JP2016208034A - エッチングチャンバ及び堆積チャンバに利用するための長寿命溶射コーティング - Google Patents
エッチングチャンバ及び堆積チャンバに利用するための長寿命溶射コーティング Download PDFInfo
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- 230000008021 deposition Effects 0.000 title description 5
- 238000005530 etching Methods 0.000 title description 2
- 238000005507 spraying Methods 0.000 title 1
- 238000000576 coating method Methods 0.000 claims abstract description 32
- 238000000034 method Methods 0.000 claims abstract description 21
- 238000012545 processing Methods 0.000 claims abstract description 17
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 15
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000011248 coating agent Substances 0.000 claims description 27
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 16
- 229910052726 zirconium Inorganic materials 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 15
- 239000010453 quartz Substances 0.000 claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
- 238000004891 communication Methods 0.000 claims description 11
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 claims description 9
- PSNPEOOEWZZFPJ-UHFFFAOYSA-N alumane;yttrium Chemical compound [AlH3].[Y] PSNPEOOEWZZFPJ-UHFFFAOYSA-N 0.000 claims description 8
- 238000005259 measurement Methods 0.000 claims description 7
- 238000007750 plasma spraying Methods 0.000 claims description 7
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 6
- 239000002131 composite material Substances 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 4
- 229910000838 Al alloy Inorganic materials 0.000 claims description 2
- 239000002019 doping agent Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 238000012544 monitoring process Methods 0.000 claims description 2
- 229910052727 yttrium Inorganic materials 0.000 claims 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims 2
- 239000013078 crystal Substances 0.000 claims 1
- 239000002223 garnet Substances 0.000 claims 1
- 230000008569 process Effects 0.000 abstract description 11
- JNDMLEXHDPKVFC-UHFFFAOYSA-N aluminum;oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Al+3].[Y+3] JNDMLEXHDPKVFC-UHFFFAOYSA-N 0.000 abstract description 3
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 abstract description 3
- 229910002076 stabilized zirconia Inorganic materials 0.000 abstract description 2
- 239000000126 substance Substances 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 36
- 210000002381 plasma Anatomy 0.000 description 21
- 229910019655 synthetic inorganic crystalline material Inorganic materials 0.000 description 10
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 238000000231 atomic layer deposition Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 229910000421 cerium(III) oxide Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 238000000224 chemical solution deposition Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005328 electron beam physical vapour deposition Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- HTXDPTMKBJXEOW-UHFFFAOYSA-N iridium(IV) oxide Inorganic materials O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 1
- NSTASKGZCMXIET-UHFFFAOYSA-N iridium(iv) oxide Chemical compound [O-2].[O-2].[Ir+4] NSTASKGZCMXIET-UHFFFAOYSA-N 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 230000002085 persistent effect Effects 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000012703 sol-gel precursor Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000005382 thermal cycling Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
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Abstract
【解決手段】プラズマ処理チャンバの内表面であるアルミニウム101を、酸化アルミニウム(Al2O3)の層102、安定化されたジルコニア(YSZ)の層103、イットリウム・アルミニウム・ガーネット(YAG)の層104の多層膜でコーティングする。
【選択図】図1
Description
Claims (15)
- プラズマを収容するように構成されたチャンバを備える基板処理装置であって、前記プラズマに面するように方向付けられた1つ以上の多層表面を備え、前記1つ以上の多層表面は、それぞれ、
ベース材料と、
前記ベース材料を覆う、ドーパント酸化物で安定化されたジルコニアを含む第1の層と、
前記第1の層を覆う、イットリウム・アルミニウム複合物を含む第2の層と、
を含む、装置。 - 請求項1に記載の装置であって、
前記イットリウム・アルミニウム複合物は、イットリウム・アルミニウム・ガーネット(YAG)である、装置。 - 請求項1に記載の装置であって、
前記イットリウム・アルミニウム複合物は、イットリウム・アルミニウム単斜晶(YAM)及びイットリウム・アルミニウム・ペロブスカイト(YAP)である、装置。 - 請求項1に記載の装置であって、
前記第1の層は、イットリア安定化ジルコニア(YSZ)である、装置。 - 請求項1に記載の装置であって、
前記ベース材料は、金属アルミニウム又はアルミニウム合金である、装置。 - 請求項5に記載の装置であって、更に、
前記ベース材料の上に且つ前記第1の層の下に、酸化アルミニウムを含む第3の層を備える装置。 - 請求項1に記載の装置であって、
前記ベース材料は、石英である、装置。 - 請求項1に記載の装置であって、
前記第1の層は、少なくとも約0.05mmで且つ約0.1mm以下の厚さを有し、前記第2の層は、少なくとも約0.05mmで且つ約0.15mm以下の厚さを有する、装置。 - 請求項1に記載の装置であって、
前記第1の層及び前記第2の層の厚さ合計は、約0.2mm未満である、装置。 - 請求項1に記載の装置であって、
前記1つ以上の多層表面の少なくとも1つは、前記装置を修理するために前記チャンバから取り外されて同一のチャンバライナで交換されてよいように前記プラズマに面して前記チャンバに嵌め込まれるように構成された交換可能なチャンバライナである、装置。 - 請求項1に記載の装置であって、
前記1つ以上の多層表面の少なくとも1つは、透明な石英窓である、装置。 - 請求項11に記載の装置であって、更に、
前記石英窓を通して前記チャンバの内部で分光測定を行うように位置決めされた分光測定センサと、
前記分光測定の結果に対応する信号を1つ以上のデジタル信号に変換するように構成されたアナログ−デジタル変換器と、
汎用コンピュータであって、
1つ以上のプロセッサと、
デジタルメモリシステムと、
前記デジタル−アナログ変換器と通信しており、前記1つ以上のデジタル信号を受信するように構成された入出力バスと、
前記1つ以上のプロセッサと、前記データレシーバと、前記デジタルメモリシステムと、前記入出力バスとの間でデータを伝送するように構成された1本以上の相互接続バスと、
を含む汎用コンピュータと、
を備える装置。 - 請求項12に記載の装置であって、
前記デジタルメモリシステムは、一連のステップをサイクル周期で繰り返すための命令を含む実行可能プログラム命令をロードされており、前記サイクル内の前記ステップは、
(1)前記アナログ−デジタル変換器からの前記1つ以上のデジタル信号のなかから、前記チャンバ内におけるジルコニウムのレベルの分光測定結果を反映した数であるデジタル信号を受信することと、
(2)前記数を、前記チャンバ内の1つ以上の表面の破損を反映した前記ジルコニウムのレベルの最大値を表す閾値と比較することと、
(3)前記数が前記閾値に等しい及び/又は前記閾値を超える場合に、前記サイクルを終了させ、前記装置内における一表面上のコーティングの破損を示す信号を送信し、そうでない場合に、前記サイクルを繰り返すことと、
を含む、装置。 - 請求項12に記載の装置を操作する方法であって、
前記分光測定センサを使用し、前記石英窓を通して前記チャンバ内における前記ジルコニウムのレベルの分光測定を繰り返し行うことであって、前記分光測定結果は、前記アナログ−デジタル変換器によって前記1つ以上のデジタル信号に変換され、前記汎用コンピュータの前記入出力バスに伝送される、ことと、
前記汎用コンピュータに、コンピュータ実行可能プログラム命令を実行させることであって、前記コンピュータ実行可能プログラム命令は、前記デジタル信号を、それらが前記チャンバ内における前記ジルコニウムのレベルの急上昇を反映するまで監視するための命令と、次いで、前記装置内における一表面上のコーティングの破損を示す信号を伝送するための命令とを含む、ことと、を
備える方法。 - 請求項1に記載の装置を作成する方法であって、前記1つ以上の表面の各表面のために、
前記ベース材料を提供することと、
前記表面にプラズマ溶射を施すことによって、前記ベース材料を覆う前記第1の層を形成することと、
前記第1の層が形成された後に、前記表面にプラズマ溶射を施すことによって、前記第1の層を覆う前記第2の層を形成することと、
を備える方法。
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