JP2017014616A - Vapor deposition device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a vapor deposition device that is facilitated in maintenance work for an evaporation source.SOLUTION: The vapor deposition device includes an evaporation source installation part 40 provided with the evaporation source 2 for storing a vapor deposition material to perform vapor deposition. The vapor deposition device includes: a shielding part 5 surrounding the evaporation source installation part 40; and a restriction plate 4 provided in an upper position of the shielding part 5 to restrict an incidence angle of an evaporation particle of a deposition material discharged toward a substrate 1 from the evaporation source 2 provided to the evaporation source installation part 40 to the substrate 1, where the restriction plate 4 is movable relative to the shielding part 5 and the shielding part 5 is provided with an opening/closing part 6.SELECTED DRAWING: Figure 2

Description

  The present invention relates to a vapor deposition apparatus.

A vapor deposition apparatus for depositing a film forming material evaporated and ejected from an evaporation source on a substrate to form a thin film,
It is widely used in the manufacture of organic EL devices, and various devices have been devised to meet the manufacturing requirements. Patent Document 1 discloses that a limiting plate is provided on the outer wall of the evaporation source storage portion in which the evaporation source is stored in order to limit the radiation range of the vapor of the film forming material released from the evaporation source.

JP 2011-68980 A

  However, in the case of the above configuration, it is necessary to remove and fix the restriction plate every time maintenance work such as cleaning of the evaporation source or replenishment or replacement of the film forming material accommodated in the evaporation source is performed, and the efficiency of the maintenance work is reduced. To do.

  The present invention solves the problems as described above, and provides a vapor deposition apparatus that facilitates maintenance work of an evaporation source.

  The gist of the present invention will be described with reference to the accompanying drawings.

  A first aspect of the present invention is a vapor deposition apparatus including an evaporation source installation unit for installing an evaporation source 2 for vapor deposition on a substrate 1 in an evaporation chamber, and a shielding unit 5 surrounding the evaporation source installation unit 40. The shielding unit 5 is provided with a limiting plate 4 for limiting the incident angle of the evaporation particles of the film forming material emitted from the evaporation source 2 installed in the evaporation source installation unit 40 toward the substrate 1 to the substrate 1. It is the vapor deposition apparatus characterized by having provided the opening-closing part 6 in the said shielding part 5, and having the structure provided in the upper position.

  Further, the limiting plate 4 relates to a vapor deposition apparatus characterized in that it is provided on a fixed support member that does not open and close even during maintenance.

  The opening / closing unit 6 is closed during vapor deposition and is opened during maintenance.

  The fixing support member 7 is a vapor deposition apparatus characterized in that the fixing support member 7 is configured in a frame shape having an opening allowing the opening / closing operation of the opening / closing portion 6.

  Further, the fixed support member 7 relates to a vapor deposition apparatus characterized in that it is provided at a position where it does not interfere with the opening / closing operation of the opening / closing part 6.

  The vapor deposition apparatus is characterized in that the opening / closing part 6 is provided at a position facing the side surface in the longitudinal direction of the evaporation source 2 as the shielding part 5 surrounding the side peripheral surface of the evaporation source 2. is there.

  The shielding unit 5 is configured so that the evaporation source 2 is exposed from the opening / closing part 6 over the entire length in the longitudinal direction when the opening / closing part 6 is in the open state. is there.

  Further, the limiting plate 4 relates to a vapor deposition apparatus characterized by being provided movably with respect to the shielding part 5.

  The shutter 9 that opens and closes the opening 10 of the shielding part 5 that surrounds the four sides of the evaporation source 2 is movably provided with respect to the shielding part 5.

  According to a second aspect of the present invention, there is provided a vapor deposition apparatus comprising: an evaporation source installation unit that installs an evaporation source that accommodates a film forming material; and a shielding unit that surrounds the evaporation source installation unit. Has an open / close structure.

  According to the vapor deposition apparatus concerning this invention, since it becomes easy to perform the maintenance operation | work of an evaporation source, the time required for a maintenance can be shortened.

It is a schematic explanatory perspective view of a present Example. It is a schematic explanatory sectional drawing of a present Example. It is a schematic explanatory sectional drawing of a present Example. It is a schematic explanatory side view of a present Example.

  Embodiments of the vapor deposition apparatus according to the present invention will be described with specific examples.

  1 and 2 are views showing an embodiment of a vapor deposition apparatus according to the present invention. FIG. 1 is a perspective view of the internal structure of the vapor deposition apparatus, and these structures are provided in a vacuum chamber (not shown). FIG. 2 is a sectional view of FIG. 1 in the short direction of the evaporation source support 3.

  First, after describing the main configuration of the vapor deposition apparatus according to the present invention, other configurations will be described.

  An evaporation source installation unit 40 is provided on the upper surface of the evaporation source support 3, and the evaporation source 2 containing a film forming material is installed in the evaporation source installation unit 40. On the upper surface of the evaporation source support 3, a shielding part 5 surrounding the four sides of the evaporation source 2 is further provided. In this specification, the shielding part 5 exists around the evaporation source 2 except the lower part of the evaporation source 2 (the bottom surface of the vapor deposition chamber in which the evaporation source is installed) and the upper part (the substrate side of the evaporation source). The state is expressed as "enclosed on all sides". In other words, the shielding part 5 exists on the side periphery of the evaporation source. The shielding part 5 is preferably arranged so as to prevent the film-forming material from scattering in the lateral direction of the evaporation source.

  The evaporation source 2 is a so-called line source that is elongated in one direction, and has a configuration in which an upper lid (not shown) in which a large number of material discharge ports 11 are arranged side by side is detachably provided on the container body. . The evaporation source 2 is provided with a material container for containing the film forming material. By removing the upper cover, the film forming material in the material container can be replenished or replaced.

  The evaporation source 2 is detachably installed in the evaporation source installation unit 40. Since the evaporation source installation part 40 has substantially the same area as the bottom surface of the evaporation source 2, the shielding part 5 provided around the evaporation source 2 is provided around the evaporation source installation part 40. It will be. Further, the evaporation source installation unit 40 is provided with a positioning member (not shown) for determining the installation position of the evaporation source 2. Therefore, once the evaporation source 2 is removed, it can be installed again at the same position.

  The shielding unit 5 is composed of a member surrounding the side peripheral surface of the evaporation source 2, and shields the vapor of the film forming material released from the evaporation source 2. In the present embodiment, the shielding member 5 having a rectangular shape in a plan view is configured by vertically standing the respective members on the evaporation source 2, that is, the evaporation source installation portion 40. A fixed support member 7 is further provided on the upper surface of the evaporation source support 3, and vapor deposition particles of the film forming material released from the evaporation source 2 toward the substrate 1 are applied to the substrate 1 on the fixed support member 7. In order to limit the incident angle, a limiting plate 4 is provided. The limiting plate 4 is disposed above the shielding part 5.

  If the amount of material accommodated in the evaporation source 2 is reduced by film formation, the film formation rate becomes unstable, and a predetermined film thickness cannot be obtained or the film quality is deteriorated. In order to suppress the occurrence of such a situation, maintenance of the evaporation source 2 is performed. At the time of vapor deposition apparatus maintenance, the upper lid of the evaporation source 2 is removed to clean the inside, and the film forming material is replenished in a container that accommodates the material provided therein. Since the interval at which maintenance is required depends on the film formation time and the film formation speed, the frequency of maintenance increases when the vapor deposition apparatus is used as a mass production machine.

  However, since the four sides of the evaporation source 2 are surrounded by the shield 5, maintenance is very difficult in this state. In the case of the present embodiment, the restriction plate 4 is further disposed above the evaporation source 2, which is more difficult. In the configuration of the conventional vapor deposition apparatus disclosed in Patent Document 1, it is necessary to remove and fix a member provided surrounding the evaporation source such as a limiting plate every time maintenance work is performed, and the efficiency of the maintenance work is reduced.

  Therefore, in the vapor deposition apparatus according to the present invention, the shielding unit 5 is provided with an opening / closing structure, and the opening / closing structure changes the state in which the shielding unit 5 surrounds the evaporation source (closed state) and the state in which the evaporation source is exposed (open state). A possible opening / closing part 6 for maintenance is provided. For example, the opening / closing part 6 can be closed during vapor deposition, and the opening / closing part 6 can be opened using an opening / closing structure during maintenance. Thereby, the efficiency of the maintenance work is improved.

  Specifically, the shielding unit 5 is positioned on the side surface in the short direction of the evaporation source 2 and fixed to the evaporation source support 3, and a pair of opposing fixing members 14 and the evaporation source 2 in the longitudinal direction. It is composed of a pair of movable members 15 that are located on the side surface and can be moved relative to the fixed member 14 between the pair of fixed members 14.

  The movable member 15 is longer than the longitudinal direction of the evaporation source 2, and the pair of movable members 15 are disposed to face each other between the pair of fixed members 14. Both end portions of the movable member 15 are pivotally attached to the lower part of the inner surface of the fixed member 14 by the pivoting portion 17, and the movable member 15 is rotated by the pivoting portion 17 so that the movable member 15 is opened outward from the vertically standing state. It is possible to do this. With such an opening / closing structure, the opening / closing part 6 is realized which can be changed between a state where the evaporation source 2 is shielded over the entire length in the longitudinal direction and an exposed state.

  In this embodiment, the shielding unit 5 has a function of shielding heat generated from the evaporation source 2 in addition to a function of shielding vapor of the film forming material released from the evaporation source 2. Accordingly, the fixed member 14 and the movable member 15 are cooling plates provided with a refrigerant flow passage 13 through which a refrigerant such as water flows, and the inner surface of the movable member 15 is blocked to close the refrigerant flow passage 13. A plate 16 is provided.

  The fixed support member 7 is configured in a frame shape having an opening that allows the opening / closing operation of the opening / closing portion 6. Specifically, the fixed support member 7 has four leg portions 18 provided at positions that do not interfere with the opening / closing operation of the opening / closing portion 6, and a horizontal member is constructed on the upper end of the leg portion 18.

  The four leg portions 18 are erected from the evaporation source 2 at positions outside the shaft attachment portions 17 used for opening and closing each fixing member 14. That is, the distance between the leg portions 18 in the longitudinal direction of the evaporation source is longer than the length of the movable member in the longitudinal direction of the evaporation source.

  The horizontal member has a pair of short horizontal members 19 parallel to the fixed member 14 and a pair of long horizontal members 20 parallel to the movable member 15. The height of each leg 18 is set such that the horizontal members (19, 20) are provided at a position higher than the upper end of the movable member 15.

  Therefore, the evaporation source 2 is arranged in a region surrounded by the frame-shaped fixed support member 7 constituted by the four legs 18 and the horizontal member. In this embodiment, the fixed support member 7 is formed of an angle member having an L shape in cross section.

  A pair of limiting plates 4 is provided on the long horizontal member 20 that is the upper surface of the fixed support member 7.

  By providing the limiting plate 4, the angle at which the vapor deposition particles of the film forming material enter the substrate 1 is limited, and in the film formation using the mask, the vapor deposition particles incident on the substrate at an angle that enters between the mask and the substrate. Can be shielded.

  The limiting plate 4 can be moved horizontally by a slide guide member provided on the long horizontal member 20, and can be freely moved close to and away from the limiting plate 4, and can be fixed at a desired position. The limiting plate 4 has substantially the same length as the long horizontal member 20, and the incident angle can be easily adjusted by adjusting the distance between the pair of limiting plates 4.

  3 and 4 show a state in which the evaporation source 2 is exposed over the entire length in the longitudinal direction by opening and turning the movable member 15. 3 is a view as seen from the longitudinal direction of the evaporation source 2, and FIG. 4 is a view as seen from the shorter direction of the evaporation source 2. In this manner, by exposing the evaporation source 2 over the entire length in the longitudinal direction, it is possible to easily remove the upper lid of the evaporation source 2 and the like. That is, by providing the opening / closing part 6, it is not necessary to remove and fix the members provided around the evaporation source 2, thereby improving maintenance workability. In the figure, the pair of movable members 15 located on the side surfaces in the longitudinal direction are configured to be openable and closable. However, if maintenance work is possible, the movable members 15 are provided only on one of the side surfaces in the longitudinal direction. The other may be a fixing member.

  In particular, the position of the limiting plate 4 for limiting the angle at which the vapor deposition particles of the film forming material are incident on the substrate 1 is important. Therefore, once the removal plate 4 is removed, it takes a considerable time to reproduce the state before the removal. Cost. However, since the vapor deposition apparatus of the present invention has the maintenance opening / closing portion 6, the movable member 15 that is closed during vapor deposition can be easily maintained by opening the movable member 15 during maintenance. it can. Thus, since it is not necessary to remove the restriction plate 4 at the time of maintenance, maintenance can be performed while maintaining the position of the restriction plate 4, and the workability of maintenance is remarkably improved. After the maintenance is completed, the movable member 15 can be closed again to easily return the vapor deposition state.

  Next, another specific configuration of the vapor deposition apparatus of the present embodiment will be described in detail with reference to FIGS.

  In this embodiment, a shutter 9 that opens and closes the opening 10 of the shielding part 5 surrounding the evaporation source 2 is movably provided. A pair of shutters 9 are provided and are slightly longer than the movable member 15 and are disposed so as to be able to close the opening 10 of the shielding part 5. Specifically, both end portions of each shutter 9 are provided on the fixing member 14 via the slide guide member 21. Then, the shutters 9 move close to and away from each other on the fixing member 14 to open and close the opening 10.

  Further, the shutter 9 includes a horizontal plate portion 22 that closes the opening 10 of the shielding portion 5, and a vertical plate portion 23 that closes the gap between the long horizontal member 20 and the movable member 15 of the fixed support member 7. It is said. The vertical plate portion 23 is formed by providing an angle member having an L-shape in sectional view slightly shorter than the horizontal member 22 on the upper surface of the horizontal plate portion 22.

  In the state where the shutter 9 is closed, the horizontal plate portions 22 and the like are configured such that the opposing portions of the horizontal plate portion 22 overlap each other. In the state where the shutter 9 is opened during vapor deposition, the horizontal plate portion 22 is a long horizontal member. The gap (most part) between 20 and the movable member 15 is closed (see FIGS. 1 and 2).

  Specifically, the shielding portion 5 has a rectangular closing plate that is slightly smaller in width than the facing distance between the pair of movable members 15 and higher than the fixed member 14 inside the fixed member 14. The body 8 is included.

  The closing plate 8 includes folding portions 25 and 26 provided at both ends in the longitudinal direction and the outer end in the width direction of the shutter 9 and both ends of the closing plate 16 provided on the inner surface side of the movable member 15. The folding portion 27 provided in the upper portion of the shutter is overlapped when the shutter 9 and the movable member 15 are closed. Therefore, the opening 10 of the shielding part 5 where the shutter 9 is closed is specifically the opening 10 in the space surrounded by the closing plate 8 and the movable member 15.

  In this embodiment, the folded portion 27 of the closing plate 16 of the movable member 15 overlaps the outside of the closing plate 8, and the folded portions 25 and 26 of the shutter 9 overlap the outside of the closing plate 16. doing. Accordingly, leakage of the film forming material from both ends in the longitudinal direction of the evaporation source 2 is surely prevented, and the evaporation source 2 can be used in the space for the break-in operation before vapor deposition. It becomes possible to carry out in a confined state.

  From the above, according to the present embodiment, as shown in FIGS. 1 and 2, during the vapor deposition, the shutter 9 is opened to open the opening 10 of the shielding part 5, and the vapor deposition is performed while the incident angle is limited by the limiting plate 4. It can be performed.

  Also, during maintenance of the evaporation source 2 and the like, as shown in FIGS. 3 and 4, the shutter 9 is opened to a position where the movable member 15 and the closing plate 16 do not interfere with each other, and the movable member 15 is opened and rotated outward to be fixedly supported. The evaporation source 2 is exposed over the entire length from the space surrounded by the legs 18 of the member 7 and the long horizontal member 20. In this state, it is possible to remove the upper lid of the evaporation source 2 and take it out from the shielding part 5 to perform cleaning and replenishment of the film forming material, thereby shortening the maintenance time. Further, not only the maintenance of the evaporation source 2, but also when cleaning other members such as the fixed member 14, the movable member 15, and the shutter 9, there is no need to touch the limiting plate 4 provided on the fixed support member 7, and once The set incident angle can be maintained before and after maintenance. Further, fine adjustment of the incident angle can be easily performed by adjusting the degree of separation of the limiting plate 4.

  Moreover, the evaporation source support 3 of the present embodiment includes a slider. Specifically, a rail 31 extending in the first direction is provided on the bottom surface of the vapor deposition chamber, and a frame-shaped first-direction moving slider 32 capable of reciprocating sliding with respect to the rail 31 is provided. A rail 33 extending in the second movement direction is provided on the upper surface of the first direction movement slider 32, and the second direction movement slider 35 capable of reciprocating sliding with respect to the rail 33 is provided below the evaporation source support 3. Provided. An arm member 34 for moving the evaporation source support 3 is connected to the bottom surface of the evaporation source support 3. The arm member 34 is driven to move the evaporation source support 3 (evaporation source 2) in the first direction. Or it can be moved in the second direction.

  Therefore, for example, two vapor deposition regions are arranged in parallel in the first direction, and one evaporation source 2 is reciprocated in the film deposition movement direction (second direction) in one vapor deposition region, and then vapor deposition is performed. It is possible to perform film formation in the same manner in other vapor deposition regions by moving in the region movement direction (first direction). In the case of the present embodiment, when film formation is performed in one vapor deposition region, the evaporation source 2 is moved in a direction intersecting the longitudinal direction of the evaporation source 2 to perform film formation.

  Note that the present invention is not limited to this embodiment, and the specific configuration of each component can be designed as appropriate.

DESCRIPTION OF SYMBOLS 1 Board | substrate 2 Evaporation source 4 Restriction board 5 Shielding part 6 Opening / closing part 7 Fixed support member 9 Shutter
10 opening
40 Evaporation source installation section

Claims (15)

  A vapor deposition apparatus provided in a vapor deposition chamber with an evaporation source installation unit for installing an evaporation source for containing a film forming material, wherein a shielding unit surrounding the evaporation source installation unit is provided and installed in the evaporation source installation unit A limiting plate that restricts the incident angle of the evaporation particles of the film forming material emitted from the evaporation source toward the substrate to the substrate is provided above the shielding portion, and the opening and closing portion is provided in the shielding portion. A vapor deposition apparatus characterized by being provided.   The vapor deposition apparatus according to claim 1, wherein the limiting plate is provided on a fixed support member that does not open and close even during maintenance.   The vapor deposition apparatus according to claim 1, wherein the opening / closing part is closed during vapor deposition and opened during maintenance.   The vapor deposition apparatus according to claim 1, wherein the fixed support member is configured in a frame shape having an opening that allows an opening / closing operation of the opening / closing portion.   The vapor deposition apparatus according to claim 1, wherein the fixed support member is provided at a position that does not interfere with an opening / closing operation of the opening / closing portion.   6. The opening / closing part is provided at a position facing the side surface in the longitudinal direction of the evaporation source installation part as the shielding part surrounding four sides of the evaporation source installation part. The vapor deposition apparatus of description.   The said shielding part was comprised so that when the said opening / closing part was made into the open state, the evaporation source installed in the said evaporation source installation part was exposed from this opening / closing part over the longitudinal direction full length. The vapor deposition apparatus of description.   The vapor deposition apparatus according to claim 1, wherein the limiting plate is provided so as to be movable with respect to the shielding portion.   The vapor deposition apparatus according to claim 1, wherein a shutter that opens and closes an opening of the shielding unit surrounding the evaporation source installation unit is provided movably with respect to the shielding unit. An evaporation apparatus comprising: an evaporation source installation unit for installing an evaporation source that accommodates a film forming material; and a shielding unit that surrounds the four sides of the evaporation source installation unit,
The vapor deposition apparatus, wherein the shielding part has an open / close structure. The evaporation source installation part is provided on an evaporation source support,
The shielding portion includes a pair of fixing members opposed to each other with the evaporation source installation portion interposed therebetween, and a pair of members opposed to each other across the evaporation source installation portion between the pair of fixing members;
The pair of fixing members are fixed to the evaporation source support,
11. The vapor deposition apparatus according to claim 10, wherein at least one of the pair of members is a movable member that is pivotally attached to lower portions of the inner surfaces of the pair of fixed members by axially attached portions provided at both ends. The evaporation source installation part has a long shape in one direction,
The vapor deposition apparatus according to claim 11, wherein the movable part is provided along a longitudinal direction of the evaporation source installation part.   The said evaporation source support body is provided with the frame-shaped fixed support member surrounding the said evaporation source installation part, The limiting plate is provided in the upper surface of the said fixed support member, It is characterized by the above-mentioned. 13. The vapor deposition apparatus according to any one of items 12.   The vapor deposition according to claim 13, wherein an interval in the longitudinal direction of the evaporation source installation portion of the frame constituting the fixed support member is longer than a length of the movable portion in the longitudinal direction of the evaporation source installation portion. apparatus.   A vapor deposition apparatus in which a vapor deposition chamber is provided with an evaporation source for performing vapor deposition on a substrate through a mask, and a shielding part surrounding the vapor deposition source is provided, and a film forming material scattered from the vaporization source toward the substrate A restriction plate for restricting the incident angle to the substrate is provided above the shielding part, and the shielding part is provided with a maintenance opening / closing part that opens and closes during the maintenance to conceal the evaporation source. A vapor deposition apparatus characterized in that the plate is provided on a fixed support member that does not open and close even during maintenance.

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