JP2016133277A - Heat treatment device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a heat treatment device capable of controlling temperature distribution with excellent reproductivity.SOLUTION: A heat treatment device 1 includes a cylindrical heater 20, and electrodes 31, 41 electrically connected to both ends of the heater 20. The heater 20 has: a first graphite pipe 21B; a second graphite pipe 21C that is arranged so that one end surface contacts with one end surface of the first graphite pipe 21B, and that has electric resistance higher than that of the first graphite pipe 21B; and a third graphite pipe 21D that is arranged so that one end surface contacts with the other end surface of the second graphite pipe 21C, and that has electric resistance lower than that of the second graphite pipe 21C.SELECTED DRAWING: Figure 2

Description

  The present invention relates to a heat treatment apparatus.

  Carbon materials, especially graphite, have unique properties such as high electrical conductivity, high thermal conductivity, chemical resistance, and self-lubricating properties. Therefore, they are used as materials for metallurgy, electrical / electronic products, machinery, etc. Widely used in various applications. In recent years, heat-treated at high temperatures to develop graphite crystals and improve thermal conductivity are used as heat sinks and heat dissipation substrates, and as negative electrode materials for lithium ion secondary batteries.

  Graphite can be obtained by heat-treating a resin such as phenol or furan, or a graphite raw material such as coke or mesocarbon at, for example, 2000 to 3200 ° C.

  Japanese Patent Application Laid-Open No. 2002-69757 discloses a carbon fiber, a manufacturing method thereof, and an apparatus thereof. Japanese Patent No. 2744617 discloses a method and apparatus for continuous graphitization treatment of vapor-grown carbon fibers.

  In Japanese Patent No. 3787241, a plurality of cylindrical graphite tubes are connected to form a heating tube, a graphite raw material introduction portion is attached to one end portion of the heating tube, and a product graphite is attached to the other end side of the heating tube. An apparatus for producing graphite with a lead-out portion is disclosed. In this graphite manufacturing apparatus, each graphite tube constituting the heating tube is provided with a graphite tube having higher resistance toward the introduction portion side. It is described that a temperature distribution in the heating tube can be made uniform by disposing a graphite tube having a large resistance on the introduction portion side that tends to be low in temperature.

JP 2002-69757 A Japanese Patent No. 2744617 Japanese Patent No. 3787241

  In the configuration of the graphite production apparatus described above, it may be difficult to control the temperature distribution with good reproducibility.

  An object of the present invention is to provide a heat treatment apparatus capable of controlling the temperature distribution with good reproducibility.

  The heat treatment apparatus disclosed herein includes a cylindrical heater and electrodes that are electrically connected to both ends of the heater. The heater includes a first graphite tube, a second graphite tube that has one end surface in contact with one end surface of the first graphite tube, and has an electric resistance higher than that of the first graphite tube, A third graphite tube having an end surface in contact with the other end surface of the second graphite tube and having an electrical resistance lower than that of the second graphite tube.

  According to the above configuration, the heater includes three graphite tubes (first to third graphite tubes) connected in series so that the electric resistance of the middle graphite tube (second graphite tube) is the highest. Is arranged. Electric power is supplied to the heater from electrodes electrically connected to both ends of the heater. At this time, since the first to third graphite tubes are connected in series, the same current flows through the first to third graphite tubes. Therefore, the second graphite tube with the highest electrical resistance generates the most heat. As a result, the heat treatment apparatus forms a convex temperature distribution on the upper side.

  The temperature distribution of the heat treatment apparatus varies depending on factors such as the set temperature, the wear of parts, and the heat capacity of the material to be processed. According to said structure, the highest temperature position can be made into the substantially same position every time by making it into a convex-shaped temperature distribution positively. Therefore, temperature control becomes easy and a temperature distribution with high reproducibility can be formed.

It is a top view which shows schematic structure of the heat processing apparatus. It is sectional drawing along the II-II line of FIG. It is a disassembled perspective view which shows schematic structure of a heater. FIG. 4 is a cross-sectional view taken along line IV-IV in FIG. 3. It is a block diagram which shows the functional structure of the heat processing apparatus. It is an example of the temperature distribution in a heat processing apparatus. It is an example of the temperature distribution of the heat processing apparatus by a virtual comparative example. It is a figure which shows the flow of the inert gas in a heat processing apparatus.

[Embodiment]
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In the drawings, the same or corresponding parts are denoted by the same reference numerals and description thereof will not be repeated. In addition, in order to make the explanation easy to understand, in the drawings referred to below, the configuration is shown in a simplified or schematic manner, or some components are omitted. Further, the dimensional ratio between the constituent members shown in each drawing does not necessarily indicate an actual dimensional ratio.

[Overall configuration]
FIG. 1 is a plan view showing a schematic configuration of a heat treatment apparatus 1 according to an embodiment of the present invention. FIG. 2 is a cross-sectional view taken along the line II-II in FIG. The heat treatment apparatus 1 includes a heater 20, troughs 30 and 40, a furnace wall 50, and chambers 60 and 70.

  The heat treatment apparatus 1 continuously heat-treats the crucible 10 by moving the crucible 10 along the axial direction inside the cylindrical heater 20. The heater 20 also serves as a furnace core tube of the heat treatment apparatus 1.

  The crucible 10 includes a bottomed cylindrical container 11 and a lid 12 that covers the opening of the container 11. The crucible 10 contains a material to be processed that is subject to heat treatment. The material to be treated is, for example, a resin such as phenol or furan, or a powder such as coke or mesocarbon.

  The heater 20 is composed of six graphite tubes 21A, 21B, ..., 21F. The graphite tubes 21A, 21B,..., 21F are arranged coaxially with their end faces attached together. A graphite connecting ring 22 is fitted to the connecting portion of the graphite tubes 21A, 21B,..., 21F, and the radial position is regulated.

  Both ends of the heater 20 are connected to troughs 30 and 40, respectively. The troughs 30 and 40 are formed of a conductive heat-resistant member such as graphite, like the heater 20. The troughs 30 and 40 have a cylindrical shape having the same inner diameter as the heater 20.

  The entire heater 20 and a part of the troughs 30 and 40 are surrounded by a furnace wall 50 formed of a refractory block or the like. A space surrounded by the furnace wall 50 is filled with a heat insulating material 51. Examples of the heat insulating material 51 include graphite powder.

  In the troughs 30 and 40, electrodes 31 and 41 are formed at portions exposed from the furnace wall 50, respectively. Electric power is supplied to the electrodes 31 and 41 from a power supply device 85 (FIG. 5) described later. The electrodes 31 and 41 are electrically connected to the heater 20 via troughs 30 and 40. The heat treatment apparatus 1 heats the heater 20 by passing a current through the heater 20.

  A plurality of temperature measuring tubes 52 are arranged inside the furnace wall 50 so as to contact the peripheral surface of the heater 20. The temperature of the heater 20 is measured by a plurality of radiation thermometers 53 (FIG. 2).

  Gas inlets 30a and 40a are formed in the troughs 30 and 40, respectively. A gas exhaust cylinder 54 formed so as to communicate with the inside of the trough 30 is disposed inside the furnace wall 50. An inert gas such as nitrogen or argon is introduced into the heater 20 from the gas inlets 30a and 40a. The introduced inert gas is discharged from the gas exhaust tube 54 together with impurities that volatilize by the heat treatment.

  The troughs 30 and 40 are connected to the chambers 60 and 70, respectively. As shown in FIG. 1, the chamber 60 includes a shutter 61. The chamber 70 includes a shutter 71. The heat treatment apparatus 1 further includes conveyors 62 and 72, a pushing device 63, and a direction reversing device 64. Further, gas introduction ports 60a and 70a are formed in the chambers 60 and 70, respectively. An inert gas is also introduced from the gas inlets 60a and 70a.

  A plurality of crucibles 10 are inserted into the heater 20 while being in contact with each other. The heat treatment apparatus 1 pushes the crucible 10 on the chamber 60 side into the inside by the pushing device 63. As a result, the plurality of crucibles 10 in the heater 20 move toward the chamber 70.

  The heat treatment apparatus 1 drives the shutter 61 and the conveyor 62 to carry the crucible 10 before heat treatment into the chamber 60. The heat treatment apparatus 1 drives the shutter 71 and the conveyor 72 to carry out the heat-treated crucible 10 from the chamber 70. The heat treatment apparatus 1 can continuously heat treat the crucible 10 by repeating these operations.

  The direction reversing device 64 is installed on the transport path of the conveyor 62. The direction reversing device 64 is, for example, a mechanical arm, and grips and rotates the crucible 10 from above the conveyor 62. The direction reversing device 64 rotates the crucible 10 so that the lid 12 is on the chamber 70 side. By setting the lid 12 to the chamber 70 side, the lid 12 can be prevented from being damaged by the pressing of the pushing device 63.

[Configuration of Heater 20]
FIG. 3 is an exploded perspective view showing a schematic configuration of the heater 20. 4 is a cross-sectional view taken along line IV-IV in FIG. 3 and 4, the graphite tubes 21 </ b> A, 21 </ b> B,..., 21 </ b> F are simply referred to as the graphite tube 21 without being distinguished from each other.

  As described above, the graphite tubes 21A, 21B,..., 21F are arranged coaxially with their end faces attached together. More specifically, the graphite tube 21A is disposed so that one end surface thereof is in contact with one end surface of the graphite tube 21B, and the graphite tube 21B is disposed so that the other end surface thereof is in contact with one end surface of the graphite tube 21C. ..., the graphite tube 21E is disposed such that the other end surface is in contact with one end surface of the graphite tube 21F.

  That is, graphite tube 21A and graphite tube 21B, graphite tube 21B and graphite tube 21C,..., Graphite tube 21E and graphite tube 21F are in contact with each other at their end faces. Therefore, the graphite tubes 21A, 21B,..., 21F are electrically connected in series.

In this embodiment, the graphite tube 21A, 21B, · · ·, the electrical resistance of _{21F ρ A, ρ B, ···} , as [rho _F, satisfy the following relationship.
ρ _C > ρ _B > ρ _A
ρ _C > ρ _D > ρ _E > ρ _F

  In other words, in this embodiment, the electrical resistance of the graphite tube arranged on the center side in the axial direction of the heater 20 is higher. In other words, the graphite tube disposed at a position far from the electrode 31 and the electrode 32 has a higher electrical resistance. In this embodiment, the electrical resistance of the graphite tube 21C is the highest.

In the present embodiment, ρ _A , ρ _B ,..., Ρ _F further satisfy the following relationship.
ρ _C > ρ _D > ρ _B > ρ _E > ρ _F > ρ _A

  As described above, the connection ring 22 is fitted to the connection portion of the graphite tubes 21A, 21B,..., 21F. Thereby, the graphite tubes 21A, 21B,..., 21F are configured not to be displaced in the radial direction (direction perpendicular to the x direction).

  Grooves 21a having an outer diameter R2 smaller than the outer diameter R1 of the heater 20 are formed at both ends of the graphite tubes 21A, 21B,. As shown in FIG. 4, the connection ring 22 is fitted in a recess formed by the groove portions 21 a of the two graphite tubes. Thereby, the movement of the connecting ring 22 in the axial direction (x direction) of the heater 20 is restricted. Therefore, it is possible to prevent the connecting ring 22 from being displaced in the axial direction, and thus to prevent the center axes of the two graphite tubes from being displaced.

  The graphite tubes 21A, 21B,..., 21F and the connection ring 22 are preferably formed of the same material. This is because the thermal expansion coefficient of the graphite tubes 21A, 21B,..., 21F and the thermal expansion coefficient of the connection ring 22 are the same, so that the generation of stress at the connection portion is suppressed.

  In the present embodiment, the outer diameter R1 of the heater 20 and the outer diameter of the connection ring 22 are equal. In other words, the depth of the groove 21 a is equal to the thickness of the connection ring 22. When the connection ring 22 protrudes from the heater 20, the surface area increases and the amount of heat radiation increases. By preventing the connection ring 22 from protruding from the heater 20, heat dissipation can be suppressed. It should be noted that the outer diameter R1 of the heater 20 and the outer diameter of the connection ring 22 do not need to be strictly equal, and may be substantially equal.

[Temperature control method of heat treatment apparatus 1]
An example of the temperature control method of the heat treatment apparatus 1 will be described. However, the temperature control method of the heat treatment apparatus 1 is not limited to this.

  FIG. 5 is a block diagram showing a functional configuration of the heat treatment apparatus 1. The heat treatment apparatus 1 further includes a temperature control device 80 and a power supply device 85.

  The temperature control device 80 includes a plurality of analog / digital converters (ADC) 81, an arithmetic device 82, a storage device 83, and a digital / analog converter (DAC) 84.

  The computing device 82 includes a comparison unit 821 that selects the maximum value from the plurality of supplied values, and an output determination unit 822 that determines the output of the power supply device 85. The comparison unit 821 and the output determination unit 822 may be hardware such as a dedicated circuit, or may be software realized by executing a program based on information stored in the storage device 83.

  A temperature measurement value is supplied from each of the plurality of radiation thermometers 53 to the temperature control device 80 via the ADC 81. The comparison unit 821 selects the maximum value among the measurement values of the temperatures measured by the plurality of radiation thermometers 53 as a measurement temperature, and supplies the measurement temperature to the output determination unit 822.

  The storage device 83 stores a set temperature input by an input device (not shown). The output determination unit 822 calculates a deviation between the set temperature stored in the storage device 83 and the measured temperature supplied from the comparison unit 821 at regular intervals, and stores it in the storage device 83. The output determination unit 822 determines the output of the power supply device 85 based on the deviation, the time integration of the deviation, and the time differentiation of the deviation.

  In addition, the preset temperature when heat-treating a to-be-processed material is 2000-3200 degreeC, for example, Preferably it is 2200-3000 degreeC.

  The output determined by the output determination unit 822 is supplied to the power supply device 85 via the DAC 84. The power supply device 85 supplies power proportional to the output to the heater 20.

  As described above, in the present embodiment, the maximum temperature of the heater 20 is set as the measurement temperature, and the output of the power supply device 85 is adjusted so that the measurement temperature and the set temperature match.

[Effect of heat treatment apparatus 1]
FIG. 6 is an example of a temperature distribution in the heat treatment apparatus 1. The horizontal axis in FIG. 6 represents the position along the axial direction of the heater 20, and A, B,..., F are positions where the graphite tubes 21A, 21B,. It represents.

  Electric power is supplied to the heater 20 from both ends thereof via the electrodes 31 and 41. Since the graphite tubes 21A, 21B,..., 21F are electrically connected in series, the same current flows through all of the graphite tubes 21A, 21B,. Therefore, the calorific value increases as the graphite tube has a higher electrical resistance.

  In the present embodiment, the electrical resistance of the graphite tube is higher toward the center side of the heater 20 in the axial direction. Therefore, the amount of heat generation increases toward the center of the heater 20 in the axial direction. Therefore, as shown in FIG. 6, the temperature distribution of the heat treatment apparatus 1 has an upward convex shape having a peak near the center of the heater 20.

  According to this embodiment, the temperature control of the heat treatment apparatus 1 becomes easy. The effect of this configuration will be described with reference to a virtual comparative example. FIG. 7 is an example of a temperature distribution of a heat treatment apparatus according to a virtual comparative example. This heat treatment apparatus is designed so that the temperature distribution in the apparatus becomes flat.

  In actual heat treatment, the shape of the temperature distribution in the apparatus varies from heat treatment to heat treatment due to factors such as the set temperature, the heat capacity of the material to be treated, and the wear of the heater 20 and the heat insulating material 51. Therefore, in the case of the temperature distribution as shown in FIG. 7, there is a possibility that the maximum temperature position varies for each heat treatment.

  At this time, if the temperature of one location of the heater 20 is measured to control the output of the power supply device 85, the maximum temperature in the device may be higher than the set temperature. It is considered that the physical properties of the heat treatment material (material) are more strongly affected by the maximum temperature than the average temperature during the treatment. Therefore, it is not preferable that the maximum temperature in the apparatus is higher than the set temperature.

  Further, in the case of the temperature distribution as shown in FIG. 7, the maximum temperature position changes such that the maximum temperature position becomes the position of the graphite tube 21B in one heat treatment and the maximum temperature position becomes the position of the graphite tube 21E in another heat treatment. As a result, the temperature increase rate of the crucible 10 may change with each heat treatment.

  In the present embodiment, the maximum temperature position can be made almost the same every time by positively forming a convex temperature distribution. Therefore, since it is sufficient to manage the temperature in the vicinity, temperature control becomes relatively easy. Further, since the maximum temperature position is substantially the same, the heat history applied to the material to be processed can be made constant. Therefore, heat treatment with high reproducibility can be performed.

  Moreover, according to this embodiment, the heat radiation from both ends of the heater 20 can be suppressed. Therefore, it can heat efficiently compared with the temperature distribution of FIG.

  In the present embodiment, the graphite tube having the highest electrical resistance among the graphite tubes constituting the heater 20 is the graphite tube 21C. In the example of FIG. 6, the position of the graphite tube 21D is the highest temperature position. . This is because the temperature on the chamber 60 side is lowered because the crucible 10 having a low temperature is conveyed from the chamber 60 side. Thus, the position where the graphite tube having the highest electrical resistance is disposed and the maximum temperature position do not have to coincide with each other.

In this embodiment, ρ _A , ρ _B ,..., Ρ _F satisfy the relationship of ρ _C > ρ _D > ρ _B > ρ _E > ρ _F > ρ _A. That is, the electrical resistance of the graphite tube (21B, 21C) on the chamber 60 side relative to the center of the heater 20 in the axial direction is higher than that on the chamber 70 side (21D, 21E). As described above, since the crucible 10 having a low temperature is transported from the chamber 60 side, the heater 20 has a low temperature on the chamber 60 side. By making the electrical resistance of the graphite tube on the chamber 60 side relatively high, the calorific value of the graphite tube on the chamber 60 side is increased. Thereby, a temperature distribution more symmetrical with respect to the center of the heater 20 is obtained. However, the electrical resistance ρ _A of the graphite tube 21A is set lower than the electrical resistance ρ _F of the graphite tube 21F. As a result, the amount of heat generated at the position of the graphite tube 21A is made relatively small, and the temperature change at the start of heating of the material to be processed is moderated.

  The heat treatment apparatus 1 includes a plurality of radiation thermometers 53. Further, the temperature control device 80 (FIG. 5) includes a comparison unit 821 that selects the maximum value from a plurality of temperature measurement values. According to this configuration, even if the maximum temperature position varies, it is possible to prevent the maximum temperature in the apparatus from becoming higher than the set temperature.

  According to the configuration of the present embodiment, the purification of the material to be processed can be further promoted as described below.

  Impurities having a melting point lower than that of the material to be processed are volatilized by the heat treatment and discharged from the material to be processed. At this time, the higher the temperature, the higher the equilibrium vapor pressure of impurities, and more impurities volatilize. However, when the partial pressure of the impurity reaches the equilibrium vapor pressure, the impurity does not volatilize.

  According to the present embodiment, the temperature distribution in the heat treatment apparatus 1 has an upwardly convex shape having a peak near the center of the heater 20. Similarly, the concentration distribution of the volatilized impurities has an upwardly convex shape. Volatilized impurities diffuse from a high concentration position to a low concentration position. As a result, the concentration of the impurity at the peak position decreases. The partial pressure of the impurity at the peak position becomes lower than the equilibrium vapor pressure, and the impurity further volatilizes. By repeating this, impurities are continuously discharged from the material to be processed.

  In the case of a flat temperature distribution as shown in FIG. 7, the concentration distribution of volatile impurities is also flat and no diffusion occurs. Therefore, when the partial pressure of the impurity reaches the equilibrium vapor pressure, the impurity does not volatilize. On the other hand, according to the present embodiment, the impurity concentration gradient can be formed by the temperature distribution in the apparatus, and the purification of the material to be processed can be promoted by using diffusion.

  FIG. 8 is a view showing the flow of the inert gas in the heat treatment apparatus 1. In FIG. 8, the flow of the inert gas is schematically shown by white arrows. In the present embodiment, a gas inlet 40 a is formed in the trough 40 disposed on the chamber 70 side of the heater 20. Further, a gas exhaust cylinder 54 is formed so as to communicate with the trough 30 disposed on the chamber 60 side with respect to the heater 20. According to this configuration, the inert gas flows from the chamber 70 side toward the chamber 60 side in the heater 20.

  On the other hand, the crucible 10 is moved from the chamber 60 side toward the chamber 70 side by the pushing device 63. That is, in this embodiment, the inert gas flows in the direction opposite to the moving direction of the crucible 10.

  According to this configuration, the impurities discharged from the material to be processed housed in a certain crucible 10 move in the direction opposite to the moving direction of the crucible 10 by the inert gas. Therefore, impurities are not attached to the crucible 10 again. Impurities may adhere to the crucible 10 located downstream of the crucible 10 in the gas flow direction, but when the crucible 10 located downstream passes the maximum temperature position, the adhering impurities are volatilized and removed again. Can be expected. Therefore, the purity of the heat treatment material (material) can be improved.

  In the present embodiment, the gas exhaust cylinder 54 is disposed in a portion covered with the heat insulating material 51. That is, the gas exhaust cylinder 54 is disposed in a high temperature region. According to this configuration, the volatilized impurities are discharged from the gas exhaust cylinder 54 before solidifying again. Therefore, it is possible to prevent the impurities from being deposited in the apparatus, and as a result, the purity of the heat treatment material (material) can be improved.

  In the present embodiment, the gas inlet 40 a is formed in the trough 40, and the gas exhaust cylinder 54 is formed so as to communicate with the trough 30. However, the positions of the gas inlet and the gas exhaust tube are not limited to this. The gas inlet and the gas exhaust tube may be located at a position where the flow direction of the inert gas in the heater 20 is opposite to the moving direction of the crucible 10. For example, instead of the gas introduction port 40a, a gas introduction cylinder communicating with the heater 21F may be formed. Further, instead of the gas exhaust cylinder 54, a gas exhaust cylinder that communicates with the heater 21A may be formed.

  The gas inlet is preferably located downstream of the maximum temperature position of the heater 20 in the moving direction of the crucible 10, that is, on the chamber 70 side. The gas exhaust cylinder is preferably located on the upstream side in the moving direction of the crucible 10, that is, on the chamber 60 side, relative to the maximum temperature position of the heater 20. Further, the gas exhaust or the like is preferably formed at a position where the temperature in the heater 20 is higher than the melting point of the impurities of the material to be processed.

[Other Embodiments]
As mentioned above, although embodiment about this invention was described, this invention is not limited only to the above-mentioned embodiment, A various change is possible within the scope of the invention.

  In the above embodiment, the case where the heater 20 is cylindrical has been described. However, the heater 20 may be cylindrical, and the cross-sectional shapes of the heater 20 and the graphite tubes 21A, 21B, ..., 21F are arbitrary.

  In the above embodiment, the plurality of graphite tubes are illustrated as having the same length, but the lengths of the plurality of graphite tubes may be different from each other.

In the above embodiment, the case where ρ _A , ρ _B ,..., Ρ _F satisfies the following relationship has been described.
ρ _C > ρ _B > ρ _A
ρ _C > ρ _D > ρ _E > ρ _F
However, ρ _A , ρ _B ,..., Ρ _F may have the following relationship.
ρ _C = ρ _D
ρ _C > ρ _B > ρ _A
ρ _D > ρ _E > ρ _F

  This is because even in the above relationship, a temperature distribution that is convex upward is obtained. In this case, the graphite tube 21C and the graphite tube 21D can be substantially regarded as one graphite tube.

  In the above embodiment, the case where the heater 20 is composed of six graphite tubes has been described. However, the number of graphite tubes constituting the heater is arbitrary as long as it is three or more.

  That is, the heater may include three graphite tubes connected in series, and the heater may be arranged so that the electric resistance of the middle graphite tube is the highest. In other words, the heater is a first graphite tube and a second graphite tube that is disposed such that one end surface is in contact with one end surface of the first graphite tube and has an electric resistance higher than that of the first graphite tube. And a third graphite tube having one end face in contact with the other end face of the second graphite tube and having an electric resistance lower than that of the second graphite tube.

  In the above embodiment, the case where the heater 20 also serves as a furnace core tube has been described. However, the heat treatment apparatus 1 may include a furnace core tube separately from the heater 20.

  In the above embodiment, the case where the heat treatment apparatus 1 includes the chambers 60 and 70 has been described. However, the heat treatment apparatus 1 may include a shutter on the inlet side of the trough 30 or the outlet side of the trough 40 without including either or both of the chambers 60 and 70. Further, the conveyors 62 and 72 may not be provided. Alternatively, a slope or the like may be formed instead of the conveyors 62 and 72.

DESCRIPTION OF SYMBOLS 1 Heat processing apparatus 10 Crucible 11 Container 12 Cover 20 Heater 21A, 21B, ..., 21F Graphite tube 22 Connection ring 30, 40 Trough 30a, 40a Gas inlet 31, 41 Electrode 50 Furnace wall 51 Heat insulating material 52 Temperature measuring tube 53 Radiation thermometer 54 Gas exhaust cylinder 60, 70 Chamber 63 Pushing device 80 Temperature control device 85 Power supply device

JP 2002-69757 A Japanese Patent No. 2744617 Patent No. 3787241

Claims (4)

A cylindrical heater;
An electrode electrically connected to both ends of the heater;
The heater is
A first graphite tube;
A second graphite tube disposed such that one end surface is in contact with one end surface of the first graphite tube, and having an electric resistance higher than that of the first graphite tube;
A heat treatment apparatus comprising: a third graphite tube that is disposed so that one end surface is in contact with the other end surface of the second graphite tube and has an electric resistance lower than that of the second graphite tube. The heat treatment apparatus according to claim 1,
A pushing device that is disposed at one of the heater openings and pushes the material to be processed toward the other opening in the heater;
A gas inlet formed to communicate with the interior of the heater;
A gas exhaust port formed to communicate with the inside of the heater,
The gas inlet is disposed on the other side of the heater opening with respect to the second graphite tube in the axial direction of the heater,
The said gas exhaust port is a heat processing apparatus arrange | positioned between the said 2nd graphite tube and the said pushing apparatus in the axial direction of the said heater. The heat treatment apparatus according to claim 2,
Further comprising a heat insulating material disposed over the peripheral surface of the heater;
The said gas exhaust port is a heat processing apparatus arrange | positioned in the part covered with the said heat insulating material. It is the heat processing apparatus as described in any one of Claims 1-3,
A heat treatment apparatus further comprising a plurality of temperature sensors for measuring the temperature of the heater.

Images