CN114740691A - Processing method adopting lens group - Google Patents

Processing method adopting lens group Download PDF

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Publication number
CN114740691A
CN114740691A CN202110019385.6A CN202110019385A CN114740691A CN 114740691 A CN114740691 A CN 114740691A CN 202110019385 A CN202110019385 A CN 202110019385A CN 114740691 A CN114740691 A CN 114740691A
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CN
China
Prior art keywords
lens
magnification
test
projection
processing method
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Pending
Application number
CN202110019385.6A
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Chinese (zh)
Inventor
胡传武
徐国栋
李伟成
张雷
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Yuanneng Zhichuang Jiangsu Semiconductor Co ltd
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Yuanneng Zhichuang Jiangsu Semiconductor Co ltd
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Priority to CN202110019385.6A priority Critical patent/CN114740691A/en
Publication of CN114740691A publication Critical patent/CN114740691A/en
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The invention provides a processing method adopting a lens group, which obtains the minimum lens magnification according to the magnification of each lens in the lens group; obtaining the width of a projection strip with the minimum lens magnification; obtaining a projection graph of each strip according to the width of the projection strip; each pixel of the spatial light modulation element is configured according to each stripe projection pattern and the corresponding lens magnification. The problems that when the lens multiplying power is inconsistent, deviation is easy to occur in graph splicing and the effect is poor are effectively solved, and complex debugging of the lens multiplying power is avoided.

Description

Processing method adopting lens group
Technical Field
The invention relates to a processing method of a lens group, in particular to a processing method of lens groups with different lens multiplying powers.
Background
In the semiconductor and PCB industries, various processing procedures such as exposure of a substrate circuit pattern, exposure of solder resist ink, punching, etching and the like can be realized by utilizing light rays emitted by a light source. The lens is a common optical element, performs optical processing on light emitted by the light source, and enlarges or reduces light spots projected by the light source through different lens magnifications.
In the exposure process, a plurality of lenses are usually adopted to expose the substrate at the same time, so that the moving times of the substrate or the lenses are reduced, and the exposure efficiency is effectively improved. However, when multiple lenses are used for exposure, the lens magnification of each lens needs to be kept consistent to obtain a good stitching effect. The high requirements for the lens magnification virtually increase the production cost. Meanwhile, in the using process, if the multiplying power of each lens is inconsistent, the complicated adjusting and correcting process is needed, even the lens needs to be detached for realization, the flexibility is low, the operation is complicated, and the time cost and the labor cost are increased.
Disclosure of Invention
In view of the above problems, the present invention provides a method for processing lens groups with different lens magnifications.
The technical scheme is as follows: a processing method using lens group obtains minimum lens magnification according to the magnification of each lens in the lens group; obtaining the width of a projection strip with the minimum lens magnification; obtaining a projection graph of each strip according to the width of the projection strip; each pixel of the spatial light modulation element is configured according to the projection pattern of each strip and the corresponding lens magnification.
Further, configuring each pixel of the spatial light modulation element according to the projection pattern and the lens magnification is realized by selecting a configuration area of the projection pattern in a rasterization process of the projection pattern.
Further, the configuration area of the projection pattern is obtained by a ratio of the width of the projection stripe to the lens magnification.
Furthermore, the method for measuring the magnification of each lens of the lens group comprises the steps of measuring an initial magnification, and acquiring a plurality of similar test magnifications by taking the initial magnification as a reference; respectively projecting a test pattern to a carrier according to the initial multiplying power and the test multiplying power; and searching a test pattern with good splicing effect, wherein the corresponding multiplying power is the measuring multiplying power of the lens.
Furthermore, the test multiplying power is increased or decreased from the initial multiplying power according to a certain multiplying power stepping value.
Further, the initial multiplying power and the test multiplying power project the test patterns to the photosensitive substrate in sequence from small to large or from large to small.
Furthermore, the test patterns are lines with different widths.
Further, the width of the line is set according to the resolving power of the lens.
Furthermore, the test patterns are straight lines which are arranged in parallel.
Further, the test patterns are horizontal straight lines and vertical straight lines.
Further, when the magnifications of a plurality of lenses are measured simultaneously, the initial magnification and the measured magnification of each lens are obtained, and the span covering all the lens test magnifications is selected; and selecting the test multiplying powers one by one, and simultaneously projecting the photosensitive substrate by the multiple lenses at the selected test multiplying powers to obtain a test pattern, or simultaneously selecting the respective test multiplying powers by the multiple lenses according to the sequence of the test multiplying powers of the multiple lenses to project the photosensitive substrate to obtain the test pattern.
The projection exposure system comprises an exposure lens system, a moving platform system and a control system, wherein the control system controls the exposure lens system and the moving platform system, the moving platform system is used for placing a carrier and driving the carrier to move, the exposure lens system comprises a plurality of exposure lenses and is used for projecting an exposure pattern to the carrier, and the exposure lens system adopts the processing method to expose the carrier.
By the method, the problems that when the lens multiplying power is inconsistent, graph splicing is prone to deviation and poor in effect can be effectively solved, and complex debugging of the lens multiplying power is avoided.
Drawings
Fig. 1 is a schematic view of a lens group.
Fig. 2 is a flow chart of a processing method using a lens group.
Fig. 3 is a schematic diagram of a spatial light modulation element.
Fig. 4 is a schematic view of a projection exposure system.
Fig. 5 is a schematic view of initial magnification measurement.
Fig. 6 is a schematic view of an exposure pattern corresponding to each lens magnification.
Fig. 7 is a schematic diagram of multiple magnification exposure completion per lens.
Fig. 8 is a schematic view of simultaneous exposure of multiple lenses.
Detailed Description
The technical solution in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention.
Fig. 1 shows a lens group including a plurality of lenses, the number of lenses in the lens group is not limited, and it is desirable that the magnification of each lens is uniform when the lenses are projected, as required, so that the same stripe width can be obtained, it is convenient to cooperate with the moving means of the carrier 2, and it is advantageous that stripes between adjacent lenses can be well spliced. The following describes a processing method when the lens magnifications in the lens group are not uniform.
The embodiment is described by taking four lenses contained in a lens group as an example, the four lenses are respectively a first lens 11, a second lens 12, a third lens 13 and a fourth lens 14, each lens in the lens group comprises a light source, a spatial light modulation element and a projection lens, light emitted by the light source forms different projection patterns through the spatial light modulation element, the projection patterns are projected to a carrier through the projection lens, magnification adjustment (magnification or reduction) is carried out on the projection patterns according to the magnification of the projection lens, the spatial light modulation element can be a digital micromirror array (DMD) or a liquid crystal display and the like, and the carrier is a PCB board, a wafer and the like.
As shown in fig. 2, when the carrier is subjected to image projection, the image to be projected onto the carrier is divided according to the number of lenses and the area covered by the lenses, the width of each strip is determined according to the minimum lens magnification, and the image corresponding to each strip of each lens is obtained. And obtaining a utilization area of the spatial light modulation element according to the multiplying power of each lens, wherein the graph corresponding to each lens corresponds to each pixel of the spatial light modulation element and is projected to the carrier.
Before the image projection is carried out on the carrier, the lens multiplying power of each lens in the lens group is obtained, the lens multiplying power is marked, or the lens multiplying power of each lens needs to be obtained through measurement. In this embodiment, the magnification of the first lens is r0, the magnification of the second lens is r1, the magnification of the third lens is r2, and the magnification of the fourth lens is r 3. The multiplying powers of the four lenses are different or the multiplying powers of partial lenses are the same, the lens multiplying power with the minimum value of the multiplying power of the four lenses is found, and the width of the projection strip of each lens is obtained.
In this embodiment, the magnification r1 of the second lens is the smallest numerical value of the four lens magnifications, and the minimum lens magnification r1 is used to calculate the width W of the stripe projected by the second lens, where the width W of the stripe is obtained according to the width W0 of the projection pattern of the spatial light modulator and the magnification of the lens, and W = WO 1.
And the other three lenses adjust the width of the projection graph according to respective lens multiplying power, so that the strip width after the projection by the lenses is the same as the strip width W of the second lens. For the first lens, according to the lens magnification r0 of the first lens, obtaining the width W1= W/r0 of the projection graph corresponding to the first lens; for the third lens, according to the lens magnification r2 of the third lens, obtaining the width W3= W/r2 of the projection graph corresponding to the third lens; for the fourth lens, according to the lens magnification r3 of the fourth lens, the width W4= W/r3 of the projection graph corresponding to the fourth lens is obtained.
As shown in fig. 3, the regions of the spatial light modulation element are cut according to the widths of the four projection patterns, and preferably, the middle region is selected as a projection pattern forming region 100. Each pixel 101 of the spatial light modulation element is arranged in accordance with the projection pattern forming region in the rasterization process of the projection pattern.
The following description specifically introduces the application of the above lens group processing method to a projection exposure system, as shown in fig. 4, the projection exposure system includes an exposure lens system 200, a registration system 300, a motion platform system 400 and a control system, the control system controls the exposure lens system 200, the registration system 300 and the motion platform system 400, the motion platform system 400 is used to place a carrier 2 and drive the carrier 2 to move, the registration system 300 captures the registration points of the carrier 2 to perform registration on the carrier 2, after the registration, the exposure image is obtained by performing operations such as expanding, contracting and translation on the image to be exposed according to the registration information, and the exposure lens system 200 includes a plurality of exposure lenses 1 for projecting the exposure image to the carrier 2. The exposure lens system 200 and the motion platform system 400 are mutually matched, so that all patterns to be exposed to the carrier 2 are projected onto the carrier 2, that is, the exposure lens system 200 projects corresponding exposure patterns onto the carrier 2 of the motion platform according to the position of the motion platform system 400, and if the exposure lens system 200 cannot move in the scanning direction through the motion platform system 400 to realize complete exposure of the patterns in one strip, the motion platform or the exposure lens 1 needs to be moved in the horizontal direction (X direction). And the complete exposure of the graph is realized by splicing the strips projected by different lenses and/or splicing the different strips projected by the same lens.
By applying the processing method of the lens group, when the exposure lens multiplying power in the exposure lens system is different, the minimum lens multiplying power is obtained, the exposure strip is obtained according to the minimum lens multiplying power, the graph to be exposed corresponds to the exposure lens and is divided into each strip, the corresponding area of the spatial light modulation element is intercepted according to the multiplying power of the exposure lens corresponding to each strip, and each pixel of the corresponding area of the spatial light modulation element is obtained in the process of rasterizing graph data. The method has the advantages that the area of the spatial light modulation element corresponding to the graphic data is adjusted, each pixel of the spatial light modulation element is adjusted, and the strips with the same width are obtained, so that the problem of different strip widths caused by inconsistent lens multiplying power is solved, and the complicated operation of adjusting the lens multiplying power is avoided.
Through regular or irregular calibration of the exposure lens, when the magnification of the lens deviates, rapid adjustment can be carried out, and the production progress cannot be influenced.
In addition to the above-described processing methods, accurate measurement of lens power is also critical to avoid pattern deviation caused by erroneous measurement of lens power. How to improve the measurement accuracy of the lens magnification is described in detail below.
As shown in fig. 5, the initial magnification of the lens 1 is first obtained. Setting two marking points 10 in a digital graphic file, acquiring a first distance S between the two marking points 10, exposing the two marking points to a photosensitive substrate 2 through a lens 1 to form two recording points 21, acquiring a second distance S 'between the recording points 21, and acquiring an initial multiplying power r0 of the lens multiplying power through the ratio between the second distance S' and the first distance S. The method for acquiring the initial magnification of the lens is not limited to this, and other measuring methods, such as an optical measuring method, may be used to acquire the initial magnification of the lens.
And acquiring a plurality of test multiplying powers on the basis of the initial multiplying power, wherein the test multiplying power is increased or decreased by taking the initial multiplying power as a reference according to a certain multiplying power stepping value. Specifically, a multiplying power stepping value s is set, a plurality of testing multiplying powers r0 +/-Ns are determined, wherein N is a positive integer, s is set according to the precision of the lens multiplying power, and if the precision of the lens multiplying power reaches ten thousands of bits, s is a numerical value such as 0.0001 or 0.0002.
And a photosensitive base material is placed below the lens and on the carrying platform, the carrying platform can drive the photosensitive base material to move along the scanning direction, and the photosensitive base material can cover the exposure range of the lens. According to the sequence that the test multiplying power and the initial multiplying power are from large to small or from small to large, the lens sequentially exposes the images to the photosensitive base material, the test image 30 of one multiplying power is exposed, the bearing platform drives the photosensitive base material to move for a certain distance along the scanning direction, the test image 30 of the next multiplying power is exposed, intervals are arranged between the adjacent test images 30, and intervals are arranged between the test images obtained according to different test multiplying powers.
The test patterns 30 are lines with different widths, and the widths of the lines are designed according to the resolution capability of the lens, and the line width matched with the resolution capability of the lens and the similar line width are selected. Preferably, the at least one line width smaller than the resolution capability of the lens is included, so that the quality of the exposure effect under different multiplying powers can be distinguished.
The test pattern 30 may be any pattern including lines, such as concentric circles, nested square frames, irregular patterns, etc., as in the embodiment of fig. 6, the test pattern includes vertically parallel lines and horizontally parallel lines, and of course, the test pattern may also only include vertically parallel lines or only include horizontally parallel lines, which is simple and easy to determine the splicing effect.
As shown in fig. 7, 19 test patterns 30 were obtained with s =0.0001 and N = 9. And searching the graph with the best splicing effect by detecting the 19 test graphs, wherein the corresponding lens multiplying power is the measurement multiplying power. The splicing effect is judged through the uniformity of lines and line widths, and the better the uniformity is, the better the splicing effect is. The detection mode can be manual detection through microscope amplification or automatic detection through machine vision.
As shown in fig. 8, the measurement can be performed by a single lens or by multiple lenses, when multiple lenses are measured simultaneously, each lens obtains the same number of test magnifications through the initial magnification, because the initial magnifications are different, the maximum value and the minimum value of the test magnification corresponding to each lens are different, the maximum value and the minimum value of the test magnification corresponding to all lenses are selected as the span of the test magnification, that is, the test magnification span of all lenses is covered, the photosensitive substrates are exposed simultaneously one by one, and the lens magnification of each lens is obtained by analyzing the test pattern of each lens of the photosensitive substrates.
In addition to the above manner of simultaneously measuring multiple lenses, each lens may obtain the same number of test magnifications through the initial magnification, and simultaneously expose the photosensitive substrates one by one according to the sequence of the test magnifications corresponding to each lens, because the initial magnifications of each lens are different, the test magnifications used by each lens are different when the photosensitive substrates are simultaneously exposed. And finally, analyzing the test pattern of each lens of the photosensitive substrate to obtain the lens magnification of each lens.
By the method, the measurement precision of the lens magnification can be effectively improved, and the optimal exposure effect can be obtained.

Claims (12)

1. A processing method adopting a lens group is characterized in that: obtaining the minimum lens magnification according to the magnification of each lens in the lens group; obtaining the width of a projection strip with the minimum lens magnification; obtaining a projection graph of each strip according to the width of the projection strip; each pixel of the spatial light modulation element is configured according to each stripe projection pattern and the corresponding lens magnification.
2. The processing method according to claim 1, characterized in that: configuring each pixel of the spatial light modulation element according to each stripe projection pattern and the corresponding lens magnification is achieved by selecting a configuration region of the projection pattern in a rasterization process of the projection pattern.
3. The processing method according to claim 2, characterized in that: the configuration area of the projection graph is obtained by the ratio of the width of the projection strip to the lens magnification.
4. The processing method according to claim 1, characterized in that: the method for measuring the magnification of each lens of the lens group comprises the steps of measuring an initial magnification, and acquiring a plurality of similar test magnifications by taking the initial magnification as a reference; respectively projecting a test pattern to a carrier according to the initial multiplying power and the test multiplying power; and searching a test pattern with good splicing effect, wherein the corresponding multiplying power is the measuring multiplying power of the lens.
5. The processing method according to claim 4, characterized in that: the test multiplying power is increased or decreased from the initial multiplying power according to a certain multiplying power stepping value.
6. The processing method according to claim 4, characterized in that: and the initial multiplying power and the test multiplying power project the test patterns to the photosensitive substrate in sequence from small to large or from large to small.
7. The processing method according to claim 4, characterized in that: the test patterns are lines with different widths.
8. The process of claim 7, wherein: the width of the lines is set according to the resolving power of the lens.
9. The processing method according to claim 4, characterized in that: the test patterns are straight lines which are arranged in parallel.
10. The processing method according to claim 4, characterized in that: the test patterns are horizontal straight lines and vertical straight lines.
11. The processing method according to claim 4, characterized in that: when the magnifications of a plurality of lenses are measured simultaneously, acquiring the initial magnification and the measured magnification of each lens, and selecting the span covering all the lens test magnifications; and selecting the test multiplying powers one by one, and simultaneously projecting the photosensitive substrate by the multiple lenses at the selected test multiplying powers to obtain a test pattern, or simultaneously selecting the respective test multiplying powers by the multiple lenses according to the sequence of the test multiplying powers of the multiple lenses to project the photosensitive substrate to obtain the test pattern.
12. An exposure method of a projection exposure system, characterized by: the projection exposure system comprises an exposure lens system, a motion platform system and a control system, wherein the control system controls the exposure lens system and the motion platform system, the motion platform system is used for placing a carrier and driving the carrier to move, the exposure lens system comprises a plurality of exposure lenses and is used for projecting an exposure image to the carrier, and the exposure lens system adopts the processing method of any one of claims 1 to 11 to expose the carrier.
CN202110019385.6A 2021-01-07 2021-01-07 Processing method adopting lens group Pending CN114740691A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110019385.6A CN114740691A (en) 2021-01-07 2021-01-07 Processing method adopting lens group

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110019385.6A CN114740691A (en) 2021-01-07 2021-01-07 Processing method adopting lens group

Publications (1)

Publication Number Publication Date
CN114740691A true CN114740691A (en) 2022-07-12

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CN (1) CN114740691A (en)

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