JP2018509281A - Atomizing apparatus and fluid processing equipment using the same - Google Patents

Abstract

The present invention provides a storage tank in which a liquid-phase fluid is accommodated, and is inserted into the storage tank so that the insertion end of the tube is located in the storage tank, and supplies gas into the storage tank. The gas supply pipe in which the gas is discharged during operation is provided separately from the end of the gas supply pipe and the gas supply pipe, and the gas supply pipe is immersed in the fluid during operation of the atomizing device. There is provided an atomizing device including an atomizing module including a collision member that causes gas flowing out from a pipe to collide with a lower surface and atomize the gas in a liquid phase fluid. Therefore, since the cylindrical storage tank and the tubular gas supply pipe are used, the manufacturing cost can be reduced, thereby reducing the manufacturing cost and improving the economic efficiency.

Description

  The present invention relates to an atomizing apparatus and a fluid treatment facility using the same, and more particularly, has a simple structure, reduces manufacturing costs, is economical, and is aerated, degassed, oxidized, reduced, The present invention relates to an atomizing apparatus capable of performing various fluid treatments such as neutralization and dust treatment, and a fluid treatment facility using the atomizing device.

  In general, in industrial boilers and incinerators that use waste oil, which is an environmental pollutant including various fuels, and various types of garbage as heat sources, or incinerate, many toxic gases and soot and various types of gases are generated during combustion or incineration. In order to greatly accelerate air pollution, such exhaust gas and soot smoke not only destroy ecosystems but also infringe on various fields of human life.

  In order to prevent air pollution, a separate filtration device is installed in various boilers and incinerators, or a cyclone is installed to filter and collect various soot and dust generated during combustion or incineration. However, while such filtration devices and cyclones can filter relatively large foreign objects, they can effectively collect various types of harmful gases that are vaporized including smoke that is slightly smaller in particle size. It was impossible and could not be effective. Thus, conventionally, a method for collecting harmful gas and the like using an atomizing module that can collect harmful gas after miniaturization has been developed.

  By the way, the conventional atomizing apparatus has a problem that since the manufacturing cost is high, the manufacturing cost becomes high and the economy is lowered.

  On the other hand, in general, fluid treatment methods are performed using methods such as aeration, deaeration, oxidation, reduction, neutralization, and dust treatment depending on the type and purpose of treatment water. The method is performed using a reaction between gas and liquid or solid and liquid, or liquid and liquid.

  For example, in the case of an aeration apparatus in which aerobic microorganisms and oxygen are supplied into treated water containing organic substances so that organic substances are decomposed by microorganisms, in order to accelerate the decomposition of organic substances by microorganisms, In the case of a degassing device, oxygen in the wastewater containing high concentrations of ammonia or volatile organic substances is dissolved by the need to adjust the concentration of oxygen in the air. In the case of a foul odor treatment facility that uses oxidation, reduction, and neutralization reactions, ammonia, or volatile organic substances are degassed and removed, and an oxidizing agent, a reducing agent, and a neutralizing agent are added to the treated water. Each of the malodorous substances is removed by making it react well with the malodorous substances, and in the case of a dust treatment apparatus, the dust is adsorbed and removed using water.

  By the way, the conventional fluid processing equipment using the above method has an appropriate reaction efficiency corresponding to each purpose. However, in the actual site, the reaction efficiency is low. There was a real problem that had adverse effects such as an increase in power costs. For example, in the case of an existing aeration apparatus, although the high pressure compressed air or oxygen is directly injected into the liquid phase, the solubility of oxygen is low. Even in the case of malodor treatment equipment and dust treatment equipment using oxidation, reduction and neutralization reactions, the reactivity is low and the overall performance and efficiency are low. It was.

  In addition, the conventional fluid processing equipment has low reaction efficiency for various reasons as described above, and the performance and efficiency decrease thereby, the blast flow for supplying more chemicals or supplying oxygen than necessary to meet the processing target. As a result of the increase, maintenance costs such as chemical processing costs, equipment costs, and electric charges increase, processing time increases, and productivity decreases.

  The present invention can reduce the manufacturing cost and reduce the manufacturing cost, thereby improving the economic efficiency, as well as improving the contact area and contact time between the gas and the liquid, and various fluid processing steps. The reaction efficiency is increased in accordance with the above, and the reaction between the liquid and the liquid is atomized and promoted through the stirring action of the generated liquid, thereby increasing the contact area between the liquid and the gas. Providing low-cost and high-efficiency atomizing equipment and fluid treatment equipment using it, not only can improve the reaction performance, but also have a simple structure and reduce maintenance costs including equipment costs and electricity charges. The purpose is to do.

  According to a first aspect of the present invention, the present invention provides an atomizing apparatus, wherein the tubular insertion end is positioned in the atomizing chamber in which a liquid-phase fluid is accommodated. A gas supply pipe that is inserted and supplies gas into the atomizing chamber, and an end from which the gas is discharged when the atomizing device is operated is immersed in the fluid; and an end of the gas supply pipe Fixed to the gas supply pipe at a distance from the part, immersed in the fluid when the atomizing device is operated, and collided with the gas flowing out of the gas supply pipe, in the liquid phase fluid There is provided an atomizing device including an atomizing module including a collision member for atomizing the gas.

  According to the second aspect of the present invention, in the present invention, a gas outflow port is formed in a cylindrical upper portion, an inside is an atomizing chamber that accommodates a liquid phase fluid, and an insertion end is formed in a cylindrical tube. An end portion, which is inserted into the atomizing chamber so as to be located in the atomizing chamber, supplies gas into the atomizing chamber, and the gas is discharged when the atomizing apparatus is operated, A gas supply pipe immersed in the disk, and spaced apart from the end of the gas supply pipe in a disc shape, and immersed in the fluid when the atomizing device is in operation and arranged in a lateral direction. A first collision plate for causing the gas flowing out from the gas supply pipe to collide with the lower surface, and a disk-like shape having a larger diameter than the first collision plate, and spaced apart from the upper part of the first collision plate A second collision plate disposed in a lateral direction and spreading on the side surface of the first collision plate and flowing upward in the upper direction to collide with the lower surface and diffuse to the side surface. There is provided an atomizing device including a collision member for atomizing in the liquid phase fluid.

  According to the third aspect of the present invention, in the present invention, an inlet through which a gas flows is formed, a storage space for storing a liquid is provided therein, and the gas flowing into the upper part is discharged. An atomizing chamber having an outlet formed therein and a tubular insertion end inserted into the atomizing chamber so as to be positioned in the atomizing chamber, supplying gas into the atomizing chamber, and the atomizing When the apparatus is operated, an end from which the gas is discharged is provided separately from a gas supply pipe immersed in the fluid and an end of the gas supply pipe, and when the atomizing apparatus is operated, A collision member that is immersed in a fluid and causes the gas flowing out from the gas supply pipe to collide with a lower surface to cause atomization in the liquid-phase fluid. A fluid separator that is in communication with the atomizing chamber and receives the liquid in the storage space and the floating substance existing on the water surface of the liquid, and separates the liquid and the floating substance, respectively. One or more storage tanks that are connected to the fluid separator and receive and store the liquid separated by the fluid separator, one end of which is in communication with the storage tank, and the other end is A circulation supply line connected to the upper portion of the atomizing chamber to circulate and supply the liquid in the storage tank to the upper portion of the storage space, and provided on the circulation supply line. Provided is a fluid treatment facility including a circulation pump forcibly flowing and a flow rate adjusting valve provided on the circulation supply line for adjusting the flow rate of the flowing liquid.

The atomizing apparatus according to the present invention and the fluid processing facility using the same provide the following effects.
First, since a cylindrical atomizing chamber and a tubular gas supply pipe are used, the structure is simple and the manufacturing cost is reduced, thereby reducing the manufacturing cost and improving the economy. Can be made.
Second, using a cylindrical atomizing chamber and a cylindrical tubular gas supply pipe, the handling is easy, the workability is excellent, and the production is easy.
Thirdly, by reducing the gas flowing in through the collision member in the liquid, not only improving the contact area and contact time between the gas and the liquid, but also increasing the flow time of the gas in the liquid, By increasing the gas-liquid contact efficiency, it is possible to increase the reaction efficiency so as to meet each fluid processing step required by various fluid processing facilities.
Fourth, during the reaction between the liquid and the liquid, the reaction is promoted by using the stirring action of the liquid generated by miniaturization, and by increasing the contact area between the liquid and the gas, when applied as an aeration apparatus, Aeration performance can be improved.
Fifth, in the atomizing chamber, the main space is made finer through the venturi module, and in the subspace, the gas is made finer in the liquid through the atomizing device. It can be applied to various fluid processing devices such as gas removal equipment, malodor removal equipment, deaeration equipment, aeration equipment, and dust treatment equipment, and its application range is wide.
Sixth, the floating material can be separated and removed from the liquid through a fluid separator to improve the fluid processing performance.
Seventh, the eliminator is arranged so as to intersect in multiple stages, and the mist collecting effect is improved by causing the gas passing between them to collide with each other and aggregating the mist, as well as collecting mist on the surface, Contamination of the pump disposed on the rear side can be prevented.

It is a perspective view which shows the atomizing apparatus by embodiment of this invention. It is sectional drawing which shows the gas supply pipe and collision member of FIG. It is sectional drawing which shows the flow of gas at the time of the action | operation of the atomizing apparatus of FIG. It is a perspective view which shows other embodiment of the atomizing module of FIG. It is sectional drawing which shows other embodiment of the atomizing module of FIG. It is a front sectional view which shows other embodiment of the atomizing chamber of FIG. It is sectional drawing which shows other embodiment of the atomizing module of FIG. FIG. 6 is a front sectional view showing still another embodiment of the atomizing module of FIG. 1. It is a top view of the atomizing module of FIG. FIG. 6 is a front sectional view showing still another embodiment of the atomizing module of FIG. 1. It is a top view of the atomizing module of FIG. It is sectional drawing which shows other embodiment of the atomizing apparatus of FIG. It is sectional drawing which shows other embodiment of the mixing discharge part and gas supply pipe | tube of FIG. It is a block diagram which shows the structure of the fluid processing equipment using the atomizing apparatus by embodiment of this invention. It is a front sectional view which expands and shows the water level adjustment part of FIG. FIG. 15 is a front sectional view showing the configuration of the eliminator of FIG. 14 and the flow of fluid. It is a block diagram which shows the operating state of the fluid processing installation of FIG.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.
First, referring to FIG. 1, an atomizing apparatus 400 according to an embodiment of the present invention includes a storage tank 100 and an atomizing module 410.

  In the storage tank 100, a liquid-phase fluid is stored in an internal storage space, and a gas outlet 103 is formed in the upper part. Here, the storage tank 100 is a cylindrical tube that is easy to handle and easy to manufacture, and has a structure that can reduce the manufacturing cost and improve the economic efficiency.

  On the other hand, the storage tank 100 shows only the gas outlet 103 indicating the inflow and outflow of the gas in the drawing. However, although not shown, the storage tank 100 has a liquid-phase fluid supply port for supplying the liquid-phase fluid and a fluid discharge port for discharging the liquid-phase fluid below. Needless to say, each can be formed.

  The atomizing module 410 includes a gas supply pipe 200 and a collision member 300. The gas supply pipe 200 serves to supply gas into the storage tank 100. The gas supply pipe 200 has the same pipe diameter. In detail, the gas supply pipe 200 is inserted in a side surface of the storage tank 100 and bent upward in the storage tank 100 so that an insertion end portion thereof is located in the storage tank 100 in a tubular shape. . Here, an end portion of the gas supply pipe 200 from which the gas is discharged is positioned so as to be immersed in the liquid phase fluid when the atomizing device 400 is operated.

  The gas supply pipe 200 is formed of a cylindrical pipe, so that a general pipe that is easy to handle can be applied as it is. Therefore, the gas supply pipe 200 is not only easy to manufacture, unlike the existing welding using a steel plate, but also provides an effect that is easy to handle and can reduce the manufacturing cost. , Can improve economy.

  Meanwhile, the atomizing apparatus 400 supplies the gas supplied to the gas supply pipe 200 as compressed air, or forms the inside of the storage tank 100 with a negative (−) pressure structure, A gas may flow into the gas supply pipe 200.

  Referring to FIGS. 2 and 3, the collision member 300 is provided apart from an end of the gas supply pipe 200, and the gas supply pipe from which the gas is discharged when the atomizing device 400 is operated. An end portion of 200 is immersed in the fluid, and plays a role of causing the gas flowing out from the gas supply pipe 200 to collide with the lower surface and atomize in the liquid phase fluid.

The collision member 300 has a multistage structure and includes a first collision plate 310 and a second collision plate 320. The first collision plate 310 is spaced apart from the insertion end of the gas supply pipe 200 and is coupled to the gas supply pipe 200 by the first coupling member 312 and the position thereof is fixed.
The first coupling member 312 is columnarly spaced apart along the insertion end of the gas supply pipe 200, one end is coupled to the insertion end of the gas supply pipe 200, and the other end is The first collision plate 310 is coupled to an outer peripheral side surface or a lower surface.
The first collision plate 310 is disposed in a direction transverse to the outflow direction of the gas flowing out from the gas supply pipe 200 so that the gas flowing out from the gas supply pipe 200 collides with the lower surface. ing.
The second collision plate 320 is spaced apart from the upper part of the first collision plate 310 and is coupled to the first collision plate 310 by a second coupling member 322 so that its position is fixed.
The second coupling members 322 are columnarly spaced apart from each other on the upper surface of the first collision plate 310, one end is coupled to the upper surface of the first collision plate 310, and the other end is coupled to the second collision plate 310. It is coupled to the lower surface of the collision plate 320.
The second collision plate 320 is disposed in the lateral direction, spreads on the side surface of the first collision plate 310, and flows out in the upper direction to collide with the lower surface and diffuse to the side surface.

  Here, the first collision plate 310 and the second collision plate 320 are formed in a disk shape with a larger diameter than the first collision plate 310, and are arranged coaxially. The gas spreading on the side surface of the first collision plate 310 collides with the lower surface and diffuses to the side surface.

  On the other hand, in the drawing, the first collision plate 310 and the second collision plate 320 are each formed in a disc shape corresponding to the flow cross-sectional shape of the gas supply pipe 200, as shown in FIG. This is a preferred embodiment, and it is needless to say that any structure is possible as long as the gas flowing out from the gas supply pipe 200 collides with the lower surface and diffuses.

  FIG. 4 is a view showing another embodiment of the gas supply pipe 200a coupled to the storage tank 100a of FIG. Referring to the drawing, unlike FIG. 1, the gas supply pipe 200a is inserted through the lower part of the storage tank 100a and has a vertical pipe structure. In such a case, the gas supply pipe 200 is not bent in the storage tank 100a, but can be immediately inserted and fixed by a straight pipe, which is easier to manufacture and smoother than the gas flow rate. . Here, unexplained code 410a indicates an atomizing module.

  On the other hand, the gas supply pipe 200a is inserted in the outer peripheral side surface of the storage tank 100 as shown in FIG. 1, or is inserted in the lower surface of the storage tank 100a as shown in FIG. However, this is one embodiment, and it goes without saying that the installation positions of the gas supply pipes 200 and 200a are varied depending on the size and installation space of the apparatus to be designed.

  The atomizing apparatus 400 further includes a flow rate increasing unit 220 (see FIG. 12) that increases the flow rate of the gas supplied into the storage tank 100 and discharges it. In this embodiment, the flow rate increasing means 220 includes a compression pump that is connected to the gas supply pipes 200 and 200a and increases the flow rate of the gas supplied into the storage tanks 100 and 100a. .

  Referring to FIG. 5, the flow rate increasing unit 220 includes a nozzle part 210 b that is formed at the insertion end of the gas supply pipe 200 b and discharges it by increasing the flow rate of the supplied gas. The nozzle portion 210b has a passage cross-sectional area of the insertion end of the gas supply pipe 200b smaller than a passage cross-sectional area of the inflow portion into which the gas flows, and the flow velocity of the gas flowing out to the insertion end. Increase.

  On the other hand, in the drawing, the nozzle part 210b is an embodiment in which the nozzle part 210b is formed integrally with the insertion end part of the gas supply pipe 200b, but this is a preferred embodiment in consideration of manufacturability, The nozzle part 210b may be configured separately and fixedly coupled to the insertion end of the gas pipe.

  FIG. 6 is a view showing another embodiment of the atomizing apparatus 400b. Referring to the drawing, the storage tank 100b has a cup shape with an open top, and the gas discharged from the gas supply pipe 200 and discharged through the liquid phase fluid is directly exposed to the outside. It is supposed to be discharged.

  FIG. 7 is a cross-sectional view showing another embodiment of the atomizing module 410c. Referring to the drawing, the atomizing module 410 c includes a gas supply pipe 200, a collision member 300 a, and a mixing unit 350. Here, the gas supply pipe 200 and the collision member 300a are substantially the same in configuration as the gas supply pipe 200 and the collision member 300a described above, and detailed description thereof will be omitted.

  The mixing unit 350 includes a mixing injection pipe 351 and a collision plate 352. The mixed injection pipe 351 has a tubular shape with the gas supply pipe 200 inserted on one side, and an insertion end of the gas supply pipe 200 and the collision member 300a are located inside. The mixed injection pipe 351 plays a role of mixing the liquid-phase fluid flowing in from the lower side and the gas flowing out of the gas supply pipe 200 and injecting them upward when operating.

  The collision plate 352 is provided apart from the other end portion of the mixed injection pipe 351 and causes the liquid-phase fluid flowing out from the mixed injection pipe 351 to collide with the gas at the bottom surface. The collision plate 352 is preferably formed in a disc shape corresponding to the flat cross-sectional shape of the mixed injection tube 351, but is not limited thereto.

  If the gas flows out from the gas supply pipe 200 located in the mixed injection pipe 351, the atomizing module 410 c sucks the liquid phase fluid along the internal flow path of the mixed injection pipe 351. Or it is filled with ambient pressure and rises. The liquid phase fluid that has flowed up in this way is mixed with the gas flowing out from the gas supply pipe 200 and rises together. The raised liquid phase fluid and gas collide with the collision plate 352 and are refined.

  According to the above description, the atomizing module 410c is configured so that the gas and the liquid fluid are mixed and injected in the mixed injection pipe 351 through the collision plate 352 along with the gas refinement by the collision member 300a. Since the structure is miniaturized again, the mixing ratio of gas and liquid phase fluid is improved, and the structure of a simple structure such as a tubular mixed injection pipe 351 and a disk plate type collision plate 352 is simplified. The installation alone can improve the mixing ratio between the gas and the liquid phase fluid.

  As described above, in the atomizing apparatuses 400, 400a, and 400b, the storage tanks 100, 100a, and 400b are formed in a cylindrical shape, and the gas supply pipes 200 and 200a of the atomizing modules 410, 410, 410b, and 410c are formed. However, since the cylindrical tube is easy to handle, the manufacturing is easy, the manufacturing cost can be reduced, the manufacturing cost can be reduced, and the economy can be improved.

  Referring to FIG. 8, in the atomizing module 410d, the gas supply pipe 200 is formed in a cylindrical shape. Correspondingly, the first collision plate 310b is formed in a disk shape. 320b is formed in a circular ring plate shape having an inner diameter larger than the diameter of the first collision plate 310b, and the gas supply pipe 200, the first collision plate 310b, and the second collision plate 320b are arranged coaxially. ing.

  Referring to FIG. 9, the first collision plate 310 b is formed by a plurality of first coupling members 312 b that are vertically spaced from the insertion end of the gas supply pipe 200 and coupled together. The gas supply pipe 200 is spaced apart from the upper part.

  The second collision plate 320b is spaced apart from the upper portion of the first collision plate 310b by a plurality of second coupling members 322b that are separated from the upper surface along the outer periphery of the first collision plate 310b. Arranged.

  According to the above description, the atomizing module has an upper direction in which the gas flowing out from the gas supply pipe 200 collides with the lower surface of the first collision plate 310b and then spreads on the side surface of the first collision plate 310b. Then, it collides with the lower surface of the second collision plate 320b again and diffuses to the side surface.

  Referring to FIGS. 10 and 11, the atomizing module 410e is different from the atomizing module 410d of FIG. 8 in that a gas supply pipe 200c is formed in a square duct shape. The plate 310c and the second collision plate 320c are formed in a rectangular shape.

  The first collision plate 310c is formed on a flat surface so as to have an area larger than the internal area of the gas supply pipe 200c, and is set apart from the insertion end of the gas supply pipe 200c along the outer circumferential direction. The plurality of first coupling members 312c coupled to each other are spaced apart from each other on the gas supply pipe 200.

  On the other hand, referring to FIG. 11, the first collision plate 310c and the second collision plate 320c are formed by bending one structure of a square plate in multiple stages. For example, the atomizing module 410e is vertically erected and bent along the outer surface of the first collision plate 310c in the lateral direction, and the end is bent again in the lateral direction. A second collision plate 320c is formed, and the first collision plate 310c and the second collision plate 320c are integrally formed and bent in multiple stages. Thereby, even if it does not comprise the 2nd coupling member 322b mentioned above, manufacture is easy by bending and forming one plate structure in multiple steps.

  As described above, in the atomizing module 410d, the first collision plate 310b and the second collision plate 320b may be separately configured and coupled through the second coupling member 322b. The first collision plate 310c and the second collision plate 320c may be integrally formed by bending one configuration in multiple stages.

  According to the above description, the atomizing modules 410, 410a, 410b, 410d, and 410e are not only easy to install, but can be installed at any location, which is desired by the designer. The collision members 300, 300b, and 300c can be arranged in a plurality of stages depending on the processing capacity, etc., and can be designed freely. Slots and the like are provided in the plate-like collision members 300, 300b, and 300c. In addition to various designs such as forming and reducing pressure, various designs such as aeration equipment, deaeration equipment, oxidation, reduction, neutralization and dust treatment equipment can be applied.

  FIG. 12 is a view showing another embodiment of the atomizing apparatus of FIG. 1. Referring to the drawing, the atomizing apparatus is stored in the storage tanks 100, 100a, 100b as compared with FIG. The gas supply pipe 200 and the collision member 300 are positioned in the internal space 3613, and the gas and the liquid fluid are mixed while the gas is refined in the internal space 3613. It further includes a mixing / discharging unit 360 that supplies and circulates the liquid phase fluid in the internal space 3613 to the outside of the mixing chamber 361 and discharges bubbles or floating substances floating on the water surface of the internal space to the outside of the mixing chamber 361.

  The mixing and discharging unit 360 includes a mixing chamber 361, a circulation pipe 363, and a buoyancy member 364. The mixing chamber 361 is located in the storage tank, but is positioned so as to be partially immersed in the water surface of the liquid phase fluid in the storage tanks 100, 100a, 100b, and the lower part is the liquid phase. The liquid phase fluid floats so that the upper part is exposed on the water surface and the discharge port 362 is located on the water surface.

  The mixing chamber 361 has an inlet 3611 through which the liquid-phase fluid flows in at the lower part and an outlet 3612 through which the gas flows out at the upper part. In the mixing chamber 361, the gas supply pipe 200 is inserted into a side surface thereof, the insertion end of the gas supply pipe 200 and the collision member 300 are positioned in an internal space 3613, and the internal space is positioned in an upper side surface. One or a plurality of discharge ports 362 communicating with 3613 are formed.

  When the mixing and discharging unit 360 is operated, the gas is refined in the internal space 3613, and the liquid phase fluid flowing in from the lower portion and the gas flowing out from the gas supply pipe 200 are converted into the internal space 3613. In operation, the liquid phase fluid and the bubbles or floating substances in the internal space 3613 are supplied and circulated to the outside of the mixing chamber 361 while being discharged through the discharge port 362. .

  The circulation pipe 363 is located outside the mixing chamber 361 and connected to the mixing chamber 361. One end of the circulation pipe 363 communicates with the discharge port 362 and the other end is connected to the liquid phase fluid. It is bent downward so as to be immersed, and serves to discharge and circulate the liquid phase fluid discharged from the discharge port 362. In addition, the circulation pipe 363 discharges not only liquid fluid but also bubbles or suspended solids on the water surface to the discharge port 362 to the outside, and smoothly discharges gas in the internal space 3613.

  In the drawing, the other end of the circulation pipe 363 is immersed in the liquid-phase fluid. However, this is a preferred embodiment, and the other end is positioned on the water surface. The liquid phase fluid and bubbles or floating substances in the internal space 3613 may be discharged to the outside of the mixing chamber 361.

  As shown, the mixing and discharging unit 360 can reduce the manufacturing cost by using a tubular mixing chamber 361 that is easy to handle and a bent tubular circulation pipe 363, but the present invention is not limited thereto. It is not a thing.

  The buoyancy member 364 is coupled to the mixing chamber 361 or the circulation pipe 363 so that a part of the mixing chamber 361 and the circulation pipe 363 is immersed in the liquid water surface of the liquid phase. 362 serves to provide buoyancy so as to be located on the liquid water surface of the liquid phase.

  On the other hand, the buoyancy member 364 is coupled to the outer surface of the circulation pipe 363. However, this is one embodiment, and the mixing and discharging unit 360 is stably positioned on the water surface of the liquid phase fluid. If it can, it goes without saying that it can be coupled to the mixing chamber 361, and a plurality of them can be installed for a stable position and a buoyancy level.

  FIG. 13 is a view showing another embodiment of the mixed discharge part 370 and the gas supply pipe 200c of FIG. 12, and the circulation pipe 373 of the mixed discharge part 370 has the other end thereof as shown in FIG. The liquid phase is deeply immersed in the fluid. In such a case, the mixed discharge unit 370 circulates the liquid phase fluid more smoothly and circulates in a wide range, and this can be variously changed according to the size and design of the mixed discharge unit 370.

  As shown in FIG. 1, the gas supply pipe 200c is not formed so as to be bent upward, but is formed so as to be bent downward. The reaction time can be improved by increasing the residence time in the liquid phase fluid.

  On the other hand, in FIG. 13, unexplained reference numerals 371, 3711, 3712, 3173, 372, and 374 respectively indicate a mixing chamber, an inlet, an outlet, an internal space, a discharge port, and a buoyancy member. Since it corresponds to the configuration of FIG.

  According to the above description, the mixing and discharging units 360 and 370 generate microbubbles by refining the gas in the internal space of the mixing chamber, and the liquid in the internal space of the mixing chamber through the circulation pipes 363 and 373. By circulating and supplying the phase fluid to the outside, the liquid phase fluid circulation in the storage tanks 100, 100a, 100b is induced, the structure is simple, the manufacturing cost is reduced, the device installation cost and the manufacturing cost are reduced. It can reduce and can improve economic efficiency.

  As described above, the atomizing modules 410, 410a, 410b, 410c, and 410e are not only easy to install, but can be installed by adjusting the installation point anywhere, so that the designer can find a desired point. Depending on the installed capacity and the processing capacity, the number of stages of the collision members 300, 300a can be changed to a plurality of stages, the design is free, and various changes such as forming a slot etc. to reduce the pressure are possible. .

  Hereinafter, a fluid processing facility using the atomizing apparatus will be described. Referring to FIG. 14, the fluid processing facility according to the embodiment of the present invention includes an atomizing device 400 c, a fluid separator 500, a storage tank 600, a suction pump 900, and an eliminator 830.

  The atomizing device 400 c includes a storage tank 100 and an atomizing module 410. Here, the atomizing module 410 includes the gas supply pipe 200 and the collision member 300 described above. Since this is described above, a detailed description thereof will be omitted, and the following will be broadly divided. The configuration will be explained mainly.

  The storage tank 100 is formed with an inlet through which a gas flows, a storage space for storing the liquid 1 is provided therein, an outlet through which the gas flowing into the top is discharged, and a side surface An overflow outlet 103 for discharging the overflowing liquid 1 is formed.

  Here, in the storage space, the gas and the liquid 1 are flown into, the sub space 101 in which the liquid 1 is accommodated, and the sub space 101 communicates with the gas to flow the liquid. 1 and a main space 102 in which the atomizing device 400c is provided.

  Meanwhile, the fluid treatment facility further includes a venturi module 820 that is provided in the subspace 101 and that refines the liquid 1 that flows in. The venturi module 820 includes a funnel portion 821, a discharge portion 822, a collision A plate 823. The funnel portion 821 is open at the top, and is formed into a shape that becomes narrower as it goes downward in order to increase the flow rate of the liquid 1 and the gas. Yes.

The discharge part 822 extends downward from the outlet of the funnel part 821 and plays a role of guiding the liquid 1 and the gas downward.
The collision plate 823 is spaced apart from the lower part of the discharge unit 822 and plays a role of diffusing the liquid 1 and the gas flowing out from the discharge unit 822 to the side surface while colliding with the upper surface. On the other hand, in the drawing, an unexplained reference numeral 610 indicates a water tank 810 that is located above the venturi module 820 and accommodates both the liquid 1 and gas.

  The storage tank 100 includes a water level adjusting unit 110 provided on the overflow outlet 103 side. Referring to FIG. 15, the water level adjusting unit 110 is provided to be slidable in the vertical direction with respect to the overflow outlet 103 so that the overflow water level of the liquid 1 can be adjusted. On the other hand, the unexplained reference numeral 2 indicates a damper capable of adjusting the flow rate of the flowing gas, and a detailed description thereof will be omitted because a known damper can be applied.

  The fluid treatment facility is provided above the atomizing device 400c and is spaced apart from each other in a direction opposite to the gas flow direction, and includes a plurality of eliminators 830 for removing mist in the storage space. Including.

  Referring to FIG. 16, the eliminator 830 is spaced apart in multiple stages along the gas flow direction, and is arranged to cross each other with respect to the gas flow direction. The eliminator 830 extends along the width direction of the storage tank 100, one end is fixedly coupled to one inner wall of the storage tank 100, and the other end faces the one inner wall of the storage tank 100. The position is fixed in the storage tank 100 by being fixed to the other inner wall.

  In detail, the eliminator 830 includes a first eliminator 831 whose flow cross-sectional shape is formed in an inverted triangular shape, and a second eliminator located on the rear side of the first eliminator 831 and whose flow cross-sectional shape is formed in a triangular shape. 832.

  Here, in the first eliminator 831, a drain hole 711 is formed so that the mist collected in the lowest step portion is discharged.

  Meanwhile, the eliminators 830 are arranged so as to intersect with each other in multiple stages, and as shown in FIG. 4, the mists passing between the eliminators 830 are guided to collide with each other, so that the size of the mist is reduced. (Size) is enlarged and collected by gravity through it, and the friction loss of passing is minimized. Moreover, the installation height can be reduced, and the production cost of equipment can be reduced.

  On the other hand, the microbubbles generated by the atomizing module 410 are characterized in that the bubble size is small, the bubble rising speed is slow, the gas solubility is large, the frictional resistance is reduced, the pressure in the bubbles is large, the contact area It has the characteristic that it increases, has the characteristic accompanied by dissolution shrinkage, can expand the contact area of gas and the liquid 1, and can improve dust collection, deaeration, and absorptivity. As a result, the atomizing device 400c generates the gas as microbubbles to improve the fluid processing performance, and further promotes the floating of the floating substance 3 in the liquid 1 to circulate and supply the filtrate again. .

  The atomizing module 410 including the gas supply pipe 200 and the collision member 300 is provided in the storage tank 100, and when the operation is stopped, the water level of the liquid 1 is lowered and exposed to the gas. During operation, the water level rises while the subspace 101 is in a negative (−) pressure state, and is immersed in the liquid 1, and the inflowing gas is refined in the liquid 1 to form microbubbles. Let

  On the other hand, the atomizing device 400c is coupled to the gas supply pipe 200 or the collision member 300, and is coupled to the inner wall of the storage tank 100, so that the gas supply pipe 200 and the collision member 300 are not shown. And a support portion for supporting the. One end of the support unit is coupled to one inner wall of the storage tank 100, and the other end is coupled to another inner wall facing the one side inner wall of the storage tank 100. It is provided so that its position is fixed inside.

  The fluid separator 500 is communicated with the overflow outlet 103 of the storage tank 100, and the liquid 1 flowing out from the overflow outlet 103 and the suspended matter 3 existing on the water surface of the liquid 1 are introduced into the fluid separator 500, The liquid 1 and the suspended matter 3 are separated from each other, the suspended matter 3 is removed, and only the liquid 1 is supplied to the storage tank 600 to reduce the foam removal load of the storage tank 600. .

  Specifically, the fluid separator 500 includes a separation tank 510, a partition wall part 520, and a liquid supply part 530. The separation tank 510 communicates with the overflow outlet 103 to receive the liquid 1 and the floating substance 3 and accommodates the liquid 1 and the floating substance 3 in an open state. In the drawing, the separation tank 510 is divided into a first separation tank into which the overflowing liquid 1 and floating substance 3 are introduced, and a second separation tank in which the partition wall 520 is located behind the first separation tank. Although the case where it was formed is shown, this is one embodiment and can be variously changed.

  The partition wall 520 serves to separate the liquid 1 and the floating substance 3 from each other. In detail, the partition wall portion 520 is positioned in a vertical direction or an inclined direction with respect to the separation tank 510, but the upper end portion is positioned to protrude higher than the suspended substance 3 in the separation tank 510, and the lower end portion Is separated from the bottom surface of the separation tank 510, and the floating material 3 is removed from the upper part, and only the liquid 1 is allowed to pass downward.

  One end of the liquid supply unit 530 communicates with the separation tank 510 on the rear side of the partition wall 520, and the other end communicates with the storage tank 600 and passes below the partition wall 520. The liquid 1 is supplied to the storage tank 600. The liquid supply unit 530 includes a supply line 531 that supplies the liquid 1 and a supply valve 532 that is disposed on the supply line 531 and adjusts the flow rate. Here, as shown in the drawing, the supply line 531 has a plurality of branches, and can supply the liquid 1 to the storage tank 600.

  The storage tank 600 is connected to the fluid separator 500 to receive and store the liquid 1 separated by the fluid separator 500, and depending on the type of the liquid 1 and the purpose of the fluid treatment facility, Various configurations such as an Ising chamber, a floating tank, a liquid atomizing chamber, and a slurry floating tank can be used. For example, the storage tank 600 stores the liquid 1 separated from the fluid separator 500 while precipitating a precipitate contained in the liquid 1 and circulatingly supplying a supernatant. The liquid 1 can be treated using bacteria or water-treated bacteria, the amount of dissolved oxygen can be increased, and it can be concentrated and circulated.

One or a plurality of the storage tanks 600 may be arranged in parallel or in series depending on the design. Further, the storage tank 600 may be located under the fluid separator 500 and may allow the liquid 1 to flow in using potential energy without a return pump.
On the other hand, although not shown, sludge discharge portions are provided at the lower part of the storage tank 100 and the lower part of the storage tank 600, respectively, so that sludge generated during fluid processing can be removed.
The fluid treatment facility may be formed by a system in which a circulation supply unit 700 is installed and the liquid 1 in the storage tank 100 is circulated and supplied. Here, the circulation supply unit 700 includes a circulation supply line 710, a circulation pump 720, and a flow rate control valve 730.
The circulation supply line 710 has one end connected to the storage tank 600 and the other end connected to the upper part of the storage tank 100 to connect the liquid 1 in the storage tank 600 to the liquid supply line 710. It plays a role of circulating supply to the upper part of the storage space.
The circulation pump 720 is provided on the circulation supply line 710, plays a role of forcibly flowing the liquid 1, and a known fluid pump or the like can be applied.
The flow rate adjusting valve 730 is provided on the circulation supply line 710 on the front side and the rear side of the circulation pump 720 and plays a role of adjusting the flow rate of the flowing liquid 1.
The fluid treatment facility communicates with an outlet of the storage tank 100, sucks the gas in the storage space, and causes the storage space to be in a negative (−) pressure state by suction input. And a suction pump 900 that raises the water level.

  Further, the fluid treatment facility further includes a discharge chamber 910 for removing residual dust contained in the gas discharged from the suction pump 900.

  The discharge chamber 910 is provided on a discharge line on the rear side of the suction pump 900, and the gas flowing out from the suction pump 900 through a gas inlet is flown in, and the flow of the gas is turbulent in the inside. It forms, reduces the flow velocity, and plays the role of precipitating the dust contained in the gas.

  Meanwhile, the discharge chamber 910 is provided at the gas inlet of the discharge chamber 910 and further includes a guide unit 920 that guides the flow of the gas that flows into the turbulent flow state in the discharge chamber 910. Including.

  The guide part 920 is formed to be inclined downward as shown so that turbulent flow is formed while guiding the inflowing gas downward and colliding with the inner wall plate of the discharge chamber 910. However, it is needless to say that various shapes are possible as long as the object can be achieved.

  On the other hand, in the drawing, the fluid treatment facility is shown when the atomizing module 410 of FIG. 1 is applied, but this is one embodiment, and the atomizing module 410b of FIG. 5 and the atomizing module of FIG. It goes without saying that the module 410c can be applied, and the same reference numerals denote the same components.

  FIG. 17 is a view showing a state when the fluid treatment facility is in operation. Referring to the drawing, when the fluid treatment facility operates the suction pump 900 in a state where the liquid 1 is stored in the storage space, the inside of the sub space 101 has a negative pressure lower than atmospheric pressure. A pressure difference occurs between the outside and the atmospheric pressure.

  If the pressure difference is generated in this way, the water level of the liquid 1 in the sub space 101 becomes high, the gas supply pipe 200 and the collision member 300 are immersed in the liquid 1, and the gas is drawn through the inlet. .

  Then, the gas drawn into the gas supply pipe 200 is ejected from the liquid 1 in the subspace 101, collides with the collision member 300, and is micronized to generate microbubbles. Contact 1 The gas formed by the microbubbles is discharged after the harmful components are dissolved while in contact with the liquid 1, the oxygen of the gas in the liquid 1 is dissolved, or after aeration and deaeration are performed. . Here, as described above, the fluid treatment facility has a structure in which gas is refined in the sub space 101 and at the same time, the liquid 1 is refined through the venturi module 820 in the main space 102.

  On the other hand, the fluid treatment facility can be applied to an aeration apparatus, a deaeration apparatus, a dust treatment apparatus, and the like. To explain this, first, the fluid treatment facility can be applied as an aeration apparatus for the activated sludge method. For this purpose, the gas is composed of atmospheric gas, and the atmospheric gas is supplied to the inlet of the storage tank 100, and the liquid 1 is composed of treated water containing microorganisms, and the circulation supply line 710 The treated water may be supplied to and stored in the storage space, and the treated water may be brought into contact with oxygen in the atmospheric gas through the atomizing device 400c to increase the oxygen concentration in the liquid 1.

  Then, the fluid treatment facility can be applied as a degassing device (Gas stripper). For this purpose, the gas is made of atmospheric gas, the atmospheric gas is supplied to the inlet of the storage tank 100, and the liquid 1 is made of waste water containing a nitrogen component, and the circulation supply line By 710, the waste water is supplied and stored in the storage space, and the waste water is brought into contact with oxygen in the atmospheric gas through the atomizing device 400c to adsorb and remove the nitrogen in the waste water. At this time, the atomizing device 400c increases the gas-liquid contact area or the gas contact area to induce an increase in the deaeration effect.

  The fluid treatment facility can be applied as a dust treatment device. In such a case, the gas is made of dust gas containing dust, the dust gas is supplied to the inlet of the storage tank 100, the liquid 1 is made of water, and the circulation supply line 710 is used. The water is supplied to and stored in the storage space, the dust gas is brought into contact with the water through the atomizing device 400c, and the dust contained in the dust gas is adsorbed to the water and removed.

  The fluid treatment facility is applied to a water supply system. In such a case, raw liquid is supplied as the liquid in the storage tank 100. At this time, the fluid treatment facility supplies carbon dioxide as a gas to be adjusted so as to increase the pH of the raw water, and further disinfects the raw water to improve water quality. Sodium chlorite (NaOCl) can be supplied. Here, the sodium hypochlorite is supplied to the raw water in the storage tank 100, supplied in the storage tank 600, or injected into the circulation supply line 710. It goes without saying that various embodiments are possible if sodium acid can be supplied.

  On the other hand, when the fluid treatment facility is applied to a water supply system, it is desirable to apply the atomizing module 410c of FIG. This not only solves the problem that the existing carbon dioxide does not dissolve well in the raw water, but the gas supply pipe 200 can be easily used as a carbon dioxide supply source. This is because the construction cost can be reduced because it is a structure that can be simply connected to the.

  Although the present invention has been described with reference to the embodiment shown in the drawings, this is merely an example, and those skilled in the art can make various modifications and equivalent other embodiments. You will understand that. Therefore, the true technical protection scope of the present invention should be determined by the technical idea of the claims.

  According to the present invention, it can be used for aeration equipment, deaeration equipment, oxidation, reduction, neutralization and dust treatment equipment.

Claims (21)

In atomizing equipment,
When the atomizing device is in operation, the tube is inserted into the atomizing chamber so that a tubular insertion end is located in the atomizing chamber in which a liquid-phase fluid is accommodated, and gas is supplied into the atomizing chamber. , The gas discharge end is fixed to the gas supply pipe so as to be spaced apart from the gas supply pipe immersed in the fluid and the end of the gas supply pipe. An atomizing apparatus including an atomizing module including a collision member immersed in the fluid and colliding with the gas flowing out from the gas supply pipe to atomize the gas in the liquid phase fluid. The gas supply pipe is
The atomizing device according to claim 1, wherein the atomizing device is inserted into the storage tank, and an insertion end portion in the storage tank is bent upward or downward. The gas supply pipe is
The atomizing device according to claim 1, wherein the atomizing device has a structure of a vertical pipe inserted through a lower portion of the storage tank.   The atomizing apparatus according to claim 1, further comprising a flow rate increasing unit connected to the gas supply pipe to increase the flow rate of the gas supplied into the storage tank. The flow rate increasing means is
The atomizing device according to claim 4, wherein the atomizing device is connected to the gas supply pipe to increase a flow rate of the gas. The flow rate increasing means is
5. The nozzle according to claim 4, further comprising a nozzle portion that is integrally connected to an insertion end portion of the gas supply pipe, is formed smaller than a passage cross-sectional area of an inflow portion into which the gas flows, and increases a flow rate of the gas. Atomizing device. The collision member is
Outflow direction of the gas is arranged at an upper portion of the gas supply pipe by a plurality of first coupling members that are erected from the insertion end of the gas supply pipe along the outer circumferential direction and coupled together. The atomizing device according to claim 1, further comprising a first collision plate that is disposed laterally with respect to the gas and causes the gas flowing out from the gas supply pipe to collide with a lower surface. The collision member is
The first collision plate is spaced apart from the upper part of the first collision plate, is arranged in a lateral direction, spreads on the side surface of the first collision plate, and flows out in the upper direction to collide with the lower surface and diffuse to the side surface. The atomizing device according to claim 7, further comprising two collision plates. The second collision plate is
The atomizing device according to claim 8, wherein the atomizing device is coupled by a plurality of second coupling members that are erected on the upper surface of the first collision plate. The second collision plate is
The first collision plate according to claim 8, wherein the first collision plate is vertically formed along the outer surface of the first collision plate and bent, and an end portion is bent along a horizontal direction, and is formed integrally with the first collision plate. Atomizing equipment. The gas supply pipe is inserted into one side of the tube, the insertion end of the gas supply pipe and the collision member are located inside, and the liquid phase fluid and the gas introduced from one end during operation A mixed injection pipe in which the gas flowing out from the supply pipe is mixed and injected to the other end;
A mixing unit including a collision plate that is provided apart from the other end of the mixing injection pipe and collides the liquid phase fluid flowing out of the mixing injection pipe with the gas on one surface. An atomizing apparatus including the atomizing module according to item 1. The storage tank is positioned so as to be partially immersed in the water surface of the liquid phase fluid, and an inlet through which the liquid phase fluid flows in and a gas outlet through the gas are formed in the lower portion. The gas supply pipe is inserted inside, the insertion end of the gas supply pipe and the collision member are located in the internal space, and communicated with the internal space on the side surface, so that the liquid phase of the internal space A mixing chamber in which one or more outlets from which a fluid is discharged are formed;
A circulation pipe connected at one end to the mixing chamber so as to communicate with the discharge port, and discharging the liquid-phase fluid in the internal space to the outside from the discharge port;
In combination with the mixing chamber or the circulation pipe, the mixing chamber is provided with a buoyancy so that the liquid outlet fluid is discharged from the outlet through the liquid outlet. A buoyancy member to provide, an atomizing device. In atomizing equipment,
A gas outlet is formed in the upper part in a cylindrical shape, and inside, a storage tank for storing a liquid phase fluid,
An end portion that is inserted into the storage tank so that an insertion end is positioned in the storage tank in a cylindrical shape, supplies gas into the storage tank, and the gas is discharged during operation of the atomizing device A gas supply pipe immersed in the fluid;
The gas that is provided in a disc shape and spaced apart from the end of the gas supply pipe, is immersed in the fluid when the atomizing device is operated, is disposed in a lateral direction, and flows out of the gas supply pipe A first collision plate that collides with the lower surface, and is formed in a disk shape with a diameter larger than that of the first collision plate, is provided apart from the upper portion of the first collision plate, and is arranged in a lateral direction, A second collision plate that collides with the lower surface and diffuses the gas, which spreads on the side surface of the first collision plate and flows upward, to the side surface and causes the gas to atomize in the liquid phase fluid. Members,
Including atomizing equipment. In fluid processing equipment including atomizing equipment,
An inlet into which gas is introduced is formed, a storage space for storing a liquid phase fluid is provided therein, and a storage tank and a tube in which an outlet from which the gas that has flowed in is discharged are formed. Inserted into the storage tank so that the insertion end is located in the storage tank, supplying gas into the storage tank, and when the atomizing device is activated, the end from which the gas is discharged is A gas supply pipe immersed in a fluid; and provided separately from an end of the gas supply pipe; and when the atomizing device is operated, the gas supply pipe is immersed in the fluid and flows out of the gas supply pipe An atomizing device including an atomizing module including a collision member configured to cause gas to collide with a lower surface and atomize in the liquid phase fluid;
A fluid separator that is in communication with the storage tank and receives a liquid in the storage space and a floating substance existing on a water surface of the liquid, and separates the liquid and the floating substance from each other;
One or more storage tanks connected to the fluid separator to receive and store the liquid separated by the fluid separator;
One end part is connected to the storage tank, and the other end part is connected to the upper part of the storage tank so that the liquid in the storage tank is circulated and supplied to the upper part of the storage space. A circulation pump provided on the circulation supply line for forcibly flowing the liquid, a flow rate adjusting valve provided on the circulation supply line for adjusting the flow rate of the flowing liquid,
Including fluid treatment equipment. In fluid processing equipment including atomizing equipment,
A storage tank in which a liquid-phase fluid is stored and a tubular shape are inserted into the storage tank, gas is supplied into the storage tank, and an end from which the gas is discharged when the atomizing device is operated is the fluid. A gas supply pipe immersed in the interior of the gas supply pipe and spaced apart from an end of the gas supply pipe, and the gas is immersed in the fluid and flows out of the gas supply pipe when the atomizing device is operated. The gas supply pipe is inserted into one side of the tube, and the gas supply pipe insertion end and the collision member are inside. A mixed injection pipe that mixes the liquid-phase fluid flowing in from one end and the gas flowing out from the gas supply pipe and injects the mixed liquid into the other end during operation. Provided apart from the other end, And atomizing device that includes a mixing section comprising a collision plate impinging on one side and a fluid with the gas in the liquid phase flowing out of the case the injection tube, the atomizing module including,
A fluid separator that is in communication with the storage tank and receives a liquid in a storage space of the storage tank and a floating substance existing on a water surface of the liquid, and separates the liquid and the floating substance from each other;
One or more storage tanks connected to the fluid separator to receive and store the liquid separated by the fluid separator;
One end part is connected to the storage tank, and the other end part is connected to the upper part of the storage tank so that the liquid in the storage tank is circulated and supplied to the upper part of the storage space. A circulation pump provided on the circulation supply line for forcibly flowing the liquid, a flow rate adjusting valve provided on the circulation supply line for adjusting the flow rate of the flowing liquid,
Including fluid treatment equipment. The atomizing device is:
The storage tank is positioned so as to be partially immersed in the water surface of the liquid phase fluid, and an inlet into which the liquid phase fluid flows in and a gas outlet into the upper portion are respectively formed in the lower portion. The gas supply pipe is inserted inside, the insertion end of the gas supply pipe and the collision member are located in the internal space, and communicated with the internal space on the side surface, so that the liquid phase of the internal space A mixing chamber in which one or more outlets from which a fluid is discharged are formed;
A circulation pipe connected at one end to the mixing chamber so as to communicate with the discharge port, and discharging the liquid-phase fluid in the internal space to the outside from the discharge port;
In combination with the mixing chamber or the circulation pipe, the mixing chamber is provided with a buoyancy so that the liquid outlet fluid is discharged from the outlet through the liquid outlet. The fluid treatment facility according to claim 14, further comprising a mixed discharge unit including a buoyancy member to be provided. The storage tank is
A main space in which the gas and the liquid are introduced, a sub space in which the liquid is accommodated, and the sub space is communicated with the gas, the liquid is accommodated, and the atomizing device is provided. The fluid treatment facility formed in the storage space according to claim 14 or 15, including a space. The gas comprises atmospheric gas, and supplies the atmospheric gas to the inlet of the storage tank;
The liquid is made of treated water containing microorganisms, and the treated water is supplied to and stored in the storage space by the circulation supply line.
The fluid treatment facility according to claim 14 or 15, wherein the treated water is brought into contact with oxygen in the atmospheric gas through the atomizing device. The gas comprises atmospheric gas, and supplies the atmospheric gas to the inlet of the storage tank;
The liquid is composed of waste water containing a nitrogen component, and the waste water is supplied to and stored in the storage space by the circulation supply line.
The fluid treatment facility according to claim 14 or 15, wherein the wastewater is brought into contact with oxygen in the atmospheric gas through the atomizing device to remove the nitrogen component in the wastewater. The gas consists of dust gas containing dust, and supplies the dust gas to the inlet of the storage tank,
The liquid is water, and the water is supplied to and stored in the storage space by the circulation supply line.
The fluid treatment facility according to claim 14 or 15, wherein the dust gas is brought into contact with the water through the atomizing device, and the dust contained in the dust gas is adsorbed and removed by the water. The fluid separator
A separation tank that is communicated with the storage tank and in which the liquid and the suspended solids are introduced and stored;
Although located in a vertical direction or an inclined direction with respect to the separation tank, the upper end portion is located so as to protrude higher than the suspended matter in the separation tank, and the lower end portion is located away from the bottom surface of the separation tank. The floating material is removed from the upper part, and the liquid is allowed to pass downward to separate the floating material and the liquid;
One end communicates with the separation tank on the rear side of the partition wall, and the other end communicates with the storage tank, and supplies the liquid that has passed below the partition wall to the storage tank. The fluid treatment facility according to claim 14, comprising a supply unit.

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