JP2017139453A5 - - Google Patents

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Publication number
JP2017139453A5
JP2017139453A5 JP2016242693A JP2016242693A JP2017139453A5 JP 2017139453 A5 JP2017139453 A5 JP 2017139453A5 JP 2016242693 A JP2016242693 A JP 2016242693A JP 2016242693 A JP2016242693 A JP 2016242693A JP 2017139453 A5 JP2017139453 A5 JP 2017139453A5
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Japan
Prior art keywords
gutter
substrate
processing apparatus
substrate processing
ceiling
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JP2016242693A
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Japanese (ja)
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JP6904694B2 (en
JP2017139453A (en
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Priority to CN201710059370.6A priority Critical patent/CN107024790B/en
Publication of JP2017139453A publication Critical patent/JP2017139453A/en
Publication of JP2017139453A5 publication Critical patent/JP2017139453A5/ja
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Publication of JP6904694B2 publication Critical patent/JP6904694B2/en
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Claims (11)

天井を有する処理室と、
前記処理室内に設けられ、前記天井から落下した液滴を受ける樋と、
を備え、
前記天井は、山部と谷部を有する形状に形成されており、
前記天井の谷部は、一方向に延びており、
前記樋は、前記谷部の延伸方向に沿って延びるように設けられていることを特徴とする基板処理装置。
A processing room with a ceiling and
A gutter provided in the processing chamber to receive the droplets dropped from the ceiling,
With
The ceiling is formed in a shape having peaks and valleys.
The valley of the ceiling extends in one direction and
A substrate processing apparatus characterized in that the gutter is provided so as to extend along the extending direction of the valley portion.
前記樋は、複数の樋により構成されており、
前記複数の樋は、瓦状に積み重ねられて傾斜し、傾斜方向に隣接する二つの樋のうち、高い位置の樋における低い側の端部が低い位置の樋における高い側の端部を非接触で覆うように設けられていることを特徴とする請求項1に記載の基板処理装置。
The gutter is composed of a plurality of gutters.
The plurality of gutters are stacked in a tile shape and inclined, and of the two gutters adjacent to each other in the inclined direction, the lower end of the gutter at the higher position does not contact the higher end of the gutter at the lower position. The substrate processing apparatus according to claim 1, wherein the substrate processing apparatus is provided so as to cover with.
前記処理室内に、基板を搬送する基板搬送部を有し、
前記樋は、長手方向を前記基板の搬送方向に沿って、かつ搬送方向下流側に向かって徐々に低くなるように傾斜して設けられることを特徴とする請求項1または2に記載の基板処理装置。
The processing chamber has a substrate transfer unit for transporting the substrate.
The substrate treatment according to claim 1 or 2, wherein the gutter is provided so as to be inclined in the longitudinal direction along the conveying direction of the substrate and gradually lower toward the downstream side in the conveying direction. apparatus.
前記樋の両面には、濡れ性を向上させる膜が形成されていることを特徴とする請求項1乃至3のいずれかに記載の基板処理装置。 The substrate processing apparatus according to any one of claims 1 to 3, wherein a film for improving wettability is formed on both sides of the gutter. 前記複数の樋は、同じ傾斜角度で傾斜して互いに平行に配置されることを特徴とする請求項に記載の基板処理装置。 The substrate processing apparatus according to claim 2 , wherein the plurality of gutters are inclined at the same inclination angle and arranged in parallel with each other. 前記高い位置の樋における低い側の端部と前記低い位置の樋における高い側の端部との鉛直離間距離は、前記傾斜方向に沿って徐々に短くなっていることを特徴とする請求項に記載の基板処理装置。 2. Claim 2 characterized in that the vertical separation distance between the lower end of the high-position gutter and the high-side end of the low-position gutter is gradually shortened along the inclination direction. The substrate processing apparatus according to. 前記低い位置の樋における高い側の端部は、高い位置の樋における低い側の端部に平行な第1の部分と、前記高い位置の樋から離れる方向に延びる第2の部分とからなることを特徴とする請求項に記載の基板処理装置。 The high end of the low gutter comprises a first portion parallel to the low end of the high gutter and a second portion extending away from the high gutter. 2. The substrate processing apparatus according to claim 2 . 前記樋の延伸方向と交わる方向に延伸して設けられる回収樋をさらに有し、
前記回収樋は、前記樋からの前記処理液を受けられる位置に設けられることを特徴とする請求項1乃至7のいずれかに記載の基板処理装置。
Further having a recovery gutter provided by stretching in a direction intersecting the stretching direction of the gutter.
The collection trough, the substrate processing apparatus according to any one of claims 1 to 7, characterized in that provided at a position which is subjected to the processing liquid from the trough.
前記処理室には、前記処理室内の空気を排出する排気部が設けられていることを特徴とする請求項1乃至8のいずれかに記載の基板処理装置。 The substrate processing apparatus according to any one of claims 1 to 8 , wherein the processing chamber is provided with an exhaust unit for discharging air in the processing chamber. 前記処理室内に、基板を搬送する基板搬送部を有し、
前記樋は、前記基板の搬送方向に沿って設けられ、
前記樋からの前記処理液を受ける位置には、前記樋の延伸方向と交わる方向に延伸する回収樋が設けられることを特徴とする請求項に記載の基板処理装置。
The processing chamber has a substrate transfer unit for transporting the substrate.
The gutter is provided along the transport direction of the substrate, and is provided.
A position for receiving the processing liquid from the trough, the substrate processing apparatus according to claim 1, characterized in that the recovery gutter extending in a direction intersecting the extending direction of the gutter is provided.
前記処理室内に、基板を搬送する基板搬送部を有し、The processing chamber has a substrate transfer unit for transporting the substrate.
前記天井は、前記基板の搬送方向に延びる複数の山部と、隣接する前記山部間にあって前記基板搬送部による前記基板の搬送路の上方に位置する谷部と、を有する形状に形成されていることを特徴とする請求項1に記載の基板処理装置。The ceiling is formed in a shape having a plurality of peaks extending in the transport direction of the substrate and valleys between the adjacent peaks and located above the transport path of the substrate by the substrate transport portion. The substrate processing apparatus according to claim 1, wherein the substrate processing apparatus is provided.
JP2016242693A 2016-01-29 2016-12-14 Board processing equipment Active JP6904694B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710059370.6A CN107024790B (en) 2016-01-29 2017-01-24 Substrate processing apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016016604 2016-01-29
JP2016016604 2016-01-29

Publications (3)

Publication Number Publication Date
JP2017139453A JP2017139453A (en) 2017-08-10
JP2017139453A5 true JP2017139453A5 (en) 2020-09-17
JP6904694B2 JP6904694B2 (en) 2021-07-21

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ID=59565124

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016242693A Active JP6904694B2 (en) 2016-01-29 2016-12-14 Board processing equipment

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JP (1) JP6904694B2 (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57190036U (en) * 1981-05-28 1982-12-02
JPS5971819U (en) * 1982-11-04 1984-05-16 タキロン株式会社 Roofing material for daylighting
JP2582989Y2 (en) * 1992-06-25 1998-10-15 松下電工株式会社 Closing structure of roof valley
JP2565625Y2 (en) * 1992-09-07 1998-03-18 大日本スクリーン製造株式会社 Substrate processing equipment
JP4495618B2 (en) * 2004-03-29 2010-07-07 芝浦メカトロニクス株式会社 Substrate processing apparatus and processing method

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