電性被膜、30a,30b…めっき被膜、32…銅被膜、34…半光沢ニッケル被膜、36a…サテンニッケル被膜、36b…光沢ニッケル被膜、38…MPニッケル被膜、40…3価クロム被膜、42…ダーク3価クロム被膜、51…第1のハンガー、52…第2のハンガー、53…第3のハンガー、60a,60b…めっき被膜。   DESCRIPTION OF SYMBOLS 10 ... Plating part, 12 ... Base material, 14a, 14b ... Plated part, 16 ... Connection part, 18a, 18b ... Contact, 20 ... Conductive film, 30a, 30b ... Plating film, 32 ... Copper film, 34 ... Half Bright nickel coating, 36a ... satin nickel coating, 36b ... bright nickel coating, 38 ... MP nickel coating, 40 ... trivalent chromium coating, 42 ... dark trivalent chromium coating, 51 ... first hanger, 52 ... second hanger 53 ... 3rd hanger, 60a, 60b ... plating film.

Claims (3)

空間を隔てて設けられた複数の被めっき部と、前記複数の被めっき部同士を連結する連結部とを有する非導電性の樹脂成形体である基材を成形する成形工程と、
前記複数の被めっき部上に導電性被膜を形成することにより導電性を付与する無電解めっき工程と、
前記複数の被めっき部のうち互いに異なる金属被膜が形成される予定の被めっき部に対して、互いに異なる電解めっき処理を格別に施す電解めっき工程と、を備える、
めっき部品の製造方法。
A molding step of molding a substrate that is a non-conductive resin molded body having a plurality of plated parts provided with a space therebetween and a connecting part that connects the plurality of plated parts,
An electroless plating step of imparting conductivity by forming a conductive film on the plurality of portions to be plated;
An electroplating step for performing a different electroplating process on a portion to be plated on which a different metal film is to be formed among the plurality of portions to be plated.
Manufacturing method of plated parts.
前記電解めっき工程は、
前記複数の被めっき部のうち第1の被めっき部に対して通電する一方、その他全ての被めっき部に対する通電を遮断した状態で、前記第1の被めっき部に第1の金属被膜を形成する第1の電解めっき処理と、
前記複数の被めっき部のうち前記第1の被めっき部とは異なる第2の被めっき部に対して通電する一方、その他全ての被めっき部に対する通電を遮断した状態で、前記第2の被めっき部に第2の金属被膜を形成する第2の電解めっき処理と、を含む、
請求項1に記載のめっき部品の製造方法。
The electrolytic plating step is
A first metal film is formed on the first plated portion in a state where the first plated portion among the plurality of plated portions is energized while the energization is interrupted for all other plated portions. First electrolytic plating treatment to
While energizing a second plated part different from the first plated part among the plurality of plated parts, the second coated part is cut off from energizing all other plated parts. A second electrolytic plating process for forming a second metal film on the plating part,
The manufacturing method of the plating component of Claim 1.
前記電解めっき工程は、
前記複数の被めっき部の全てに対して通電した状態で、前記複数の被めっき部の全てに第1の金属被膜を形成する第1の電解めっき処理と、
前記複数の被めっき部のうちの第1の被めっき部に対して通電した状態で、前記第1の被めっき部に前記第1の金属被膜とは異なる第2の金属被膜を形成する第2の電解めっき処理と、を含む、
請求項1に記載のめっき部品の製造方法。
The electrolytic plating step is
A first electroplating process for forming a first metal film on all of the plurality of portions to be plated in a state where all of the portions to be plated are energized;
A second metal film different from the first metal film is formed on the first plated part in a state where the first plated part among the plurality of plated parts is energized. An electroplating process of
The manufacturing method of the plating component of Claim 1.
JP2017147007A 2017-07-28 2017-07-28 Production method of plating component Pending JP2019026889A (en)

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