JP2017508612A - 高電圧放電と微細起泡を利用した廃水浄化処理システム - Google Patents
高電圧放電と微細起泡を利用した廃水浄化処理システム Download PDFInfo
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- JP2017508612A JP2017508612A JP2016556781A JP2016556781A JP2017508612A JP 2017508612 A JP2017508612 A JP 2017508612A JP 2016556781 A JP2016556781 A JP 2016556781A JP 2016556781 A JP2016556781 A JP 2016556781A JP 2017508612 A JP2017508612 A JP 2017508612A
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- wastewater
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/24—Treatment of water, waste water, or sewage by flotation
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/4608—Treatment of water, waste water, or sewage by electrochemical methods using electrical discharges
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/74—Treatment of water, waste water, or sewage by oxidation with air
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/14—Paint wastes
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/20—Nature of the water, waste water, sewage or sludge to be treated from animal husbandry
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/26—Nature of the water, waste water, sewage or sludge to be treated from the processing of plants or parts thereof
- C02F2103/28—Nature of the water, waste water, sewage or sludge to be treated from the processing of plants or parts thereof from the paper or cellulose industry
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/32—Nature of the water, waste water, sewage or sludge to be treated from the food or foodstuff industry, e.g. brewery waste waters
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/26—Reducing the size of particles, liquid droplets or bubbles, e.g. by crushing, grinding, spraying, creation of microbubbles or nanobubbles
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Water Supply & Treatment (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Electrochemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Treating Waste Gases (AREA)
- Physical Water Treatments (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
Abstract
Description
支持台270−3は円筒型管270−1とこれを含む高電圧放電器270の各構成要素を支持することになる。また、支持台270−3は高電圧放電がかなう領域と電流と空気を流入される領域を区分する役割をすることができる。このような支持台270−3の材質や形状は特に制限されなくて、例えば、非伝導性物質からなることができる。
10:浄化チャンバー
12:外部空気流入管
14:内部空気流出管
100:第1貯蔵槽
150:第1気泡発生器
152:第1廃水流入管
154:第1廃水流出管
200:第2貯蔵槽
250:第2気泡発生器
252:第2廃水流入管
254:第2廃水流出管
260:高電圧放電装置
262:空気流入管
266:カバー
270:高電圧放電器
270−1:円筒型管
270−3:支持台
270−5:金属網
270−7:外部電極
270−9:内部電極(270−9)
B:微細気泡
c/w:浄水(clean water)
V1、V2、V3、V4:バルブ
w/w:廃水(waste water)
w/w−1:1次浄化廃水
SS:浮遊性汚染物質
Claims (3)
- 廃水を浄化する廃水浄化処理システムであって、
浄化チャンバーと、
前記浄化チャンバー内に位置されて前記浄化チャンバーの外部から流入する廃水が貯蔵されて、前記廃水内に浮遊して存在する浮遊性汚染物質の外面に微細気泡が吸着して前記浮遊性汚染物質が捕集および浮遊されることによって、前記廃水を1次浄化し、前記1次浄化は微細気泡だけで行なう第1浄化槽と、
前記第1浄化槽内に前記1次浄化のための微細気泡がぎっしり埋まれるように、前記第1浄化槽から廃水が流入されて微細気泡とともに前記第1浄化槽へ流出させる第1気泡発生器と、
前記浄化チャンバー内に位置されて、前記第1浄化槽から前記1次浄化された1次浄化廃水が流入されて、高電圧放電および微細気泡を同時に利用して前記1次浄化廃水を2次浄化する第2浄化槽と、
前記第2浄化槽の上部に位置して、前記浄化チャンバー内部の空気が空気流入管を通じて流入されて、前記浄化チャンバー内部の空気を1段階浄化するするとともに、前記第2浄化槽内部の前記1次浄化廃水にオゾンやラジカルイオンを排出する高電圧放電装置と、
前記第2浄化槽の上部で前記高電圧放電装置から排出されるオゾンやラジカルイオンが、前記第2浄化槽の内部に拡散されるようにする微細気泡を発生させるために、前記第2浄化槽から前記1次浄化廃水が流入されて微細気泡とともに前記第2浄化槽へ流出させる第2気泡発生器と、
前記浄化チャンバーから流出される空気を高電圧放電で2段階浄化して外へ排出する高電圧放電空気清浄機と、を含んで、
外部から流入される前記廃水を前記1次浄化および前記2次浄化で浄化し、前記浄化チャンバー内部の空気を前記1段階浄化および前記2段階浄化で浄化する高電圧放電と微細起泡を利用した廃水浄化処理システム。 - 前記第1浄化槽へ流入される廃水は食物廃水と、染色廃水と、畜産廃水と、製紙廃水と、および澱粉廃水中の一つ以上を含むことを特徴とする請求項1に記載の高電圧放電と微細起泡を利用した廃水浄化処理システム。
- 前記第1気泡発生器および前記第2気泡発生器は、一つの微細気泡発生器から微細気泡が供給されることを特徴とする請求項1に記載の高電圧放電と微細起泡を利用した廃水浄化処理システム。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2014-0028481 | 2014-03-11 | ||
KR20140028481A KR101418385B1 (ko) | 2014-03-11 | 2014-03-11 | 고전압 방전과 미세 기포를 이용한 폐수 정화 처리 시스템 |
PCT/KR2014/006875 WO2015137573A1 (ko) | 2014-03-11 | 2014-07-28 | 고전압 방전과 미세 기포를 이용한 폐수 정화 처리 시스템 |
Publications (2)
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JP2017508612A true JP2017508612A (ja) | 2017-03-30 |
JP6178522B2 JP6178522B2 (ja) | 2017-08-09 |
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JP2016556781A Expired - Fee Related JP6178522B2 (ja) | 2014-03-11 | 2014-07-28 | 高電圧放電と微細気泡を利用した廃水浄化処理システム |
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JP (1) | JP6178522B2 (ja) |
KR (1) | KR101418385B1 (ja) |
WO (1) | WO2015137573A1 (ja) |
Cited By (1)
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---|---|---|---|---|
JP2021001414A (ja) * | 2019-06-21 | 2021-01-07 | 栗田工業株式会社 | 抄紙阻害物質回収方法 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6653475B2 (ja) * | 2016-02-17 | 2020-02-26 | パナソニックIpマネジメント株式会社 | 液体処理装置 |
KR101745562B1 (ko) * | 2016-08-29 | 2017-06-12 | 금강환경(주) | 고농도 유기성 폐수의 고도처리공정 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10323674A (ja) * | 1997-05-23 | 1998-12-08 | Kurita Water Ind Ltd | 有機物含有水の処理装置 |
JP2001252665A (ja) * | 2000-03-14 | 2001-09-18 | Mitsubishi Heavy Ind Ltd | 排水処理装置 |
JP2006289236A (ja) * | 2005-04-08 | 2006-10-26 | Sutai Rabo:Kk | プラズマ放電処理水生成装置、並びにプラズマ放電水、植物成長促進液、化粧用水、工業用オゾン洗浄水、医療用オゾン殺菌水及び医療用オゾン治療水 |
JP2007038110A (ja) * | 2005-08-02 | 2007-02-15 | Toshiba Corp | ラジカル処理装置 |
KR100743226B1 (ko) * | 2006-05-19 | 2007-07-27 | 주식회사 에스디알앤디 | 수처리 시스템 |
JP2009160489A (ja) * | 2007-12-28 | 2009-07-23 | Kazuaki Owada | 廃液の浄化装置 |
JP2010012386A (ja) * | 2008-07-02 | 2010-01-21 | Ihi Corp | 排水の処理方法及び装置 |
JP2010117073A (ja) * | 2008-11-12 | 2010-05-27 | Mitsubishi Electric Corp | 浴水汚れ分解装置およびこれを備えた追焚き機能付き給湯機 |
KR101206905B1 (ko) * | 2012-06-28 | 2012-11-30 | 주식회사 동신이엔텍 | 플라즈마 방전 반응 장치와 가압부상조를 이용한 수처리 시스템 |
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KR19980085039A (ko) * | 1997-05-27 | 1998-12-05 | 이대원 | 전자선 및 오존에 의한 폐수처리 방법 및 장치 |
KR20080034217A (ko) * | 2006-07-11 | 2008-04-21 | 주식회사 현진기업 | 광촉매와 자외선 등을 이용한 바이러스 및 세균을 제거하는환경친화용 소독기 |
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2014
- 2014-03-11 KR KR20140028481A patent/KR101418385B1/ko active IP Right Grant
- 2014-07-28 JP JP2016556781A patent/JP6178522B2/ja not_active Expired - Fee Related
- 2014-07-28 WO PCT/KR2014/006875 patent/WO2015137573A1/ko active Application Filing
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10323674A (ja) * | 1997-05-23 | 1998-12-08 | Kurita Water Ind Ltd | 有機物含有水の処理装置 |
JP2001252665A (ja) * | 2000-03-14 | 2001-09-18 | Mitsubishi Heavy Ind Ltd | 排水処理装置 |
JP2006289236A (ja) * | 2005-04-08 | 2006-10-26 | Sutai Rabo:Kk | プラズマ放電処理水生成装置、並びにプラズマ放電水、植物成長促進液、化粧用水、工業用オゾン洗浄水、医療用オゾン殺菌水及び医療用オゾン治療水 |
JP2007038110A (ja) * | 2005-08-02 | 2007-02-15 | Toshiba Corp | ラジカル処理装置 |
KR100743226B1 (ko) * | 2006-05-19 | 2007-07-27 | 주식회사 에스디알앤디 | 수처리 시스템 |
JP2009160489A (ja) * | 2007-12-28 | 2009-07-23 | Kazuaki Owada | 廃液の浄化装置 |
JP2010012386A (ja) * | 2008-07-02 | 2010-01-21 | Ihi Corp | 排水の処理方法及び装置 |
JP2010117073A (ja) * | 2008-11-12 | 2010-05-27 | Mitsubishi Electric Corp | 浴水汚れ分解装置およびこれを備えた追焚き機能付き給湯機 |
KR101206905B1 (ko) * | 2012-06-28 | 2012-11-30 | 주식회사 동신이엔텍 | 플라즈마 방전 반응 장치와 가압부상조를 이용한 수처리 시스템 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021001414A (ja) * | 2019-06-21 | 2021-01-07 | 栗田工業株式会社 | 抄紙阻害物質回収方法 |
JP7293903B2 (ja) | 2019-06-21 | 2023-06-20 | 栗田工業株式会社 | 抄紙阻害物質回収方法 |
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Publication number | Publication date |
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JP6178522B2 (ja) | 2017-08-09 |
KR101418385B1 (ko) | 2014-07-11 |
WO2015137573A1 (ko) | 2015-09-17 |
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