JP2017002382A5 - - Google Patents

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Publication number
JP2017002382A5
JP2017002382A5 JP2015119882A JP2015119882A JP2017002382A5 JP 2017002382 A5 JP2017002382 A5 JP 2017002382A5 JP 2015119882 A JP2015119882 A JP 2015119882A JP 2015119882 A JP2015119882 A JP 2015119882A JP 2017002382 A5 JP2017002382 A5 JP 2017002382A5
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JP
Japan
Prior art keywords
processing apparatus
vacuum
plasma processing
vacuum vessel
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2015119882A
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English (en)
Japanese (ja)
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JP6567886B2 (ja
JP2017002382A (ja
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Priority to JP2015119882A priority Critical patent/JP6567886B2/ja
Priority claimed from JP2015119882A external-priority patent/JP6567886B2/ja
Publication of JP2017002382A publication Critical patent/JP2017002382A/ja
Publication of JP2017002382A5 publication Critical patent/JP2017002382A5/ja
Application granted granted Critical
Publication of JP6567886B2 publication Critical patent/JP6567886B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2015119882A 2015-06-15 2015-06-15 プラズマ処理装置 Active JP6567886B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2015119882A JP6567886B2 (ja) 2015-06-15 2015-06-15 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015119882A JP6567886B2 (ja) 2015-06-15 2015-06-15 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2017002382A JP2017002382A (ja) 2017-01-05
JP2017002382A5 true JP2017002382A5 (zh) 2018-07-26
JP6567886B2 JP6567886B2 (ja) 2019-08-28

Family

ID=57753470

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015119882A Active JP6567886B2 (ja) 2015-06-15 2015-06-15 プラズマ処理装置

Country Status (1)

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JP (1) JP6567886B2 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108828243B (zh) * 2018-04-23 2021-12-14 济南鲁瑞生物科技有限公司 常规临床检验仪器
US11244803B2 (en) * 2020-01-23 2022-02-08 Hitachi High-Tech Corporation Plasma processing apparatus and operating method of plasma processing apparatus

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5529673A (en) * 1995-02-17 1996-06-25 Sony Corporation Mechanically joined sputtering target and adapter therefor
JP3527450B2 (ja) * 1999-12-22 2004-05-17 東京エレクトロン株式会社 処理装置
JP2007260624A (ja) * 2006-03-29 2007-10-11 Tokyo Electron Ltd 真空装置に用いる真空容器及びその製造方法
JP2008024975A (ja) * 2006-07-19 2008-02-07 Phyzchemix Corp 半導体製造装置
JP5549552B2 (ja) * 2010-11-12 2014-07-16 東京エレクトロン株式会社 真空処理装置の組み立て方法及び真空処理装置

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