JP2016225025A - Plasma generation element - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a plasma generation element that has flexibility and can improve the degree of freedom of installation.SOLUTION: A plasma generation element 1 comprises a plurality of conductive wire parts 20 which are arranged in parallel to each other and a plurality of insulation coating parts 30 which insulate and coat the plurality of conductive wire parts 20, and the plurality of insulation coating parts 30 are provided to a predetermined length in an extension direction of the plurality of conductive wire parts 20 so as to form gaps R in which plasma can be generated between adjacent insulation coating parts 30, so that a plasma generation part is constituted with a plurality of conductive wire parts 20 and a plurality of insulation coating parts 30 of parts covered with the plurality of insulation coating parts 30. The plurality of conductive wire parts 20 and the plurality of insulation coating parts 30 each have flexibility, and generate potential differences between adjacent conductive wire parts 20, so that the plasma generation part can generate plasma.SELECTED DRAWING: Figure 2

Description

  The present invention relates to a plasma generating element that generates a plasma by generating a dielectric barrier discharge.

  Japanese Patent No. 3015268 (Patent Document 1) is cited as a document that discloses a plasma generation device that has mechanical strength and can generate plasma in an environment such as high-humidity air or water.

  The plasma generating apparatus disclosed in Patent Document 1 inserts a rod-shaped conductor into a longitudinal through hole provided in a rod-shaped ceramic dielectric, and integrally bonds the conductor and the ceramic dielectric with glass or an adhesive. A plurality of electrodes configured by sealing are provided, and the plurality of electrodes are configured to be joined in a line contact state in a ceramic dielectric.

Japanese Patent No. 3015268

  However, in the plasma generation device described in Patent Document 1, the dielectric is formed of ceramics. For this reason, when installing a plasma production apparatus, it can arrange only in the shape of a straight line.

  When a plasma generation apparatus is installed inside an electric device or the like, the installation space is limited depending on the shape of the component and the positional relationship with the component. The size of the installation space varies depending on the size of the component parts and the variation in the assembly position. For this reason, the size of the installation space may be smaller than the size of the plasma generation device. In such a case, even if a plasma generator having a fixed shape is prepared, it cannot be installed.

  The present invention has been made in view of the above problems, and an object of the present invention is to provide a plasma generating element that has flexibility and can improve the degree of freedom of installation.

  A plasma generation element according to the present invention is a plasma generation element having a plasma generation unit that generates plasma by generating dielectric barrier discharge, and includes a plurality of conductive line portions arranged in parallel to each other, A plurality of insulation coating portions that insulate and coat the conductive wire portions, and each of the plurality of insulation coating portions includes a plurality of the conductive wires so that a gap capable of generating plasma is formed between adjacent insulation coating portions. The plasma generating section is provided by the plurality of conductive wire sections and the plurality of insulating coating sections in a portion that is provided over a predetermined length in the extending direction of each section, and is covered by the plurality of insulating coating sections. The plurality of conductive wire portions and the plurality of insulating coating portions are both flexible and generate potential differences in each of the adjacent conductive wire portions. , Plasma is generated can be configured in the plasma generator.

  In the plasma generating element according to the present invention, the insulating coating portions adjacent to each other may be connected at least partially from the one end side to the other end side.

  In the plasma generating element according to the present invention, the plurality of conductive wire portions are preferably arranged on a plane, a curved surface, or an annular shape.

  In the plasma generating element according to the present invention, the plurality of conductive wire portions bend in the same direction correspondingly in at least a part of the extending direction, so that the plasma generating portion is bent. You may have.

  In the plasma generating element according to the present invention, a plurality of sets of the plurality of conductive wire portions and the plurality of insulating coating portions constituting the plasma generating portion are provided, whereby the plasma generating portion is You may have more than one.

  ADVANTAGE OF THE INVENTION According to this invention, it has a softness | flexibility and can provide the plasma generation element which can improve the freedom degree of installation.

1 is a schematic diagram of a plasma generation apparatus including a plasma generation element according to Embodiment 1. FIG. 2 is a cross-sectional view of the plasma generating element according to Embodiment 1. FIG. FIG. 4 is a schematic diagram of a plasma generation apparatus including a plasma generation element according to a second embodiment. 6 is a cross-sectional view of a plasma generating element according to Embodiment 3. FIG. FIG. 6 is a schematic diagram of a plasma generation apparatus including a plasma generation element according to a fourth embodiment. FIG. 6 is a cross-sectional view of a plasma generating element according to a fourth embodiment. FIG. 6 is a schematic diagram of a plasma generation apparatus including a plasma generation element according to a fifth embodiment. It is a figure for demonstrating the effect of the plasma generation element which concerns on Embodiment 5. FIG. FIG. 10 is a schematic diagram of a plasma apparatus including a plasma generating element according to a sixth embodiment. It is sectional drawing which shows the internal structure of the air cleaner which concerns on Embodiment 7. FIG. It is a rear view of the air cleaner concerning Embodiment 7.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In the following embodiments, the same or common parts are denoted by the same reference numerals in the drawings, and description thereof will not be repeated.

(Embodiment 1)
FIG. 1 is a schematic diagram of a plasma generation apparatus including a plasma generation element according to the present embodiment. FIG. 2 is a cross-sectional view of the plasma generating element according to the present embodiment. With reference to FIG. 1 and FIG. 2, the plasma generation apparatus 100 and the plasma generation element 1 which concern on this Embodiment are demonstrated.

  As shown in FIG. 1, the plasma generation apparatus 100 includes a plasma generation element 1 and a high voltage circuit 50. As shown in FIGS. 1 and 2, the plasma generating element 1 includes a plurality of covered conductors 10.

  The plurality of covered conductive wires 10 are arranged in parallel with a predetermined distance from each other. The plurality of covered conductive wires 10 are arranged on the same plane. The plurality of covered conductive wires 10 are supported by a pair of support plates 60 facing each other.

  The pair of support plates 60 are provided with a plurality of holes according to the number of the plurality of covered conductors 10. A plurality of covered conductors 10 are inserted into each of the plurality of holes. Thereby, both ends of the plurality of covered conductive wires 10 are supported by the pair of support plates 60.

  Each of the plurality of covered conductors 10 has flexibility. Thereby, the distance between the pair of support plates 60 is variable. Each of the plurality of covered conductive wires 10 includes a conductive wire 20 as a conductive wire portion and an insulating coating layer 30 as an insulating coating portion.

  The plurality of conductive wires 20 are metal wires having flexibility. Each of the plurality of conductive lines 20 is provided in a straight line shape. The plurality of conductive lines 20 are arranged in parallel to each other. The plurality of conductive lines 20 are arranged side by side in a direction intersecting the extending direction.

  The plurality of insulating coating layers 30 are made of an insulating resin member having flexibility. Each of the plurality of insulating coating layers 30 is provided over a predetermined length in the extending direction of each of the plurality of conductive lines 20 so that a gap R capable of generating plasma is formed in the insulating coating layers 30 adjacent to each other. ing.

  The insulating coating layer 30 covers the conductive wire 20 so that at least one end of the conductive wire 20 is exposed. Of the insulating coating layers 30 adjacent to each other, one insulating coating layer 31 is covered with the conductive wire 21 so that one end side of one conductive wire 21 of the adjacent conductive wires 20 is exposed. One insulating coating layer 32 among the insulating coating layers 30 adjacent to each other is such that the other end side (the side opposite to the one end side) of one conductive line 22 of the adjacent conductive wires 20 is exposed. Is covered.

  Of the conductive lines 20 adjacent to each other, the wiring 51 connected to one end side of the conductive line 21 on one side, and the other end side of the conductive line 22 on the other side of the conductive lines 20 adjacent to each other (opposite side to the one end side). A high voltage circuit 50 is provided between the wiring 52 and the wiring 52. The conductive wires 21 on one side are connected in parallel. The other conductive wire 22 is connected in parallel.

  The high voltage circuit 50 generates a high voltage from a voltage supplied from a power source (not shown). The high voltage circuit 50 applies high frequency and high voltage between the conductive lines 20 adjacent to each other. As a result, a potential difference is generated between the conductive lines 20 adjacent to each other. The voltage applied between the conductive wires 20 adjacent to each other is preferably an AC voltage.

  As described above, the adjacent coated conductors 10 are arranged close to each other, so that a gap R capable of generating plasma is formed between the adjacent insulating coating layers 30.

  In the gap R, plasma can be generated by satisfying predetermined discharge conditions. Specifically, a voltage equal to or higher than the discharge start voltage determined according to the product of the distance between the insulating coating layers 30 adjacent to each other and the atmospheric pressure (fluid pressure) is applied between the adjacent conductive lines 20. Then, dielectric barrier discharge is generated and plasma is generated.

  When the plasma is generated, the charged particles in the plasma are accumulated on the surfaces of the insulating coating layers 30 adjacent to each other due to the potential difference between the conductive lines 20 adjacent to each other, and the generation of the plasma ends. At this time, a charge having a polarity opposite to that of the one conductive line 21 of the adjacent conductive lines 20 is accumulated on the surface of one insulating cover layer 31 of the adjacent insulating cover layers 30. On the surface of the other insulating coating layer 32 of the insulating coating layers 30 adjacent to each other, charges having a polarity opposite to that of the other conductive line 22 of the conductive wires 20 adjacent to each other are accumulated.

  Subsequently, when a voltage having an opposite polarity is applied between the conductive lines 20 adjacent to each other, an electric field created by the accumulated charges and an electric field generated by the voltage applied between the adjacent conductive lines 20 again. Plasma is generated.

  Dielectric barrier discharge is repeatedly performed each time the polarity of the voltage applied between the adjacent conductive lines 20 is reversed. As described above, the plasma generation unit P is configured by the plurality of conductive wires 20 and the plurality of insulating coating layers 30 in portions covered by the plurality of insulating coating layers 30.

  Since plasma is generated from one end side to the other end side of the insulating coating layer 30 in each of the gaps R between the adjacent insulating coating layers 30, it is possible to generate plasma in a wide range. For this reason, it becomes possible to improve the contact efficiency of process target gas and a plasma production | generation part.

  While generating plasma, by passing a processing target gas such as air through the plasma generation apparatus 100 along a direction parallel to the same plane on which the plurality of conductive wires 20 are arranged, Virus inactivation or impurity gas contained in the gas to be treated such as odor can be decomposed and removed. Thereby, the gas to be processed can be purified.

  The plasma generating element 1 according to the present embodiment can be bent and deformed because the plurality of conductive wires 20 and the plurality of insulating coating layers 30 have flexibility. The distance between both ends of the plurality of conductive lines 20 can be varied by bending the plurality of conductive lines 20 in the same direction correspondingly in at least a part of the extending direction. For example, when the plurality of conductive wires 20 are supported by the pair of support plates 60 as described above, the distance between the pair of support plates 60 can be varied. Thereby, the freedom degree of installation of the said plasma generation element 1 and the plasma generation apparatus 100 provided with the same can be improved.

  In addition, in this Embodiment, although the case where the one side conductive wire 21 was connected in parallel was illustrated and demonstrated, it is not limited to this, You may connect in series. In this case, the conductive wire 21 on one side is alternately connected on one end side and the other end side. Similarly, although the case where the other conductive wire 21 is connected in parallel has been described as an example, the present invention is not limited to this and may be connected in series. In this case, the conductive wire 21 on the other side is alternately connected on one end side and the other end side.

(Embodiment 2)
FIG. 3 is a schematic diagram of a plasma generation apparatus including the plasma generation element according to the present embodiment. With reference to FIG. 3, plasma generation apparatus 100A and plasma generation element 1A according to the present exemplary embodiment will be described.

  As shown in FIG. 3, the plasma generating apparatus 100A according to the present embodiment is different in the configuration of the plasma generating element 1A from the plasma generating apparatus 100 according to the first embodiment. Other configurations are almost the same.

  The plasma generating element 1A includes a first covered conductor 10A, a second covered conductor 10B, and a high voltage circuit 50. The first covered conductor 10A and the second covered conductor 10B have flexibility. The first covered conductive wire 10A and the second covered conductive wire 10B include a conductive wire and an insulating coating layer that covers the conductive wire. The first covered conductor 10A and the second covered conductor 10B are supported by a pair of support plates 60 facing each other.

  Each of the pair of support plates 60 is provided with a plurality of holes along the extending direction of the support plates. Every other first covered conductor 10A is inserted into the hole. The first covered conductor 10 </ b> A is folded back toward the inside of the pair of support plates 60 on the outside of the pair of support plates 60. The first covered conductive wire 10 </ b> A is alternately folded on one side and the other side of the pair of support plates 60.

  The first covered conductor 10A includes a plurality of first covered conductors 10A1 and a plurality of folded portions 10A2. The plurality of first covered conductive wire portions 10 </ b> A <b> 1 are located inside the pair of support plates 60, and the plurality of folded portions 10 </ b> A <b> 2 are located outside the pair of support plates 60.

  The plurality of first covered conductor portions 10A1 extend linearly. The plurality of first covered conductor portions 10A1 are arranged in parallel to each other. The plurality of first covered conductor portions 10A1 are arranged side by side in a direction that intersects the extending direction that extends linearly (a direction that is substantially orthogonal in FIG. 3). The plurality of first covered conductor portions 10A1 are arranged on the same plane.

  Each of the plurality of first covered conductive wire portions 10A1 includes a conductive wire portion and an insulating covering portion that covers the conductive wire portion from one side to the other side in the extending direction.

  The second covered conductor 10B is inserted into a hole different from the hole into which the first covered conductor 10A is inserted. The second covered conductor 10 </ b> B is folded back toward the inside of the pair of support plates 60 on the outside of the pair of support plates 60. The second covered conductor 10 </ b> B is alternately folded on one side and the other side of the pair of support plates 60.

  The second covered conductor 10B includes a plurality of second covered conductor portions 10B1 and a plurality of folded portions 10B2. The plurality of second covered conductor portions 10B1 are located inside the pair of support plates 60, and the plurality of folded portions 10B2 are located outside the pair of support plates 60.

  The plurality of second covered conductor portions 10B1 extend linearly. The plurality of second covered conductive wire portions 10B1 are arranged in parallel to each other. The plurality of second covered conductor portions 10B1 are arranged side by side in a direction that intersects the extending direction that extends linearly (a direction that is substantially orthogonal in FIG. 3). The plurality of second covered conductor portions 10B1 are arranged on the same plane.

  Each of the plurality of second covered conductive wire portions 10B1 includes a conductive wire portion and an insulating covering portion that covers the conductive wire portion from one side to the other side in the extending direction.

  The plurality of first covered conductor portions 10A1 and the plurality of second covered conductor portions 10B1 are arranged so as to be alternately arranged in a direction intersecting the extending direction (a direction substantially orthogonal in FIG. 3). Thereby, the plurality of conductive wire portions included in the plurality of first covered conductor portions 10A1 and the plurality of second covered conductor portions 10B1 are arranged in parallel to each other. In addition, in the plurality of insulation coating portions included in the plurality of first covered conductor portions 10A1 and the plurality of second covered conductor portions 10B1, gaps capable of generating plasma are formed between the adjacent conductive wire portions.

  A high voltage circuit 50 is provided between a wiring 51 connected to one end of the conductive wire of the first covered conductive wire 10A and a wiring 52 connected to one end of the second covered conductive wire 10B.

  The high voltage circuit 50 applies high frequency and high voltage between the conductive wire of the first covered conductive wire 10A and the conductive wire of the second covered conductive wire 10B. As a result, a potential difference is generated between the conductive line portions adjacent to each other. The voltage applied between the conductive line portions adjacent to each other is preferably an alternating voltage.

  As described above, the conductive line portions adjacent to each other are arranged close to each other, whereby a gap capable of generating plasma is formed between the insulating coating portions adjacent to each other.

  Also in the present embodiment, as in the first embodiment, plasma can be generated in the gap by satisfying predetermined discharge conditions. Specifically, the discharge start voltage is equal to or higher than the discharge start voltage determined according to the product of the distance between the conductive wire portion of the first covered conductive wire 10A and the conductive wire portion of the second covered conductive wire 10B adjacent to each other and the atmospheric pressure (fluid pressure). When a voltage is applied between the conductive wire portion of the first covered conductive wire 10A and the conductive wire portion of the second covered conductive wire 10B that are adjacent to each other, a dielectric barrier discharge is generated and plasma is generated.

  Thus, the plasma generation part P is comprised by the some conductive wire part and the some insulation coating part of the part covered with the some insulation coating part.

  As described above, even in the plasma generating element 1A according to the present embodiment, the first covered conductive wire 10A and the second covered conductive wire 10B have flexibility, so that bending deformation is possible. Thereby, each of the plurality of first covered conductor portions 10A1 included in the first covered conductor 10A and the plurality of second covered conductor portions 10B1 included in the second covered conductor 10B corresponds to at least a part of the extending direction. By bending in the same direction, the distance between both ends of the plurality of first covered conductor portions 10A1 and the plurality of second covered conductor portions 10B1 can be varied. For example, when the first covered conductive wire 10A and the second covered conductive wire 10B are supported by the pair of support plates 60 as described above, the distance between the pair of support plates 60 can be varied. Thereby, the freedom degree of installation of the said plasma production | generation element 1A and plasma production | generation apparatus 100A provided with the same can be improved.

(Embodiment 3)
FIG. 4 is a cross-sectional view of the plasma generating element according to the present embodiment. With reference to FIG. 4, plasma generating element 1B according to the present exemplary embodiment will be described.

  As shown in FIG. 4, when the plasma generating element 1 </ b> B according to the present embodiment is compared with the plasma generating element 1 according to the first exemplary embodiment, the insulating coating portions 30 </ b> B adjacent to each other are connected via the connecting portion 33. Is different. Other configurations are almost the same.

  The insulating coating portions 30B adjacent to each other are connected via a connecting portion 33 from one end side to the other end side. The plurality of insulating coating portions 30B that cover the plurality of conductive wires 20 and the connecting portion 33 are integrally formed by, for example, extrusion molding. The insulating coating portion 30B and the connecting portion 33 are made of an insulating resin member having flexibility.

  In addition, when supporting the some covered conducting wire 10 with which the insulation coating part 30B adjacent to each other was connected with a pair of plate, each of a pair of plate is provided with the insertion part extended in the extension direction of a plate. . By inserting both ends of the plurality of covered conducting wires 10 into the insertion portions of the pair of support plates, the plurality of covered conducting wires 10 are supported by the pair of plates.

  Since the insulating coating portion 30B is connected via the connecting portion 33, the distance between the insulating coating portions 30B adjacent to each other (distance of the gap R) can be made substantially constant from one end side to the other end side.

  Plasma can be generated by satisfying predetermined discharge conditions in the gap between the insulating coating portions 30B adjacent to each other. Specifically, a voltage equal to or higher than the discharge start voltage determined according to the product of the distance between the insulation coating portions 30B adjacent to each other and the atmospheric pressure (fluid pressure) is applied between the adjacent conductive lines 20. Then, dielectric barrier discharge is generated and plasma is generated.

  As described above, since the distance between the insulating coating portions 30B adjacent to each other is substantially constant from one end side to the other end side, the plasma is stabilized in the gap R from one end side to the other end side of the insulating coating portion 30B. Can be generated.

  Even in the plasma generating element 1B according to the present exemplary embodiment, the plurality of conductive wires 20, the plurality of insulating coating portions 30B, and the plurality of connecting portions 33 have flexibility, so that bending deformation is possible. The distance between both ends of the plurality of conductive lines 20 can be varied by bending the plurality of conductive lines 20 in the same direction correspondingly in at least a part of the extending direction. For example, when the plurality of conductive wires 20 are supported by a pair of support plates as described above, the distance between the pair of support plates can be varied. Thereby, the freedom degree of installation of the said plasma generation element 1B and the plasma generation apparatus 100 provided with the same can be improved.

  In the present embodiment, the case where the insulating coating portions 30B adjacent to each other are connected by integrally forming the plurality of insulating coating portions 30B and the connecting portions 33 has been described. However, the insulating coating portions 30B adjacent to each other may be connected in a line contact with an adhesive or the like.

  Further, in the present embodiment, the insulating coating portions 30B adjacent to each other have been described by way of example in which they are connected via the connecting portion 33 from one end side to the other end side. What is necessary is just to be connected at least in part from at least one end side to the other end side. For example, when supported by a pair of support plates as described above, the insulating coating portions 30B adjacent to each other need not be connected outside the pair of support plates.

(Embodiment 4)
FIG. 5 is a schematic diagram of a plasma generation apparatus including the plasma generation element according to the present embodiment. FIG. 6 is a cross-sectional view of the plasma generating element according to the present embodiment. With reference to FIG. 5 and FIG. 6, plasma generation apparatus 100C and plasma generation element 1C according to the present embodiment will be described.

  As shown in FIGS. 5 and 6, the plasma generation device 100 </ b> C according to the present embodiment is different in the configuration of the plasma generation element 1 </ b> C from the plasma generation device 100 </ b> B according to the third embodiment.

  In the plasma generating element 1 </ b> C, a plurality of covered conductors 10 are arranged in a ring shape. The plurality of insulating coating portions 30 </ b> C cover the plurality of conductive wires 20. The mutually adjacent insulating coating portions 30C are connected via a connecting portion 33 from one end side to the other end side.

  The plurality of insulating coating portions 30C and the connecting portion 33 are integrally formed by, for example, extrusion molding. The insulating covering portion 30C and the connecting portion 33 are made of a flexible insulating resin member.

  The plurality of coated conductors 10 to which the insulating coating portions 30C adjacent to each other are connected are supported by a pair of annular members 60C having an opening at the center. By fitting the pair of annular members 60C to both ends of the plurality of coated conductors 10, the plurality of coated conductors 10 are supported by the pair of annular members 60C. The pair of annular members 60 </ b> C are fitted on the outer peripheral sides of the plurality of covered conductors 10.

  Since the insulating covering portion 30C is connected via the connecting portion 33, the distance between the insulating covering portions 30C adjacent to each other (in the gap R) on each of the outer side and the inner side of the plurality of covered conducting wires 10 arranged in a ring shape. The distance) can be made substantially constant from one end side to the other end side.

  Plasma can be generated by satisfying predetermined discharge conditions in the gap between the adjacent insulating coating portions 30C. Specifically, a voltage equal to or higher than the discharge start voltage determined according to the product of the distance between the insulating coating portions 30C adjacent to each other and the atmospheric pressure (fluid pressure) is applied between the adjacent conductive lines 20. Then, dielectric barrier discharge is generated and plasma is generated.

  As described above, since the distance between the insulating coating portions 30C adjacent to each other is substantially constant from one end side to the other end side, the plasma is stabilized in the gap R from one end side to the other end side of the insulating coating portion 30C. Can be generated.

  Even in the plasma generating element 1 </ b> C according to the present embodiment, the plurality of conductive wires 20, the plurality of insulating coating portions 30 </ b> C, and the plurality of connecting portions 33 have flexibility, so that bending deformation is possible. The distance between both ends of the plurality of conductive lines 20 can be varied by bending the plurality of conductive lines 20 in the same direction correspondingly in at least a part of the extending direction. For example, when the plurality of conductive wires 20 are supported by the pair of annular members 60C as described above, the distance between the pair of annular members 60C can be varied. Thereby, the freedom degree of installation of the said plasma generation element 1C and the plasma generation apparatus 100C provided with this can be improved.

  Furthermore, by arranging the plurality of conductive wires 20 in an annular shape, the plasma generated inside the insulating coating portion 30 </ b> C can be kept in a space surrounded by the plurality of coated conducting wires 10. By allowing the gas to be treated to pass through the space along the extending direction of the plurality of conductive wires 20, inactivation of bacteria and viruses present in the gas to be treated, or in the gas to be treated such as odor The impurity gas contained can be efficiently decomposed and removed. Thereby, process target gas can be purified efficiently.

(Embodiment 5)
FIG. 7 is a schematic diagram of a plasma generation apparatus including the plasma generation element according to the present embodiment. With reference to FIG. 7, plasma generating apparatus 100D according to the present embodiment will be described.

  The plasma generation device 100D according to the present embodiment differs from the plasma generation device 100 according to the present embodiment in the configuration of the plasma generation element 1D.

  In the plasma generating element 1D, the plurality of coated conductors 10 are bent in the same direction corresponding to each other in at least a part of the extending direction. As a result, the plurality of conductive wires and the plurality of covered conductors included in the plurality of covered conductors 10 are also bent in the same direction correspondingly in at least a part of the extending direction.

  For this reason, the plasma generation part P comprised by the some conductive wire part of the part covered with the some insulation coating layer and the some insulation coating layer also has a bending part.

  FIG. 8 is a diagram for explaining the effect of the plasma generating element according to the present embodiment. In FIG. 8, a plurality of covered conductors in a state after being bent are indicated by solid lines, and a plurality of covered conductors in a state before being bent are indicated by two-dot chain lines. With reference to FIG. 8, the effect of plasma generating element 1D according to the present exemplary embodiment will be described.

  As shown in FIG. 8, the plurality of covered conductive wires 10 in a state before being bent extend linearly. In the plurality of coated conductors 10 in a state before being bent, the distance from one end to the other end is L1. In other words, the length of the covered conducting wire 10 in the extending direction is L1.

  In the plurality of covered conductive wires 10 that are bent as described above, the distance from one end to the other end is L2. L2 is smaller than L1. Since the distance from one end to the other end of the plurality of covered conductors 10 in the state after bending is shorter than that in the state before bending, the plasma generating element 1D can be installed in a smaller installation space.

  On the other hand, in the state after bending, the length of the coated conductor 10 in the extending direction itself is L1, so the gap between the insulating coating layers adjacent to each other is also the length of L1 along the extending direction of the coated conductor. Formed with.

  For this reason, the plasma generating element 1D according to the present embodiment has plasma as compared with a case where a plurality of covered conducting wires extending linearly with a length L2 are arranged in an installation space having a length L2. The area of the generation unit P can be widened. Thereby, inactivation of bacteria and viruses present in the processing target gas or processing target gas such as odor by passing the processing target gas through the space along the extending direction of the plurality of conductive wires The impurity gas contained therein can be efficiently decomposed and removed. Thereby, process target gas can be purified efficiently.

  Further, even in the plasma generating element 1D according to the present embodiment, the plurality of conductive wires, the plurality of insulating coating portions, and the plurality of connecting portions included in the plurality of coated conducting wires have flexibility, so that bending deformation occurs. It becomes possible. The distance between the ends of the plurality of conductive lines can be varied by further bending the plurality of conductive lines in the same direction correspondingly in at least a part of the extending direction from the state after the bending. Thereby, the freedom degree of installation of the said plasma generation element 1D and plasma generation apparatus 100D provided with the same can be improved.

  In the present embodiment, the case where the plurality of covered conductors 10 are bent in the same plane has been described as an example, but the plurality of covered conductors 10 may be bent so as to form a curved surface.

(Embodiment 6)
FIG. 9 is a schematic view of a plasma apparatus including the plasma generating element according to the present embodiment. With reference to FIG. 9, plasma generating apparatus 100E according to the present embodiment will be described.

  As shown in FIG. 9, the plasma generation device 100E according to the present embodiment is different from the plasma generation device 100 according to the first embodiment in the configuration of the plasma generation element 1E. Other configurations are almost the same.

  The plasma generating element 1 </ b> E includes a plurality of covered conductive wires 10. Each of the plurality of covered conductive wires 10 includes a conductive wire and an insulating coating layer that covers the conductive wire. The insulating coating layers adjacent to each other are connected from one end side to the other end side via a connecting portion as in the third embodiment.

  The plurality of covered conductive wires 10 are provided in a meandering manner such that portions extending linearly and portions curved in a U shape are alternately continued. The plurality of covered conductive wires 10 are supported by a pair of support plates facing each other.

  The plurality of covered conductive wires 10 are supported by a pair of support plates 60 facing each other. The pair of support plates 60 extend in one direction (upward in FIG. 9). Each of the pair of support plates 60 has a plurality of insertion portions into which a plurality of connected covered conductors 10 can be inserted. The plurality of insertion portions are arranged side by side along the one direction.

  The plurality of covered conductive wires 10 are folded back toward the inside of the pair of support plates 60 on the outside of the pair of support plates 60. The plurality of covered conductive wires 10 are alternately folded on one side and the other side of the pair of support plates 60.

  In a portion extending in a straight line among the plurality of covered conductors 10 extending while meandering, each of the plurality of insulating coating portions is formed with a gap capable of generating plasma between adjacent insulating coating portions. Is provided.

  In the gap, plasma can be generated by satisfying predetermined discharge conditions. Specifically, the conductive wire portions of the covered conductive wires 10 that are adjacent to each other have a voltage equal to or higher than the discharge start voltage determined according to the product of the distance between the conductive wire portions of the adjacent conductive wires 10 and the atmospheric pressure (fluid pressure). By being applied between them, dielectric barrier discharge is generated and plasma is generated.

  As described above, in the portion extending linearly, the plasma generation portion P is configured by the plurality of conductive wire portions and the plurality of insulating coating portions of the portion covered by the plurality of insulating coating portions.

  A plurality of portions extending linearly are provided. The plurality of linearly extending portions are arranged side by side along the one direction. The plurality of linearly extending portions are positioned in parallel to each other.

  By providing a plurality of portions extending linearly, a plurality of plasma generation portions P are also provided. The plurality of plasma generation units P are arranged side by side along the one direction. The plurality of plasma generating parts P are located in parallel to each other.

  In the plasma generation element 1E, a plurality of plasma generation units P are configured. By flowing the gas to be processed in parallel with the direction in which the plurality of coated conducting wires 10 are arranged, the gas to be processed can be efficiently cleaned.

  The plasma generating element 1E according to the present embodiment can be bent and deformed because the conductive wires 20 and the plurality of insulating coating layers 30 included in the plurality of coated conductive wires 10 have flexibility. By extending the plurality of coated conductive wires 10 in a meandering manner, a plurality of plasma generation parts P can be formed, and the gas to be processed can be cleaned over a wide range.

  Moreover, in the part extended linearly among the some covered conducting wires 10, the distance between the both ends of the some conductive wire 20 is made by bending each correspondingly in the same direction in at least one part of the said extension direction. Can be varied. For example, when the plurality of covered conductive wires 10 are supported by the pair of support plates 60 as described above, the distance between the pair of support plates 60 can be varied. Thereby, the freedom degree of installation of the said plasma generation element 1E and the plasma generation apparatus 100E provided with the same can be improved.

  In the present embodiment, the plurality of plasma generating parts P are positioned in parallel because the linearly extending portions of the plurality of coated conductive wires 10 extending in a meandering manner are positioned in parallel to each other. However, the present invention is not limited to this, and the plasma generating elements according to the first to fifth embodiments are arranged in a direction perpendicular to the plane on which the plurality of conductive line portions are arranged. By doing so, a plurality of plasma generation units may be provided. In order to form the plasma generation part P over a wide range, a plurality of plasma generation elements may be provided on the same plane.

(Embodiment 7)
FIG. 10 is a cross-sectional view showing the internal configuration of the air cleaner according to the present embodiment. FIG. 11 is a rear view of the air cleaner according to the present embodiment. With reference to FIG. 10 and FIG. 11, the air cleaner 200 which concerns on this Embodiment is demonstrated. Air cleaner 200 is an example of an electronic device that includes a plasma generation device. For example, plasma generation device 100 according to Embodiment 1 is used as the plasma generation device.

  As shown in FIGS. 10 and 11, the air purifier 200 includes a plasma generating device 100, a main body 210 provided with a suction port 220 and a blower outlet 230, a blower path 240, and a blower 250 as a blower.

  The suction port 220 is provided on the back side of the main body 210. The air outlet 230 is provided above the main body 210. The air supply path 240 is provided in the main body 210 and connects the suction port 220 and the air outlet 230. A blower 250 is provided in the blower path 240. A part of the ventilation path 240 is defined by the casing of the blower 250.

  The blower 250 blows air sucked from the suction port 220 toward the blower outlet 230. As the blower 250, various blowers such as a sirocco fan and a cross flow fan can be employed.

  The plasma generating apparatus 100 is disposed in the blower path 240. Specifically, the plasma generation apparatus 100 is disposed in a position in the vicinity of the suction port 220 or in the blower path 240 located between the blower 250 and the blower outlet 230. The plasma generating apparatus 100 is arrange | positioned so that the extension direction and the ventilation direction of the covering conducting wire 10 may become substantially parallel, for example. In addition, the plasma production apparatus 100 should just be arrange | positioned so that the pressure loss of the ventilation which blows may become small, and is not limited to the relationship between the extending direction of the covering conducting wire 10, and the ventilation direction as mentioned above. The plane or the like on which the plurality of covered conductive wires 10 are arranged may be substantially parallel to the blowing direction.

  By disposing the plasma generating apparatus 100 in this way and allowing air to pass through the plasma generating apparatus 100 while generating plasma, inactivation of bacteria and viruses present in the air, or odors are included in the air. Impurity gas can be decomposed and removed. Thereby, the air suck | inhaled from the suction inlet 220 and the air which blows off from the blower outlet 230 can be purified. As a result, clean air can be blown out from the outlet 230.

  In the present embodiment, an air purifier has been described as an example of an electric device. However, the present invention is not limited to this, and the electric device is not limited to this, but includes an air conditioner (air conditioner), a refrigeration device, and the like. A vacuum cleaner, a humidifier, a dehumidifier, or the like may be used as long as it is an electric device having a blowing unit for allowing the plasma generating apparatus 100 to pass air when sucking air and blowing air.

  In the present embodiment, the case where the plasma generation apparatus 100 according to the first embodiment is used as the plasma generation apparatus has been described as an example. However, the present invention is not limited to this, and the plasma generation according to the second to sixth embodiments is described. Any of the plasma generation apparatuses including the element may be used.

  Although the embodiments of the present invention have been described above, the embodiments disclosed herein are illustrative and non-restrictive in every respect. The scope of the present invention is defined by the terms of the claims, and includes meanings equivalent to the terms of the claims and all modifications within the scope.

  1, 1A, 1B, 1C, 1D, 1E Plasma generating element, 10 coated conductor, 10A first coated conductor, 10A1 first coated conductor, 10A2, 10B2 folded portion, 10B second coated conductor, 10B1 second coated conductor , 20, 21, 22 Conductive wire, 30, 31, 32 Insulation coating layer, 30B, 30C Insulation coating portion, 33 connection portion, 50 high voltage circuit, 51, 52 wiring, 60 pair of support plates, 60C pair of hollow disks 100, 100A, 100B, 100C, 100D, 100E Plasma generator, 200 air cleaner, 210 main body, 220 suction port, 230 air outlet, 240 air flow path, 250 air blower.

Claims (5)

A plasma generation element having a plasma generation unit that generates plasma by generating dielectric barrier discharge,
A plurality of conductive wire portions arranged in parallel with each other;
A plurality of insulation coating portions for insulating coating the plurality of conductive wire portions;
Each of the plurality of insulation coating portions is provided over a predetermined length in the extending direction of each of the plurality of conductive wire portions so that a gap capable of generating plasma is formed between adjacent insulation coating portions, Thereby, the plasma generating unit is configured by the plurality of conductive wire portions and the plurality of insulating coating portions of the portion covered by the plurality of insulating coating portions,
Each of the plurality of conductive wire portions and the plurality of insulating coating portions has flexibility,
A plasma generation element configured to generate plasma in the plasma generation unit by generating a potential difference between adjacent conductive line units.   The plasma generating element according to claim 1, wherein the insulating coating portions adjacent to each other are connected at least partially from one end side to the other end side.   The plasma generating element according to claim 1, wherein the plurality of conductive line portions are arranged on a plane, a curved surface, or an annular shape.   3. The plasma generating element according to claim 1, wherein the plurality of conductive line portions are bent in the same direction correspondingly in at least a part of the extending direction, so that the plasma generating portion has a bent portion. .   5. The system according to claim 1, wherein a plurality of the plasma generation units are provided by providing a plurality of sets of the plurality of conductive wire portions and the plurality of insulating coating portions constituting the plasma generation unit. 2. The plasma generating element according to claim 1.

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