JP2017080647A - Treatment equipment - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide treatment equipment in which a mechanism capable of stopping and accurately positioning a rack holding a workpiece when storing the rack into a treatment tank can be achieved with a simple structure and can be stably used over a long period.SOLUTION: Treatment equipment 1 includes a treatment tank 110 which stores a rack 2 holding a workpiece and executes a predetermined treatment process. The treatment tank 110 includes: an entrance port 112 for making the rack 2 enter in a predetermined direction; an exit port 122 for making the rack exit; a stopper 162 which is provided more inside the entrance port 112, and in which the rear-side frame 204 of the rack 2 comes in contact with a predetermined part 162a to stop entering of the rack 2; and a release part 166 for releasing the contact by moving the predetermined part 162a of the stopper 162 downward from the rear-side frame 204. The rack 2 has a notch 206a for avoiding contact with the stopper 162 at a position on the same line in an advance direction with respect to a contact position of the rear-side frame 204 with the stopper 162 in the front-side frame 206.SELECTED DRAWING: Figure 6

Description

  The present invention relates to a processing apparatus, and more particularly to a processing apparatus that stores a work held in a rack in a processing tank and performs a predetermined processing step such as a cleaning process or a sterilization process.

  As an example, Japanese Patent Laying-Open No. 2015-24383 (Patent Document 1) discloses that a work placed in a basket is transported using a carriage while being held in a rack, and is accommodated in a processing tank (cleaning tank). Thus, a processing apparatus (cleaning apparatus) that performs the cleaning process on the workpiece is disclosed (particularly, refer to FIG. 2 of the same document).

  As another example, Japanese Patent Application Laid-Open No. 11-4876 (Patent Document 2) discloses that a work is conveyed in a state of being held in a rack with wheels (that is, a cart) and placed in a processing tank (sterilization tank). A processing apparatus (sterilization apparatus) that accommodates and sterilizes the workpiece is disclosed (particularly, see FIGS. 9 and 10 in the same document).

Japanese Patent Laying-Open No. 2015-24383 JP-A-11-4876

  Here, as a result of earnest studies on the processing apparatuses such as the cleaning apparatus and the sterilization apparatus exemplified in Patent Documents 1 and 2, the present inventors have obtained various findings. For example, with respect to the cleaning apparatus, when the rack holding the workpiece is accommodated in the processing tank, it is preferable that the processing tank is provided with an entrance and an exit separately to advance the rack in one direction. . According to this, it is possible to separate a so-called contaminated side in front of the entrance and a so-called non-contaminated side in front of the entrance, so that the workpiece after cleaning does not advance to the contaminated side. Therefore, there is no risk of recontamination of the workpiece, and it is possible to maintain a high degree of cleaning. The same applies to the sterilizer.

  However, as shown in Patent Documents 1 and 2, etc., a rack used in a processing apparatus such as a cleaning apparatus or a sterilization apparatus is provided with a plurality of shelves to hold more workpieces in order to increase processing efficiency. Is possible. Conventionally, when the processing is performed by moving the rack in one direction as described above, the cleaning nozzle, the sterilization nozzle, and the disinfection nozzle are disposed inside the processing tank so that the rack can pass through the processing tank. It had to be installed on any of the upper surface, the lower surface, and the side surface. Therefore, the problem which the washability, sterilization, and disinfection of the shelf of a middle stage fell especially with respect to the rack which has a shelf of several steps has arisen.

  In contrast, the inventors of the present application have a rack frame with a hollow structure, and supply cleaning liquid, sterilizing liquid, sterilizing gas, disinfecting liquid, disinfecting gas, etc. into the frame, and distribute them to the frame. Research was conducted on means for solving the problem by using a configuration in which the nozzles are ejected toward the work held on each shelf of the rack.

  When it is going to employ | adopt the said structure, the point of how to position correctly the supply part provided in a processing tank, and the inlet provided in a rack becomes a subject. In addition, how to realize a simple and stable configuration over a long period of time in an environment exposed to cleaning liquid, sterilizing liquid, sterilizing gas, disinfecting liquid, and disinfecting gas. The point is also an issue.

  The present invention has been made in view of the above problems, and realizes a mechanism that enables the rack to stop and be accurately positioned when a rack that holds a workpiece is accommodated in a processing tank with a simple structure. And it aims at providing the processing apparatus which enabled it to use stably over a long period of time.

  As an embodiment, the above-described problem is solved by a solution as disclosed below.

  The disclosed processing apparatus is a processing apparatus that includes a rack that holds a work and a processing tank that stores the rack, and that performs a predetermined processing process on the work that is held in the rack stored in the processing tank. The treatment tank includes an advancement entrance for causing the rack to enter in a predetermined direction, an advancement exit for advancement, and a rear frame of the rack and a predetermined portion in an inward position of the advancement entrance so that the rack enters. And a release portion that releases the abutment by moving the predetermined portion of the stopper below the rear frame, and the rack includes the rear frame in the front frame. And a notch for avoiding contact with the stopper at a position on the same line in the advancing direction with respect to the contact position with the stopper.

  According to the present invention, it is possible to stop and advance and accurately position a rack entering the processing tank with a very simple configuration. In addition, there is no risk of failure because it does not use an electric motor or hydraulic / pneumatic mechanism. In addition, it has high corrosion resistance and can prevent deterioration, so it can be used stably over a long period of time. Is possible.

It is the schematic which shows the example of the processing apparatus which concerns on embodiment of this invention. It is the schematic which shows the example of the processing apparatus shown in FIG. 1 (a rack is not shown). It is the schematic which shows the example of the rack of the processing apparatus shown in FIG. It is the schematic which shows the other example of the rack of the processing apparatus shown in FIG. It is the V section enlarged view of FIG. It is operation | movement explanatory drawing of the processing apparatus shown in FIG. It is operation | movement explanatory drawing of the processing apparatus shown in FIG. It is the schematic which shows the example of the trolley which carries in / out to the processing apparatus shown in FIG. FIG. 7 is a side view of FIG. 6B (rack is not shown). FIG. 10 is a sectional view taken along line XX in FIG. 9. It is the XI section enlarged view of FIG. It is operation | movement explanatory drawing of the processing apparatus shown in FIG.

  In the present embodiment, a “processing apparatus” will be described as an example of a cleaning apparatus that accommodates a workpiece in a processing tank while being held in a rack and performs a cleaning process on the workpiece. For example, when the cleaning device is used in the medical field, it is possible to clean a surgical knife or scissors as a work (object to be cleaned).

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
FIG. 1 is a perspective view of a processing apparatus (cleaning apparatus) 1 according to this embodiment. On the other hand, FIG. 2 is a perspective view in which the rack 2 is not shown in the processing apparatus 1 shown in FIG. FIG. 3 shows an enlarged view (perspective view) of the rack 2.
Note that components having the same function are denoted by the same reference symbols throughout the drawings for describing the embodiments, and the repetitive description thereof may be omitted. In addition, the number of components (including the number, numerical value, quantity, range, etc.) is limited to the specific number, unless otherwise specified or clearly limited to a specific number in principle. It may be more than a specific number or less. In addition, when referring to the shape of a component, etc., it is intended to include those that are substantially similar or similar to the shape, etc., unless explicitly stated or in principle otherwise considered otherwise .

  The processing apparatus 1 includes a rack 2 that holds a work (not shown), and a processing tank (here, a cleaning tank) 110 that accommodates the rack 2 and performs a predetermined processing process (here, a cleaning process). ing. As an example, the treatment tank 110 has an entrance 112 for entering the rack 2 traveling in a predetermined direction and an exit 122 for advancing the two opposite surfaces of the apparatus (here, the entrance side panel 114 and the advancing side panel). 124) (see FIG. 9). Further, in order to perform the cleaning process of the workpiece in the processing tank 110, a shutter 102 and a shutter 104 capable of sealing the processing tank 110 by raising and lowering are provided at the entrance 112 and the exit 122, respectively. Since the rack 2 is configured to be able to enter and advance into the processing tank 110, it is possible to easily place the workpiece before cleaning and take out the workpiece after cleaning.

  Further, the processing apparatus 1 is provided with a mechanism for cleaning the work held by the rack 2 in the processing tank 110. More specifically, a lower nozzle 132 is provided at a lower position in the processing tank 110, and an upper nozzle 142 is provided at an upper position facing this in the vertical direction.

  Further, the processing apparatus 1 is provided outside the processing tank 110 in communication with the lower nozzle 132 and the upper nozzle 142, and includes a liquid feeding mechanism (all not shown) including a pump, a pipe, and the like that send out the cleaning liquid. Accordingly, the lower nozzle 132 and the upper nozzle 142 can receive the supply of the cleaning liquid from the liquid feeding mechanism and discharge the cleaning liquid. Here, the processing apparatus 1 includes a processing unit (control unit) 134 that executes a plurality of processes provided outside the processing tank 110. The processing unit 134 is, for example, a unit on which a CPU is mounted, and controls the amount of cleaning liquid delivered by the liquid feeding mechanism with respect to execution of processing for discharging the cleaning liquid from the lower nozzle 132 and the upper nozzle 142.

  In the processing tank 110, the rack 2 is arranged between the lower nozzle 132 and the upper nozzle 142. The lower nozzle 132 and the upper nozzle 142 are, for example, rod-shaped rotary nozzles that rotate by the discharge flow of the cleaning liquid to be discharged, and are respectively supplied with liquid supply mechanisms via communication pipes 136 and 146 that extend in the horizontal direction in the processing tank 110. Communicated with. As the operation of each nozzle, the lower nozzle 132 has a discharge port 132a that opens upward (that is, the rack 2), and discharges (injects) the cleaning liquid from the discharge port 132a while rotating. The upper nozzle 142 has a discharge port (not shown) that opens downward (that is, the rack 2), and discharges (injects) the cleaning liquid from the discharge port while rotating.

  Here, as the cleaning liquid delivered from the liquid feeding mechanism, water including a detergent (hereinafter, “water” includes “warm water”) or water not including the detergent is used. Furthermore, liquids other than water may be used depending on the type of workpiece and the type of dirt attached to the workpiece.

  In addition, in order to dry a workpiece | work, the processing apparatus 1 is good also as a structure which provides the heating air supply part which supplies heated air in the processing tank 110, and the exhaust circuit part which discharges the air in the processing tank 110 ( Neither is shown).

  On the other hand, the rack 2 has a square columnar skeleton structure. More specifically, first, the rear side frame 204 and the front side frame 206 are connected by a pair of opposing side frames 208 and 208 to form a rectangular base frame 210 that forms a base. Further, at the corner portion of the base frame 210, four pillar portions 224a, 224b, 224c, 224d are erected in the vertical direction.

  Here, the base frame 210 is formed using a solid material made of a stainless alloy or the like in order to maintain the strength to support heavy objects. On the other hand, the four pillar portions 224a, 224b, 224c, and 224d are formed using a hollow material made of a stainless alloy or the like so that the cleaning liquid can flow therethrough.

  Therefore, the column part 224a and the column part 224b are connected using a hollow upper bar 228 so that the flow path communicates, and the column part 224c and the column part 224d are hollow upper parts so that the flow path communicates with each other. They are connected using a bar 228.

  On the other hand, a hollow side bar 230 and a solid or hollow side bar 232 are appropriately used for the connection between the column part 224a and the column part 224c and the connection between the column part 224b and the column part 224d. The side bars 230 and 232 are provided at predetermined intervals in the vertical direction, and serve as support parts for providing later-described shelves (for example, shelves opened in a lattice shape).

  For example, the side bars 230 and 232 are provided in three at each of the left and right positions, and three-stage shelves 236a, 236b, and 236c are provided in parallel to each other (see FIG. 1, but in FIG. For the sake of simplicity, the shelf portions 236b and 236c are not shown). Accordingly, the rack 2 including four shelves is configured together with the shelves 234 supported by the base frame 210. However, the number of shelves (number of installations) is not particularly limited, and may be set as appropriate.

  The rack 2 is provided with a central nozzle 242 and an auxiliary nozzle 246. The center nozzle 242 is provided in each of the shelves 236a, 236b, and 236c so as to be rotatable by a rotation shaft 240 at the geometric center of the shelves 236a, 236b, and 236c in plan view. The central nozzle 242 is a shower nozzle that has a first discharge port 244 that opens in a direction from the lower side to the upper side of the shelf portions 236a, 236b, and 236c, and discharges the cleaning liquid from the first discharge port 244 while rotating. is there.

  On the other hand, the auxiliary nozzle 246 is fixed to the side bar 230. The auxiliary nozzle 246 discharges the cleaning liquid from the second discharge port 248 that opens toward the four corner areas of the shelves 234, 236 a, 236 b, and 236 c, which are areas where the cleaning liquid discharged from the central nozzle 242 is difficult to reach. It is a shower nozzle.

  Thus, in addition to the lower nozzle 132 and the upper nozzle 142 provided in the processing tank 110, according to the configuration in which the central nozzle 242 and the auxiliary nozzle 246 are provided in an arrangement corresponding to each shelf in the rack 2, a plurality of stages are provided. Even in the case of the rack 2 having the shelves, it is possible to keep the washability of the shelves uniform, particularly without deteriorating the washability and sterility of the middle shelf. Furthermore, it is possible to simply realize a configuration in which processing is performed by moving the rack 2 in one direction in the processing tank 110. As a reason for this, if the rack 2 is not provided with the central nozzle 242 and the auxiliary nozzle 246, in order to ensure high cleanability, the rack part (especially the middle shelf) is moved forward and backward. This is because a movable nozzle installed in the processing tank 110 is required to be movable, and the mechanism becomes complicated.

  In particular, by providing the auxiliary nozzle 246, it becomes possible to spray the cleaning liquid even to the area where the shower of the cleaning liquid by the central nozzle 242 is difficult or impossible to reach, so that the cleaning effect can be improved.

  Next, another example (modification) of the rack 2 is shown in FIG. 4, and an enlarged view of the V portion is shown in FIG. Although the basic configuration is the same as the above example, in this modification, the auxiliary nozzle 246 is arranged in the column portions 224a, 224b, 224c, and 224d.

  For example, a plurality of auxiliary nozzles 246 are arranged on each of the column portions 224a, 224b, 224c, and 224d so that the cleaning liquid is discharged to each of the four planar corner portions of the shelves 234, 236a, 236b, and 236c. This is a shower nozzle. The image of the shower region of the cleaning liquid by the auxiliary nozzle 246 is indicated by a broken line in FIGS.

  According to this configuration, since the blind spot area (planar corner) not included in the cleaning liquid shower area by the central nozzle 242 can be supplemented by the cleaning liquid shower area by the auxiliary nozzle 246, the shelves 234, 236a. Even if workpieces are loaded on the entire planes 236b and 236c, the workpieces can be washed uniformly, and the cleaning effect can be improved.

  The workpiece to be processed (cleaned) may be placed directly on the shelves 234, 236a, 236b, 236c, or may be placed in a storage container 200 (see FIGS. 4 and 5) such as a basket of mesh material. It may be placed after being accommodated once.

Here, a mechanism for supplying the cleaning liquid to the rack 2 will be described.
First, a first circuit unit 250 provided in the rack 2 in communication with the central nozzle 242 is provided. The first circuit unit 250 includes a first injection part 252 into which a cleaning liquid is injected, and the cleaning liquid flows from the first injection part 252 to the central nozzle 242. Here, each of the first circuit portions 250 includes a tubular first tube portion 254 and a second tube portion 256. The first pipe portion 254 is erected vertically from the center position of the side frame 208. The second pipe portion 256 communicates with the first pipe portion 254 and is disposed orthogonal to the first pipe portion 254. Accordingly, the cleaning liquid injected into the first injection unit 252 can be sent to the central nozzle 242 and discharged from the first discharge port 244 (spouted in a shower shape).

  In addition, a second circuit portion 260 provided in the rack 2 in communication with the auxiliary nozzle 246 is provided. The second circuit unit 260 includes a second injection unit 262 into which the cleaning liquid is injected, and the cleaning liquid flows from the second injection unit 262 to the auxiliary nozzle 246. Here, the second circuit portion 260 includes tubular column portions 224a, 224b, 224c, and 224d, a tubular upper bar 228, and a tubular side bar 230. As a result, the cleaning liquid injected into the second injection part 262 can be sent to the auxiliary nozzle 246 and discharged from the second discharge port 248 (spouted like a shower). When the auxiliary nozzle 246 is disposed in the column portions 224a, 224b, 224c, and 224d as in the above-described modification, the side bar 230 communicates with the column portions 224a, 224b, 224c, and 224d. It may not be a tubular structure.

  On the other hand, the processing tank 110 of the processing apparatus 1 is provided with a first supply unit 150 that supplies the cleaning liquid to the first injection unit 252 of the rack 2. The first supply unit 150 is disposed so as to communicate with the first injection unit 252, and thereby the cleaning liquid is supplied to the first circuit unit 250. Specifically, the first supply unit 150 is a hollow expansion body made of a rubber member or the like, and is configured to communicate with the first injection unit 252 so that no gap is generated when the first supply unit 150 is expanded by the inflow of the cleaning liquid. I have.

  The processing tank 110 of the processing apparatus 1 is provided with a second supply unit 152 that supplies the cleaning liquid to the second injection unit 262 of the rack 2. The second supply unit 152 is disposed so as to communicate with the second injection unit 262, whereby the cleaning liquid is supplied to the second circuit unit 260. Specifically, the second supply unit 152 is a hollow expansion body made of a rubber member or the like, and is configured to communicate with the second injection unit 262 so that no gap is generated when the second supply unit 152 is expanded by the inflow of the cleaning liquid. I have.

  Furthermore, the processing apparatus 1 is provided with a pump, piping, and the like (all not shown) for sending the cleaning liquid to the first supply unit 150 and the second supply unit 152. Is controlled.

  Therefore, in a state where the cleaning liquid is not discharged, the connection between the first injection unit 252 and the first supply unit 150 and the connection between the second injection unit 262 and the second supply unit 152 are both loosened (a gap is generated). Therefore, it becomes easy to attach and detach the rack 2 from the processing tank 110. On the other hand, in the state where the cleaning liquid is discharged, the connection between the first injection unit 252 and the first supply unit 150 and the connection between the second injection unit 262 and the second supply unit 152 are performed without a gap, and thus the sealing performance is improved. In the rack 2 configured to be detachable from the processing tank 110, liquid leakage from the connecting portion can be prevented.

  The first circuit unit 250 and the second circuit unit 260 may be independent circuits or may be circuits that communicate with each other.

  According to the above configuration, the cleaning liquid is supplied from the processing tank 110 (specifically, the first supply unit 150 and the second supply unit 152) to the first circuit unit 250 and the second circuit unit 260 provided in the rack 2. be able to. Further, since the rack 2 can be attached to and detached from the processing tank 110, for example, the work is loaded on the shelves 234, 236a, 236b, and 236c in a state where the rack 2 is taken out (separated) from the processing tank 110. Becomes easy.

  Subsequently, when the rack 2 holding the workpiece is accommodated in the processing tank 110 of the processing apparatus 1, a procedure for stopping the progress of the rack 2 and positioning the rack 2 at a predetermined position, and a characteristic mechanism therefor Will be described in detail. In order to reliably perform the above-described operation, when the rack 2 is accommodated in the processing tank 110 of the processing apparatus 1, the rack 2 needs to enter the entrance 112 in a predetermined direction. Specifically, the direction of entry from the front frame 206 side is predetermined.

  As an example, as shown in FIG. 6A, the rack 2 holding a work (not shown) is placed on a carriage 3 having casters 302 and conveyed to the processing apparatus 1. Here, FIG. 8 shows a configuration example of the carriage 3 (FIG. 8A is a top perspective view, and FIG. 8B is a bottom perspective view). As a modified example, a configuration may be adopted in which the sheet is conveyed by a conveying means such as a belt conveyor instead of the carriage (not shown).

  Next, as shown in FIG. 6B, the processing apparatus 1 and the carriage 3 are connected at a predetermined position. In the subsequent process, the rack 2 placed on the carriage 3 is caused to enter the processing tank 110 from the entrance 112 of the processing apparatus 1. For this purpose, it is important that the connecting position between the processing apparatus 1 and the carriage 3 is accurately positioned so that there is no left-right shift and inclination, particularly with respect to the traveling direction in which the rack 2 is advanced. This is because it is impossible to allow the rack 2 to enter the processing tank 110 when they occur.

  In this embodiment, as shown in FIG. 1, FIG. 2, FIG. 9 (side view of FIG. 6B (rack 2 is not shown)) and FIG. 10 (cross-sectional view taken along line XX in FIG. 9) In the processing apparatus 1, a trapezoidal guide part 116 is provided at a predetermined position (for example, a position below the entrance 112) of the entry side panel 114, and at the same height in the cart 3 with respect to the guide part 116 in a side view. Two rollers 304 having a vertical rotation axis are provided at positions that sandwich the outer side surface of each guide portion 116 in plan view. According to this, the roller 304 of the cart 3 is guided by the guide portion 116 of the processing device 1 only by bringing the cart 3 close to the processing device 1 in the approximate left-right direction, and finally, When the front part of the carriage 3 comes into contact with the end surface of the guide part 116 (or when the roller 304 reaches (contacts) the entry side panel 114), the left and right sides of the carriage 3 with respect to the processing apparatus 1 The effect that the positioning in the direction is reliably performed can be obtained.

  Further, when the positioning is performed, the lock portion 306 of the carriage is configured to be able to be engaged with the lock groove 118 of the processing apparatus 1. Accordingly, since the carriage 3 can be fixed to the processing apparatus 1 (entrance side panel 114) without any gap, when the rack 2 on the carriage 3 enters the processing tank 110, the carriage 3 It is possible to prevent an accident that the rack 2 falls due to the movement of the rack.

  In addition, in this embodiment, the structure for connecting the trolley | bogie 3 provided in said entrance 112 side is similarly provided in the exit 122 side (not shown). As a result, the same effect as described above can be obtained for the cart connected to the outlet 122 side of the processing apparatus 1 and carrying out the rack 2.

  Next, the rack 2 placed on the carriage 3 is caused to enter the processing tank 110 from the entrance 112 of the processing apparatus 1. FIG. 7A is a diagram of a state in which the rack 2 has entered the processing apparatus 1 (a state in which the carriage 3 is disconnected).

  As described above, the procedure for causing the rack 2 to enter the processing apparatus 1 is based on the premise that the processing apparatus 1 and the carriage 3 are connected at a predetermined position. In this state, the operator holds the handle 202 of the rack 2 and pushes it into the processing tank 110 while releasing the fixing bar 308 that fixes the rack 2 to the carriage 3. It is possible to enter the processing apparatus 1. At this time, as a mechanism for supporting and moving the rack 2, a rotatable roller 310 is provided on the left and right sides of the carriage 3, and a rotatable roller 120 is provided on the left and right sides of the treatment tank 110. When connected at a predetermined position, they are arranged so as to form a straight line with each other on the left and right sides. According to this, the pair of left and right side frames 208 constituting the base frame 210 of the rack 2 is moved while being rotatably supported from the roller 310 disposed on the left and right sides to the roller 120, respectively. Therefore, even when the total weight of the rack 2 holding the workpiece is increased, the rack 2 can be easily advanced with a small force.

  However, the problem here is how to accurately position the rack 2 with respect to a predetermined position inside the processing tank 110. In particular, as the total weight of the rack 2 increases, it becomes more difficult to stop at a predetermined position in the processing apparatus 1 due to the inertial force in the traveling direction, and fine adjustment (minute movement) is performed when positioning to the predetermined position. The problem that is difficult occurs. Alternatively, if the stop cannot be sufficiently performed, there is a possibility of colliding with a shutter or the like provided at the exit.

  Therefore, in this embodiment, a stopper 162 that stops the rack 2 entering the processing tank 110 at a predetermined position is provided. As an example, as shown in FIG. 2, the stopper 162 is disposed at an inward position (a position that is forward in the traveling direction of the rack 2) so that the shutter 102 can be opened and closed with respect to the entrance 112.

  A configuration example of the stopper 162 is shown in FIG. 11 (an enlarged view of the XI portion in FIG. 2). The stopper 162 according to the present embodiment is an arm-shaped member as shown in FIG. As an example, the main body is a solid rod-shaped member formed using a stainless alloy or the like, but is not limited thereto, and may be formed using a plate-shaped member, a tubular member, or the like. The stopper 162 is swingably fixed with respect to an attachment stay 164 fixed at a lower position in the processing tank 110. As a structural feature, the center of gravity is such that the one end 162a is always lowered by the action of gravity and the other end 162b is raised to a height at which it can come into contact with the rear frame 204 of the rack 2. The position is set closer to the one end 162a than the position of the swing axis C1.

  According to this configuration, as shown in FIG. 12 (a) (partial cross section inside the broken line circle), which is an operation explanatory diagram, the rack 2 is pushed from the carriage 3 and the tank 112 is moved from the entrance 112 of the processing tank 110. When entering in the direction of arrow A1 inward, the rear frame 204, which is the rear side in the traveling direction of the rack 2, comes into contact with a predetermined portion of the stopper 162, that is, the end surface of the one end 162a, and the entry of the rack 2 is stopped. Thus, the action of being positioned at a predetermined position is obtained.

  In order to obtain the above-described operation, the rack 2 is provided with a configuration in which the front frame 206 constituting the lowermost base frame 210 does not come into contact with the one end 162a of the stopper 162 and stop. It has been. More specifically, in the front frame 206, the stopper is located at a position on the same line in the traveling direction with respect to the position where the rear frame 204 and the stopper 162 abut (that is, the position where the one end 162a of the stopper 162 is provided). A notch 206a capable of avoiding contact with one end 162a of 162 is provided. In addition, the notch 206a includes a configuration that exhibits the same operational effect, and includes a shape that performs the same avoiding action by, for example, bending the portion of the front frame 206.

  As described above, the rear side frame 204 and the front side frame 206 are connected by a pair of opposing side frames 208 and 208 to constitute a base frame 210 that forms the lowest part of the rack. Therefore, the rack 2 abuts against the stopper 162 when traveling between the abutting position of the rear frame 204 and the stopper 162 (one end 162a of the stopper 162) and the notch 206a of the front frame 206. The structure does not have a possible part.

  In addition, when the rack 2 is accommodated in the processing tank 110 of the processing apparatus 1, if it is accidentally moved in the direction opposite to the predetermined direction, that is, the rack 2 enters the entrance 112 from the rear frame 204 side, the rear side Since the frame 204 contacts the one end 162a of the stopper 162, erroneous entry is prevented. This is because a notch for avoiding contact is not provided at the contact position of the rear frame 204 with the stopper 162 (one end portion 162a).

  On the other hand, the processing apparatus 1 is provided with a release unit 166 for releasing the stopping action by the stopper 162 when the stopped rack 2 is moved out of the processing tank 110.

  A configuration example of the release unit 166 is shown in FIG. The release portion 166 according to the present embodiment is an arm-shaped member as shown in FIG. As an example, the main body is a solid rod-shaped member formed using a stainless alloy or the like, but is not limited thereto, and may be formed using a plate-shaped member, a tubular member, or the like. The release portion 166 is fixed so as to be swingable with respect to an attachment stay 164 fixed at a lower position in the processing tank 110. As a structural feature, the center of gravity is set closer to the other end 166b than the position of the swinging axis C2 so that the other end 166b is lowered by the action of gravity and the one end 166a is raised at all times. Has been.

  Further, when the shutter 102 is lowered and the entrance 112 is closed (shielded), one end 166a of the release portion 166 is disposed at a position where the shutter 102 contacts the lower end 102a. Here, FIG. 7B shows a state in which the rack 2 is held at a predetermined position in the processing apparatus 1, the shutter 102 is lowered, and the entrance 112 is closed.

  According to this configuration, when the shutter 102 is lowered and the entrance 112 is closed (shielded) as shown in FIG. The lower end portion 102a comes into contact with the one end portion 166a of the release portion 166 and further pushes it (presses down). As a result, the effect | action that the one end part 166a descend | falls and the other end part 166b raises is acquired. At this time, the other end portion 166 b of the release portion 166 is disposed at a position directly below the one end portion 162 a of the stopper 162. Therefore, since the action of pushing up the one end 162a of the stopper 162 is obtained by raising the other end 166b of the release part 166, the action of moving the other end 162b of the stopper 162 downward is obtained. Thus, the other end 166b of the release portion 166 constitutes a pushing portion that pushes up the one end 162a of the stopper 162. In addition, when the other end portion 166b of the release portion 166 is raised, the shape and arrangement of the stopper 162, the position of the swing axis C1, and the release portion 166 so that the one end portion 162a of the stopper 162 can be pushed up. The shape, arrangement, and position of the swing axis C2 are appropriately set. Incidentally, in the present embodiment, C1 and C2 are set in parallel. With such a configuration, the contact between the rear side frame 204 and the stopper 162 can be released, and the rack 2 can be advanced toward the outside of the processing tank 110 in the direction of the arrow A2.

  Here, at one end 166 a of the release portion 166 that contacts the shutter 102, a roller 168 that contacts the shutter 102 and rolls is provided. The roller 168 is provided with a rotation axis C3 parallel to the above-described swinging axis C2. Thereby, as shown in FIG. 12B, the shutter 102 rotates as the shutter 102 moves. More specifically, when the shutter 102 is lowered, the lower end portion 102a of the shutter 102 first contacts the roller 168, and the roller 168 rotates while being pushed. Thereafter, the roller 168 is gradually pushed down by the lower end portion 102 a of the shutter 102 while rotating, and the contact point shifts from the lower end portion 102 a of the shutter 102 to the inner wall 102 b of the shutter 102. At the time of the transition, the displacement (swinging operation) of the release portion 166 is completed, and thereafter, only the rotation operation of the roller 168 that contacts the inner wall 102b of the shutter 102 that descends.

  According to this, in the release part 166, by providing the roller 168 in the contact part with the shutter 102, the sliding resistance is reduced, and the shutter 102 made of glass is scratched. In addition, it is possible to prevent the increase in the amount of wear and the generation of dust due to sliding contact. The roller 168 is configured using a resin material, a metal material, or the like.

  As described above, according to the processing apparatus according to the present invention, it is possible to stop and accurately position the rack 2 entering the processing tank 110 with an extremely simple configuration.

  Further, when the rack 2 is accidentally entered from the rear side frame 204 side into the entrance 112, the rear side frame 204 comes into contact with the one end portion 162a of the stopper 162, so that erroneous entry can be prevented. .

  Further, the stopper 162 and the mounting stay 164 are configured to be able to ensure high rigidity while using a metal material such as a stainless alloy and having a simple configuration. Thereby, even if the total weight of the rack 2 is heavy, it can withstand the impact of a collision and can prevent deformation and breakage. Similarly, both the release portions 166 formed using a metal material such as a stainless alloy have high corrosion resistance and can prevent deterioration even in an environment where they are exposed to a cleaning liquid or the like for a long time. In particular, since an electric motor and a hydraulic / pneumatic mechanism are not used as a mechanism for operating the stopper 162 and the release portion 166, the structure can be greatly simplified and failure can be prevented. Furthermore, since biasing members such as a coil spring and a leaf spring are not used, there is no problem that a predetermined operation is not performed due to material deterioration of these members. From the above, it becomes possible to use it stably over a long period of time.

  The present invention is not limited to the embodiments described above, and various modifications can be made without departing from the present invention. In particular, the processing apparatus 1 has been described by taking as an example a cleaning apparatus that performs a cleaning process on a workpiece held in the rack 2 in the processing tank 110. However, the processing apparatus 1 is not limited thereto. The present invention can be similarly applied to a processing apparatus that performs other processing, such as a sterilizing apparatus that sterilizes a work held in a rack in 110 or a sterilizing apparatus that performs disinfection processing.

DESCRIPTION OF SYMBOLS 1 Processing apparatus 2 Rack 3 Car 102, 104 Shutter 110 Processing tank 112 Advancement inlet 122 Advancement outlet 132 Lower nozzle 142 Upper nozzle 150 First supply part 152 Second supply part 162 Stopper 162a Stopper end 162b Stopper other end 164 Mounting stay 166 Release part 166a Release part one end part 166b Release part other end part 168 Roller 200 Storage container 202 Handle 204 Rear frame 206 Front frame 206a Notch 208 Side frame 210 Base frames 224a, 224b, 224c, 224d Column part 230, 232 Side bar 234, 236a, 236b, 236c Shelf part 242 Central nozzle 246 Auxiliary nozzle 250 First circuit part 252 First injection part 260 Second circuit part 262 Second injection part

Claims (5)

A processing apparatus comprising a rack for holding a workpiece and a processing tank for storing the rack, and performing a predetermined processing step on the workpiece held in the rack accommodated in the processing tank,
The treatment tank includes an advancement entrance for entering the rack in a predetermined direction, an advancement exit for advancement, and a rear side frame of the rack and a predetermined portion at an inner position of the advancement entrance so that the rack enters. A stopper that stops, and a release portion that moves the predetermined portion of the stopper below the rear side frame to release the contact,
The rack has a notch that avoids contact with the stopper at a position on the same line in the traveling direction with respect to the contact position between the rear frame and the stopper in the front frame. Processing equipment. When the rack is made to enter the entrance from the rear frame side opposite to the predetermined direction, the rack avoids contact with the stopper at a contact position with the stopper in the rear frame. The processing apparatus according to claim 1, wherein the processing apparatus has no notch. The stopper is fixed to the processing tank so as to be swingable, and the gravity center position is swung so that one end is lowered by the action of gravity and the other end is raised to a position where it can come into contact with the rear frame. The processing apparatus according to claim 1, wherein the processing unit is an arm-shaped member set closer to one end than the axial position of movement, and the other end forms the predetermined portion. The treatment tank further includes a shutter that is raised and lowered to open and close the entrance.
The release portion is fixed to the processing tank so as to be swingable, and when the shutter is lowered to close the entrance, the release portion is pressed against the shutter to lower one end and the other end. An arm-like member disposed so as to raise the portion, and moving the predetermined portion of the stopper downward by raising the other end and pushing up one end of the stopper. The processing apparatus as described in any one of Claims 1-3 characterized by the above-mentioned. The processing apparatus according to claim 4, wherein a roller that rolls in contact with the shutter is provided at the one end of the release portion.

Images