JP2017044533A5 - - Google Patents
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- JP2017044533A5 JP2017044533A5 JP2015166040A JP2015166040A JP2017044533A5 JP 2017044533 A5 JP2017044533 A5 JP 2017044533A5 JP 2015166040 A JP2015166040 A JP 2015166040A JP 2015166040 A JP2015166040 A JP 2015166040A JP 2017044533 A5 JP2017044533 A5 JP 2017044533A5
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- timepiece
- component
- manufacturing
- oxide film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004519 manufacturing process Methods 0.000 claims description 9
- 238000005530 etching Methods 0.000 claims 4
- 238000000034 method Methods 0.000 claims 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 230000000149 penetrating Effects 0.000 claims 1
- 230000007261 regionalization Effects 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Description
また、この発明にかかる時計部品の製造方法は、上記の発明において、前記第１のレジストパタンが、前記所定領域の外側の部分を覆う部品外枠部と、前記時計部品の形状をなす部品形状部と、当該部品形状部と前記部品外枠部とを接続する部品接続部と、からなることを特徴とする。また、この発明にかかる時計部品の製造方法は、上記の発明において、前記部品接続部は、前記部品形状部との境界位置において細くなる形状であることを特徴とする。また、この発明にかかる時計部品の製造方法は、上記の発明において、前記接続部と前記部品接続部は、平面視で異なる位置に配置されていることを特徴とする。 In addition, in the method for manufacturing a watch part according to the present invention, in the above invention, the first resist pattern includes a part outer frame portion that covers an outer portion of the predetermined area, and a part shape that forms the shape of the watch part. And a component connecting portion that connects the component shape portion and the component outer frame portion. The timepiece component manufacturing method according to the present invention is characterized in that, in the above-described invention, the component connection portion has a shape that becomes narrower at a boundary position with the component shape portion. The timepiece component manufacturing method according to the present invention is characterized in that, in the above invention, the connection portion and the component connection portion are arranged at different positions in plan view.
Claims (6)
前記酸化膜形成工程において形成された酸化膜の表側面に、時計の駆動機構を構成する時計部品の形状に基づく第１のパタンの第１のレジストパタンを形成する第１のパタン形成工程と、
前記酸化膜および前記デバイス層に対して、前記第１のパタン形成工程において形成された第１のレジストパタン部分を残して残余を除去するエッチング加工をおこなう第１のエッチング工程と、
前記支持層の裏側面に、当該支持層の厚さ方向において前記第１のパタンと一部が重複し当該第１のパタンを含む所定領域の内側に配置され、当該支持層の厚さ方向に貫通する複数の貫通孔または溝を含む第２のパタンの第２のレジストパタンを形成する第２のパタン形成工程と、
前記支持層に対して、前記第２のパタン形成工程において形成された第２のレジストパタン部分を残して残余を除去するエッチング加工をおこなう第２のエッチング工程と、
前記所定領域の内側における前記中間層および前記酸化膜を除去する除去工程と、
を含むことを特徴とする時計部品の製造方法。 An oxide film forming step of forming an oxide film on the device layer of the laminated substrate in which the support layer made of silicon and the device layer made of silicon are laminated through the intermediate layer made of silicon dioxide;
A first pattern forming step of forming a first resist pattern of a first pattern based on a shape of a timepiece component constituting a timepiece driving mechanism on the front side surface of the oxide film formed in the oxide film forming step;
A first etching step of performing an etching process on the oxide film and the device layer to remove a residue while leaving the first resist pattern portion formed in the first pattern forming step;
A part of the back surface of the support layer overlaps with the first pattern in the thickness direction of the support layer and is disposed inside a predetermined region including the first pattern, and is arranged in the thickness direction of the support layer. A second pattern forming step of forming a second resist pattern of a second pattern including a plurality of through holes or grooves penetrating;
A second etching step of performing an etching process on the support layer to remove the remainder while leaving the second resist pattern portion formed in the second pattern formation step;
A removing step of removing the intermediate layer and the oxide film inside the predetermined region;
A method for manufacturing a watch part, comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015166040A JP6514993B2 (en) | 2015-08-25 | 2015-08-25 | Method of manufacturing watch parts |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015166040A JP6514993B2 (en) | 2015-08-25 | 2015-08-25 | Method of manufacturing watch parts |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017044533A JP2017044533A (en) | 2017-03-02 |
| JP2017044533A5 true JP2017044533A5 (en) | 2018-08-30 |
| JP6514993B2 JP6514993B2 (en) | 2019-05-15 |
Family
ID=58209784
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015166040A Active JP6514993B2 (en) | 2015-08-25 | 2015-08-25 | Method of manufacturing watch parts |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6514993B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3543796A1 (en) * | 2018-03-21 | 2019-09-25 | Nivarox-FAR S.A. | Method for manufacturing a silicon hairspring |
| JP7052625B2 (en) * | 2018-08-02 | 2022-04-12 | セイコーエプソン株式会社 | How to manufacture watch parts, movements, watches and watch parts |
| JP6908064B2 (en) * | 2019-03-14 | 2021-07-21 | セイコーエプソン株式会社 | Watch parts, watch movements and watches |
| CH716605A1 (en) | 2019-09-16 | 2021-03-31 | Richemont Int Sa | Method of manufacturing a plurality of resonators on a wafer. |
| CH719412A2 (en) * | 2022-02-11 | 2023-08-15 | Sigatec Sa | Process for manufacturing a silicon part. |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3928364B2 (en) * | 2001-03-21 | 2007-06-13 | セイコーエプソン株式会社 | clock |
| JP5176387B2 (en) * | 2007-05-18 | 2013-04-03 | 大日本印刷株式会社 | Membrane structure manufacturing method |
| DE102008061182A1 (en) * | 2008-12-04 | 2010-06-10 | Konrad Damasko | Manufacturing a microcomponent for mechanical clockwork of a wristwatch, comprises providing layer sequence consisting of carrier-, intermediate- and wearing layer, and cutting-off the microcomponent made of wearing layer by laser cutting |
| JP3203513U (en) * | 2013-03-22 | 2016-04-07 | オメガ・エス アー | Coaxial escapement integrated ankle |
-
2015
- 2015-08-25 JP JP2015166040A patent/JP6514993B2/en active Active
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