JP2016200649A5 - - Google Patents
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- Publication number
- JP2016200649A5 JP2016200649A5 JP2015078857A JP2015078857A JP2016200649A5 JP 2016200649 A5 JP2016200649 A5 JP 2016200649A5 JP 2015078857 A JP2015078857 A JP 2015078857A JP 2015078857 A JP2015078857 A JP 2015078857A JP 2016200649 A5 JP2016200649 A5 JP 2016200649A5
- Authority
- JP
- Japan
- Prior art keywords
- optical
- axis
- axis direction
- filter
- rod
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 230000003287 optical effect Effects 0.000 description 8
- 238000010586 diagram Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015078857A JP6544972B2 (ja) | 2015-04-08 | 2015-04-08 | 照明光学装置、およびデバイス製造方法 |
| TW105107917A TWI611272B (zh) | 2015-04-08 | 2016-03-15 | 照明光學設備及裝置製造方法 |
| US15/084,949 US9841589B2 (en) | 2015-04-08 | 2016-03-30 | Illumination optical apparatus and device manufacturing method |
| KR1020160040796A KR102035163B1 (ko) | 2015-04-08 | 2016-04-04 | 조명 광학장치, 및 디바이스 제조 방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015078857A JP6544972B2 (ja) | 2015-04-08 | 2015-04-08 | 照明光学装置、およびデバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016200649A JP2016200649A (ja) | 2016-12-01 |
| JP2016200649A5 true JP2016200649A5 (enExample) | 2018-05-24 |
| JP6544972B2 JP6544972B2 (ja) | 2019-07-17 |
Family
ID=57111726
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015078857A Active JP6544972B2 (ja) | 2015-04-08 | 2015-04-08 | 照明光学装置、およびデバイス製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9841589B2 (enExample) |
| JP (1) | JP6544972B2 (enExample) |
| KR (1) | KR102035163B1 (enExample) |
| TW (1) | TWI611272B (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102439935B1 (ko) * | 2018-02-27 | 2022-09-02 | 가부시키가이샤 오크세이사쿠쇼 | 투영 노광 장치 |
| JP7185440B2 (ja) * | 2018-08-08 | 2022-12-07 | キヤノン株式会社 | 照明光学系、露光装置および物品製造方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000269114A (ja) * | 1999-03-16 | 2000-09-29 | Nikon Corp | 照明装置、露光装置及び露光方法 |
| US6281967B1 (en) * | 2000-03-15 | 2001-08-28 | Nikon Corporation | Illumination apparatus, exposure apparatus and exposure method |
| WO2000057459A1 (en) * | 1999-03-24 | 2000-09-28 | Nikon Corporation | Exposure method and apparatus |
| JP2004055856A (ja) * | 2002-07-19 | 2004-02-19 | Canon Inc | 照明装置、それを用いた露光装置及びデバイス製造方法 |
| EP1670043B1 (en) * | 2003-09-29 | 2013-02-27 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| US20050134820A1 (en) * | 2003-12-22 | 2005-06-23 | Asml Netherlands B.V. | Method for exposing a substrate, patterning device, and lithographic apparatus |
| US7312850B2 (en) * | 2004-04-02 | 2007-12-25 | Asml Netherlands B.V. | Lithographic apparatus, illumination system, and optical element for rotating an intensity distribution |
| JP2008191496A (ja) * | 2007-02-06 | 2008-08-21 | Sharp Corp | プロジェクタ |
| US7843549B2 (en) * | 2007-05-23 | 2010-11-30 | Asml Holding N.V. | Light attenuating filter for correcting field dependent ellipticity and uniformity |
-
2015
- 2015-04-08 JP JP2015078857A patent/JP6544972B2/ja active Active
-
2016
- 2016-03-15 TW TW105107917A patent/TWI611272B/zh active
- 2016-03-30 US US15/084,949 patent/US9841589B2/en active Active
- 2016-04-04 KR KR1020160040796A patent/KR102035163B1/ko active Active
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