JP2017501951A5 - - Google Patents

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Publication number
JP2017501951A5
JP2017501951A5 JP2016530920A JP2016530920A JP2017501951A5 JP 2017501951 A5 JP2017501951 A5 JP 2017501951A5 JP 2016530920 A JP2016530920 A JP 2016530920A JP 2016530920 A JP2016530920 A JP 2016530920A JP 2017501951 A5 JP2017501951 A5 JP 2017501951A5
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JP
Japan
Prior art keywords
reflection
shape
target
data
target structure
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2016530920A
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English (en)
Japanese (ja)
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JP2017501951A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/US2014/065399 external-priority patent/WO2015077113A1/en
Publication of JP2017501951A publication Critical patent/JP2017501951A/ja
Publication of JP2017501951A5 publication Critical patent/JP2017501951A5/ja
Pending legal-status Critical Current

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JP2016530920A 2013-11-25 2014-11-13 実質的に柱面を成す鏡面反射面の形状を決定するための方法 Pending JP2017501951A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361908277P 2013-11-25 2013-11-25
US61/908,277 2013-11-25
PCT/US2014/065399 WO2015077113A1 (en) 2013-11-25 2014-11-13 Methods for determining a shape of a substantially cylindrical specular reflective surface

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2019171279A Division JP6808002B2 (ja) 2013-11-25 2019-09-20 実質的に柱面を成す鏡面反射面の形状を決定するための方法

Publications (2)

Publication Number Publication Date
JP2017501951A JP2017501951A (ja) 2017-01-19
JP2017501951A5 true JP2017501951A5 (https=) 2017-12-21

Family

ID=53180042

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2016530920A Pending JP2017501951A (ja) 2013-11-25 2014-11-13 実質的に柱面を成す鏡面反射面の形状を決定するための方法
JP2019171279A Active JP6808002B2 (ja) 2013-11-25 2019-09-20 実質的に柱面を成す鏡面反射面の形状を決定するための方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2019171279A Active JP6808002B2 (ja) 2013-11-25 2019-09-20 実質的に柱面を成す鏡面反射面の形状を決定するための方法

Country Status (6)

Country Link
US (1) US9835442B2 (https=)
JP (2) JP2017501951A (https=)
KR (1) KR102216118B1 (https=)
CN (1) CN105764860B (https=)
TW (1) TWI637144B (https=)
WO (1) WO2015077113A1 (https=)

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EP2781296B1 (de) 2013-03-21 2020-10-21 Corning Laser Technologies GmbH Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser
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EP3452418B1 (en) 2016-05-06 2022-03-02 Corning Incorporated Laser cutting and removal of contoured shapes from transparent substrates
US10410883B2 (en) 2016-06-01 2019-09-10 Corning Incorporated Articles and methods of forming vias in substrates
US10794679B2 (en) 2016-06-29 2020-10-06 Corning Incorporated Method and system for measuring geometric parameters of through holes
KR20190035805A (ko) 2016-07-29 2019-04-03 코닝 인코포레이티드 레이저 처리를 위한 장치 및 방법
JP2019532908A (ja) 2016-08-30 2019-11-14 コーニング インコーポレイテッド 強度マッピング光学システムによる材料のレーザー切断
JP6923284B2 (ja) 2016-09-30 2021-08-18 コーニング インコーポレイテッド 非軸対称ビームスポットを用いて透明被加工物をレーザ加工するための装置及び方法
LT3529214T (lt) 2016-10-24 2021-02-25 Corning Incorporated Substrato apdorojimo stotis lakšto formos stiklo substratų lazeriniam mašininiam apdorojimui
US10752534B2 (en) 2016-11-01 2020-08-25 Corning Incorporated Apparatuses and methods for laser processing laminate workpiece stacks
US10688599B2 (en) 2017-02-09 2020-06-23 Corning Incorporated Apparatus and methods for laser processing transparent workpieces using phase shifted focal lines
US10580725B2 (en) 2017-05-25 2020-03-03 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
US11078112B2 (en) 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US10626040B2 (en) 2017-06-15 2020-04-21 Corning Incorporated Articles capable of individual singulation
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US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness

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