JP2017527780A5 - - Google Patents
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- JP2017527780A5 JP2017527780A5 JP2016575210A JP2016575210A JP2017527780A5 JP 2017527780 A5 JP2017527780 A5 JP 2017527780A5 JP 2016575210 A JP2016575210 A JP 2016575210A JP 2016575210 A JP2016575210 A JP 2016575210A JP 2017527780 A5 JP2017527780 A5 JP 2017527780A5
- Authority
- JP
- Japan
- Prior art keywords
- different
- aperture
- collection
- images
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462017264P | 2014-06-26 | 2014-06-26 | |
| US62/017,264 | 2014-06-26 | ||
| US201562111402P | 2015-02-03 | 2015-02-03 | |
| US62/111,402 | 2015-02-03 | ||
| US14/749,564 US9709510B2 (en) | 2014-06-26 | 2015-06-24 | Determining a configuration for an optical element positioned in a collection aperture during wafer inspection |
| US14/749,564 | 2015-06-24 | ||
| PCT/US2015/038115 WO2015200856A1 (en) | 2014-06-26 | 2015-06-26 | Determining a configuration for an optical element positioned in a collection aperture during wafer inspection |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017527780A JP2017527780A (ja) | 2017-09-21 |
| JP2017527780A5 true JP2017527780A5 (https=) | 2018-07-26 |
| JP6652511B2 JP6652511B2 (ja) | 2020-02-26 |
Family
ID=54930191
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016575210A Active JP6652511B2 (ja) | 2014-06-26 | 2015-06-26 | ウェハ検査中に集光アパーチャ内に位置付けられる光学要素の構成の決定 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US9709510B2 (https=) |
| JP (1) | JP6652511B2 (https=) |
| KR (1) | KR102269512B1 (https=) |
| CN (2) | CN106415249B (https=) |
| IL (1) | IL248647B (https=) |
| WO (1) | WO2015200856A1 (https=) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10062156B2 (en) * | 2016-02-25 | 2018-08-28 | Kla-Tencor Corporation | Method and system for detecting defects on a substrate |
| KR102637273B1 (ko) * | 2016-11-23 | 2024-02-15 | 노바 엘티디. | 마이크로전자 디바이스 내의 패턴화된 구조물의 파라미터를 측정하기 위한 광학 시스템 및 방법 |
| JP7115826B2 (ja) * | 2017-07-18 | 2022-08-09 | 三星電子株式会社 | 撮像装置および撮像方法 |
| US10429315B2 (en) * | 2017-07-18 | 2019-10-01 | Samsung Electronics Co., Ltd. | Imaging apparatus and imaging method |
| CN109425619B (zh) * | 2017-08-31 | 2021-12-28 | 深圳中科飞测科技股份有限公司 | 光学测量系统及方法 |
| CN109425618B (zh) * | 2017-08-31 | 2021-12-28 | 深圳中科飞测科技股份有限公司 | 光学测量系统及方法 |
| US10607119B2 (en) * | 2017-09-06 | 2020-03-31 | Kla-Tencor Corp. | Unified neural network for defect detection and classification |
| JP7208233B2 (ja) * | 2017-11-15 | 2023-01-18 | コーニング インコーポレイテッド | ガラスシートの表面欠陥の検出方法および装置 |
| US11067389B2 (en) | 2018-03-13 | 2021-07-20 | Kla Corporation | Overlay metrology system and method |
| NL2023884A (en) | 2018-10-12 | 2020-05-07 | Asml Netherlands Bv | Detection system for an alignment sensor |
| US11815470B2 (en) | 2019-01-17 | 2023-11-14 | Applied Materials Israel, Ltd. | Multi-perspective wafer analysis |
| US10902582B2 (en) * | 2019-01-17 | 2021-01-26 | Applied Materials Israel, Ltd. | Computerized system and method for obtaining information about a region of an object |
| CN110006684A (zh) * | 2019-03-13 | 2019-07-12 | 广州金域医学检验中心有限公司 | 数字病理切片的生成系统和方法 |
| JP7236170B2 (ja) * | 2019-03-29 | 2023-03-09 | 国立大学法人大阪大学 | 光検出装置、光検出方法、光検出装置の設計方法、試料分類方法、及び、不良検出方法 |
| US11940608B2 (en) * | 2019-05-06 | 2024-03-26 | Asml Netherlands B.V. | Dark field microscope |
| US10921261B2 (en) | 2019-05-09 | 2021-02-16 | Kla Corporation | Strontium tetraborate as optical coating material |
| US11011366B2 (en) | 2019-06-06 | 2021-05-18 | Kla Corporation | Broadband ultraviolet illumination sources |
| US11255797B2 (en) | 2019-07-09 | 2022-02-22 | Kla Corporation | Strontium tetraborate as optical glass material |
| CN114616657A (zh) | 2019-11-04 | 2022-06-10 | 东京毅力科创株式会社 | 用于校准多个晶圆检查系统(wis)模块的系统和方法 |
| US11624607B2 (en) | 2020-01-06 | 2023-04-11 | Tokyo Electron Limited | Hardware improvements and methods for the analysis of a spinning reflective substrates |
| KR102874193B1 (ko) | 2020-03-10 | 2025-10-20 | 도쿄엘렉트론가부시키가이샤 | 트랙 시스템 내로의 통합을 위한 장파 적외선 열 센서 |
| US11738363B2 (en) | 2021-06-07 | 2023-08-29 | Tokyo Electron Limited | Bath systems and methods thereof |
| US12488452B2 (en) | 2021-06-16 | 2025-12-02 | Tokyo Electron Limited | Wafer bath imaging |
| US12072606B2 (en) | 2021-07-30 | 2024-08-27 | Kla Corporation | Protective coating for nonlinear optical crystal |
| KR102695451B1 (ko) * | 2021-12-03 | 2024-08-23 | 참엔지니어링(주) | 하전입자를 이용한 시료 처리 장치 |
| US11899338B2 (en) | 2021-12-11 | 2024-02-13 | Kla Corporation | Deep ultraviolet laser using strontium tetraborate for frequency conversion |
| EP4339703A1 (en) * | 2022-09-13 | 2024-03-20 | ASML Netherlands B.V. | Metrology method and associated metrology device |
| IL317785A (en) * | 2022-09-13 | 2025-02-01 | Asml Netherlands Bv | The metrology method and the associated metrology instrument |
| US20250383294A1 (en) * | 2024-06-18 | 2025-12-18 | Kla Corporation | Speckle noise reduction using pupil masks |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7957066B2 (en) * | 2003-02-21 | 2011-06-07 | Kla-Tencor Corporation | Split field inspection system using small catadioptric objectives |
| US7041998B2 (en) | 2003-03-24 | 2006-05-09 | Photon Dynamics, Inc. | Method and apparatus for high-throughput inspection of large flat patterned media using dynamically programmable optical spatial filtering |
| US20060012781A1 (en) | 2004-07-14 | 2006-01-19 | Negevtech Ltd. | Programmable spatial filter for wafer inspection |
| US20060285110A1 (en) * | 2005-02-25 | 2006-12-21 | Accent Optical Technologies, Inc. | Apparatus and method for enhanced critical dimension scatterometry |
| JP4625716B2 (ja) * | 2005-05-23 | 2011-02-02 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置及び欠陥検査方法 |
| US7345825B2 (en) * | 2005-06-30 | 2008-03-18 | Kla-Tencor Technologies Corporation | Beam delivery system for laser dark-field illumination in a catadioptric optical system |
| US7345754B1 (en) | 2005-09-16 | 2008-03-18 | Kla-Tencor Technologies Corp. | Fourier filters and wafer inspection systems |
| WO2010147846A2 (en) * | 2009-06-19 | 2010-12-23 | Kla-Tencor Technologies Corporation | Inspection systems and methods for detecting defects on extreme ultraviolet mask blanks |
| KR20110055787A (ko) | 2009-11-20 | 2011-05-26 | 재단법인 서울테크노파크 | 레이저를 이용한 접합웨이퍼 검사장치 |
| KR101492205B1 (ko) * | 2010-11-12 | 2015-02-10 | 에이에스엠엘 네델란즈 비.브이. | 메트롤로지 방법 및 장치, 리소그래피 시스템, 및 디바이스 제조 방법 |
| US9223227B2 (en) * | 2011-02-11 | 2015-12-29 | Asml Netherlands B.V. | Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method |
| WO2012126684A1 (en) * | 2011-03-24 | 2012-09-27 | Asml Netherlands B.V. | Substrate and patterning device for use in metrology, metrology method and device manufacturing method |
| US9429743B2 (en) | 2011-10-12 | 2016-08-30 | Ventana Medical Systems, Inc. | Systems and methods of polyfocal hyperspectral imaging having a beam splitter with optical channels respectively corresponding to plural image planes |
| US8614790B2 (en) * | 2011-12-12 | 2013-12-24 | Applied Materials Israel, Ltd. | Optical system and method for inspection of patterned samples |
| JP6345125B2 (ja) * | 2012-03-07 | 2018-06-20 | ケーエルエー−テンカー コーポレイション | ウェハおよびレチクル検査システムならびに照明瞳配置を選択するための方法 |
| KR101761735B1 (ko) * | 2012-03-27 | 2017-07-26 | 에이에스엠엘 네델란즈 비.브이. | 메트롤로지 방법 및 장치, 리소그래피 시스템 및 디바이스 제조 방법 |
| US8896827B2 (en) | 2012-06-26 | 2014-11-25 | Kla-Tencor Corporation | Diode laser based broad band light sources for wafer inspection tools |
| KR101442792B1 (ko) | 2012-08-31 | 2014-09-23 | (주)유텍시스템 | 사파이어 웨이퍼의 검사 방법 |
| US9075027B2 (en) * | 2012-11-21 | 2015-07-07 | Kla-Tencor Corporation | Apparatus and methods for detecting defects in vertical memory |
| US9091650B2 (en) * | 2012-11-27 | 2015-07-28 | Kla-Tencor Corporation | Apodization for pupil imaging scatterometry |
| US9726617B2 (en) * | 2013-06-04 | 2017-08-08 | Kla-Tencor Corporation | Apparatus and methods for finding a best aperture and mode to enhance defect detection |
-
2015
- 2015-06-24 US US14/749,564 patent/US9709510B2/en active Active
- 2015-06-26 CN CN201580029498.7A patent/CN106415249B/zh active Active
- 2015-06-26 WO PCT/US2015/038115 patent/WO2015200856A1/en not_active Ceased
- 2015-06-26 KR KR1020177000065A patent/KR102269512B1/ko active Active
- 2015-06-26 JP JP2016575210A patent/JP6652511B2/ja active Active
- 2015-06-26 CN CN201810473396.XA patent/CN108508028B/zh active Active
-
2016
- 2016-10-31 IL IL248647A patent/IL248647B/en active IP Right Grant
-
2017
- 2017-06-18 US US15/626,123 patent/US10215713B2/en active Active
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