JP2016207693A - Imprint mold, imprint method, pattern formation body - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an imprint mold and imprint method for producing a pattern formation body free from defect by making a transfer material, dispensed on an imprint mold of good detachability, stay at a desired position.SOLUTION: An imprint mold for transferring an uneven pattern to a transfer material includes a substrate, a main pattern including a first fine uneven structure formed on the principal surface of the substrate, and an auxiliary pattern including a second fine uneven structure formed at least partially in a region where the main pattern is not formed, out of the surface of the substrate where the main pattern is formed. The surface of the substrate where at least the main pattern and auxiliary pattern are formed is formed so that the detachability from the hardened transfer material becomes high.SELECTED DRAWING: Figure 5

Description

  The present invention relates to an imprint mold, an imprint method using the imprint mold, and a pattern forming body manufactured using the imprint method.

  In recent years, there is a demand for a method for forming a specific fine uneven pattern (three-dimensional structure pattern) according to various applications.

  For example, semiconductor devices, optical elements, wiring circuits, data storage media (hard disks, optical media, etc.), medical materials (analysis test chips, microneedles, etc.), bio devices (biosensors, cell culture substrates, etc.), precision testing Applications such as equipment members (inspection probes, sample holding members, etc.), display panels, panel members, energy devices (solar cells, fuel cells, etc.), microchannels, microreactors, MEMS devices, imprint molds, photomasks, etc. It is done.

  As a method for forming such a fine concavo-convex pattern, a technique called an imprint method has attracted attention.

  In the imprint method, an original plate called an imprint mold having a concavo-convex pattern to be transferred is brought into contact with a resin on a base material, and the resin is cured in a state where the resin conforms to the shape of the concavo-convex pattern of the original plate. The uneven pattern is transferred to the resin on the substrate.

  One typical imprinting method is a photoimprinting method in which a resin is cured by exposure (see Patent Document 1).

  As an example, pattern formation by a conventional general optical imprint method will be described with reference to FIG.

  First, as shown in FIG. 1A, a UV curable resin 12 is dispensed on the imprint mold 11. Next, as shown in FIG.1 (b), the base material 13 is made to contact UV curing resin 12, and UV curing resin 12 is spread to a desired pattern area | region. Next, as shown in FIG. 1C, the UV curable resin 12 is cured by irradiating UV light 99. Next, as shown in FIG.1 (d), the base material 13 and the imprint mold 11 are peeled away and the pattern formation body 15 which has the transcription pattern 14 on the base material 13 is obtained.

JP 2000-194142 A

  In order to prevent the cured resin 12 from adhering to the imprint mold 11 and damaging the transfer pattern 14, the imprint mold 11 is made of a material having a high releasability from the cured resin 12, or is previously peelable. Surface treatment is performed to improve the quality.

  As a method for efficiently spreading the resin 12 on the pattern area 16 of the imprint mold 11, as shown in FIGS. 2 and 3, the resin 12 is dispensed near the end of the imprint mold 11 (FIG. 2A, FIG. 3). ), After covering the base material 13 so as to come into contact with the resin 12 (FIG. 2B), there is a method of extending the pattern region 16 (FIG. 2C).

  However, when the resin 12 is dispensed on the surface of the imprint mold 11 with good releasability, the contact angle is very high, so that the resin droplet rolls and moves without staying at a desired position on the imprint mold 11. (See reference numerals 17 to 19 in FIG. 4).

  If the resin 12 moves from a desired position before the substrate 13 is covered, the resin 12 may fall to the outside of the imprint mold 11 (see reference numeral 18 in FIG. 4), or the resin 12 may be imprint mold. There is a concern that a defect may occur in which the entire 11 pattern region 16 does not spread or bubbles enter the spread resin 12. In addition, a plurality of moved droplets may be integrated (see reference numeral 19 in FIG. 4).

  If the resin 12 falls to the outside of the imprint mold 11, the amount of the resin 12 necessary for the transfer is insufficient and the transfer pattern 14 is defective, or the side surface and the back surface of the imprint mold 11 are contaminated by the resin and need to be cleaned. It becomes. If the resin 12 does not spread over the entire pattern region 16, the pattern forming body 15 having the desired transfer pattern 14 cannot be obtained. Further, when bubbles enter the resin 12, the bubbles become defects in the transfer pattern.

  The present invention has been made in order to solve the above-described problem. The transfer material dispensed on the imprint mold having good releasability is kept at a desired position, and an in-pattern capable of forming a defect-free pattern formed body can be formed. It is an object of the present invention to provide a print mold, an imprint method, and a pattern forming body manufactured by using the imprint method.

  The invention according to claim 1 of the present invention is an imprint mold for transferring a concavo-convex pattern to a transfer material, and includes a main pattern including a substrate and a first fine concavo-convex structure formed on a main surface of the substrate. And an auxiliary pattern including a second fine concavo-convex structure formed in at least a part of a region where the main pattern is not formed in a surface of the substrate where the main pattern is formed, At least the surface on which the main pattern and the auxiliary pattern are formed is designed to have high releasability from the cured transfer material.

According to a second aspect of the present invention, there is provided a dispensing step of dispensing a transfer material on the auxiliary pattern of the imprint mold according to the first aspect; a substrate is brought into contact with the transfer material; It is an imprinting method characterized by comprising a transfer step for spreading the entire pattern region, a curing step for curing the transfer material, and a peeling step for peeling the base material and the imprint mold in this order.

  The invention according to claim 3 of the present invention is a pattern formed body manufactured using the imprint method according to claim 2.

  According to the present invention, an imprint mold, an imprint method, and an imprint method that can cause a transfer material to remain at a desired position on an imprint mold at the time of imprinting and obtain a pattern-formed body having no defect. The pattern formed body manufactured in this way can be provided.

It is a schematic sectional drawing which shows the pattern formation body manufacturing method by the conventional optical imprint method. It is a schematic sectional drawing which shows the pattern formation body manufacturing method by the conventional optical imprint method. It is a schematic plan view which shows the pattern formation body manufacturing method by the conventional optical imprint method corresponding to Fig.2 (a). It is a schematic plan view which shows the problem in the pattern formation body manufacturing method by the conventional optical imprint method. It is a schematic plan view of the imprint mold in embodiment of this invention. It is a schematic sectional drawing explaining the imprint method in embodiment of this invention. It is a schematic sectional drawing explaining the imprint mold preparation process in the Example of this invention. It is a schematic plan view which shows the imprint mold in the Example of this invention. It is a schematic sectional drawing explaining the manufacturing process of the pattern formation body by the imprint method of the Example of this invention.

  The imprint mold according to the embodiment of the present invention will be described with reference to FIG.

  An imprint mold 31 according to an embodiment of the present invention is for transferring a concavo-convex pattern onto a transfer material, and has a substrate. As shown in FIG. A main pattern 21 for transferring the pattern is formed. On the substrate of the imprint mold 31, there is further provided an auxiliary pattern 22 for keeping the dispensed transfer material before curing at a desired position on the substrate.

  In addition, at least the upper surface of the surface of the imprint mold 31 is designed to have high peelability from the cured transfer material. For this, a material having high peelability from the cured transfer material may be used for the substrate itself, or the outermost surface of the substrate may be processed so that the peelability from the cured transfer material is high.

  The imprint mold 31 of the present invention is not limited to a specific imprint method, and can be widely applied to known imprint methods. For example, imprinting methods such as optical imprinting, thermal imprinting, and sol-gel imprinting can be mentioned.

  Moreover, it can select suitably as a board | substrate so that it may be suitable for the imprint method to be used. For example, quartz glass, silicon, nickel and the like can be mentioned. Here, for example, when quartz glass is used as the substrate, quartz has transparency to general exposure light, and the present invention is applied to optical imprinting in which exposure is performed from the back side of the imprint mold. It is suitable when the imprint method shown in the form is used. Moreover, as a manufacturing method of the imprint mold 31, a well-known mold manufacturing method may be used as appropriate.

  The main pattern 21 can be designed according to the pattern to be transferred to the transfer material. For example, a line and space, a hole, a dot pattern, etc. are mentioned. The step of the main pattern is not limited to one step, but may be a stepped shape having two or more steps.

  The auxiliary pattern 22 has a concavo-convex structure having a finer pitch than the pitch of the concavo-convex structure constituting the main pattern 21. The auxiliary pattern 22 is a fine pattern of nano to micron size, and the transfer material dispensed on the auxiliary pattern 22 is prevented from moving out of the auxiliary pattern 22 area before the transfer operation is started.

  Further, the auxiliary pattern 22 is not limited to the position shown in FIG. 5A, and can be provided at an arbitrary position that does not interfere with the main pattern 21 in the plane where the imprint mold 31 and the transfer material contact. . For example, the position of the auxiliary pattern 22 may be outside the area of the main pattern 21 as shown in FIG. 5A, or the main pattern in the area where the main pattern 21 is arranged as shown in FIG. The position which does not interfere with 21 may be sufficient, and as shown in FIG.5 (c), you may provide in multiple places.

  Next, an imprint method according to an embodiment of the present invention will be described with reference to FIG.

  First, as shown in FIG. 6A, a transfer material 32 is dispensed on the auxiliary pattern 22 provided on the upper surface of the imprint mold 31. The dispensing method may be appropriately selected according to the type of the transfer material 32, the amount of dispensing, and the like, and a pipette, a dispenser, an ink jet, or the like may be used.

  At this time, by dispensing the transfer material 32 on the auxiliary pattern 22, it is possible to prevent the droplet of the transfer material 32 from rolling and moving on the upper surface of the imprint mold 31.

  Next, as shown in FIG. 6B, the base material 33 is placed so as to come into contact with the transfer material 32 on the imprint mold 31. The substrate 33 may be appropriately selected depending on the application. Examples of the material of the base material 33 include PET film, quartz glass, and silicon. Here, for example, when a PET film or quartz glass is used as the base material, PET or quartz has transparency to general exposure light, and the optical input for performing exposure from the back side of the base material 33 is used. This is suitable when the imprint method shown in the embodiment of the present invention is used for printing.

  At this time, the base material 33 is sized to cover the main pattern 21 and the auxiliary pattern 22 provided on the imprint mold 31, so that the transfer material 32 dispensed on the auxiliary pattern 22 can be spread on the main pattern 21. It becomes possible.

  Further, at least the lower surface of the surface of the substrate 33, that is, the surface in contact with the transfer material 32 is formed so as to have high adhesion to the cured transfer material 32. For this, a material having high adhesion to the cured transfer material 32 may be used for the substrate 33 itself, or the outermost surface of the substrate 33 is processed so that adhesion to the cured transfer material 32 is increased. May be.

  Next, as shown in FIG. 6C, the transfer material 32 is spread over the entire main pattern 21. The method of spreading the transfer material 32 includes the viscosity of the transfer material 32, the amount of the transfer material 32, the pattern height (depth) of the main pattern 21, the area of the main pattern 21, the arrangement of the main pattern 21 and the auxiliary pattern 22, and the substrate. You may select suitably according to the material of 33, the thickness of the desired pattern formation body 35, etc. For example, spreading while applying pressure with a roller, pressing and spreading in the vertical direction, spreading with the weight of the substrate itself, and the like.

  Next, as shown in FIG. 6D, the transfer material 32 is cured. The curing method may be appropriately selected according to the imprint method or the transfer material 32. For example, light imprinting can be performed by performing exposure from the back side of the imprint mold 31 or the base material 33 made of a material having optical transparency.

  Next, as shown in FIG. 6E, the pattern formation in which the transfer pattern 34 having the main pattern 21 and the auxiliary pattern 22 is formed on the substrate 33 by peeling the substrate 33 from the imprint mold 31. A body 35 is obtained.

  Thereafter, as shown in FIG. 6F, the region where the auxiliary pattern 22 is transferred may be removed as necessary.

  Hereinafter, specific examples of the imprint mold, the imprint method, and the pattern forming body manufacturing method of the present invention will be described with reference to FIGS. FIGS. 7 to 9 are diagrams showing an example of producing a pattern forming body by producing a quartz imprint mold for optical imprinting and performing optical imprinting.

  First, a method for producing a quartz imprint mold for optical imprint will be described.

  First, as shown in FIG. 7A, a resist material was coated to a thickness of 100 nm on a laminated substrate in which a chromium layer 42 having a thickness of 10 nm was formed on a quartz substrate 41 to form a resist film 43.

  Next, as shown in FIG. 7B, after patterning by irradiating the electron beam onto the resist film 43 with an electron beam drawing apparatus, development processing, rinsing, and rinsing liquid are dried to form a resist pattern. 44 was obtained. At this time, as shown in FIG. 8, an auxiliary pattern 22 for dropping the resin was also formed at a position 2 cm away from the edge of the substrate outside the area of the main pattern 21. The auxiliary pattern 22 was a line and space pattern with a pitch of 600 nm to 20 μm.

  Next, as shown in FIG. 7C, a chromium pattern 45 having a main pattern 21 and an auxiliary pattern 22 was formed by dry etching using a chlorine-based mixed gas plasma using the resist pattern 44 as a mask.

  Next, as shown in FIG. 7D, using the chromium pattern 45 as a mask, the quartz substrate 41 is dry-etched to a depth of 120 nm using a fluorocarbon mixed gas plasma, and the main pattern 21 and the auxiliary pattern 22 are formed. A quartz pattern 46 is formed.

  Next, as shown in FIG. 7E, the remaining chromium pattern 45 was removed by a wet cleaning process, and then a mold release process was performed using a fluorine-based mold release agent.

  Thus, a quartz imprint mold 51 was obtained.

  Next, a method for producing a pattern forming body by performing optical imprinting using the produced quartz imprint mold will be described.

  First, as shown in FIG. 9A, a photocurable resin PAK-02 (manufactured by Toyo Gosei Co., Ltd.) was dropped as a transfer material 52 on the auxiliary pattern 22 of the quartz imprint mold 51.

  Next, as shown in FIG. 9B, the PET film 53 was placed so that the easy adhesion surface of the PET film 53 was in contact with the transfer material 52.

  Next, as shown in FIG. 9C and FIG. 9D, the transfer material 52 was spread by the rubber roller 88 so that the transfer material 52 spread over the region of the main pattern 21.

Next, as shown in FIG. 9E, from the side on which the PET film 53 was placed, the transfer material 52 was cured by performing exposure at 100 mJ / m ² using a light source having a peak wavelength of 365 nm.

  Next, the PET film 53 was peeled from the quartz imprint mold 51 to obtain a pattern forming body 55 in which the resin pattern 54 having the main pattern 21 and the auxiliary pattern 22 was formed on the PET film 53.

  The imprint mold, the imprint method, and the pattern forming body of the present invention can be used in a wide range of fields where a fine pattern is required. For example, photomasks, semiconductor devices, optical elements, wiring circuits, data storage media (hard disks, optical media, etc.), medical members (analysis test chips, microneedles, etc.), biodevices (biosensors, Cell culture substrate, etc., precision inspection equipment members (test probes, sample holding members, etc.), display panels, panel members, energy devices (solar cells, fuel cells, etc.), microchannels, microreactors, MEMS devices, etc. There is expected.

DESCRIPTION OF SYMBOLS 11 ... Imprint mold 12 ... UV curable resin 13 ... Base material 14 ... Transfer pattern 15 ... Pattern formation body 16 ... Pattern area | region 17 ... Moved UV curable resin 18. ..UV curable resin 19 that has moved and dropped from the imprint mold 19... UV curable resin 21 that has moved and integrated a plurality of droplets 21... Main pattern 22. Mold 32 ... Transfer material 33 ... Base material 34 ... Transfer pattern 35 ... Pattern forming body 41 ... Quartz substrate 42 ... Chrome layer 43 ... Resist film 44 ... Resist pattern 45 ... Chrome pattern 46 ... Quartz pattern 51 ... Quartz imprint mold 52 ... Transfer material 53 ... PET film 54 ... Resin pattern 55 ... Pattern-formed body 88 ... rubber roller 99 ··· UV light

Claims (3)

An imprint mold for transferring a concavo-convex pattern to a transfer material,
A substrate,
A main pattern including a first fine relief structure formed on the main surface of the substrate;
An auxiliary pattern including a second fine concavo-convex structure formed in at least a part of a region where the main pattern is not formed in a surface of the substrate on which the main pattern is formed,
An imprint mold, wherein at least a surface of the substrate on which the main pattern and the auxiliary pattern are formed is formed so as to have high releasability from a cured transfer material. A dispensing step of dispensing a transfer material on the auxiliary pattern of the imprint mold according to claim 1;
A transfer step in which a substrate is brought into contact with the transfer material, and the transfer material is spread over the entire area of the main pattern;
A curing process for curing the transfer material;
An imprint method comprising: a peeling step for peeling the base material and the imprint mold in this order.   A pattern formed body manufactured using the imprint method according to claim 2.