JP2016196678A5 - - Google Patents
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- JP2016196678A5 JP2016196678A5 JP2015076204A JP2015076204A JP2016196678A5 JP 2016196678 A5 JP2016196678 A5 JP 2016196678A5 JP 2015076204 A JP2015076204 A JP 2015076204A JP 2015076204 A JP2015076204 A JP 2015076204A JP 2016196678 A5 JP2016196678 A5 JP 2016196678A5
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- JP
- Japan
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015076204A JP6666656B2 (ja) | 2015-04-02 | 2015-04-02 | Ｒｆマグネトロンスパッタリング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015076204A JP6666656B2 (ja) | 2015-04-02 | 2015-04-02 | Ｒｆマグネトロンスパッタリング装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016196678A JP2016196678A (ja) | 2016-11-24 |
| JP2016196678A5 true JP2016196678A5 (enExample) | 2018-05-24 |
| JP6666656B2 JP6666656B2 (ja) | 2020-03-18 |
Family
ID=57358166
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015076204A Active JP6666656B2 (ja) | 2015-04-02 | 2015-04-02 | Ｒｆマグネトロンスパッタリング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6666656B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113774323B (zh) * | 2017-11-14 | 2023-12-12 | 大日本印刷株式会社 | 用于制造蒸镀掩模的金属板、蒸镀掩模及它们的制造方法 |
| EP3717675B1 (en) * | 2017-12-01 | 2022-09-21 | China Triumph International Engineering Co., Ltd. | Physical vapor deposition system comprising positioning marker and method for adjusting distance between crucible and substrate |
| JP7249142B2 (ja) * | 2018-12-14 | 2023-03-30 | キヤノントッキ株式会社 | 搬送キャリア、蒸着装置、および電子デバイスの製造装置 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013234350A (ja) * | 2012-05-08 | 2013-11-21 | Sumitomo Electric Ind Ltd | 酸化物超電導線材用の中間層付基材の製造装置および製造方法 |
| US10174420B2 (en) * | 2013-09-04 | 2019-01-08 | Toyo Kohan Co., Ltd. | Method for forming oxide layer, laminated substrate for epitaxial growth, and method for producing the same |
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2015
- 2015-04-02 JP JP2015076204A patent/JP6666656B2/ja active Active