JP2017527107A5 - - Google Patents

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Publication number
JP2017527107A5
JP2017527107A5 JP2017502835A JP2017502835A JP2017527107A5 JP 2017527107 A5 JP2017527107 A5 JP 2017527107A5 JP 2017502835 A JP2017502835 A JP 2017502835A JP 2017502835 A JP2017502835 A JP 2017502835A JP 2017527107 A5 JP2017527107 A5 JP 2017527107A5
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JP
Japan
Prior art keywords
polishing
pressure control
pad
substrate
control pad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2017502835A
Other languages
English (en)
Japanese (ja)
Other versions
JP6778176B2 (ja
JP2017527107A (ja
Filing date
Publication date
Priority claimed from US14/334,948 external-priority patent/US9662762B2/en
Application filed filed Critical
Priority claimed from PCT/US2015/040064 external-priority patent/WO2016010865A1/en
Publication of JP2017527107A publication Critical patent/JP2017527107A/ja
Publication of JP2017527107A5 publication Critical patent/JP2017527107A5/ja
Application granted granted Critical
Publication of JP6778176B2 publication Critical patent/JP6778176B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2017502835A 2014-07-18 2015-07-10 基板の厚さプロファイルの調節 Active JP6778176B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201462026269P 2014-07-18 2014-07-18
US62/026,269 2014-07-18
US14/334,948 2014-07-18
US14/334,948 US9662762B2 (en) 2014-07-18 2014-07-18 Modifying substrate thickness profiles
PCT/US2015/040064 WO2016010865A1 (en) 2014-07-18 2015-07-10 Modifying substrate thickness profiles

Publications (3)

Publication Number Publication Date
JP2017527107A JP2017527107A (ja) 2017-09-14
JP2017527107A5 true JP2017527107A5 (hr) 2018-08-23
JP6778176B2 JP6778176B2 (ja) 2020-10-28

Family

ID=55078939

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017502835A Active JP6778176B2 (ja) 2014-07-18 2015-07-10 基板の厚さプロファイルの調節

Country Status (5)

Country Link
JP (1) JP6778176B2 (hr)
KR (1) KR102376928B1 (hr)
CN (1) CN106463384B (hr)
TW (1) TWI691379B (hr)
WO (1) WO2016010865A1 (hr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102666494B1 (ko) * 2016-03-25 2024-05-17 어플라이드 머티어리얼스, 인코포레이티드 국부 영역 연마 시스템 및 연마 시스템용 연마 패드 조립체들
CN109844923B (zh) * 2016-10-10 2023-07-11 应用材料公司 用于化学机械抛光的实时轮廓控制
SG10202111784SA (en) * 2016-10-18 2021-12-30 Ebara Corp System for controlling a scrubbing process system, method of a controller controlling a scrubbing process, and program
KR102629679B1 (ko) * 2018-11-09 2024-01-29 주식회사 케이씨텍 연마 장치용 캐리어 헤드 및 이에 사용되는 멤브레인
TWI834195B (zh) 2019-04-18 2024-03-01 美商應用材料股份有限公司 Ｃｍｐ期間基於溫度的原位邊緣不對稱校正的電腦可讀取儲存媒體
US11282755B2 (en) * 2019-08-27 2022-03-22 Applied Materials, Inc. Asymmetry correction via oriented wafer loading
TWI797501B (zh) 2019-11-22 2023-04-01 美商應用材料股份有限公司 在拋光墊中使用溝槽的晶圓邊緣不對稱校正
CN111975469A (zh) * 2020-08-28 2020-11-24 上海华力微电子有限公司 化学机械研磨的方法及研磨系统

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06333891A (ja) * 1993-05-24 1994-12-02 Sony Corp 基板研磨装置および基板保持台
US5938504A (en) * 1993-11-16 1999-08-17 Applied Materials, Inc. Substrate polishing apparatus
US5558563A (en) * 1995-02-23 1996-09-24 International Business Machines Corporation Method and apparatus for uniform polishing of a substrate
US6267659B1 (en) * 2000-05-04 2001-07-31 International Business Machines Corporation Stacked polish pad
JP2002246346A (ja) * 2001-02-14 2002-08-30 Hiroshima Nippon Denki Kk 化学機械研磨装置
US20020164926A1 (en) * 2001-05-07 2002-11-07 Simon Mark G. Retainer ring and method for polishing a workpiece
US6863771B2 (en) * 2001-07-25 2005-03-08 Micron Technology, Inc. Differential pressure application apparatus for use in polishing layers of semiconductor device structures and methods
US6764387B1 (en) * 2003-03-07 2004-07-20 Applied Materials Inc. Control of a multi-chamber carrier head
US6913518B2 (en) * 2003-05-06 2005-07-05 Applied Materials, Inc. Profile control platen
TWI275451B (en) * 2005-01-11 2007-03-11 Asia Ic Mic Process Inc Measurement of thickness profile and elastic modulus profile of polishing pad
US7198548B1 (en) * 2005-09-30 2007-04-03 Applied Materials, Inc. Polishing apparatus and method with direct load platen
US8858300B2 (en) * 2010-02-09 2014-10-14 International Business Machines Corporation Applying different pressures through sub-pad to fixed abrasive CMP pad
KR101941586B1 (ko) * 2011-01-03 2019-01-23 어플라이드 머티어리얼스, 인코포레이티드 압력 제어되는 폴리싱 플래튼
JP6282437B2 (ja) * 2012-10-18 2018-02-21 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 研磨パッドコンディショナ用ダンパ
US20140141694A1 (en) * 2012-11-21 2014-05-22 Applied Materials, Inc. In-Sequence Spectrographic Sensor

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