JP2017030266A5 - - Google Patents

Download PDF

Info

Publication number
JP2017030266A5
JP2017030266A5 JP2015153289A JP2015153289A JP2017030266A5 JP 2017030266 A5 JP2017030266 A5 JP 2017030266A5 JP 2015153289 A JP2015153289 A JP 2015153289A JP 2015153289 A JP2015153289 A JP 2015153289A JP 2017030266 A5 JP2017030266 A5 JP 2017030266A5
Authority
JP
Japan
Prior art keywords
substrate
manufacturing
liquid
microdevice
micro device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2015153289A
Other languages
Japanese (ja)
Other versions
JP2017030266A (en
JP6541499B2 (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2015153289A priority Critical patent/JP6541499B2/en
Priority claimed from JP2015153289A external-priority patent/JP6541499B2/en
Publication of JP2017030266A publication Critical patent/JP2017030266A/en
Publication of JP2017030266A5 publication Critical patent/JP2017030266A5/ja
Application granted granted Critical
Publication of JP6541499B2 publication Critical patent/JP6541499B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Claims (10)

第1の基板と第2の基板が積層されて構成されるマイクロデバイスの製造方法であって、
2つの前記第1の基板を、仮接着層を介して、互いの面を接着する仮接着工程と、
前記第1の基板における前記面とは反対の面に、前記第2の基板を接合し、前記第1の基板と前記第2の基板とを積層する積層工程と、
前記仮接着層を剥離する剥離工程と
を有することを特徴とするマイクロデバイスの製造方法。
A method of manufacturing a microdevice configured by laminating a first substrate and a second substrate,
A temporary bonding step of bonding the two first substrates to each other through a temporary bonding layer;
A laminating step of bonding the second substrate to a surface opposite to the surface of the first substrate, and laminating the first substrate and the second substrate;
A microdevice manufacturing method comprising: a peeling step of peeling the temporary adhesive layer.
前記仮接着工程と前記積層工程の間に、前記第1の基板に所定の構造を形成するための加工工程を有する請求項1に記載のマイクロデバイスの製造方法。   The method for manufacturing a microdevice according to claim 1, further comprising a processing step for forming a predetermined structure on the first substrate between the temporary bonding step and the laminating step. 前記加工工程は、ウェットエッチング、ドライエッチング、機械的な加工、の少なくともいずれかを含んでいる請求項2に記載のマイクロデバイスの製造方法。   The method of manufacturing a microdevice according to claim 2, wherein the processing step includes at least one of wet etching, dry etching, and mechanical processing. 前記加工工程は、前記第1の基板の厚みを薄くする工程を含む請求項2または3に記載のマイクロデバイスの製造方法。   The method of manufacturing a microdevice according to claim 2, wherein the processing step includes a step of reducing the thickness of the first substrate. 前記所定の構造は、前記第1の基板に対する貫通穴、閉塞穴、溝、凹部の少なくともいずれかを含んでいる請求項2ないし4のいずれか1項に記載のマイクロデバイスの製造方法。   5. The method of manufacturing a micro device according to claim 2, wherein the predetermined structure includes at least one of a through hole, a blocking hole, a groove, and a recess with respect to the first substrate. 前記積層工程において、前記第1の基板の厚みは100μm以上かつ600μm以下である請求項1ないし5のいずれかに記載のマイクロデバイスの製造方法。   6. The method of manufacturing a micro device according to claim 1, wherein in the stacking step, the thickness of the first substrate is not less than 100 μm and not more than 600 μm. 前記マイクロデバイスは、液体吐出ヘッド用の積層基板であり、
前記第1の基板には液体を供給するための供給口が形成され、
前記第2の基板には、液体を吐出する吐出口と、前記供給口から供給された液体を前記吐出口まで導く流路と、前記吐出口から液体を吐出させるエネルギを発生させるためのエネルギ発生素子とが備えられている請求項1ないし6のいずれか1項に記載のマイクロデバイスの製造方法。
The micro device is a laminated substrate for a liquid discharge head,
A supply port for supplying a liquid is formed in the first substrate,
The second substrate has a discharge port for discharging a liquid, a flow path for guiding the liquid supplied from the supply port to the discharge port, and energy generation for generating energy for discharging the liquid from the discharge port. The method for manufacturing a microdevice according to claim 1, further comprising an element.
前記マイクロデバイスは、液体吐出ヘッド用の積層基板であり、
前記第1の基板には、液体を吐出させるエネルギを発生させるためのエネルギ発生素子と、当該エネルギ発生素子まで液体を導く流路とが備えられ、
前記第2の基板には前記流路に液体を供給するための供給口が備えられている請求項1ないし6のいずれか1項に記載のマイクロデバイスの製造方法。
The micro device is a laminated substrate for a liquid discharge head,
The first substrate includes an energy generating element for generating energy for discharging the liquid, and a flow path for guiding the liquid to the energy generating element.
The method for manufacturing a microdevice according to claim 1, wherein the second substrate is provided with a supply port for supplying a liquid to the flow path.
前記エネルギ発生素子は、前記第1の基板の前記仮接着層に接触する面に予め形成されている請求項8に記載のマイクロデバイスの製造方法。   The method of manufacturing a micro device according to claim 8, wherein the energy generating element is formed in advance on a surface of the first substrate that contacts the temporary adhesive layer. 前記仮接着工程によって仮接着される前記2つの第2の基板は、厚みまたは構造が異なっている請求項1ないし9のいずれか1項に記載のマイクロデバイスの製造方法。   10. The method of manufacturing a microdevice according to claim 1, wherein the two second substrates that are temporarily bonded in the temporary bonding step have different thicknesses or structures.
JP2015153289A 2015-08-03 2015-08-03 Method of manufacturing micro device Expired - Fee Related JP6541499B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2015153289A JP6541499B2 (en) 2015-08-03 2015-08-03 Method of manufacturing micro device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015153289A JP6541499B2 (en) 2015-08-03 2015-08-03 Method of manufacturing micro device

Publications (3)

Publication Number Publication Date
JP2017030266A JP2017030266A (en) 2017-02-09
JP2017030266A5 true JP2017030266A5 (en) 2018-07-12
JP6541499B2 JP6541499B2 (en) 2019-07-10

Family

ID=57987012

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015153289A Expired - Fee Related JP6541499B2 (en) 2015-08-03 2015-08-03 Method of manufacturing micro device

Country Status (1)

Country Link
JP (1) JP6541499B2 (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE544594T1 (en) * 2006-12-22 2012-02-15 Telecom Italia Spa INKJET PRINTHEAD MANUFACTURING METHOD
JP5775809B2 (en) * 2011-12-21 2015-09-09 新電元工業株式会社 Manufacturing method of semiconductor device

Similar Documents

Publication Publication Date Title
JP2016033967A5 (en)
JP2013069808A5 (en)
JP2014032960A5 (en) Method for manufacturing display device
JP2016029161A5 (en)
JP2015172480A5 (en)
JP2013069807A5 (en)
JP2014192386A5 (en)
MY184180A (en) Wafer-processing tape
PH12018500798B1 (en) First protective film-forming sheet, method for forming first protective film, and method for manufacturing semiconductor chip
JP2016225415A5 (en)
JP2015518270A5 (en)
JP2012525719A5 (en)
JP2015097734A5 (en)
JP2018110149A5 (en)
WO2014017871A3 (en) Semiconductor light-emitting device
JP2013070112A5 (en)
JP2018202826A5 (en)
JP2015129830A5 (en)
JP2017030266A5 (en)
JP2015128195A5 (en)
JP2013062296A5 (en)
JP2016507396A5 (en)
JP2013115352A5 (en)
JP2016064540A5 (en)
JP2017188528A5 (en)