JP2016219578A5 - - Google Patents
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- Publication number
- JP2016219578A5 JP2016219578A5 JP2015101980A JP2015101980A JP2016219578A5 JP 2016219578 A5 JP2016219578 A5 JP 2016219578A5 JP 2015101980 A JP2015101980 A JP 2015101980A JP 2015101980 A JP2015101980 A JP 2015101980A JP 2016219578 A5 JP2016219578 A5 JP 2016219578A5
- Authority
- JP
- Japan
- Prior art keywords
- processing chamber
- plasma
- vacuum processing
- vacuum
- processing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015101980A JP2016219578A (ja) | 2015-05-19 | 2015-05-19 | プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015101980A JP2016219578A (ja) | 2015-05-19 | 2015-05-19 | プラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2016219578A JP2016219578A (ja) | 2016-12-22 |
| JP2016219578A5 true JP2016219578A5 (https=) | 2018-02-22 |
Family
ID=57578621
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015101980A Pending JP2016219578A (ja) | 2015-05-19 | 2015-05-19 | プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2016219578A (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102600534B1 (ko) * | 2021-11-02 | 2023-11-10 | 세메스 주식회사 | 기판 처리 장치 및 기판 처리 방법 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62204528A (ja) * | 1986-03-05 | 1987-09-09 | Hitachi Ltd | ドライプロセス処理装置 |
| JPH02151027A (ja) * | 1988-12-01 | 1990-06-11 | Nec Corp | 半導体装置の製造装置 |
| JPH0653169A (ja) * | 1992-07-28 | 1994-02-25 | Tokyo Electron Ltd | 処理室圧力安定化方法 |
| JP2002363755A (ja) * | 2001-06-06 | 2002-12-18 | Sharp Corp | プラズマ処理装置およびプラズマ処理装置の調圧方法 |
| JP4620537B2 (ja) * | 2005-07-21 | 2011-01-26 | 東京エレクトロン株式会社 | プラズマ処理装置およびプラズマ処理装置の制御方法 |
| WO2007026889A1 (ja) * | 2005-09-01 | 2007-03-08 | Matsushita Electric Industrial Co., Ltd. | プラズマ処理装置、プラズマ処理方法、これに用いられる誘電体窓及びその製造方法 |
-
2015
- 2015-05-19 JP JP2015101980A patent/JP2016219578A/ja active Pending
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