JP2017155198A5 - - Google Patents
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- JP2017155198A5 JP2017155198A5 JP2016042674A JP2016042674A JP2017155198A5 JP 2017155198 A5 JP2017155198 A5 JP 2017155198A5 JP 2016042674 A JP2016042674 A JP 2016042674A JP 2016042674 A JP2016042674 A JP 2016042674A JP 2017155198 A5 JP2017155198 A5 JP 2017155198A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016042674A JP6645873B2 (ja) | 2016-03-04 | 2016-03-04 | 研磨用組成物 |
| KR1020187017929A KR20180118603A (ko) | 2016-03-04 | 2017-02-08 | 연마용 조성물 |
| PCT/JP2017/004582 WO2017150114A1 (ja) | 2016-03-04 | 2017-02-08 | 研磨用組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016042674A JP6645873B2 (ja) | 2016-03-04 | 2016-03-04 | 研磨用組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017155198A JP2017155198A (ja) | 2017-09-07 |
| JP2017155198A5 true JP2017155198A5 (th) | 2018-06-14 |
| JP6645873B2 JP6645873B2 (ja) | 2020-02-14 |
Family
ID=59744050
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016042674A Active JP6645873B2 (ja) | 2016-03-04 | 2016-03-04 | 研磨用組成物 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP6645873B2 (th) |
| KR (1) | KR20180118603A (th) |
| WO (1) | WO2017150114A1 (th) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6255471B1 (ja) * | 2016-12-28 | 2017-12-27 | 日揮触媒化成株式会社 | シリカ粒子分散液及びその製造方法 |
| JP7477964B2 (ja) * | 2019-12-13 | 2024-05-02 | インテグリス・インコーポレーテッド | 化学機械研磨組成物及びそれを用いた化学機械研磨方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0655957B2 (ja) * | 1986-02-28 | 1994-07-27 | 徳山曹達株式会社 | 洗浄用組成物 |
| JPS63196697A (ja) * | 1987-02-09 | 1988-08-15 | 花王株式会社 | 液体クレンザ−組成物 |
| JPH0425599A (ja) * | 1990-05-21 | 1992-01-29 | Kao Corp | スコアリングパッド用洗浄剤組成物 |
| JP4318840B2 (ja) * | 2000-06-21 | 2009-08-26 | 花王株式会社 | 硬質表面用防汚剤 |
| JP2002180090A (ja) * | 2000-12-08 | 2002-06-26 | Kao Corp | 洗浄つや出し剤組成物 |
| JP2002190458A (ja) * | 2000-12-21 | 2002-07-05 | Jsr Corp | 化学機械研磨用水系分散体 |
| JP2003147391A (ja) * | 2001-11-16 | 2003-05-21 | Toyo Seikan Kaisha Ltd | 研磨洗浄用エアゾール製品 |
| JP2009263560A (ja) * | 2008-04-28 | 2009-11-12 | Dai Ichi Kogyo Seiyaku Co Ltd | 液体洗浄剤組成物 |
| JP2010129941A (ja) * | 2008-12-01 | 2010-06-10 | Fujifilm Corp | 金属用研磨液、および化学的機械的研磨方法 |
| JP5441578B2 (ja) * | 2009-09-11 | 2014-03-12 | 花王株式会社 | 研磨液組成物 |
| EP2640816A1 (en) * | 2010-11-16 | 2013-09-25 | Dow Global Technologies LLC | Hard surface cleaners comprising low voc, low odor alkanolamines |
| US20130302984A1 (en) * | 2011-01-26 | 2013-11-14 | Fujimi Incorporated | Polishing composition, polishing method using same, and substrate production method |
| JP6125507B2 (ja) * | 2011-09-07 | 2017-05-10 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | グリコシドを含む化学機械研磨（ｃｍｐ）組成物 |
| JP6105916B2 (ja) * | 2012-12-17 | 2017-03-29 | 株式会社フジミインコーポレーテッド | セルロース誘導体組成物、当該セルロース誘導体組成物を用いた研磨用組成物、当該研磨用組成物の製造方法、および当該研磨用組成物を用いた基板の製造方法 |
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2016
- 2016-03-04 JP JP2016042674A patent/JP6645873B2/ja active Active
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2017
- 2017-02-08 KR KR1020187017929A patent/KR20180118603A/ko not_active Application Discontinuation
- 2017-02-08 WO PCT/JP2017/004582 patent/WO2017150114A1/ja active Application Filing