JP2018121089A - Semiconductor integrated circuit device and wearable device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a semiconductor device which can operate stably while reducing power consumption.SOLUTION: A semiconductor device includes a CPU26, a system controller 24 for specifying the operation speed of the CPU26, an SRAM 30 having P type SOTB transistors SP1, SP2 and N type SOTB transistors SN1-SN4, and connected with the CPU26, and a substrate bias circuit 23 connected with the system controller 24, and capable of supplying substrate bias voltages Vsp, Vsn to the P type SOTB transistors SP1, SP2 and N type SOTB transistors SN1-SN4. When the system controller 24 specifies a low speed mode for operating the CPU26 at a low speed, the substrate bias circuit 23 supplies the substrate bias voltages Vsp, Vsn to the P type SOTB transistors SP1, SP2 and N type SOTB transistors SN1-SN4.SELECTED DRAWING: Figure 2

Description

  The present invention relates to a semiconductor integrated circuit device and a wearable device, and more particularly to a semiconductor integrated circuit device suitable for low power consumption.

  As a wearable device, there is a portable terminal device worn on an arm like a smart watch. Such a portable terminal device is required to operate for a long time, although it is driven by the power supplied from the battery. In order to achieve a function as a terminal and a function as a wristwatch, a semiconductor integrated circuit device with a built-in microprocessor (hereinafter referred to as a CPU: Central Processing Unit), a memory, etc., in the portable terminal device (Hereinafter also simply referred to as a semiconductor device) is mounted.

  In order to enable a portable terminal device to operate for a long time, a semiconductor device incorporating a low-speed CPU operating at low speed and a semiconductor device incorporating a high-speed CPU operating at high speed are mounted inside the portable terminal device. It is possible to do. In this case, for example, the function as a wristwatch is achieved by a low-speed CPU (sub CPU), and the function as a terminal is achieved by a high-speed CPU (main CPU). Since the low-speed CPU operates at a low speed, the power consumption is low, so that the operation time of the mobile terminal device can be extended.

  As a technique for reducing the power consumption of a semiconductor device, DVFS (Dynamic Voltage and Frequency Scaling) is known. By using the DVFS technique, the power supply voltage of the semiconductor device is lowered, and the frequency for operating the semiconductor device is lowered, whereby the power consumption of the semiconductor device can be reduced. Since the power consumption of the semiconductor device can be reduced, the operation time of the mobile terminal device can be extended.

  Further, as a technique for reducing the power consumption of a semiconductor device, for example, Patent Document 1 discloses that a substrate bias voltage is applied to a substrate of the semiconductor device to change a frequency for operating the semiconductor device. .

  As a memory built in the semiconductor device, there is a static random access memory (hereinafter referred to as SRAM). A technique for reducing the power consumption of the SRAM is described in Patent Document 2, for example.

JP 2004-28276A JP 2003-132683 A

  In a configuration using two semiconductor devices, that is, a semiconductor device incorporating a main CPU and a semiconductor device incorporating a sub CPU, there is a concern that the number of semiconductor devices to be mounted increases and the price of the portable terminal device increases. In the configuration using the DVFS technique, even if the frequency is lowered and the operation is performed at a low speed, the standby current due to the leakage current or the like is not reduced, and a high effect on the reduction of power consumption cannot be expected. Furthermore, the range of frequencies that can be changed by the DVFS technique is about 50%, and the frequency cannot be changed in units of digits, so that a high effect on low power consumption cannot be expected.

  In the configuration in which the substrate bias voltage supplied to the substrate of the semiconductor device is changed, it is difficult to operate the semiconductor device stably.

  Patent Documents 1 and 2 do not describe a semiconductor device that can operate stably while reducing power consumption.

  An object of the present invention is to provide a semiconductor device that can operate stably while reducing power consumption.

  The above and other objects and novel features of the present invention will be apparent from the description of this specification and the accompanying drawings.

  Of the inventions disclosed in the present application, the outline of typical ones will be briefly described as follows.

  In other words, the semiconductor device includes a first circuit, a mode designating circuit designating the operating speed of the first circuit, a second circuit connected to the first circuit, including a P-type SOTB transistor and an N-type SOTB transistor. A substrate bias circuit connected to the mode designating circuit and capable of supplying first and second substrate bias voltages to the P-type SOTB transistor and the N-type SOTB transistor. Here, when the mode designating circuit designates the first operation mode in which the first circuit operates at the first speed, the substrate bias circuit uses the first and second substrate bias voltages as the P-type SOTB transistor and the N-type SOTB. Supply to transistor. On the other hand, when the mode specifying circuit specifies the second operation mode in which the first circuit is operated at the second speed higher than the first speed, the substrate bias circuit applies the substrate bias to the P-type SOTB transistor and the N-type SOTB transistor. Does not supply voltage.

  Here, SOTB is an abbreviation for Silicon on Thin Buried Oxide, and the SOTB transistor means a transistor using a substrate in which an extremely thin insulating film and a silicon thin film are formed on a silicon substrate. In the SOTB transistor, the impurity concentration in the channel region (silicon thin film region) where the channel through which the drain current flows is formed is lowered. Therefore, the SOTB transistor is also called a dopantless transistor. A P-type SOTB transistor means an SOTB transistor in which a channel through which a drain current flows is a P-type channel, and an N-type SOTB transistor means an SOTB transistor in which a channel through which a drain current flows is an N-type channel.

  In the SOTB transistor, the impurity concentration of the channel region (silicon thin film region) where the channel is formed is low. Therefore, the variation in threshold voltage between SOTB transistors is small. That is, the variation in threshold voltage between P-type SOTB transistors and the variation in threshold voltage between N-type SOTB transistors are small. This makes it possible to reduce the number of P-type SOTB transistors and / or N-type SOTB transistors that are erroneously turned on or off due to variations in threshold voltage when a substrate bias voltage is supplied. It is possible to provide a semiconductor device that operates stably even when a bias voltage is supplied.

  In addition, since an insulating film is interposed between the silicon substrate to which the substrate bias voltage is supplied and the silicon thin film region serving as the channel region, even if the substrate bias voltage is supplied, the silicon thin film and the silicon substrate are provided. It is possible to prevent leakage current from flowing between the two. As a result, even if the substrate bias voltage is supplied, it is possible to suppress an increase in power consumption. That is, it is possible to provide a semiconductor device that operates stably while reducing power consumption.

  Further, in the SOTB transistor, the threshold voltage changes in proportion to the value of the supplied substrate bias voltage. Therefore, each of the P-type SOTB transistor and the N-type SOTB transistor can be easily changed to a desired threshold voltage depending on the value of the substrate bias voltage.

  A silicon substrate has been described as an example in which a substrate bias voltage is supplied. However, when the region facing the silicon thin film is, for example, a well region formed in a silicon substrate, a substrate bias voltage is supplied to the well region.

  In this specification, a field effect transistor is simply referred to as a MOS transistor, and is distinguished from a SOTB transistor. Also in a field effect transistor, a MOS transistor whose channel is a P channel is referred to as a P-type MOS transistor, and a MOS transistor whose channel is an N-type channel is referred to as an N-type MOS transistor.

  Of the inventions disclosed in the present application, effects obtained by typical ones will be briefly described as follows.

  A semiconductor device that can operate stably while reducing power consumption can be provided.

1 is a block diagram illustrating a configuration of a semiconductor device according to a first embodiment. 1 is a circuit diagram illustrating a configuration of a semiconductor device according to a first embodiment. (A) And (B) is sectional drawing which shows typically the structure of a MOS transistor and a SOTB transistor. FIG. 3 is an explanatory diagram showing an operation concept of the semiconductor device according to the first embodiment. FIG. 6 is a characteristic diagram showing changes in threshold voltages of the P-type SOTB transistor and the N-type SOTB transistor according to the first embodiment. It is a typical wave form diagram showing change of substrate bias voltage generated by a substrate bias circuit. It is a characteristic view which shows the relationship between the threshold voltage and power supply voltage in the high-speed mode calculated | required by simulation. It is a characteristic view which shows the relationship between the threshold voltage and power supply voltage in the low speed mode calculated | required by simulation. FIG. 6 is a characteristic diagram showing characteristics of a P-type SOTB transistor and an N-type SOTB transistor according to the second embodiment.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. Note that components having the same function are denoted by the same reference symbols throughout the drawings for describing the embodiment, and the repetitive description thereof will be omitted.

(Embodiment 1)
<Overall configuration of semiconductor device>
FIG. 1 is a block diagram showing a configuration of a semiconductor device 10 according to the first embodiment. In the figure, the block surrounded by the alternate long and short dash line indicates a circuit and a bus formed in one semiconductor chip. The semiconductor device 10 includes a CPU (Central Processing Unit) 26, a GPIO 29, an SRAM 30, an ADC 31, a ROM (Read Only Memory) 32, an I / F 33, an S / C 24, an I / O 22, an IOP 28, and a VBB-GEN 23. ing. Here, I / O 22 represents an input / output circuit, and is not particularly limited, but includes a circuit that converts the voltage level of the signal between the outside and the inside of the semiconductor device 10, a circuit that performs signal buffering, and the like. Have.

  In FIG. 1, GPIO 29 is a general purpose input / output circuit, and a microprocessor (CPU) 26 accesses GPIO 29 via a control circuit IOP28. The GPIO 29 transmits / receives information to / from the outside of the semiconductor device 10 via the input / output circuit I / O 22 based on access from the CPU 26, and transmits / receives information to / from the outside to / from the CPU 26. Send and receive.

  In FIG. 1, the SRAM 30 is a static random access memory as described above, and is connected to the bus 27. The ADC 31 represents an analog / digital conversion circuit (hereinafter referred to as an AD conversion circuit), the ROM 32 represents a non-volatile memory, and the I / F 33 represents an interface circuit. The AD conversion circuit ADC 31, the nonvolatile memory ROM 32, and the interface circuit I / F 33 are each connected to the bus 27. The CPU 26 is also connected to the bus 27. The CPU 26 accesses the SRAM 30, the AD conversion circuit ADC 31, the nonvolatile memory ROM 32, and the interface circuit I / F 33 via the bus 27, and transmits / receives signals to / from them.

  For example, the CPU 26 reads a program from the nonvolatile memory ROM 32 via the bus 27, and executes processing according to the read program. In the process of executing this process, the CPU 26 uses the SRAM 30, the AD conversion circuit ADC31, and the interface circuit I / F33. For example, the CPU 26 transmits / receives information to / from a device provided outside the semiconductor device 10 using the interface circuit I / F 33.

  A plurality of devices are provided outside the semiconductor device 10. FIG. 1 illustrates a wireless device 34 and a sensor 35. In the example illustrated in FIG. 1, the interface circuit I / F 33 includes an interface circuit for the wireless device 34 and an interface circuit for the sensor 35, although not particularly limited. The CPU 26 accesses the wireless device 34 via the interface circuit for the wireless device, and transmits and receives information using a wireless signal using the wireless device 34. Further, the sensor 35 is accessed via the sensor interface circuit, and information from the sensor 35 is converted by, for example, the AD conversion circuit ADC 31 and used for processing.

  The semiconductor device 10 of this embodiment is built in a wearable device such as a smart watch. The sensor 35 is used for measuring the body temperature and the like of a human body wearing the smart watch, and the wireless device 34 is used for transmitting the measured body temperature and the like to a so-called smartphone. Of course, it is not limited to such a use. For example, the wireless device 34 can also be used to connect to a so-called IoT (Internet of Things) device wirelessly.

  In this embodiment, although not particularly limited, the nonvolatile memory ROM 32 is an electrically rewritable nonvolatile memory such as a flash memory. The nonvolatile memory ROM 32 can be connected to the outside of the semiconductor device 10 via the input / output circuit I / O 22. As a result, the nonvolatile memory ROM 32 can be rewritten from the outside.

  The SRAM 30 is used to store, for example, primary information when the CPU 26 performs processing according to a program. Of course, it is not limited to this application.

  Further, the circuit connected to the bus 27 is not limited to the circuit described above. For example, interface circuits such as SPI (Serial Peripheral Interface), UART (Universal Asynchronous Receive Transmitter), and I2C (Inter-Integrated Circuit) may be connected to the bus.

  The semiconductor device 10 according to the embodiment has two operation speed modes. That is, the semiconductor device 10 has a low speed mode 2 (first operation mode) in which the semiconductor device 10 operates at a low speed and a high speed mode 1 (second operation mode) in which the semiconductor device 10 operates at a higher speed than the low speed mode 2. . In this embodiment, a clock signal for operating the semiconductor device 10 when the low speed mode 2 is designated, and a clock signal for operating the semiconductor device 10 when the high speed mode 1 is designated are: It is generated outside the semiconductor device 10 by two clock generators 36A and 36B. The clock generator 36A generates a high-speed clock signal 20, and the clock generator 36B generates a low-speed clock signal 21. In this embodiment, the clock generators 36A and 36B are constituted by crystal oscillation circuits, and the frequency of the low-speed clock signal 21 is, for example, 32 KHz, and the frequency of the high-speed clock signal (hereinafter also referred to as high-speed clock signal) 20 Is, for example, 40 MHz. That is, the high-speed clock signal 20 and the low-speed clock signal (hereinafter also referred to as a low-speed clock signal) 21 have different frequency digits.

  Although FIG. 1 shows an example in which the clock generators 36A and 36B are provided outside the semiconductor device 10, the clock generators 36A and 36B may be provided inside the semiconductor device 10. That is, the clock generators 36A and 36B may be formed on the same semiconductor chip as the circuit such as the CPU 26. Further, one clock generator, for example, a clock generator 36B that generates a low-speed clock signal 21 is provided outside the semiconductor device 10, and a multiplication circuit is provided in the semiconductor device 10, and the low-speed clock signal 21 is generated by the multiplication circuit. A high-speed clock signal 20 may be formed.

  In FIG. 1, S / C 24 indicates a system controller (mode designation circuit). The system controller S / C 24 is supplied with an instruction signal M_Cont from the CPU 26 and clock signals 20 and 21 via the input / output circuit I / O 22. The system controller S / C 24 selects the high-speed clock signal 20 or the low-speed clock signal 21 in accordance with the instruction signal M_Cont from the CPU 26 and supplies it to the CPU 26 as the operation clock signal 25. In other words, the system controller S / C 24 designates the high speed mode 1 and the low speed mode 2 by the instruction signal M_Cont. In the designation of the high speed mode 1, the system controller S / C 24 supplies the high speed clock signal 20 to the CPU 26 as the operation clock signal 25. On the other hand, in the designation of the low speed mode 2, the system controller S / C 24 supplies the low speed clock signal 21 to the CPU 26 as the operation clock signal 25.

  The CPU 26 operates in synchronization with the supplied operation clock signal 25. Therefore, when the low-speed clock signal 21 is supplied as the operation clock signal 25, the operation speed of the CPU 26 is slow. When the high-speed clock signal 20 is supplied as the operation clock signal 25, the operation speed of the CPU 26 is reduced. Will be faster.

  For example, when realizing the function of a wristwatch, the CPU 26 supplies a designation signal M_Cont corresponding to the low speed mode 2 to the system controller S / C24. Further, when realizing a function as a terminal, for example, when executing an application, the CPU 26 supplies a designation signal M_Cont corresponding to the high-speed mode 1 to the system controller S / C 24. If it is a function of a wristwatch, for example, it is only necessary to display time, so that the processing amount required for the CPU 26 is relatively small. Therefore, even if the operating speed of the CPU 26 is slow, the CPU 26 can realize the function of the wristwatch in a relatively short time. On the other hand, when an application is executed as a terminal, the processing amount required for the CPU 26 is much larger than the function of the wristwatch. Therefore, in order to execute the application in a relatively short time, the operation speed of the CPU 26 is increased. Thus, by reducing the operating speed of the CPU 26 in the low speed mode 2, it is possible to reduce the power consumed by the CPU 26 and the like.

  Further, in this embodiment, the system controller S / C 24 forms a mode designation signal for controlling a substrate bias circuit (hereinafter also referred to as a substrate bias generation circuit) in accordance with the designation signal M_Cont. In FIG. 1, the substrate bias circuit is shown as VBB-GEN 23, and is controlled by a mode designation signal Vb_Cont from the system controller S / C24. This mode designation signal Vb_Cont is formed in the system controller S / C 24 based on the designation signal M_Cont.

  The substrate bias circuit VBB-GEN23 outputs a substrate bias voltage (Vsp, Vsn) supplied to a SOTB (Silicon on Thin Buried Oxide) transistor and a substrate bias voltage (Vmp, Vmn) supplied to a MOS transistor. The substrate bias voltage supplied to the SOTB transistor outputs two types of substrate bias voltages corresponding to the channel type of the SOTB transistor. That is, the substrate bias voltage Vsp (first substrate bias voltage) is output as the substrate bias voltage supplied to the P-type SOTB transistor, and the substrate bias voltage Vsn (second substrate bias) is output as the substrate bias voltage supplied to the N-type SOTB transistor. Voltage).

  Similarly, the substrate bias generation circuit VBB-GEN23 outputs a substrate bias voltage corresponding to the channel type of the MOS transistor. That is, the substrate bias voltage Vmp (third substrate bias voltage) is output as the substrate bias voltage supplied to the P-type MOS transistor, and the substrate bias voltage Vmn (fourth substrate bias voltage) is output to the N-type MOS transistor. Is output.

  As will be described later, the voltage values of the substrate bias voltages Vsp, Vsn, Vmp, and Vmn output from the substrate bias generation circuit VBB-GEN23 are determined by the mode designation signal Vb_Cont. Next, a circuit to which the substrate bias voltages Vsp, Vsn, Vmp, and Vmn are supplied will be described.

  In FIG. 1, for example, the input / output circuit I / O 22 and the CPU 26 are configured by N-type MOS transistors and P-type MOS transistors, not by SOTB transistors. On the other hand, the SRAM 30 is configured by a SOTB transistor and a MOS transistor. Substrate bias voltages Vmp and Vmn are not supplied to a circuit constituted by MOS transistors, for example, input / output circuit I / O 22, and substrate bias voltages Vmp and Vmn are supplied to CPU 26. This is because when the substrate bias voltage is supplied to the MOS transistor constituting the input / output circuit I / O22, the threshold voltage of the MOS transistor changes and the input logic threshold voltage of the input / output circuit I / O22 changes. It is. On the other hand, the CPU 26 can reduce power consumption by supplying substrate bias voltages Vmp and Vmn. Next, a circuit to which the substrate bias voltages Vsp, Vsn, Vmp, and Vmn are supplied will be described using the CPU 26 and the SRAM 30 as an example.

<Configuration of CPU 26 (first circuit) and SRAM 30 (second circuit)>
FIG. 2 is a circuit diagram showing a configuration of the semiconductor device 10 according to the first embodiment. The figure shows a circuit of the CPU 26 and a circuit of the SRAM 30 in the semiconductor device 10 shown in FIG. 2 also shows the bus 27, the AD conversion circuit ADC31, and the interface circuit I / F 33 shown in FIG. 1, but since they are the same as those in FIG. 1, their descriptions are omitted. FIG. 2 also shows the configuration of the substrate bias circuit VBB-GEN23. Here, for convenience of explanation, the substrate bias circuit VBB-GEN 23 includes a substrate bias generation circuit 23-Vsp for forming the substrate bias voltage Vsp, a substrate bias generation circuit 23-Vsn for forming the substrate bias voltage Vsn, and a substrate bias. Although the substrate bias generating circuit 23-Vmp for forming the voltage Vmp and the substrate bias generating circuit 23-Vmn for forming the substrate bias voltage Vmn are shown, the number is not limited to this.

  The CPU 26 (first circuit) is composed of a plurality of P-type MOS transistors and a plurality of N-type MOS transistors. FIG. 2 shows, as an example, one P-type MOS transistor MP1 and one N-type MOS transistor MN1 among such a plurality of P-type MOS transistors and a plurality of N-type MOS transistors. A power supply voltage Vd is supplied to the source of the P-type MOS transistor MP1, and its drain is connected to the drain of the N-type MOS transistor MN1. The ground voltage Vs is supplied to the source of the N-type MOS transistor MN1. The gate of the N-type MOS transistor MN1 and the gate of the P-type MOS transistor MP1 are connected in common. That is, the N-type MOS transistor MN1 and the P-type MOS transistor MP1 constitute an inverter circuit. The CPU 26 is configured by combining a plurality of logic circuits such as inverter circuits, sequential circuits, memory circuits, and the like.

  Next, the configuration of the SRAM 30 (second circuit) will be described. The SRAM 30 includes a memory cell array (not shown) having a plurality of memory cells MC00 to MCnn arranged in a matrix, and a peripheral circuit PRK connected to the memory cell array. In each row of the memory cell array, word lines W0 to Wn are arranged, and in each column, complementary data line pairs D0, / D0 to Dn, / Dn are arranged. Here, the data lines / D0 to / Dn indicate data lines that transmit signals having opposite phases to the data lines D0 to Dn. Each of memory cells MC00 to MCnn is connected to a word line arranged in a row where it is arranged and a complementary data line pair arranged in a column where it is arranged.

  In FIG. 2, among the memory cells MC00 to MCnn arranged in the memory cell array, two rows and two columns of memory cells MC00 to MC11 and word lines W0 and W1 corresponding to these memory cells MC00 to MC11 are complementary. Data line pairs D0, / D0, D1, and / D1 are illustrated. Since the memory cells MC00 to MCnn have the same configuration, FIG. 2 shows the circuit configuration only for the memory cell MC00.

  Here, the configuration of the memory cell will be described using the memory cell MC00 whose circuit configuration is exemplified. The memory cell MC00 is configured by a SOTB transistor. That is, the memory cell MC00 includes P-type SOTB transistors SP1 and SP2 and N-type SOTB transistors SN1, SN2, SN3, and SN4.

  A power supply voltage Vd is supplied to the source of the P-type SOTB transistor SP1, and its drain is connected to the drain of the N-type SOTB transistor SN1. The ground voltage Vs is supplied to the source of the N-type SOTB transistor SN1. The gate of the P-type SOTB transistor SP1 and the gate of the N-type SOTB transistor SN1 are connected to each other. Thus, a first inverter circuit is configured in which the gate of the P-type SOTB transistor SP1 and the gate of the N-type SOTB transistor SN1 are input, and the drain of the P-type SOTB transistor SP1 and the drain of the N-type SOTB transistor SN1 are outputs. .

  Similarly, the power supply voltage Vd is supplied to the source of the P-type SOTB transistor SP2, and the drain thereof is connected to the drain of the N-type SOTB transistor SN2. The ground voltage Vs is supplied to the source of the N-type SOTB transistor SN2. The gate of the P-type SOTB transistor SP2 and the gate of the N-type SOTB transistor SN2 are connected to each other. Thus, a second inverter circuit is configured in which the gate of the P-type SOTB transistor SP2 and the gate of the N-type SOTB transistor SN2 are input, and the drain of the P-type SOTB transistor SP2 and the drain of the N-type SOTB transistor SN2 are outputs. .

  The input of the first inverter circuit is connected to the output of the second inverter circuit, and the input of the second inverter circuit is connected to the output of the first inverter circuit. That is, the input and output of the first inverter circuit and the output and input of the second inverter circuit are cross-connected to constitute a flip-flop circuit. A pair of inputs and outputs of the flip-flop circuit, that is, an input of the first inverter circuit (output of the second inverter circuit) and an input of the second inverter circuit (output of the first inverter circuit) are N-type SOTB transistors for transfer. (Transfer SOTB transistor) SN3 and SN4 are connected to corresponding complementary data line pairs D0 and / D0. The gates of the transfer SOTB transistors SN3 and SN4 are connected to the corresponding word line W0.

  Word lines W0 to Wn and complementary data line pairs D0, / D0 to Dn, / Dn of the memory cell array are connected to a peripheral circuit PRK. The peripheral circuit PRK is connected to the bus 27 and receives an address signal (not shown) and a read / write control signal (not shown) via the bus 27. The peripheral circuit PRK selects the word line specified by the address signal from the plurality of word lines W0 to Wn based on the supplied address signal, and sets the selected word line to the high level. The peripheral circuit PRK selects a complementary data line pair designated by the address signal from the plurality of complementary data line pairs D0, / D0 to Dn, / Dn based on the supplied address signal.

  The peripheral circuit PRK supplies information from the selected complementary data line pair to the bus 27 when the read / write control signal designates a read operation. In this case, information from the memory cell connected to the selected complementary data line pair and having the voltage of the connected word line is at a high level is supplied to the bus 27. On the other hand, when the read / write control signal designates a write operation, the peripheral circuit PRK supplies information on the bus 27 to the selected complementary data line pair. In this case, information on the bus 27 is supplied to a memory cell connected to the selected complementary data line pair and the voltage of the connected word line is at a high level, and writing is performed.

  The write operation and read operation will be described by taking as an example the case where the peripheral circuit PRK selects the word line W0 and the complementary data line pair D0, / D0. When the word line W0 is set to the high level by selection, both the transfer SOTB transistors SN3 and SN4 in the selected memory cell MC00 are turned on.

  In the write operation, the voltage of the complementary data line pair D0, / D0 is transmitted to the pair of input / output of the flip-flop circuit via the transfer SOTB transistors SN3, SN4. That is, the voltage of the complementary data line D0 is supplied to the input of the second inverter circuit via the transfer SOTB transistor SN3, and the voltage of the complementary data line / D0 is supplied to the first inverter via the transfer SOTB transistor SN4. Supplied to the input of the circuit. The voltage (signal) on the complementary data line / D0 is phase-inverted with respect to the voltage (signal) on the complementary data line D0. Therefore, for example, a high level is supplied to the input of the first inverter circuit via the transfer SOTB transistor SN3, and a low level is supplied to the input of the second inverter circuit via the transfer SOTB transistor SN4. Become. As a result, the state held by the flip-flop circuit is determined by the signals in the complementary data line pair D0, / D0, and writing to the memory cell MC00 is performed.

  On the other hand, in the read operation, a pair of input / outputs of the flip-flop circuit is connected to the complementary data line pair D0, / D0 via the transfer SOTB transistors SN3, SN4. That is, the output of the second inverter circuit is connected to the complementary data line / D0 via the transfer SOTB transistor SN4, and the output of the first inverter circuit is connected to the complementary data line D0 via the transfer SOTB transistor SN3. Connected. For example, in the flip-flop circuit, when the output of the first inverter circuit is at the low level and the output of the second inverter circuit is at the high level, the low level is set via the transfer SOTB transistor SN3 to the complementary data line D0. The high level is supplied to the complementary data line / D0 via the transfer SOTB transistor SN4.

  The same applies to the memory cell MC00 when word line and complementary data line pairs corresponding to the other memory cells MC01, MC10 to MCnn are selected.

  When the peripheral circuit PRK deselects the word line W0, that is, sets it to the low level, both the transfer SOTB transistors SN3 and SN4 are turned off. As a result, the pair of complementary data lines and the input / output of the flip-flop circuit in the memory cell MC00 are electrically separated. At this time, since the power supply voltage Vd and the ground voltage Vs are supplied to the flip-flop circuit, the held state is continuously held. Similarly, when the corresponding word line is not selected, the other memory cells keep the held state.

  The peripheral circuit PRK includes a plurality of P-type MOS transistors and a plurality of N-type MOS transistors. For example, the peripheral circuit PRK includes a decoder circuit that decodes an address signal and a drive circuit that transmits the output of the decoder circuit to a word line. These circuits include a plurality of P-type MOS transistors and a plurality of N-type MOS transistors. It is composed of a type MOS transistor. FIG. 2 representatively shows some P-type MOS transistors and N-type MOS transistors among the plurality of P-type MOS transistors and the plurality of N-type MOS transistors constituting the peripheral circuit PRK. That is, FIG. 2 shows the MOS transistors that constitute the output part of the drive circuit that supplies the selected and unselected voltages to the word lines W0 and W1.

  In the figure, the output part of the drive circuit has the same configuration, and has a P-type MOS transistor MP2 and an N-type MOS transistor MN2. Here, the power supply voltage Vd is supplied to the source of the P-type MOS transistor MP2, and its drain is connected to the corresponding word line (for example, W0). A ground voltage Vs is supplied to the source of the N-type MOS transistor MN2, and its drain is connected to the corresponding word line (W0). The gate of the P-type MOS transistor MP2 and the gate of the N-type MOS transistor MN2 are connected in common, and a signal decoded by the decoder circuit is transmitted.

  Thereby, in the output part of the drive circuit corresponding to the word line (for example, W0) designated by the address signal, the P-type MOS transistor MP2 is turned on and the N-type MOS transistor MN2 is turned off. As a result, the power supply voltage Vd (high level) is supplied to the selected word line (W0) via the P-type MOS transistor MP2. On the other hand, in the output part of the drive circuit corresponding to the word line (for example, W1) not designated by the address signal, the P-type MOS transistor MP2 is turned off and the N-type MOS transistor MN2 is turned on. As a result, the ground voltage Vs (low level) is supplied to the non-selected word line (W1) via the N-type MOS transistor MN2.

  Each of the P-type SOTB transistor, the N-type SOTB transistor, the P-type MOS transistor, and the N-type MOS transistor will be described later with reference to FIG. 3, but the source region (corresponding to the source), the drain region (corresponding to the drain), It has a gate electrode (corresponding to the gate) and a back gate region (corresponding to the back gate).

  In this embodiment, the substrate bias voltage Vsp (first substrate bias voltage) is supplied to the back gates of the P-type SOTB transistors SP1 and SP2 in each of the memory cells MC00 to MCnn included in the memory cell array in the SRAM 30. ing. A substrate bias voltage Vsn (second substrate bias voltage) is supplied to the back gates of the N-type SOTB transistors SN1 to SN4 in each of the memory cells MC00 to MCnn. On the other hand, the substrate bias voltage Vmp (third substrate bias voltage) is supplied to the back gates of the plurality of P-type MOS transistors (MP2) constituting the peripheral circuit PRK in the SRAM 30, and the peripheral circuit PRK in the SRAM 30 is A substrate bias voltage Vmn (fourth substrate bias voltage) is supplied to the back gates of the plurality of N-type MOS transistors (MN2) constituting the same. The substrate bias voltage Vmp (third substrate bias voltage) is also supplied to the back gates of the plurality of P-type MOS transistors (MP1) constituting the CPU 26, and the plurality of N-type MOS transistors (MN1) constituting the CPU 26 are supplied. ) Is supplied with a substrate bias voltage Vmn (fourth substrate bias voltage).

  That is, in this embodiment, the back bias of the P-type MOS transistor (MP1) constituting the CPU 26 and the P-type MOS transistor (MP2) constituting the peripheral circuit PRK in the SRAM 30 is connected to the substrate bias of the same voltage value. A substrate bias voltage Vmn having the same voltage value is supplied to the back gates of the N-type MOS transistor (MN1) constituting the CPU 26 and the N-type MOS transistor (MN2) constituting the peripheral circuit PRK in the SRAM 30. Is supplied.

  The back gates of the P-type SOTB transistors SP1 and SP2 constituting each memory cell are supplied with a substrate bias voltage Vsp that is the same P-channel type but is different from the substrate bias voltage Vmp. Similarly, a substrate bias voltage Vsn which is the same N-channel type but different from the substrate bias voltage Vmn is supplied to the back gates of the N-type SOTB transistors SN1 and SN2 constituting each memory cell. The substrate bias voltage Vsp and the substrate bias voltage Vsn are generated by the substrate bias generation circuits 23-Vsp and 23-Vsn so that the polarities are different from each other, and the substrate bias voltage Vmp and the substrate bias voltage Vmn are mutually polar. Are generated by the substrate bias generation circuit 23-Vmp and 23-Vmn. The substrate bias voltage Vsp and the substrate bias voltage Vmp have the same polarity, and the substrate bias voltage Vsn and the substrate bias voltage Vmn have the same polarity.

<Structure of MOS transistor and SOTB transistor>
Next, the structure of the MOS transistor and the SOTB transistor will be described with reference to FIG. FIG. 3A is a cross-sectional view schematically showing the structure of a P-type MOS transistor and an N-type MOS transistor. FIG. 3B is a cross-sectional view schematically showing structures of a P-type SOTB transistor and an N-type SOTB transistor.

  The structures of the plurality of P-type MOS transistors are the same as each other, and the structures of the plurality of N-type MOS transistors are also the same as each other. Therefore, the P-type MOS transistor described in FIG. 3A corresponds to the P-type MOS transistor MP1 shown in FIG. 2, and the N-type MOSFET transistor corresponds to the N-type MOS transistor MN1 shown in FIG. Explain that it is. Further, the structures of the plurality of P-type SOTB transistors are the same as each other, and the structures of the plurality of N-type SOTB transistors are also the same as each other. Therefore, the P-type SOTB transistor described in FIG. 3B corresponds to the P-type SOTB transistor SP1 shown in FIG. 2, and the N-type SOTB transistor corresponds to the N-type SOTB transistor SN1 shown in FIG. Explain that it is.

  These MOS transistors and SOTB transistors are formed on one semiconductor chip. In FIG. 3, the substrate 40 is common to the MOS transistor and the SOTB transistor. Here, the substrate 40 will be described as a P-channel type (hereinafter referred to as P-type) silicon substrate.

In FIG. 3A, reference numeral 41 denotes an N channel type (hereinafter referred to as N type) well region formed in a P type silicon substrate 40. An N-type well region 42 and a P-type well region 43 are formed in the N-type well region 41. The N-type well region 42 includes a P ⁺ -type region 45 serving as a source region of the P-type MOS transistor (MP1), a P ⁺ -type region 46 serving as a drain region of the P-type MOS transistor (MP1), and an N ⁺ -type region. 44 is formed. In the figure, reference numeral 50 denotes a gate electrode of a P-type MOS transistor (MP1). The gate electrode 50 is formed on the N-type well region 42 via an insulating film (gate insulating film) (not shown). In FIG. 3A, the gate electrode 50 is drawn so as to be separated from the source region 45 and the drain region 46 in order to make the drawing easy to see, but actually, the gate electrode 50 and the source region 45 are illustrated. The drain region 46 is formed to overlap. The N ⁺ type region 44 is a region for supplying the substrate bias voltage Vmp to the N type well region 42.

In FIG. 3A, 52 indicates an electrode for supplying the substrate bias voltage Vmp to the N ⁺ type region 44, and 53 indicates an electrode for supplying the power supply voltage Vd to the P ⁺ type region 45. Is shown. In FIG. 3A, reference numeral 56 denotes an electrode for connecting the P ⁺ type region 46 to the output out, and 54 denotes an electrode for connecting the gate electrode 50 to the input in.

The P-type well region 43 includes an N ⁺ -type region 48 serving as a source region of the N-type MOS transistor (MN1), an N ⁺ -type region 47 serving as a drain region of the N-type MOS transistor (MN1), and P ⁺ A mold region 49 is formed. In the figure, reference numeral 51 denotes a gate electrode of an N-type MOS transistor (MN1). The gate electrode 51 is formed on the P-type well region 43 via an insulating film (gate insulating film) (not shown). In FIG. 3A, the gate electrode 51 is also drawn so as to be separated from the source region 48 and the drain region 47 in order to make the drawing easy to see, but actually, the gate electrode 51 and the source region 48 are drawn. And the drain region 47 is formed to overlap. The P ⁺ type region 49 is a region for supplying the substrate bias voltage Vmn to the P type well region 43.

In FIG. 3A, 59 indicates an electrode for supplying the substrate bias voltage Vmn to the P ⁺ -type region 49, and 58 indicates an electrode for supplying the ground voltage Vs to the N ⁺ -type region 48. Is shown. In FIG. 3A, 57 indicates an electrode for connecting the N ⁺ type region 47 to the output out, and 55 indicates an electrode for connecting the gate electrode 51 to the input in.

Each of the substrate 40, the N-type well regions 41 and 42, the P-type well region 43, the P ⁺ -type regions 45, 46, and 49 and the N ⁺ -type regions 44, 47, and 48 is silicon containing impurities, Each channel type is determined by the contained impurities.

  Note that the portion of the N-type well region 42 (P-type well region 43) on the lower side of the gate electrode 50 (51) sandwiched between the source region 45 (48) and the drain region 46 (47). The channel is formed by supplying a voltage to the gate electrode 50 (51). In FIG. 3A, reference numeral 60 denotes an insulating region that separates elements.

  Similar to FIG. 3A, in FIG. 3B, 40 indicates a common P-type silicon substrate, 41 indicates an N-type well region formed in the P-type silicon substrate 40, and 42 indicates An N-type well region formed in the N-type well region 41 is shown. Reference numeral 43 denotes a P-type well region formed in the N-type well region 41.

A thin insulating film 80 is formed on the N-type well region 42. A P ⁺ type region 62 serving as a source region of the P type SOTB transistor (SP1) and a P ⁺ type region 64 serving as a drain region are formed on the N type well region 42 so as to sandwich the thin insulating film 80. ing. Further, a silicon region (region of silicon thin film) 63 substantially not containing impurities is formed between the P ⁺ type region 62 and the P ⁺ type region 64. A gate electrode 69 is formed on the silicon region 63 via an insulating film (gate insulating film) (not shown). Here, the silicon region 63 is in contact with the P ⁺ type region 62 and the P ⁺ type region 64, and a channel is formed in the silicon region 63 by supplying a voltage to the gate electrode 69. In FIG. 3B, the gate electrode 69 is drawn so as to be separated from the source region 62 and the drain region 64 in order to make the drawing easy to see. 62 and drain region 64 are formed to overlap.

Further, an N ⁺ type region 61 for supplying the substrate bias voltage Vsp to the N type well region 42 is formed on the N type well region 42. In FIG. 3B, reference numeral 71 denotes an electrode for supplying the substrate bias voltage Vsp to the N ⁺ type region 61, and 72 denotes an electrode for supplying the power supply voltage Vd to the source region 62. Reference numeral 74 denotes an electrode for connecting the drain region 64 to the output out. Reference numeral 73 denotes an electrode for connecting the gate electrode 69 to the input in.

A thin insulating film 81 is formed on the P-type well region 43. So as to sandwich the thin insulating film 81, on the P-type well region 43, an ^{N +} -type region 67 serving as the source region of the N-type SOTB transistor (SN1), a ^{N +} -type region 65 serving as a drain region are formed ing. In addition, a silicon region (silicon thin film region) 66 substantially free of impurities is formed between the N ⁺ type region 65 and the N ⁺ type region 67. A gate electrode 70 is formed on the silicon region 66 via an insulating film (gate insulating film) (not shown). Here, the silicon region 66 is in contact with the N ⁺ type region 65 and the N ⁺ type region 67, and a channel is formed in the silicon region 66 by supplying a voltage to the gate electrode 70. Again, for ease of viewing the drawing, the gate electrode 70 is depicted as being separated from the source region 67 and the drain region 65, but actually the gate electrode 70, the source region 67 and the drain region 65 are drawn. Are formed to overlap.

A P ⁺ type region 68 for supplying the substrate bias voltage Vsn to the P type well region 43 is formed on the P type well region 43. In FIG. 3B, reference numeral 78 denotes an electrode for supplying the substrate bias voltage Vsn to the P ⁺ type region 68, and 77 denotes an electrode for supplying the ground voltage Vs to the source region 67. Reference numeral 75 denotes an electrode for connecting the drain region 65 to the output out, and 77 denotes an electrode for connecting the gate electrode 70 to the input in. Note that in FIG. 3B, reference numeral 60 denotes an insulating region for element isolation as in FIG.

  The thicknesses of the thin silicon regions (silicon thin film regions) 63 and 66 and the thin insulating films 80 and 81 are, for example, about 10 nm. The channel type of the SOTB transistor is determined by the composition of the insulating film provided between the gate electrodes 69 and 70 and the thin silicon regions 63 and 66, that is, the gate insulating film. For example, the channel type of the SOTB transistor is determined by using aluminum or hafnium as the composition of the gate insulating film. The threshold voltage of the SOTB transistor is determined by the amount of aluminum or hafnium and / or the amount of impurities contained in the thin insulating films 80 and 81.

  As shown in FIG. 3A, in the P-type MOS transistor and the N-type MOS transistor, channels are formed in the N-type well region 42 and the P-type well region 43 containing impurities. Therefore, if the concentration of impurities contained varies between the N-type well regions 42 (and / or between the P-type well regions 43) formed in the same semiconductor chip, the P-type MOS transistor (and / or the N-type MOS transistor) The threshold voltage varies between the two. A PN junction exists between the N-type well region 42 (P-type well region 43) and the source and drain regions of the P-type MOS transistor (N-type MOS transistor). Therefore, when the substrate bias voltage Vmp (Vmn) is supplied to the N-type well region 42 (P-type well region 43), a leakage current due to the PN junction is generated.

  On the other hand, in the P-type SOTB transistor and the N-type SOTB transistor, the regions 63 and 66 where the channel is formed contain substantially no impurities. Therefore, variation in the amount of impurities can reduce variation in threshold voltages of the P-type SOTB transistor and the N-type SOTB transistor. In addition, since impurities are not substantially contained, the threshold voltages of the P-type SOTB transistor and the N-type SOTB transistor change in proportion to the substrate bias voltages Vsp and Vsn. Further, the N-type well region 42 (P-type well region 43) to which the substrate bias voltage Vsp (Vsn) is supplied, and the source region and drain region of the P-type SOTB transistor (N-type SOTB transistor) are provided with the insulating film 80 (81 ), The PN junction does not exist. As a result, it is possible to prevent leakage current from being generated by the PN junction.

  The back gate of the P-type MOS transistor (MP1) corresponds to the N-type well region 42 of FIG. 3A, and the back gate of the N-type MOS transistor (MN1) corresponds to the P-type well region 43 of FIG. Is applicable. The back gate of the P-type SOTB transistor (SP1) corresponds to the N-type well region 42 of FIG. 3B, and the back gate of the N-type SOTB transistor (SN1) corresponds to the P-type well of FIG. Region 43 corresponds.

<Operation of Semiconductor Device 10>
FIG. 4 is an explanatory diagram showing an operation concept of the semiconductor device 10 according to the first embodiment. In the figure, the horizontal axis represents time, and the vertical axis represents the operating frequency in a predetermined circuit block of the semiconductor device 10. The predetermined circuit here is, for example, the CPU 26.

  In FIG. 4, 1 indicates the operating frequency in the high speed mode, and 2 indicates the operating frequency in the low speed mode. Reference numeral 3 denotes a standby mode. In the high speed mode 1, as described with reference to FIG. 1, the CPU 26 operates in synchronization with the high speed clock signal 20. Therefore, it operates at a high frequency (High f). In the low speed mode 2, the CPU 26 operates in synchronization with the low speed clock signal 21. Therefore, it operates at a low frequency (Low f). On the other hand, in the standby mode, the clock signal is cut off.

  The substrate bias circuit 23 generates substrate bias voltages Vmp, Vmn, Vsp, and Vsn in the low-speed mode 2 and the standby mode 3, and supplies them to the CPU 26, the SRAM 30, and the like. By supplying the substrate bias voltages Vmp, Vmn, Vsp and Vsn to the respective back gates of the P-type MOS transistor, N-type MOS transistor, P-type SOTB transistor and N-type SOTB transistor constituting the CPU 26, SRAM 30 and the like, The threshold voltage of each transistor increases. By increasing the threshold voltage of each transistor, the leakage current can be greatly reduced. On the other hand, the substrate bias generation circuit 23 does not supply the substrate bias voltages Vmp, Vmn, Vsp, and Vsn to the respective transistors in the high-speed mode 1. As a result, the threshold voltage of each transistor does not increase, so that the CPU 26, SRAM 30, etc. can operate at high speed.

  In this embodiment, in any of the high speed mode 1, the low speed mode 2 and the standby mode 3, the voltage values of the power supply voltage Vd and the ground voltage Vs are not changed and are constant.

  In the standby mode 3, since the supply of the clock signal is interrupted, a specific circuit block in the CPU 26 enters a sleep state.

  The standby mode 3 and the low speed mode 2 are switched at a certain time interval. This makes it possible to create a super standby state that can reduce power consumption while performing processing at a low speed. In the super standby state or the low speed mode 2, the semiconductor device 10 performs a process that can be performed at a predetermined low speed. For example, in the super standby state or in the low speed mode 2, the semiconductor device 10 executes processing for realizing the function of the watch. At this time, since the substrate bias voltage is supplied to the back gates of the MOS transistor and the SOTB transistor, the respective threshold voltages are increased, and the leakage current can be reduced. In addition, since the operating frequency is low, the operating current is also reduced. Thereby, power consumption can be further reduced.

  On the other hand, the function of the mobile terminal device, for example, an application such as a game, is executed in the high-speed mode 1. In the high-speed mode 1, the substrate bias voltages Vmp, Vmn, Vsp and Vsn are not supplied to the back gates of the P-type MOS transistor, N-type MOS transistor, P-type SOTB transistor and N-type SOTB transistor. The value voltage does not increase. As a result, the leakage current increases. At this time, since the operating frequency is high, the operating current increases, and the increase in power consumption due to the increase in leakage current is negligible.

  In both the standby mode 3 and the low-speed mode 2, the substrate bias voltages Vmp, Vmn, Vsp, and Vsn are the P-type MOS transistor, N-type MOS transistor, P-type SOTB transistor, and N-type SOTB that constitute the CPU 26, SRAM 30, etc. It is supplied to each back gate of the transistor. For this reason, the system controller S / C 24 determines that the substrate bias generation circuit 23-Vmp, 23-Vmn, 23-V is generated by the mode designation signal Vb_Cont only when the designation signal M_Cont supplied from the CPU 26 corresponds to the second mode. Vsp and 23-Vsn (FIG. 2) are operated so that the substrate bias voltages Vmp, Vmn, Vsp and Vsn are supplied to the back gate. On the other hand, when the designation signal M_Cont supplied from the CPU 26 corresponds to the first mode, the system controller S / C 24 causes the substrate bias generation circuit 23-Vmp, 23-Vmn, 23-Vsp, 23-Vsn (FIG. 2) is set to the non-operating state.

<Threshold control of SOTB transistor>
In order to operate the semiconductor device 10 stably, it is important to make the SRAM 30 operate stably. In order to achieve high integration of the semiconductor device 10, the transistor that forms the memory cells MC <b> 00 to MCnn included in the SRAM 30 is the smallest transistor among the transistors included in the semiconductor device 10. Since the size is the smallest, the size (width W and length L) of the gate electrode of the transistor is also reduced. In the P-type MOS transistor and the N-type MOS transistor, for example, impurities are implanted into the semiconductor region immediately below the gate electrode (in FIG. 3A, a part of the N-type well region 42 and the P-type well region 43). The threshold voltages of the P-type MOS transistor and the N-type MOSFET are determined.

  Since the size of the gate electrode is small, the semiconductor region immediately below the gate electrode is also small, and the amount of impurities implanted is small. Therefore, if the amount of implanted impurities varies, the characteristics of the P-type MOS transistor and the N-type MOS transistor vary greatly. For example, in a 65 nm SRAM, when a MOS transistor constituting a memory cell is examined, the threshold voltage of the MOS transistor varies, for example, 0.6V. For example, when the threshold voltage of the MOS transistor of the memory cell is set to 0.2 V, a MOS transistor with a threshold voltage of 0.8 V (0.2 V + 0.6 V) may occur due to variations. . This indicates that when the power supply voltage Vd drops below 0.8V, a memory cell that does not operate normally is generated. That is, the operation lower limit voltage of the semiconductor device 10 is determined by the operation lower limit voltage of the SRAM memory cell. Although it is conceivable that the SRAM memory cell operates stably by increasing the power supply voltage Vd, increasing the power supply voltage Vd leads to an increase in power consumption.

  In the embodiment, each of memory cells MC00 to MCnn includes P-type SOTB transistors SP1 and SP2 and N-type SOTB transistors SN1 to SN4. A channel is formed in a region substantially free of impurities (63 and 66 in FIG. 3B). Therefore, even if the size of these SOTB transistors is reduced, variation in threshold voltage due to impurity variation can be suppressed. For example, the variation in threshold voltage can be suppressed to about 0.2V. Thereby, even when the power supply voltage Vd is low, the SRAM 30 can operate stably, and the semiconductor device 10 can be operated stably.

  Furthermore, in this embodiment, the substrate bias circuit 23 controls the threshold voltage of the P-type SOTB transistor so that the SRAM 30 operates stably.

  FIG. 5 is a characteristic diagram showing changes in threshold voltages of the P-type SOTB transistors SP1 and SP2 and the N-type SOTB transistors SN1 to SN4 when the substrate bias voltages Vsp and Vsn are changed. In the figure, the horizontal axis indicates the change in threshold voltage (Vth) of the N-type SOTB transistor when the absolute value of the substrate bias voltage Vsn is increased, and the vertical axis indicates the absolute value of the substrate bias voltage Vsp. A change in the threshold voltage (Vth) of the P-type SOTB transistor when the value is increased is shown.

  In the high-speed mode 1, the substrate bias voltage is not supplied to the back gates of the P-type SOTB transistors SP1 and SP2 and the N-type SOTB transistors SN1 to SN4. In the high-speed mode 1, since the CPU 26, the SRAM 30, and the like operate in synchronization with the high-speed clock signal 20, the SRAM 30 has the threshold voltage of the P-type SOTB transistors SP1, SP2 so that the operation margin is maximized. The threshold voltages of the N-type SOTB transistors SN1 to SN4 are set to the same values Vth1 (P) and Vth1 (N). That is, the thresholds of the P-type SOTB transistors SP1 and SP2 are not supplied with the substrate bias voltage Vsp and the N-type SOTB transistors SN1 to SN4 are not supplied with the substrate bias voltage Vsn. The absolute value Vth1 (p) of the value voltage and the absolute value Vth1 (n) of the threshold voltage of these N-type SOTB transistors are manufactured to be the threshold voltage Vth1. In FIG. 5, the threshold voltages of the P-type SOTB transistor and the N-type SOTB transistor in the high-speed mode 1 are indicated by ◯.

  When the low speed mode 2 is designated, the back gate voltages of the P-type SOTB transistors SP1 and SP2 and the N-type SOTB transistors SN1 to SN1 in accordance with the substrate bias voltages Vsp and Vsn from the substrate bias generating circuits 23-Vsp and 23-Vsn. The back gate voltage of SN4 increases in absolute value. As a result, the absolute value of the threshold voltage of the N-type SOTB transistors SN1 to SN4 changes to a large value as indicated by a broken line in FIG. As already described, in the SOTB transistor, the threshold voltage changes in proportion to the voltage supplied to the back gate.

  As will be described later with reference to FIGS. 7 and 8, in order to stably operate the SRAM 30, the absolute values of the threshold voltages of the P-type SOTB transistors SP1 and SP2 are the values of the N-type SOTB transistors SN1 to SN4. It is desirable that the absolute value of the threshold voltage is twice or more. Therefore, the substrate bias generation circuit 23-Vsp generates a substrate bias voltage Vsp having a voltage value that is at least twice as large as the absolute value of the substrate bias voltage Vsn generated by the substrate bias generation circuit 23-Vsn. Thereby, the absolute value of the threshold voltage of N-type SOTB transistors SN1 to SN4 increases along the broken line, but the threshold voltage of P-type SOTB transistors SP1 and SP2 increases along solid line 6. As a result, in the low-speed mode 2, the absolute value of the threshold voltage of the P-type SOTB transistor is the threshold voltage Vth2, 3 (P) indicated by □. On the other hand, the absolute value of the threshold voltage of the N-type SOTB increases along the broken line, so that it becomes the threshold voltage Vth2, 3 (N) in the low-speed mode 2, and the absolute value is P-type. It becomes smaller than the threshold voltage Vth2, 3 (P) of the SOTB transistor.

  Also in the standby mode 3, substrate bias voltages Vsp and Vsn having the same values as those in the low speed mode 2 are supplied to the back gates of the P-type SOTB transistor and the N-type SOTB transistor. Therefore, also in the standby mode 3, the threshold voltages of the P-type SOTB transistors SP1 and SP2 are Vth2, 3 (P), and the threshold voltages of the N-type SOTB transistors SN1 to SN4 are Vth2, 3 (N). It becomes.

  In the low-speed mode 2 and the standby mode 3, the P-type MOS transistors (for example, MP1 and MP2 in FIG. 2) and the N-type MOS transistors (for example, MN1 and MN2 in FIG. 2) constituting the peripheral circuit PRK and the like in the CPU 26 and the SRAM 30 The substrate bias generation circuits 23-Vmp and 23-Vmn supply substrate bias voltages Vmp and Vmn to the respective back gates. Also in these P-type MOS transistor and N-type MOS transistor, in the high-speed mode 1, the same threshold voltage is set in the absolute value so that the operation margin is maximized. That is, the absolute values of the threshold voltages of the P-type MOS transistor and the N-type MOS transistor are the same when the substrate bias voltage is not supplied to the back gates of the P-type MOS transistor and the N-type MOS transistor. To manufacture.

  By supplying substrate bias voltages Vmp and Vmn in the low-speed mode 2 and the standby mode 3, the absolute values of the threshold voltages of the P-type MOS transistor and the N-type MOS transistor increase. In order to increase the absolute values of the threshold voltages of the P-type MOS transistor and the N-type MOS transistor while maintaining the operation margin, in this embodiment, the substrate bias voltage Vmp having the same absolute value and Vmn is formed and supplied by substrate vise generating circuits 23-Vmp and 23-Vmn. Thus, by supplying the substrate bias voltages Vmp and Vmn having the same absolute value to the back gates of the P-type MOS transistor and the N-type MOS transistor, the threshold voltage of the P-type MOS transistor and the N-type MOS transistor The threshold voltage reaches a high value in the low speed mode 2 and the standby mode 3 while maintaining an absolute value equal to each other.

  By making the value of the substrate bias voltage Vmn supplied to the back gate of the N-type MOS transistor the same as the value of the substrate bias voltage Vsn supplied to the back gate of the N-type SOTB transistor, the substrate shown in FIG. There is no need to provide the bias generation circuit 23-Vmn or 23-Vsn. In this case, both the substrate bias voltages Vmn and Vsn are formed by the remaining substrate bias generation circuit 23-Vsn or Vmn. Similarly, by making the value of the substrate bias voltage Vmp supplied to the back gate of the P-type MOS transistor the same as the value of the substrate bias voltage Vsp supplied to the back gate of the P-type SOTB transistor, FIG. It is not necessary to provide the substrate bias generation circuit 23-Vmp or 23-Vsp shown. In this case, both the substrate bias voltages Vmp and Vsp are formed by the remaining substrate bias generation circuit 23-Vsp or Vmp.

  Thus, by setting the substrate bias voltages Vmn and Vsn (or Vmp and Vsp) to the same voltage value, the number of substrate bias generation circuits provided in the substrate bias generation circuit 23 can be reduced to three. The semiconductor device 10 can be downsized.

  FIG. 6 is a schematic waveform diagram showing a change in the substrate bias voltage generated by the substrate bias generation circuit 23. In the figure, the horizontal axis indicates time, and the vertical axis indicates the voltage value of the substrate bias voltage as an absolute value. In FIG. 6, a period indicated by 1 indicates a period during which the semiconductor device 10 operates in the high speed mode 1, and 2 and 3 indicate periods during which the semiconductor device 10 operates in the low speed mode 2 and the standby mode 3. Yes. For example, periods 2 and 3 indicate periods in which the semiconductor device 10 operates in the super standby state described above.

  Substrate bias generation circuits 23-Vsp and 23-Vsn do not supply substrate bias voltages Vsp and Vsn to the back gate of the SOTB transistor in high-speed mode 1. In contrast, in the low-speed mode 2 and the standby mode 3, the substrate bias generation circuit 23-Vsn supplies the substrate bias voltage Vsn having the low bias voltage 4 to the back gate of the N-type SOTB transistor. 23-Vsp supplies a substrate bias voltage Vsp having a high bias voltage 5 to the back gate of the P-type SOTB transistor. In this embodiment, in order to stabilize SRAM 30, the threshold voltage of the P-type SOTB transistor is set to be at least twice as large as the threshold voltage of the N-type SOTB transistor in absolute value. Therefore, the value of the high bias voltage 5 has a voltage that is at least twice that of the low bias voltage 4 in absolute value.

  Substrate bias generation circuits 23-Vmn and 23-Vmp also do not supply substrate bias voltages Vmp, Vmn to the back gates of the P-type MOS transistor and N-type MOS transistor in period 1 of high-speed mode 1. On the other hand, in low-speed mode 2 and standby mode 3, substrate bias generation circuits 23-Vmn and 23-Vmp form substrate bias voltages Vmp, Vmn having absolute values equal to low bias voltage 4 or high bias voltage 5, respectively. To do. In this case, since the substrate bias voltage Vsp can be used as the substrate bias voltage Vmp, or the substrate bias voltage Vsn can be used as the substrate bias voltage Vmn, the number of substrate bias generating circuits provided in the substrate bias generating circuit 23 is 3 It is possible to reduce it to pieces.

<Stable operation of semiconductor devices>
As described above, the power supply voltage Vd is determined by the power supply voltages of the memory cells MC00 to MCnn included in the SRAM 30 in order to stably operate the semiconductor device 10. That is, when the power supply voltage Vd of the semiconductor device 10 is lowered, first, the operation of the SRAM 30 becomes unstable.

  When the memory cells MC00 to MCnn are configured by P-type SOTB transistors SP1 and SP2 and N-type SOTB transistors SN1 to SN4 as shown in FIG. 2, the threshold voltages of the P-type SOTB transistors are as follows. Whether or not the power supply voltage at which the SRAM 30 operates stably varies depending on the threshold voltage of the N-type SOTB transistor. 7 and 8 are characteristic diagrams showing the relationship between the threshold voltage obtained by simulation and the power supply voltage. 7 and 8, the horizontal axis represents the ratio of the threshold voltage (Vth (P-type SOTB)) of the P-type SOTB transistor to the threshold voltage (Vth (N-type SOTB)) of the N-type SOTB transistor ( Vth (P-type SOTB) / Vth (N-type SOTB)), and the vertical axis represents the power supply voltage Vd (voltage with respect to the ground voltage Vs) at which the SRAM operates stably. Here, FIG. 7 shows a state in the high speed mode 1 in which the substrate bias voltage is not supplied, and FIG. 8 shows a state in the low speed mode 2 in which the substrate bias voltage is supplied. . 7 and 8, the smaller the operating voltage Vdmin shown on the vertical axis, the wider the operating range. That is, the smaller the operating voltage Vdmin is, the larger the operating margin is.

  In FIG. 7, a broken line indicated by A indicates a case where the ratio of threshold voltages of the P-type SOTB transistor and the N-type SOTB transistor is 1. That is, the threshold voltage of the P-type SOTB transistor is equal to the threshold voltage of the N-type SOTB transistor.

  The minimum operating voltage at which the SRAM can operate is high when the threshold voltage Vth (P-type SOTB) of the N-type SOTB transistor is larger than the threshold voltage Vth (N-type SOTB) of the P-type SOTB transistor. As the value voltage ratio approaches 1, it decreases. That is, the operation margin is increased around the threshold voltage Vth (P-type SOTB) and the threshold voltage Vth (N-type SOTB) being equal. As the threshold voltage Vth (P-type SOTB) of the P-type SOTB increases and the ratio increases, the minimum operating voltage gradually increases. Therefore, even when the ratio is twice (broken line B) or more, the minimum operating voltage is relatively low and the operating margin is relatively large.

  When the substrate bias voltage is supplied, the minimum operating voltage of the SRAM changes as shown in FIG. That is, the minimum operating voltage Vdmin is low when the ratio is smaller than 1 time, and is lowest when the ratio is 2 times or more. That is, the operation margin is large when the ratio of the threshold voltages of the P-type SOTB transistor and the N-type SOTB transistor is twice or more. On the other hand, the operation margin deteriorates in the vicinity of the ratio of 1.

  Thus, when the substrate bias voltage is not supplied, the ratio of the threshold voltages of the P-type SOTB transistor and the N-type SOTB transistor is about 1 (equal), and the operation margin of the SRAM is increased. On the other hand, when the substrate bias voltage is supplied, if the ratio of the threshold voltages of the P-type SOTB transistor and the N-type SOTB transistor is increased, the operation margin is improved, and if it is doubled or more, the operation margin is increased. . Therefore, when the substrate bias voltage is supplied, the ratio of the threshold voltages of the P-type SOTB transistor and the N-type SOTB transistor is preferably set to be larger than 1 time, preferably 2 times or more.

(Embodiment 2)
In the semiconductor device according to the second embodiment, the voltage value of the substrate bias voltage generated by the substrate bias generation circuit 23 is changed from that in the first embodiment. The configuration of the semiconductor device is the same as that of the first embodiment except that the number of substrate bias generation circuits changes. Since the operation of the substrate bias circuit 23 is the same as that of the first embodiment, the description thereof is omitted.

  FIG. 9 is a characteristic diagram showing characteristics of the P-type SOTB transistor and the N-type SOTB transistor according to the second embodiment. Similar to FIG. 5, FIG. 9 shows characteristics indicating changes in threshold voltages of the P-type SOTB transistors SP1 and SP2 and the N-type SOTB transistors SN1 to SN4 when the substrate bias voltages Vsp and Vsn are changed. It is shown.

  In the figure, a broken line indicates a change in the threshold voltage of the N-type SOTB transistor, and a solid line 7 indicates a change in the threshold voltage of the P-type SOTB transistor. In the second embodiment, the threshold voltages of P-type SOTB transistors SP1 and SP2 are set to be larger in absolute value than N-type SOTB transistors SN1 to SN4. For example, the threshold voltages of the P-type SOTB transistors SP1 and SP2 are twice or more in absolute value with respect to the N-type SOTB transistors SN1 to SN4. The threshold voltage is set by, for example, the amount of aluminum or hafnium contained in the gate insulating film and / or the thin insulating film 80 for each of the P-type SOTB transistors SP1 and SP2 and the N-type SOTB transistors SN1 to SN4. 81 (FIG. 3) by changing the amount of impurities contained in the semiconductor device.

  In the high-speed mode 1, the substrate bias circuit 23 does not supply the substrate bias voltages Vsp and Vsn to the back gates of the P-type SOTB transistors SP1 and SP2 and the N-type SOTB transistors SN1 to SN4. Further, the substrate bias voltages Vmp and Vmn are not supplied to the back gates of the P-type MOS transistor and the N-type MOS transistor constituting the peripheral circuit PRK (FIG. 2) of the CPU 26 and the SRAM 30, respectively. The threshold voltages (N-type MOSTB_Vth) of the N-type SOTB transistors SN1 to SN4 change as shown by the broken line in FIG. 9 according to the change of the substrate bias voltage Vmn. Since the substrate bias voltage is not supplied to each of the type SOTB transistors SN1 to SN4, the threshold voltage at that time is Vth1 (N). On the other hand, when the substrate bias voltage Vsn is supplied to each of the N-type SOTB transistors SN1 to SN4, the absolute value of the threshold voltage of the N-type SOTB transistor increases. The absolute values of the threshold voltages are Vth2 and Vth3 (N).

  On the other hand, when each of the P-type SOTB transistors SP1 and SP2 is in the high-speed mode 1, the absolute value of the threshold voltage (P-type SOTB_Vth) is Vth1 (P). At this time, the absolute value Vth (P) of the threshold voltages of the P-type SOTB transistors SP1 and SP2 is a value more than twice the threshold voltage Vth (N) of the N-type SOTB transistors SN1 to SN4.

  In the low speed mode 2 or the standby mode 3, the substrate bias circuit 23 supplies the substrate bias voltages Vsp and Vsn to the back gates of the P-type SOTB transistor and the N-type SOTB transistor. In the second embodiment, in the low speed mode 2 or the standby mode 3, the absolute values of the substrate bias voltages Vsp and Vsn formed by the substrate bias circuit 23 are set to the same value. In other words, substrate bias generation circuits 23-Vsp and 23-Vsn form substrate bias voltages Vsp and Vsn having the same absolute value.

  Thereby, the absolute value of each threshold voltage of P-type SOTB transistors SP1 and SP2 and the absolute value of each threshold voltage of N-type transistors SN1 to SN4 are two or more times the threshold voltage. While maintaining the state of the difference (the voltage difference between the threshold voltages), the state changes and transitions from the high speed mode 1 to the low speed mode 2 and / or the standby mode 3. In FIG. 9, the absolute value of the threshold voltage of the P-type SOTB transistor in the low-speed mode 2 and the standby mode 3 is shown as Vth2, 3 (P), and this value is the threshold value of the N-type SOTB transistor. The absolute value of voltage Vth2, 3 (N) is twice or more.

  Thereby, similarly to the first embodiment, the SRAM 30 can be stably operated even in the low speed mode 2 or the standby mode 3.

  In the second embodiment, the P-type MOS transistors MP1 and MP2 and the N-type MOS transistors MN1 and MN2 are manufactured so that the respective threshold values are equal in absolute value. The substrate bias voltage is not supplied from the substrate bias circuit 23 to the back gates of the P-type MOS transistors MP1 and MP2 and the N-type MOS transistors MN1 and MN2 in the high-speed mode 1, and the low-speed mode 2 and the standby mode. 3, a substrate bias voltage is supplied from the substrate bias circuit 23. Thereby, in the high-speed mode 1, the threshold voltage of the P-type MOS transistor and the threshold voltage of the N-type MOS transistor are equal to each other in absolute value, and the operation margin can be increased.

  On the other hand, in the low-speed mode 2 and the standby mode 3, the substrate bias voltage Vsp generated by the substrate bias generation circuit 23-Vsp is supplied as the substrate bias voltage Vmp to the back gates of the P-type MOS transistors MP1 and MP2. The substrate bias voltage Vsn generated by the substrate bias generation circuit 23-Vsn is supplied as the substrate bias voltage Vmn to the back gates of the N-type MOSTB transistors MN1 and MN2.

  Thus, in the low-speed mode 2 and / or the standby mode 3, the back gates of the P-type MOS transistor and the N-type MOS transistor constituting the peripheral circuit PRK of the CPU 26 and the SRAM 30 have the same absolute value as each other. Bias voltages Vmp and Vmn are supplied. By supplying substrate bias voltages Vmp and Vmn, the P-type MOS transistor and the N-type MOS transistor become large while maintaining the same absolute value. As a result, in the low-speed mode 2 and the standby mode 3, each of the P-type MOS transistor and the N-type MOS transistor constituting the peripheral circuit PRK of the CPU 26 and the SRAM 30 becomes high while maintaining the same value in absolute value, In the low speed mode 2 and the standby mode 3, power consumption can be reduced.

  In the second embodiment, the substrate bias voltage generated by the substrate bias generation circuit 23-Vsp is used as the substrate bias voltages Vsp and Vmp, and the substrate bias voltage generated by the substrate bias generation circuit 23-Vsn is the substrate bias. Used as voltages Vsn and Vmn. Therefore, the substrate bias circuit 23 can be configured by the two substrate vise generation circuits 23-Vsp and 23-Vsn, and an increase in the size of the semiconductor device 10 can be suppressed. In the high-speed mode 1, the absolute value of the threshold voltage of the P-type SOTB transistor is increased, but there is substantially no problem with respect to the operation margin.

  As described above, in the low-speed mode 2 and the standby mode 3, the substrate bias voltage is supplied to the back gates of the P-type SOTB transistor, the N-type SOTB transistor, the P-type MOS transistor, and the N-type MOS transistor. The threshold voltage (absolute value) of each transistor can be increased, and the power consumption of the semiconductor device 10 can be reduced. In addition, in the low speed mode 2 and the standby mode 3, the operation can be stabilized.

  In the first and second embodiments, substrate bias voltage is not supplied from substrate bias circuit 23 to the back gates of P-type SOTB transistor, N-type SOTB transistor, P-type MOS transistor, and N-type MOS transistor in high-speed mode 1 in the first and second embodiments. However, this means that the substrate bias voltage for increasing the threshold voltage of each transistor is not supplied. Therefore, in the high-speed mode 1, the substrate bias circuit 23 may supply the same voltage as the source of each transistor to the back gate of each transistor. That is, in the high-speed mode 1, the substrate bias circuit 23 supplies a voltage having the same value as the voltage at the source of the P-type SOTB transistor to the back gate of the P-type SOTB transistor, and the back-gate of the N-type SOTB transistor A voltage having the same value as the voltage at the source of the N-type SOTB transistor may be supplied. In the high-speed mode 1, the substrate bias circuit 23 supplies a voltage having the same value as the voltage at the source of the P-type MOS to the back gate of the P-type MOS transistor. A voltage having the same value as the voltage at the source of the MOS transistor may be supplied.

  Alternatively, the substrate bias circuit 23 may cause the back gates of the respective transistors to be in a floating state in the high-speed mode 1.

  As mentioned above, the invention made by the present inventor has been specifically described based on the embodiment. However, the present invention is not limited to the embodiment, and various modifications can be made without departing from the scope of the invention. Needless to say.

  For example, the substrate bias voltage formed by the substrate bias circuit is used for all P-type SOTB transistors, N-type SOTB transistors, P-type MOS transistors, and N-type MOS transistors that constitute the semiconductor device 10 in the low-speed mode 2 and the standby mode 3. The back gate may be supplied. However, when the semiconductor device 10 has an analog circuit, it is desirable not to supply the substrate bias voltage to the back gate of the transistor that forms the analog circuit.

  Moreover, although the case where it has three modes, the high speed mode 1, the low speed mode 2, and the standby mode 3, was demonstrated, it is not limited to this number. For example, it may be a case where only the high speed mode 1 and the low speed mode 2 (or the standby mode 3) are provided. Also in this case, in the high-speed mode 1, the substrate bias voltage is not supplied from the substrate bias circuit 23 to the back gate of the transistor, and the substrate bias voltage is supplied in the low-speed mode 2 (or the standby mode 3). Good.

DESCRIPTION OF SYMBOLS 1 High speed mode 2 Low speed mode 3 Standby mode 10 Semiconductor device 23 Substrate bias circuit 23-Vsp, 23-Vsn, 23-Vmp, 23-Vmn Substrate bias generation circuit 24 System controller 26 CPU
12 Analog circuit 30 SRAM
36A, 36B Clock generator SP1, SP2 P-type SOTB transistors SN1-SN4 N-type SOTB transistors MP1, MP2 P-type MOS transistors MN1, MN2 N-type MOS transistors MC00-MC11 Memory cells

Claims (7)

A first circuit having a P-type transistor and an N-type transistor;
A mode designating circuit for designating an operating speed of the first circuit;
A second circuit having a P-type SOTB transistor and an N-type SOTB transistor and connected to the first circuit;
A first voltage supply circuit for supplying a first voltage;
A second voltage supply circuit for supplying a second voltage;
A third voltage supply circuit for supplying a third voltage;
A fourth voltage supply circuit for supplying a fourth voltage;
With
When the mode designating circuit designates a first operation mode for operating the first circuit at a first speed, the first voltage supply circuit supplies the first voltage to the substrate of the P-type SOTB transistor, The second voltage supply circuit supplies the second voltage to the substrate of the N-type SOTB transistor, the third voltage supply circuit supplies the third voltage to the substrate of the P-type transistor, and the second voltage supply circuit. The four voltage supply circuit supplies the fourth voltage to the substrate of the N-type transistor, and the mode designating circuit has a second operation mode in which the first circuit is operated at a second speed higher than the first speed. When specifying, the first voltage supply circuit does not supply the first voltage to the substrate of the P-type SOTB transistor, and the second voltage supply circuit supplies the second voltage to the substrate of the N-type SOTB transistor. Without supplying
The semiconductor integrated circuit device, wherein the third voltage is different from the first voltage, and the fourth voltage is the same as the second voltage. The semiconductor integrated circuit device according to claim 1,
The second circuit is a static memory having a plurality of memory cells, and each of the plurality of memory cells has a pair of inverter circuits configured by the P-type SOTB transistor and the N-type SOTB transistor. The input of one inverter circuit is connected to the output of the other inverter circuit, the input of the other inverter circuit is connected to the output of the one inverter circuit,
When the one voltage is not supplied to the substrate of the P-type SOTB transistor in the pair of inverter circuits and the two voltage is not supplied to the substrate of the N-type SOTB transistor, the pair of inverter circuits The threshold voltage of the P-type SOTB transistor in the semiconductor integrated circuit device is higher in absolute value than the threshold voltage of the N-type SOTB transistor in the pair of inverter circuits. The semiconductor integrated circuit device according to claim 2,
In the first operation mode, the first substrate voltage is supplied to the substrate of the P-type SOTB transistor in the pair of inverter circuits, and the first substrate voltage is supplied to the substrate of the N-type SOTB transistor in the pair of inverter circuits. By supplying two substrate voltages, the threshold voltage of the P-type SOTB transistor in the pair of inverter circuits and the threshold voltage of the N-type SOTB transistor in the pair of inverter circuits are back-biased. When not supplied, between the absolute value of the threshold voltage of the P-type SOTB transistor in the pair of inverter circuits and the absolute value of the threshold voltage of the N-type SOTB transistor in the pair of inverter circuits A semiconductor integrated circuit device that changes in a state where the voltage difference is maintained. The semiconductor integrated circuit device according to claim 1,
The second circuit is a static memory having a plurality of memory cells, and each of the plurality of memory cells has a pair of inverter circuits configured by the P-type SOTB transistor and the N-type SOTB transistor. The input of one inverter circuit is connected to the output of the other inverter circuit, the input of the other inverter circuit is connected to the output of the one inverter circuit, and the P in the pair of inverter circuits The absolute value of the threshold voltage of the type SOTB transistor is equal to the absolute value of the threshold voltage of the N type SOTB transistor in the pair of inverter circuits;
Each of the first and second voltage supply circuits is configured such that, in the first operation mode, an absolute value of a threshold voltage of the P-type SOTB transistor in the pair of inverter circuits is equal to that in the pair of inverter circuits. A semiconductor integrated circuit device that supplies the first voltage and the second voltage that are higher than an absolute value of a threshold voltage of an N-type SOTB transistor. The semiconductor integrated circuit device according to claim 1,
The P-type SOTB transistor includes a gate electrode, a source region, a drain region, a channel region between the source region and the drain region, in which a channel is formed, and the channel via an insulating film. The first region is opposed to the first region, and the first voltage is supplied to the first region;
The N-type SOTB transistor includes a gate electrode, a source region, a drain region, a channel region between the source region and the drain region, in which a channel is formed, and the channel through an insulating film. A semiconductor integrated circuit device having a second region facing each other, wherein the second voltage is supplied to the second region.   A wearable device comprising the semiconductor integrated circuit device according to claim 1. A first circuit having a P-type transistor and an N-type transistor;
A mode designating circuit for designating an operating speed of the first circuit;
A second circuit having a P-type SOTB transistor and an N-type SOTB transistor and connected to the first circuit;
A first voltage supply circuit for supplying a first voltage;
A second voltage supply circuit for supplying a second voltage;
A third voltage supply circuit for supplying a third voltage;
A fourth voltage supply circuit for supplying a fourth voltage;
With
When the mode designating circuit designates a first operation mode for operating the first circuit at a first speed, the first voltage supply circuit supplies the first voltage to the substrate of the P-type SOTB transistor, The second voltage supply circuit supplies the second voltage to the substrate of the N-type SOTB transistor, the third voltage supply circuit supplies the third voltage to the substrate of the P-type transistor, and the second voltage supply circuit. The four voltage supply circuit supplies the fourth voltage to the substrate of the N-type transistor, and the mode designating circuit has a second operation mode in which the first circuit is operated at a second speed higher than the first speed. When specifying, the first voltage supply circuit does not supply the first voltage to the substrate of the P-type SOTB transistor, and the second voltage supply circuit supplies the second voltage to the substrate of the N-type SOTB transistor. Without supplying
The third voltage is different from the first voltage, and the fourth voltage is the same as the second voltage,
The second circuit is a static memory having a plurality of memory cells, and each of the plurality of memory cells has a pair of inverter circuits configured by the P-type SOTB transistor and the N-type SOTB transistor. ,
When the absolute value of the threshold voltage of the P-type SOTB transistor in the pair of inverter circuits is equal to the absolute value of the threshold voltage of the N-type SOTB transistor in the pair of inverter circuits, the first And the second voltage supply circuit is configured such that, in the first operation mode, the absolute value of the threshold voltage of the P-type SOTB transistor in the pair of inverter circuits is the N-type SOTB in the pair of inverter circuits. A semiconductor integrated circuit device for supplying the first voltage and the second voltage which are higher than an absolute value of a threshold voltage of a transistor.

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