JP2018024948A - 真空蒸着装置 - Google Patents
真空蒸着装置 Download PDFInfo
- Publication number
- JP2018024948A JP2018024948A JP2017219572A JP2017219572A JP2018024948A JP 2018024948 A JP2018024948 A JP 2018024948A JP 2017219572 A JP2017219572 A JP 2017219572A JP 2017219572 A JP2017219572 A JP 2017219572A JP 2018024948 A JP2018024948 A JP 2018024948A
- Authority
- JP
- Japan
- Prior art keywords
- processing furnace
- vapor deposition
- raw material
- vacuum
- workpiece
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007738 vacuum evaporation Methods 0.000 title claims abstract description 17
- 238000007740 vapor deposition Methods 0.000 claims abstract description 102
- 239000002994 raw material Substances 0.000 claims abstract description 90
- 230000008016 vaporization Effects 0.000 claims abstract description 51
- 239000000463 material Substances 0.000 claims abstract description 50
- 238000009834 vaporization Methods 0.000 claims abstract description 41
- 238000001771 vacuum deposition Methods 0.000 claims description 15
- 230000001737 promoting effect Effects 0.000 claims description 12
- 238000000151 deposition Methods 0.000 claims description 11
- 230000008021 deposition Effects 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 239000007787 solid Substances 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 5
- 230000007246 mechanism Effects 0.000 abstract description 54
- 229910001220 stainless steel Inorganic materials 0.000 abstract description 7
- 239000010935 stainless steel Substances 0.000 abstract description 7
- 238000001704 evaporation Methods 0.000 abstract description 4
- 230000008020 evaporation Effects 0.000 abstract description 4
- 239000007789 gas Substances 0.000 description 26
- 238000005019 vapor deposition process Methods 0.000 description 19
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 239000011888 foil Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000008531 maintenance mechanism Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007666 vacuum forming Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
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- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017219572A JP2018024948A (ja) | 2017-11-15 | 2017-11-15 | 真空蒸着装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017219572A JP2018024948A (ja) | 2017-11-15 | 2017-11-15 | 真空蒸着装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014146558A Division JP6252862B2 (ja) | 2014-07-17 | 2014-07-17 | 真空蒸着装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2018024948A true JP2018024948A (ja) | 2018-02-15 |
| JP2018024948A5 JP2018024948A5 (enExample) | 2018-03-29 |
Family
ID=61195186
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017219572A Pending JP2018024948A (ja) | 2017-11-15 | 2017-11-15 | 真空蒸着装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2018024948A (enExample) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01123069A (ja) * | 1987-11-04 | 1989-05-16 | Nippon Kentetsu Co Ltd | 薄膜蒸着装置 |
| JP2010275616A (ja) * | 2009-06-01 | 2010-12-09 | Goto Seiko:Kk | イオンプレーティング装置 |
| US20120160665A1 (en) * | 2009-07-22 | 2012-06-28 | Oerlikon Trading Ag, Trubbach | Method for producing coatings with a single composite target |
| JP2013209698A (ja) * | 2012-03-30 | 2013-10-10 | Hitachi High-Technologies Corp | 蒸着装置 |
-
2017
- 2017-11-15 JP JP2017219572A patent/JP2018024948A/ja active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01123069A (ja) * | 1987-11-04 | 1989-05-16 | Nippon Kentetsu Co Ltd | 薄膜蒸着装置 |
| JP2010275616A (ja) * | 2009-06-01 | 2010-12-09 | Goto Seiko:Kk | イオンプレーティング装置 |
| US20120160665A1 (en) * | 2009-07-22 | 2012-06-28 | Oerlikon Trading Ag, Trubbach | Method for producing coatings with a single composite target |
| JP2013209698A (ja) * | 2012-03-30 | 2013-10-10 | Hitachi High-Technologies Corp | 蒸着装置 |
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