JP2016167017A - Test method and test equipment - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a technique to make search of a superior range for reflection performance easy in a reflection plane of a diffraction-type spatial light modulator.SOLUTION: A technique includes: a step S10 of acquiring a first reflection light volume value distribution by monitoring reflection light volume value of reflected light for a reflection region formed in a reflection plane of plural modulation units; a step S13 of providing a region in the reflection region which extends to a first direction and is a linear region narrower than the reflection region in a second direction perpendicular to the first direction; and a step S15 of acquiring characteristics information about a light volume value in the linear region on the basis of the first reflection light volume value distribution.SELECTED DRAWING: Figure 7

Description

  The present invention relates to a technique for inspecting a diffractive spatial light modulator.

  When forming a pattern such as a circuit on the photosensitive material applied on the substrate, the light emitted from the light source is subjected to spatial modulation corresponding to the pattern data representing the pattern, and the light on the substrate is exposed to the spatially modulated light. In recent years, a direct drawing type drawing apparatus (direct drawing apparatus) that scans a material and does not use a mask has attracted attention.

  As a spatial light modulator, GLV (Grating Light Valve) (registered trademark of Silicon Light Machines (San Jose, Calif.)), Which is a diffractive ribbon diffractive element, is known. In the diffractive spatial light modulator, a light modulation element including a fixed ribbon having a fixed reflection surface and a movable ribbon having a movable reflection surface movable relative to the fixed reflection surface is provided along a predetermined direction. Are arranged (see, for example, Patent Document 1).

  In this diffractive spatial light modulator, when a voltage is applied to the movable ribbon of each light modulation element, the movable reflective surface moves to a position recessed with respect to the fixed reflective surface. The size of the recess can be adjusted by the amount of voltage applied to each movable ribbon. Each light modulation element controls the amount of reflected light (the amount of reflected light) by switching the incident light to zero-order light or diffracted light of a non-order 0 according to the size of the recess.

JP 2003-140355 A

  After completion of the assembly of the direct drawing apparatus, an operation for adjusting the incident position of the beam from the light source such as a laser unit through the illumination optical system to the reflecting surface of the diffractive spatial light modulator is performed. Conventionally, an operator repeatedly adjusts the illumination optical system to acquire a reflected light amount value, and a region where the reflected light amount value is the highest and stable, that is, a region having high reflection performance has been searched.

  In addition, when the beam is continuously irradiated to the same position on the reflecting surface, the amount of reflected light may change over time due to deterioration or the like. For this reason, in the diffractive spatial light modulator, generally, the incident position of the beam is shifted in the direction perpendicular to the arrangement direction (direction in which each light modulation element extends), and the use is continued again. ing. As described above, in the diffractive spatial light modulator, since it is assumed that the incident position is shifted, there are cases where a plurality of candidate regions are determined.

  However, the task of searching for an area with high reflection performance is largely dependent on the skill of each worker. For this reason, there is a possibility that the determined beam incident position varies depending on the skill of the operator.

  Therefore, an object of the present invention is to provide a technique that facilitates searching for a region having excellent reflection performance on the reflection surface of a diffractive spatial light modulator.

  In order to solve the above-described problem, the first aspect inspects a diffractive spatial light modulator in which a plurality of modulation units that form a reflecting surface that modulates and reflects incident light are arranged along the first direction. (A) a step of obtaining a first reflected light amount value distribution by measuring a reflected light amount value of reflected light with respect to a reflective region formed by a reflective surface of a plurality of modulation units; b) defining a linear region having a width narrower than that of the reflection region in the second direction orthogonal to the first direction and extending in the first direction among the reflection regions; c) obtaining characteristic information relating to the light amount value in the linear region based on the first reflected light amount value distribution.

  The second aspect is the inspection method according to the first aspect, wherein the step (c) includes dividing the linear region into regions corresponding to a plurality of modulation units into one cell. The method includes a step of dividing the linear region into a plurality of cells and acquiring characteristic information regarding the light amount value for each cell based on the first reflected light amount value distribution.

  The third aspect is the inspection method according to the second aspect, wherein the characteristic information acquired in the step (c) exceeds the ideal light amount value in which the average reflected light amount value of the cell is defined in advance. Information indicating whether or not.

  Further, a fourth aspect is the inspection method according to the third aspect, wherein (d) ratio information indicating a ratio of the cells exceeding the ideal light amount value among the plurality of cells included in the linear region. Generating further.

  Further, a fifth aspect is the inspection method according to the fourth aspect, wherein the step (b) divides the reflective region into a plurality of strip-shaped regions in the second direction, and each of the regions is (E) a step of generating order information indicating the order of the ratio based on the ratio information for each of the plurality of linear areas generated in the step (d), Further included.

  According to a sixth aspect, in the inspection method according to any one of the second to fifth aspects, (f) the characteristic information acquired in the step (c) is a reflection of the linear region. The method further includes a step of determining whether or not there is a portion below the reference light amount value in the linear region based on the reflected light amount value distribution of the linear region.

  In addition, a seventh aspect is the inspection method according to any one of the first to sixth aspects, wherein the step (b) is the first acquired in the step (b-1) (a). A step of generating a reflected light amount value distribution image obtained by imaging the reflected light amount value distribution and displaying the image on the display unit.

  Moreover, an 8th aspect is an inspection method which concerns on a 7th aspect, Comprising: The said (b) process is the said 8th displayed on the said display part in the (b-2) said (b-1) process. A step of displaying a representative line indicating the position of the linear region on the reflected light quantity value distribution image; and (b-3) a step of accepting a change in the position of the representative line based on a predetermined operation input; (B-4) a step of redefining the linear region based on the position of the representative line after the change received in the step (b-3), and the step (c) includes (c- 1) A step of displaying, on the display unit, the characteristic information about the linear region defined in the step (b-4) based on the first reflected light amount value distribution.

  Further, a ninth aspect is an inspection method according to the eighth aspect, wherein the step (b-2) is performed on the first reflected light amount value distribution image displayed on the display unit. It is a step of displaying a plurality of the representative lines indicating the plurality of linear regions arranged at predetermined intervals in the direction.

  A tenth aspect is an inspection method according to any one of the first to ninth aspects, and (g) after the step (a), after the step (a), the reflected light amount of the reflected light is reflected on the reflective region. Measuring the value, reacquiring the second reflected light amount value distribution, (h) the first reflected light amount value distribution acquired in the step (a), and acquired in the step (g). Comparing the second reflected light amount value distribution.

  An eleventh aspect is an inspection apparatus for inspecting a diffractive spatial light modulator in which a plurality of modulation units that form a reflecting surface that modulates and reflects incident light is arranged along the first direction, A reflection light amount value distribution acquisition unit that acquires a first reflected light amount value distribution of reflected light, and a region that extends in the first direction among the reflection regions. And a linear region defining portion that defines a linear region having a width narrower than the reflective region in a second direction orthogonal to the first direction, and the linear shape based on the first reflected light amount value distribution. A characteristic information acquisition unit that acquires characteristic information related to the amount of reflected light in the region.

  According to the first to eleventh aspects, by changing the linear region defined on the reflection region, it is possible to easily specify a region having excellent reflection performance. Therefore, it is possible to easily search for a region having excellent reflection performance.

  Further, according to the second aspect, a plurality of modulation units are set as one cell, and characteristic information is acquired in cell units. For this reason, since the characteristic information of each modulation unit can be compressed, it is possible to search for a region excellent in reflection performance at high speed.

  Further, according to the third aspect, by acquiring information indicating whether or not the average light amount value of each cell exceeds the ideal light amount value, an area having ideal reflection performance can be easily searched.

  Moreover, according to the 4th aspect, the area | region where reflection performance was more excellent can be searched easily by producing | generating ratio information.

  Moreover, according to the 5th aspect, the superiority or inferiority of reflection performance can be grasped about a plurality of linear fields divided into strips. Therefore, a plurality of regions suitable for irradiating light for pattern drawing can be appropriately determined.

  Moreover, according to the 6th aspect, the area | region unsuitable for use can be easily detected by determining the presence or absence of the location which is less than a reference | standard light quantity value.

  Moreover, according to the 7th aspect, it becomes easy for an operator to grasp | ascertain the area | region suitable for use by displaying a reflected light amount value distribution image.

  According to the eighth aspect, the linear area is changed by moving the representative line, and the characteristic information of the changed linear area is displayed. For this reason, it is possible to easily search for an area having excellent reflection performance.

  Further, according to the ninth aspect, since a plurality of linear regions can be defined simultaneously, it becomes easy to search for a region with excellent reflection performance.

  Further, according to the tenth aspect, the deterioration of the reflecting surface in the diffractive spatial light modulator is detected by comparing the reflected light amount value distribution acquired again after a time with the previously acquired reflected light amount value distribution. can do.

It is a side view which shows typically the structure of the drawing apparatus which concerns on embodiment. It is a top view which shows typically the structure of the drawing apparatus which concerns on embodiment. It is a figure which shows typically the exposure head which concerns on embodiment. It is a schematic sectional drawing which shows the schematic cross section of the some light modulation element in a surface perpendicular | vertical with respect to a movable ribbon and a fixed ribbon. It is a schematic plan view for demonstrating the exposure scanning which concerns on embodiment. It is a block diagram which shows the structure of the control part which concerns on embodiment. It is a flowchart which shows the example of a 1st candidate area | region search process. It is a schematic plan view which shows a mode that a modulation surface is scanned with a line beam. It is a figure which shows an example of a reflected light amount value distribution image. It is a figure which shows the linear area | region defined on the reflected light amount value distribution image corresponding to a reflective area. It is a figure which shows distribution of reflected light quantity value in linear area | region LR1. It is a figure which shows distribution of reflected light quantity value in linear area | region LR3. It is a figure for demonstrating a mode that a linear area | region is divided | segmented into a some cell. It is a flowchart which shows the example of a 2nd candidate area search process. It is a figure which shows the example of a display of a cursor line. It is a figure which shows the example in which a linear area | region is set based on the position of a cursor line. It is a flowchart which shows the degradation test process which test | inspects degradation of the modulation surface which is a reflective surface.

  Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. In addition, the component described in this embodiment is an illustration to the last, and is not a thing of the meaning which limits the scope of the present invention only to them. In the drawings, the size and number of each part may be exaggerated or simplified as necessary for easy understanding.

<1. Overall Configuration of Drawing Apparatus 1>
FIG. 1 is a side view schematically showing a configuration of a drawing apparatus 1 according to the embodiment. FIG. 2 is a plan view schematically showing the configuration of the drawing apparatus 1 according to the embodiment. 1 and 2, a part of the cover panel 12 is not shown for convenience of explanation.

  The drawing apparatus 1 exposes a pattern (for example, a circuit pattern) by irradiating light (drawing light) spatially modulated according to CAD data or the like on the upper surface of the substrate W on which a layer of a photosensitive material such as a resist is formed. This is a device for drawing. The substrate W to be processed by the drawing apparatus 1 is, for example, a substrate for a color filter provided in a semiconductor substrate, a printed board, a liquid crystal display device, etc., for a flat panel display provided in a liquid crystal display device, a plasma display device, or the like. Glass substrates, magnetic disk substrates, optical disk substrates, solar cell panels, and the like. In the following description, it is assumed that the substrate W is a circular semiconductor substrate.

  The drawing apparatus 1 has a configuration in which a cover panel 12 is attached to a ceiling surface, a floor surface, and a peripheral surface of a skeleton formed of a main body frame 11. The main body frame 11 and the cover panel 12 form a housing of the drawing apparatus 1. An internal space (that is, a space surrounded by the cover panel 12) of the housing of the drawing apparatus 1 is divided into a delivery area 13 and a processing area 14. A base 15 is disposed in the processing area 14. A gate-shaped support frame 16 is provided on the base 15.

  The drawing apparatus 1 includes a transport device 2, a pre-alignment unit 3, a stage 4, a stage drive mechanism 5, a stage position measurement unit 6, a mark imaging unit 7, an exposure unit 8, and a control unit 9. Each of these components is arranged inside the casing of the drawing apparatus 1 (that is, the transfer area 13 and the processing area 14) or outside the casing (that is, the space outside the main body frame 11).

<Transport device 2>
The transport device 2 transports the substrate W. The transfer device 2 is disposed in the transfer area 13 and carries the substrate W in and out of the processing area 14. Specifically, the transport device 2 includes, for example, two hands 21 and 21 for supporting the substrate W, and a hand drive mechanism 22 that moves the hands 21 and 21 independently (advancement / retraction movement and elevation movement). Prepare.

  A cassette placement portion 17 for placing the cassette C is disposed outside the housing of the drawing apparatus 1 and adjacent to the transfer area 13. The transfer device 2 takes out the unprocessed substrate W accommodated in the cassette C placed on the cassette placement unit 17 and carries it into the processing region 14, and unloads the processed substrate W from the processing region 14. Housed in cassette C. In addition, delivery of the cassette C with respect to the cassette mounting part 17 is performed by an external conveyance apparatus (illustration omitted).

<Pre-alignment unit 3>
The pre-alignment unit 3 performs a process (pre-alignment process) for roughly correcting the rotational position of the substrate W before the substrate W is placed on the stage 4 described later. The pre-alignment unit 3 includes, for example, a mounting table that is configured to be rotatable, and a notch portion (for example, a notch, an orientation flat, or the like) formed in a part of the outer peripheral edge of the substrate W mounted on the mounting table. It can comprise including the sensor which detects a position, and the rotation mechanism which rotates a mounting base. In this case, in the pre-alignment process in the pre-alignment unit 3, first, the position of the notch portion of the substrate W placed on the mounting table is detected by a sensor, and then the rotation mechanism determines whether the position of the notch portion is the same. This is performed by rotating the mounting table so as to be in a predetermined position.

<Stage 4>
The stage 4 is a holding unit that holds the substrate W inside the housing. The stage 4 is disposed on the base 15 disposed in the processing area 14. Specifically, the stage 4 has, for example, a flat plate-like outer shape, and places and holds the substrate W on the upper surface thereof in a horizontal posture. A plurality of suction holes (not shown) are formed on the upper surface of the stage 4, and a negative pressure (suction pressure) is formed in the suction holes, whereby the substrate W placed on the stage 4 is placed on the stage 4. Hold it fixed on the top surface.

<Stage drive mechanism 5>
The stage drive mechanism 5 moves the stage 4 relative to the base 15. The stage drive mechanism 5 is disposed on a base 15 disposed in the processing region 14.

  Specifically, the stage drive mechanism 5 includes a rotation mechanism 51 that rotates the stage 4 in the rotation direction (rotation direction around the Z axis (θ axis direction)), and a support plate that supports the stage 4 via the rotation mechanism 51. 52 and a sub-scanning mechanism 53 that moves the support plate 52 in the sub-scanning direction (X-axis direction). The stage drive mechanism 5 further includes a base plate 54 that supports the support plate 52 via the sub-scanning mechanism 53, and a main scanning mechanism 55 that moves the base plate 54 in the main scanning direction (Y-axis direction).

  The rotation mechanism 51 rotates the stage 4 about a rotation axis A that passes through the center of the upper surface of the stage 4 (mounting surface of the substrate W) and is perpendicular to the mounting surface. For example, the rotation mechanism 51 is provided at the lower end of the rotation shaft portion 511 and the lower end of the rotation shaft portion 511 that is fixed to the back surface side of the mounting surface and extends along the vertical axis, and rotates the rotation shaft portion 511. A rotation drive unit (for example, a rotation motor) 512 may be included. In this configuration, the rotation drive unit 512 rotates the rotation shaft portion 511, so that the stage 4 rotates about the rotation axis A in the horizontal plane.

  The sub-scanning mechanism 53 has a linear motor 531 configured by a mover attached to the lower surface of the support plate 52 and a stator laid on the upper surface of the base plate 54. The base plate 54 is provided with a pair of guide members 532 extending in the sub-scanning direction. The guide members 532 slide between the guide members 532 and the support plate 52 while sliding on the guide members 532. Ball bearings that can move along are installed. That is, the support plate 52 is supported on the pair of guide members 532 via the ball bearing. When the linear motor 531 is operated in this configuration, the support plate 52 moves smoothly along the sub-scanning direction while being guided by the guide member 532.

  The main scanning mechanism 55 includes a linear motor 551 that includes a moving element attached to the lower surface of the base plate 54 and a stator laid on the base 15. In addition, a pair of guide members 552 extending in the main scanning direction is laid on the base 15, and an air bearing, for example, is installed between each guide member 552 and the base plate 54. Air is always supplied from utility equipment to the air bearing, and the base plate 54 is levitated and supported on the guide member 552 by the air bearing in a non-contact manner. When the linear motor 551 is operated in this configuration, the base plate 54 smoothly moves without friction along the main scanning direction while being guided by the guide member 552.

<Stage position measurement unit 6>
The stage position measurement unit 6 measures the position of the stage 4. Specifically, for example, the stage position measurement unit 6 emits laser light from outside the stage 4 toward the stage 4 and receives the reflected light. The stage position measurement unit 6 measures the position of the stage 4 (specifically, the Y position along the main scanning direction and the θ position along the rotation direction) from the interference between the reflected light and the emitted light. The laser length measuring instrument is configured.

<Mark imaging unit 7>
The mark imaging unit 7 is an optical device that images the upper surface of the substrate W held on the stage 4. The mark imaging unit 7 is supported by the support frame 16. Specifically, the mark imaging unit 7 includes, for example, a lens barrel, a focusing lens, a CCD image sensor, and a drive unit. As the lens barrel, an illumination unit (that is, illumination light for imaging (however, light having a wavelength that does not sensitize resist on the substrate W or the like is selected as illumination light) disposed outside the housing of the drawing apparatus 1 is selected. ) And an illumination unit 700) connected via a fiber cable or the like. The CCD image sensor is composed of an area image sensor (two-dimensional image sensor) or the like. The drive unit is configured by a motor or the like, and drives the focusing lens to change its height position. The drive unit adjusts the height position of the focusing lens to perform autofocus.

  In the mark imaging unit 7 having such a configuration, the light emitted from the illumination unit 700 is introduced into the lens barrel and guided to the upper surface of the substrate W on the stage 4 through the focusing lens. The reflected light is received by the CCD image sensor. Thereby, imaging data of the upper surface of the substrate W is acquired. This imaging data is sent to the control unit 9 and used for alignment (positioning) of the substrate W.

<Exposure unit 8>
The exposure unit 8 is an optical device that forms drawing light. The drawing apparatus 1 includes two exposure units 8. However, the number of the exposure units 8 that are mounted is not necessarily two, and may be one or three or more.

  The exposure unit 8 includes an exposure head 80 and a light source unit 81. The exposure head 80 includes a modulation unit 82 and a projection optical system 83. The light source unit 81, the modulation unit 82 and the projection optical system 83 are supported by the support frame 16. Specifically, for example, the light source unit 81 is accommodated in an accommodation box placed on the top plate of the support frame 16. Further, the modulation unit 82 and the projection optical system 83 are accommodated in an accommodation box fixed to the + Y side of the support frame 16.

  The light source unit 81, the modulation unit 82, and the projection optical system 83 included in the exposure unit 8 will be described with reference to FIG. 3 in addition to FIGS. FIG. 3 is a view schematically showing the exposure head 80 according to the embodiment.

a. Light source 81
The light source unit 81 emits light toward the exposure head 80. Specifically, the light source unit 81 includes, for example, a laser driving unit 811 and a laser oscillator 812 that receives driving from the laser driving unit 811 and emits laser light from an output mirror (not shown). Further, the light source unit 81 converts the light (spot beam) emitted from the laser oscillator 812 into linear light having a uniform intensity distribution (that is, a line beam having a light beam cross-section band-shaped light) 813. Is provided.

  The light source unit 81 further includes a drawing focus lens 814 that converges the line beam emitted from the illumination optical system 813 onto the modulation surface 320 of the diffractive spatial light modulator 32. The drawing focus lens 814 is constituted by, for example, a cylindrical lens, and is arranged so that its cylindrical surface (cylindrical surface) faces the upstream side of incident light. Further, the drawing focus lens 814 is arranged at a height position at which the line beam emitted from the illumination optical system 813 is incident on the center line (hereinafter, such a height position is referred to as the drawing focus lens 814). Also referred to as “reference position” of the focus lens 814). The drawing focus lens 814 is provided with a displacement mechanism 814A that changes its height position (position along the Z direction). The displacement mechanism 814A displaces the height position of the drawing focus lens 814 to a position higher (or lower) than the reference position, thereby changing the optical path of the line beam. By changing the optical path of the line beam, the position where the line beam is incident on the modulation surface 320 of the diffractive spatial light modulator 32 of the modulation unit 82 is changed in the width direction of the line beam, as shown in FIG. Is done.

b. Modulation unit 82
The modulation unit 82 performs spatial modulation on the incident light according to the pattern data. However, “to spatially modulate light” means to change the spatial distribution (amplitude, phase, polarization, etc.) of light. The “pattern data” is data in which position information on the substrate W to be irradiated with light is recorded in units of pixels. The pattern data is acquired, for example, by receiving from an external terminal device connected via a network or the like, or by reading from a recording medium, and is stored in the storage device 94 of the control unit 9 described later.

  The modulation unit 82 includes a diffractive spatial light modulator 32. The diffractive spatial light modulator 32 is a device that spatially modulates light by electrical control, for example, and reflects necessary light that contributes to pattern drawing and unnecessary light that does not contribute to pattern drawing in different directions. It is. The diffractive spatial light modulator 32 includes a GLV (Grating Light Valve), which is a reflection type and diffraction grating type spatial light modulator.

  FIG. 4 is a schematic cross-sectional view showing a schematic cross section of a plurality of light modulation elements 321 in a plane perpendicular to the movable ribbon 321a and the fixed ribbon 321b. Each light modulation element 321 includes one movable ribbon 321a and one fixed ribbon 321b.

  The upper surface of the movable ribbon 321a and the upper surface of the fixed ribbon 321b are respectively provided with a movable reflective surface 322a and a fixed reflective surface 322b parallel to the base surface 322c behind. The movable reflecting surface 322a and the fixed reflecting surface 322b each have a strip shape extending perpendicular to the arrangement direction of the light modulation elements 321 (here, the direction parallel to the X-axis direction). In the diffractive spatial light modulator 32, the movable reflection surface 322a and the fixed reflection surface 322b are alternately arranged in the element arrangement direction.

  The movable ribbon 321a can move up and down with respect to the base surface 322c, and the height of the movable reflective surface 322a from the base surface 322c is variable. The fixed ribbon 321b is fixed to the base surface 322c, and the height of the fixed reflective surface 322b from the base surface 322c is also fixed. The surfaces of the movable ribbon 321a and the fixed ribbon 321b are coated so as to reflect the incident light L1.

  In the diffractive spatial light modulator 32, a predetermined number of light modulation elements 321 form one modulation unit, and a plurality of the modulation units are arranged one-dimensionally along the X-axis direction. ing. The diffractive spatial light modulator 32 is connected to a driver circuit unit 33 (modulator driver) that can apply a voltage independently to each of the plurality of light modulation elements 321. The driver circuit unit 33 can individually apply a voltage corresponding to the drive value to each of the movable ribbons 321a of the light modulation element 321 of the accessory die. When a voltage is applied to the light modulation element 321, the movable ribbon 321a bends so as to be recessed with respect to the fixed ribbon 321b. In this way, by indenting the fixed ribbon 321b, the light incident on each modulation unit (incident light L1) is switched between zero-order light and diffracted light of a non-zero order (non-zero-order diffracted light).

  The amount of depression of the movable ribbon 321a with respect to the fixed ribbon 321b is determined by the magnitude of the voltage applied to the movable ribbon 321a. That is, by controlling the magnitude of the voltage applied by the driver circuit unit 33, the height difference between the movable reflective surface 322a of the movable ribbon 321a and the fixed reflective surface 322b of the fixed ribbon is adjusted in a plurality of steps. . Accordingly, the light amount of the light (reflected light L2) reflected by the modulation surface 320 of each modulation unit (hereinafter, this light amount is also referred to as “reflected light amount”) is individually divided into a plurality of gradations according to the magnitude of the voltage. Can be switched to.

  In the modulation unit 82, the light (line beam) emitted from the illumination optical system 813 while the state of each modulation unit of the diffractive spatial light modulator 32 is switched according to the pattern data under the control of the control unit 9. Enters the modulation surface 320 of the diffractive spatial light modulator 32 through the mirror 822 at a predetermined angle. However, the line beams were arranged in a line so that the long-width direction of the linear beam cross section was along the arrangement direction (X-axis direction) of the plurality of modulation units of the diffractive spatial light modulator 32. Incident in multiple modulation units. Therefore, the light emitted from the diffractive spatial light modulator 32 is light that is spatially modulated for a plurality of pixels along the sub-scanning direction (however, light that is spatially modulated in one modulation unit is one pixel). The cross section is a strip-shaped drawing light. As described above, the diffractive spatial light modulator 32 receives the light emitted from the light source unit 81 by the modulation surface 320 and performs spatial modulation according to the pattern data on the received light.

c. Projection optical system 83
The projection optical system 83 blocks unnecessary light out of the drawing light emitted from the diffractive spatial light modulator 32 and guides the necessary light to the surface of the substrate W to form an image of the necessary light on the surface of the substrate W. . That is, the drawing light emitted from the diffractive spatial light modulator 32 includes necessary light and unnecessary light. The necessary light travels in the −Z direction along the Z axis, and the unnecessary light travels from the Z axis. It proceeds in the -Z direction along an axis slightly inclined in the ± X direction. The projection optical system 83 includes, for example, a blocking plate 831 having a through hole formed in the middle so that only necessary light passes, and the blocking plate 831 blocks unnecessary light. In addition to the blocking plate 831, the projection optical system 83 forms a plurality of lenses 832 constituting a zoom unit that widens (or narrows) the necessary light, and forms an image of the necessary light on the substrate W as a predetermined magnification. Further included are a focusing lens 833, a driving unit (for example, a motor) (not shown) that performs autofocus by driving the focusing lens 833 and changing its height position.

  When pattern drawing is performed, a substrate W placed on the stage 4 is disposed immediately below the projection optical system 83, and a line beam from the projection optical system 83 is irradiated onto the substrate W. In the present embodiment, as will be described later, a process of determining a position where a line beam is incident on the modulation surface 320 of the diffractive spatial light modulator 32, that is, a region to be used for pattern drawing in the modulation surface 320. Is done. In this processing, the modulation surface 320 of the diffractive spatial light modulator 32 is scanned with a line beam, and the light amount (reflection light amount) of the line beam reflected on the modulation surface 320 is measured. The drawing apparatus 1 includes a camera 34 attached to the upper surface of the stage 4 in order to measure the amount of reflected light of the line beam. Note that the camera 34 is not necessarily provided on the stage 4 and may be provided at any position as long as the light amount of the line beam reflected by the modulation surface 320 can be measured.

  FIG. 5 is a schematic plan view for explaining exposure scanning according to the embodiment. In exposure scanning, the stage drive mechanism 5 moves the stage 4 along the main scanning axis (Y axis) in the forward direction (here, for example, the + Y direction), thereby moving the substrate W. The exposure head 80 is moved relative to the main scanning axis (outward main scanning). When viewed from the substrate W, each exposure head 80 traverses the substrate W in the −Y direction along the main scanning axis as indicated by an arrow AR11. In addition, with the start of forward main scanning, drawing light is irradiated from each exposure head 80. That is, the pattern data (specifically, the portion of the pattern data describing the data to be drawn in the stripe area to be drawn in the forward main scanning) is read out, and the modulation unit 82 corresponds to the pattern data. Be controlled. Then, drawing light subjected to spatial modulation in accordance with the pattern data is emitted toward the substrate W from each exposure head 80.

  When each exposure head 80 crosses the substrate W once along the main scanning axis while intermittently emitting drawing light toward the substrate W, one stripe region (extending along the main scanning axis) is obtained. The pattern group is drawn in a region where the width along the sub-scanning axis corresponds to the width of the drawing light. Here, since the two exposure heads 80 and 80 simultaneously traverse the substrate W, a pattern group is drawn in each of the two stripe regions by one forward main scan.

  When the forward main scanning with drawing light irradiation ends, the stage drive mechanism 5 corresponds to the width of the drawing light in a predetermined direction (for example, −X direction) along the sub-scanning axis (X axis). Move it a distance. As a result, the substrate W moves relative to each exposure head 80 along the sub-inspection axis (sub-scanning). When viewed from the substrate W, as indicated by an arrow AR12, each exposure head 80 moves in the + X direction along the sub-scanning axis by the width of the stripe region.

  When the sub-scanning is completed, a return main scanning with irradiation of drawing light is executed. That is, the stage drive mechanism 5 moves the stage 4 along the main scanning axis (Y axis) in the backward direction (here, the −Y direction). As a result, the substrate W moves relative to each exposure head 80 along the main scanning axis (return main scanning). When viewed from the substrate W, as indicated by an arrow AR13, each exposure head 80 moves across the substrate W in the + Y direction along the main scanning axis. On the other hand, when the backward main scan is started, irradiation of the drawing light from each exposure head 80 is started. By this backward main scanning, a pattern group is drawn in the stripe area adjacent to the stripe area drawn in the previous forward main scanning.

  When the backward main scanning with the drawing light irradiation ends, the sub-scanning is performed, and then the forward main scanning with the drawing light irradiation is performed again. By the forward main scanning, a pattern group is drawn in the stripe area adjacent to the stripe area drawn in the previous backward main scanning. Thereafter, similarly, when the main scanning with the irradiation of the drawing light is repeatedly performed with the sub-scan interposed, and the pattern is drawn in the entire drawing target region, the drawing process for one pattern data is finished.

<Control unit 9>
FIG. 6 is a block diagram illustrating a configuration of the control unit 9 according to the embodiment. The control unit 9 is electrically connected to each unit included in the drawing apparatus 1 and controls the operation of each unit of the drawing apparatus 1 while executing various arithmetic processes.

  For example, as shown in FIG. 6, the control unit 9 is configured as a general computer in which a CPU 91, a ROM 92, a RAM 93, a storage device 94, and the like are interconnected via a bus line 95. The ROM 92 stores basic programs and the like. The RAM 93 is used as a work area when the CPU 91 performs a predetermined process. The storage device 94 is configured by a nonvolatile storage device such as a flash memory or a hard disk device. A program PG1 is installed in the storage device 94. Various functions are realized by the CPU 91 as the main control unit performing arithmetic processing according to the procedure described in the program PG1.

  In particular, the reflected light quantity value measuring unit 911, the reflected light quantity value distribution image generating unit 912, the linear region defining unit 913, the characteristic information acquiring unit 914, the support information generating unit 915, and the deterioration inspecting unit 916 are the diffractive spatial light modulator 32. In order to determine a candidate region suitable for making a line beam incident for pattern drawing on the modulation surface 320, a region having excellent reflection performance (that is, a high reflectance and a small variation in the amount of reflected light) is searched. When it works.

  The reflected light amount value measuring unit 911 is configured to scan the reflection area formed by the modulation surface 320 of the diffractive spatial light modulator 32 with a line beam and measure the light amount value (reflected light amount value) of the reflected line beam. Has been. The reflected light amount value measurement unit 911 acquires the reflected light amount value distribution for the reflection region.

  The reflected light amount value distribution image generation unit 912 generates an image (reflected light amount value distribution image) visualizing the reflected light amount value distribution for the reflection region based on the light amount value distribution acquired by the reflected light amount value measuring unit 911. It is configured as follows.

  The linear region defining unit 913 is configured to define a linear region with respect to the reflective region. The linear region is a region extending along the arrangement direction (first direction) of the light modulation elements 321 which are modulation units. Details of the linear region will be described later.

  The characteristic information acquisition unit 914 is configured to acquire characteristic information related to the light amount value from the reflected light amount value distribution for the linear region defined by the linear region defining unit 913. In the present embodiment, characteristic information regarding the light amount value is acquired for each cell in which the linear region is partitioned into a plurality of cells. Details of this will be described later.

  The support information generation unit 915 is configured to generate support information based on the characteristic information for each cell. The support information is, for example, information (ratio information) regarding the ratio of cells exceeding a predetermined ideal light amount value among all the cells included in one linear region.

  The deterioration inspection unit 916 is configured to execute a deterioration inspection process for inspecting deterioration of the diffractive spatial light modulator 32. The deterioration inspection process will be described later.

  The program PG1 is normally stored and used in advance in a memory such as the storage device 94, but is recorded in a recording medium such as a CD-ROM or DVD-ROM or an external flash memory (program product). (Or provided by downloading from an external server via a network) and may be additionally or exchanged stored in a memory such as the storage device 94. Note that some or all of the functions realized in the control unit 9 may be realized in hardware by a dedicated logic circuit or the like.

  In the control unit 9, an input unit 96, a display unit 97, and a communication unit 98 are also connected to the bus line 95. The input unit 96 is an input device composed of, for example, a keyboard and a mouse, and accepts various operations (operations such as inputting commands and various data) from the operator. The input unit 96 may be configured with various switches, a touch panel, and the like. The display unit 97 is a display device that includes a liquid crystal display device, a lamp, and the like, and displays various types of information under the control of the CPU 91. The communication unit 98 has a data communication function for transmitting / receiving commands and data to / from an external device via a network.

<2. Operation of the drawing apparatus>
<2.1. First candidate area search process>
FIG. 7 is a flowchart illustrating an example of the first candidate area search process. The candidate area search process is a process of searching for an area on the modulation surface 320 that is a line beam incident position for pattern drawing and that has excellent reflection performance. A series of operations described below is executed by the CPU 91 of the control unit 9 operating according to the program PG1 unless otherwise specified. The candidate area search process shown in FIG. 7 is executed, for example, when the diffractive spatial light modulator 32 is attached to the drawing apparatus 1.

  First, the reflected light amount value measuring unit 911 acquires a reflected light amount value distribution (first reflected light amount ground distribution) (step S10). Specifically, the reflected light amount value measurement unit 911 scans the modulation surface 320 with a line beam by driving the displacement mechanism 814A to displace the drawing focus lens 814. The reflected light amount value is measured by detecting the line beam reflected by the camera 34.

  FIG. 8 is a schematic plan view showing a state where the modulation surface 320 is scanned with the line beam LB1. In FIG. 8 and the following description, the direction in which the light modulation elements 321 (modulation units) are arranged is referred to as an arrangement direction Dx (first direction). The arrangement direction Dx coincides with the X-axis direction shown in FIG. 1 and the like, and also coincides with the direction extending to the line beam LB1. A direction orthogonal to the arrangement direction Dx and parallel to the modulation surface 320 is defined as a width direction Dy (second direction) of the line beam LB1.

  In step S10, as shown in FIG. 8, scanning is performed by moving the line beam LB1 in the width direction Dy. Then, the amount of reflected light of the line beam LB1 reflected by the modulation surface 320 is measured. Note that the area scanned by the line beam LB1 is an effective area (an area scheduled to be used for pattern drawing in the modulation surface 320 which is a reflection surface. For example, a width of ± 20 μm from the center in the width direction Dy. The line beam LB1 is scanned with respect to the reflection region RR1 larger in the width direction Dy than the region. Then, the reflected light amount value distribution in the reflection region RR1 is acquired.

  In addition, when acquiring the reflected light amount value distribution, the line beam LB1 is stopped at each position in the width direction Dy by moving the line beam LB1 stepwise in the width direction Dy at a constant pitch (for example, 10 μm). The reflected light amount value of the line beam LB1 reflected in the state may be acquired. Alternatively, the line beam LB1 may be continuously moved in the width direction Dy and detected by the camera 34 at a predetermined period to obtain the reflected light amount value.

  Returning to FIG. 7, when the reflected light amount value distribution is acquired, the reflected light amount value distribution image generation unit 912 generates a reflected light region distribution image (step S11).

  FIG. 9 is a diagram illustrating an example of the reflected light amount value distribution image MAP1. Each part of the reflected light amount value distribution image MAP1 corresponds to each position of the reflection region RR1 scanned with the line beam LB1. Further, in this example, the reflected light amount value is divided into a plurality of classes by size, and a unique color is defined for each class, and a color of the class corresponding to the reflected light amount value is given to each part. . The reflected light amount value distribution image MAP1 is appropriately displayed on the display unit 97.

  According to the reflected light amount value distribution image MAP1, it is possible to visually grasp the characteristic of the reflected light amount in the reflection region RR1. For this reason, generating the reflected light amount value distribution image MAP1 is extremely effective in determining a region having excellent reflection performance for reflecting the line beam LB1 on the modulation surface 320. In addition, about the reflected light quantity value distribution image MAP1, generation | occurrence | production of the image may be abbreviate | omitted when there exists a situation where an operator does not need to confirm reflected light quantity value distribution.

  Returning to FIG. 7, when the reflected light amount value distribution image MAP1 is generated, the linear region defining unit 913 divides the reflective region RR1 into a plurality of strip-shaped regions in the width direction Dy (step S12). And the linear area | region prescription | regulation part 913 makes each strip-shaped area | region a linear area | region (step S13).

  FIG. 10 is a diagram illustrating a linear region defined on the reflected light amount value distribution image MAP1 corresponding to the reflective region RR1. In the example shown in FIG. 10, the reflection region RR1 is divided into a plurality of regions in a strip shape in the width direction Dy, and each region is defined as seven linear regions LR1 to LR7. Each of the linear regions LR1 to LR7 extends along the arrangement direction Dx, and the width (the size of the width direction Dy) is smaller than the width of the reflection region RR1.

  FIG. 11 is a diagram showing the reflected light amount value distribution VD1 in the linear region LR1. FIG. 12 is a diagram showing the reflected light amount value distribution VD3 in the linear region LR3. 11 and 12, the horizontal axis indicates the position in the arrangement direction Dx, and the vertical axis indicates the reflected light amount value. The reflected light amount value distributions VD1 and VD3 are obtained by plotting reflected light amount values at positions corresponding to one light modulation element 321 on the coordinates with respect to the all light modulation elements 321.

  As shown in FIG. 10, the linear region LR1 is located at the end of the reflective region RR1. In this linear region LR1, as shown in FIG. 11, the amount of reflected light differs at the position in the arrangement direction Dx, and the intensity varies. On the other hand, the linear region LR3 is located near the center of the reflection region RR1, as shown in FIG. In this linear region LR3, as shown in FIG. 12, it can be seen that the reflected light amount value is stable as a whole and the intensity thereof is relatively large.

  Returning to FIG. 7, when a plurality of linear regions are defined, the characteristic information acquisition unit 914 divides each linear region into a plurality of cells (step S14). And the characteristic information acquisition part 914 acquires the characteristic information regarding a reflected light amount value for every cell (step S15).

  FIG. 13 is a diagram for explaining how the linear region is divided into a plurality of cells. As shown in FIG. 12, the characteristic information acquisition unit 914 divides the linear region LR1 at a predetermined pitch in the arrangement direction Dx, and a plurality of cells (cells Ce1, Ce2,...) Are defined. In the illustrated example, each of the cells Ce1, Ce2,... Is a region corresponding to eight light modulation elements 321 arranged in the arrangement direction Dx. As an example, when the diffractive spatial light modulator 32 includes 8000 light modulation elements 321, the linear region corresponds to the 8000 light modulation elements 321. As shown in FIG. 12, when the linear region is divided with eight light modulation elements 321 as one cell, the linear region is divided into 1000 cells.

  Of course, the number of light modulation elements 321 included in one cell is not limited to eight. For example, one light modulation element 321 may be included per cell, or a large number of light modulation elements 321 such as tens or hundreds may be included.

  As described above, the characteristic information acquisition unit 914 divides each linear region into a plurality of cells, and the characteristic information regarding the reflected light amount value for each cell is referred to as an average value (hereinafter referred to as “average reflected light amount value”). ) To get. The average reflected light amount value for each cell can be calculated from the reflected light amount value distribution VD1 shown in FIG. 11 or FIG. For example, for the linear region LR1, for the average reflected light amount value of the cell Ce1 shown in FIG. 12, the reflected light amount value of the portion corresponding to the range of the cell Ce1 is extracted from the reflected light amount value distribution VD1 shown in FIG. Obtained by averaging them.

  Returning to FIG. 7, when the characteristic information for each cell is acquired, the support information generation unit 915 determines whether or not there is a portion lower than the reference light amount value for each linear region (step S <b> 16). The reference light amount value is a predetermined reflected light amount value, and corresponds to a reflected light amount value that is minimum required when used in pattern drawing or a reflected light amount value that is larger than that. When a portion that does not exceed the reference light amount value exists in a part of the linear region, the linear region is determined to be a region having low reflection performance.

  For example, in the example shown in FIGS. 11 and 12, the reference light amount value is v1. As for the linear region LR1, as shown in FIG. 11, there are some portions in the reflected light amount value distribution VD1 that are below the reference light amount value v1. For this reason, the linear region LR1 is excluded from the candidates. On the other hand, as shown in FIG. 12, the linear region LR3 does not have a portion below the reference light amount value v1 in the reflected light amount value distribution VD3. For this reason, the linear region LR3 is determined as a region having relatively high reflection performance.

  Note that the determination process in step S16 may be performed in units of cells. That is, the average reflected light amount value of each cell acquired in steps S14 and S16 is compared with the reference light amount value, and if there is a cell below, the linear region may be removed.

  The information (determination information) obtained by the determination process in step S16 is an example of support information generated based on the characteristic information.

  Subsequently, the support information generation unit 915 generates ratio information for each linear region (step S17). The ratio information is information indicating the ratio of the number of cells in which the average reflected light amount value exceeds the ideal light amount value out of the total number of cells in the specific linear region. The ideal light amount value is a value indicating a reflected light amount value suitable for pattern drawing, and is a value set in advance by an operator or the like. By obtaining the ratio of the number of cells exceeding the ideal light amount value for each linear region, it is possible to specify a desired region for use in the reflective region RR1. The ratio information is an example of support information generated from the characteristic information.

  As described above, by using the average reflected light amount value in units of cells, it is possible to compress the information amount of the reflected light amount value for every light modulation element 321. Therefore, by adopting the average reflected light amount value as the comparison target of the ideal light amount value, it is possible to search for a region having excellent reflection performance at high speed.

  Subsequently, the support information generation unit 915 generates order information (step S18). The order information is information indicating an order that is suitable for use based on a predetermined standard for the linear region. In this example, ranking is performed based on the ratio information acquired in step S17 with respect to a plurality of linear regions in which no part falls below the reference light amount value in step S16. Specifically, the ranking is performed in descending order of the number of cells exceeding the ideal light quantity value. This order information is an example of support information.

  Subsequently, based on the order information, one or a plurality of linear regions are determined as candidate regions suitable for incidence of a line beam for pattern drawing as regions having excellent reflection performance (step S19). This step S19 may be automatically executed by the control unit 9, or may be executed by an operator. When the control unit 9 automatically executes step S19, the control unit 9 determines one or more linear regions at the upper level as use candidate regions from the order information acquired in step S18. do it. On the other hand, when the operator executes step S19, the display unit 97 displays the reflected light amount value distribution image MAP1 in addition to support information such as determination information, ratio information, or rank information. Then, the operator may determine one or a plurality of linear regions as use candidate regions based on the display content.

  Note that the support information is not limited to that described above. For example, as shown in FIGS. 11 and 12, the reflected light amount value distributions VD1 and VD3 may be approximated to the straight lines VL1 and VL3, and the slopes of the straight lines VL1 and VL3 may be obtained. The closer the inclination is to 0 (that is, parallel to the horizontal axis), the less the variation in the all-light modulation element 321 and the higher the reflection performance. Therefore, by generating the tilt as support information, it is possible to easily determine a region with high reflection performance. Further, as the support information, the dispersion or standard deviation of the reflected light amount value may be obtained from the reflected light amount value distributions VD1 and VD3. By obtaining the dispersion or standard deviation, it is possible to grasp the variation in the reflected light amount value. As a result, it is possible to easily determine a region having excellent reflection performance with little variation.

  Further, when defining a plurality of linear regions in steps S12 and S13, the width of each linear region is preferably equal to or larger than the width of the line beam LB1 irradiated to the modulation surface 320 during pattern drawing. . For example, it is assumed that a linear region narrower than the width of the line beam LB1 is set. Then, when two adjacent linear regions are selected as candidate regions for irradiating the line beam, when the irradiation position of the line beam LB1 is switched between the candidate regions, a part of the incident part overlaps. That is, since the line beam LB1 is again irradiated to the portion where the reflection performance is reduced by the previous use, the stability of the reflected light amount value may be reduced. For the above reasons, the width of the linear region is preferably the same as or larger than that of the line beam LB1.

<2.2. Second candidate area search process>
In the flow shown in FIG. 7, the control unit 9 mainly operates according to a program to set a plurality of linear regions, and based on the characteristic information on the reflected light amount value and the support information generated from the characteristic information, An area having high reflection performance is automatically or semi-automatically searched. However, the operator may arbitrarily set a linear region, and search for a region with high reflection performance based on the characteristic information of the linear region.

  FIG. 14 is a flowchart illustrating an example of the second candidate area search process. A series of operations described below is executed by the CPU 91 of the control unit 9 operating according to the program PG1 unless otherwise specified.

  First, the reflected light amount value distribution data is acquired in the same manner as step S10 shown in FIG. 7 (step S200).

  Subsequently, the reflected light amount value distribution image generation unit 912 generates a reflected light amount value distribution image in the same manner as in step S11. In this flow, the linear area defining unit 913 displays the image on the display unit 97 in order to define the linear area (step S201). Further, the linear region defining unit 913 displays a cursor line (representative line) on the reflected light amount distribution image (step S202).

  FIG. 15 is a diagram illustrating a display example of the cursor line CL1. As shown in FIG. 15, the cursor line CL1 is a straight line extending in the arrangement direction Dx, and is displayed over the reflected light amount value distribution image MAP1. The cursor line CL1 is configured to move on the reflected light amount value distribution image MAP1 along the width direction Dy based on a predetermined operation input via the input unit 96.

  Returning to FIG. 14, when the cursor line is displayed, the linear area defining unit 913 defines the linear area based on the position of the cursor line (step S203).

  FIG. 16 is a diagram illustrating an example in which the linear region LR21 is set based on the position of the cursor line CL1. As shown in FIG. 5, the relative position of the cursor line CL1 with respect to the reflected light amount value distribution image MAP1 is read, and the linear region LR21 is set from the position information.

  Returning to FIG. 14, when the linear region is defined, the characteristic information acquisition unit 914 divides the linear region into a plurality of cells in substantially the same manner as in step S14 shown in FIG. 7 (step S204). And the characteristic information acquisition part 914 acquires the characteristic information for every cell in the same way as step S15 shown in FIG. 7 (step S205).

  Subsequently, the support information generation unit 915 determines whether or not there is a portion below the reference light amount value in the linear region in the same manner as Step S16 illustrated in FIG. 7 and displays the determination result on the display unit 97 ( Step S206). In the example shown in FIG. 16, since there are no NG locations in the linear region LR21 where the reflected light amount value is lower than the reference light amount value, the fact that there is no NG location is displayed on the support information display unit SI1.

  Further, the support information generation unit 915 generates ratio information about the linear region in the same manner as step S17 shown in FIG. 7, and displays the ratio information on the display unit 97 (step S207). In the example shown in FIG. 16, in the linear region LR21, the ratio of the number of cells exceeding the ideal light amount value is displayed as the sufficiency rate on the support information display unit SI2.

  Note that when the linear region is set in step S203, a reflected light amount value distribution in the linear region as shown in FIG. 11 or 12 may be displayed. Further, the slope of the straight line when the reflected light quantity value distribution is approximated by a straight line may be displayed. In the example shown in FIG. 16, the inclination is displayed on the support information display unit SI2 as the inclination.

  Returning to FIG. 14, when the display of the ratio information in step S207 is completed, it is determined whether or not the position of the cursor line has been changed (step S208). If it is determined that the position has been changed (NO in step S208), control unit 9 returns to step S203 and continues the process.

  If it is determined in step S208 that there is no position change (YES in step S208), it is determined whether or not to determine the linear region as a candidate region (step S209). For example, when the operator determines that the currently set linear region is a region having excellent reflection performance based on the support information, the operator performs a predetermined operation input via the input unit 96 to The shape area is determined as a candidate area (step S210). On the other hand, when there is no input from the operator (NO in step S209), the control unit 9 returns to step S208 and continues the process.

  When the candidate area is determined in step S210, the control unit 9 determines whether or not to end the search for another area having high reflection performance (step S211). For example, when the operator wants to search for another area (NO in step S211), the control unit 9 returns to step S202 and continues the process. When the operator ends the area search, an operation input for ending is performed, and the control unit 9 ends the operation.

  As described above, according to the flow shown in FIG. 14, the operator can easily check the distribution of the reflected light amount value in the reflected light amount value distribution image MAP1 and easily select a region having high reflection performance based on the support information. You can explore. Therefore, the dependence on the operator's skill in the area search can be reduced.

  In step S202, in the example shown in FIG. 15, one cursor line CL1 is shown as a representative line. However, a plurality of (for example, three) cursor lines are provided at predetermined intervals in the width direction Dy. You may make it display. The plurality of cursor lines may be moved simultaneously or individually to define the respective linear regions, and the characteristic information or support information based on the characteristic information may be displayed on the display unit 97. . Accordingly, the reflection performance of a plurality of areas can be grasped at the same time, so that an area having high reflection performance can be efficiently searched.

<2.3. Deterioration inspection process>
FIG. 17 is a flowchart showing a deterioration inspection process for inspecting deterioration of the modulation surface 320 which is a reflection surface. This deterioration inspection process is simply a process for inspecting the deterioration of the modulation surface 320 in the diffractive spatial light modulator 32 by detecting a change with time in the reflected light quantity value distribution.

  In the deterioration inspection process, first, the reflected light amount value measurement unit 911 acquires a reflected light amount value distribution (first reflected light amount value distribution) for the reflective region RR1 of the modulation surface 320 at a certain time (step S31). This step S31 is executed in the same manner as step S10 shown in FIG. 7 or step S200 shown in FIG.

  Subsequently, one or more candidate areas are determined by defining the linear area (step S32). This step S32 is executed in the same manner as, for example, step S11 to step S19 shown in FIG. 7 or step S201 to step S211 shown in FIG.

  Subsequently, in the drawing apparatus 1, pattern drawing on the substrate W is executed as shown in FIG. 5 (step S33). At this time, one of the one or more candidate regions determined in step S32 is set as the incident position of the line beam LB1.

  When a predetermined time has elapsed since the use of the one candidate area for pattern drawing, the reflected light quantity value measuring unit 911 again returns the reflected light quantity value distribution (second second) for the reflective area RR1 of the modulation surface 320. A reflected light amount value distribution) is acquired (step S34).

  Subsequently, the deterioration inspection unit 916 compares the first reflected light amount value distribution acquired in step S31 with the second reflected light amount value distribution even acquired in step S34 (step S35). Then, it is determined whether or not there is a portion where the reflected light amount value has decreased beyond a predetermined reference value, that is, a deteriorated portion (step S36). And when a degradation location exists, a predetermined notification is performed (step S37).

  For example, suppose that it is determined in step S36 that there is a deteriorated portion in the linear region corresponding to the region (irradiation region) irradiated with the line beam for pattern drawing in step S33. Then, in step S37, the operator is notified via the display unit 97 and the like that there is a degraded portion in the linear region. At this time, for example, when a plurality of candidate areas are determined in advance for pattern drawing in step S32, the presence of the degraded portion may be notified and other candidate areas may be presented. Thereby, the operator can easily change the irradiation area. Further, the operator may be able to confirm the deterioration state by displaying the reflected light amount value distribution image based on the second reflected light amount value distribution.

  In step S36, if it is determined that there is a deteriorated part for all candidate areas determined in step S32, the operator is notified via the display unit 97 or the like. Thus, the operator can examine the necessity of maintenance including replacement of the diffractive spatial light modulator 32. Further, based on the second reflected light amount value distribution, the control unit 9 may execute a step S11 to a step S19 shown in FIG. 7 again to search for a new candidate area. Note that the plurality of linear regions set when searching for a new candidate region are set to positions shifted in the width direction Dy from the plurality of linear regions set in the previous step S32. By defining a plurality of linear regions by shifting in the width direction Dy, it is possible to search for a new candidate region having no deteriorated portion.

  As described above, according to this deterioration inspection process, the deterioration state of the diffractive spatial light modulator 32 can be inspected. For this reason, the operator can appropriately determine whether or not the maintenance including the change of the irradiation area of the line beam on the modulation surface 320 or the replacement of the diffractive spatial light modulator 32 is necessary.

  7, 14, and 17 are performed in a state in which the diffractive spatial light modulator 32 is incorporated in the drawing apparatus 1. However, each inspection process for the diffractive spatial light modulator 32 may be performed by an inspection apparatus having a configuration necessary for performing each inspection process.

  Although the present invention has been described in detail, the above description is illustrative in all aspects, and the present invention is not limited thereto. It is understood that countless variations that are not illustrated can be envisaged without departing from the scope of the present invention. In addition, the configurations described in the above embodiments and modifications can be appropriately combined or omitted as long as they do not contradict each other.

DESCRIPTION OF SYMBOLS 1 Drawing apparatus 8 Exposure unit 9 Control part 32 Diffractive spatial light modulator 320 Modulation surface (reflection surface)
321 Light modulation element (modulation unit)
34 Camera 82 Modulation unit 91 CPU
911 Reflected light quantity value measuring unit 912 Reflected light quantity value distribution image generating unit 913 Linear region defining unit 914 Characteristic information acquiring unit 915 Support information generating unit 916 Degradation inspection unit 96 Input unit 97 Display unit CL1 Cursor line (representative line)
Ce1, Ce2 cell Dx arrangement direction (first direction)
Dy width direction (second direction)
LB1 Line beam LR1 to LR7, LR21 Linear region MAP1 Reflected light amount value distribution image RR1 Reflected region SI1, SI2 Support information display unit VD1, VD3 Reflected light amount value distribution W Substrate

Claims (11)

An inspection method for inspecting a diffractive spatial light modulator in which a plurality of modulation units forming a reflecting surface for modulating and reflecting incident light are arranged along a first direction,
(A) obtaining a first reflected light amount value distribution by measuring a reflected light amount value of reflected light for a reflective region formed by a reflective surface of a plurality of modulation units;
(B) defining a linear region having a width narrower than that of the reflection region in a second direction orthogonal to the first direction, the region extending in the first direction among the reflection regions;
(C) acquiring characteristic information relating to a light amount value in the linear region based on the first reflected light amount value distribution;
Including an inspection method. The inspection method according to claim 1,
In the step (c), the linear region is divided into a plurality of cells by dividing a region corresponding to a plurality of modulation units into one cell, and the first reflected light amount value distribution is divided. And a method of acquiring characteristic information on the light quantity value for each cell based on the above. The inspection method according to claim 2,
The inspection method, wherein the characteristic information acquired in the step (c) includes information indicating whether an average reflected light amount value of the cell exceeds a predetermined ideal light amount value. The inspection method according to claim 3,
(D) generating ratio information indicating a ratio of the cells exceeding the ideal light amount value among the plurality of cells included in the linear region;
An inspection method further comprising: The inspection method according to claim 4,
The step (b) is a step of dividing the reflective region into a plurality of strip-shaped regions in the second direction, and making each of the regions a linear region.
(E) A step of generating order information indicating the order of the ratio based on the ratio information for each of the plurality of linear regions generated in the step (d).
An inspection method further comprising: In the inspection method according to any one of claims 2 to 5,
(F) The characteristic information acquired in the step (c) includes information indicating the reflected light amount value distribution of the linear region, and the linear information is based on the reflected light amount value distribution of the linear region. Determining whether or not there is a portion below the reference light amount value in the region;
An inspection method further comprising: In the inspection method according to any one of claims 1 to 6,
The step (b)
(B-1) A step of generating a reflected light amount value distribution image obtained by imaging the first reflected light amount value distribution acquired in the step (a) and displaying the image on a display unit.
Including an inspection method. The inspection method according to claim 7,
The step (b)
(B-2) displaying a representative line indicating the position of the linear region on the first reflected light amount value distribution image displayed on the display unit in the step (b-1);
(B-3) receiving a change in the position of the representative line based on a predetermined operation input;
(B-4) A step of redefining the linear region based on the position of the representative line after the change received in the step (b-3);
Including
The step (c)
(C-1) Based on the first reflected light amount value distribution, displaying the characteristic information about the linear region defined in the step (b-4) on the display unit;
Including an inspection method. The inspection method according to claim 8,
The step (b-2) includes a plurality of linear regions arranged at predetermined intervals in the second direction on the first reflected light amount value distribution image displayed on the display unit. An inspection method, which is a step of displaying the representative line. The inspection method according to any one of claims 1 to 9,
(G) After the step (a), the step of re-acquiring the second reflected light amount value distribution by measuring the reflected light amount value of the reflected light for the reflective region;
(H) comparing the first reflected light amount value distribution acquired in the step (a) with the second reflected light amount value distribution acquired in the step (g);
Including an inspection method. An inspection apparatus for inspecting a diffractive spatial light modulator in which a plurality of modulation units forming a reflecting surface for modulating and reflecting incident light are arranged along a first direction,
A reflected light amount value distribution acquisition unit that acquires a first reflected light amount value distribution of reflected light with respect to a reflection region formed by a reflection surface of a plurality of modulation units;
A linear region defining portion that defines a linear region that extends in the first direction and has a width narrower than the reflective region in a second direction orthogonal to the first direction, out of the reflective regions; ,
Based on the first reflected light amount value distribution, a characteristic information acquisition unit that acquires characteristic information related to the reflected light amount value in the linear region;
An inspection apparatus comprising:

Images