JP2018035392A5 - - Google Patents
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- JP2018035392A5 JP2018035392A5 JP2016168705A JP2016168705A JP2018035392A5 JP 2018035392 A5 JP2018035392 A5 JP 2018035392A5 JP 2016168705 A JP2016168705 A JP 2016168705A JP 2016168705 A JP2016168705 A JP 2016168705A JP 2018035392 A5 JP2018035392 A5 JP 2018035392A5
- Authority
- JP
- Japan
- Prior art keywords
- flat plate
- cylindrical portion
- planar shape
- plate
- flow path
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 9
- 229910052802 copper Inorganic materials 0.000 claims 9
- 239000010949 copper Substances 0.000 claims 9
- 229910000838 Al alloy Inorganic materials 0.000 claims 8
- 229910000881 Cu alloy Inorganic materials 0.000 claims 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 8
- 229910052782 aluminium Inorganic materials 0.000 claims 8
- 238000004519 manufacturing process Methods 0.000 claims 8
- 238000005304 joining Methods 0.000 claims 6
- 238000003756 stirring Methods 0.000 claims 6
- 238000003466 welding Methods 0.000 claims 6
- 238000000034 method Methods 0.000 claims 2
- 238000005096 rolling process Methods 0.000 claims 2
- 238000004544 sputter deposition Methods 0.000 claims 2
- 239000011247 coating layer Substances 0.000 claims 1
- 230000003628 erosive effect Effects 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000012528 membrane Substances 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 claims 1
- 238000005477 sputtering target Methods 0.000 claims 1
Priority Applications (12)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016168705A JP6795819B2 (ja) | 2016-08-31 | 2016-08-31 | 処理ローラーおよびその製造方法ならびに処理装置 |
| CN201780001627.0A CN107614747B (zh) | 2016-03-30 | 2017-01-25 | 溅射阴极、溅射装置和成膜体的制造方法 |
| CN201910226747.1A CN109881166B (zh) | 2016-03-30 | 2017-01-25 | 溅射阴极、溅射装置和成膜体的制造方法 |
| US15/735,847 US20180171464A1 (en) | 2016-03-30 | 2017-01-25 | Sputtering cathode, sputtering device, and method for producing film-formed body |
| KR1020207009231A KR20200036065A (ko) | 2016-03-30 | 2017-01-25 | 스퍼터링 캐소드, 스퍼터링 장치 및 성막체의 제조 방법 |
| EP17773579.2A EP3438322B1 (en) | 2016-03-30 | 2017-01-25 | Sputtering device, and method for producing film-formed body |
| PCT/JP2017/002463 WO2017169029A1 (ja) | 2016-03-30 | 2017-01-25 | スパッタリングカソード、スパッタリング装置および成膜体の製造方法 |
| KR1020187031762A KR20180121798A (ko) | 2016-03-30 | 2017-01-25 | 스퍼터링 캐소드, 스퍼터링 장치 및 성막체의 제조 방법 |
| KR1020177024162A KR20180032523A (ko) | 2016-03-30 | 2017-01-25 | 스퍼터링 캐소드, 스퍼터링 장치 및 성막체의 제조 방법 |
| US16/297,121 US10692708B2 (en) | 2016-03-30 | 2019-03-08 | Sputtering cathode, sputtering device, and method for producing film-formed body |
| US16/897,762 US20200303173A1 (en) | 2016-03-30 | 2020-06-10 | Heat-transfer roller for sputtering and method of making the same |
| US17/089,100 US20210050196A1 (en) | 2016-03-30 | 2020-11-04 | Heat-Transfer Roller for Sputtering and Method of Making the Same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016168705A JP6795819B2 (ja) | 2016-08-31 | 2016-08-31 | 処理ローラーおよびその製造方法ならびに処理装置 |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018075110A Division JP6360986B2 (ja) | 2018-04-10 | 2018-04-10 | デバイスの製造方法およびフィルムの製造方法 |
| JP2020149559A Division JP6801911B2 (ja) | 2020-09-07 | 2020-09-07 | バッキングプレートおよびその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018035392A JP2018035392A (ja) | 2018-03-08 |
| JP2018035392A5 true JP2018035392A5 (enrdf_load_stackoverflow) | 2019-10-10 |
| JP6795819B2 JP6795819B2 (ja) | 2020-12-02 |
Family
ID=61565452
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016168705A Active JP6795819B2 (ja) | 2016-03-30 | 2016-08-31 | 処理ローラーおよびその製造方法ならびに処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6795819B2 (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019189913A (ja) * | 2018-04-26 | 2019-10-31 | 京浜ラムテック株式会社 | スパッタリングカソード、スパッタリングカソード集合体およびスパッタリング装置 |
| JP7244362B2 (ja) * | 2019-05-28 | 2023-03-22 | 株式会社アルバック | 搬送室 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3672949B2 (ja) * | 1994-10-05 | 2005-07-20 | 三菱伸銅株式会社 | 蒸着装置 |
| JPH1060628A (ja) * | 1996-08-16 | 1998-03-03 | Sony Corp | 材料飛翔装置及び材料飛翔源 |
| JP6252402B2 (ja) * | 2014-08-18 | 2017-12-27 | 住友金属鉱山株式会社 | 加熱ロールおよびそれを備えた成膜装置 |
| JP6417964B2 (ja) * | 2015-01-23 | 2018-11-07 | 住友金属鉱山株式会社 | 積層体基板、配線基板ならびにそれらの製造方法 |
| JP2016144873A (ja) * | 2015-02-06 | 2016-08-12 | 凸版印刷株式会社 | ガスバリア性積層体の製造方法 |
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2016
- 2016-08-31 JP JP2016168705A patent/JP6795819B2/ja active Active