JP2018533035A - フレキソ刷版におけるハイブリッド印刷ドットの作製方法 - Google Patents
フレキソ刷版におけるハイブリッド印刷ドットの作製方法 Download PDFInfo
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- JP2018533035A JP2018533035A JP2018507724A JP2018507724A JP2018533035A JP 2018533035 A JP2018533035 A JP 2018533035A JP 2018507724 A JP2018507724 A JP 2018507724A JP 2018507724 A JP2018507724 A JP 2018507724A JP 2018533035 A JP2018533035 A JP 2018533035A
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- MHCLJIVVJQQNKQ-UHFFFAOYSA-N ethyl carbamate;2-methylprop-2-enoic acid Chemical compound CCOC(N)=O.CC(=C)C(O)=O MHCLJIVVJQQNKQ-UHFFFAOYSA-N 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
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- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
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- 239000011087 paperboard Substances 0.000 description 1
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- 229940057847 polyethylene glycol 600 Drugs 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
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- 239000005060 rubber Substances 0.000 description 1
- RBYJOOWYRXEJAM-UHFFFAOYSA-M sodium;5,9-dianilino-7-phenylbenzo[a]phenazin-7-ium-4,10-disulfonate Chemical compound [Na+].C=1C=CC=CC=1[N+]1=C2C=C(NC=3C=CC=CC=3)C(S(=O)(=O)[O-])=CC2=NC(C2=CC=CC(=C22)S([O-])(=O)=O)=C1C=C2NC1=CC=CC=C1 RBYJOOWYRXEJAM-UHFFFAOYSA-M 0.000 description 1
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- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Printing Plates And Materials Therefor (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
【選択図】図1
Description
1)デジタル「コンピューター・トゥ・プレート」刷版におけるマスクアブレーション又は従来のアナログ版におけるネガ作製であることができる画像形成;
2)光硬化性層にフロア層を作製してレリーフの深さを確立する背面露光;
3)マスクで覆われていない光硬化性層の部分を選択的に架橋及び硬化させてレリーフ像を作製するための、マスク(又はネガ)を通した前面(face)露光;
4)溶剤(水を含む)又は熱現像によって未露光フォトポリマーを除去するための現像;及び
5)必要に応じて、後露光及び粘着除去(detackification)、
を含む。
a)光硬化性印刷ブランクを準備する工程であって、前記光硬化性印刷ブランクが、
i)バッキング層と;
ii)前記バッキング層の上に配置される1つ以上の光硬化性層とを含み、前記1つ以上の光硬化性層が、
1)バインダーと;
2)1つ以上のモノマーと;
3)光開始剤と;
4)ブチル化ヒドロキシトルエン;ペンタエリスリトールテトラキス(3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロピオネート);オクタデシル3,5ジ−(tert)−ブチル−4−ヒドロキシヒドロシンナメート;ペンタエリスリトールテトラキス(3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロピオネート);オクタデシル(oxtadecyl)−3(3,5−ジ−tert.ブチル−4−ヒドロキシフェニル)−プロピオネート;エチレンビス(オキシエチレン)ビス−(3−(5−tert−ブチル−4−ヒドロキシ−m−トリル−プロピオネート;N,N’−ヘキサン−1,6−ジイルビス(3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニルプロピオンアミド);ベンゼンプロパン酸;3,5−ビス(1,1−ジメチル−エチル)−4−ヒドロキシ−C7−C9分岐アルキルエステル;2−(3−tert−ブチル−2−ヒドロキシ−5−メチルフェニル)−5−クロロ−2H−ベンゾトリアゾール;2−(2−ヒドロキシ−3,5−ジペリル(diperyl)−フェニル)ベンゾトリアゾール、及び前述の組合せからなる群から選択される約0.01〜約2.0重量パーセントの材料と、
を含む光硬化性組成物を含む工程と;
b)前記1つ以上の光硬化性層を化学線に選択的に画像化し、前記1つ以上の光硬化性層の部分を選択的に架橋及び硬化する工程と;
c)前記1つ以上の光硬化性層を現像し、前記1つ以上の光硬化性層の未硬化部分を除去すると共に、その中に複数のレリーフ印刷ドットを含むレリーフ像を露呈させる工程と、
を含み、
前記レリーフ印刷ドットが、ラウンド(rounded)トップを有するドットとフラットトップを有するドットと、を含む。
a)光硬化性印刷ブランクを準備する工程であって、前記光硬化性印刷ブランクが、
i)バッキング層と;
ii)前記バッキング層の上に配置される1つ以上の光硬化性層とを含み、前記1つ以上の光硬化性層が、
1)バインダーと;
2)1つ以上のモノマーと;
3)光開始剤と;
4)ブチル化ヒドロキシトルエン;ペンタエリスリトールテトラキス(3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロピオネート);オクタデシル3,5ジ−(tert)−ブチル−4−ヒドロキシヒドロシンナメート;ペンタエリスリトールテトラキス(3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロピオネート);オクタデシル(oxtadecyl)−3(3,5−ジ−tert.ブチル−4−ヒドロキシフェニル)−プロピオネート;エチレンビス(オキシエチレン)ビス−(3−(5−tert−ブチル−4−ヒドロキシ−m−トリル−プロピオネート;N,N’−ヘキサン−1,6−ジイルビス(3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニルプロピオンアミド);ベンゼンプロパン酸;3,5−ビス(1,1−ジメチル−エチル)−4−ヒドロキシ−C7−C9分岐アルキルエステル;2−(3−tert−ブチル−2−ヒドロキシ−5−メチルフェニル)−5−クロロ−2H−ベンゾトリアゾール;2−(2−ヒドロキシ−3,5−ジペリル(diperyl)−フェニル)ベンゾトリアゾール、及び前述の組合せからなる群から選択される約0.01〜約2.0重量パーセントの材料と、
を含む光硬化性組成物を含む工程と;
b)前記1つ以上の光硬化性層を化学線に選択的に画像化し、前記1つ以上の光硬化性層の部分を選択的に架橋及び硬化する工程と;
c)前記1つ以上の光硬化性層を現像し、前記1つ以上の光硬化性層の未硬化部分を除去すると共に、その中に複数のレリーフ印刷ドットを含むレリーフ像を露呈させる工程と、
を含み、
前記レリーフ印刷ドットが、ラウンドトップを有するドットとフラットトップを有するドットと、を含む。
Claims (10)
- 光硬化性印刷ブランクからレリーフ像印刷要素を製造する方法であって、前記方法が、
a)光硬化性印刷ブランクを準備する工程であって、前記光硬化性印刷ブランクが、
i)バッキング又はサポート層と;
ii)前記バッキング又はサポート層の上に配置される1つ以上の光硬化性層とを含み、前記1つ以上の光硬化性層が、
1)バインダーと;
2)1つ以上のモノマーと;
3)光開始剤と;
4)ブチル化ヒドロキシトルエン;ペンタエリスリトールテトラキス(3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロピオネート);オクタデシル3,5ジ−(tert)−ブチル−4−ヒドロキシヒドロシンナメート;ペンタエリスリトールテトラキス(3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロピオネート);オクタデシル(oxtadecyl)−3(3,5−ジ−tert.ブチル−4−ヒドロキシフェニル)−プロピオネート;エチレンビス(オキシエチレン)ビス−(3−(5−tert−ブチル−4−ヒドロキシ−m−トリル−プロピオネート;N,N’−ヘキサン−1,6−ジイルビス(3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニルプロピオンアミド);ベンゼンプロパン酸;3,5−ビス(1,1−ジメチル−エチル)−4−ヒドロキシ−C7−C9分岐アルキルエステル;2−(3−tert−ブチル−2−ヒドロキシ−5−メチルフェニル)−5−クロロ−2H−ベンゾトリアゾール;2−(2−ヒドロキシ−3,5−ジペリル(diperyl)−フェニル)ベンゾトリアゾール、及び前述の組合せからなる群から選択される約0.01〜約2.0重量パーセントの添加剤と、
を含む光硬化性組成物を含む工程と;
b)前記1つ以上の光硬化性層を化学線に露光し、前記1つ以上の光硬化性層の部分を選択的に架橋及び硬化することで、前記1つ以上の光硬化性層を選択的に画像化する工程と;
c)前記1つ以上の光硬化性層を現像し、前記1つ以上の光硬化性層の未硬化部分を除去すると共に、その中に複数のレリーフ印刷ドットを含むレリーフ像を露呈させる工程と、
を含み、
前記レリーフ印刷ドットが、ラウンド(rounded)トップを有するレリーフ印刷ドットとフラットトップを有するレリーフ印刷ドットと、を含むことを特徴とする方法。 - 前記光硬化性組成物の組成物の全重量に対して、前記添加剤が、約0.05%〜約0.20重量%の濃度で、前記1つ以上の光硬化性層中に存在する請求項1に記載の方法。
- 前記添加剤が、ブチル化ヒドロキシトルエンである請求項1に記載の方法。
- サイズ約1%未満の印刷ドットがラウンドトップ(round top)を示す請求項1に記載の方法。
- 前記ラウンドトップ印刷ドットが、前記レリーフ像印刷要素上の前記フラットトップドットの高さの約98%未満である高さを有する請求項1に記載の方法。
- 前記ラウンドトップ印刷ドットが、前記レリーフ像印刷要素上の前記フラットトップドットの高さの約95%未満である高さを有する請求項7に記載の方法。
- 前記ラウンドトップ印刷ドットが、前記レリーフ像印刷要素上の前記フラットトップドットの高さの約90%未満である高さを有する請求項8に記載の方法。
- 前記現像工程が、溶媒現像を含む請求項1に記載の方法。
- 前記現像工程が、熱現像を含む請求項1に記載の方法。
- 印刷ドットの上面が前記印刷ドットのショルダーと交差する点で、前記フラットトップ印刷ドットが、良好なエッジの鮮明度を有する請求項1に記載の方法。
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US14/829,163 | 2015-08-18 | ||
PCT/US2016/047119 WO2017031094A1 (en) | 2015-08-18 | 2016-08-16 | Method of creating hybrid printing dots in a flexographic printing plate |
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