JP2018165393A - Surface treatment apparatus - Google Patents

Surface treatment apparatus Download PDF

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JP2018165393A
JP2018165393A JP2017063751A JP2017063751A JP2018165393A JP 2018165393 A JP2018165393 A JP 2018165393A JP 2017063751 A JP2017063751 A JP 2017063751A JP 2017063751 A JP2017063751 A JP 2017063751A JP 2018165393 A JP2018165393 A JP 2018165393A
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surface treatment
liquid
gas
treatment apparatus
treatment tank
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JP6914073B2 (en
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正仁 谷川
Masahito Tanigawa
正仁 谷川
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Uemera Kogyo Co Ltd
C Uyemura and Co Ltd
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Uemera Kogyo Co Ltd
C Uyemura and Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a surface treatment apparatus that can reduce the number of devices attendant on surface treatment equipment such as pumps, for cost reduction.SOLUTION: A surface treatment apparatus 100 is used for treating a target surface 105, and has: a surface treatment tank 102 that stores at least a surface treatment liquid 101; and an aspirator 103 that has a gas introduction port 103a that introduces gas into the surface treatment tank 102, a liquid introduction port 103b that introduces liquid, and a discharge port 103c that mixes the gas introduced from the gas introduction port 103a and the liquid introduced from the liquid introduction port 103b to discharge the mixture, where the gas introduction port 103a is connected to outside of the surface treatment tank 102.SELECTED DRAWING: Figure 1

Description

本発明は、被処理物表面を処理するために用いられる表面処理装置に関する。   The present invention relates to a surface treatment apparatus used for treating a surface of a workpiece.

表面処理は、めっきや塗装など処理対象物の性質を向上させるために行われる。表面処理の一例としてめっきを例に挙げる場合、通常めっきする際、めっき液を撹拌しながらめっきする。その撹拌方法として、めっき液中でバブリングや噴流を用いて行っている。また、噴流に空気を混ぜ、液体と気体の両方により撹拌しめっきを行っている。   The surface treatment is performed in order to improve the properties of the object to be treated such as plating or painting. When plating is given as an example of the surface treatment, plating is usually performed while stirring a plating solution when plating. As the stirring method, bubbling or jet flow is used in the plating solution. In addition, air is mixed with the jet, and stirring is performed with both liquid and gas to perform plating.

特許文献1では、被処理基板の下方へ無電解めっき液をポンプ等により供給し、被処理基板の下方に供給された無電解めっき液内へ酸素含有気体をエアーポンプ等により散気し、液体と気体の両方で撹拌しながらめっきすることが記載されている。   In Patent Document 1, an electroless plating solution is supplied by a pump or the like below the substrate to be processed, and an oxygen-containing gas is diffused by an air pump or the like into the electroless plating solution supplied below the substrate to be processed. And plating with stirring in both gas and gas.

特開2016−060935号公報JP, 2006-060935, A

しかしながら、液体と気体の両方により撹拌する場合、液体用ポンプと気体用ポンプの両方が必要となる。通常、めっき等の表面処理設備の環境は、表面処理液が酸やアルカリのため、酸やアルカリ雰囲気であることが多く、その場合、ポンプ等の表面処理設備に備わる付帯装置を腐食させるなどの悪影響を及ぼす。よって、ポンプ等の表面処理設備に備わる付帯装置の個数は、設備環境、メンテナンス面、コスト等の面から極力少ない方が好ましい。   However, in the case of stirring with both liquid and gas, both a liquid pump and a gas pump are required. Usually, the environment of surface treatment equipment such as plating is often an acid or alkali atmosphere because the surface treatment solution is acid or alkali, and in such cases, corrosive equipment attached to the surface treatment equipment such as a pump is corroded. Adversely affect. Therefore, it is preferable that the number of auxiliary devices provided in a surface treatment facility such as a pump is as small as possible in terms of facility environment, maintenance, cost, and the like.

そこで、本発明はそのような表面処理環境の中、ポンプ等の表面処理設備に備わる付帯装置の個数を減らし、省コスト化が可能な表面処理装置を提供することを目的とする。   Therefore, an object of the present invention is to provide a surface treatment apparatus capable of reducing the cost by reducing the number of auxiliary devices provided in a surface treatment facility such as a pump in such a surface treatment environment.

本発明の一態様に係る表面処理装置は、被処理物表面を処理するために用いられる表面処理装置であって、少なくとも表面処理液が収容された表面処理槽と、前記表面処理槽に、気体を導入する気体導入口と、液体を導入する液体導入口と、前記気体導入口から導入した前記気体と前記液体導入口から導入された前記液体とを混合して吐出する吐出口とを有するアスピレーターとを備え、前記気体導入口が前記表面処理槽の外部と接続されていることを特徴とする。   A surface treatment apparatus according to one embodiment of the present invention is a surface treatment apparatus used for treating a surface of an object to be processed, and includes a surface treatment tank containing at least a surface treatment liquid, and a gas in the surface treatment tank. An aspirator having a gas introduction port for introducing liquid, a liquid introduction port for introducing liquid, and a discharge port for mixing and discharging the gas introduced from the gas introduction port and the liquid introduced from the liquid introduction port And the gas inlet is connected to the outside of the surface treatment tank.

このようにすれば、アスピレーターにより気体と液体を同時に吐出できるので、エアーポンプが不要となり、ポンプの個数を減らし、省コスト化が可能となる。   In this way, since gas and liquid can be discharged simultaneously by the aspirator, an air pump becomes unnecessary, the number of pumps can be reduced, and cost can be saved.

このとき、本発明の一態様では、前記気体導入口に導入される前記気体の吸気量を調節する吸気量調節機構が前記液体導入口の上流側にさらに設けられていても良い。   At this time, in one aspect of the present invention, an intake air amount adjusting mechanism for adjusting an intake air amount of the gas introduced into the gas inlet may be further provided on the upstream side of the liquid inlet.

このようにすれば、空気の量が調節可能となるので、被処理物表面の酸化を制御できるなど、所望の気体量とすることができる。   In this way, since the amount of air can be adjusted, it is possible to obtain a desired gas amount, such as controlling the oxidation of the surface of the workpiece.

このとき、本発明の一態様では、前記液体導入口の上流側に前記液体を分岐させるための分岐機構と、前記分岐機構の下流側に前記吸気量調節機構がさらに設けられ、前記吸気量調節機構の下流から液体を吐出させても良い。   At this time, in one aspect of the present invention, a branch mechanism for branching the liquid upstream of the liquid inlet, and an intake air amount adjusting mechanism downstream of the branch mechanism are further provided, and the intake air amount adjustment Liquid may be discharged from the downstream of the mechanism.

このようにすれば、所望の単位時間当たりの必要な処理液の循環量とすることができる。   If it does in this way, it can be set as the circulation amount of the process liquid required per unit time desired.

このとき、本発明の一態様では、前記吐出口は、前記表面処理槽底部の前記被処理物の底部と対向する位置に、前記表面処理槽の底部から頂部に向けて混合された前記気体と前記液体を吐出するように設けられても良い。   At this time, in one aspect of the present invention, the discharge port is mixed with the gas mixed from the bottom to the top of the surface treatment tank at a position facing the bottom of the object to be processed at the bottom of the surface treatment tank. You may provide so that the said liquid may be discharged.

このようにすれば、直接的に被処理物に気体と液体が同時にあたるので、被処理物表面近傍の溶液を効率よく撹拌でき、また液流が下から上になるので、溶液中の不純物をオーバーフローから気泡と一緒に除去できる。   In this way, since the gas and liquid are directly applied to the object to be processed at the same time, the solution near the surface of the object to be processed can be efficiently stirred, and the liquid flow goes from bottom to top. Can be removed along with bubbles from the overflow.

このとき、本発明の一態様では、前記吐出口は、前記表面処理槽底部の前記被処理物の底部と対向する位置を除く位置の何れかに複数設けられていても良い。   At this time, in one embodiment of the present invention, a plurality of the discharge ports may be provided at any position excluding a position facing the bottom of the object to be processed at the bottom of the surface treatment tank.

このようにすれば、被処理物の両側面に気体と液体が同時に吐出されるので、被処理物の両側面の溶液を効率よく撹拌できる。   In this way, since the gas and the liquid are simultaneously discharged to both side surfaces of the object to be processed, the solutions on both side surfaces of the object to be processed can be efficiently stirred.

このとき、本発明の一態様では、前記吐出口は、前記表面処理槽側面の前記被処理物側面と対向する位置に、前記表面処理槽側面から中央に向けて混合された前記気体と前記液体を吐出するように設けられていても良い。   At this time, in one mode of the present invention, the discharge port is mixed with the gas and the liquid mixed from the side surface of the surface treatment tank toward the center at a position facing the side surface of the object to be processed on the side surface of the surface treatment tank. It may be provided so as to discharge.

このようにすれば、被処理物表面である被処理物側面に直接あたるので、被処理物表面の溶液をさらに効率よく撹拌できる。   If it does in this way, since it will contact directly to the processed material side which is the processed material surface, the solution on the processed material surface can be stirred more efficiently.

また、本発明の一態様では、前記吐出口は、前記表面処理槽側面近傍で前記被処理物の底部下端より下方に設けられ、前記表面処理槽側面から中央に向けて混合された前記気体と前記液体を吐出するように設けられていても良い。   Moreover, in one aspect of the present invention, the discharge port is provided below the bottom lower end of the object to be processed in the vicinity of the side surface of the surface treatment tank, and the gas mixed from the side surface of the surface treatment tank toward the center. It may be provided to discharge the liquid.

このようにすれば、被処理物に気体と液体を直接あてない場合の、液中の溶存酸素量を増減させることができる。   In this way, the amount of dissolved oxygen in the liquid can be increased or decreased when the gas and liquid are not directly applied to the object to be processed.

また、本発明の一態様では、前記表面処理装置は、さらに液体導入口の上流側に前記液体を分岐させるための分岐機構と、前記分岐機構の下流に液体を吐出させるための液体吐出機構が設けられても良い。   In the aspect of the invention, the surface treatment apparatus may further include a branch mechanism for branching the liquid to the upstream side of the liquid introduction port, and a liquid discharge mechanism for discharging the liquid downstream of the branch mechanism. It may be provided.

このようにすれば、局所的に液体のみを被処理物に吐出させ、液体のみの撹拌を必要とする場合に有利である。   This is advantageous when only the liquid is locally discharged onto the object to be processed and only the liquid needs to be stirred.

以上説明したように本発明によれば、アスピレーターにより気体と液体を同時に吐出できるので、エアーポンプが不要となり、ポンプの個数を減らし、省コスト化が可能となる。   As described above, according to the present invention, gas and liquid can be discharged simultaneously by an aspirator, so that an air pump is not required, the number of pumps can be reduced, and cost can be reduced.

図1(A)は、本発明の一実施形態に係る表面処理装置の一例を示す概略構成で、アスピレーターを表面処理槽に直接接続しない態様を示す図であり、図1(B)は、本発明の一実施形態に係る表面処理装置の一例を示す概略構成で、アスピレーターを表面処理槽に直接接続する態様を示す図である。FIG. 1 (A) is a schematic configuration showing an example of a surface treatment apparatus according to an embodiment of the present invention, and is a view showing an aspect in which an aspirator is not directly connected to a surface treatment tank, and FIG. It is a schematic structure which shows an example of the surface treatment apparatus concerning one embodiment of the invention, and is a figure showing the mode which connects an aspirator directly to a surface treatment tank. 図2は、本発明の実施形態に係る表面処理装置の一変形例を示す概略構成図である。FIG. 2 is a schematic configuration diagram showing a modification of the surface treatment apparatus according to the embodiment of the present invention. 図3は、本発明の他の実施形態に係る表面処理装置の他の一変形例を示す概略構成図である。FIG. 3 is a schematic configuration diagram showing another modification of the surface treatment apparatus according to another embodiment of the present invention. 図4は、本発明の他の実施形態に係る表面処理装置のさらに他の一変形例を示す概略構成図である。FIG. 4 is a schematic configuration diagram showing still another modification of the surface treatment apparatus according to another embodiment of the present invention. 図5は、本発明の他の実施形態に係る表面処理装置のさらに他の一変形例を示す概略構成図である。FIG. 5 is a schematic configuration diagram showing still another modification of the surface treatment apparatus according to another embodiment of the present invention. 図6は、本発明の他の実施形態に係る表面処理装置のさらに他の一変形例を示す概略構成図である。FIG. 6 is a schematic configuration diagram showing still another modification of the surface treatment apparatus according to another embodiment of the present invention.

以下、本発明の好適な実施の形態について詳細に説明する。なお、以下に説明する本実施形態は、特許請求の範囲に記載された本発明の内容を不当に限定するものではなく、本実施形態で説明される構成の全てが本発明の解決手段として必須であるとは限らない。   Hereinafter, preferred embodiments of the present invention will be described in detail. The present embodiment described below does not unduly limit the contents of the present invention described in the claims, and all the configurations described in the present embodiment are essential as means for solving the present invention. Not necessarily.

まず、本発明の一実施形態に係る表面処理装置の構成について、図面を使用しながら説明する。図1は、本発明の一実施形態に係る表面処理装置の概略構成を示す図である。   First, the configuration of a surface treatment apparatus according to an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a diagram showing a schematic configuration of a surface treatment apparatus according to an embodiment of the present invention.

本発明の一実施形態に係る表面処理装置100は、図1に示すように、被処理物105表面を処理するために用いられ、少なくとも表面処理液101が収容された表面処理槽102を備える。そして、上記表面処理槽102に、気体を導入する気体導入口103aと、液体を導入する液体導入口103bと、上記気体導入口103aから導入した上記の気体と上記液体導入口103bから導入された上記液体とを混合して同時に吐出する吐出口103cとを有するアスピレーター103とを備える。そして、上記気体導入口103aが上記表面処理槽102の外部と接続されていることを特徴とする。   As shown in FIG. 1, the surface treatment apparatus 100 according to an embodiment of the present invention is used to treat the surface of the workpiece 105 and includes a surface treatment tank 102 in which at least a surface treatment liquid 101 is accommodated. The gas was introduced into the surface treatment tank 102 from the gas introduction port 103a for introducing gas, the liquid introduction port 103b for introducing liquid, the gas introduced from the gas introduction port 103a, and the liquid introduction port 103b. An aspirator 103 having a discharge port 103c that mixes and discharges the liquid at the same time. The gas introduction port 103a is connected to the outside of the surface treatment tank 102.

図1に示すように、アスピレーター103は基本的にT字管になっており、図1のアスピレーター103の垂直線にあたる管の下方を液体導入口103bへ接続する。そして、その垂直線にあたる管の上方は、吐出口103cとなる。垂直線にあたる管の内部は一部細くなっており、ここから分岐して水平線にあたる気体導入口103aが付く。図1のアスピレーター103の水平方向へは液体が流れ込まないようになっている。垂直方向に水を流すと、管内の細くなった部分で流速が増すため、ベンチュリ効果によって圧力が低下する。この減圧になった液流に上記の気体導入口103aが表面処理槽102の外部に接続された周囲の気体が流れ込み、アスピレーター103内で気体と液体が混合され、吐出口103cから気体と液体が同時に吐出される。   As shown in FIG. 1, the aspirator 103 is basically a T-shaped tube, and the lower part of the tube corresponding to the vertical line of the aspirator 103 in FIG. 1 is connected to the liquid inlet 103b. And the upper part of the pipe | tube which corresponds to the perpendicular line becomes the discharge outlet 103c. The inside of the pipe corresponding to the vertical line is partially narrowed, and a gas introduction port 103a which branches from here and corresponds to the horizontal line is attached. The liquid does not flow in the horizontal direction of the aspirator 103 in FIG. When water is caused to flow in the vertical direction, the flow velocity increases at a narrowed portion in the pipe, and therefore the pressure decreases due to the venturi effect. The surrounding gas in which the gas inlet 103a is connected to the outside of the surface treatment tank 102 flows into the reduced pressure liquid flow, and the gas and the liquid are mixed in the aspirator 103, and the gas and the liquid are discharged from the outlet 103c. It is discharged at the same time.

また、気体導入口103aへ導入される気体は、気体導入口103aが表面処理槽102の外部と接続されることにより、気体を取り入れ、取り入れられた気体は例えば配管108などを通って、アスピレーター103内で液体導入口103bから導入された液体と混合して、吐出口103cから気体と液体が同時に吐出される。一方、液体導入口103bへ導入される液体は、表面処理槽102に収容された表面処理液が、オーバーフロー槽107から配管108を通ってポンプ106へ移送され、ポンプ106から配管108を通って液体導入口103bへ接続され、アスピレーター103内で気体導入口103aから導入された気体と混合して、吐出口103cから気体と液体が同時に吐出される。   Further, the gas introduced into the gas introduction port 103a is introduced by connecting the gas introduction port 103a to the outside of the surface treatment tank 102, and the introduced gas passes through, for example, the pipe 108 and the aspirator 103. The gas and the liquid are simultaneously discharged from the discharge port 103c by mixing with the liquid introduced from the liquid introduction port 103b. On the other hand, the liquid introduced into the liquid introduction port 103b is obtained by transferring the surface treatment liquid stored in the surface treatment tank 102 from the overflow tank 107 to the pump 106 through the pipe 108 and from the pump 106 through the pipe 108. The gas is connected to the inlet 103b, mixed with the gas introduced from the gas inlet 103a in the aspirator 103, and the gas and the liquid are simultaneously discharged from the outlet 103c.

また、上記アスピレーター103は、複数設けても良い。例えば、撹拌を強く必要とする場合には、複数設けた方が有利である。   A plurality of the aspirators 103 may be provided. For example, when strong stirring is required, it is advantageous to provide a plurality of stirring.

さらに、ポンプ106の前後の何れかに濾過装置を設けることが好ましい。このようにすれば、循環させる液体に浮遊する不純物を濾過し、不純物そのものによるアスピレーター103内での詰まりを防止できる。また、表面処理が無電解めっきの場合、不純物の存在により、それが核となって金属結晶を成長させてしまうことによる、アスピレーター103内での詰まりを防止できる。   Furthermore, it is preferable to provide a filtration device either before or after the pump 106. In this way, impurities floating in the circulated liquid can be filtered, and clogging in the aspirator 103 due to the impurities themselves can be prevented. In addition, when the surface treatment is electroless plating, clogging in the aspirator 103 due to the presence of impurities that causes the metal crystal to grow as a nucleus can be prevented.

また、本発明の一実施形態に係る表面処理装置100は、図1(A)に示すように、気体導入口103aに導入される気体の吸気量を調節する吸気調節機構104が、液体導入口103bの上流側にさらに設けられていることが好ましい。さらに吸気調節機構104は、液体導入口103bの上流側でかつ、ポンプ106の下流側に設けられることが好ましい。例えば、液体導入口103bとポンプ106の間に設けられる。このようにすれば、液体導入口103bの上流側に設けた、吸気調節機構104により、ポンプ106から液体導入口103bへ送る液の流速を調節することにより、吸気する空気の量が調節可能となるので、所望の気体量とすることができる。   Further, as shown in FIG. 1 (A), the surface treatment apparatus 100 according to an embodiment of the present invention includes an air intake adjustment mechanism 104 that adjusts an intake amount of gas introduced into the gas introduction port 103a. Preferably, it is further provided on the upstream side of 103b. Further, the intake air adjusting mechanism 104 is preferably provided on the upstream side of the liquid inlet 103 b and on the downstream side of the pump 106. For example, it is provided between the liquid inlet 103 b and the pump 106. In this way, the amount of air to be sucked can be adjusted by adjusting the flow rate of the liquid sent from the pump 106 to the liquid inlet 103b by the intake air adjusting mechanism 104 provided on the upstream side of the liquid inlet 103b. As a result, a desired gas amount can be obtained.

例えば、気体と液体を混合し吐出させ撹拌させたい状況において、被処理物105の表面酸化を抑えたい場合には、上記の吸気調節機構104により調節し、吸気量を抑えれば良い。一方、被処理物105の表面酸化を進めたい場合には、同様に上記の吸気調節機構104により調節し、吸気量を増加させればよい。また液中の溶存酸素量を制御できる。   For example, when it is desired to suppress the surface oxidation of the workpiece 105 in a situation where gas and liquid are mixed and discharged and stirred, the intake air amount may be suppressed by adjusting the intake air adjusting mechanism 104. On the other hand, when it is desired to proceed the surface oxidation of the workpiece 105, the intake air amount may be increased by adjusting the intake air adjusting mechanism 104 in the same manner. Moreover, the amount of dissolved oxygen in the liquid can be controlled.

上記の吸気調節機構104は、特に限定されるものではないが、例えばバルブにより吸気量を調節すれば良い。なお、バルブを閉じていくと、流れる液の流量が減ることで流速が遅くなり、吸気量が減る。一方バルブを開いていくと、流れる液の流量が増すことで、流速が速くなり、吸気量が増える。   The intake air adjusting mechanism 104 is not particularly limited, but the intake air amount may be adjusted by a valve, for example. Note that when the valve is closed, the flow rate of the flowing liquid is reduced, the flow velocity is reduced, and the intake amount is reduced. On the other hand, when the valve is opened, the flow rate of the flowing liquid increases, so that the flow velocity increases and the intake amount increases.

また、調節機構のさらに上流側にエアーフィルターを設けたほうが好ましい。このようにすれば、大気中に浮遊する不純物を吸気の際に吸気することを防止し、より不純物の少ない気体をアスピレーター103に導入でき、不純物そのものによるアスピレーター103内での詰まりを防止できる。また、表面処理が無電解めっきの場合、不純物の存在により、それが核となって金属結晶を成長させてしまうことによる、アスピレーター103内での詰まりを防止できる。さらに、上記に設けるエアーフィルターは、カーボンフィルターがより好ましい。表面処理雰囲気は、めっき液やめっき前処理などの表面処理液に有機物が添加される場合があり、また表面処理装置に添加される潤滑剤などの有機物が浮遊している場合があるので、大気中の不純物の他に上記の有機物も除去できるからである。上記のフィルターを組み合わせても良い。また、吸気量調整機構104を設けずに上記のフィルターを設けてもよい。エアーフィルターを設ける場合は、吸気の妨げとならないよう、十分な通気性を持ったエアーフィルターを選定する。   Moreover, it is preferable to provide an air filter further upstream of the adjusting mechanism. In this way, it is possible to prevent inhalation of impurities floating in the atmosphere when inhaling, to introduce a gas with less impurities into the aspirator 103, and to prevent clogging in the aspirator 103 due to the impurities themselves. In addition, when the surface treatment is electroless plating, clogging in the aspirator 103 due to the presence of impurities that causes the metal crystal to grow as a nucleus can be prevented. Furthermore, the air filter provided above is more preferably a carbon filter. In the surface treatment atmosphere, organic matter may be added to the surface treatment solution such as plating solution or pre-plating treatment, and organic matter such as lubricant added to the surface treatment equipment may be floating. This is because the above organic substances can be removed in addition to the impurities therein. You may combine said filter. Further, the above-described filter may be provided without providing the intake air amount adjusting mechanism 104. When installing an air filter, select an air filter with sufficient ventilation so as not to obstruct air intake.

また、気体導入口103aの上流側の配管に真空計を取り付けることが好ましい。そうすることで、真空計の値から配管を通る気体の流動状況を確認できるので、完全に詰まった後の段階ばかりでなく、詰まる前段階が確認できる。よって、配管の詰まりを未然に防止でき、アスピレーターからの吐出量をより一定に保つことができる。ゆえに、被処理物の表面処理能力の向上が可能となる。   Moreover, it is preferable to attach a vacuum gauge to piping upstream of the gas inlet 103a. By doing so, since the state of gas flow through the pipe can be confirmed from the value of the vacuum gauge, not only the stage after completely clogging but also the stage before clogging can be confirmed. Therefore, clogging of the pipe can be prevented in advance, and the discharge amount from the aspirator can be kept more constant. Therefore, it is possible to improve the surface treatment capability of the workpiece.

さらに図1(A)では、表面処理槽102内に配管108を設け、アスピレーター103を表面処理槽102に設ける態様を示したが、例えば図1(B)に示すように、アスピレーター113を表面処理槽112に直接接続する態様とした表面処理装置110も可能である。このとき、気体導入口113aは気体を導入するため、表面処理槽112の外部となるように接続する。   Further, FIG. 1A shows a mode in which the pipe 108 is provided in the surface treatment tank 102 and the aspirator 103 is provided in the surface treatment tank 102. For example, as shown in FIG. A surface treatment apparatus 110 that is directly connected to the tank 112 is also possible. At this time, the gas inlet 113a is connected to be outside the surface treatment tank 112 in order to introduce gas.

例えば、図1(A)としては、表面処理槽102に浸漬された被処理物105の底部105b下端より下方のスペースに、アスピレーター103を導入できる場合や、設置地面から表面処理槽102の底部102bまでにアスピレーター103を導入できるスペースがない場合、又は設置が困難な場合に選択する方が好ましい。   For example, as shown in FIG. 1A, the aspirator 103 can be introduced into a space below the lower end of the bottom 105b of the workpiece 105 immersed in the surface treatment tank 102, or the bottom 102b of the surface treatment tank 102 from the installation ground. It is preferable to select when there is no space where the aspirator 103 can be introduced or when installation is difficult.

一方、図1(B)としては、表面処理槽112に浸漬された被処理物115の底部115b下端より下方のスペースに、アスピレーター113を導入できない場合や、設置地面から表面処理槽112の底部112bまでにアスピレーター113を導入できるスペースがある場合や、設置が比較的容易な場合に選択する方が好ましい。   On the other hand, as shown in FIG. 1B, when the aspirator 113 cannot be introduced into the space below the lower end of the bottom 115b of the workpiece 115 immersed in the surface treatment tank 112, or when the bottom 112b of the surface treatment tank 112 is installed from the installation ground. It is preferable to select when there is a space where the aspirator 113 can be introduced or when the installation is relatively easy.

上述したように従来、液体と気体の両方により撹拌する場合、液体用ポンプと気体用ポンプの両方が必要となっていた。通常、表面処理設備の環境は、めっき前処理液やめっき液などの表面処理液が酸やアルカリのため、酸やアルカリ雰囲気であることが多く、その場合、ポンプ等の表面処理設備に備わる付帯装置を腐食させたり、酸やアルカリ雰囲気により装置に結晶が付着し、さらに腐食を進行させたりするなど悪影響を及ぼす。またポンプは高額なため初期コストが増加する。さらに酸やアルカリ雰囲気のため故障率が高く、設備の維持コストや、ポンプ交換の人的コストが増加する。場合によっては、ポンプは各槽に1個以上必要となるので、気体と液体との混合撹拌が必要な場合には、層ごとにポンプの台数が増加していく。よってポンプ等の付帯装置の個数は、設備環境、メンテナンス面、コスト等の面から極力少ない方が好ましい。   As described above, conventionally, in the case of stirring with both liquid and gas, both a liquid pump and a gas pump have been required. Usually, the surface treatment equipment environment is often an acid or alkali atmosphere because the surface treatment liquid such as pre-plating solution or plating solution is acid or alkali. It has adverse effects such as corroding the device, and crystals adhering to the device due to an acid or alkali atmosphere, and further causing corrosion. In addition, the initial cost increases because the pump is expensive. Furthermore, the failure rate is high due to the acid or alkali atmosphere, and the maintenance cost of the equipment and the human cost of pump replacement increase. In some cases, one or more pumps are required for each tank, and therefore, when mixing and stirring of gas and liquid is required, the number of pumps increases for each layer. Therefore, the number of auxiliary devices such as pumps is preferably as small as possible from the standpoints of equipment environment, maintenance and cost.

そこで、本発明の一実施形態に係る表面処理装置100によれば、表面処理槽102に設けられたアスピレーター103を用いることで、気体導入口103aと液体導入口103bから導入された気体と液体を吐出口103cから同時に吐出することで、エアーポンプが不要となり、ポンプの個数を減らし、省コスト化が可能となる。   Therefore, according to the surface treatment apparatus 100 according to an embodiment of the present invention, the gas and liquid introduced from the gas introduction port 103a and the liquid introduction port 103b are obtained by using the aspirator 103 provided in the surface treatment tank 102. By discharging simultaneously from the discharge port 103c, an air pump becomes unnecessary, the number of pumps can be reduced, and cost can be reduced.

さらに、本発明の一実施形態に係る表面処理装置100によれば、上記の設備のコスト面等ばかりでなく、気体と液体を混合して同時に吐出し撹拌しているので、撹拌力が向上することで、表面処理が例えばめっきの場合、めっき析出の促進が可能となる。また、被処理物105表面に付着した不純物も除去しやすくなり、被処理表面の異物、ざらつき等といった外観不良も改善できる。よって、表面処理能力の向上が可能となる。   Furthermore, according to the surface treatment apparatus 100 according to an embodiment of the present invention, not only the cost of the above equipment, but also the gas and the liquid are mixed and simultaneously discharged and stirred, so that the stirring power is improved. Thus, when the surface treatment is, for example, plating, it is possible to promote plating deposition. Further, impurities attached to the surface of the workpiece 105 can be easily removed, and appearance defects such as foreign matters and roughness on the surface to be processed can be improved. Therefore, the surface treatment ability can be improved.

またアスピレーターはエアーポンプと比べ、非常に安価である。また、アスピレーターは小設備なので、初期の設置や後付けが容易である。またそれがゆえに、表面処理槽の幅広い改造ができるので、様々な表面処理の仕様に対応可能である。以下本発明の一実施形態に係る表面処理装置100の態様、変形例について説明する。   Aspirators are very cheap compared to air pumps. In addition, since the aspirator is a small facility, it can be easily installed and retrofitted. In addition, because of this, the surface treatment tank can be widely modified, so that various surface treatment specifications can be accommodated. Hereinafter, aspects and modifications of the surface treatment apparatus 100 according to an embodiment of the present invention will be described.

本発明の一実施形態に係る表面処理装置100は、図1(A)に示すように、吐出口103cは、表面処理槽102底部102bの被処理物105の底部105bと対向する位置に、上記表面処理槽102の底部102bから頂部に向けて混合された気体と液体を吐出するように設けられることが好ましい。   In the surface treatment apparatus 100 according to one embodiment of the present invention, as shown in FIG. 1A, the discharge port 103c is located at a position facing the bottom 105b of the workpiece 105 in the bottom 102b of the surface treatment tank 102. It is preferable that the gas and liquid mixed from the bottom part 102b of the surface treatment tank 102 to the top part are discharged.

このようにすれば、被処理物105に直接あたるので、被処理物105表面近傍の溶液を効率よく撹拌でき、被処理物105の表面処理を促進することができる。例えば、表面処理がめっきの場合、めっき析出の促進が図れる。また、液流方向が下から上になるので、被処理物105表面に付着した溶液中の不純物を除去し、オーバーフロー槽107から気泡と一緒に効率よく除去できる。よって、被処理物105表面の液体の撹拌により、被処理物105表面を効率よく洗浄も可能となる。また、被処理物105表面に付着した溶液中の不純物を除去するばかりでなく、表面処理液101中に浮遊する不純物もオーバーフロー槽107から気泡と一緒に効率よく除去できる。ゆえに、被処理物表面の異物、ざらつき等といった外観不良もさらに改善できる。   In this way, since it directly hits the workpiece 105, the solution near the surface of the workpiece 105 can be efficiently stirred, and the surface treatment of the workpiece 105 can be promoted. For example, when the surface treatment is plating, plating deposition can be promoted. Further, since the liquid flow direction is from the bottom to the top, impurities in the solution adhering to the surface of the workpiece 105 can be removed and efficiently removed from the overflow tank 107 together with bubbles. Therefore, the surface of the workpiece 105 can be efficiently cleaned by stirring the liquid on the surface of the workpiece 105. In addition to removing impurities in the solution adhering to the surface of the workpiece 105, impurities floating in the surface treatment liquid 101 can be efficiently removed from the overflow tank 107 together with bubbles. Therefore, appearance defects such as foreign matter and roughness on the surface of the object to be processed can be further improved.

ここで表面処理の例としては、無電解めっき、電気めっき、置換めっき、前処理、後処理、活性化、触媒付与、プレディップ、エッチング、ジンケート、剥離、水洗、酸洗及びデスミア等が挙げられる。よって本発明の一実施形態に係る表面処理装置は、上記の表面処理における装置に対応可能である。なお、表面処理は上記に限定されるものではなく、被処理物の性質を向上させるために行われる処理の装置に適用可能である。   Examples of the surface treatment include electroless plating, electroplating, displacement plating, pretreatment, post-treatment, activation, catalyst application, pre-dip, etching, zincate, peeling, water washing, pickling and desmear. . Therefore, the surface treatment apparatus according to an embodiment of the present invention can correspond to the apparatus in the surface treatment described above. Note that the surface treatment is not limited to the above, and can be applied to an apparatus for processing performed to improve the properties of the object to be processed.

例えば、めっき前処理に本発明の一実施形態に係る表面処理装置を用いた場合、めっき前処理に必要な反応を促進させた後めっきする場合に有利となる。上記にも説明した通り、勿論めっき前処理液中の不純物をオーバーフロー槽から気泡と一緒に除去し、めっき外観不良低減に効果的である。   For example, when the surface treatment apparatus according to an embodiment of the present invention is used for pre-plating treatment, it is advantageous when plating is performed after promoting the reaction necessary for pre-plating treatment. As described above, of course, impurities in the plating pretreatment solution are removed together with bubbles from the overflow tank, which is effective in reducing plating appearance defects.

また、水洗槽に本発明の一実施形態に係る表面処理装置を用いた場合、気体と液体の両方を同時に吐出し撹拌しているので、洗浄力が向上し、また水洗槽の液中の不純物をオーバーフロー槽から気泡と一緒に除去し、被処理物の外観不良低減が可能となる。   In addition, when the surface treatment apparatus according to an embodiment of the present invention is used in the washing tank, both the gas and the liquid are discharged and stirred at the same time, so that the cleaning power is improved and the impurities in the liquid of the washing tank Can be removed together with bubbles from the overflow tank, and the appearance defect of the object to be processed can be reduced.

上記にめっき前処理、水洗槽に本発明の一実施形態に係る表面処理装置を用いた場合の効果を説明したが、めっき前処理、水洗槽以外の無電解めっき、電気めっき、置換めっき、前処理、後処理、活性化、触媒付与、プレディップ、エッチング、ジンケート、剥離、水洗、酸洗及びデスミア等においても、本発明の一実施形態に係る表面処理装置を用いた場合には、表面処理能力を向上させることができ、上記と同様の効果を得ることができる。   Although the effect at the time of using the surface treatment apparatus concerning one embodiment of the present invention for plating pretreatment and a washing tub was explained above, plating pretreatment, electroless plating other than a washing tub, electroplating, displacement plating, before In the treatment, post-treatment, activation, catalyst application, pre-dip, etching, zincate, peeling, water washing, pickling, desmear, etc., when the surface treatment apparatus according to one embodiment of the present invention is used, the surface treatment The ability can be improved, and the same effect as described above can be obtained.

また、本発明は上述した実施形態に限定されない。例えば図2に、本発明の実施形態に係る表面処理装置100の一変形例を示す表面処理装置200の概略構成を示す。図2に示すように、液体導入口203bの上流側に液体を分岐させるための分岐機構209と、上記分岐機構209のアスピレーター203へ向かう下流とは別の下流に吸気量調節機構204がさらに設けられ、そして吸気量調節機構204の下流から液体を表面処理槽202内に配管208を通じて吐出させることが好ましい。上記の吸気量調節機構204は、特に限定されるものではないが、例えばバルブにより吸気量を調節すれば良い。なお、バルブを閉じていくと、ポンプ206からアスピレーター203へ流れる液の流量が増すことで流速が速くなり、吸気量が増える。一方バルブを開いていくと、ポンプ206からアスピレーター203へ流れる液の流量が減ることで、流速が遅くなり、吸気量が減る。   Further, the present invention is not limited to the above-described embodiment. For example, FIG. 2 shows a schematic configuration of a surface treatment apparatus 200 showing a modification of the surface treatment apparatus 100 according to the embodiment of the present invention. As shown in FIG. 2, a branching mechanism 209 for branching the liquid to the upstream side of the liquid inlet 203b and an intake air amount adjusting mechanism 204 further provided downstream of the branching mechanism 209 from the downstream toward the aspirator 203 are further provided. The liquid is preferably discharged from the downstream side of the intake air amount adjusting mechanism 204 into the surface treatment tank 202 through the pipe 208. The intake air amount adjusting mechanism 204 is not particularly limited. For example, the intake air amount may be adjusted by a valve. As the valve is closed, the flow rate of liquid flowing from the pump 206 to the aspirator 203 increases, so that the flow velocity increases and the intake air amount increases. On the other hand, when the valve is opened, the flow rate of the liquid flowing from the pump 206 to the aspirator 203 is reduced, so that the flow velocity is reduced and the intake amount is reduced.

ここで、表面処理槽に於いてポンプを設置する理由は、槽内の液の撹拌とフィルターレーションによる濾過を行う為である。フィルタレーションでは、槽の容量に応じて、単位時間当たりの必要な処理液の循環量が設定される。アスピレーターのみでの循環では、その特性上、この単位時間当たりの必要な処理液の循環量を満足できない可能性がある。アスピレーターを多数設置して、循環量を多くすることも可能であるが、逆にバブリングが多く成り過ぎる可能性もある。また、専用のポンプを設置してしまうと動力が増えてしまう為、本来の目的から外れてしまう。よって上記の理由から、図2の態様によれば、所望の適切な循環量となり、より適切なフィルターレーションによる濾過が可能となる。   Here, the reason for installing a pump in the surface treatment tank is to perform agitation of the liquid in the tank and filtration by filtration. In the filtration, the necessary amount of processing liquid circulated per unit time is set according to the capacity of the tank. In circulation using only an aspirator, there is a possibility that the necessary circulation amount of the processing liquid per unit time cannot be satisfied due to its characteristics. It is possible to install many aspirators and increase the amount of circulation, but conversely there may be too much bubbling. In addition, if a dedicated pump is installed, the power will increase, which is not the original purpose. Therefore, according to the embodiment shown in FIG. 2, for the above reason, a desired appropriate circulation amount is obtained, and filtration by more appropriate filtration becomes possible.

さらに図2の態様について、処理液の循環量を多くする場合には、複数の分岐機構209、吸気量調節機構204、配管208を設けても良い。   Further, in the embodiment of FIG. 2, when the circulation amount of the processing liquid is increased, a plurality of branch mechanisms 209, an intake air amount adjustment mechanism 204, and a pipe 208 may be provided.

分岐機構209は、分岐するのに適した機構であれば良く、例えば3つまたのT字やY字ジョイントを用いる。なお、4つまた以上のジョイントを用いても良い。また、吸気量調節機構204の下流から液体を表面処理槽202内に吐出させる配管は、表面処理槽202の液面付近に液体を吐出させても良い。一方、図2に示すように、表面処理槽202の底部付近まで配管を伸ばし液体を吐出させても良い。また、分岐機構209は、ポンプ206の下流側に設けられることが好ましい。   The branch mechanism 209 may be a mechanism suitable for branching, and for example, three T-shaped or Y-shaped joints are used. Four or more joints may be used. Further, the pipe for discharging the liquid into the surface treatment tank 202 from the downstream side of the intake air amount adjusting mechanism 204 may discharge the liquid near the liquid surface of the surface treatment tank 202. On the other hand, as shown in FIG. 2, the pipe may be extended to the vicinity of the bottom of the surface treatment tank 202 to discharge the liquid. Further, the branch mechanism 209 is preferably provided on the downstream side of the pump 206.

さらに、本発明の実施形態に係る表面処理装置100の他の一変形例を示す。図3に示すように、吐出口303cは、表面処理槽底部302bの被処理物の底部305bと対向する位置を除く位置の何れかに複数設けることが好ましい。   Furthermore, another modification of the surface treatment apparatus 100 according to the embodiment of the present invention is shown. As shown in FIG. 3, it is preferable to provide a plurality of discharge ports 303c at any position other than the position facing the bottom 305b of the object to be processed in the surface treatment tank bottom 302b.

このようにすれば、被処理物305の両側面の溶液を効率よく撹拌できる。よって被処理物305の両側面に気体と液体が吐出されるので、撹拌がより強くなり、表面処理がめっきの場合、めっき析出の促進や、被処理物305表面の不純物の除去がより効果的となり、被処理物表面の外観不良低減がより可能となる。また、被処理物305の両側面に吐出されるので、被処理物305が薄い板の場合に有利となる。例えば、被処理物の対象がプリント基板の場合、その板厚は様々であり、薄型の基板にも対応できる。さらに、被処理物305の両側面に吐出されるので、両側面均等に撹拌できる点で有利である。   In this way, the solution on both sides of the object to be processed 305 can be efficiently stirred. Therefore, since gas and liquid are discharged to both sides of the workpiece 305, the agitation becomes stronger, and when the surface treatment is plating, the promotion of plating deposition and the removal of impurities on the surface of the workpiece 305 are more effective. Thus, the appearance defect on the surface of the workpiece can be further reduced. Moreover, since it discharges to the both sides | surfaces of the to-be-processed object 305, it becomes advantageous when the to-be-processed object 305 is a thin board. For example, when the object of the object to be processed is a printed board, the plate thickness varies, and it can be applied to a thin board. Furthermore, since it discharges to the both sides | surfaces of the to-be-processed object 305, it is advantageous at the point which can agitate equally on both sides.

さらに、本発明の実施形態に係る表面処理装置100の他の一変形例を示す。図4は、本発明の他の実施形態に係る表面処理装置の他の一変形例を示す表面処理装置400の概略構成図である。図4に示すように、吐出口403cは、表面処理槽側面402aの被処理物側面405aと対向する位置に、表面処理槽側面402aから中央に向けて混合された気体と液体を吐出するように設けることが好ましい。   Furthermore, another modification of the surface treatment apparatus 100 according to the embodiment of the present invention is shown. FIG. 4 is a schematic configuration diagram of a surface treatment apparatus 400 showing another modification of the surface treatment apparatus according to another embodiment of the present invention. As shown in FIG. 4, the discharge port 403c discharges the gas and liquid mixed from the surface treatment tank side surface 402a toward the center at a position facing the object side surface 405a of the surface treatment tank side surface 402a. It is preferable to provide it.

このようにすれば、被処理物405表面である被処理物側面405aに直接あたるので、被処理物405表面の溶液をさらに効率よく撹拌でき、表面処理がめっきの場合、さらなるめっき析出の促進が可能となるなど、表面処理能力の向上が可能となる。図4に示す態様は特に、被処理物表面の撹拌を強くしたい場合により効果的である。   In this way, since it directly hits the workpiece side 405a, which is the surface of the workpiece 405, the solution on the workpiece 405 surface can be stirred more efficiently, and when the surface treatment is plating, further plating precipitation is promoted. It becomes possible to improve the surface treatment capability. The embodiment shown in FIG. 4 is particularly effective when it is desired to increase the stirring of the surface of the workpiece.

さらに、本発明の実施形態に係る表面処理装置100の他の一変形例を示す。図5は、本発明の他の実施形態に係る表面処理装置のさらに他の一変形例を示す表面処理装置500の概略構成図である。図5に示すように、吐出口503cは、表面処理槽側面502a近傍で被処理物の底部505b下端より下方に設けられ、表面処理槽側面502aから中央に向けて混合された気体と液体を吐出するように設けることが好ましい。つまり、被処理物の底部505b下端と表面処理槽底部502bの間hにアスピレーター503を設ける。   Furthermore, another modification of the surface treatment apparatus 100 according to the embodiment of the present invention is shown. FIG. 5 is a schematic configuration diagram of a surface treatment apparatus 500 showing still another modification of the surface treatment apparatus according to another embodiment of the present invention. As shown in FIG. 5, the discharge port 503c is provided in the vicinity of the surface treatment tank side surface 502a and below the lower end of the bottom 505b of the object to be processed, and discharges gas and liquid mixed from the surface treatment tank side surface 502a toward the center. It is preferable to provide it. That is, the aspirator 503 is provided between the lower end of the bottom 505b of the workpiece and the bottom surface 502b of the surface treatment tank.

このようにすれば、被処理物505に気体と液体を直接あてないときの、溶存酸素量を増減させたい場合に効果的である。また、吸気量調節機構504により吸気量を調節し、吐出口503cから吐出される気体の量を調節することが好ましい。   This is effective when it is desired to increase or decrease the amount of dissolved oxygen when the gas and liquid are not directly applied to the workpiece 505. Further, it is preferable to adjust the amount of gas discharged from the discharge port 503c by adjusting the intake amount by the intake air amount adjusting mechanism 504.

この場合も、上記の対応と同様に、表面処理が例えばめっきの場合、めっき析出の促進や、被処理物505表面に付着した溶液中の不純物を除去し、オーバーフロー槽507から気泡と一緒に除去できる。よって、被処理物505表面の液体の撹拌の他、被処理物505表面の洗浄も可能となる。また、被処理物505表面に付着した溶液中の不純物を除去するばかりでなく、表面処理液501中に浮遊する不純物もオーバーフロー槽507から気泡と一緒に除去できる。ゆえに、表面処理表面の異物、ざらつき等といった外観不良も改善できる。   In this case as well, in the case where the surface treatment is, for example, plating, the deposition is promoted and impurities in the solution adhering to the surface of the workpiece 505 are removed and removed from the overflow tank 507 together with bubbles. it can. Therefore, in addition to stirring the liquid on the surface of the object to be processed 505, the surface of the object to be processed 505 can be cleaned. In addition to removing impurities in the solution adhering to the surface of the object to be treated 505, impurities floating in the surface treatment liquid 501 can be removed from the overflow tank 507 together with bubbles. Therefore, appearance defects such as foreign matter and roughness on the surface of the surface treatment can be improved.

さらに、本発明の実施形態に係る表面処理装置100の他の一変形例を示す。図6は、本発明の他の実施形態に係る表面処理装置のさらに他の一変形例を示す表面処理装置600の概略構成図である。図6に示した表面処理装置600は、図1の表面処理装置100に、さらに液体導入口603bの上流側に液体を分岐させるための分岐機構609と、上記分岐機構の下流に液体を吐出させるための液体吐出機構610が設けられても良い。また、分岐機構609は、ポンプ606の下流側に設けられることが好ましい。   Furthermore, another modification of the surface treatment apparatus 100 according to the embodiment of the present invention is shown. FIG. 6 is a schematic configuration diagram of a surface treatment apparatus 600 showing still another modification of the surface treatment apparatus according to another embodiment of the present invention. The surface treatment apparatus 600 shown in FIG. 6 causes the surface treatment apparatus 100 of FIG. 1 to further discharge a liquid downstream of the branch mechanism and a branch mechanism 609 for branching the liquid upstream of the liquid inlet 603b. A liquid discharge mechanism 610 may be provided. Further, the branch mechanism 609 is preferably provided on the downstream side of the pump 606.

このとき、液体吐出機構610は、複数設けられていても良い。また、表面処理槽側面602aの被処理物側面605aと対向する位置に、上記表面処理槽側面602aから中央に向けて上記液体を吐出するように設けられても良い。さらに、液体吐出機構610は、表面処理槽底部602bの上記被処理物の底部605bと対向する位置に、上記表面処理槽の底部505bから頂部に向けて上記液体を吐出するように設けられていても良い。また、複数の液体吐出機構610を設け、表面処理槽底部602bの上記被処理物の底部605bと対向する位置を除く位置の何れかに複数設けられていても良い。   At this time, a plurality of liquid ejection mechanisms 610 may be provided. Further, the liquid may be provided at a position facing the object side surface 605a of the surface treatment tank side surface 602a so as to discharge the liquid from the surface treatment tank side surface 602a toward the center. Furthermore, the liquid discharge mechanism 610 is provided at a position facing the bottom 605b of the object to be processed of the surface treatment tank bottom 602b so as to discharge the liquid from the bottom 505b to the top of the surface treatment tank. Also good. Further, a plurality of liquid discharge mechanisms 610 may be provided, and a plurality of liquid discharge mechanisms 610 may be provided at any position other than the position facing the bottom 605b of the object to be processed of the surface treatment tank bottom 602b.

このようにすれば、局所的に液体のみを被処理物に吐出させ、液体のみの撹拌を必要とする場合に有利である。また、液体のみを吐出させることにより、アスピレーターから吐出した気体と液体の撹拌方向を変えることができ、複雑な撹拌とすることができる。   This is advantageous when only the liquid is locally discharged onto the object to be processed and only the liquid needs to be stirred. Moreover, by discharging only the liquid, the stirring direction of the gas and liquid discharged from the aspirator can be changed, and complicated stirring can be achieved.

分岐機構609は、上述したように、分岐するのに適した機構であれば良く、例えば3つまたのT字やY字ジョイントを用いる。また4つまた以上のジョイントを用いても良く、この場合、液体吐出機構610は複数となる。さらに液体吐出機構610は、吐出するのに適した機構であれば良く、例えば、配管のまま吐出させても良いが、撹拌力を高めるため、吐出口が狭くなっているものが好ましい。   As described above, the branch mechanism 609 may be a mechanism suitable for branching, and for example, three T-shaped or Y-shaped joints are used. Further, four or more joints may be used. In this case, a plurality of liquid ejection mechanisms 610 are provided. Furthermore, the liquid discharge mechanism 610 may be a mechanism suitable for discharge. For example, the liquid discharge mechanism 610 may be discharged as it is, but it is preferable that the discharge port is narrow in order to increase the stirring force.

また、上述したように、表面処理装置600は、図1の表面処理装置100に、さらに分岐機構609及び液体吐出機構610が設けられることを説明したが、図2〜5に示した表面処理装置200、300、400及び500の構成にも、さらに液体導入口603bの上流側に液体を分岐させるための分岐機構609と、上記分岐機構の下流に液体を吐出させるための液体吐出機構610が設けられても良い。また、分岐機構609は、ポンプ606の下流側に設けられることが好ましい。このようにすれば、上記に説明した同様の効果を得ることができる。   In addition, as described above, the surface treatment apparatus 600 has been described with respect to the surface treatment apparatus 100 of FIG. 1 further provided with the branch mechanism 609 and the liquid discharge mechanism 610. However, the surface treatment apparatus illustrated in FIGS. The configurations 200, 300, 400 and 500 are further provided with a branch mechanism 609 for branching the liquid upstream of the liquid inlet 603b and a liquid discharge mechanism 610 for discharging the liquid downstream of the branch mechanism. May be. Further, the branch mechanism 609 is preferably provided on the downstream side of the pump 606. If it does in this way, the same effect explained above can be acquired.

なお、上記のように本発明の各実施形態について詳細に説明したが、本発明の新規事項及び効果から実体的に逸脱しない多くの変形が可能であることは、当業者には、容易に理解できるであろう。従って、このような変形例は、全て本発明の範囲に含まれるものとする。   Although each embodiment of the present invention has been described in detail as described above, it is easily understood by those skilled in the art that many modifications can be made without departing from the novel matters and effects of the present invention. It will be possible. Therefore, all such modifications are included in the scope of the present invention.

例えば、明細書又は図面において、少なくとも一度、より広義又は同義な異なる用語と共に記載された用語は、明細書又は図面のいかなる箇所においても、その異なる用語に置き換えることができる。また、表面処理装置の構成、動作も本発明の各実施形態及び各実施例で説明したものに限定されず、種々の変形実施が可能である。   For example, a term described with a different term having a broader meaning or the same meaning at least once in the specification or the drawings can be replaced with the different term in any part of the specification or the drawings. The configuration and operation of the surface treatment apparatus are not limited to those described in the embodiments and examples of the present invention, and various modifications can be made.

100 110 130 140 200 300 400 500 600 表面処理装置
101 111 131 141 201 301 401 501 601 表面処理液、
102 112 202 302 402 502 602 表面処理槽
402a 502a 602a 表面処理槽側面、102b 112b 202b 302b 402b 502b 602b 表面処理槽底部、
103 113 133 143 203 303 403 503 603 アスピレーター、
103a 113a 133a 143a 203a 303a 403a 503a 603a 気体導入口、
103b 113b 133b 143b 203b 303b 403b 503b 603b 液体導入口、
103c 113c 133c 143c 203c 303c 403c 503c 603c 吐出口、
104 114 134 144 204 304 404 504 604 吸気調節機構、
105 115 135 145 205 305 405 505 605 被処理物、
405a 605a 被処理物側面、
105b 115b 135b 145b 205b 405b 505b 605b被処理物の底部、
106 116 136 146 206 306 406 506 606 ポンプ、
107 117 137 147 207 307 407 507 607 オーバーフロー槽、
108 118 138 148 208 308 408 508 608 配管、
209 609 分岐機構、 610 液体吐出機構
100 110 130 140 200 300 400 400 500 600 Surface treatment apparatus 101 111 131 141 201 301 401 501 601 Surface treatment liquid,
102 112 202 302 402 502 602 Surface treatment tank 402a 502a 602a Surface treatment tank side surface, 102b 112b 202b 302b 402b 502b 602b Surface treatment tank bottom,
103 113 133 143 203 303 403 503 603 aspirator,
103a 113a 133a 143a 203a 303a 403a 503a 603a gas inlet,
103b 113b 133b 143b 203b 303b 403b 503b 603b liquid inlet,
103c 113c 133c 143c 203c 303c 403c 503c 603c Discharge port,
104 114 134 144 204 304 404 504 604 intake adjustment mechanism,
105 115 135 145 205 305 405 505 605 Workpiece,
405a 605a Workpiece side surface,
105b 115b 135b 145b 205b 405b 505b 605b bottom of workpiece,
106 116 136 146 206 306 406 506 606 pump,
107 117 137 147 207 307 407 507 607 overflow tank,
108 118 138 148 208 308 408 508 608 piping,
209 609 Branch mechanism, 610 Liquid discharge mechanism

Claims (8)

被処理物表面を処理するために用いられる表面処理装置であって、
少なくとも表面処理液が収容された表面処理槽と、
前記表面処理槽に、気体を導入する気体導入口と、液体を導入する液体導入口と、前記気体導入口から導入した前記気体と前記液体導入口から導入された前記液体とを混合して吐出する吐出口とを有するアスピレーターとを備え、
前記気体導入口が前記表面処理槽の外部と接続されていることを特徴とする表面処理装置。
A surface treatment apparatus used for treating a surface of a workpiece,
A surface treatment tank containing at least a surface treatment liquid;
A gas introduction port for introducing gas, a liquid introduction port for introducing liquid, and the gas introduced from the gas introduction port and the liquid introduced from the liquid introduction port are mixed and discharged into the surface treatment tank. An aspirator having a discharge port for
The surface treatment apparatus, wherein the gas inlet is connected to the outside of the surface treatment tank.
前記気体導入口に導入される前記気体の吸気量を調節する吸気量調節機構が前記液体導入口の上流側にさらに設けられていることを特徴とする請求項1に記載の表面処理装置。   The surface treatment apparatus according to claim 1, further comprising an intake air amount adjusting mechanism that adjusts an intake air amount of the gas introduced into the gas introduction port on an upstream side of the liquid introduction port. 前記液体導入口の上流側に前記液体を分岐させるための分岐機構と、前記分岐機構の下流側に前記吸気量調節機構がさらに設けられ、前記吸気量調節機構の下流から液体を吐出させることを特徴とする請求項1に記載の表面処理装置。   A branching mechanism for branching the liquid upstream of the liquid introduction port; and an intake air amount adjusting mechanism provided further downstream of the branching mechanism, and discharging the liquid from the downstream of the intake air amount adjusting mechanism. The surface treatment apparatus according to claim 1. 前記吐出口は、前記表面処理槽底部の前記被処理物の底部と対向する位置に、前記表面処理槽の底部から頂部に向けて混合された前記気体と前記液体を吐出するように設けられていることを特徴とする請求項1〜3のいずれか1項に記載の表面処理装置。   The discharge port is provided at a position facing the bottom of the object to be processed at the bottom of the surface treatment tank so as to discharge the gas and the liquid mixed from the bottom to the top of the surface treatment tank. The surface treatment apparatus according to claim 1, wherein the surface treatment apparatus is provided. 前記吐出口は、前記表面処理槽底部の前記被処理物の底部と対向する位置を除く位置の何れかに複数設けられていることを特徴とする請求項1〜3のいずれか1項に記載の表面処理装置。   The said discharge port is provided with two or more in any position except the position which opposes the bottom part of the said to-be-processed object of the said surface treatment tank bottom part. Surface treatment equipment. 前記吐出口は、前記表面処理槽側面の前記被処理物側面と対向する位置に、前記表面処理槽側面から中央に向けて混合された前記気体と前記液体を吐出するように設けられていることを特徴とする請求項1〜3のいずれか1項に記載の表面処理装置。   The discharge port is provided to discharge the gas and the liquid mixed from the side surface of the surface treatment tank toward the center at a position on the side surface of the surface treatment tank facing the side surface of the object to be processed. The surface treatment apparatus of any one of Claims 1-3 characterized by these. 前記吐出口は、前記表面処理槽側面近傍で前記被処理物の底部下端より下方に設けられ、前記表面処理槽側面から中央に向けて混合された前記気体と前記液体を吐出するように設けられていることを特徴とする請求項1〜3のいずれか1項に記載の表面処理装置。   The discharge port is provided near the side surface of the surface treatment tank and below the bottom lower end of the object to be processed, and is provided so as to discharge the gas and the liquid mixed from the side of the surface treatment tank toward the center. The surface treatment apparatus according to claim 1, wherein the surface treatment apparatus is provided. 前記表面処理装置は、さらに液体導入口の上流側に前記液体を分岐させるための分岐機構と、前記分岐機構の下流に液体を吐出させるための液体吐出機構が設けられていることを特徴とする請求項1〜7のいずれか1項に記載の表面処理装置。   The surface treatment apparatus is further provided with a branch mechanism for branching the liquid upstream of the liquid introduction port and a liquid discharge mechanism for discharging liquid downstream of the branch mechanism. The surface treatment apparatus of any one of Claims 1-7.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5554600A (en) * 1978-10-18 1980-04-21 Ngk Insulators Ltd Surface treating apparatus of metal and others
JPS55119199A (en) * 1979-03-07 1980-09-12 Ngk Insulators Ltd Surface treatment apparatus for metal, etc.
JPS59143059A (en) * 1983-02-02 1984-08-16 Canon Inc Electroless plating apparatus
JPH0697631A (en) * 1992-09-14 1994-04-08 Japan Energy Corp Electroless plating method and equipment
JPH0697632A (en) * 1992-09-14 1994-04-08 Japan Energy Corp Method for oxygen feeding to electroless plating solution and equipment
JPH06179976A (en) * 1992-12-11 1994-06-28 Ibiden Co Ltd Chemical plating vessel
JP2006286410A (en) * 2005-03-31 2006-10-19 Fuji Photo Film Co Ltd Manufacturing device and manufacturing method of light transmittable conductive material
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JP2016060935A (en) * 2014-09-17 2016-04-25 上村工業株式会社 Method of manufacturing wiring board and wiring board manufactured by same method

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