KR20170101164A - Atomizing apparatus - Google Patents

Abstract

The present invention relates to an atomizing apparatus, comprising: a gas supply pipe inserted into an atomizing chamber to enable an insertion end part having a pipe shape to be positioned inside the atomizing chamber storing liquid, supplying gas into the atomizing chamber, and enabling an end part where the gas is discharged to be submerged in the fluid when an atomizing device is operated; and an atomizing module fixated to a gas supply pipe to be spaced from the end part of the gas supply pipe, submerged inside the fluid when the atomizing device is operated, and having a collision member atomizing the gas inside the liquid by enabling the collision member to collide with the gas leaked from the gas supply pipe. Therefore, the present invention can reduce manufacturing costs by using the cylindrical atomizing chamber and the pipe-shaped gas supply pipe, thereby reducing the manufacturing costs to improve economic efficiency.

Description

Atomizing apparatus

More particularly, the present invention relates to an atomizing apparatus which is simple in structure and capable of reducing manufacturing cost, is economical, and is capable of performing various fluid treatments such as aeration, deaeration, oxidation, reduction, neutralization, To a demining device.

Generally, in industrial boilers and incinerators that use various fuels as well as waste oil and various refuse such as environmental pollutants as heat sources or incinerators, many noxious gases, soot and various foreign substances are inevitably discharged during combustion or incineration, They accelerate air pollution so they destroy many areas of human life as well as destruction of ecosystems.

Accordingly, in order to prevent air pollution, a filtration device is separately installed in various boilers or incinerators, or a siphon or the like is installed to collect various kinds of soot and dust generated during combustion or incineration. Such a filtration device or a cyclone Can remove relatively large foreign substances and the like. On the other hand, it is impossible to capture various harmful gases, such as soot, which is slightly smaller in particle size, and the like, and it can not be effectively used. Accordingly, conventionally, a method of collecting harmful gas or the like by using an atomizing module capable of collecting harmful gas after miniaturization has been developed.

However, the conventional atomizing apparatus has a problem that the manufacturing cost is high and the economical efficiency is low because the manufacturing cost is high.

On the other hand, in general, the fluid treatment method is treated by methods such as aeration, deaeration, oxidation, reduction, neutralization and dust treatment depending on the kind of treatment water and treatment purpose. Liquid, and liquid.

For example, in the case of an aeration apparatus that allows organic matter to be decomposed by microorganisms by supplying aerobic microorganisms and oxygen to the treated water containing organic matter, it is necessary to control the concentration of oxygen in the treated water in order to accelerate the decomposition of organic matters in the microorganism In the case of the degassing apparatus, ammonia or volatile organic substances are deaerated and removed by supplying oxygen to wastewater containing high concentration of ammonia or volatile organic substances, and oxidation, reduction, neutralization reaction , The oxidant, reducing agent and neutralizing agent are added to the treated water and reacted with the odorous substance to remove the respective odorous substances. In the case of the dust treating apparatus, dust is adsorbed and removed by using water .

Conventional fluid treatment plants using the above-described methods have appropriate reaction efficiencies to meet their respective purposes. However, since the reaction efficiency is low in actual sites, excessive use of chemicals, increase in power ratio due to extension of equipment operation time, There was a real problem being raised. For example, in the case of a conventional aeration apparatus, although the high pressure compressed air or oxygen is directly injected into the liquid phase, the solubility of oxygen is low. In the case of the degassing apparatus, the efficiency of degassing is low due to low reactivity with air and substances requiring degassing. Even in the case of the malodor processing apparatus and the dust processing apparatus using the oxidation, reduction, and neutralization reactions, the reactivity is low and the overall performance and efficiency are low.

In addition, due to various reasons as described above, the conventional fluid treatment equipment has a low reaction efficiency, resulting in deterioration of performance and efficiency. As a result, The maintenance cost such as the processing cost, the equipment cost and the electric power cost increases, and the processing time is increased, and the productivity is lowered.

Korean Patent No. 1058321 Korean Patent No. 10-1571092

The present invention can improve the economical efficiency by reducing the manufacturing cost by reducing the manufacturing cost, improve the contact area of the gas with the liquid and the contact time, thereby increasing the reaction efficiency to meet various fluid treatment processes, When the liquid is reacted with the liquid, the reaction can be promoted through the stirring action of the generated liquid and the contact area of the liquid and the gas can be increased to improve the fluid treatment reaction performance, It is an object of the present invention to provide a low-cost and high-efficiency atomizing apparatus which can reduce the maintenance cost including the equipment cost and the electric cost.

According to a first aspect of the present invention, there is provided an atomizing apparatus comprising: an atomizing chamber which is inserted into an atomizing chamber so that an insertion end having a tubular shape is positioned in an atomizing chamber in which a liquid fluid is received; Wherein the gas supply pipe is fixed to the gas supply pipe so as to be spaced apart from the end of the gas supply pipe while the end of the gas supply pipe is immersed in the fluid during operation of the atomizing device, And an impingement member immersed in the fluid and causing the gas to collide with the gas flowing out of the gas supply pipe to atomize the gas in the liquid phase fluid.

According to a second aspect of the present invention, there is provided an atomization chamber having a cylindrical shape, a gas outlet formed at an upper portion of the chamber, an atomizing chamber for receiving a fluid in the chamber, A gas supply pipe which is fixedly inserted into the atomizing chamber and supplies gas into the atomizing chamber and which has an end where the gas is discharged during operation of the atomizing device is immersed in the fluid, A first impingement plate which is installed so as to be in contact with the lower surface of the atomizing device and is immersed in the fluid during operation of the atomizing device, And the first impingement plate is spaced apart from the first impingement plate And a second impingement plate disposed in a direction of the first impingement plate and projecting to the side of the first impingement plate so as to allow the gas to flow out in an upward direction so as to collide with the lower surface and to spread out laterally, And a collision member for causing the collision member to collide with the collision member.

The atomizing apparatus according to the present invention provides the following effects.

First, since a cylindrical atomizing chamber and a gas supply pipe of a tubular shape are used, the manufacturing cost can be reduced because the structure is simple and the manufacturing cost can be reduced, thereby improving the economical efficiency.

Secondly, using a cylindrical atomizing chamber and a gas pipe of a round tube type, the handling is easy and the workability is good and the manufacturing is easy.

Third, the gas introduced through the impingement member is refined in the liquid to improve the gas-liquid contact area and contact time, as well as to increase the gas-liquid contact time by increasing the gas flow time in the liquid, It is possible to increase the reaction efficiency so as to meet each of the required fluid treatment processes.

Fourth, even when the liquid is reacted with the liquid, the reaction can be promoted by utilizing the stirring action of the liquid generated by micronization. By increasing the contact area between the liquid and the gas, the aeration performance can be improved when applied to the aeration device.

Fifth, in the atomizing chamber, the liquid is refined through the venturi module in the main space, and the gas is refined in the liquid through the atomizing device in the subspace. Thus, the air pollution prevention facility, the harmful gas removal facility, , Degassing equipment, aeration equipment, and dust treatment equipment, and thus its application range is wide.

Sixth, the floating material that overflows can be separated and removed from the liquid through the fluid separator to improve the fluid treatment performance.

Seventh, the eliminators are disposed in multiple stages so that the mist collects on the surface, as well as the gas passing through it collides with each other, thereby causing the mist to aggregate, thereby improving the mist collecting effect and preventing the contamination of the rearward pump can do.

1 is a perspective view illustrating an atomizing apparatus according to an embodiment of the present invention.
Fig. 2 is a cross-sectional view showing the gas supply pipe and the impingement member of Fig. 1;
3 is a cross-sectional view illustrating the flow of gas during operation of the atomizing apparatus of FIG.
FIG. 4 is a perspective view showing another embodiment of the atomizing module of FIG. 1; FIG.
FIG. 5 is a cross-sectional view showing another embodiment of the atomizing module of FIG. 1;
FIG. 6 is a front sectional view showing another embodiment of the atomizing chamber of FIG. 1;
7 is a cross-sectional view showing another embodiment of the atomizing module of FIG.
FIG. 8 is a front sectional view showing another embodiment of the atomizing module of FIG. 1; FIG.
FIG. 9 is a top view of the atomizing module of FIG. 8. FIG.
10 is a front sectional view showing still another embodiment of the atomizing module of FIG.
11 is a top view of the atomizing module of FIG.
12 is a configuration diagram showing the configuration of a fluid treatment facility using an atomizing apparatus according to an embodiment of the present invention.
13 is an enlarged cross-sectional front view of the water level adjusting portion of Fig.
FIG. 14 is a front sectional view showing the configuration of the eliminator of FIG. 12 and the fluid flow.
Fig. 15 is a configuration diagram showing an operating state of the fluid treatment facility of Fig. 12; Fig.
Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.
Referring first to FIG. 1, an atomizing apparatus 400 according to an embodiment of the present invention includes an atomizing chamber 100 and an atomizing module 410.
In the atomizing chamber 100, a fluid in a liquid state is accommodated in an internal space, and an upper gas outlet 103 is formed. Here, the atomizing chamber 100 has a circular tube shape and is easy to handle, easy to manufacture, and can be manufactured at a low cost, thereby improving the economical efficiency.
In the meantime, the atomizing chamber 100 shows only the gas outlet 103 which shows the inflow and outflow of the gas. However, it is needless to say that the atomizing chamber 100 may be formed with a liquid-phase fluid supply port for supplying the liquid-phase fluid and a fluid-discharging port for discharging the liquid-phase fluid below.
The atomization module 410 includes a gas supply pipe 200 and a collision member 300. The gas supply pipe 200 serves to supply gas into the atomizing chamber 100. The gas supply pipe 200 has the same diameter. In detail, the gas supply pipe 200 is inserted and fixed into the side of the atomizing chamber 100 such that the insertion end thereof is located in the atomizing chamber 100, . Here, the end of the gas supply pipe 200 through which the gas is discharged is positioned so as to be immersed in the fluid in operation of the atomizing apparatus 400.
The gas supply pipe 200 is a cylindrical pipe, and a general pipe easy to handle can be applied as it is. Therefore, the gas supply pipe 200 is easy to manufacture as well as easy to handle, as well as being economical because it can lower the manufacturing cost, unlike the conventional gas supply pipe 200 which is welded using a steel plate.
Meanwhile, the atomizing device 400 may supply the gas supplied to the gas supply pipe 200 as compressed air, or may form a negative pressure structure inside the atomizing chamber 100, So that the gas can be introduced into the gas supply pipe 200.
2 and 3, the collision member 300 may be installed apart from the end of the gas supply pipe 200, and may be connected to the gas supply pipe 200 through which the gas is discharged during the operation of the atomizing device 400 200 are immersed in the fluid, so that the gas flowing out from the gas supply pipe 200 collides with the lower surface and atomizes in the liquid-phase fluid.
The impact member 300 includes a first impact plate 310 and a second impact plate 320 in a multi-step structure. The first impingement plate 310 is spaced upward from the insertion end of the gas supply pipe 200 and is coupled with the gas supply pipe 200 by the first engagement member 312 to fix the position thereof.
The first engaging member 312 is pillar-shaped and spaced apart along the insertion end of the gas supply pipe 200. One end of the first engaging member 312 is engaged with the insertion end of the gas supply pipe 200, (Not shown).
The first impingement plate 310 is disposed in a transverse direction with respect to a flow direction of the gas flowing out from the gas supply pipe 200 so that the gas flowing out of the gas supply pipe 200 collides with the lower surface.
The second impact plate 320 is spaced apart from the upper portion of the first impact plate 310 and is coupled to the first impact plate 310 by the second engagement member 322, do.
The second engaging member 322 is pillar-shaped and spaced apart from the upper surface of the first impingement plate 310. One end of the second engaging member 322 engages with the upper surface of the first impingement plate 310, And engages with the lower surface of the impact plate 320.
The second impingement plate 320 is disposed in the transverse direction and spreads to the side of the first impingement plate 310 so that the gas that flows out in the upward direction collides with the bottom surface and spreads to the side.
The first impingement plate 310 and the second impingement plate 320 are formed in a disk shape and the second impingement plate 320 is formed larger in diameter than the first impingement plate 310, The gas colliding with the lower surface of the first impingement plate 310 spreads to the side surface.
In the meantime, the first impact plate 310 and the second impact plate 320 are formed in a disk shape corresponding to the flow cross-sectional shape of the gas supply pipe 200 as shown in the drawing, It goes without saying that any gas may be used as long as the gas flowing out from the gas supply pipe 200 can collide with the bottom surface and spread out.
4 is a view showing another embodiment of the gas supply pipe 200a coupled to the atomizing chamber 100a of FIG. 1, the gas supply pipe 200a is inserted and fixed in a lower portion of the atomizing chamber 100a to have a straight pipe structure. In this case, the gas supply pipe 200 can be inserted and fixed directly into the atomizing chamber 100a without bending it, so that the gas supply pipe 200 can be manufactured more easily and smoothly than the gas flow rate. Here, reference numeral 410a denotes an atomizing module.
1, the gas supply pipe 200a is inserted or fixed at the outer circumferential side of the atomizing chamber 100, or inserted and fixed at the lower surface of the atomizing chamber 100a as shown in FIG. 4 as an example However, it is needless to say that the installation position of the gas supply pipes 200 and 200a may vary according to the size and installation space of the device to be designed.
The atomizing apparatus 400 further includes flow rate increasing means for increasing a flow velocity of the gas supplied into the atomizing chamber 100 to be discharged. As an example of this, although not shown, the flow rate increasing means includes a compression pump connected to the gas supply pipes 200 and 200a to increase the flow rate of the gas supplied into the atomizing chambers 100 and 100a.
Referring to FIG. 5, the flow rate increasing means includes a nozzle portion 210b formed at an insertion end of the gas supply pipe 200b to increase the flow rate of the supplied gas and discharge the gas. Sectional area of the insertion portion of the gas supply pipe 200b is formed to be smaller than the cross-sectional area of the inlet portion through which the gas flows, thereby increasing the flow rate of the gas flowing out to the insertion end.
Although the nozzle unit 210b is integrally formed at the insertion end of the gas supply pipe 200b in the figure, the nozzle unit 210b may be a separate And may be fixedly coupled to the insertion end of the gas pipe.
6 is a view showing another embodiment of the atomizing apparatus 400b. Referring to the drawing, the atomizing chamber 100b has a cup shape with an opened top, and the gas flowing out of the gas supply pipe 200 and discharged through the liquid-phase fluid is directly discharged to the outside .
7 is a cross-sectional view showing another embodiment of the atomizing module 410c. Referring to the drawings, the atomization module 410c includes a gas supply pipe 200, a collision member 300a, and a mixing unit 350. [ Here, the gas supply pipe 200 and the collision member 300a are substantially the same as those of the gas supply pipe 200 and the collision member 300a, and a detailed description thereof will be omitted.
The mixing unit 350 includes a mixing injection pipe 351 and an impingement plate 352. The gas injection pipe 200 is inserted and fixed in a tubular shape in the mixing injection pipe 351 so that the insertion end of the gas supply pipe 200 and the collision member 300a are located inside. The mixed injection pipe 351 mixes the liquid fluid introduced from the lower side and the gas flowing out from the gas supply pipe 200 during operation and injects the mixed gas to the upper part.
The impingement plate 352 is provided to be spaced apart from the other end of the mixing blast pipe 351 to cause the liquid to flow out from the mixing blast pipe 351 and the gas to collide with the bottom surface. The impingement plate 352 is preferably formed in a disc shape corresponding to a flat cross-sectional shape of the mixing injection pipe 351, but is not limited thereto.
When the gas is discharged from the gas supply pipe 200 located in the mixed injection pipe 351, the atomization module 410c may be configured such that a fluid in a liquid state downward along the internal flow path of the mixed injection pipe 351 It is sucked up or is sucked up by ambient pressure and then ascends. The upwardly flowing liquid fluid mixes with the gas flowing out from the gas supply pipe 200 and rises together. The liquid and the gas in the raised liquid phase collide with the impingement plate 352 and become fine.
The atomization module 410c is configured to mix the gas and the liquid in the mixing and dispensing tube 351 together with the finer gas by the impact member 300a, The mixing ratio of the gas and the liquid phase can be improved and the structure of the simple structure such as the mixing plate 351 of the tubular shape and the impingement plate 352 of the disk plate type can be improved The mixing ratio between gas and liquid fluid can be improved by simple installation.
As described above, the atomizing apparatuses 400, 400a, and 400b may be configured such that the atomizing chambers 100, 100a, and 400b are cylindrically formed, and the gas supply pipes 200 and 200a of the atomizing modules 410, 410, 410b, It is easy to manufacture and the manufacturing cost can be lowered, so that the manufacturing cost can be reduced and the economical efficiency can be improved.
Referring to FIG. 8, the atomization module 410d includes a gas supply pipe 200 formed in a cylindrical shape, the first impingement plate 310b is formed in a circular plate shape, and the second impingement plate 320b Is formed in the shape of a circular ring plate having an inner diameter larger than the diameter of the first impact plate 310b and the gas supply pipe 200 and the first collision plate 310b and the second collision plate 320b are coaxial Respectively.
9, the first impingement plate 310b is connected to the gas supply pipe 200 by a plurality of first engaging members 312b which are erected and spaced apart from the insertion end of the gas supply pipe 200 in the circumferential direction, As shown in FIG.
The second impact plate 320b is fixed to the upper portion of the first impact plate 310b by a plurality of second engagement members 322b which are erected and spaced apart from the upper surface along the outer periphery of the first impact plate 310b Are spaced apart.
According to the above description, the atomizing module is configured such that the gas emitted from the gas supply pipe 200 collides with the lower surface of the first impingement plate 310b and then spreads to the side of the first impingement plate 310b, And then collides with the lower surface of the second impact plate 320b and spreads laterally.
10 and 11, the atomizing module 410e has a gas duct 200c formed in a rectangular duct shape unlike the atomizing module 410d shown in FIG. 8, and correspondingly, The first impingement plate 310c and the second impingement plate 320c are formed in a rectangular shape.
The first impingement plate 310c is formed to have a larger area than the inner surface area of the gas supply pipe 200c in a plan view. The first impingement plate 310c has a plurality of And is spaced apart from the upper portion of the gas supply pipe 200 by the first engagement member 312c.
Referring to FIG. 11, the first collision plate 310c and the second collision plate 320c are formed by bending a configuration of one square plate in multiple stages. The atomizing module 410e is bent in the longitudinal direction along the outer upper surface of the first collision plate 310c in the transverse direction and bent along the transverse direction to form the second collision plate 320c, And the first impact plate 310c and the second impact plate 320c are integrally formed and bent in multiple stages. In this case, it is easy to manufacture by bending one plate structure in multiple stages without having to form the second engagement member 322b.
As described above, the atomizing module 410d may separately form the first impact plate 310b and the second impact plate 320b and may be coupled through the second engagement member 322b. However, The first impingement plate 310c and the second impingement plate 320c may be integrally formed by bending a single structure into multiple stages.
According to the above description, the atomizing modules 410, 410a, 410b, 410d, and 410e can be easily installed, and the installation points can be installed anywhere, so that the designer can install the modules at desired points. The number of stages of the members 300, 300b, and 300c can be set to a plurality of stages, so that it is possible to design variously, and a variety of designs such as a reduction in pressure by forming a slot or the like in the plate-shaped impact members 300, 300b, and 300c, Apparatuses, degassing apparatuses, oxidation, reduction, neutralization and dust processing apparatuses, and the like.
Hereinafter, a fluid treatment apparatus using the atomizing apparatus will be described. 12, a fluid treatment apparatus according to an embodiment of the present invention includes an atomizing apparatus 400c, a fluid separator 500, a reservoir 600, a suction pump 900, an eliminator 830).
The atomizing apparatus 400c includes an atomizing chamber 100 and an atomizing module 410. [ Here, the atomization module 410 includes the gas supply pipe 200 and the collision member 300, which have been described above, so that a detailed description thereof will be omitted. Hereinafter, Let's take a look.
In the atomizing chamber 100, an inlet through which the gas is introduced is formed, a storage space for storing the liquid 1 is provided therein, an outlet through which the gas introduced into the upper portion is discharged is formed, An overflow outlet 103 through which the liquid 1 to be flowed is discharged is formed.
The storage space includes a sub space 101 into which the gas and the liquid 1 are introduced and in which the liquid 1 is received and a sub space 101 communicating with the sub space 101, And a main space 102 in which the atomizing device 1 is accommodated and the atomizing device 400c is installed.
The fluid treatment facility further includes a venturi module 820 installed in the sub space 101 to refine the liquid 1 introduced into the sub space 101. The venturi module 820 includes a funnel part 821, A discharge portion 822, and an impingement plate 823. The upper portion of the funnel portion 821 is opened so that the base body and the liquid 1 are introduced together and formed to be narrowed downward to increase the flow velocity of the liquid 1 and the base body.
The discharge portion 822 extends downward from the outlet of the funnel portion 821 to guide the liquid 1 and the gas downward.
The impingement plate 823 is spaced apart from the lower portion of the discharge portion 822 and serves to spread the liquid 1 from the discharge portion 822 to the side while colliding with the upper surface of the discharge portion 822 . In the drawing, reference numeral 610 denotes a water tank 810 located above the venturi module 820 to house the liquid 1 and the gas together.
The atomizing chamber 100 includes a water level adjusting unit 110 installed on the overflow outlet 103 side. Referring to FIG. 13, the water level adjusting unit 110 is installed so as to be slidable in the vertical direction with respect to the overflow outlet 103, so that the overflow water level of the liquid 1 can be adjusted. Reference numeral 2 denotes a damper capable of adjusting the flow rate of the flowing gas, and a detailed description thereof will be omitted because a known damper can be applied.
The fluid treatment facility includes a plurality of eliminators 830 disposed above the atomizing device 400c and spaced from each other in a direction opposite to the direction of flow of the gas to remove mist in the storage space .
Referring to FIG. 14, the eliminators 830 are spaced apart from each other along the flow direction of the base body, and are arranged to be offset from each other with respect to the flow direction of the base body. One end of the electromagnet 830 is fixedly coupled to one side of the inner wall of the atomizing chamber 100 and the other end of the electromagnet is coupled to the atomizing chamber 100, And is fixed to the inside of the atomizing chamber 100. As shown in FIG.
In detail, the eliminator 830 includes: a first elevator 831 having a flow cross-sectional shape formed in an inverted oblique shape; a second elevator 831 disposed behind the first elevator 831, Lt; RTI ID = 0.0 > 832 < / RTI >
A drain hole 711 is formed in the first elastic member 831 so that the mist trapped at the lowermost end can be discharged.
Meanwhile, as shown in FIG. 4, the eliminators 830 are arranged in a staggered manner so as to guide the mist passing through the eliminators 830 to collide with each other, thereby reducing the size of the mist To be gravitationally captured, and to minimize the loss of pass-through friction. In addition, the installation height can be reduced, which can reduce the production cost of the facility.
On the other hand, the microbubbles generated by the atomizing module 410 are characterized by a small bubble size, a slow rising rate of bubbles, and a large gas dissolution property. The bubbles have a large frictional resistance, a large bubble pressure, And has the characteristic of being accompanied by dissolution shrinkage, thereby increasing the contact area between the gas and the liquid 1, thereby improving the dust collection, degassing, and absorption performance. Accordingly, the atomizing device 400c can generate the microbubbles of the gas to improve the fluid treatment performance. Further, the atomizing device 400c promotes the floating of the suspended material 3 in the liquid 1, .
The atomization module 410 including the gas supply pipe 200 and the collision member 300 is installed in the atomizing chamber 100. When the operation of the atomization chamber is stopped, the liquid level of the liquid 1 is lowered and exposed to the gas The sub-space 101 is in a negative pressure state and the water level rises to be immersed in the liquid 1, and the inflowing gas is refined in the liquid 1 to form micro bubbles .
The atomizing device 400c is coupled to the gas supply pipe 200 or the impact member 300 and is coupled to the inner wall of the atomizing chamber 100, And a support for supporting the collision member 300. One end of the supporter is coupled to the inner wall of one side of the atomizing chamber 100 and the other end is coupled to the inner wall of the other side of the atomizing chamber 100 facing the inner wall of the atomizing chamber 100, So that the position is fixed.
The fluid separator 500 is connected to the overflow outlet 103 of the atomizing chamber 100 and is connected to the overflow outlet 103 through the surface of the liquid 1 and the liquid 1, The suspended material 3 is introduced and separated from the liquid 1 and the suspended material 3 to remove the suspended material 3 and only the liquid 1 is supplied to the reservoir 600 And serves to reduce the foaming removal load of the storage tank (600).
In detail, the fluid separator 500 includes a separation tank 510, a partition 520, and a liquid supply unit 530. The separation vessel 510 is connected to the overflow outlet 103 to allow the liquid 1 and the suspended material 3 to flow in and the upper portion of the separation vessel 510 to be opened, . In the drawing, the separating tank 510 is divided into a first separating tank into which the overflowed liquid 1 and the suspended material 3 are introduced and a second separating tank in which the separating wall 520 is located behind the first separating tank. However, the present invention is not limited thereto.
The partition 520 serves to separate the liquid 1 and the suspended material 3 from each other. Specifically, the partition 520 is positioned vertically or obliquely with respect to the separating tank 510, and the upper end of the separating tank 510 protrudes higher than the floating material 3 of the separating tank 510, Is spaced apart from the bottom surface of the bath 510 so that the suspended material 3 is removed at the top and only the liquid 1 is allowed to pass downward.
One end of the liquid supply unit 530 communicates with the separation tank 510 at the rear of the partition 520 and the other end communicates with the reservoir 600 to discharge the liquid to the lower side of the partition 520. [ And serves to supply the liquid 1 to the storage tank 600. The liquid supply portion 530 includes a supply line 531 for supplying the liquid 1 and a supply valve 532 disposed on the supply line 531 for regulating the flow rate. Here, the supply line 531 has a plurality of branches as shown in the figure, and can supply the liquid 1 to the reservoir 600.
The reservoir 600 is connected to the fluid separator 500 to receive and store the liquid 1 separated by the fluid separator 500 and to control the type of the liquid 1 and the Depending on the purpose, it can be configured in various ways such as waste water storage tank, flotation tank, liquid storage tank, slurry flotation tank. For example, the reservoir 600 may store the liquid 1 separated from the fluid separator 500 and precipitate the precipitate contained in the liquid 1 to circulate and supply the supernatant. In the case of wastewater, Or the water treatment bacteria can be used to treat the liquid 1, the dissolved oxygen amount can be increased, and the concentrated liquid can be circulated and supplied.
One or a plurality of the storage tanks 600 may be arranged in parallel or in series according to design. Further, the reservoir 600 may be located below the fluid separator 500, and may allow the liquid 1 to flow into the reservoir 600 using a potential energy without a return pump.
Although not shown, a sludge discharge unit may be provided at a lower portion of the atomizing chamber 100 and a lower portion of the storage tank 600, respectively, so that sludge generated during the fluid treatment can be removed.
The fluid treatment facility may be configured as a system for circulating and supplying the liquid 1 of the atomizing chamber 100 by installing a circulation supply unit 700. The circulation supply unit 700 includes a circulation supply line 710, a circulation pump 720, and a flow control valve 730.
One end of the circulation supply line 710 is connected to the reservoir 600 and the other end of the circulation supply line 710 is connected to the upper portion of the atomization chamber 100 to connect the liquid 1 of the reservoir 600 And circulates and supplies the water to the upper portion of the storage space.
The circulation pump 720 is installed on the circulation supply line 710 and forcibly flows the liquid 1, and a known fluid pump or the like can be applied.
The flow control valve 730 controls the flow rate of the liquid 1 flowing on the circulation supply line 710 in front of and behind the circulation pump 720.
The fluid treatment facility communicates with the outlet of the atomizing chamber 100 to suck the gas in the storage space and to bring the storage space into a negative pressure state by a suction force, And a suction pump 900 for raising the level of the water.
Further, the fluid treatment facility further includes a discharge chamber 910 for removing residual dust contained in the gas discharged from the suction pump 900.
The discharge chamber 910 is installed on the rear discharge line of the suction pump 900. The gas discharged from the suction pump 900 flows through the gas inlet and flows in the turbulent state Thereby reducing the flow velocity and precipitating the dust contained in the gas.
The discharge chamber 910 is provided with a guide portion 920 installed at the gas inlet of the discharge chamber 910 and guiding the flow of the introduced gas into the discharge chamber 910 in a turbulent state .
The guide portion 920 is preferably formed to be inclined downward as shown in FIG. 10 so as to induce downward flow of the introduced gas and to form turbulence while colliding with the inner wall of the discharge chamber 910. However, Of course, it is possible to have various shapes.
In the meantime, although the fluid treatment facility shown in FIG. 1 has been applied to the atomization module 410 of FIG. 1, it is also applicable to the atomization module 410b of FIG. 5 and the atomization module 410c ), And the same reference numerals denote the same components.
Fig. 15 is a view showing a state of the fluid treatment facility during operation. Fig. Referring to the drawings, when the suction pump 900 is operated in a state where the liquid 1 is stored in the storage space, the inside of the sub space 101 is in a state of a negative pressure lower than atmospheric pressure The difference between the outside and the air pressure is generated.
When the pressure difference is generated as described above, the liquid level of the liquid 1 in the sub space 101 is increased, so that the gas supply pipe 200 and the impingement member 300 are immersed in the liquid 1, do.
The gas introduced into the gas supply pipe 200 is injected in the liquid 1 in the sub space 101 and is micronized while colliding with the collision member 300 to generate micro bubbles and contact with the liquid 1 . The gas formed by the microbubbles dissolves harmful components as they come into contact with the liquid 1, or the oxygen of the gas in the liquid 1 is dissolved or aeration and degassing are performed and then discharged. As described above, the fluid treatment facility has a structure in which the gas is refined in the sub-space 101 and the liquid 1 is refined in the main space 102 through the venturi module 820.
On the other hand, the above-described fluid treatment facility can be applied to an aeration device, a degassing device, and a dust treatment device. In this regard, the fluid treatment facility can be applied as an aeration device for the activated sludge process. For this, the gas is made of atmospheric gas and supplies the atmospheric gas to the inlet of the atomizing chamber 100. The liquid 1 is composed of treatment water containing microorganisms and is supplied by the circulation supply line 710 The treated water can be supplied to and stored in the storage space and the treated water can be brought into contact with oxygen in the atmospheric gas through the atomizing device 400c to increase the oxygen concentration in the liquid 1 .
Next, the fluid treatment facility may be applied as a gas stripper. For this, the gas is made of atmospheric gas and supplies the atmospheric gas to the inlet of the atomizing chamber 100. The liquid 1 is composed of wastewater containing a nitrogen component and is supplied to the circulation supply line 710 Thereby allowing the wastewater to be supplied to and stored in the storage space, and allowing the wastewater to come into contact with oxygen in the atmospheric gas through the atomizing device 400c to adsorb and remove the nitrogen in the wastewater. At this time, the atomizing device 400c expands the gas-liquid contact area or the gas-gas contact area, thereby inducing an increase in the degassing effect.
Further, the fluid treatment facility can be applied as a dust treatment apparatus. In this case, the gas is composed of dust-containing dust gas and supplies the dust gas to the inlet of the atomizing chamber 100. The liquid 1 is composed of water, Is supplied to and stored in the storage space and the dust gas is brought into contact with the water through the atomizing device 400c to adsorb and remove the dust contained in the dust gas in the water.
In addition, the fluid treatment facility can be applied to a water supply system. In this case, the liquid in the atomization chamber 100 is supplied with raw water. At this time, the fluid treatment facility may supply the supplied gas as carbon dioxide to adjust the pH of the raw water to increase, and may also supply sodium hypochlorite (NaOCl) to improve water quality by disinfecting the raw water. The sodium hypochlorite may be supplied to the raw water in the atomizing chamber 100 or the sodium hypochlorite may be supplied to the raw water by supplying the raw water in the storage tank 600 or the circulating supply line 710, It is needless to say that various embodiments are possible as long as they can supply.
When the fluid treatment facility is applied to a water supply system, it is preferable to apply the atomization module 410c of FIG. This is because the fluid treatment facility having a good gas-liquid mixing ratio and a good reaction rate can solve the problem that conventional carbon dioxide is not sufficiently dissolved in the raw water, and it is possible to simply connect the gas supply pipe 200 to a carbon dioxide supply source This is because the equipment cost can be reduced.
While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims. Accordingly, the true scope of the present invention should be determined by the technical idea of the appended claims.

100, 100a, 100b ... atomizing chamber 101 ... subspace
102 ... main space 103 ... gas outlet
200, 200a, 200b, ... gas supply pipe 210b,
300, 300b, 300c, ... Collision members 310, 310b, 310c ... First collision plate
312c, 312c, 312c, ..., 312c, ...,
322, 322b, 322c ... second engaging member 350 ... mixed portion
351 ... blending sprayer 352 ... collision plate
400, 400a, 400b, 400c ... Atomizing device
410, 410a, 410b, 410d, 410e ... Atomizing module
500 ... fluid separator 510 ... separator
520 ... partition wall portion 530 ... liquid supply portion
531 ... supply line 532 ... supply valve
600 ... storage tank 700 ... circulation supply part
710 ... circulation supply line 720 ... circulation pump
730 ... flow control valve 810 ... water tank
820 ... Venturi module 821 ... funnel part
822 ... discharge portion 823 ... collision plate
830 ... Eliminator 831 ... First Eliminator
832 ... Second Eliminator 900 ... Suction pump
910 ... discharge chamber 920 ... guide portion

Claims (12)

In an atomizing apparatus,
The atomizing chamber is inserted into the atomizing chamber so that an insertion end having a tubular shape is positioned in the atomizing chamber in which a liquid fluid is received and the gas is supplied into the atomizing chamber, A gas supply pipe which is immersed in the fluid and is fixed to the gas supply pipe so as to be spaced apart from the end of the gas supply pipe so as to be immersed in the fluid during operation of the atomizing device and to collide with the gas flowing out from the gas supply pipe And an impingement member for atomizing the gas in the liquid phase fluid. The method according to claim 1,
The gas supply pipe,
Wherein the atomizing chamber is inserted through the side of the atomizing chamber and the insertion end of the atomizing chamber is bent upward. The method according to claim 1,
The gas supply pipe,
Wherein the atomizing chamber has a vertical tube structure inserted through the bottom of the atomizing chamber. The method according to claim 1,
Further comprising flow rate increasing means connected to the gas supply line to increase the flow rate of the gas supplied into the atomizing chamber. The method of claim 4,
Wherein the flow velocity increasing means comprises:
And a compression pump connected to the gas supply pipe to increase the flow rate of the gas. The method of claim 4,
Wherein the flow velocity increasing means comprises:
And a nozzle unit integrally connected to the insertion end of the gas supply pipe and formed to have a cross sectional area smaller than a cross sectional area of the inlet unit through which the gas flows, thereby increasing the flow rate of the gas. The method according to claim 1,
The impact member
A plurality of first engagement members spaced apart from an insertion end of the gas supply pipe so as to be spaced apart from each other in an outer circumferential direction and spaced apart from the upper portion of the gas supply pipe and disposed transversely with respect to the gas outflow direction, And a first impingement plate for causing the outflowing gas to collide with the lower surface. The method of claim 7,
The impact member
A second collision plate disposed to be spaced apart from the upper portion of the first collision plate and disposed in a lateral direction so as to spread out to the side of the first collision plate so that the gas collides with the lower surface and flows out to the side, Comprising an atomizing device. The method of claim 8,
The second impingement plate may include:
Wherein the first and second collision plates are coupled to each other by a plurality of second engaging members that are erected on an upper surface of the first collision plate. The method of claim 8,
The second impingement plate may include:
Wherein the first impingement plate is bent in a longitudinal direction along an outer upper surface of the first impingement plate, the end portion is bent along the transverse direction, and is integrally formed with the first impingement plate. In an atomizing apparatus,
An atomization chamber in which a gas outlet is formed at an upper portion in a cylindrical shape, and a liquid fluid is accommodated in the chamber;
Wherein the gas is supplied into the atomizing chamber by inserting the insertion end into the atomizing chamber so that the insertion end is located in the atomizing chamber, A locked gas supply pipe;
A first impingement plate which is provided in a disc shape so as to be spaced from an end of the gas supply pipe and which is submerged in the fluid when the atomizing apparatus is operated and which is disposed laterally, And a second impingement plate having a diameter larger than that of the first impingement plate and spaced apart from the upper portion of the first impingement plate and disposed in a lateral direction, And a second impingement plate which collides with the lower surface and spreads to the side surface, the impingement member atomizing the gas in the liquid phase fluid. In an atomizing apparatus,
An atomization chamber in which a liquid fluid is received; And
A gas supply pipe inserted and fixed into the atomizing chamber in a tubular shape to supply gas into the atomizing chamber and an end portion of the atomizing device to which the gas is discharged during the operation of the atomizing device is immersed in the fluid; A collision member which is provided so as to be spaced apart from the fluid and which is immersed in the fluid at the time of operation of the atomizing device and which atomizes in the liquid phase by causing the gas flowing out from the gas supply line to collide with the lower surface, The gas supply pipe is inserted and fixed so that the insertion end of the gas supply pipe and the impingement member are located inside and the liquid flowing from the one end side during operation is mixed with the gas flowing out from the gas supply pipe and is sprayed to the other end And a control unit for controlling the flow of the mixed gas from the other end of the mixing / An atomizing module including a mixing portion including a liquid-phase fluid which is installed at a predetermined distance from the mixing tube, and a collision plate which causes the gas to collide with the liquid-state fluid which flows out from the mixing tube.

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