JP2018202319A - Cleaning device and cleaning method - Google Patents

Abstract

To provide a cleaning device which enables improvement of stability of a floating position of a cleaned object during cleaning.SOLUTION: A cleaning system 100 includes: a chamber 1 which has an introduction port 1A for introducing a cleaning fluid L, a discharge port 1B for discharging the cleaning fluid L, and a first cylindrical part 1C in which the cleaning fluid L may circulate between the introduction port 1A and the discharging port 1B and houses a cleaned object P at the inner side of the first cylindrical part 1C; and a pump system 6 which has a pump 6c for suctioning the liquid fluid L in the first cylindrical part 1C through the discharge port 1B and forms flow of the cleaning fluid L flowing from the introduction port 1A to the discharge port 1B in the first cylindrical part 1C.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a cleaning apparatus and a cleaning method.

For example, a cleaning method in which an object to be cleaned is immersed in a cleaning liquid or sprayed with a cleaning liquid is known. In a cleaning apparatus used for such a cleaning method, cleaning is often performed in a state where an object to be cleaned is held by a holding jig. However, in a state where the object to be cleaned is held by the holding jig, there is a possibility that a portion where the cleaning liquid does not come into contact may be generated, or unevenness may occur in how the cleaning liquid touches. For this reason, there exists a problem that there exists a possibility that dirt may remain in a part of cleaning object.
For example, in recent years, it is more preferable to use a cleaning method that does not use a holding jig during cleaning for an object to be cleaned that has a relatively small portion that can be held, such as an optical member that has been significantly downsized.
For example, in Patent Document 1, an optical member is washed in a floating state by a floating means having a gas ejection portion that floats the optical member by ejecting gas and a cleaning fluid that is a mixture of liquid and gas or liquid. And an optical member cleaning device comprising a cleaning means.

JP 2013-237596 A

However, the conventional techniques as described above have the following problems.
According to the technique described in Patent Document 1, the object to be cleaned is suspended by the ejection of gas. However, in the first place, it is not so easy to stabilize the floating position of the object to be cleaned by gas ejection. Furthermore, in the technique described in Patent Document 1, the cleaning object is cleaned by spraying the cleaning fluid onto the floating cleaning object. For this reason, there is a possibility that the floating position of the object to be cleaned may be further destabilized at the point where the cleaning fluid is jetted. If the object to be cleaned is ejected from the jet of gas, the object to be cleaned may fall and become dirty or damaged.

  The present invention has been made in view of the above problems, and an object of the present invention is to provide a cleaning apparatus and a cleaning method in which the stability of the floating position of an object to be cleaned during cleaning is improved.

  In order to solve the above-described problem, the cleaning device according to the first aspect of the present invention includes an introduction port that introduces a fluid, a discharge port that discharges the fluid, and a gap between the introduction port and the discharge port. A cylindrical portion through which fluid can circulate, and a chamber that houses an object to be cleaned inside the cylindrical portion, and a pump that sucks the fluid in the cylindrical portion through the discharge port, A pump system configured to form a flow of the fluid from the introduction port toward the discharge port in a cylindrical portion.

  In the cleaning apparatus, the fluid may be a cleaning liquid.

  In the cleaning apparatus, the cylindrical portion may be arranged such that the discharge port is on the upper side of the introduction port.

  In the cleaning apparatus, a diameter-reducing portion that is reduced in diameter in a direction from the introduction port toward the discharge port may be formed on the inner peripheral surface of the cylindrical portion.

  The cleaning apparatus may further include a storage tank that stores the fluid, and the pump system may circulate the fluid between the chamber and the storage tank.

  In the cleaning apparatus, the pump system may include a flow rate control valve that controls a suction amount of the fluid from the discharge port.

  In the cleaning device, a locking portion having an opening that can be closed by the object to be cleaned is provided on the inner peripheral surface of the cylindrical portion, and the object to be cleaned is obtained by suction of the fluid by the pump system. An object may be capable of being adsorbed to the locking portion.

  In the cleaning device, the locking portion may be made of an elastic member that can be deformed when the cleaning object contacts.

  In the said washing | cleaning apparatus, you may further provide the position detector which detects the position of the said washing | cleaning target object in the said cylindrical part.

  The cleaning apparatus further includes a control unit that controls the position of the cleaning object in the direction along the flow in the cylindrical portion by driving the pump system based on the detection output of the position detector. May be.

  The cleaning apparatus may further include an ultrasonic oscillator that applies ultrasonic vibrations to the inside of the cylindrical portion of the chamber.

  The cleaning device according to the second aspect of the present invention includes an introduction port for introducing a fluid, a discharge port for discharging the fluid, and a cylindrical portion through which the fluid can flow between the introduction port and the discharge port. A reduced diameter portion formed in the cylindrical portion and having a diameter reduced in a direction from the introduction port toward the discharge port, and a chamber for storing an object to be cleaned inside the cylindrical portion, A pump system that forms a flow of the fluid from the inlet to the outlet in the cylindrical portion.

  The cleaning method according to the third aspect of the present invention includes an introduction port for introducing a fluid, a discharge port for discharging the fluid, and a cylindrical portion through which the fluid can flow between the introduction port and the discharge port. Preparing a chamber for containing the object to be cleaned inside the cylindrical part, and disposing the cylindrical part so that the discharge port is on the upper side of the introduction port; Forming the flow of the fluid from the inlet to the outlet in the inside of the tubular portion in a state in which the object to be cleaned is accommodated in the inside of the tubular portion, and the flow rate of the flow Controlling the object to be cleaned in a state where the object to be cleaned is suspended inside the cylindrical portion.

  In the cleaning method, the chamber is prepared to be movable between a plurality of storage tanks storing different fluids, and the fluid stored in a first storage tank among the plurality of storage tanks. After the cleaning is completed by the above, the fluid is sucked from the discharge port to adsorb the object to be cleaned to the inside of the cylindrical portion, and the chamber to which the object to be cleaned is adsorbed And moving to a second storage tank among the plurality of storage tanks.

  The cleaning apparatus and the cleaning method of the present invention can improve the stability of the floating position of the cleaning object during cleaning.

It is a typical block diagram which shows an example of the washing | cleaning apparatus of the 1st Embodiment of this invention. It is a typical longitudinal cross-sectional view which shows the flow of the washing | cleaning fluid in the chamber of the washing | cleaning apparatus of the 1st Embodiment of this invention. It is a flowchart which shows an example of the washing | cleaning method of the 1st Embodiment of this invention. It is a flowchart which shows an example of the cleaning control in the cleaning method of the 1st Embodiment of this invention. It is operation | movement explanatory drawing of the washing | cleaning apparatus of the 1st Embodiment of this invention. It is operation | movement explanatory drawing of the washing | cleaning apparatus of the 1st Embodiment of this invention. It is a typical block diagram which shows an example of the washing | cleaning apparatus of the 2nd Embodiment of this invention. It is a typical block diagram which shows an example of the washing | cleaning apparatus of the 3rd Embodiment of this invention. It is a typical longitudinal cross-sectional view which shows the principal part of the washing | cleaning apparatus of the modification (1st modification) of the 3rd Embodiment of this invention. It is a typical block diagram which shows an example of the washing | cleaning apparatus of the 4th Embodiment of this invention. It is operation | movement explanatory drawing of the washing | cleaning apparatus of the 4th Embodiment of this invention. It is a flowchart which shows an example of the cleaning control in the cleaning method of the 4th Embodiment of this invention. It is a typical block diagram which shows an example of the washing | cleaning apparatus of the 5th Embodiment of this invention. It is a typical longitudinal section showing an example of the principal part of the washing device of a 6th embodiment of the present invention. It is AA sectional drawing in FIG.

  Embodiments of the present invention will be described below with reference to the accompanying drawings. In all the drawings, even if the embodiments are different, the same or corresponding members are denoted by the same reference numerals, and common description is omitted.

[First Embodiment]
A cleaning apparatus and a cleaning method according to the first embodiment of the present invention will be described.
FIG. 1 is a schematic configuration diagram illustrating an example of a cleaning device according to a first embodiment of the present invention. FIG. 2 is a schematic longitudinal sectional view showing the flow of the cleaning fluid in the chamber of the cleaning apparatus according to the first embodiment of the present invention.
Since each drawing is a schematic diagram, the shape and dimensions are exaggerated (the following drawings are also the same).

As shown in FIG. 1, the cleaning system 100 of the present embodiment is a cleaning device that cleans an object to be cleaned P with a cleaning liquid L (fluid).
The type of the cleaning object P is not limited. As will be described later, in the cleaning system 100, the cleaning object P is cleaned while being floated against the gravity in the cleaning liquid L, so that the cleaning object P is held by a holding jig or the like during the cleaning. Absent. For this reason, the cleaning target P may be a member having a shape that is difficult to hold with a holding jig or the like, or a member that easily causes uneven cleaning when held with a holding jig. For example, as the cleaning object P, a glass member, a resin member, or the like that is used as an optical member or a raw material of the optical member may be used.

The shape of the cleaning object P is not limited as long as the shape can be accommodated in the chamber 1 described later. FIG. 1 illustrates an example in which the cleaning target P is a sphere as an example. However, the shape of the cleaning target P is not limited to a sphere. The shape of the object to be cleaned P may be, for example, a spheroid, disk, polyhedron, plate, rod, cylinder, or the like. The cleaning target P may have an appropriate lens shape such as a biconvex lens, a planoconvex lens, a biconcave lens, a planoconcave lens, or a meniscus lens. The cleaning target P may have the shape of an optical member such as an appropriate prism or reflection mirror.
In the present embodiment, since the cleaning object P is not held by the holding jig during cleaning, the surface shape of the cleaning object P may have an appropriate uneven shape that impedes holding. Good.
The cleaning object P may have a shape such as a substantially spherical shape, a substantially cubic shape, a substantially cylindrical shape, or a substantially prismatic shape in that the floating state is more stable when floating in the flow of the cleaning liquid L. preferable.

The cleaning target P shown in FIG. 1 is a sphere having a diameter D as an example. Examples of the cleaning object P having such a shape include a spherical lens and a glass mold lens preform.
Hereinafter, for the sake of simplicity, the configuration of the cleaning system 100 will be described using an example in which the cleaning target P made of a sphere having an outer diameter D is cleaned.

  The type of the cleaning liquid L is not particularly limited as long as the cleaning target P can be cleaned. In this specification, cleaning refers to cleaning in a broad sense including rinsing. For example, the cleaning liquid L may be pure water, an aqueous cleaning agent, an organic solvent, a solution containing a surfactant, or the like.

  The cleaning system 100 includes a storage tank 7, an ultrasonic oscillator 8, a chamber 1, and a pump system 6. The cleaning system 100 further includes a control unit 9A that controls operations of the ultrasonic oscillator 8 and the pump system 6.

The storage tank 7 stores the cleaning liquid L. The upper opening 7a of the storage tank 7 has a size that allows passage of a chamber 1 described later.
In FIG. 1, the storage tank 7 is drawn to the depth which can immerse the whole chamber 1 mentioned later as an example. However, the storage tank 7 only needs to have a depth at which the inlet 1A at the lower end of the chamber 1 described later can be immersed in the state where the cleaning liquid L is stored.
The cleaning liquid L in the storage tank 7 may be supplied with an unused cleaning liquid L by a supply system (not shown) provided outside the storage tank 7. The cleaning liquid L in the storage tank 7 may be circulated and used by a circulation system (not shown) provided outside the storage tank 7. When a circulation system is used, it is more preferable that a cleaning device for cleaning the cleaning liquid L is provided on the circulation path.
An ultrasonic oscillator 8 is installed on the bottom surface portion 7 b of the storage tank 7.

  The ultrasonic oscillator 8 applies ultrasonic vibrations to the cleaning liquid L stored in the storage tank 7. The ultrasonic oscillator 8 is communicably connected to a control unit 9A described later. The operation of the ultrasonic oscillator 8 is controlled by a control signal from the control unit 9A.

The chamber 1 is formed in a cylindrical shape having a through hole at the center. The through hole of the chamber 1 is configured by connecting a first inner peripheral surface 1a, a reduced diameter portion 1b, and a second inner peripheral surface 1c in this order. Therefore, the chamber 1 includes a first cylindrical portion 1C (cylindrical portion) in which a first inner peripheral surface 1a and a reduced diameter portion 1b are formed, and a second inner peripheral surface 1c in which the second inner peripheral surface 1c is formed. 2 cylindrical parts 1D.
In the present specification, a “cylindrical” shape is a circular cross section perpendicular to the central axis of the through hole and the outer shape (hereinafter referred to as a cross section perpendicular to the axis) as long as a through hole is formed in the center. It is not limited to. For example, the cross section perpendicular to the axis of the “cylindrical” shaped through hole may be circular, elliptical, polygonal, or the like. For example, the cross section perpendicular to the axis of the “cylindrical” outer shape may be circular, elliptical, polygonal, or the like.

The first inner peripheral surface 1a and the reduced diameter portion 1b, which are inner peripheral surfaces of the first cylindrical portion 1C, have a size that can accommodate the cleaning object P inside thereof. The first inner peripheral surface 1 a is open at the first end E <b> 1 of the chamber 1. An introduction port 1A is formed in the first end E1 by the first inner peripheral surface 1a.
For example, in the example shown in FIG. 2, the first inner peripheral surface 1a has an inner diameter da (where da> D) and a length h (where h > D) cylindrical surface shape. In this case, the introduction port 1A is a circular opening having a diameter da.
For example, in the example shown in FIG. 2, the reduced diameter portion 1b has a tapered surface shape that gradually decreases from the inner diameter da to the inner diameter db (where db <D).

The second inner peripheral surface 1c, which is the inner peripheral surface of the second cylindrical portion 1D, has a size through which the cleaning liquid L cannot pass and the cleaning target P cannot pass. The second inner peripheral surface 1c is connected to the end of the reduced diameter portion 1b in the reduced diameter direction. The second inner peripheral surface 1 c is open at the second end E <b> 2 of the chamber 1. A discharge port 1B is formed at the second end E2 by the second inner peripheral surface 1c.
For example, in the example shown in FIG. 2, the second inner peripheral surface 1c has a cylindrical surface shape with an inner diameter db. In this case, the discharge port 1B is a circular opening having a diameter db. At the boundary between the second inner peripheral surface 1c and the reduced diameter portion 1b, a locking portion 1d that is a circular corner portion having an inner diameter db is formed. The locking part 1d has a shape that allows the cleaning object P to be in line contact over the entire circumference of the locking part 1d. When the cleaning target P contacts the entire circumference of the locking portion 1d, the second inner peripheral surface 1c is closed.
If such a locking portion 1d can be formed, for example, the second inner peripheral surface 1c may have a shape that increases in diameter from the reduced diameter portion 1b toward the opposite side to the first inner peripheral surface 1a. For example, the second inner peripheral surface 1c may have a shape that decreases in diameter from the locking portion 1d toward the discharge port 1B.

  As shown in FIG. 1, a pipe connection portion 2 for connecting a pump system 6 described later is provided at the discharge port 1 </ b> B of the chamber 1. When a suction pipe 6a of a pump system 6 to be described later is connected to the pipe connecting portion 2, the discharge port 1B of the chamber 1 and the suction pipe 6a communicate with each other.

  Such a chamber 1 is formed of an appropriate material having such a rigidity that the inner diameter of the through hole can be kept substantially constant when the flow of the cleaning liquid L is formed therein. For example, the chamber 1 may be formed of metal, resin, or a composite material of metal and resin. It is more preferable that the material used for the chamber 1 has a lower hardness than the material of the cleaning object P so that the cleaning object P is less likely to be damaged when the cleaning object P comes into contact therewith. The material used for the chamber 1 may be an elastic material in which the vicinity of the locking portion 1d is elastically deformed when the cleaning object P comes into contact with the locking portion 1d. In this case, the adhesiveness with the cleaning object P is improved by elastically deforming the vicinity of the locking portion 1d when the cleaning object P comes into contact. For this reason, the 2nd inner peripheral surface 1c is more reliably obstruct | occluded by the cleaning target P.

As shown in FIG. 1, a first position detection sensor 3 (position detector), a second position detection sensor 4 (position detector) are provided in the first cylindrical portion 1 </ b> C where the first inner peripheral surface 1 a is formed. ) And a third position detection sensor 5 (position detector). For simplicity, hereinafter, the first position detection sensor 3, the second position detection sensor 4, and the third position detection sensor 5 may be collectively referred to as “each position detection sensor”.
Each position detection sensor detects the position of the cleaning object P along the axial direction of the first cylindrical portion 1C inside the first cylindrical portion 1C.
The configuration of each position detection sensor is not limited as long as the position of the cleaning object P floating in the cleaning liquid L can be detected in a non-contact state. In the example shown in FIG. 1, each position detection sensor has sensor portions 3 a, 4 a, and 5 a on the first inner peripheral surface 1 a. Each position detection sensor generates a detection signal when the cleaning object P is positioned in front of the sensor units 3a, 4a, and 5a (left side in the drawing). Each position detection sensor is communicably connected to a control unit 9A described later. The detection signal of each position detection sensor is sent to the control unit 9A.

Each position detection sensor may have a common configuration with each other, or may have a configuration different from each other.
For example, an optical sensor including a light emitting unit that projects detection light and a light receiving unit that receives reflected light of the detection light may be used as each position detection sensor. As the detection light, LED light, laser light, or the like may be used.
For example, as each position detection sensor, a capacitance sensor having an electrode as a sensor unit may be used.

The sensor portion 3a of the first position detection sensor 3 is disposed in the vicinity of the reduced diameter portion 1b on the first inner peripheral surface 1a. The sensor unit 3a is disposed at a position where it can be detected that the cleaning object P is inside the first cylindrical portion 1C and the opening of the second inner peripheral surface 1c in the reduced diameter portion 1b is not blocked. Has been.
The sensor portion 5a of the third position detection sensor 5 is disposed in the vicinity of the first end E1 on the first inner peripheral surface 1a.
The sensor portion 4a of the second position detection sensor 4 is disposed between the sensor portions 3a and 5a in the axial direction of the first cylindrical portion 1C. The sensor unit 4a is disposed at a position where it can be detected that the entire cleaning object P is inside the first cylindrical part 1C. More preferably, the distance between the sensor portions 3a and 4a in the axial direction of the first tubular portion 1C is as long as possible.
In the present embodiment, as an example, the distance between the sensor portions 3a and 4a in the axial direction of the first cylindrical portion 1C is larger than the outer diameter D of the cleaning target P. For this reason, the cleaning target P is not simultaneously detected by the first position detection sensor 3 and the second position detection sensor 4.
Furthermore, the distance between the sensor parts 4a and 5a in the axial direction of the first cylindrical part 1C is smaller than the outer diameter D of the cleaning object P. For this reason, when the cleaning target P crosses the sensor units 4a and 5a, the cleaning target P may be simultaneously detected by the second position detection sensor 4 and the third position detection sensor 5.

The pump system 6 is an apparatus part that forms a flow of the cleaning liquid L from the introduction port 1A toward the discharge port 1B inside the first cylindrical portion 1C. In the example shown in FIG. 1, the pump system 6 includes a suction pipe 6a, a pump 6c, and a discharge pipe 6b.
The suction pipe 6 a is a pipe member for sucking the cleaning liquid L in the chamber 1. Both ends of the suction pipe 6a are connected to the pipe connecting part 2 of the chamber 1 and the pump 6c, respectively.
The pump 6c sucks the cleaning liquid L from the suction pipe 6a. A discharge pipe 6b is connected to the pump 6c. The pump 6c discharges the sucked cleaning liquid L to the discharge pipe 6b.
The configuration of the pump 6c is not particularly limited as long as the cleaning liquid L can be sucked and discharged. For example, an axial flow pump, a turbine pump, or the like may be used as the pump 6c. The pump 6c is communicably connected to a control unit 9A described later. The operation of the pump 6c is controlled by a control signal from the control unit 9A.
The discharge pipe 6 b is a tubular member for returning the cleaning liquid L discharged by the pump 6 c into the storage tank 7. For this reason, the one end part of the discharge pipe 6b is connected to the discharge port of the pump 6c. The other end of the discharge pipe 6 b is disposed inside the storage tank 7.

  Although not particularly illustrated, in the pump system 6, a filter device that removes dirt of the cleaning liquid L may be provided in at least one of the suction pipe 6a and the discharge pipe 6b.

The control unit 9A controls the overall operation of the cleaning system 100. The control unit 9A is connected to at least the first position detection sensor 3, the second position detection sensor 4, the third position detection sensor 5, the ultrasonic oscillator 8, and the pump 6c so as to be communicable. Although not shown, an operation unit operable by an operator is connected to the control unit 9A.
The control unit 9A starts control of each device portion of the cleaning system 100 when an operation start operation input is made to the operation unit. For example, the controller 9A controls the flow of the cleaning liquid L in the first cylindrical portion 1C by sending a control signal to the pump 6c. For example, the control unit 9A causes the cleaning target P to float inside the first cylindrical portion 1C based on the detection output of each position detection sensor. For example, the control unit 9A starts ultrasonic cleaning by the ultrasonic oscillator 8 in a state where the cleaning target P is floating.
A specific control operation of the control unit 9A will be described in an operation description of the cleaning system 100 described later.

  The device configuration of the control unit 9A includes, for example, a computer including a CPU, a memory, an input / output interface, an external storage device, and the like. In the computer constituting the control unit 9A, an appropriate control program for performing the control operation described above and later is executed.

Next, the operation of the cleaning system 100 of this embodiment will be described focusing on the cleaning method of this embodiment performed using the cleaning system 100.
FIG. 3 is a flowchart showing an example of the cleaning method according to the first embodiment of the present invention. FIG. 4 is a flowchart illustrating an example of cleaning control in the cleaning method according to the first embodiment of the present invention. 5 and 6 are operation explanatory views of the cleaning apparatus according to the first embodiment of the present invention.

The cleaning method of the present embodiment is performed by executing steps S1 to S5 shown in FIG. 3 according to the flow shown in FIG.
In step S1, a cleaning system 100 that is a cleaning device of the present embodiment is prepared. The cleaning system 100 includes a chamber 1.
The storage tank 7 stores the cleaning liquid L by a predetermined amount. Furthermore, the cleaning object P is immersed in the cleaning liquid L by a conveyance jig (not shown). The configuration of the conveying jig is not limited as long as the cleaning object P can be placed so as to be sucked upward. For example, as a transport jig, a transport rod, a transport pallet, or the like held by a moving unit such as a moving robot may be used. The conveyance jig may be withdrawn from between the introduction port 1A and the ultrasonic oscillator 8 until Step S4 described later is started.
Thus, step S1 is completed.

Step S2 is performed after step S1. In step S <b> 2, the chamber 1 is disposed in the storage tank 7. A pump system 6 is connected to the chamber 1.
When the suction pipe 6a is configured by a flexible pipe, the positional relationship between the pump 6c and the discharge pipe 6b with respect to the storage tank 7 may be fixed by a support member (not shown).
The chamber 1 and the pump system 6 may be supported so as to be movable in the horizontal and vertical directions, for example, by a moving jig (not shown). Hereinafter, an example in which the operator controls the position and posture of the chamber 1 by operating a movement jig (not shown) will be described.
The chamber 1 is disposed in the cleaning liquid L of the storage tank 7 such that the discharge port 1B is located above the introduction port 1A. In the present embodiment, as shown in FIG. 1, the central axis of the first cylindrical portion 1 </ b> C of the chamber 1 is arranged in a posture that is parallel to the vertical axis.
1 A of inlets are positioned in the positional relationship which covers the washing | cleaning target object P arrange | positioned in the storage tank 7 from the upper side. More preferably, the center of the introduction port 1A faces the center of the cleaning object P in the vertical direction.
Such an arrangement position and arrangement posture of the chamber 1 are kept constant by a moving jig (not shown) until cleaning described later is completed.
Step S2 is complete | finished above.

Step S3 is performed after step S2. In step S3, a flow of the cleaning liquid L that is a fluid is formed in the chamber 1 from the inlet 1A toward the outlet 1B.
Specifically, the control operation by the control unit 9A is started when the operator inputs an operation input for starting the cleaning operation to the control unit 9A via an operation unit (not shown).
The controller 9A sends a control signal for operating the pump 6c to the pump 6c so as to suck the cleaning liquid L having a predetermined flow rate q0. The pump 6c sucks the cleaning liquid L at the flow rate q0 from the suction pipe 6a based on the sent control signal, and discharges the sucked cleaning liquid L at the flow rate q0 to the discharge pipe 6b (see the arrow in FIG. 1). Here, the flow rate q0 is set to such a size that the cleaning object P disposed in the vicinity of the introduction port 1A can be sucked into the first cylindrical portion 1C from the introduction port 1A.

As illustrated in FIG. 2, the cleaning liquid L is sucked from the discharge port 1 </ b> B of the chamber 1, whereby a flow of the cleaning liquid L from the introduction port 1 </ b> A toward the discharge port 1 </ b> B is formed inside the chamber 1. Outside the chamber 1 below the chamber 1, the introduction port 1 </ b> A is a suction port for the cleaning liquid L. For this reason, the cleaning target P below the inlet 1A is sucked into the first cylindrical portion 1C from the inlet 1A along the flow F1 flowing from the outside of the chamber 1 into the inlet 1A.
A flow F2 that rises along the central axis of the first inner peripheral surface 1a is formed inside the first inner peripheral surface 1a. Since the reduced diameter portion 1b is formed at the upper portion of the first inner peripheral surface 1a, the flow F2 is accelerated more than the flow velocity in the first inner peripheral surface 1a when entering the inside of the reduced diameter portion 1b. When entering the second inner peripheral surface 1c, in the present embodiment, since the inner diameter of the second inner peripheral surface 1c is constant, in the flow F3 in the second inner peripheral surface 1c, the highest flow velocity in the reduced diameter portion 1b is obtained. Kept.
When the cleaning object P is sucked into the first cylindrical portion 1C, step S3 is completed. Whether or not the cleaning object P has been sucked into the first cylindrical portion 1C is determined by the control unit 9A by analyzing the detection output of each position detection sensor, as will be described later.

Step S4 is performed after step S3. In step S4, the cleaning target P is cleaned while the cleaning target P is suspended inside the first cylindrical portion 1C.
When the cleaning object P enters the flow field formed in step S3, the cleaning object P is guided in the vicinity of the central axis of the first inner peripheral surface 1a in the radial direction. For example, when the cleaning object P approaches the first inner peripheral surface 1a due to the disturbance of the flow F2, the resultant pressure of the pressure acting on the cleaning object P in the radial direction pushes the cleaning object P back on the central axis. Works. For this reason, the cleaning target P floats in the vicinity of the central axis of the first inner peripheral surface 1a while maintaining non-contact with the first inner peripheral surface 1a by the flow F2.
Further, in the axial direction, since the flow F2 is accelerated in the reduced diameter portion 1b, a vertically upward suction force a0 due to the increased flow F2 is generated. On the other hand, the apparent gravity f obtained by subtracting the buoyancy from the gravity acts on the cleaning target P vertically downward. The vertical movement of the cleaning object P is determined by the difference in magnitude between the suction force a0 and the apparent gravity f.

For this reason, when the flow rate of the flow F2 in the first cylindrical portion 1C is appropriately set by controlling the suction amount of the pump 6c, the cleaning object P is floated inside the first cylindrical portion 1C. Can be made.
9 A of control parts in this embodiment perform control which maintains the washing | cleaning target object P floating state so that it may mention later by detecting the position of the cleaning target object P based on the detection output of each position detection sensor.
Further, the control unit 9 </ b> A sends a control signal for applying ultrasonic vibration to the cleaning liquid L to the ultrasonic oscillator 8. In the present embodiment, the ultrasonic oscillator 8 faces the inlet 1A. The ultrasonic vibration radiated from the ultrasonic oscillator 8 propagates upward and is transmitted to the cleaning liquid L inside the first cylindrical portion 1C through the introduction port 1A. An ultrasonic standing wave is generated inside the first cylindrical portion 1C. For this reason, especially when the cleaning object P passes through the antinodes of the standing wave, the dirt component of the cleaning object P is strongly excited by the standing wave. As a result, the dirt component of the cleaning target P is peeled off from the surface of the cleaning target P. The separated dirt component is transported upward by the flow F2 of the cleaning liquid L. In order to form a standing wave over the entire interior of the first cylindrical portion 1C, it is more preferable that an obstacle that reflects ultrasonic waves is not disposed between the inlet 1A and the ultrasonic oscillator 8. For example, when the conveyance jig of the cleaning object P has a structure that easily reflects ultrasonic waves, the conveyance jig is retracted from between the introduction port 1A and the ultrasonic oscillator 8 before Step S4 is started. More preferably.

In the floating state, the cleaning object P sequentially comes into contact with the flow F2 of the cleaning liquid L that does not include the dirt component rising from below. For this reason, the contamination component of the cleaning target P is easily peeled off from the cleaning target P by contact with the flow F2 having a relative speed difference in addition to the ultrasonic vibration. At this time, the surface of the cleaning object P is evenly cleaned because the cleaning object P rotates or vibrates in the flow F2 due to the change in the floating state.
In particular, in the present embodiment, as will be described later, the vertical position of the floating cleaning object P is changed. As a result, the cleaning object P sequentially passes through the antinodes and nodes of the standing waves arranged in the vertical direction, so that the cleaning object P is subjected to ultrasonic vibrations in a wavelike manner during the ascending and descending process. For this reason, the cleaning target P is more efficiently cleaned.

In step S4, the control unit 9A executes steps S11 to S16 shown in FIG. 4 according to the flow shown in FIG. 4 to place the cleaning object P in the floating state inside the first cylindrical part 1C.
In the cleaning system 100, the cleaning object P is cleaned in a state where it is suspended in a predetermined cleaning area inside the first cylindrical portion 1C. In the present embodiment, the cleaning region is set to the inside of the first cylindrical portion 1C, and the cleaning target P is set to a range that does not block the opening at the boundary between the reduced diameter portion 1b and the second inner peripheral surface 1c. Has been. Specifically, it is an area from the position where the cleaning object P is detected by the first position detection sensor 3 to the position where the cleaning object P is detected by the second position detection sensor 4.

  In the following, the detection outputs of the first position detection sensor 3, the second position detection sensor 4, and the third position detection sensor 5 are expressed as [IJK] (where I, J, and K represent 0 or 1). Describe. Here, I, J, and K represent the binarized detection outputs of the first position detection sensor 3, the second position detection sensor 4, and the third position detection sensor 5, respectively. The detection output “1” means that the presence of the cleaning object P is detected in front of the sensor unit. The detection output of “0” means that the presence of the cleaning object P is not detected in front of the sensor unit.

The controller 9A sets, in the memory, the first flag B1, the second flag B2, and the third flag B3 for determining the position of the cleaning target P in accordance with the change in the detection output of each position detection sensor. .
The first flag B1 is a flag indicating that at least a part of the cleaning object P is present inside the first cylindrical portion 1C.
The second flag B2 is a flag indicating that the cleaning target P is located above the lower limit of the cleaning region.
The third flag B3 is a flag indicating that the cleaning object P is located below the upper limit of the cleaning region.
The first flag B1, the second flag B2, and the third flag B3 are cleared by the start of step S3.

The first flag B1 is set when the detection output first becomes [001] after the start of step S3. The first flag B1 is cleared when the detection output changes from [011] through [001] to [000].
The second flag B2 is set when the detection output first becomes [010] after the start of step S3. The second flag B2 is cleared when the detection output changes from [010] to [011]. The end timing of step S3 described above may be matched when the second flag B2 is set.
The third flag B3 is set while the detection output is [100].

In step S <b> 11, the control unit 9 </ b> A determines whether or not the entire cleaning object P is inside the chamber 1.
Specifically, when the first flag B <b> 1 is set, the control unit 9 </ b> A has at least a part of the cleaning target P inside the chamber 1, so that the cleaning target P is inside the chamber 1. Is determined. In this case, the flow moves to step S12.
When the first flag B <b> 1 is not set, the control unit 9 </ b> A determines that the cleaning target P is not inside the chamber 1 because the entire cleaning target P is outside the chamber 1. In this case, the flow moves to step S14.

In step S12, the control unit 9A determines whether or not the cleaning object P has exceeded the lower limit of the cleaning region.
Specifically, the control unit 9A determines that the cleaning object P has exceeded the lower limit of the cleaning region when the second flag B2 is set. In this case, the flow moves to step S13.
The control unit 9A determines that the cleaning target P does not exceed the lower limit of the cleaning region when the second flag B2 is not set. In this case, the flow moves to step S14.

In step S13, the controller 9A determines whether or not the cleaning object P has reached the upper limit of the cleaning area.
Specifically, the control unit 9A determines that the cleaning target P has reached the upper limit of the cleaning region when the third flag B3 is set. In this case, the flow moves to step S15.
The control unit 9A determines that the cleaning object P has not reached the upper limit of the cleaning region when the third flag B3 is not set. In this case, the flow moves to step S14.

In step S14, the control unit 9A sends a control signal for sucking the cleaning liquid L to the pump 6c so that the flow rate in the suction pipe 6a becomes a predetermined flow rate q1 (see FIG. 5). Here, the flow rate q1 may be the same as or different from the flow rate q0 in step S3. For example, the flow rate q1 may be smaller than the flow rate q0 as long as a suction force that raises the cleaning target P in the first tubular portion 1C can be generated.
Above, step S14 is complete | finished. Step S16 is performed after step S14.

For example, FIG. 5 illustrates a state in which step S14 is performed after step S13 is performed.
In the state shown in FIG. 5, since the detection output of each position detection sensor is [010], the cleaning target P is the first cylindrical portion 1C near the lower end of the first inner peripheral surface 1a when viewed from the radial direction. Located inside.
In order to raise the cleaning target P, the controller 9A controls the operation of the pump 6c so that the flow rate of the cleaning liquid L in the suction pipe 6a becomes the flow rate q1. According to the flow rate q1, flows F21 and F31 similar to the flows F2 and F3 in step S3 are generated in the first cylindrical portion 1C. However, the flow rates of the flows F21 and F31 are determined according to the difference between the flow rate q1 and the flow rate q0. As a result, since the upward suction force a1 acts on the cleaning target P, the cleaning target P has an upward acceleration. In this way, the cleaning object P continues to rise inside the first cylindrical portion 1C.

In step S15, the control unit 9A sends a control signal for aspirating the cleaning liquid L so that the flow rate in the suction pipe 6a becomes a predetermined flow rate q2 (see FIG. 6) for a predetermined delivery time. To send.
Step S15 is performed after the cleaning object P reaches the upper limit of the cleaning region in step S13. For this reason, the detection output of each position detection sensor at the start of step S15 is [100].
The flow rate q2 is set such that the magnitude of the suction force acting on the cleaning object P is smaller than the apparent magnitude of gravity f. The flow rate q2 is more preferably a positive value less than the flow rate q1. However, the flow rate q2 may be zero.
As a result of the flow rate q2 in the suction pipe 6a being smaller than the flow rate q1, the magnitude of the suction force acting on the cleaning object P is larger than the apparent gravity f acting on the cleaning object P. descend. For this reason, the cleaning target P has a downward acceleration. In this way, the cleaning object P starts to descend within the first cylindrical portion 1C. The cleaning object P continues to descend while the control signal is being sent.
The controller 9A sends a control signal to the pump 6c for a preset sending time. The delivery time is a time such that the drop distance of the cleaning object P does not fall below the lower limit of the cleaning region at the flow rate q2. An appropriate delivery time can be obtained, for example, by performing an experiment in advance, according to the mass of the cleaning object P or the like.
When the transmission time of the control signal has elapsed, step S15 ends. Step S16 is performed after step S15.

For example, FIG. 6 illustrates a state where step S15 is performed after step S13 is performed.
In the state shown in FIG. 6, since the detection output of each position detection sensor is [100], the object P to be cleaned is closer to the upper end of the first inner peripheral surface 1a or the first inner peripheral surface when viewed from the radial direction. It is located in the inside of the 1st cylindrical part 1C which straddled the diameter-reduced part 1b from 1a.
The controller 9A controls the operation of the pump 6c so that the flow rate of the cleaning liquid L in the suction pipe 6a becomes the flow rate q2 in order to lower the cleaning target P. When the flow rate q2 is a positive value, flows F22 and F32 similar to the flows F2 and F3 in step S3 are generated in the first cylindrical portion 1C according to the flow rate q2. However, the flow rates of the flows F22 and F32 are determined according to the difference between the flow rate q2 and the flow rate q0. As a result, an upward suction force a2 acts on the cleaning object P. However, since the magnitude of the suction force a2 is smaller than the apparent gravity f acting on the cleaning target P, the cleaning target P has a downward acceleration. In this way, the cleaning object P descends inside the first cylindrical portion 1C. In this case, since an upward flow is generated inside the first cylindrical portion 1C, the dirt component is discharged together with the cleaning liquid L to the outside of the chamber 1 through the suction pipe 6a.
However, when the flow rate q2 is 0, the flow of the cleaning liquid L in the first cylindrical portion 1C stops. For this reason, the suction force due to the flow of the cleaning liquid L disappears. The cleaning target P starts to descend inside the first cylindrical portion 1C by the action of the apparent gravity f.

In step S16, the controller 9A determines whether or not to end the cleaning.
The control unit 9A determines whether or not to end the cleaning based on a preset determination condition. The determination conditions include, for example, the cleaning time, the number of times the cleaning target P is moved up and down, the presence or absence of an operation input for stopping the cleaning by the operator, and the like.
For example, in the determination based on the cleaning time, the control unit 9A measures an elapsed time after the cleaning is started by using a timer or the like. The control unit 9A determines that the cleaning is finished when the measured elapsed time exceeds a predetermined scheduled cleaning time.
For example, in the determination based on the number of times of raising and lowering, the control unit 9A monitors the detection output of each position detection sensor. For example, the control unit 9A measures the number of times of raising and lowering based on the number of times the detection output becomes [100]. Control part 9A determines with the end of washing | cleaning, when the measured raising / lowering frequency exceeds the predetermined raising / lowering frequency | count.
For example, in the determination based on the operation input for stopping the cleaning, the control unit 9A monitors an operation input from an operation unit (not shown). Control part 9A determines with completion | finish of washing | cleaning, when the operation input of washing | cleaning stop is detected.
Two or more appropriate combinations may be used as such determination conditions. For example, the controller 9 </ b> A may determine that the cleaning has ended when the cleaning time exceeds the scheduled cleaning time and the number of times of ascent / descent exceeds the number of times of ascent / descent. For example, the control unit 9A may determine that the cleaning is completed when it is determined that the cleaning is completed based on any one of the cleaning time, the number of times of raising and lowering, and the operation input for cleaning stop.

When it determines with complete | finishing washing | cleaning, 9 A of control parts complete | finish step S4. For example, the control unit 9A sends a control signal for stopping the ultrasonic oscillation to the ultrasonic oscillator 8. In this case, the flow moves to step S5 in FIG.
When it determines with not complete | finishing washing | cleaning, 9 A of control parts perform step S11.

In this way, the above-described steps S11 to S16 are repeated until the control unit 9A determines the end of cleaning.
By such a cleaning control operation, the cleaning target P is caused to flow upward in the cleaning liquid L in the cleaning region inside the first cylindrical portion 1C where a standing wave is generated by the ultrasonic waves emitted from the ultrasonic oscillator 8. Go up and down while resisting. Thereby, the cleaning object P is cleaned. In such cleaning, the cleaning action by ultrasonic vibration and the cleaning action by dynamic contact with the cleaning liquid L by movement, rotation, etc. in the flow of the cleaning liquid L act synergistically.

As shown in FIG. 3, in step S5, the cleaning object P is taken out.
In the present embodiment, the operator takes out the cleaning object P to the outside of the storage tank 7 using the transport jig. For example, the operator performs an operation input for stopping the suction by the pump 6c from the operation unit in a state where the conveying jig for the cleaning object P is disposed below the introduction port 1A. For example, when the conveyance jig of the cleaning object P is retracted from between the introduction port 1A and the ultrasonic oscillator 8 during step S4, the conveyance jig is introduced into the introduction port 1A before the operation input. Moved down.
When the suction by the pump 6c is stopped, the apparent gravity f acts on the cleaning target P, and therefore the cleaning target P starts to descend inside the first cylindrical portion 1C. The cleaning object P moves downward from the inlet 1A and lands on the transport jig. The operator moves the conveying jig and takes out the cleaning object P outside the storage tank 7.
This is the end of step S5. Thereby, the cleaning method of this embodiment is completed.

  As described above, according to the cleaning system 100 and the cleaning method using the cleaning system 100 of the present embodiment, the chamber 1 is arranged in parallel to the vertical axis, and the first cylindrical portion 1C is sucked by the pump system 6 by suction. An upward flow of the cleaning liquid L from the inlet 1A toward the outlet 1B is formed inside. The cleaning object P is held in a floating state inside the first cylindrical portion 1C by the flow of the cleaning liquid L. The cleaning object P is held in the center in the radial direction by the flow in the pipe line by the first cylindrical portion 1C, and the floating position in the height direction is defined by the suction force generated by the suction amount of the pump 6c. . For this reason, for example, the floating position of the cleaning target P is significantly stabilized as compared with the case where the cleaning target P is brought into a floating state by the gas flow injected from the opening. For this reason, the stability of the floating position of the cleaning object P during cleaning is improved.

In particular, in the present embodiment, by controlling the pump 6c based on the detection output of each position detection sensor, the floating position of the cleaning object P in the vertical direction is set inside the first cylindrical portion 1C. Controlled within the cleaning area. For this reason, it is prevented that the cleaning target P comes out of the first cylindrical portion 1C during the cleaning.
Furthermore, in this embodiment, the floating position in the vertical direction of the cleaning object P moves up and down in the cleaning region by controlling the pump 6c based on the detection output of each position detection sensor. For this reason, since the cleaning target P repeatedly passes through a plurality of antinodes of the standing wave, the cleaning target P is cleaned more efficiently than ultrasonic cleaning at a certain floating position. When the cleaning target P is moved up and down, the cleaning target P is also cleaned more efficiently at the point where it comes into contact with the rising flow of the cleaning liquid L in the first cylindrical portion 1C.

[Second Embodiment]
A cleaning apparatus and a cleaning method according to the second embodiment of the present invention will be described.
FIG. 7 is a schematic configuration diagram showing an example of the cleaning device according to the second embodiment of the present invention.

As shown in FIG. 7, the cleaning system 101 (cleaning apparatus) of the present embodiment includes a pump system 16 and a control unit 9B in place of the pump system 6 and the control unit 9A in the cleaning system 100 of the first embodiment. Prepare.
Hereinafter, a description will be given centering on differences from the first embodiment.

  The pump system 16 is configured by adding a first flow rate control valve 10A (flow rate control valve), a suction pipe 16c, and a second flow rate control valve 10B (flow rate control valve) to the pump system 6 in the first embodiment. Has been.

The first flow control valve 10A is provided on the flow path of the suction pipe 6a. 10 A of 1st flow control valves are connected so that communication with the control part 9B mentioned later is possible. The first flow rate control valve 10A changes the flow rate in the suction pipe 6a based on the control signal from the control unit 9B.
For example, the first flow control valve 10A may be configured with an electromagnetic valve capable of opening / closing control. Since the response time of the solenoid valve is shortened, rapid flow rate switching is possible.
For example, the first flow rate control valve 10A may be a throttle valve, a flow rate adjustment valve, or the like whose flow rate is adjustable. In this case, the flow rate in the suction pipe 6a can be finely adjusted without changing the suction amount of the pump 6c.

  The suction pipe 16c is provided to be branched from the pump 6c and the first flow control valve 10A in the suction pipe 6a. A distal end portion of the suction pipe 16 c in the branch direction is disposed inside the storage tank 7.

The second flow rate control valve 10B is provided on the flow path of the suction pipe 16c. The 2nd flow control valve 10B is connected so that communication with control part 9B mentioned below is possible. The second flow rate control valve 10B changes the flow rate in the suction pipe 16c based on the control signal from the control unit 9B.
The second flow rate control valve 10B may have the same configuration as the first flow rate control valve 10A.

The controller 9B controls the overall operation of the cleaning system 101. The controller 9B includes at least a first position detection sensor 3, a second position detection sensor 4, a third position detection sensor 5, an ultrasonic oscillator 8, a pump 6c, a first flow control valve 10A, and a second flow control valve 10B. Is communicably connected. Although not shown in the figure, the control unit 9B is connected to an operation unit that can be operated by the operator, similarly to the control unit 9A in the first embodiment.
The configuration of the control unit 9B is the same as that of the control unit 9A in the first embodiment.
The specific control operation of the control unit 9B will be described in the operation description of the cleaning system 101 described later.

Next, the operation of the cleaning system 101 of this embodiment will be described focusing on the cleaning method of this embodiment performed using the cleaning system 101.
The cleaning method of the present embodiment is performed by executing steps S1, S2, S23, S24, and S5 shown in FIG. 3 according to the flow shown in FIG. As described above, the cleaning method of the present embodiment is different from the first embodiment in that the cleaning method 101 is performed and the operations in steps S23 and S24 are performed. Below, it demonstrates centering on a different point from the said 1st Embodiment.
However, in the following, an example in which the first flow control valve 10A and the second flow control valve 10B are configured by electromagnetic valves will be described as an example.

Similarly to the first embodiment, after steps S1 and S2 are performed, step S23 of the present embodiment is performed.
In step S23, a flow of the cleaning liquid L that is a fluid is formed in the chamber 1 from the inlet 1A toward the outlet 1B.
Specifically, the control operation of the control unit 9B is started when the operator performs an operation input for starting the cleaning operation to the control unit 9B by an operation unit (not shown).
The control unit 9B sends a control signal for opening the flow path of the suction pipe 6a to the first flow rate control valve 10A. The control unit 9B sends a control signal for closing the flow path of the suction pipe 16c to the second flow rate control valve 10B. Thereafter, similarly to step S3 in the first embodiment, the control unit 9B sends a control signal for operating the pump 6c to suck the cleaning liquid L having a predetermined flow rate q0 to the pump 6c.
Thereby, the flow of the cleaning liquid L similar to step S3 in the first embodiment is formed in the first cylindrical portion 1C.
Above, step S23 is complete | finished.

Step S24 is performed after step S23. In step S24, the cleaning target P is cleaned while the cleaning target P is suspended inside the first cylindrical portion 1C.
When step S24 is started, the control unit 9B pumps a control signal for sucking the cleaning liquid L so that the flow rate in the suction pipe 6a when the first flow rate control valve 10A is opened becomes the predetermined flow rate q1. Send to 6c. The amount of suction by the pump 6c is kept constant while step S24 is performed.

After that, the control unit 9B executes the steps S11 to S13, S34, S35, and S16 shown in FIG. 4 according to the flow shown in FIG. 4 to set the cleaning object P inside the first cylindrical part 1C. Let it float.
In steps S11 to S13 and S16 in the present embodiment, operations similar to those in the first embodiment are performed except that corresponding operations are performed using the cleaning system 101. However, the flow transfer destination in the case of “NO” in steps S11 to S13 in the present embodiment is step S34. If “YES” in step S13 in the present embodiment, the flow transfer destination is step S35.

In step S34, the control unit 9B sends a control signal for opening the flow path of the suction pipe 6a to the first flow rate control valve 10A. Further, the control unit 9B sends a control signal for closing the flow path of the suction pipe 16c to the second flow rate control valve 10B.
As a result, as in step S14 in the first embodiment, the cleaning liquid L having the flow rate q1 flows through the suction pipe 6a. For this reason, in this step, similarly to step S14 in the first embodiment, the cleaning object P continues to rise inside the first cylindrical portion 1C.

In step S35, the control unit 9B sends a control signal for closing the flow path of the suction pipe 6a to the first flow rate control valve 10A. Furthermore, the control unit 9B sends a control signal for opening the flow path of the suction pipe 16c to the second flow rate control valve 10B.
As a result, the suction of the cleaning liquid L is stopped in the suction pipe 6a between the pipe connecting portion 2 and the first flow control valve 10A. On the other hand, the cleaning liquid L outside the chamber 1 is sucked from the suction pipe 16c by the pump 6c. The sucked cleaning liquid L is returned to the storage tank 7 by being discharged to the discharge pipe 6b by the pump 6c.
As a result, similarly to the case where the flow rate q2 is set to 0 in step S14 in the first embodiment, the flow of the cleaning liquid L in the first cylindrical portion 1C is also stopped. For this reason, also in this step, as in the case where the flow rate q2 is set to 0 in step S14 in the first embodiment, the cleaning target P starts to descend inside the first cylindrical portion 1C.

In step S16 in the present embodiment, an operation similar to that in step S16 in the first embodiment is performed except that the control unit 9B determines whether to end the cleaning.
In this way, steps S11 to S13, S24, S25, and S16 described above are repeated until the control unit 9B determines the end of cleaning.
If it is determined in step S16 that the cleaning has been completed, step S24 in FIG. 3 ends.
As shown in FIG. 3, after step S24, step S5 of the present embodiment is performed in the same manner as in the first embodiment.
This is the end of the cleaning method of the present embodiment.

As described above, according to the cleaning system 101 and the cleaning method using the cleaning system 101 of the present embodiment, the switching of the suction amount of the cleaning liquid L for maintaining the floating state of the cleaning target P is the first flow rate control. The point which is performed by the valve 10A and the second flow control valve 10B is different from the first embodiment.
For this reason, according to the present embodiment, as in the first embodiment, the stability of the floating position of the cleaning object P during the cleaning is improved.
In particular, according to the present embodiment, the pump system 16 can be easily controlled because the suction flow rate by the pump 6c does not need to be changed during cleaning. Furthermore, since the flow rate in the suction pipe 6a can be switched by opening and closing the electromagnetic valve, the switching time is delayed due to the start / stop time of the pump 6c and the inertia of the cleaning liquid L as in the case of reducing the flow rate of the pump 6c. Does not occur. For this reason, the flow rate is switched more quickly. As a result, in this embodiment, even if the cleaning target P moves up and down in a wide range of the cleaning region, the cleaning target P can be stably suspended in the cleaning region.

  As described above, the cleaning system 101 of the present embodiment has been described with an example in which the first flow control valve 10A and the second flow control valve 10B are configured by electromagnetic valves. However, when the first flow rate control valve 10A and the second flow rate control valve 10B are composed of a throttle valve, a flow rate adjustment valve, etc., the first flow rate control valve 10A and the second flow rate control valve 10B are used even when the pump 6c is in a steady operation. The flow rate in the suction pipes 6a and 16c can be adjusted appropriately. In this case, although detailed description of the operation is omitted, in the first embodiment, cleaning in a floating state similar to the case where the flow rate q2 is set to a positive value smaller than the flow rate q1 is possible. In this case, as in the first embodiment, the cleaning object P can be cleaned up and down while the upward flow of the cleaning liquid L is formed.

[Third Embodiment]
A cleaning apparatus and a cleaning method according to the third embodiment of the present invention will be described.
FIG. 8 is a schematic configuration diagram illustrating an example of a cleaning device according to a third embodiment of the present invention.

As shown in FIG. 8, the cleaning system 102 (cleaning apparatus) of the present embodiment has a storage tank 27 (second storage tank) and an ultrasonic oscillator 28 added to the cleaning system 100 of the first embodiment. It is configured.
However, the pump system 6 in the present embodiment is provided so as to be movable to the outside of the storage tank 7 together with the chamber 1. The chamber 1 and the pump system 6 are held so as to be movable in a vertical direction and a horizontal direction by a moving jig (not shown) as necessary.
Hereinafter, a description will be given centering on differences from the first embodiment.

The storage tank 27 stores the cleaning liquid R (fluid). The storage tank 27 may be configured in the same size and shape as the storage tank 7. The opening 27 a at the top of the storage tank 27 has a size that allows the chamber 1 to pass therethrough. The storage tank 27 is more preferably arranged adjacent to the vicinity of the storage tank 7.
The cleaning liquid R is a fluid for cleaning the cleaning target P after the cleaning using the cleaning liquid L in the storage tank 7 (first storage tank) is completed. The type of the cleaning liquid R may be selected from fluids suitable for the illustrated cleaning liquid L in the first embodiment. For example, the cleaning liquid R may be used for cleaning the cleaning target P in multiple stages. For example, as the cleaning liquid R, a rinsing fluid that removes the cleaning liquid L component may be used.

The cleaning liquid R in the storage tank 27 may be supplied by a supply system (not shown) provided outside the storage tank 27. The cleaning liquid R in the storage tank 27 may be circulated and used by a circulation system (not shown) provided outside the storage tank 27. When a circulation system is used, it is more preferable that a cleaning device for cleaning the cleaning liquid R is provided on the circulation path.
An ultrasonic oscillator 28 is installed on the bottom surface portion 27 b of the storage tank 27.

  The ultrasonic oscillator 28 applies ultrasonic vibrations to the cleaning liquid R stored in the storage tank 27. The ultrasonic oscillator 28 is communicably connected to the control unit 9A. The operation of the ultrasonic oscillator 28 is controlled by a control signal from the control unit 9A.

Next, the operation of the cleaning system 102 of this embodiment will be described focusing on the cleaning method of this embodiment performed using the cleaning system 102.
In the cleaning method of the present embodiment, cleaning similar to that of the first embodiment is performed with the chamber 1 immersed in the cleaning liquid L stored in the storage tank 7 (see the two-dot chain line chamber 1 in FIG. 8). ).
Thereafter, the cleaning object P is transferred to the storage tank 27 by using the chamber 1 and the pump system 6 (see the solid chamber 1 in FIG. 8).
Thereafter, in the state where the chamber 1 is immersed in the cleaning liquid R stored in the storage tank 27, the cleaning liquid R is cleaned in the same manner as in the first embodiment.
Since each cleaning operation in the storage tanks 7 and 27 is the same as that in the first embodiment, hereinafter, an operation in which the cleaning object P is moved from the storage tank 7 to the storage tank 27 (hereinafter referred to as a transfer operation). Will be described in more detail.

In the transfer operation, after the cleaning is completed by the cleaning liquid L stored in the storage tank 7, the cleaning liquid L is sucked from the discharge port 1B, thereby adsorbing the cleaning object P inside the first cylindrical portion 1C. And moving the chamber 1 in which the cleaning object P is adsorbed to the storage tank 27.
Such a transfer operation is also a variation of step S5 in the first embodiment.

9 A of control parts continue the suction | inhalation of the washing | cleaning liquid L by the pump system 6 after step S1-S4 shown in FIG.
When the suction proceeds to some extent, the cleaning object P that has floated in the cleaning region as indicated by reference symbol P1 in FIG. 8 contacts the entire circumference of the locking portion 1d as indicated by reference symbol P2. The lower end portion of the second inner peripheral surface 1c is closed by the cleaning object P that is in contact with the locking portion 1d. As a result, the cleaning object P is adsorbed at the position indicated by the symbol P2.

The operator moves the chamber 1 and the pump system 6 vertically upward using the moving jig (not shown) until the chamber 1 and the pump system 6 reach above the opening 7a. At this time, the pump system 6 is controlled so as to maintain the state in which the cleaning object P is attracted to the locking portion 1d. For example, the control unit 9A may perform control to continue the suction operation of the pump 6c during the moving operation.
Alternatively, if the suction pipe 6a is previously provided with a valve (not shown) that can be opened and closed by the control unit 9A or an operator, the pump 6c can be controlled to stop. In this case, the controller 9A or the operator closes the above-described valve, so that the adsorption state of the cleaning object P is maintained even when the pump 6c is stopped.

  When the chamber 1 moves above the liquid level of the cleaning liquid L, the cleaning liquid L in the first cylindrical portion 1C falls into the storage tank 7 by gravity. However, the cleaning object P is kept in the state of being attracted to the locking portion 1d.

The operator moves the chamber 1 and the pump system 6 moved above the storage tank 7 to above the storage tank 27 using a movement jig (not shown) (see the solid line in FIG. 8).
Thereafter, the operator lowers the chamber 1 and the pump system 6 that have been moved above the storage tank 27 using a movement jig (not shown).
When the inlet 1A of the chamber 1 is immersed in the cleaning liquid R stored in the storage tank 27, the operator stops the descent.
This completes the transfer operation.

Thereafter, a cleaning operation with the cleaning liquid R is performed in substantially the same manner as in the first embodiment.
However, in this embodiment, the operation up to step S2 shown in FIG. 3 is completed by the transfer operation.
In step S3 in the present embodiment, the operator first releases the suction state of the cleaning object P. Specifically, when the suction of the pump 6c is continued and the suction state is maintained, the suction of the pump 6c is stopped. Alternatively, when the suction state is maintained by closing the valve on the suction pipe 6a, the valve is opened.
When the adsorption state is released, the cleaning object P and the cleaning liquid L1 in the second inner peripheral surface 1c fall on the cleaning liquid R by gravity.

Thereafter, when the operator inputs an operation input for starting the cleaning operation to the control unit 9A by an operation unit (not shown), the control operation of the control unit 9A similar to step S3 in the first embodiment is started. The
Thereafter, the same cleaning method as in the first embodiment is performed. As a result, the cleaning object P is cleaned using the cleaning liquid R.

As described above, according to the cleaning system 102 and the cleaning method using the cleaning system 102 of the present embodiment, the cleaning with the cleaning liquid L in the storage tank 7 and the cleaning with the cleaning liquid R in the storage tank 27 are respectively performed as the first. This is performed in the same manner as the embodiment.
For this reason, according to the present embodiment, as in the first embodiment, the stability of the floating position of the cleaning object P during the cleaning is improved.

Furthermore, in this embodiment, the cleaning object P is moved from the storage tank 7 to the storage tank 27 together with the chamber 1 in a state where the cleaning object P is adsorbed to the chamber 1. For this reason, since the operation | work of taking out the washing | cleaning target P on the conveyance jig | tool and taking out to the exterior of the storage tank 7 can be abbreviate | omitted, it can transfer rapidly.
In the cleaning system 102, since the two types of cleaning can be performed by the single chamber 1, the apparatus configuration can be made compact.

  In the transfer operation, the cleaning target P is adsorbed inside the first cylindrical part 1C, and therefore the first cylindrical part 1C has a function of a protection member for the cleaning target P. For this reason, it is possible to prevent the cleaning object P from coming into contact with other members and being damaged or dirty during the transfer.

[First Modification]
Next, a cleaning apparatus according to a modified example (first modified example) of the third embodiment will be described.
FIG. 9 is a schematic longitudinal sectional view showing a main part of a cleaning device of a modified example (first modified example) of the third embodiment of the present invention.

As shown in FIG. 9, the cleaning system 103 (cleaning apparatus) of the present modification includes a chamber 21 instead of the chamber 1 of the cleaning system 102 of the third embodiment.
Hereinafter, a description will be given focusing on differences from the third embodiment.

As shown in FIG. 9, the chamber 21 is formed in a cylindrical shape having a through-hole at the center, similarly to the chamber 1 in the third embodiment. The outer shape of the chamber 21 is the same as that of the chamber 1. In the through hole of the chamber 21, a first inner peripheral surface 21a, a reduced diameter portion 21b, and a second inner peripheral surface 21c are formed in this order from the first end E1 toward the second end E2.
The first inner peripheral surface 21a, the reduced diameter portion 21b, and the second inner peripheral surface 21c are respectively the first inner peripheral surface of the chamber 1 except for the partial shapes of the reduced diameter portion 21b and the second inner peripheral surface 21c. It has the same shape as 1a, the reduced diameter portion 1b, and the second inner peripheral surface 1c.
However, a ring member 22 is embedded between the reduced diameter portion 21 b and the second inner peripheral surface 21 c in order to form a shape corresponding to the locking portion 1 d of the chamber 1. A through hole including a tapered surface 22b and a cylindrical inner peripheral surface 22c is formed at the center of the ring member 22.

The first inner peripheral surface 21 a has the same shape as the first inner peripheral surface 1 a of the chamber 1.
The inner peripheral surface of the through hole constituted by the reduced diameter portion 21b and the tapered surface 22b has the same shape as the reduced diameter portion 1b of the chamber 1 as a whole. For this reason, the first inner peripheral surface 21 a is open at the first end E <b> 1 of the chamber 21. An inlet 1A similar to the chamber 1 is formed in the first end E1 by the first inner peripheral surface 21a.

The inner peripheral surface of the through hole constituted by the cylindrical inner peripheral surface 22c and the second inner peripheral surface 1c has the same shape as the second inner peripheral surface 1c of the chamber 1 as a whole.
In the ring member 22, a locking portion 22 d having the same shape as the locking portion 1 d of the chamber 1 is formed at the boundary between the tapered surface 22 b and the cylindrical inner peripheral surface 22 c.
The second inner peripheral surface 21 c is open at the second end E <b> 2 of the chamber 21. A discharge port 1B similar to the chamber 1 is formed at the second end E2 by the second inner peripheral surface 21c.

As the material of the chamber 21, the same material as that of the chamber 1 may be used. However, in this modified example, since the cleaning target P is not locked to the inner peripheral surface of the chamber 21, a material having a hardness higher than that of the cleaning target P can also be suitably used.
As the material of the ring member 22, a material having a hardness lower than that of the chamber 1 is used. For example, the ring member 22 may be a polyacetal resin, an elastomer having resistance to the cleaning liquids L and R, or the like.

  With such a configuration, the chamber 21 includes a first cylindrical portion 21C (cylindrical portion) in which a first inner peripheral surface 21a, a reduced diameter portion 21b, and a tapered surface 22b are formed. And a second cylindrical portion 21D formed with a peripheral surface 22c and a second inner peripheral surface 1c.

According to the cleaning system 103 of this modification including such a chamber 21, the shape of the flow path through which the cleaning liquids L and R flow inside the chamber 21 is the same as that of the chamber 1. A cleaning method can be performed. For this reason, according to the cleaning system 103, the stability of the floating position of the cleaning target P during the cleaning is improved as in the cleaning system 102 of the third embodiment.
Furthermore, according to this modification, the locking portion 22 d is formed by the ring member 22. For this reason, even when the chamber 21 is formed of a material having a hardness higher than that of the cleaning object P, the ring member 22 is formed of a material having a hardness lower than that of the cleaning object P. Damage can be prevented.
Furthermore, when a soft elastic member that is elastically deformed by the contact of the cleaning object P, such as an elastomer, is used as the ring member 22, the cleaning object P is more stably adsorbed in the transfer operation. Further, in this case, even if the surface of the cleaning target P has irregularities, the cleaning target P can be adsorbed as long as the irregularities can be followed by deformation of the elastic member. For this reason, the transfer operation is more easily performed on various cleaning objects P.

[Fourth Embodiment]
A cleaning apparatus and a cleaning method according to the fourth embodiment of the present invention will be described.
FIG. 10 is a schematic configuration diagram illustrating an example of a cleaning apparatus according to the fourth embodiment of the present invention.

As shown in FIG. 10, the cleaning system 104 (cleaning apparatus) of the present embodiment is replaced with the storage tank 7, the chamber 1, the pump system 6, and the controller 9A of the cleaning system 100 of the first embodiment. The storage tank 32, the chamber 31, the pump system 36, and the control part 39 are provided.
Hereinafter, a description will be given centering on differences from the first embodiment.

The storage tank 32 stores the cleaning liquid L. The cleaning liquid L in the storage tank 32 may be supplied with the unused cleaning liquid L by a supply system (not shown) provided outside the storage tank 32 as in the storage tank 7 in the first embodiment. The cleaning liquid L in the storage tank 32 may be circulated and used by a circulation system (not shown) provided outside the storage tank 32. When a circulation system is used, it is more preferable that a cleaning device for cleaning the cleaning liquid L is provided on the circulation path.
However, as will be described later, unlike the storage tank 7 in the first embodiment, the chamber 31 described later is not immersed in the storage tank 32. For this reason, the size and shape of the storage tank 32 are not particularly limited as long as the cleaning liquid L necessary for cleaning can be stored. Furthermore, the storage tank 32 may not have an opening for taking in and out the chamber 31 described later. As in the example illustrated in FIG. 10, the storage tank 32 may be configured as a sealed tank.
The storage tank 32 is not provided with an ultrasonic oscillator.

The chamber 31 includes a chamber body 31A (cylindrical portion), a lower lid 31C, and an upper lid 31B (cylindrical portion).
The chamber main body 31A is a cylindrical member in which a cylindrical inner peripheral surface 31a having an inner diameter larger than the outer diameter D of the cleaning object P is penetrated in the center.
An inlet 31b made of a through hole having an inner diameter through which the cleaning object P cannot be inserted is formed on the side surface of the chamber body 31A near the first end e1. A pipe connecting portion 38A for connecting a pump system 36 to be described later is provided in the introduction port 31b that opens to the outer peripheral surface of the chamber body 31A.

In the chamber body 31A, the first position detection sensor 3, the second position detection sensor 4, and the third position detection sensor that are the same as those in the first embodiment are provided at a portion closer to the second end e2 than the introduction port 31b. 5 is arranged.
The sensor portions 3a, 4a, and 5a of the position detection sensors are exposed in this order along the direction from the second end e2 to the first end e1 on the cylindrical inner peripheral surface 31a. The sensor unit 5a of the present embodiment is exposed at a position closer to the second end e2 than the introduction port 31b in the axial direction. The positional relationship between the sensor units 3a, 4a, and 5a in the axial direction is the same as that in the first embodiment. That is, the arrangement interval in the axial direction of the sensor units 3 a and 4 a defines the size of the cleaning region in the chamber 31.
Each position detection sensor is communicably connected to a control unit 39 described later. The detection signal of each position detection sensor is sent to the control unit 39.

The lower lid 31C is a plate-like member for closing the opening of the cylindrical inner peripheral surface 31a at the first end e1 of the chamber body 31A. In the lower lid 31C, the ultrasonic oscillator 8 similar to that of the first embodiment is disposed at a portion facing the upper lid 31B.
The ultrasonic oscillator 8 in this embodiment applies ultrasonic vibrations to the cleaning liquid L introduced into the chamber 31. The ultrasonic oscillator 8 is communicably connected to a control unit 39 described later. The operation of the ultrasonic oscillator 8 is controlled by a control signal from the control unit 39.

The upper lid 31B is a plate-like member as a whole for closing the opening of the cylindrical inner peripheral surface 31a at the second end e2 of the chamber body 31A. However, it is also a cylindrical member with a short axial length in that a through-hole composed of a reduced diameter portion 31c and a discharge port 31d is formed in the central portion of the upper lid 31B.
The reduced diameter portion 31c has a tapered surface shape that gradually decreases in diameter from the same inner diameter as the inner diameter of the cylindrical inner peripheral surface 31a. The reduced diameter portion 31c is smoothly connected to the end portion of the cylindrical inner peripheral surface 31a in a state where the upper lid 31B is fixed to the second end portion e2 of the chamber body 31A.
The discharge port 31d penetrates the top of the reduced diameter portion 31c and is configured by a through hole smaller than the outer diameter of the cleaning object P. The discharge port 31d is provided with a pipe connecting portion 38B for connecting a pump system 36 to be described later.
In the present embodiment, the taper angle of the reduced diameter portion 31c and the inner diameter of the discharge port 31d are such that the cleaning object P contacts the reduced diameter portion 31c without contacting the boundary between the reduced diameter portion 31c and the discharge port 31d. It is set to a size that can.

The upper lid 31B is detachably attached to the second end e2 of the chamber body 31A. An unillustrated fixing means for detachably fixing the upper lid 31B to the chamber body 31A is not particularly limited. For example, bolt fixing or the like may be used as the fixing means.
The upper lid 31B is provided with an air supply pipe 37a that allows the outside of the chamber 31 and the inside of the chamber body 31A to communicate with each other in order to smoothly attach and detach the chamber body 31A. A valve 37 for opening and closing the flow path of the air supply pipe 37a is provided on the air supply pipe 37a. For example, the valve 37 may be a manual valve that is manually opened and closed. However, in the example shown in FIG. 10, the valve 37 is configured by an electromagnetic valve. The valve 37 is electrically connected to a control unit 39 described later. The valve 37 is opened and closed according to a control signal from a control unit 39 described later.

In the chamber 31 having such a configuration, when the lower lid 31C and the upper lid 31B are fixed to the chamber body 31A, the chamber 31 is surrounded by the lower lid 31C, the cylindrical inner peripheral surface 31a, and the reduced diameter portion 31c. A formed internal space S is formed.
As shown in FIG. 10, in a state where the chamber 31 is arranged so that the lower lid 31C faces downward and the upper lid 31B faces upward, the discharge port 31d communicating with the internal space S is positioned above the introduction port 31b. To do.
The introduction port 31b introduces the cleaning liquid L supplied from the pump system 36 described later into the internal space S. The discharge port 31d is connected to a pump system 36, which will be described later, thereby discharging the cleaning liquid L introduced into the internal space S from the internal space S to the outside.
In a state where the internal space S is filled with the cleaning liquid L, the cleaning target P is accommodated so as to be movable along the axial direction of the cylindrical inner peripheral surface 31a.

  The pump system 36 is a device part that forms a flow of the cleaning liquid L from the inlet 31 b toward the outlet 31 d in the internal space S of the chamber 31. In the example shown in FIG. 10, the pump system 36 includes a supply pipe 36e, a flow control valve 35, a pressure gauge 36f, a suction pipe 36b, a flow control valve 33, a pump 36c, a discharge pipe 36a, a communication pipe 36d, and a valve 34. .

The supply pipe 36 e is a pipe member for supplying the cleaning liquid L from the storage tank 32 to the chamber 31. Both ends of the supply pipe 36e are connected to the storage tank 32 and the pipe connection part 38A, respectively. A flow control valve 35 is disposed on the flow path of the supply pipe 36e.
The flow control valve 35 adjusts the amount of the cleaning liquid L introduced into the chamber 31. As the flow rate control valve 35, a throttle valve capable of adjusting the flow rate, a flow rate adjustment valve, or the like is used. The flow control valve 35 is communicably connected to a control unit 39 described later. The flow rate in the flow rate control valve 35 is controlled by a control signal from the control unit 39.
On the flow path of the supply pipe 36e, a pressure gauge 36f for measuring the flow rate of the cleaning liquid L in the supply pipe 36e is provided between the pipe connecting portion 38A and the flow rate control valve 35.
The pressure gauge 36f is communicably connected to a control unit 39, which will be described later, through a wiring (not shown). The pressure gauge 36 f sends a detection signal corresponding to the measured flow rate to the control unit 39.

The suction pipe 36 b is a pipe member for sucking the cleaning liquid L from the chamber 31. Both ends of the suction pipe 36b are connected to a pipe connecting portion 38B and a pump 36c described later. A flow rate control valve 33 is disposed on the flow path of the suction pipe 36b.
The flow control valve 33 adjusts the discharge amount of the cleaning liquid L from the chamber 31. The flow rate control valve 33 has the same configuration as the flow rate control valve 35. The flow control valve 33 is communicably connected to a control unit 39 described later. The flow rate in the flow rate control valve 33 is controlled by a control signal from the control unit 39.

The pump 36c sucks the cleaning liquid L from the suction pipe 36b. A discharge pipe 36a is connected to the pump 36c. The pump 36c discharges the sucked cleaning liquid L to the discharge pipe 36a.
The configuration of the pump 36c is not particularly limited as long as the cleaning liquid L can be sucked and discharged. For example, as the pump 36c, the same configuration as the pump 6c in the first embodiment may be used. The pump 36c is communicably connected to a control unit 39 described later. The operation of the pump 36 c is controlled by a control signal from the control unit 39.
The discharge pipe 36 a is a tubular member for returning the cleaning liquid L discharged by the pump 36 c into the storage tank 32. For this reason, the one end part of the discharge pipe 36a is connected to the discharge port of the pump 36c. The other end of the discharge pipe 36 a is disposed inside the storage tank 32.

The communication pipe 36d is a pipe member for draining liquid from the suction pipe 36b when the upper lid 31B is removed. One end of the communication pipe 36d is connected between the flow control valve 33 and the pump 36c in the flow path of the suction pipe 36b. The other end of the communication pipe 36d is connected between the pressure gauge 36f and the flow control valve 35 in the flow path of the supply pipe 36e. A valve 34 is disposed on the flow path of the communication pipe 36d.
The valve 34 opens and closes the flow path of the communication pipe 36d. For example, the valve 34 may be a manual valve that is manually opened and closed. However, in the example shown in FIG. 10, the valve 34 is configured by an electromagnetic valve. The valve 34 is electrically connected to a control unit 39 described later. The valve 34 is opened and closed in response to a control signal from a control unit 39 described later.

  Although not particularly illustrated, in the pump system 36, a filter device that removes dirt of the cleaning liquid L may be provided in at least one of the suction pipe 36b, the discharge pipe 36a, and the supply pipe 36e.

The control unit 39 controls the overall operation of the cleaning system 104. The control unit 39 is communicably connected to at least the first position detection sensor 3, the second position detection sensor 4, the third position detection sensor 5, the ultrasonic oscillator 8, and the pump system 36. Although not shown, the control unit 39 is connected to an operation unit operable by an operator.
When an operation start operation input is given to the operation unit, the control unit 39 starts control of each device part of the cleaning system 104. For example, the control unit 39 controls the flow of the cleaning liquid L in the chamber 31 by sending a control signal to the pump system 36. For example, the control unit 39 floats the cleaning object P in the internal space S of the chamber 31 based on the detection output of each position detection sensor. For example, the control unit 39 starts ultrasonic cleaning by the ultrasonic oscillator 8 in a state where the cleaning target P is floating.
A specific control operation of the control unit 39 will be described in an operation description of the cleaning system 104 described later.
The device configuration of the control unit 39 is configured in the same manner as the control unit 9A in the first embodiment.

Next, the operation of the cleaning system 104 of the present embodiment will be described focusing on the cleaning method of the present embodiment performed using the cleaning system 104.
FIG. 11 is an explanatory diagram of the operation of the cleaning apparatus according to the fourth embodiment of the present invention. FIG. 12 is a flowchart illustrating an example of cleaning control in the cleaning method of the fourth embodiment of the present invention.

  In the cleaning method of the present embodiment, the cleaning object P is accommodated in a state where the cleaning liquid L is introduced into the internal space S of the chamber 31, thereby cleaning the cleaning object P in substantially the same manner as in the first embodiment. Is done.

  The cleaning method of the present embodiment is performed by executing steps S1 and S42 to S45 shown in FIG. 3 according to the flow shown in FIG. As described above, the cleaning method of the present embodiment is different from the first embodiment in that the cleaning method 104 is performed and the operations in steps S42 to S45 are performed. Below, it demonstrates centering on a different point from the said 1st Embodiment.

In step S <b> 1 of the present embodiment, a cleaning system 104 is prepared instead of the cleaning system 100. When the cleaning system 104 is energized, the control unit 39 initializes the control state of each device part. In this initialized state, the pump 36c is stopped. The flow control valve 35, the valve 34, the flow control valve 33, and the valve 37 are closed.
After step S1 is performed, step S42 of the present embodiment is performed.

In step S42, as shown in FIG. 10, the chamber 31 is placed upright so that the discharge port 31d is in an attitude above the introduction port 31b. In particular, in the present embodiment, the chamber 31 is arranged in such a posture that the central axis of the cylindrical inner peripheral surface 31a is parallel to the vertical axis.
In the present embodiment, the chamber 31 is disposed outside the storage tank 32. For this reason, the chamber 31 is arrange | positioned in the appropriate position according to the length of the supply pipe | tube 36e and the suction pipe 36b. However, the chamber 31 is disposed such that the second end e2 of the chamber body 31A is higher than the liquid level of the cleaning liquid L stored in the storage tank 32.
A suction pipe 36b of the pump system 36 is connected to the upper lid 31B of the chamber 31 through a pipe connecting portion 38B. A supply pipe 36e of the pump system 36 is connected to the chamber main body 31A of the chamber 31 through a pipe connecting portion 38A.

Next, the cleaning object P is accommodated in the chamber 31.
The operator performs an operation input for opening the valve 37 from an operation unit (not shown). The control unit 39 sends a control signal for opening the valve 37 to the valve 37. Thereby, the valve 37 is opened. When the valve 37 is opened, the inner space S communicates with the outside, so that the upper lid 31B can be easily removed.
The operator removes the upper lid 31B from the chamber body 31A (see FIG. 11). The operator performs an operation input for introducing the cleaning liquid L into the chamber body 31 </ b> A via the operation unit of the control unit 39. The control unit 39 opens the flow rate control valve 35 in response to the operation input. When the cleaning liquid L is introduced to such an extent that it does not overflow from the chamber body 31A, the control unit 39 closes the flow control valve 35.
As shown in FIG. 11, the operator introduces the cleaning object P into the cylindrical inner peripheral surface 31a that opens to the second end e2. Thereafter, the operator fixes the upper lid 31B to the chamber body 31A.
The operator performs an operation input for closing the valve 37 from the operation unit. The control unit 39 sends a control signal for closing the valve 37 to the valve 37. Thereby, the valve 37 is closed.
Above, step S42 is complete | finished.

Step S43 is performed after step S42.
In step S43, a flow of the cleaning liquid L that is a fluid is formed in the chamber 31 from the inlet 31b toward the outlet 31d.
Specifically, the control operation of the control unit 39 is started when the operator inputs an operation input for starting the cleaning operation to the control unit 39 by an operation unit (not shown).
The control unit 39 sends a control signal for opening the flow control valves 35 and 33 to the flow control valves 35 and 33. Thereafter, the control unit 39 sends a control signal for operating the pump 36c to the pump 36c so as to suck the cleaning liquid L at a predetermined flow rate. In the present embodiment, since the flow is formed in a state where the cleaning object P is accommodated in the internal space S, the flow rate of the cleaning liquid L only needs to make the cleaning object P floating. For this reason, the flow rate q1 in the first embodiment is used as the flow rate of the cleaning liquid L in this step.
However, in this embodiment, the pump system 36 includes the flow control valves 35 and 33 and the pressure gauge 36f. Therefore, in this step, the control unit 39 performs control to adjust the opening amounts of the flow rate control valves 35 and 33 so that the flow rate q1 is maintained by monitoring the pressure detected by the pressure gauge 36f.

In this way, a flow of the cleaning liquid L from the inlet 31b toward the outlet 31d is formed inside the chamber 31. The flow of the cleaning liquid L is the same as that in step S3 in the first embodiment except that the cleaning liquid L flows in the horizontal direction in the vicinity of the introduction port 31b. The flow of the cleaning liquid L that moves horizontally from the introduction port 31b is guided by the cylindrical inner peripheral surface 31a, and becomes an upward flow along the cylindrical inner peripheral surface 31a. For this reason, in the internal space S, the cleaning liquid L flows vertically upward along the cylindrical inner peripheral surface 31a and the reduced diameter portion 31c above the introduction port 31b. When air remains in the internal space S, the air is also moved vertically upward by the flow of the cleaning liquid L.
When the cleaning liquid L reaches the height at which the reduced diameter portion 31c is located, the cleaning liquid L is accelerated by the inclination of the reduced diameter portion 31c and travels toward the discharge port 31d. When the cleaning liquid L exits the discharge port 31d, the cleaning liquid L is sucked into the pump 36c through the suction pipe 36b. The pump 36c discharges the cleaning liquid L to the storage tank 32 through the discharge pipe 36a.
In this way, when a steady flow of the cleaning liquid L is formed inside the chamber 31, step S43 ends.

Step S44 is performed after step S43. In step S <b> 44, the cleaning target P is cleaned while the cleaning target P is suspended inside the chamber 31.
When step S <b> 44 is started, the control unit 39 sends a control signal for applying ultrasonic vibration to the cleaning liquid L to the ultrasonic oscillator 8. The ultrasonic wave radiated from the ultrasonic oscillator 8 forms a standing wave in the internal space S.
The control unit 39 performs the steps S51 to S55 shown in FIG. 12 according to the flow shown in FIG.
Steps S51, S52, and S55 in the present embodiment are the same as steps S12, S13, and S16 in the first embodiment, respectively, except that the corresponding operations are performed using the cleaning system 104. However, the destination of the flow in the case of “NO” in steps S51 and S52 in the present embodiment is step S53. If “YES” in step S52 in the present embodiment, the flow transfer destination is step S55. If “NO” in the step S55 in the present embodiment, the flow transfer destination is the step S51.

In step S53, the control unit 39 performs control to adjust the opening amounts of the flow rate control valves 35 and 33 so that the flow rate q1 is maintained by monitoring the pressure detected by the pressure gauge 36f.
Therefore, in this step, the cleaning object P continues to rise inside the chamber 31 in the same manner as in step S14 in the first embodiment.

In step S54, the control unit 39 monitors the pressure detected by the pressure gauge 36f, so that the flow rate q2 (q2> 0) in the first embodiment is maintained, so that the flow rate control valve 35, Control for adjusting the opening amount at 33 is performed. The control time during which the control unit 39 maintains the flow rate q2 is a time that does not cause the falling distance of the cleaning object P to fall below the lower limit of the cleaning region at the flow rate q2, as in the first embodiment.
For this reason, in this step, the cleaning target P starts to descend in the chamber 31 as in step S15 in the first embodiment. The object to be cleaned P continues to descend while the flow rate is controlled to be q2.
When the control time has elapsed, step S54 ends. Step S55 is performed after step S54.

In step S55, an operation similar to that in step S16 in the first embodiment is performed except that the control unit 39 determines whether or not to end the cleaning.
In this way, steps S51 to S55 described above are repeated until the control unit 39 determines the end of cleaning.
If it is determined in step S55 that the cleaning has been completed, step S44 in FIG. 3 ends.
As shown in FIG. 3, after step S44, step S45 of the present embodiment is performed in the same manner as in the first embodiment.

In step S45, the object to be cleaned P is taken out.
In the present embodiment, the control unit 39 sends a control signal for stopping the pump 36c to the pump 36c. Further, the control unit 39 sends control signals for opening the flow control valve 33 and the valves 34 and 37 to the flow control valve 33 and the valve 34, respectively. Thereafter, the control unit 39 sends a control signal for opening the flow rate control valve 35 until the cleaning liquid L in the chamber 31 becomes an amount that does not hinder the removal. For example, the remaining amount of the cleaning liquid L is set so that the level of the cleaning liquid L in the internal space S is lower than at least the second end e2 of the chamber body 31A.
Thereafter, the operator removes the upper lid 31B from the chamber body 31A as shown in FIG. The operator takes out the cleaning object P to the outside of the chamber main body 31A using an appropriate take-out jig as necessary.
Above, step S45 is complete | finished and the cleaning method of this embodiment is complete | finished.

As described above, according to the cleaning system 104 and the cleaning method using the cleaning system 104 of the present embodiment, the upward flow of the cleaning liquid L formed in the chamber 31 causes the same as in the first embodiment. Thus, the cleaning object P is cleaned.
For this reason, according to the present embodiment, as in the first embodiment, the stability of the floating position of the cleaning object P during the cleaning is improved.

Furthermore, in this embodiment, the inlet 31b has a size that the cleaning target P cannot pass through. Thereby, since the cleaning target P is cleaned while being confined in the chamber 31, it is possible to reliably prevent the cleaning target P from deviating from the cleaning space.
Furthermore, in this embodiment, the cleaning liquid L circulates in a closed loop flow path. For this reason, the cleaning liquid L does not evaporate from the liquid surface of the storage tank 7 as in the first embodiment in which the cleaning liquid L for immersing the chamber 1 in the storage tank 7 needs to be stored. For this reason, the consumption of the cleaning liquid L can be reduced.
In the present embodiment, unlike the first embodiment, the amount of the cleaning liquid L used for cleaning is reduced in that it is not necessary to store a large amount of the cleaning liquid L outside the cleaning flow path in order to immerse the chamber 1. The

[Fifth Embodiment]
A cleaning apparatus according to a fifth embodiment of the present invention will be described.
FIG. 13 is a schematic configuration diagram illustrating an example of a cleaning device according to a fifth embodiment of the present invention.

As shown in FIG. 13, the cleaning system 105 (cleaning apparatus) of the present embodiment is replaced with the storage tank 32, the chamber 31, the pump system 36, and the control unit 39 of the cleaning system 104 of the fourth embodiment. A storage tank 42, a chamber 41, a pump system 46, and a control unit 49 are provided.
The cleaning system 105 of the present embodiment cleans the cleaning target P by floating it with a floating gas G (fluid).
Hereinafter, a description will be given focusing on differences from the fourth embodiment.

  The storage tank 42 stores the floating gas G. The floating gas G is not particularly limited as long as it is a gas that does not affect the cleaning target P even if it contacts the cleaning target P. For example, as the floating gas G, clean air may be used.

The chamber 41 includes a chamber body 41A (tubular portion) and a lower lid 41C instead of the chamber body 31A and the lower lid 31C of the chamber 31 in the fourth embodiment.
The chamber body 41A is configured by fixing the cleaning unit 40 to the cylindrical inner peripheral surface 31a of the chamber body 31A.
The cleaning unit 40 is not particularly limited as long as the cleaning object P floating in the flow of the floating gas G can be cleaned. Examples of the cleaning unit 40 include an ozone generator and a UV light irradiation device. In the present embodiment, the surface of the cleaning unit 40 is smoothly connected to the surrounding cylindrical inner peripheral surface 31a so as not to disturb the flow of the floating gas G.

The lower lid 41C is configured by a flat plate member in which the ultrasonic oscillator 8 is deleted from the lower lid 31C described in the fourth embodiment and the deleted portion of the ultrasonic oscillator 8 is closed.
The chamber body 41A, the upper lid 31B, and the lower lid 41C are assembled in the same manner as the chamber body 31A, the upper lid 31B, and the lower lid 31C in the third embodiment. However, in the chamber 41, the members are fixed so as to keep airtightness with respect to the floating gas G.
The upper lid 31B of this embodiment is detachably fixed to the chamber body 41A.

In the chamber 41 having such a configuration, when the lower lid 41C and the upper lid 31B are fixed to the chamber main body 41A, the lower lid 41C, the cylindrical inner peripheral surface 31a, the cleaning unit 40, and the reduced diameter are provided inside the chamber 31. An internal space T surrounded by the portion 31c is formed.
As shown in FIG. 13, in the state where the chamber 41 is arranged so that the lower lid 41C faces downward and the upper lid 31B faces upward, the discharge port 31d communicating with the internal space T is positioned above the introduction port 31b. To do.

The pump system 46 is a device part that forms a flow of the floating gas G in the internal space T of the chamber 41 from the inlet 31b toward the outlet 31d. In the example shown in FIG. 13, the pump system 46 includes a supply pipe 46e, a flow control valve 45, a pressure gauge 46f, a suction pipe 46b, a flow control valve 43, a pump 46c, a discharge pipe 46a, a communication pipe 46d, and a valve 44. .
In the supply pipe 46e, the flow control valve 45, the pressure gauge 46f, the suction pipe 46b, the flow control valve 43, the pump 46c, the discharge pipe 46a, the communication pipe 46d, and the valve 44, the floating gas G flows instead of the cleaning liquid L. The supply pipe 36e, the flow control valve 35, the pressure gauge 36f, the suction pipe 36b, the flow control valve 33, the pump 36c, the discharge pipe 36a of the pump system 36 in the fourth embodiment, except for the parts for gas flow. Functions similar to those of the communication pipe 36d and the valve 34 are provided.

The control unit 49 controls the overall operation of the cleaning system 105. Similarly to the control unit 39 of the fourth embodiment, the control unit 49 includes a first position detection sensor 3, a second position detection sensor 4, a third position detection sensor 5, a pump system 36, and an operation unit (not shown). It is connected so that it can communicate. Furthermore, the control part 49 is connected so that communication with the washing | cleaning unit 40 is possible.
The control unit 49 controls the operation of each connected device part. The device configuration of the control unit 49 is the same as that of the control unit 39 in the fourth embodiment.

The operation of the cleaning system 105 having such a configuration will be briefly described focusing on the differences from the fourth embodiment.
As in the fourth embodiment, the cleaning system 105 sucks the floating gas G with the pump 46c, so that the flow of the floating gas G from the inlet 31b to the outlet 31d is caused in the internal space T. It is formed.
As the control unit 49 controls the flow rate in the internal space T in the same manner as in the fourth embodiment, the cleaning object P is floated in the cleaning region in the internal space T.
However, the setting of the flow rate of the floating gas G in the present embodiment is changed according to conditions such as the pressure of the floating gas G, for example.
The control unit 49 sends a control signal to the cleaning unit 40 to start cleaning by the cleaning unit 40 in a floating state of the cleaning target P. For example, when ozone, UV light, or the like is irradiated from the cleaning unit 40, the ozone, UV light, etc. interact with the dirt component on the surface of the cleaning object P, so that the dirt component is decomposed and the cleaning object. It is removed from the surface of P.

Thus, according to the cleaning system 105, as in the fourth embodiment, the upward flow of the floating gas G formed inside the chamber body 31A that is a cylindrical body causes the above-described fourth embodiment to Similarly, the cleaning object P is brought into a floating state, and cleaning by the cleaning unit 40 is performed.
Since the upward flow of the floating gas G is disturbed, even if the floating position of the cleaning object P fluctuates, the cleaning object P is trapped inside the chamber 41, so that the cleaning object P is suspended in the floating gas. It does not deviate from the flow of G or jump out of the internal space T.
For this reason, according to the present embodiment, as in the fourth embodiment, the stability of the floating position of the cleaning object P during cleaning is improved.

[Sixth Embodiment]
A cleaning apparatus according to a sixth embodiment of the present invention will be described.
FIG. 14 is a schematic longitudinal sectional view showing an example of a main part of a cleaning device according to a sixth embodiment of the present invention. 15 is a cross-sectional view taken along line AA in FIG.

  As shown in FIG. 14, the cleaning system 106 (cleaning apparatus) of the present embodiment includes a chamber 51 instead of the chamber 1 of the cleaning system 100 of the first embodiment. Hereinafter, a description will be given centering on differences from the first embodiment.

The chamber 51 has a shape that is particularly suitable when the object to be cleaned P is a biconvex lens 53.
The biconvex lens 53 has convex surfaces 53a and 53b and a cylindrical lens side surface 53c on the surface.
In order to float such a biconvex lens 53 in the cleaning liquid L more efficiently, the chamber 51 is formed in a cylindrical shape having a through hole at the center.
The through hole of the chamber 51 is configured by connecting a first inner peripheral surface 51a, a reduced diameter portion 51b, and a second inner peripheral surface 51c in this order. Therefore, the chamber 51 includes a first cylindrical portion 51C (cylindrical portion) in which a first inner peripheral surface 51a and a reduced diameter portion 51b are formed, and a second inner peripheral surface 51c formed in the interior. Two cylindrical portions 51D.

As shown in FIG. 15, the first inner peripheral surface 51a has a cylindrical shape with an elliptical cross section. The cross section perpendicular to the axis of the first inner peripheral surface 51 a has a shape obtained by enlarging an ellipse that approximates the spindle shape viewed from the side of the biconvex lens 53. For this reason, when the biconvex lens 53 with the optical axis disposed in the horizontal direction (the left-right direction in the figure) is disposed at the center of the first inner peripheral surface 51a, the biconvex lens 53 and the first inner peripheral surface 51a A substantially equal gap is formed between them in the circumferential direction.
The first inner peripheral surface 51 a is open at the first end E <b> 1 of the chamber 51. An elliptical introduction port 51A is formed in the first end E1 by the first inner peripheral surface 51a.

The reduced diameter portion 51b has a shape that gradually decreases in diameter from the end of the first inner peripheral surface 51a in a state where the cross section perpendicular to the axis is substantially elliptical. The end 51d closest to the second end E2 in the reduced diameter portion 51b is fitted with a spindle shape in which the biconvex lens 53 is broken parallel to the optical axis at a position shifted from the optical axis.
The second inner peripheral surface 51c is configured such that the shape of the end 51d of the reduced diameter portion 51b extends to the second end E2 along the central axis of the first inner peripheral surface 51a.
A discharge port 51B is formed in the second end E2 of the chamber 51 by opening the second inner peripheral surface 51c.
However, as in the case of the first embodiment, the second inner peripheral surface 51c may be increased in diameter or reduced in diameter toward the second end E2. Therefore, the shape of the second inner peripheral surface 51c in the cross section perpendicular to the axis may be gradually changed from a spindle shape like the end portion 51d to an elliptical shape, a circular shape, or the like.

According to such a chamber 51, the flow of the cleaning liquid L is formed from the inlet 51 </ b> A toward the outlet 51 </ b> B, whereby an upward flow that flows substantially uniformly around the biconvex lens 53 is formed. For this reason, according to the chamber 51, the biconvex lens 53 can be stably floated substantially at the center of the first inner peripheral surface 51a.
The chamber 51 of the present embodiment is an example of a chamber that can stably maintain a floating state in the flow of the cleaning liquid L even if the shape of the cleaning object P is not spherical.

In the description of each of the above embodiments, an example in which a reduced diameter portion whose inner diameter is gradually reduced is formed on the inner peripheral surface of the cylindrical portion has been described. However, if the cross section of the flow path is changed, the reduced diameter portion may be changed in a step shape.
Furthermore, if the disturbance of the fluid flow is within an allowable range, the reduced diameter portion may not be provided on the inner peripheral surface of the cylindrical portion. For example, a configuration may be used in which a lid is provided at one end of the cylindrical portion, and a discharge port having an inner diameter smaller than the inner diameter of the inner peripheral surface of the cylindrical portion is provided at the center of the lid.

In the above description of each embodiment, an example in which the chamber has three position detectors has been described. However, the number of position detectors is not limited to three. One or more appropriate number of position detectors may be provided.
For example, if the sensor can identify the position of the object to be cleaned within the imaging range, such as an image sensor, the position of the object to be cleaned can be controlled within the cleaning region even with a single position detector. Is possible.

In the description of each of the above embodiments, the example in which the control unit controls the flow rate based on the detection output of each position detection sensor in order to keep the cleaning target P in a floating state has been described.
However, when the flow in the chamber is stable, the floating position, the descending speed, the ascending speed, etc. of the cleaning object P have a high correlation with the flow rate. For this reason, for example, if it is detected that the cleaning target P is floating at a certain position inside the chamber, the cleaning target P can be moved up and down in the cleaning region by periodically changing the flow rate. is there. In this case, the position detection sensor that detects the position of the cleaning target P while the cleaning target P is moved up and down may be omitted.
For example, when the lifting position of the cleaning object P can be observed directly or indirectly, the operator may manually adjust the flow rate of the cleaning liquid L according to the lifting position of the cleaning object P. Good.

  In the above description of each embodiment, an example has been described in which cleaning is performed by moving the cleaning target P up and down in the cleaning region during cleaning. However, even if the vertical floating position of the cleaning object P is fixed, the vertical floating position of the cleaning object P may be fixed if there is no problem in cleaning.

  In the description of the third embodiment, an example in which cleaning is performed by moving a chamber and an object to be cleaned between two reservoirs has been described. However, the cleaning may be performed by moving the chamber and the cleaning object between three or more storage tanks.

  In the description of the third embodiment and the first modification example, the case where the locking portion is adsorbed to the chamber by being in line contact with the object to be cleaned has been described. However, the locking portion may be formed in a shape that makes surface contact with the object to be cleaned.

  In the description of the first modification, the ring member 22 has the tapered surface 22b and the cylindrical inner peripheral surface 22c so that the cross-sectional shape of the ring member 22 is along the first inner peripheral surface 21a and the second inner peripheral surface 21c of the chamber 21. Explained in the case example. However, if the disturbance of the flow of the cleaning liquid L is within an allowable range, the ring member may have a convex shape having a step with respect to the first inner peripheral surface 21a. For example, the ring member may be configured by an O-ring, a square ring, or the like that is embedded in the first inner peripheral surface 21a so as to protrude from the first inner peripheral surface 21a.

In the description of each of the above embodiments, an example in which the pump system sucks fluid from the discharge port has been described. However, as long as an upward flow from the inlet to the outlet can be formed inside the chamber, the pump system may be configured to pump fluid from the inlet.
For example, in the fourth (fifth) embodiment, a pump that pumps the cleaning liquid L (floating gas G) may be provided on the flow path of the supply pipe 36e (46e).
In this case, when the flow in the chamber is formed only by the supply pressure of the pump to be pumped, the pump 36c (46c) that performs suction from the discharge port 31d may be further deleted. In the cleaning system 104 (105), since the reduced diameter portion 31c that restricts the flow is provided between the discharge port 31d and the cylindrical inner peripheral surface 31a, the cleaning liquid L (floating gas G) is discharged from the discharge port 31d. Even if pumped from the side, a smooth flow is formed in the cylindrical inner peripheral surface 31a.

The preferred embodiments and modifications of the present invention have been described above, but the present invention is not limited to these embodiments and modifications. Additions, omissions, substitutions, and other modifications can be made without departing from the spirit of the present invention.
Further, the present invention is not limited by the above description, and is limited only by the appended claims.
For example, the chamber 21 of the first modified example and the chamber 51 of the sixth embodiment may be used as chambers of other embodiments.

1, 21, 31, 41, 51 Chamber 1a, 21a, 51a First inner peripheral surface 1A, 31b, 51A Inlet port 1b, 21b, 31c, 51b Reduced diameter portion 1B, 31d, 51B Discharge port 1c, 21c, 51c First 2 Inner peripheral surfaces 1C, 21C, 51C First cylindrical part (cylindrical part)
1d, 22d Locking portions 1D, 21D, 51D Second cylindrical portion 3 First position detection sensor (position detector)
4 Second position detection sensor (position detector)
5 Third position detection sensor (position detector)
6, 16, 36, 46 Pump system 6c, 36c, 46c Pump 7 Storage tank (first storage tank)
27 Reservoir (second reservoir)
32, 42 Reservoir 8, 28 Ultrasonic oscillator 9A, 9B, 39, 49 Control unit 10A First flow control valve (flow control valve)
10B Second flow control valve (flow control valve)
33, 35, 43, 45 Flow control valve 22 Ring member 31a Cylindrical inner peripheral surface 31A, 41A Chamber body (cylindrical portion)
31B Top cover (cylindrical part)
34, 37, 44 Valve 40 Cleaning unit 51d End (locking portion)
53 Biconvex lens (object to be cleaned)
100, 101, 102, 103, 104, 105, 106 Cleaning system a0, a1, a2 Suction force f Apparent gravity F1, F2, F3, F21, F21, F22, F31, F32 Flow G Floating gas (fluid)
L, L1, R Cleaning fluid (fluid)
P Cleaning object S, T Internal space

Claims (14)

An inlet that introduces fluid, an outlet that discharges the fluid, and a cylindrical portion through which the fluid can flow between the inlet and the outlet, and inside the cylindrical portion A chamber containing the object to be cleaned;
A pump system having a pump for sucking the fluid in the cylindrical portion through the discharge port, and forming a flow of the fluid from the introduction port toward the discharge port in the cylindrical portion;
A cleaning apparatus comprising: The fluid is a cleaning liquid;
The cleaning apparatus according to claim 1. The cylindrical portion is arranged so that the discharge port is on the upper side than the introduction port,
The cleaning apparatus according to claim 1 or 2. On the inner peripheral surface of the cylindrical portion, a reduced diameter portion is formed that is reduced in diameter in a direction from the introduction port toward the discharge port.
The cleaning apparatus according to any one of claims 1 to 3. A storage tank for storing the fluid;
The pump system circulates the fluid between the chamber and the reservoir;
The cleaning apparatus according to any one of claims 1 to 4. The pump system includes a flow control valve that controls a suction amount of the fluid from the discharge port.
The cleaning apparatus according to any one of claims 1 to 5. The inner peripheral surface of the cylindrical portion is provided with a locking portion having an opening that can be closed by the object to be cleaned,
By the suction of the fluid by the pump system, the object to be cleaned can be adsorbed to the locking portion.
The cleaning apparatus according to any one of claims 1 to 6. The locking portion is made of an elastic member that can be deformed when the object to be cleaned comes into contact.
The cleaning apparatus according to claim 7. A position detector for detecting the position of the object to be cleaned in the cylindrical portion;
The cleaning apparatus according to any one of claims 1 to 8. A controller that controls the position of the object to be cleaned in the direction along the flow in the cylindrical portion by driving the pump system based on the detection output of the position detector;
The cleaning apparatus according to claim 9. An ultrasonic oscillator for applying ultrasonic vibrations to the inside of the cylindrical portion of the chamber;
The cleaning apparatus according to any one of claims 1 to 10. An inlet for introducing a fluid, an outlet for discharging the fluid, a cylindrical portion through which the fluid can flow between the inlet and the outlet, and a cylindrical portion formed in the cylindrical portion from the inlet A reduced-diameter portion that reduces the diameter in a direction toward the discharge port, and a chamber that accommodates an object to be cleaned inside the cylindrical portion;
A pump system for forming a flow of the fluid from the inlet to the outlet in the cylindrical portion of the chamber;
A cleaning apparatus comprising: An inlet for introducing a fluid, an outlet for discharging the fluid, and a cylindrical part through which the fluid can flow between the inlet and the outlet, and the inside of the cylindrical part Preparing a chamber for containing the object to be cleaned;
Disposing the tubular portion so that the discharge port is on the upper side of the introduction port;
Forming the flow of the fluid from the inlet to the outlet in the inside of the tubular portion in a state where the object to be cleaned is accommodated in the inside of the tubular portion;
By controlling the flow rate of the flow, cleaning the cleaning target in a state where the cleaning target is suspended in the cylindrical portion;
Including a cleaning method. The chamber is prepared to be movable between a plurality of storage tanks storing the different fluids,
After the cleaning is completed by the fluid stored in the first storage tank among the plurality of storage tanks, the fluid is sucked from the discharge port so that the object to be cleaned is removed from the cylindrical portion. Adsorbing in the interior;
Moving the chamber on which the object to be cleaned is adsorbed to a second storage tank among the plurality of storage tanks;
The cleaning method according to claim 13, further comprising:

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