JP2017069509A - Manufacturing method for light-emitting device - Google Patents

Manufacturing method for light-emitting device Download PDF

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JP2017069509A
JP2017069509A JP2015196583A JP2015196583A JP2017069509A JP 2017069509 A JP2017069509 A JP 2017069509A JP 2015196583 A JP2015196583 A JP 2015196583A JP 2015196583 A JP2015196583 A JP 2015196583A JP 2017069509 A JP2017069509 A JP 2017069509A
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base
aggregate
light emitting
manufacturing
emitting device
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JP6551119B2 (en
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宏佳 前河
Hiroyoshi Maekawa
宏佳 前河
恭平 白浜
Kyohei Shirahama
恭平 白浜
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Nichia Chemical Industries Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a manufacturing method for a light-emitting device capable of avoiding the risk that an end material or the like is left on a jig for dicing, while shortening the work time.SOLUTION: A manufacturing method for a light-emitting device includes the steps of: preparing an aggregate substrate including a plurality of aggregations, where more than one aggregations each consisting of a plurality of light-emitting devices are arranged in one direction, and coupling parts placed between the aggregate and an adjacent aggregate; preparing a bed where the friction coefficient of a region in which the coupling part of aggregate substrate is placed is smaller than that of a region where the aggregate is placed; placing the aggregate substrate on the bed, and separating the aggregate substrate into a plurality of aggregations and the coupling parts; and cutting and individualizing the aggregation.SELECTED DRAWING: Figure 5

Description

本開示は、発光装置の製造方法に関する。   The present disclosure relates to a method for manufacturing a light emitting device.

複数の発光素子が搭載された集合基板を個片化し、複数の発光装置を得る製造方法が知られている。このような集合基板は、複数の発光装置が連なる製品部と、製造工程の中で端材と呼ばれる非製品部とを有する。特許文献1は、このような集合基板の一例である集合基板を開示している。特許文献1のような集合基板を切断する際には、発生する端材やコンタミが治具の上に残らないように、切削水を用いて端材等を流したり、若しくは端材等を吹き飛ばしながら切断工程が行われる。   A manufacturing method for obtaining a plurality of light-emitting devices by dividing a collective substrate on which a plurality of light-emitting elements are mounted is known. Such a collective substrate has a product part in which a plurality of light emitting devices are connected, and a non-product part called a scrap in the manufacturing process. Patent Document 1 discloses an aggregate substrate which is an example of such an aggregate substrate. When cutting a collective substrate as in Patent Document 1, the cutting material is flowed using cutting water or blown off the cutting material so that the generated cutting material and contamination do not remain on the jig. The cutting process is performed.

特開2015−37100号公報JP-A-2015-37100

しかし、特許文献1のような集合基板においては、全ての端材等が流されることはなく、例えば比較的大きな端材は治具上に残留することがある。このように残留した端材等は、切断工程により切り離された個々の発光装置に付着したり、切断工程中に切削ブレードと接触して切削ブレードを破損させるなどの不具合を生じさせる可能性がある。そのため、治具上の端材等を取り除く工程が新たに必要となり、製造工程の増加や作業時間が増大する虞がある。   However, in the collective substrate as in Patent Document 1, not all the end materials are flown, and for example, relatively large end materials may remain on the jig. The remaining end materials and the like may cause problems such as adhesion to individual light emitting devices separated by the cutting process or contact with the cutting blade during the cutting process to break the cutting blade. . Therefore, a process for removing the end material on the jig is newly required, which may increase the manufacturing process and the working time.

そこで本実施形態では、端材等を取り除く工程を必要としない発光装置の製造方法を提供することを目的とする。   Accordingly, an object of the present embodiment is to provide a method for manufacturing a light emitting device that does not require a step of removing offcuts and the like.

本実施形態の発光装置の製造方法は、複数の発光装置からなる集合体が、一方向に少なくとも2つ以上配列される複数の集合体と、集合体と隣接する集合体との間に配置される連結部とを備える集合基板を準備する工程と、集合基板の連結部が載置される領域の摩擦係数が、集合体が載置される領域の摩擦係数よりも小さい土台を準備する工程と、集合基板を土台に載置し、集合基板を複数の集合体と連結部とに切り離す工程と、集合体を切断して個片化する工程を備える。   In the light emitting device manufacturing method of the present embodiment, an assembly composed of a plurality of light emitting devices is arranged between a plurality of assemblies in which at least two or more arrays are arranged in one direction and an assembly adjacent to the assembly. And a step of preparing a base in which a friction coefficient of a region where the connecting portion of the collective substrate is placed is smaller than a friction coefficient of a region where the aggregate is placed; The method includes a step of placing the collective substrate on a base, separating the collective substrate into a plurality of collectives and connecting portions, and a step of cutting the collective piece into individual pieces.

本実施形態によれば、治具の上に端材等が残る虞を回避することができ、作業時間が短い発光装置の製造方法を提供することができる。   According to the present embodiment, it is possible to avoid the possibility that the end material or the like remains on the jig, and it is possible to provide a method for manufacturing a light emitting device with a short work time.

本実施形態のリードフレームを示す模式平面図である。It is a schematic plan view showing a lead frame of the present embodiment. 図1Aの破線で囲んだ部分を詳細に示した図である。It is the figure which showed the part enclosed with the broken line of FIG. 1A in detail. 本実施形態の集合基板を示す模式平面図である。It is a schematic plan view which shows the aggregate substrate of this embodiment. 図2Aの破線で囲んだ部分を詳細に示した図である。It is the figure which showed the part enclosed with the broken line of FIG. 2A in detail. 本実施形態の土台とマスクを示す模式平面図である。It is a schematic plan view which shows the foundation and mask of this embodiment. 本実施形態の難溶性粒子が形成されている状態を示す模式平面図である。It is a schematic plan view which shows the state in which the hardly soluble particle | grains of this embodiment are formed. 本実施形態の土台の上に集合基板が載置される様子を示す模式斜視図である。It is a model perspective view which shows a mode that a collective substrate is mounted on the base of this embodiment.

以下、本実施形態について図面を参照して説明する。ただし、以下に説明する実施形態は、本開示の技術思想を具体化するためのものであり、本開示の技術的範囲を限定することを意図したものではない。1つの実施形態において説明する構成は、特段の断りがない限り、他の実施形態にも適用可能である。以下の説明では、必要に応じて特定の方向や位置を示す用語(例えば、「上」、「下」、「右」、「左」及びそれらの用語を含む別の用語)を用いるが、それらの用語の使用は図面を参照した発明の理解を容易にするためであって、それらの用語の意味によって本開示の技術的範囲が制限されるものではない。
各図面が示す部材の大きさや位置関係等は、説明を明確にするため、誇張していることがある点も留意されたい。また、複数の図面に表れる同一符号の部分は同一の部分又は部材を示す。
Hereinafter, the present embodiment will be described with reference to the drawings. However, the embodiments described below are intended to embody the technical idea of the present disclosure, and are not intended to limit the technical scope of the present disclosure. The configuration described in one embodiment is applicable to other embodiments unless otherwise specified. In the following description, terms indicating a specific direction or position (for example, “up”, “down”, “right”, “left” and other terms including these terms) are used as necessary. The use of the terminology is intended to facilitate understanding of the invention with reference to the drawings, and the technical scope of the present disclosure is not limited by the meaning of these terms.
It should also be noted that the size and positional relationship of the members shown in each drawing may be exaggerated for clarity of explanation. Moreover, the part of the same code | symbol which appears in several drawing shows the same part or member.

本開示に係る発光装置100の製造方法は、集合基板1を準備する工程と、摩擦係数が領域によって異なる土台5を準備する工程と、集合基板1を土台5に載置し、集合基板1を複数の集合体2と連結部3とに切り離す工程と、集合体2を切断して個片化された発光装置100を得る工程とを備える。
以下、図面を用いて各工程を詳細に説明する。
The manufacturing method of the light emitting device 100 according to the present disclosure includes a step of preparing the collective substrate 1, a step of preparing a base 5 having a different friction coefficient depending on a region, and placing the collective substrate 1 on the base 5. A step of separating the plurality of assemblies 2 and the connecting portion 3, and a step of cutting the assembly 2 to obtain a light-emitting device 100 singulated.
Hereafter, each process is demonstrated in detail using drawing.

(集合基板を準備する工程)
図1A〜図2Bを参照して、集合基板1を準備する工程について説明する。ここでは、集合基板1として、リードフレーム7と成形体8を構成要素とする樹脂成形体を例にとって説明する。なお、集合基板1は樹脂成形体に限定されず、例えば、セラミックやガラス等を主材料とする集合基板を用いることができる。また、ここでは集合基板を形成する工程を示しているが、予め形成された集合基板を購入する等して、準備してもよい。
(Process for preparing the assembly board)
With reference to FIG. 1A-FIG. 2B, the process of preparing the aggregate substrate 1 is demonstrated. Here, a resin molded body having the lead frame 7 and the molded body 8 as constituent elements will be described as an example of the collective substrate 1. The aggregate substrate 1 is not limited to a resin molded body, and for example, an aggregate substrate mainly made of ceramic, glass, or the like can be used. Moreover, although the process of forming an aggregate substrate is shown here, it may be prepared by purchasing an aggregate substrate formed in advance.

まず、金属板をパンチングして、複数の発光装置が形成される領域X(後に集合体2となる領域)と、その領域X間を連結する連結部3(ハッチングを施した領域)とに区画されたリードフレーム7を形成する。図1Aはこのようなリードフレーム7を示す模式平面図であり、図1Bは図1Aの破線で囲まれた部分を詳細に示した図である。複数の発光装置が形成される領域Xは、一方向に少なくとも2つ以上配列されており、図1Aでは、当該領域Xは4つ形成され、連結部3は3つ形成されている。図1Aで示すように、本実施形態の連結部3は貫通孔9を有する。連結部3に貫通孔9を設けることで、集合基板1が反った場合であっても、集合基板1の反りの応力を連結部3で緩和することができる。連結部3において貫通孔9が占める割合は、貫通孔9が無かった場合の連結部3の平面積の30%以上であることが好ましく、50%以上であることがより好ましく、70%以上であることがさらに好ましい。なお、貫通孔9を考慮しない場合の連結部3の形状は、図1Aで示すような長方形の形状だけでなく、その他の多角形、円形又はその組み合わせ等の種々の形状を有することができる。また、貫通孔9を備えていない平板状の連結部3であってもよい。リードフレーム7は、さらに複数の発光装置が形成される領域X及び連結部3の外側であって、各部と連結して形成される枠体4を備えていてもよい。連結部3及び枠体4は非製品部であるので、リードフレーム7から切断された後は端材となる。
リードフレーム7はエッチングやプレス等の加工により表面に凹凸が設けられていてもよい。このような凹凸は、リードフレーム7と成形体8との密着強度を向上させる。また、リードフレーム7の表面には、Ni、Pd、Au、Ag等のメッキ層が施されるが、メッキ層を形成する工程は成形体8を形成する前であってもよいし、成形体8を形成した後でもよい。
First, a metal plate is punched and divided into a region X where a plurality of light emitting devices are formed (a region that will later become an assembly 2) and a connecting portion 3 (a hatched region) that connects the regions X. The formed lead frame 7 is formed. FIG. 1A is a schematic plan view showing such a lead frame 7, and FIG. 1B is a diagram showing in detail a portion surrounded by a broken line in FIG. 1A. At least two regions X in which a plurality of light emitting devices are formed are arranged in one direction. In FIG. 1A, four regions X are formed and three connection portions 3 are formed. As shown in FIG. 1A, the connecting portion 3 of this embodiment has a through hole 9. By providing the through hole 9 in the connecting portion 3, even when the collective substrate 1 is warped, the warping stress of the collective substrate 1 can be relaxed by the connecting portion 3. The proportion of the through-hole 9 in the connecting portion 3 is preferably 30% or more, more preferably 50% or more, and more preferably 70% or more of the plane area of the connecting portion 3 when there is no through-hole 9. More preferably it is. In addition, the shape of the connection part 3 when not considering the through-hole 9 can have not only a rectangular shape as shown in FIG. 1A but various shapes, such as another polygon, a circle, or its combination. Moreover, the flat connection part 3 which is not provided with the through-hole 9 may be sufficient. The lead frame 7 may further include a frame 4 that is formed outside the region X where the plurality of light emitting devices are formed and the connecting portion 3 and connected to each portion. Since the connecting portion 3 and the frame body 4 are non-product portions, they become end materials after being cut from the lead frame 7.
The lead frame 7 may be provided with irregularities on the surface by processing such as etching or pressing. Such unevenness improves the adhesion strength between the lead frame 7 and the molded body 8. Further, a plated layer of Ni, Pd, Au, Ag or the like is applied to the surface of the lead frame 7, but the step of forming the plated layer may be performed before the molded body 8 is formed, or the molded body It may be after forming 8.

次に、凸部を有する上金型と下金型を備える金型を用いてリードフレーム7を挟み込む。そして、金型内に成形体8をトランスファモールドしてリードフレーム7に成形体8を形成する。この時、複数の発光装置が形成される領域Xにおいて、凸部に挟みこまれる領域は発光装置100の凹部に相当し、凸部に挟みこまれない領域は空隙となりこの空隙に成形体8が形成される。図2Aは、このように形成された集合基板を示す模式平面図であり、図2Bは図2Aの破線で囲まれた部分を詳細に示した図である。成形体8を形成する方法は、トランスファモールドに限られず、射出成形法や圧縮成形法等の種々の成形方法を用いることが出来る。   Next, the lead frame 7 is sandwiched using a mold having an upper mold having a convex part and a lower mold. Then, the molded body 8 is transfer-molded in the mold to form the molded body 8 on the lead frame 7. At this time, in the region X where the plurality of light emitting devices are formed, the region sandwiched between the convex portions corresponds to the concave portion of the light emitting device 100, and the region not sandwiched between the convex portions becomes a void, and the molded body 8 is formed in this void. It is formed. FIG. 2A is a schematic plan view showing the aggregate substrate formed as described above, and FIG. 2B is a diagram showing in detail a portion surrounded by a broken line in FIG. 2A. The method for forming the molded body 8 is not limited to transfer molding, and various molding methods such as injection molding and compression molding can be used.

次に、複数の発光装置が形成される領域Xにおいて、樹脂成形体の複数の凹部に発光素子10が載置される。この時、発光素子10はダイボンド材を用いて実装され、ワイヤによって発光素子10の電極とリードフレーム7が電気的に接続される。ただし、発光素子10は半田等の導電性部材を介してフリップチップ実装されてもよい。   Next, in the region X where the plurality of light emitting devices are formed, the light emitting element 10 is placed in the plurality of concave portions of the resin molded body. At this time, the light emitting element 10 is mounted using a die bond material, and the electrode of the light emitting element 10 and the lead frame 7 are electrically connected by a wire. However, the light emitting element 10 may be flip-chip mounted via a conductive member such as solder.

そして、発光素子10を被覆するように凹部の中に透光性部材が形成される。透光性部材の材料としては、例えば、シリコーン樹脂、エポキシ樹脂、アクリル樹脂、不飽和ポリエステル樹脂またはこれらを1つ以上含む樹脂を用いることができる。また、透光性部材には、酸化チタン、酸化ケイ素、酸化ジルコニウム、酸化亜鉛、酸化アルミニウム、窒化アルミニウムなどの光散乱粒子や、発光素子10からの発光の波長を変換する蛍光体等を含有させてもよい。   And a translucent member is formed in a recessed part so that the light emitting element 10 may be coat | covered. As a material of the translucent member, for example, a silicone resin, an epoxy resin, an acrylic resin, an unsaturated polyester resin, or a resin containing one or more of these can be used. The translucent member contains light scattering particles such as titanium oxide, silicon oxide, zirconium oxide, zinc oxide, aluminum oxide, and aluminum nitride, and a phosphor that converts the wavelength of light emitted from the light emitting element 10. May be.

以上の工程により、複数の発光装置100からなる集合体2が、一方向に少なくとも2つ以上配列される複数の集合体2と、前記集合体2と隣接する集合体2との間に配置される連結部を備える集合基板1を準備することができる。   Through the above steps, the assembly 2 composed of the plurality of light emitting devices 100 is arranged between the plurality of assemblies 2 arranged in at least two in one direction and the assembly 2 adjacent to the assembly 2. It is possible to prepare a collective substrate 1 having a connecting portion.

(土台を準備する工程)
次に、摩擦係数が領域によって異なる土台5を準備する工程を説明する。具体的には、土台5として、集合基板1の連結部3が載置される領域の摩擦係数が、集合体2が載置される領域の摩擦係数よりも小さい土台5が用いられる。この時の土台5とは、ダイシング装置において、被加工物が載置されダイシング工程が行われる作業台のことを指す。土台5は、被加工物を固定するために真空吸着用の吸着孔が設けられていることが好ましい。 図3〜図4を参照して、マスクMを用いて難溶性粒子6が形成された土台5を準備する工程について、詳細に説明をする。
(Process of preparing the foundation)
Next, the process of preparing the base 5 having a different friction coefficient depending on the region will be described. Specifically, a base 5 having a friction coefficient smaller than that of a region where the aggregate 2 is placed is used as the base 5. The base 5 at this time refers to a work table on which a workpiece is placed and a dicing process is performed in a dicing apparatus. The base 5 is preferably provided with suction holes for vacuum suction in order to fix the workpiece. With reference to FIGS. 3 to 4, the step of preparing the base 5 on which the hardly soluble particles 6 are formed using the mask M will be described in detail.

まず、図3で示すようにダイシング装置の土台5の上面にダミーの集合基板Dを載置する。この時用いられるダミーの集合基板Dは、先の工程で得られた集合基板1の外形と略同じ外形を有する集合基板が用いられる。例えば、ダミーの集合基板Dとして、先の工程で不良となった集合基板1を用いることができる。
この時の土台5とは、ダイシング装置を構成する一部位であり、集合基板1を載置する台のことを指す。土台5の表面には、土台5と集合基板1とを真空吸着させるための多数の吸着孔が設けられている。土台5の集合基板1が載置される表面は、弾性部材からなることが好ましく、例えば、シリコーン樹脂組成物、変性シリコーン樹脂組成物、エポキシ樹脂組成物、変性エポキシ樹脂組成物、フッ素樹脂組成物等の材料で形成される。
First, as shown in FIG. 3, a dummy collective substrate D is placed on the upper surface of the base 5 of the dicing apparatus. As the dummy collective substrate D used at this time, a collective substrate having substantially the same outer shape as the collective substrate 1 obtained in the previous step is used. For example, as the dummy collective substrate D, the collective substrate 1 that has become defective in the previous process can be used.
The base 5 at this time is a part of the dicing apparatus and refers to a base on which the collective substrate 1 is placed. On the surface of the base 5, a large number of suction holes for vacuum-sucking the base 5 and the collective substrate 1 are provided. The surface on which the aggregate substrate 1 of the base 5 is placed is preferably made of an elastic member. For example, a silicone resin composition, a modified silicone resin composition, an epoxy resin composition, a modified epoxy resin composition, a fluororesin composition Etc.

次に、ダミーの集合基板Dを土台5に真空吸着してダミーの集合基板Dを固定する。この時、ダミーの集合基板Dの連結部3に相当する部位は土台5と吸着されない、もしくは集合体2に相当する部位の吸着力よりも弱い吸着力で土台5と吸着される。また、ダミーの集合基板Dと土台5は、切断されるダミーの集合基板Dの切断予定線とダイシング装置のブレードとが平行になるように配置される。   Next, the dummy collective substrate D is vacuum-sucked to the base 5 to fix the dummy collective substrate D. At this time, the portion corresponding to the connecting portion 3 of the dummy aggregate substrate D is not attracted to the base 5 or is attracted to the base 5 with an adsorption force weaker than the adsorption force of the portion corresponding to the aggregate 2. Further, the dummy collective substrate D and the base 5 are arranged so that the planned cutting line of the dummy collective substrate D to be cut is parallel to the blade of the dicing apparatus.

そして、ダミーの集合基板Dの連結部3及び枠体4に相当する部位(図3の斜線部分)は、ダイシング装置のブレードによる切断によってダミーの集合基板Dから切り離される。この時の切断工程は、通常のダイシング装置による切断工程と同じ手順で切断される。また、土台5及びダミーの集合基板Dの切断箇所に切削剤をかけながら切断が行われる。切削剤は、切削する領域を潤滑又は冷却することにより工具の摩耗を抑制することや、ダイシング装置の土台5から端材を洗い流し、端材が土台5の上に堆積することによる切削不良の発生を抑えるために用いられる。切削剤としては、水等の水溶性の切削水や油性の切削油を用いることができる。また、切削剤の代わりにエアーを噴射させながらダイシング装置による切断が行われてもよいし、切削剤とエアーを同時にかけながら切断が行われてもよい。切削剤とエアーを同時に用いることで、端材等を浮かせやすくなり洗浄力が向上する。
このように、切削剤をかけながら切断が行われることで、ダミーの集合基板Dの集合体2に相当する部位は真空吸着によって土台5の上に残るが、連結部3に相当する部位は切削剤によって土台5の上から取り除かれる。なお、切削剤により連結部3が除去出来ない場合は、複数回の切削剤による除去作業やピンセット等で除去を行う。この結果、土台5の上面において、難溶性粒子6を形成する粒子形成領域のみを露出するマスクMを得ることができる。
And the part (shaded part of FIG. 3) equivalent to the connection part 3 and the frame 4 of the dummy collective board | substrate D is cut | disconnected from the dummy collective board D by the cutting | disconnection by the blade of a dicing apparatus. The cutting process at this time is cut in the same procedure as the cutting process by a normal dicing apparatus. Further, the cutting is performed while the cutting agent is applied to the cutting portions of the base 5 and the dummy collective substrate D. The cutting agent suppresses the wear of the tool by lubricating or cooling the area to be cut, or the cutting material is washed out from the base 5 of the dicing machine, and the cutting material is generated on the base 5 to generate cutting defects. Used to suppress As the cutting agent, water-soluble cutting water such as water or oil-based cutting oil can be used. Moreover, the cutting | disconnection by a dicing apparatus may be performed, spraying air instead of a cutting agent, and a cutting | disconnection may be performed applying a cutting agent and air simultaneously. By using the cutting agent and air at the same time, it is easy to float off the end material and the like, and the cleaning power is improved.
Thus, by cutting while applying the cutting agent, the portion corresponding to the aggregate 2 of the dummy aggregate substrate D remains on the base 5 by vacuum suction, but the portion corresponding to the connecting portion 3 is cut. It is removed from the base 5 by the agent. In addition, when the connection part 3 cannot be removed with a cutting agent, it removes by the removal operation | work with a cutting agent, tweezers, etc. several times. As a result, it is possible to obtain a mask M that exposes only the particle forming region for forming the hardly soluble particles 6 on the upper surface of the base 5.

次に、図4で示すように、先の工程で露出した粒子形成領域に難溶性粒子6を形成する。この時の「難溶性粒子」とは、水等の切削剤によって溶けにくい性質を持つ粒子のことを指す。したがって切削剤に完全に溶解しなければよく、粒子の一部が切削剤に溶解する場合も含む。難溶性粒子6は、その上に載置された連結部3を切削剤等により除去しやすくするものであり、言い換えると、土台5と連結部3との粘着力を緩和させるものである。したがって、集合基板1の連結部3が載置される領域の摩擦係数は、集合体2が載置される領域の摩擦係数よりも小さくなる。
この時、難溶性粒子6は例えばモース硬度1〜2の硬度を有する粒子を用いることが好ましい。このように軟らかい粒子を用いることで、粒子形成領域に形成された難溶性粒子6の表面に凹凸ができることを抑制することができ、難溶性粒子6を均一に形成することができる。また、難溶性粒子6は平均粒径が1〜50μm程度の粒子を用いることが好ましい。難溶性粒子6として粒径が小さい粒子を用いることで、弾性体からなる土台5に馴染みやすくなるので好ましい。
難溶性粒子6としては、例えば、タルクを用いることができる。
Next, as shown in FIG. 4, hardly soluble particles 6 are formed in the particle formation region exposed in the previous step. The “slightly soluble particles” at this time refers to particles having properties that are hardly dissolved by a cutting agent such as water. Therefore, it does not have to be completely dissolved in the cutting agent, and includes a case where a part of the particles dissolves in the cutting agent. The hardly soluble particles 6 make it easy to remove the connecting portion 3 placed thereon with a cutting agent or the like, in other words, ease the adhesive force between the base 5 and the connecting portion 3. Therefore, the friction coefficient of the area where the connecting portion 3 of the collective substrate 1 is placed is smaller than the friction coefficient of the area where the aggregate 2 is placed.
At this time, it is preferable to use particles having a Mohs hardness of 1-2, for example, as the hardly soluble particles 6. By using such soft particles, it is possible to suppress the formation of irregularities on the surface of the hardly soluble particles 6 formed in the particle forming region, and the hardly soluble particles 6 can be uniformly formed. Moreover, it is preferable to use the particles having an average particle diameter of about 1 to 50 μm as the hardly soluble particles 6. It is preferable to use particles having a small particle size as the hardly soluble particles 6 because the particles can easily become familiar with the base 5 made of an elastic body.
As the hardly soluble particles 6, for example, talc can be used.

粒子形成領域に難溶性粒子6を形成する方法としては、スクリーン印刷、ポッティング、トランスファモールド、コンプレッションモールド等の公知の方法により形成することができる。また、難溶性粒子6は、粒子形成領域の幅よりも小さい幅を有する綿棒等の治具を用いて形成してもよい。このように綿棒等の治具を用いることで、難溶性粒子6が形成されにくい角部等の部位に確実に難溶性粒子6を形成することができる。   As a method of forming the poorly soluble particles 6 in the particle forming region, they can be formed by a known method such as screen printing, potting, transfer molding, compression molding or the like. Further, the hardly soluble particles 6 may be formed using a jig such as a cotton swab having a width smaller than the width of the particle forming region. In this way, by using a jig such as a cotton swab, it is possible to reliably form the hardly soluble particles 6 in a portion such as a corner where the hardly soluble particles 6 are hardly formed.

難溶性粒子6を形成した後に、土台5及びマスクMは水等の切削剤で洗浄する工程を行ってもよい。これにより、粒子形成領域に形成された難溶性粒子6の塗布分布を均一にさせることができるとともに、粒子形成領域以外の領域に付着した粒子を洗い流すことができる。   After forming the hardly soluble particles 6, the base 5 and the mask M may be subjected to a step of cleaning with a cutting agent such as water. Thereby, while being able to make application | coating distribution of the hardly soluble particle | grains 6 formed in the particle | grain formation area uniform, the particle | grains adhering to area | regions other than a particle | grain formation area can be washed away.

ここまで、難溶性粒子6を形成する工程は、ダミー基板Dを用いて土台5に難溶性粒子6を形成する方法を説明してきた。しかし、これに限らず、土台5上に集合体2の形状や大きさに応じたマスクMを複数個配置して、難溶性粒子6を形成してもよい。これにより、ダミー基板Dを準備し不要な部位を切断する等の複雑な工程を要する必要が無いので、簡易にマスクMを配置することができる。
また、難溶性粒子6は最初から土台5に形成されていてもよい。つまり、土台5の表面に難溶性粒子6が最初から埋め込まれ、又は貼付されていてもよい。このようにすることで、マスクM等を用いる工程を省略することができるので、簡易な製造方法とすることができる。
Up to this point, the step of forming the hardly soluble particles 6 has described the method of forming the hardly soluble particles 6 on the base 5 using the dummy substrate D. However, the present invention is not limited thereto, and a plurality of masks M corresponding to the shape and size of the aggregate 2 may be arranged on the base 5 to form the hardly soluble particles 6. This eliminates the need for complicated steps such as preparing the dummy substrate D and cutting unnecessary parts, and thus the mask M can be easily arranged.
Further, the hardly soluble particles 6 may be formed on the base 5 from the beginning. That is, the hardly soluble particles 6 may be embedded or stuck on the surface of the base 5 from the beginning. By doing in this way, since the process using mask M etc. can be omitted, it can be set as a simple manufacturing method.

また、土台5の別の形態として、集合体2が載置される領域にブラスト処理を施した土台5を用いてもよい。このように土台5の表面にブラスト処理を施すことで、ブラスト処理が施された表面が粗面化し、その表面の摩擦係数が増大する。これにより、連結部3が載置される領域の摩擦係数を、集合体2が載置される領域の摩擦係数よりも小さくすることができる。   Further, as another form of the base 5, a base 5 in which a blasting process is performed on an area where the aggregate 2 is placed may be used. By performing the blasting process on the surface of the base 5 in this way, the surface subjected to the blasting process becomes rough, and the friction coefficient of the surface increases. Thereby, the friction coefficient of the area | region where the connection part 3 is mounted can be made smaller than the friction coefficient of the area | region where the aggregate | assembly 2 is mounted.

(集合体と連結部を切り離す工程)
次に、集合体2と連結部3とを切り離す工程を説明する。
まず、図5で示すように、集合基板1を土台5に載置する。この時、集合基板1の連結部3と、土台5の難溶性粒子6が形成された領域とが合致するように配置される。この場合の「合致」とは、完全に一致するだけでなく、予め設定された誤差範囲内に存在する場合も含む。
(Process of separating the assembly and the connecting part)
Next, the process of separating the assembly 2 and the connecting portion 3 will be described.
First, as shown in FIG. 5, the collective substrate 1 is placed on the base 5. At this time, it arrange | positions so that the connection part 3 of the aggregate substrate 1 and the area | region in which the hardly soluble particle | grains 6 of the base 5 were formed may correspond. “Match” in this case includes not only a perfect match but also a case where it exists within a preset error range.

次に、集合基板1を土台5に真空吸着させ、集合基板1を複数の集合体2と連結部3とに切り離すための切断が行われる。この時の切断は、マスクMの切断工程と同様に切断箇所に水等の切削剤やエアーをかけながら、ダイシング装置のブレードによって切断が行われる。連結部3と土台5との間には吸着を抑制する難溶性粒子6が形成されているので、連結部3は水等の切削剤やエアーをかけることで容易に土台5の上から取り除くことができる。一方で、複数の発光装置100からなる集合体2は、土台5に真空吸着されているのでそのまま土台5の上に残る。   Next, the collective substrate 1 is vacuum-adsorbed on the base 5, and cutting for separating the collective substrate 1 into a plurality of aggregates 2 and connecting portions 3 is performed. The cutting at this time is performed by a blade of a dicing apparatus while a cutting agent such as water or air is applied to the cutting portion in the same manner as the mask M cutting process. Since insoluble particles 6 that suppress adsorption are formed between the connecting portion 3 and the base 5, the connecting portion 3 can be easily removed from the base 5 by applying a cutting agent such as water or air. Can do. On the other hand, the assembly 2 composed of the plurality of light emitting devices 100 remains on the base 5 as it is because the base 5 is vacuum-sucked.

(個片化工程)
次に、土台5に残った集合体2を切断して個片化する。
以上に説明した製造方法により、個片化された発光装置100を得ることができる。
(Individualization process)
Next, the assembly 2 remaining on the base 5 is cut into pieces.
By the manufacturing method described above, it is possible to obtain the light emitting device 100 that is separated into pieces.

以上、実施形態について説明したが、これらの説明は特許請求の範囲に記載された構成を何ら限定するものではない。   Although the embodiments have been described above, these descriptions do not limit the configurations described in the claims.

100 発光装置
10 発光素子
1 集合基板
2 集合体
3 連結部
4 枠体
5 土台
6 難溶性粒子
7 リードフレーム
8 成形体
9 貫通孔
D ダミーの集合基板
M マスク
X 複数の発光装置が形成される領域
DESCRIPTION OF SYMBOLS 100 Light-emitting device 10 Light-emitting element 1 Aggregate substrate 2 Aggregate 3 Connecting part 4 Frame body 5 Base 6 Insoluble particle 7 Lead frame 8 Molded body 9 Through hole D Dummy aggregate substrate M Mask X Area where a plurality of light-emitting devices are formed

Claims (10)

複数の発光装置からなる集合体が、一方向に少なくとも2つ以上配列される複数の集合体と、前記集合体と隣接する集合体との間に配置される連結部と、を備える集合基板を準備する工程と、
前記集合基板の前記連結部が載置される領域の摩擦係数が、前記集合体が載置される領域の摩擦係数よりも小さい土台を準備する工程と、
前記集合基板を前記土台に載置し、前記集合基板を前記複数の集合体と前記連結部とに切り離す工程と、
前記集合体を切断して個片化する工程と、
を備える発光装置の製造方法。
A collective substrate comprising: a plurality of aggregates in which at least two aggregates each including a plurality of light emitting devices are arranged in one direction; and a connecting portion disposed between the aggregate and the adjacent aggregate. A preparation process;
Preparing a base having a friction coefficient of a region where the connecting portion of the aggregate substrate is placed smaller than a friction coefficient of a region where the aggregate is placed;
Placing the collective substrate on the base, and separating the collective substrate into the plurality of assemblies and the connecting portion;
Cutting the assembly into pieces,
A method for manufacturing a light emitting device.
前記土台は、前記集合基板の前記連結部が載置される領域に難溶性粒子が形成されている請求項1に記載の発光装置の製造方法。   The light emitting device manufacturing method according to claim 1, wherein the base is formed with hardly soluble particles in a region where the connecting portion of the collective substrate is placed. 前記集合基板を切り離す工程は、前記集合基板に切削剤及び/又はエアーをかけながら行われる請求項1又は請求項2に記載の発光装置の製造方法。   The method for manufacturing the light emitting device according to claim 1, wherein the step of separating the collective substrate is performed while applying a cutting agent and / or air to the collective substrate. 前記難溶性粒子を形成する工程は、マスクを用いて行われる請求項2又は請求項3に記載の発光装置の製造方法。   The method for manufacturing a light emitting device according to claim 2, wherein the step of forming the hardly soluble particles is performed using a mask. 前記難溶性粒子を形成した後に、さらに前記マスク及び前記土台を洗浄する工程を備える請求項4に記載の発光装置の製造方法。   The method for manufacturing the light emitting device according to claim 4, further comprising a step of cleaning the mask and the base after forming the hardly soluble particles. 前記複数の集合体を切り離す工程は、前記土台と、前記集合基板の下面の前記複数の集合体に相当する領域とを吸着して行われる請求項1乃至請求項5のいずれか1項に記載の発光装置の製造方法。 6. The step of separating the plurality of aggregates is performed by adsorbing the base and a region corresponding to the plurality of aggregates on a lower surface of the aggregate substrate. Method for manufacturing the light emitting device. 前記集合基板は、リードフレームと成形体とからなる樹脂成形体である請求項1乃至請求項6のいずれか1項に記載の発光装置の製造方法。   The method for manufacturing a light emitting device according to claim 1, wherein the aggregate substrate is a resin molded body including a lead frame and a molded body. 前記難溶性粒子はタルクである請求項2乃至請求項7のいずれか1項に記載の発光装置の製造方法。   The method for manufacturing a light-emitting device according to claim 2, wherein the hardly soluble particle is talc. 前記連結部は貫通孔を有する請求項1乃至請求項8のいずれか1項に記載の発光装置の製造方法。 The method for manufacturing a light emitting device according to claim 1, wherein the connecting portion has a through hole. 前記土台の前記集合基板が載置される領域は弾性部材からなる請求項1乃至請求項9のいずれか1項に記載の発光装置の製造方法。 The method for manufacturing a light emitting device according to any one of claims 1 to 9, wherein a region of the base on which the aggregate substrate is placed is made of an elastic member.
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