JP2016512394A - 半導体のための自立型金属物品 - Google Patents
半導体のための自立型金属物品 Download PDFInfo
- Publication number
- JP2016512394A JP2016512394A JP2016500396A JP2016500396A JP2016512394A JP 2016512394 A JP2016512394 A JP 2016512394A JP 2016500396 A JP2016500396 A JP 2016500396A JP 2016500396 A JP2016500396 A JP 2016500396A JP 2016512394 A JP2016512394 A JP 2016512394A
- Authority
- JP
- Japan
- Prior art keywords
- metal article
- layer
- metal
- conductive
- self
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 295
- 239000002184 metal Substances 0.000 title claims abstract description 295
- 239000004065 semiconductor Substances 0.000 title claims abstract description 90
- 239000000463 material Substances 0.000 claims abstract description 49
- 239000010410 layer Substances 0.000 claims description 167
- 238000000034 method Methods 0.000 claims description 89
- 229910000679 solder Inorganic materials 0.000 claims description 47
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 44
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 31
- 229910052802 copper Inorganic materials 0.000 claims description 31
- 239000010949 copper Substances 0.000 claims description 31
- 229910052759 nickel Inorganic materials 0.000 claims description 22
- 238000005323 electroforming Methods 0.000 claims description 21
- 229910052709 silver Inorganic materials 0.000 claims description 21
- 239000004332 silver Substances 0.000 claims description 21
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 20
- 230000007246 mechanism Effects 0.000 claims description 19
- 239000011248 coating agent Substances 0.000 claims description 12
- 238000000576 coating method Methods 0.000 claims description 12
- 238000005530 etching Methods 0.000 claims description 9
- 230000003667 anti-reflective effect Effects 0.000 claims description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 239000002344 surface layer Substances 0.000 claims 6
- 230000008878 coupling Effects 0.000 claims 4
- 238000010168 coupling process Methods 0.000 claims 4
- 238000005859 coupling reaction Methods 0.000 claims 4
- 238000010438 heat treatment Methods 0.000 claims 4
- 239000002019 doping agent Substances 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 abstract description 22
- 210000004027 cell Anatomy 0.000 description 143
- 229920000642 polymer Polymers 0.000 description 48
- 230000008569 process Effects 0.000 description 32
- 238000007747 plating Methods 0.000 description 25
- 239000006117 anti-reflective coating Substances 0.000 description 22
- 230000004888 barrier function Effects 0.000 description 11
- 238000009713 electroplating Methods 0.000 description 11
- 229910052738 indium Inorganic materials 0.000 description 9
- 238000001465 metallisation Methods 0.000 description 9
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 8
- 238000000059 patterning Methods 0.000 description 7
- 239000011295 pitch Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 230000006870 function Effects 0.000 description 6
- 238000012546 transfer Methods 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 238000005476 soldering Methods 0.000 description 5
- 229920002397 thermoplastic olefin Polymers 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000012790 adhesive layer Substances 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000005038 ethylene vinyl acetate Substances 0.000 description 4
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 4
- 238000007650 screen-printing Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- DQXBYHZEEUGOBF-UHFFFAOYSA-N but-3-enoic acid;ethene Chemical compound C=C.OC(=O)CC=C DQXBYHZEEUGOBF-UHFFFAOYSA-N 0.000 description 3
- 238000007772 electroless plating Methods 0.000 description 3
- 229920002313 fluoropolymer Polymers 0.000 description 3
- 239000004811 fluoropolymer Substances 0.000 description 3
- 238000003754 machining Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000002161 passivation Methods 0.000 description 3
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 3
- 239000000565 sealant Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000009736 wetting Methods 0.000 description 3
- 229910000846 In alloy Inorganic materials 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 238000004873 anchoring Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910021334 nickel silicide Inorganic materials 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 229920000307 polymer substrate Polymers 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- 229910001152 Bi alloy Inorganic materials 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 229910001374 Invar Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- YCOASTWZYJGKEK-UHFFFAOYSA-N [Co].[Ni].[W] Chemical compound [Co].[Ni].[W] YCOASTWZYJGKEK-UHFFFAOYSA-N 0.000 description 1
- FEBFYWHXKVOHDI-UHFFFAOYSA-N [Co].[P][W] Chemical compound [Co].[P][W] FEBFYWHXKVOHDI-UHFFFAOYSA-N 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- MPZNMEBSWMRGFG-UHFFFAOYSA-N bismuth indium Chemical compound [In].[Bi] MPZNMEBSWMRGFG-UHFFFAOYSA-N 0.000 description 1
- BGTFCAQCKWKTRL-YDEUACAXSA-N chembl1095986 Chemical compound C1[C@@H](N)[C@@H](O)[C@H](C)O[C@H]1O[C@@H]([C@H]1C(N[C@H](C2=CC(O)=CC(O[C@@H]3[C@H]([C@@H](O)[C@H](O)[C@@H](CO)O3)O)=C2C=2C(O)=CC=C(C=2)[C@@H](NC(=O)[C@@H]2NC(=O)[C@@H]3C=4C=C(C(=C(O)C=4)C)OC=4C(O)=CC=C(C=4)[C@@H](N)C(=O)N[C@@H](C(=O)N3)[C@H](O)C=3C=CC(O4)=CC=3)C(=O)N1)C(O)=O)=O)C(C=C1)=CC=C1OC1=C(O[C@@H]3[C@H]([C@H](O)[C@@H](O)[C@H](CO[C@@H]5[C@H]([C@@H](O)[C@H](O)[C@@H](C)O5)O)O3)O[C@@H]3[C@H]([C@@H](O)[C@H](O)[C@@H](CO)O3)O[C@@H]3[C@H]([C@H](O)[C@@H](CO)O3)O)C4=CC2=C1 BGTFCAQCKWKTRL-YDEUACAXSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- ZGDWHDKHJKZZIQ-UHFFFAOYSA-N cobalt nickel Chemical compound [Co].[Ni].[Ni].[Ni] ZGDWHDKHJKZZIQ-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- QLTKZXWDJGMCAR-UHFFFAOYSA-N dioxido(dioxo)tungsten;nickel(2+) Chemical compound [Ni+2].[O-][W]([O-])(=O)=O QLTKZXWDJGMCAR-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- RUFLMLWJRZAWLJ-UHFFFAOYSA-N nickel silicide Chemical compound [Ni]=[Si]=[Ni] RUFLMLWJRZAWLJ-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910000969 tin-silver-copper Inorganic materials 0.000 description 1
- 238000009489 vacuum treatment Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000003631 wet chemical etching Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/022441—Electrode arrangements specially adapted for back-contact solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/022433—Particular geometry of the grid contacts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/05—Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells
- H01L31/0504—Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells specially adapted for series or parallel connection of solar cells in a module
- H01L31/0508—Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells specially adapted for series or parallel connection of solar cells in a module the interconnection means having a particular shape
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
Landscapes
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Sustainable Energy (AREA)
- Photovoltaic Devices (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electrodes Of Semiconductors (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
本出願は、「Free−Standing Metallic Article for Semiconductors」と題され、2013年3月13日付けで提出され、米国特許出願第8,569,096号として発行された米国特許出願第13/798,124号に対する優先権を主張するものであり、また米国特許第8,569,096号の特許となる、当該米国特許出願は本出願の譲受人により所有され、参照により本明細書に組み込まれる。本出願は、1)「Free−Standing Metallic Article for Semiconductors」と題され、2013年3月13日付けで提出された、Babayan et al.による、米国特許出願第13/798,123号、2)「Free−Standing Metallic Article for Semiconductors」と題され、2013年3月13日付けで提出された、Babayan et al.による、米国予備特許出願第61,778,443号、及び3)「Free−Standing Metallic Article for Semiconductors」と題され、2013年3月13日付けで提出された、Babayan et al.による、米国予備特許出願第61、778,444号と関連し、それらの全ては本出願の譲受人により所有され、参照により本明細書に組み込まれる。
Claims (30)
- 光電池の形成方法であって、
i)導電性マンドレル上に金属物品を電鋳するステップを含み、前記導電性マンドレルは少なくとも1つの予備成形されたパターンを備える外表面を有しており、前記金属物品の少なくとも一部分は前記予備成形されたパターン内に形成され、
ii)前記導電性マンドレルから前記金属物品を分離して、自立型金属物品を形成するステップと、
iii)前記自立型金属物品を光電池のための半導体材料と電気的に連結するステップとを含む、方法。 - 前記予備成形されたパターンは高さ及び幅を有し、前記高さ対前記幅の比率はアスペクト比を定義し、前記アスペクト比は1より大きく、前記自立型金属物品は、前記導電性マンドレルの前記予備成形されたパターンと実質的に同様なパターンを有する、請求項1に記載の方法。
- 前記方法は、前記自立型金属物品上に被膜金属を適用するステップを更に含む、請求項1に記載の方法。
- 前記金属物品は銅を含み、前記被膜金属はニッケルを含む、請求項3に記載の方法。
- 前記方法は、取付機構を前記自立型金属物品に適用するステップを更に含み、前記取付機構ははんだまたは反応性金属を含む、請求項1に記載の方法。
- 前記反応性金属は、ファイヤスルー銀ペーストである、請求項5に記載の方法。
- 前記取付機構は、前記自立型金属物品の底面に適用される、請求項5に記載の方法。
- 前記半導体が外表面層を含み、
前記自立型金属物品を電気的に連結する前記ステップは、
前記自立型金属物品の前記取付機構を前記半導体の前記外表面層に連結することと、
前記取付機構を加熱することとを含む、請求項5に記載の方法。 - 前記取付機構は反応性金属であり、前記取付機構を前記加熱するステップは、約400℃以上の温度に加熱することを含む、請求項8に記載の方法。
- 前記半導体は外表面層を含み、前記外表面層は前記半導体材料の表面上の反射防止表面被膜であり、前記自立型金属物品を電気的に連結する前記ステップは、前記反射防止表面被膜を通して前記自立型金属物品を前記半導体材料に電気的に連結することを含む、請求項1に記載の方法。
- 光電池を形成するステップを更に含み、前記光電池を形成するステップは前記光電池上に反射防止表面被膜を形成することを含み、前記自立型金属物品は前記半導体表面と前記反射防止表面被膜との間に位置する、請求項1に記載の方法。
- 前記半導体が外表面層を含み、前記外表面層は前記半導体材料の表面上の透明導電性酸化物層であり、前記自立型金属物品を電気的に連結する前記ステップは、前記自立型金属物品を前記透明導電性酸化物層に電気的に連結することを含む、請求項1に記載の方法。
- 前記自立型金属物品は前記自立型金属物品の底面に適用されるはんだ層を含み、前記自立型金属物品を電気的に連結する前記ステップは、前記はんだ層を前記透明導電性酸化物層に接着することを含む、請求項12に記載の方法。
- 前記半導体材料の裏面は、p型ドーパントを含む複数の第1の領域と、n型ドーパントを含む複数の第2の領域とを含み、前記自立型金属物品を電気的に連結する前記ステップは、前記第1の領域の少なくとも1つと接触して第1の自立型金属物品を配置することと、前記第2の領域の少なくとも1つと接触して第2の自立型金属物品を配置することとを含む、請求項1に記載の方法。
- 前記金属物品は、複数の実質的に平行な第2の要素と交差する複数の実質的に平行な第1の要素を含む、請求項1に記載の方法。
- 前記金属物品は、前記光電池内で電気導管として機能するように構成された連続する格子パターンを含む、請求項1に記載の方法。
- 前記連続する格子パターンは複数の電鋳された要素を含み、前記電鋳された要素は互いに一体になっている、請求項16に記載の方法。
- 前記半導体材料及び前記自立型金属物品から前記光電池を形成するステップを更に含む、請求項1に記載の方法。
- 前記半導体材料は、前記半導体材料の表面の少なくとも一部分上に導電性金属層を備え、前記導電性金属層は前記表面に電気的に連結され、
電気的に連結する前記ステップは、前記自立型金属物品を前記導電性金属層の少なくとも一部分と電気的に連結することを含み、前記自立型金属物品の前記連結は、前記導電性金属層のマスクされた領域及び前記導電性金属層の露出された領域を形成し、前記マスクされた領域は前記自立型金属物品の直下にあり、
前記方法は、前記導電性金属層の前記露出された領域の少なくとも一部分を除去して、前記導電性金属層内にパターンを形成するステップを更に含み、前記パターンは前記自立型金属物品によって決定される、請求項1に記載の方法。 - 前記半導体材料の前記表面は光入射上面である、請求項19に記載の方法。
- 前記導電性金属層は、チタン、ニッケル、タングステン、クロム、モリブデン、またはそれらの組合せを含む、請求項19に記載の方法。
- 前記自立型金属物品を電気的に連結する前記ステップは、前記自立型金属物品を前記導電性金属層の少なくとも一部分に接着することを含む、請求項19に記載の方法。
- 前記露出された領域の少なくとも一部分を除去する前記ステップは、前記半導体材料の前記表面から前記露出された領域の全てを除去することを含む、請求項19に記載の方法。
- 前記露出された領域の少なくとも一部分を除去する前記ステップは、前記半導体材料の前記表面から前記露出された領域の少なくとも一部分をエッチングすることを含む、請求項19に記載の方法。
- 光電池の形成方法であって、
i)導電性マンドレル上に金属物品を電鋳するステップを含み、前記導電性マンドレルは少なくとも1つの予備成形されたパターンを備える外表面を有し、前記金属物品は、複数の実質的に平行な第2の区分と交差する複数の実質的に平行な第1の区分を含み、前記複数の実質的に平行な第1の区分と前記複数の実質的に平行な第2の区分とは高さ及び幅を有し、前記高さ対前記幅の比率はアスペクト比を定義し、前記複数の実質的に平行な第1の区分及び前記複数の実質的に平行な第2の区分の大部分は1より大きいアスペクト比を有し、
ii)前記導電性マンドレルから前記金属物品を取り出すステップを含み、前記取り出された金属物品は自立型金属物品であり、
iii)前記自立型金属物品を半導体材料と電気的に連結するステップと、
iv)前記半導体材料及び前記自立型金属物品から前記光電池を形成するステップとを含む、前記方法。 - 前記金属物品は銅を含み、ニッケルを含む被膜は前記金属物品の少なくとも一部分上に適用される、請求項25に記載の方法。
- 取付機構を前記自立型金属物品に適用するステップを更に含み、前記取付機構ははんだまたは反応性金属を含み、
前記自立型金属物品を電気的に連結する前記ステップは、
前記自立型金属物品の前記取付機構を前記半導体と連結することと、
前記取付機構を加熱することとを含む、請求項25に記載の方法。 - 前記光電池を前記形成するステップは、
透明層を前記半導体材料の前記表面に連結することを含み、前記透明層は誘電体反射防止表面被膜または導電性反射防止表面被膜を含み、
前記自立型金属物品を前記透明層に連結することとを含む、請求項25に記載の方法。 - 前記複数の実質的に平行な第1の区分及び前記複数の実質的に平行な第2の区分は、線形であり、実質的に長方形の断面形状を有する、請求項25に記載の方法。
- 前記複数の実質的に平行な第1の区分及び前記複数の実質的に平行な第2の区分は互いに一体になっている、請求項25に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/798,124 US8569096B1 (en) | 2013-03-13 | 2013-03-13 | Free-standing metallic article for semiconductors |
US13/798,124 | 2013-03-13 | ||
PCT/US2014/018489 WO2014158584A1 (en) | 2013-03-13 | 2014-02-26 | Free-standing metallic article for semiconductors |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2016512394A true JP2016512394A (ja) | 2016-04-25 |
Family
ID=49448557
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016500396A Pending JP2016512394A (ja) | 2013-03-13 | 2014-02-26 | 半導体のための自立型金属物品 |
Country Status (8)
Country | Link |
---|---|
US (1) | US8569096B1 (ja) |
EP (1) | EP2973739A4 (ja) |
JP (1) | JP2016512394A (ja) |
KR (1) | KR20150132281A (ja) |
CN (1) | CN105027300B (ja) |
BR (1) | BR112015021591A2 (ja) |
MY (1) | MY171950A (ja) |
WO (1) | WO2014158584A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022075308A1 (ja) * | 2020-10-05 | 2022-04-14 | 株式会社カネカ | 太陽電池セル |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8936709B2 (en) | 2013-03-13 | 2015-01-20 | Gtat Corporation | Adaptable free-standing metallic article for semiconductors |
US8916038B2 (en) * | 2013-03-13 | 2014-12-23 | Gtat Corporation | Free-standing metallic article for semiconductors |
US9054238B1 (en) * | 2014-02-26 | 2015-06-09 | Gtat Corporation | Semiconductor with silver patterns having pattern segments |
BR112016029814A2 (pt) | 2014-06-20 | 2017-08-22 | Merlin Solar Tech Inc | célula fotovoltaica que tem um artigo de metal expandido acoplado |
US10672927B2 (en) | 2014-06-20 | 2020-06-02 | Merlin Solar Technologies, Inc. | Photovoltaic cell having a coupled expanded metal article |
US10309012B2 (en) | 2014-07-03 | 2019-06-04 | Tesla, Inc. | Wafer carrier for reducing contamination from carbon particles and outgassing |
EP3046151B1 (en) | 2015-01-16 | 2019-04-03 | Somont GmbH | Method and apparatus of fabricating an interconnector assembly |
US9761744B2 (en) | 2015-10-22 | 2017-09-12 | Tesla, Inc. | System and method for manufacturing photovoltaic structures with a metal seed layer |
ITUA20162095A1 (it) * | 2016-03-30 | 2016-06-30 | Fabrizio Chiara | Procedimento di ricopertura di una superficie fotovoltaica e superficie fotovoltaica realizzata mediante un tale procedimento. |
US20180019349A1 (en) * | 2016-07-13 | 2018-01-18 | Solarcity Corporation | Gridless photovoltaic cells and methods of producing a string using the same |
US10672919B2 (en) | 2017-09-19 | 2020-06-02 | Tesla, Inc. | Moisture-resistant solar cells for solar roof tiles |
US11190128B2 (en) | 2018-02-27 | 2021-11-30 | Tesla, Inc. | Parallel-connected solar roof tile modules |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3442007A (en) * | 1966-12-29 | 1969-05-06 | Kewanee Oil Co | Process of attaching a collector grid to a photovoltaic cell |
JPS60211883A (ja) * | 1984-03-09 | 1985-10-24 | エナージー・コンバーシヨン・デバイセス・インコーポレーテツド | 光感応構造体の製造方法 |
JPH06151915A (ja) * | 1992-11-05 | 1994-05-31 | Canon Inc | 光発電素子、その製造方法及びそれに供される製造装置 |
JP2006222192A (ja) * | 2005-02-09 | 2006-08-24 | Sanyo Electric Co Ltd | 光起電力装置、光起電力モジュールおよびその製造方法 |
JP2007305978A (ja) * | 2006-04-14 | 2007-11-22 | Sharp Corp | 太陽電池、該太陽電池を用いた太陽電池モジュール、及び、該太陽電池モジュールの製造方法 |
JP2009182154A (ja) * | 2008-01-30 | 2009-08-13 | Shin Etsu Chem Co Ltd | 太陽電池及び太陽電池の製造方法 |
JP2010034540A (ja) * | 2008-06-26 | 2010-02-12 | Hitachi Chem Co Ltd | 太陽電池用電極基材 |
JP2011142127A (ja) * | 2009-12-11 | 2011-07-21 | Hitachi Chem Co Ltd | 太陽電池構造体及びその製造方法 |
Family Cites Families (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4380112A (en) | 1980-08-25 | 1983-04-19 | Spire Corporation | Front surface metallization and encapsulation of solar cells |
US4695674A (en) * | 1985-08-30 | 1987-09-22 | The Standard Oil Company | Preformed, thin-film front contact current collector grid for photovoltaic cells |
US5236572A (en) | 1990-12-13 | 1993-08-17 | Hewlett-Packard Company | Process for continuously electroforming parts such as inkjet orifice plates for inkjet printers |
US7732243B2 (en) | 1995-05-15 | 2010-06-08 | Daniel Luch | Substrate structures for integrated series connected photovoltaic arrays and process of manufacture of such arrays |
JP2992638B2 (ja) | 1995-06-28 | 1999-12-20 | キヤノン株式会社 | 光起電力素子の電極構造及び製造方法並びに太陽電池 |
US7635810B2 (en) | 1999-03-30 | 2009-12-22 | Daniel Luch | Substrate and collector grid structures for integrated photovoltaic arrays and process of manufacture of such arrays |
US20090111206A1 (en) | 1999-03-30 | 2009-04-30 | Daniel Luch | Collector grid, electrode structures and interrconnect structures for photovoltaic arrays and methods of manufacture |
US8076568B2 (en) | 2006-04-13 | 2011-12-13 | Daniel Luch | Collector grid and interconnect structures for photovoltaic arrays and modules |
US7507903B2 (en) | 1999-03-30 | 2009-03-24 | Daniel Luch | Substrate and collector grid structures for integrated series connected photovoltaic arrays and process of manufacture of such arrays |
US8222513B2 (en) | 2006-04-13 | 2012-07-17 | Daniel Luch | Collector grid, electrode structures and interconnect structures for photovoltaic arrays and methods of manufacture |
US8138413B2 (en) | 2006-04-13 | 2012-03-20 | Daniel Luch | Collector grid and interconnect structures for photovoltaic arrays and modules |
US6547944B2 (en) | 2000-12-08 | 2003-04-15 | Delphi Technologies, Inc. | Commercial plating of nanolaminates |
EP1225253A1 (en) | 2001-01-22 | 2002-07-24 | DSL Dresden Material-Innovation GmbH | A continuous electroforming process to form a strip for battery electrodes and a mandrel to be used in said electroforming process |
NL1017213C2 (nl) * | 2001-01-29 | 2002-07-30 | Stork Screens Bv | Werkwijzen voor het vervaardigen van elektrische geleiders, en toepassing van aldus vervaardigde geleiders. |
DE10239845C1 (de) | 2002-08-29 | 2003-12-24 | Day4 Energy Inc | Elektrode für fotovoltaische Zellen, fotovoltaische Zelle und fotovoltaischer Modul |
US20070125415A1 (en) * | 2005-12-05 | 2007-06-07 | Massachusetts Institute Of Technology | Light capture with patterned solar cell bus wires |
US8322025B2 (en) * | 2006-11-01 | 2012-12-04 | Solarworld Innovations Gmbh | Apparatus for forming a plurality of high-aspect ratio gridline structures |
US7799182B2 (en) | 2006-12-01 | 2010-09-21 | Applied Materials, Inc. | Electroplating on roll-to-roll flexible solar cell substrates |
KR101223023B1 (ko) * | 2006-12-04 | 2013-01-17 | 엘지전자 주식회사 | 태양전지의 전극 형성방법, 태양전지의 제조방법 및태양전지 |
WO2008080160A1 (en) | 2006-12-22 | 2008-07-03 | Advent Solar, Inc. | Interconnect technologies for back contact solar cells and modules |
KR20100097219A (ko) | 2007-12-18 | 2010-09-02 | 데이4 에너지 인코포레이티드 | Pv 스트링으로 에지 액세스를 수행하는 광전지 모듈, 연결 방법, 장치, 및 시스템 |
TWI390747B (zh) | 2008-04-29 | 2013-03-21 | Applied Materials Inc | 使用單石模組組合技術製造的光伏打模組 |
JP5410050B2 (ja) | 2008-08-08 | 2014-02-05 | 三洋電機株式会社 | 太陽電池モジュール |
US20100071765A1 (en) * | 2008-09-19 | 2010-03-25 | Peter Cousins | Method for fabricating a solar cell using a direct-pattern pin-hole-free masking layer |
JP5499537B2 (ja) | 2008-09-24 | 2014-05-21 | Tdk株式会社 | 電極製造装置及び電極製造方法 |
JP4985717B2 (ja) | 2008-12-04 | 2012-07-25 | 大日本印刷株式会社 | 有機薄膜太陽電池およびその製造方法 |
US8691620B2 (en) * | 2009-05-26 | 2014-04-08 | Lg Chem, Ltd. | Method for preparation of front electrode for solar cell of high efficiency |
US8273413B2 (en) * | 2009-07-02 | 2012-09-25 | International Business Machines Corporation | Methods of forming metal oxide nanostructures, and nanostructures thereof |
WO2011016122A1 (ja) * | 2009-08-06 | 2011-02-10 | 三菱電機株式会社 | 太陽電池の電極形成方法、太陽電池の製造方法、太陽電池 |
US8039292B2 (en) | 2009-11-18 | 2011-10-18 | International Business Machines Corporation | Holey electrode grids for photovoltaic cells with subwavelength and superwavelength feature sizes |
EP2348539B1 (en) | 2010-01-19 | 2019-05-29 | SolarWorld Industries GmbH | Photovoltaic cell electrode and method for electrically connecting a photovoltaic cell |
US20120180850A1 (en) | 2011-01-13 | 2012-07-19 | Kim Sung-Su | Photoelectric conversion module and method of manufacturing the same |
-
2013
- 2013-03-13 US US13/798,124 patent/US8569096B1/en active Active
-
2014
- 2014-02-26 JP JP2016500396A patent/JP2016512394A/ja active Pending
- 2014-02-26 WO PCT/US2014/018489 patent/WO2014158584A1/en active Application Filing
- 2014-02-26 CN CN201480013234.8A patent/CN105027300B/zh active Active
- 2014-02-26 EP EP14773882.7A patent/EP2973739A4/en not_active Withdrawn
- 2014-02-26 KR KR1020157028339A patent/KR20150132281A/ko not_active Application Discontinuation
- 2014-02-26 BR BR112015021591A patent/BR112015021591A2/pt active Search and Examination
- 2014-02-26 MY MYPI2015703110A patent/MY171950A/en unknown
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3442007A (en) * | 1966-12-29 | 1969-05-06 | Kewanee Oil Co | Process of attaching a collector grid to a photovoltaic cell |
JPS60211883A (ja) * | 1984-03-09 | 1985-10-24 | エナージー・コンバーシヨン・デバイセス・インコーポレーテツド | 光感応構造体の製造方法 |
JPH06151915A (ja) * | 1992-11-05 | 1994-05-31 | Canon Inc | 光発電素子、その製造方法及びそれに供される製造装置 |
JP2006222192A (ja) * | 2005-02-09 | 2006-08-24 | Sanyo Electric Co Ltd | 光起電力装置、光起電力モジュールおよびその製造方法 |
JP2007305978A (ja) * | 2006-04-14 | 2007-11-22 | Sharp Corp | 太陽電池、該太陽電池を用いた太陽電池モジュール、及び、該太陽電池モジュールの製造方法 |
JP2009182154A (ja) * | 2008-01-30 | 2009-08-13 | Shin Etsu Chem Co Ltd | 太陽電池及び太陽電池の製造方法 |
JP2010034540A (ja) * | 2008-06-26 | 2010-02-12 | Hitachi Chem Co Ltd | 太陽電池用電極基材 |
JP2011142127A (ja) * | 2009-12-11 | 2011-07-21 | Hitachi Chem Co Ltd | 太陽電池構造体及びその製造方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022075308A1 (ja) * | 2020-10-05 | 2022-04-14 | 株式会社カネカ | 太陽電池セル |
JP7493052B2 (ja) | 2020-10-05 | 2024-05-30 | 株式会社カネカ | 太陽電池セル |
Also Published As
Publication number | Publication date |
---|---|
EP2973739A4 (en) | 2016-11-02 |
EP2973739A1 (en) | 2016-01-20 |
BR112015021591A2 (pt) | 2017-07-18 |
CN105027300B (zh) | 2017-08-08 |
MY171950A (en) | 2019-11-08 |
KR20150132281A (ko) | 2015-11-25 |
CN105027300A (zh) | 2015-11-04 |
US8569096B1 (en) | 2013-10-29 |
WO2014158584A1 (en) | 2014-10-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6400071B2 (ja) | 半導体のための自立型金属物品 | |
JP2016512394A (ja) | 半導体のための自立型金属物品 | |
US20170288081A1 (en) | Photovoltaic module | |
JP5806304B2 (ja) | 太陽電池およびその製造方法 | |
KR102215506B1 (ko) | 반도체들을 위한 적응가능 독립 금속 물품 | |
EP3203530A1 (en) | Solar cell and method for manufacturing same | |
JP2005340362A (ja) | 太陽電池セルおよび太陽電池モジュール | |
US20150129024A1 (en) | Free-Standing Metallic Article With Expansion Segment | |
WO2014158586A1 (en) | Free-standing metallic article with overplating | |
WO2012051626A2 (en) | Solar cell architecture having a plurality of vias with shaped foil via interior | |
JP5329980B2 (ja) | 太陽電池モジュール | |
TWI631724B (zh) | 形成光伏打電池之方法 | |
TW201523910A (zh) | 具有膨脹片段之自立金屬物品 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20161012 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20161012 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170131 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20171221 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180116 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20180807 |