JP2016200649A5 - - Google Patents

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Publication number
JP2016200649A5
JP2016200649A5 JP2015078857A JP2015078857A JP2016200649A5 JP 2016200649 A5 JP2016200649 A5 JP 2016200649A5 JP 2015078857 A JP2015078857 A JP 2015078857A JP 2015078857 A JP2015078857 A JP 2015078857A JP 2016200649 A5 JP2016200649 A5 JP 2016200649A5
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JP
Japan
Prior art keywords
optical
axis
axis direction
filter
rod
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Application number
JP2015078857A
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English (en)
Japanese (ja)
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JP6544972B2 (ja
JP2016200649A (ja
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Priority to JP2015078857A priority Critical patent/JP6544972B2/ja
Priority claimed from JP2015078857A external-priority patent/JP6544972B2/ja
Priority to TW105107917A priority patent/TWI611272B/zh
Priority to US15/084,949 priority patent/US9841589B2/en
Priority to KR1020160040796A priority patent/KR102035163B1/ko
Publication of JP2016200649A publication Critical patent/JP2016200649A/ja
Publication of JP2016200649A5 publication Critical patent/JP2016200649A5/ja
Application granted granted Critical
Publication of JP6544972B2 publication Critical patent/JP6544972B2/ja
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JP2015078857A 2015-04-08 2015-04-08 照明光学装置、およびデバイス製造方法 Active JP6544972B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2015078857A JP6544972B2 (ja) 2015-04-08 2015-04-08 照明光学装置、およびデバイス製造方法
TW105107917A TWI611272B (zh) 2015-04-08 2016-03-15 照明光學設備及裝置製造方法
US15/084,949 US9841589B2 (en) 2015-04-08 2016-03-30 Illumination optical apparatus and device manufacturing method
KR1020160040796A KR102035163B1 (ko) 2015-04-08 2016-04-04 조명 광학장치, 및 디바이스 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015078857A JP6544972B2 (ja) 2015-04-08 2015-04-08 照明光学装置、およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2016200649A JP2016200649A (ja) 2016-12-01
JP2016200649A5 true JP2016200649A5 (cg-RX-API-DMAC7.html) 2018-05-24
JP6544972B2 JP6544972B2 (ja) 2019-07-17

Family

ID=57111726

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015078857A Active JP6544972B2 (ja) 2015-04-08 2015-04-08 照明光学装置、およびデバイス製造方法

Country Status (4)

Country Link
US (1) US9841589B2 (cg-RX-API-DMAC7.html)
JP (1) JP6544972B2 (cg-RX-API-DMAC7.html)
KR (1) KR102035163B1 (cg-RX-API-DMAC7.html)
TW (1) TWI611272B (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102439935B1 (ko) * 2018-02-27 2022-09-02 가부시키가이샤 오크세이사쿠쇼 투영 노광 장치
JP7185440B2 (ja) * 2018-08-08 2022-12-07 キヤノン株式会社 照明光学系、露光装置および物品製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000269114A (ja) * 1999-03-16 2000-09-29 Nikon Corp 照明装置、露光装置及び露光方法
US6281967B1 (en) * 2000-03-15 2001-08-28 Nikon Corporation Illumination apparatus, exposure apparatus and exposure method
AU2940600A (en) * 1999-03-24 2000-10-09 Nikon Corporation Exposure method and apparatus
JP2004055856A (ja) * 2002-07-19 2004-02-19 Canon Inc 照明装置、それを用いた露光装置及びデバイス製造方法
KR101335736B1 (ko) * 2003-09-29 2013-12-02 가부시키가이샤 니콘 노광장치, 노광방법 및 디바이스 제조방법
US20050134820A1 (en) * 2003-12-22 2005-06-23 Asml Netherlands B.V. Method for exposing a substrate, patterning device, and lithographic apparatus
US7312850B2 (en) * 2004-04-02 2007-12-25 Asml Netherlands B.V. Lithographic apparatus, illumination system, and optical element for rotating an intensity distribution
JP2008191496A (ja) * 2007-02-06 2008-08-21 Sharp Corp プロジェクタ
US7843549B2 (en) * 2007-05-23 2010-11-30 Asml Holding N.V. Light attenuating filter for correcting field dependent ellipticity and uniformity

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