JP2017143261A5 - - Google Patents

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JP2017143261A5
JP2017143261A5 JP2017020050A JP2017020050A JP2017143261A5 JP 2017143261 A5 JP2017143261 A5 JP 2017143261A5 JP 2017020050 A JP2017020050 A JP 2017020050A JP 2017020050 A JP2017020050 A JP 2017020050A JP 2017143261 A5 JP2017143261 A5 JP 2017143261A5
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etching
profile
model
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independent input
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JP6899659B2 (ja
JP2017143261A (ja
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JP2017020050A 2016-02-08 2017-02-07 反射スペクトルマッチングおよび表面動力学モデル最適化によるエッチングプロファイル最適化のための方法および装置 Active JP6899659B2 (ja)

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Application Number Priority Date Filing Date Title
US15/018,708 2016-02-08
US15/018,708 US9792393B2 (en) 2016-02-08 2016-02-08 Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization

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JP2017143261A JP2017143261A (ja) 2017-08-17
JP2017143261A5 true JP2017143261A5 (enExample) 2020-03-19
JP6899659B2 JP6899659B2 (ja) 2021-07-07

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JP2017020050A Active JP6899659B2 (ja) 2016-02-08 2017-02-07 反射スペクトルマッチングおよび表面動力学モデル最適化によるエッチングプロファイル最適化のための方法および装置

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US (3) US9792393B2 (enExample)
JP (1) JP6899659B2 (enExample)
KR (1) KR102765386B1 (enExample)
CN (2) CN107330132B (enExample)
TW (1) TWI706120B (enExample)

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