JP2016085369A - Polarizing plate and image display device including the same - Google Patents
Polarizing plate and image display device including the same Download PDFInfo
- Publication number
- JP2016085369A JP2016085369A JP2014218510A JP2014218510A JP2016085369A JP 2016085369 A JP2016085369 A JP 2016085369A JP 2014218510 A JP2014218510 A JP 2014218510A JP 2014218510 A JP2014218510 A JP 2014218510A JP 2016085369 A JP2016085369 A JP 2016085369A
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- Prior art keywords
- polarizing plate
- polarizer
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- mass
- protective layer
- Prior art date
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- NHJIDZUQMHKGRE-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-yl 2-(7-oxabicyclo[4.1.0]heptan-4-yl)acetate Chemical compound C1CC2OC2CC1OC(=O)CC1CC2OC2CC1 NHJIDZUQMHKGRE-UHFFFAOYSA-N 0.000 description 1
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- 239000007983 Tris buffer Substances 0.000 description 1
- FZEYVTFCMJSGMP-UHFFFAOYSA-N acridone Chemical class C1=CC=C2C(=O)C3=CC=CC=C3NC2=C1 FZEYVTFCMJSGMP-UHFFFAOYSA-N 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
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- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
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- 239000004305 biphenyl Substances 0.000 description 1
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- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- MAOSFLAYGYQLBB-UHFFFAOYSA-N butane-1,4-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OCCCCO MAOSFLAYGYQLBB-UHFFFAOYSA-N 0.000 description 1
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- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 1
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- WAZPATOMLZGRAY-UHFFFAOYSA-K diphenyl-(4-phenylsulfanylphenyl)sulfanium phosphate Chemical compound [O-]P([O-])([O-])=O.S(c1ccccc1)c1ccc(cc1)[S+](c1ccccc1)c1ccccc1.S(c1ccccc1)c1ccc(cc1)[S+](c1ccccc1)c1ccccc1.S(c1ccccc1)c1ccc(cc1)[S+](c1ccccc1)c1ccccc1 WAZPATOMLZGRAY-UHFFFAOYSA-K 0.000 description 1
- OZLBDYMWFAHSOQ-UHFFFAOYSA-N diphenyliodanium Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1 OZLBDYMWFAHSOQ-UHFFFAOYSA-N 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000006266 etherification reaction Methods 0.000 description 1
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- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
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- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
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- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- UUORTJUPDJJXST-UHFFFAOYSA-N n-(2-hydroxyethyl)prop-2-enamide Chemical compound OCCNC(=O)C=C UUORTJUPDJJXST-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
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- 125000003566 oxetanyl group Chemical group 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 229920001610 polycaprolactone Polymers 0.000 description 1
- 239000004632 polycaprolactone Substances 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 150000004291 polyenes Chemical class 0.000 description 1
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- 239000000243 solution Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- MKOBNHWWZPEDQJ-UHFFFAOYSA-N trifluoro(methanidylsulfonyl)methane Chemical compound [CH2-]S(=O)(=O)C(F)(F)F MKOBNHWWZPEDQJ-UHFFFAOYSA-N 0.000 description 1
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 1
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- 125000005289 uranyl group Chemical group 0.000 description 1
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Polarising Elements (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Mathematical Physics (AREA)
- Liquid Crystal (AREA)
Abstract
Description
本発明は偏光板及びこれを備える画像表示装置に関する。特に、芳香族エポキシ樹脂を主成分とする保護層が設けられた偏光板及びこれを備える画像表示装置に関する。 The present invention relates to a polarizing plate and an image display device including the same. In particular, the present invention relates to a polarizing plate provided with a protective layer mainly composed of an aromatic epoxy resin and an image display device including the same.
液晶表示装置には、所定方向の光の透過を遮断するための偏光板が液晶とともに具備されている。偏光板としては、偏光子の両側にTAC(トリアセチルセルロース)フィルム、PET(ポリエチレンテレフタラート)フィルム、アクリル系樹脂フィルムなどの熱可塑性保護フィルムを接着剤を用いて貼り付けた構造、或は、偏光子の一側に前記保護フィルムを接着剤層を介して貼り付け、他側にCOP(シクロオレフィン樹脂)フィルム、TACフィルム、PC(ポリカーボネート)フィルムなどを用いて作製された位相差フィルムを接着剤層を介して貼り付けた構造が従来から知られている。 The liquid crystal display device includes a polarizing plate for blocking transmission of light in a predetermined direction together with the liquid crystal. As a polarizing plate, a structure in which a thermoplastic protective film such as a TAC (triacetyl cellulose) film, a PET (polyethylene terephthalate) film, an acrylic resin film is attached to both sides of a polarizer using an adhesive, or The protective film is attached to one side of the polarizer via an adhesive layer, and the other side is bonded to a retardation film made using COP (cycloolefin resin) film, TAC film, PC (polycarbonate) film, etc. A structure pasted through an agent layer is conventionally known.
また、偏光板の薄型化、軽量化、高耐久化を図るために、接着剤層を省略し、偏光子上に直接保護膜を形成した構造も検討されている。例えば、特許文献1には、偏光フィルムの一方の面に積層されたエポキシ系化合物を含む活性エネルギー線硬化性化合物を含有する硬化性樹脂組成物の硬化物からなる保護層が提案されており、特許文献2には、偏光子の表面に直接塗布されたアクリル系化合物を含む光重合性化合物が重合した硬化物を含有する保護膜が提案されている。また、特許文献3には、偏光フィルムの少なくとも一方の側に備えられた脂環式エポキシ化合物及びアクリル系化合物を含有する活性エネルギー線硬化性樹脂組成物の硬化物を主成分とする保護膜が提案されている。 In addition, in order to reduce the thickness, weight, and durability of the polarizing plate, a structure in which an adhesive layer is omitted and a protective film is directly formed on a polarizer has been studied. For example, Patent Document 1 proposes a protective layer made of a cured product of a curable resin composition containing an active energy ray-curable compound containing an epoxy compound laminated on one surface of a polarizing film, Patent Document 2 proposes a protective film containing a cured product obtained by polymerizing a photopolymerizable compound including an acrylic compound directly applied to the surface of a polarizer. Patent Document 3 discloses a protective film mainly composed of a cured product of an active energy ray-curable resin composition containing an alicyclic epoxy compound and an acrylic compound provided on at least one side of a polarizing film. Proposed.
しかしながら、特許文献1で提案されているエポキシ系樹脂の硬化物を含有する保護膜、及び特許文献3で提案されているエポキシ系樹脂及びアクリル系樹脂を含む硬化物を含有する保護膜は、弾性率が低く、熱収縮による偏光フィルムのクラックが発生し易いという問題があった。また、特許文献2で提案されているアクリル系樹脂の硬化物を含有する保護膜は、樹脂の硬化時における収縮が大きいため、偏光フィルムに対する接着性が弱く、偏光フィルムのクラックが発生し易いという問題があった。 However, a protective film containing a cured product of an epoxy resin proposed in Patent Document 1 and a protective film containing a cured product including an epoxy resin and an acrylic resin proposed in Patent Document 3 are elastic. The rate was low, and there was a problem that the polarizing film was easily cracked by heat shrinkage. Moreover, since the protective film containing the hardened | cured material of acrylic resin proposed by patent document 2 has the large shrinkage | contraction at the time of hardening of resin, it says that the adhesiveness with respect to a polarizing film is weak, and the crack of a polarizing film is easy to generate | occur | produce. There was a problem.
そこで、本発明は、上述の問題を解決するものであって、偏光子に対する接着性が良く、且つ高耐久性を有する保護層が設けられた偏光板及びこれを備える画像表示装置を提供することを目的とする。 Accordingly, the present invention solves the above-described problems, and provides a polarizing plate provided with a protective layer having good adhesion to a polarizer and having high durability, and an image display device including the polarizing plate. With the goal.
本発明の一実施形態によると、偏光子と、前記偏光子の少なくとも一方の面上に配置されて、芳香族エポキシ化合物を含有する樹脂組成物の硬化物により形成された保護層と、を含む偏光板が提供される。 According to one embodiment of the present invention, a polarizer and a protective layer disposed on at least one surface of the polarizer and formed of a cured product of a resin composition containing an aromatic epoxy compound are included. A polarizing plate is provided.
本発明の一実施形態に係る偏光板は、偏光子の少なくとも一面上に芳香族エポキシ化合物を含む樹脂組成物を硬化させることにより得られる剛直な芳香族エポキシ樹脂を含む保護層を備えるため、高弾性率及び高耐久性を実現することが可能であり、偏光子の熱収縮を抑制することができる。また、前記保護層の偏光子に対する接着性が良好であるため、保護層を偏光子の表面上に直接形成することが可能であり、接着剤などを用いる必要がない。そのため、偏光板の薄型化及び軽量化を実現することができる。 The polarizing plate according to one embodiment of the present invention includes a protective layer containing a rigid aromatic epoxy resin obtained by curing a resin composition containing an aromatic epoxy compound on at least one surface of a polarizer. Elastic modulus and high durability can be realized, and thermal contraction of the polarizer can be suppressed. Moreover, since the adhesiveness of the protective layer to the polarizer is good, the protective layer can be formed directly on the surface of the polarizer, and it is not necessary to use an adhesive or the like. Therefore, the polarizing plate can be reduced in thickness and weight.
前記前記芳香族エポキシ化合物が以下の一般式(1)で表わされる化合物であってもよい。
前記前記芳香族エポキシ化合物が一般式(1)で表わされる化合物を含むことにより、保護層の高弾性率化を実現することができる。 When the said aromatic epoxy compound contains the compound represented by General formula (1), high elastic modulus of a protective layer is realizable.
前記樹脂組成物は、芳香族エポキシ化合物を主成分として含み、前記芳香族エポキシ化合物は、前記樹脂組成物全体に対して40質量%以上90質量%以下含有されてもよい。 The resin composition may include an aromatic epoxy compound as a main component, and the aromatic epoxy compound may be contained in an amount of 40% by mass to 90% by mass with respect to the entire resin composition.
前記樹脂組成物が芳香族エポキシ化合物を主成分として含むことにより、該樹脂組成物を硬化させることにより得られる保護層は、芳香族エポキシ樹脂を主成分として含むため、さらなる高弾性率を実現することができるため、偏光子の熱収縮をさらに抑制し、偏光板の耐久性をさらに向上させることができる。 When the resin composition contains an aromatic epoxy compound as a main component, the protective layer obtained by curing the resin composition contains an aromatic epoxy resin as a main component, thereby realizing further high elastic modulus. Therefore, the thermal contraction of the polarizer can be further suppressed, and the durability of the polarizing plate can be further improved.
前記樹脂組成物は、芳香環を有さないエポキシ化合物をさらに含んでもよい。 The resin composition may further include an epoxy compound having no aromatic ring.
前記樹脂組成物が芳香環を有さないエポキシ化合物をさらに含むことにより、該樹脂組成物の粘度を希釈させ、前記保護層を前記偏光子上に容易に形成することができる。 When the resin composition further contains an epoxy compound having no aromatic ring, the viscosity of the resin composition can be diluted, and the protective layer can be easily formed on the polarizer.
前記樹脂組成物は、光カチオン重合開始剤をさらに含んでもよい。 The resin composition may further contain a photocationic polymerization initiator.
高弾性率及び高耐久性を有し、偏光子の熱収縮を抑制することができる偏光板を実現することができる。 A polarizing plate having a high elastic modulus and high durability and capable of suppressing thermal contraction of the polarizer can be realized.
前記保護層の膜厚は、25μm以下であってもよい。 The protective layer may have a thickness of 25 μm or less.
前記保護層の膜厚が25μm以下であることにより、該保護層の信頼性及び可撓性を向上させることができる。 When the thickness of the protective layer is 25 μm or less, the reliability and flexibility of the protective layer can be improved.
本発明の一実施形態によると、前記いずれかの偏光板を備える画像表示装置が提供される。 According to an embodiment of the present invention, an image display device including any one of the polarizing plates is provided.
本発明の一実施形態に係る画像表示装置は、前記いずれかの偏光板を備えることにより、耐久性が向上され、長寿命化を実現することができる。 The image display apparatus according to an embodiment of the present invention includes any one of the polarizing plates, whereby durability is improved and a long life can be realized.
本発明に係る偏光板は、偏光子の少なくとも一面上に芳香族エポキシ樹脂を含む保護層を備えることにより、偏光子の熱収縮が抑制される。その結果、熱衝撃による偏光子のクラックを抑制することができ、耐久性に優れた偏光板を実現することができる。また、該保護層は、偏光子に対する接着性が良好であるため、偏光子の表面上に直接保護層を形成することが可能であり、接着剤などを用いる必要がない。したがって、本発明に係る偏光板は、薄型化及び軽量化を実現することができる。 The polarizing plate which concerns on this invention is equipped with the protective layer containing an aromatic epoxy resin on at least one surface of a polarizer, and the thermal contraction of a polarizer is suppressed. As a result, the polarizer can be prevented from cracking due to thermal shock, and a polarizing plate having excellent durability can be realized. In addition, since the protective layer has good adhesion to the polarizer, it is possible to form the protective layer directly on the surface of the polarizer, and it is not necessary to use an adhesive or the like. Therefore, the polarizing plate according to the present invention can be reduced in thickness and weight.
上述の問題を解決すべく鋭意検討した結果、本発明者は、剛直な骨格を有する芳香族エポキシ樹脂を樹脂組成物の主成分とすることにより、薄型化、軽量化、及び高耐久性を実現することを見出し、本発明を完成させた。 As a result of intensive studies to solve the above-mentioned problems, the present inventor has realized a reduction in thickness, weight, and durability by using an aromatic epoxy resin having a rigid skeleton as the main component of the resin composition. As a result, the present invention has been completed.
以下、図面を参照して本発明に係る保護層が設けられた偏光板及びこの偏光板を備える画像表示装置について図面を参照して詳細に説明する。但し、本発明の保護層が設けられた偏光板及びこの偏光板を備える画像表示装置は異なる態様で実施することが可能であり、以下に示す実施の形態の記載内容に限定して解釈されるものではない。なお、本実施の形態で参照する図面において、同一部分又は同様な機能を有する部分には同一の符号を付し、その繰り返しの説明は省略する。 Hereinafter, a polarizing plate provided with a protective layer according to the present invention and an image display device including the polarizing plate will be described in detail with reference to the drawings. However, the polarizing plate provided with the protective layer of the present invention and the image display device provided with the polarizing plate can be implemented in different modes, and are limited to the description of the embodiments described below. It is not a thing. Note that in the drawings referred to in this embodiment, the same portions or portions having similar functions are denoted by the same reference numerals, and repetitive description thereof is omitted.
図1は、本発明の実施形態に係る偏光板100の一例を示す断面図である。図1に示すように、偏光板100は、偏光子101と、偏光子101の表面上に貼り付けられ、偏光子保護部材として機能する偏光板用保護層(以下、単に「保護層」という)103、105を備えている。 FIG. 1 is a cross-sectional view showing an example of a polarizing plate 100 according to an embodiment of the present invention. As shown in FIG. 1, a polarizing plate 100 is a polarizer 101 and a protective layer for a polarizing plate (hereinafter simply referred to as a “protective layer”) that is attached to the surface of the polarizer 101 and functions as a polarizer protective member. 103 and 105.
偏光子
偏光子101としては、特に制限はなく、従来公知のものを使用することができる。例えば、ポリビニルアルコール系フィルム、部分ホルマール化ポリビニルアルコール系フィルム、エチレン・酢酸ビニル共重合体系部分ケン化フィルム等の親水性高分子フィルムに、ヨウ素や二色性染料等の二色性材料を吸着させて一軸延伸したもの、ポリビニルアルコールの脱水処理物やポリ塩化ビニルの脱塩酸処理物等ポリエン系配向フィルム等が挙げられる。特に、平均重合度2000以上2800以下、けん化度90mol%以上100mol%以下のポリビニルアルコールフィルムをヨウ素で染色し、5〜6倍に一軸延伸して製造した偏光子が好ましい。より具体的には、このような偏光子は、例えば、ポリビニルアルコールフィルムを、ヨウ素水溶液に浸漬して染色し、延伸することにより得られる。ヨウ素水溶液としては、例えば、ヨウ素/ヨウ化カリウムの0.1質量%以上1.0質量%以下の水溶液が好ましい。必要に応じて50〜70℃のホウ酸やヨウ化カリウムなどの水溶液に浸漬してもよく、洗浄や染色むら防止のために、25〜35℃の水に浸漬してもよい。延伸はヨウ素で染色した後に行っても、染色しながら延伸しても、延伸してからヨウ素で染色してもよい。染色および延伸後は、水洗し、35〜55℃で1〜10分程度、乾燥してもよい。
There is no restriction | limiting in particular as polarizer polarizer 101, A conventionally well-known thing can be used. For example, dichroic materials such as iodine and dichroic dyes are adsorbed on hydrophilic polymer films such as polyvinyl alcohol films, partially formalized polyvinyl alcohol films, and ethylene / vinyl acetate copolymer partially saponified films. And polyene-based oriented films such as a uniaxially stretched product, a polyvinyl alcohol dehydrated product and a polyvinyl chloride dehydrochlorinated product. In particular, a polarizer produced by dyeing a polyvinyl alcohol film having an average polymerization degree of 2000 or more and 2800 or less and a saponification degree of 90 mol% or more and 100 mol% or less with iodine and stretching it uniaxially 5 to 6 times is preferable. More specifically, such a polarizer can be obtained by, for example, immersing and stretching a polyvinyl alcohol film by immersing it in an aqueous iodine solution. As the iodine aqueous solution, for example, an aqueous solution of 0.1% by mass to 1.0% by mass of iodine / potassium iodide is preferable. If necessary, it may be immersed in an aqueous solution such as boric acid or potassium iodide at 50 to 70 ° C., or may be immersed in water at 25 to 35 ° C. in order to prevent washing or uneven dyeing. Stretching may be performed after dyeing with iodine, may be stretched while dyeing, or may be dyed with iodine after stretching. After dyeing and stretching, it may be washed with water and dried at 35 to 55 ° C. for about 1 to 10 minutes.
樹脂組成物
本発明に係る保護層103、105は、芳香族エポキシ樹脂を含む。即ち、本発明に係る保護層は、芳香族エポキシ化合物を含有する樹脂組成物の硬化物である。本発明に係る樹脂組成物において、高耐久性を実現させるために、芳香族エポキシ化合物は樹脂組成物の主成分として含有されることが好ましい。芳香族エポキシ化合物の含有量は、硬化膜弾性率などの観点から、樹脂組成物全体に対して40質量%以上90質量%以下が好ましく、50質量%以上85質量%以下がより好ましく、60質量%以上80質量%以下が特に好ましい。芳香族エポキシ化合物は、分子中に2つ以上の芳香環を有し、且つ2官能以上であるエポキシ化合物が好ましい。特に、芳香族エポキシ化合物が、ナフタレン骨格を有するジグリシジルエーテルであることが好ましい。
Resin Composition The protective layers 103 and 105 according to the present invention include an aromatic epoxy resin. That is, the protective layer according to the present invention is a cured product of a resin composition containing an aromatic epoxy compound. In the resin composition according to the present invention, the aromatic epoxy compound is preferably contained as a main component of the resin composition in order to achieve high durability. The content of the aromatic epoxy compound is preferably 40% by mass or more and 90% by mass or less, more preferably 50% by mass or more and 85% by mass or less, and more preferably 60% by mass with respect to the entire resin composition from the viewpoint of the cured film elastic modulus and the like. % To 80% by mass is particularly preferable. The aromatic epoxy compound is preferably an epoxy compound having two or more aromatic rings in the molecule and having two or more functions. In particular, the aromatic epoxy compound is preferably diglycidyl ether having a naphthalene skeleton.
即ち、芳香族エポキシ化合物は、例えば、以下の化学式(1)で表わされる化合物であってもよい。
本発明に係る保護層は、化学式(1)で表わされるナフタレン骨格を有するジグリシジルエーテルなどの芳香族エポキシ化合物である樹脂モノマーを含む樹脂組成物を重合することにより生成される。 The protective layer according to the present invention is produced by polymerizing a resin composition containing a resin monomer that is an aromatic epoxy compound such as diglycidyl ether having a naphthalene skeleton represented by chemical formula (1).
樹脂組成物は、光反応性を向上させるとともに、該樹脂組成物の粘度を希釈させるという観点から、芳香環を有さないエポキシ化合物をさらに含有する。芳香環を有さないエポキシ化合物の含有量は、樹脂組成物全体に対して10質量%以上60質量%以下が好ましく、また20質量%以上50質量%以下がより好ましく、20質量%以上40質量%以下が特に好ましい。であってもよい。芳香環を有さないエポキシ化合物は、特に限定されず、例えば、脂肪族系エポキシ樹脂モノマーや脂環式エポキシ樹脂モノマーが挙げられる。 The resin composition further contains an epoxy compound having no aromatic ring from the viewpoint of improving photoreactivity and diluting the viscosity of the resin composition. The content of the epoxy compound having no aromatic ring is preferably 10% by mass to 60% by mass, more preferably 20% by mass to 50% by mass, and more preferably 20% by mass to 40% by mass with respect to the entire resin composition. % Or less is particularly preferable. It may be. The epoxy compound which does not have an aromatic ring is not specifically limited, For example, an aliphatic epoxy resin monomer and an alicyclic epoxy resin monomer are mentioned.
脂肪族エポキシ樹脂モノマーとしては、脂肪族多価アルコールや、そのアルキレンオキサイド付加物のポリグリシジルエーテル化合物が含まれ、例えば、1,4−ブタンジオールジグリシジルエーテル、1,6−ヘキサンジオールジグリシジルエーテル、ジエチレングリコールジグリシジルエーテル、トリメチロールプロパントリグリシジルエーテル、エチレングリコールジグリシジルエーテル、プロピレングリコールジグリシジルエーテル、トリプロピレングリコールジグリシジルエーテル、ネオペンチルグリコールジグリシジルエーテル、トリメチロールプロパンジグリシジルエーテル、ポリエチレングリコールジグリシジルエーテル等が挙げられる。 Examples of the aliphatic epoxy resin monomer include aliphatic polyhydric alcohols and polyglycidyl ether compounds of alkylene oxide adducts thereof, such as 1,4-butanediol diglycidyl ether and 1,6-hexanediol diglycidyl ether. , Diethylene glycol diglycidyl ether, trimethylolpropane triglycidyl ether, ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, tripropylene glycol diglycidyl ether, neopentyl glycol diglycidyl ether, trimethylolpropane diglycidyl ether, polyethylene glycol diglycidyl ether Examples include ether.
また、脂環式エポキシ樹脂モノマーとしては、3,4−エポキシシクロヘキシルメチル−3,4−エポキシシクロヘキサンカルボキシレート、1,2:8,9ジエポキシリモネン、1,2−エポキシ−4−ビニルシクロヘキサン等が挙げられる。 Alicyclic epoxy resin monomers include 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, 1,2: 8,9 diepoxy limonene, 1,2-epoxy-4-vinylcyclohexane, etc. Is mentioned.
また、本発明に係る保護層の樹脂組成物は、芳香族エポキシ化合物及び芳香環を有さないエポキシ化合物に加えて、その他の樹脂モノマー、光酸発生剤(光カチオン重合開始剤)、及び光増感剤などを含んでもよい。 In addition to the aromatic epoxy compound and the epoxy compound having no aromatic ring, the resin composition of the protective layer according to the present invention includes other resin monomers, a photoacid generator (photocation polymerization initiator), and light. A sensitizer and the like may be included.
光酸発生剤
光酸発生剤としては、従来公知の光酸発生剤を特に制限なく使用することができる。具体的には、例えば、芳香族ジアゾニウム塩、芳香族ヨードニウム塩や芳香族スルホニウム塩などのオニウム塩、鉄−アレン錯体などが挙げられる。これらは、単独で使用しても、二種以上を組み合わせて使用してもよい。
As the photoacid generator , a conventionally known photoacid generator can be used without particular limitation. Specific examples include aromatic diazonium salts, onium salts such as aromatic iodonium salts and aromatic sulfonium salts, and iron-allene complexes. These may be used alone or in combination of two or more.
芳香族ジアゾニウム塩としては、例えば、ベンゼンジアゾニウムヘキサフルオロアンチモネート、ベンゼンジアゾニウムヘキサフルオロホスフェート、ベンゼンジアゾニウムヘキサフルオロボレートなどが挙げられる。 Examples of the aromatic diazonium salt include benzenediazonium hexafluoroantimonate, benzenediazonium hexafluorophosphate, and benzenediazonium hexafluoroborate.
芳香族ヨードニウム塩としては、例えば、ジフェニルヨードニウムテトラキス(ペンタフルオロフェニル)ボレート、ジフェニルヨードニウムヘキサフルオロホスフェート、ジフェニルヨードニウムヘキサフルオロアンチモネート、ジ(4−ノニルフェニル)ヨードニウムヘキサフルオロホスフェートなどが挙げられる。 Examples of the aromatic iodonium salt include diphenyliodonium tetrakis (pentafluorophenyl) borate, diphenyliodonium hexafluorophosphate, diphenyliodonium hexafluoroantimonate, di (4-nonylphenyl) iodonium hexafluorophosphate, and the like.
芳香族スルホニウム塩としては、例えば、トリフェニルスルホニウムヘキサフルオロホスフェート、トリフェニルスルホニウムヘキサフルオロアンチモネート、トリフェニルスルホニウムテトラキス(ペンタフルオロフェニル)ボレート、ジフェニル[4−(フェニルチオ)フェニル]スルホニウムヘキサフルオロアンチモネート、4,4’−ビス〔ジフェニルスルホニオ〕ジフェニルスルフィドビスヘキサフルオロホスフェート、4,4’−ビス〔ジ(β−ヒドロキシエトキシ)フェニルスルホニオ〕ジフェニルスルフィドビスヘキサフルオロアンチモネート、4,4’−ビス〔ジ(β−ヒドロキシエトキシ)フェニルスルホニオ〕ジフェニルスルフィドビスヘキサフルオロホスフェート、7−〔ジ(p−トルイル)スルホニオ〕−2−イソプロピルチオキサントンヘキサフルオロアンチモネート、7−〔ジ(p−トルイル)スルホニオ〕−2−イソプロピルチオキサントンテトラキス(ペンタフルオロフェニル)ボレート、4−フェニルカルボニル−4’−ジフェニルスルホニオ−ジフェニルスルフィドヘキサフルオロホスフェート、4−(p−tert−ブチルフェニルカルボニル)−4’−ジフェニルスルホニオ−ジフェニルスルフィドヘキサフルオロアンチモネート、4−(p−tert−ブチルフェニルカルボニル)−4’−ジ(p−トルイル)スルホニオ−ジフェニルスルフィドテトラキス(ペンタフルオロフェニル)ボレート、ジフェニル[4−(フェニルチオ)フェニル]スルホニウムのリン酸塩などが挙げられる。 Examples of the aromatic sulfonium salt include triphenylsulfonium hexafluorophosphate, triphenylsulfonium hexafluoroantimonate, triphenylsulfonium tetrakis (pentafluorophenyl) borate, diphenyl [4- (phenylthio) phenyl] sulfonium hexafluoroantimonate, 4,4'-bis [diphenylsulfonio] diphenylsulfide bishexafluorophosphate, 4,4'-bis [di (β-hydroxyethoxy) phenylsulfonio] diphenylsulfide bishexafluoroantimonate, 4,4'-bis [Di (β-hydroxyethoxy) phenylsulfonio] diphenyl sulfide bishexafluorophosphate, 7- [di (p-toluyl) sulfonio] -2-isopropylthioxa N-ton hexafluoroantimonate, 7- [di (p-toluyl) sulfonio] -2-isopropylthioxanthone tetrakis (pentafluorophenyl) borate, 4-phenylcarbonyl-4'-diphenylsulfonio-diphenyl sulfide hexafluorophosphate, 4- (P-tert-butylphenylcarbonyl) -4'-diphenylsulfonio-diphenylsulfide hexafluoroantimonate, 4- (p-tert-butylphenylcarbonyl) -4'-di (p-toluyl) sulfonio-diphenylsulfide tetrakis (Pentafluorophenyl) borate, diphenyl [4- (phenylthio) phenyl] sulfonium phosphate, and the like.
鉄−アレン錯体としては、例えば、キシレン−シクロペンタジエニル鉄(II)ヘキサフルオロアンチモネート、クメン−シクロペンタジエニル鉄(II)ヘキサフルオロホスフェート、キシレン−シクロペンタジエニル鉄(II)−トリス(トリフルオロメチルスルホニル)メタナイドなどが挙げられる。 Examples of iron-allene complexes include xylene-cyclopentadienyl iron (II) hexafluoroantimonate, cumene-cyclopentadienyl iron (II) hexafluorophosphate, xylene-cyclopentadienyl iron (II) -tris. And (trifluoromethylsulfonyl) methanide.
光酸発生剤は市販品を用いてもよく、例えば、CPI-100P、101A、200K、210S(サンアプロ株式会社製)、カヤラッド(登録商標)PCI-220、PCI-620(日本化薬株式会社製)、UVI-6990(ユニオンカーバイド社製)、アデカオプトマーSP-150、SP-170(株式会社ADEKA製)、CI-5102、CIT-1370、1682、CIP-1866S、2048S、2064S、(日本曹達株式会社製)、DPI-101、102、103、105、MPI-103、105、BBI-101、102、103、105、TPS-101、102、103、105、MDS-103、105、DTS-102、103(みどり化学株式会社製)、PI-2074(ローディアジャパン株式会社製)などが挙げられる。 Commercially available photoacid generators may be used. For example, CPI-100P, 101A, 200K, 210S (manufactured by Sun Apro Co., Ltd.), Kayrad (registered trademark) PCI-220, PCI-620 (manufactured by Nippon Kayaku Co., Ltd.) ), UVI-6990 (Union Carbide), Adekaoptomer SP-150, SP-170 (ADEKA), CI-5102, CIT-1370, 1682, CIP-1866S, 2048S, 2064S (Nippon Soda) Co., Ltd.), DPI-101, 102, 103, 105, MPI-103, 105, BBI-101, 102, 103, 105, TPS-101, 102, 103, 105, MDS-103, 105, DTS-102 , 103 (manufactured by Midori Chemical Co., Ltd.), PI-2074 (manufactured by Rhodia Japan Co., Ltd.), and the like.
尚、活性エネルギー線照射後の樹脂組成物硬化性の低下、及び耐久性の低下を防止するとの観点から、光酸発生剤の含有量は、保護層を形成する樹脂組成物全体に対して、0.1質量%以上15質量%以下が好ましく、0.5質量%以上10質量%以下がより好ましく、1質量%以上8質量%以下が特に好ましい。 In addition, from the viewpoint of preventing a decrease in the resin composition curability after irradiation with active energy rays, and a decrease in durability, the content of the photoacid generator is based on the entire resin composition forming the protective layer. 0.1 mass% or more and 15 mass% or less are preferable, 0.5 mass% or more and 10 mass% or less are more preferable, and 1 mass% or more and 8 mass% or less are especially preferable.
光増感剤
本発明の保護層を形成する樹脂組成物は、光増感剤を含有することにより、カチオン重合の反応性が向上し、本実施形態の樹脂組成物の機械的強度および接着性を向上させることができる。
Photosensitizer The resin composition forming the protective layer of the present invention contains a photosensitizer, whereby the reactivity of cationic polymerization is improved, and the mechanical strength and adhesiveness of the resin composition of this embodiment are improved. Can be improved.
光増感剤としては、例えば、カルボニル化合物、有機硫黄化合物、過硫化物、レドックス系化合物、アゾおよびジアゾ化合物、ハロゲン化合物ならびに光還元性色素などが挙げられ、より具体的には、ベンゾインメチルエーテル、ベンゾインイソプロピルエーテル、α,α−ジメトキシ−α−フェニルアセトフェノンなどのベンゾイン誘導体;ベンゾフェノン、2,4−ジクロロベンゾフェノン、o−ベンゾイル安息香酸メチル、4,4’−ビス(ジメチルアミノ)ベンゾフェノン、4,4’−ビス(ジエチルアミノ)ベンゾフェノンなどのベンゾフェノン誘導体;2−クロロチオキサントン、2−イソプロピルチオキサントンなどのチオキサントン誘導体;2−クロロアントラキノン、2−メチルアントラキノンなどのアントラキノン誘導体;N−メチルアクリドン、N−ブチルアクリドンなどのアクリドン誘導体;および、α,α−ジエトキシアセトフェノン、ベンジル、フルオレノン、キサントン、ウラニル化合物、ハロゲン化合物等が挙げられる。 Examples of the photosensitizer include carbonyl compounds, organic sulfur compounds, persulfides, redox compounds, azo and diazo compounds, halogen compounds, and photoreductive dyes, and more specifically, benzoin methyl ether. Benzoin derivatives such as benzoin isopropyl ether, α, α-dimethoxy-α-phenylacetophenone; benzophenone, 2,4-dichlorobenzophenone, methyl o-benzoylbenzoate, 4,4′-bis (dimethylamino) benzophenone, 4, Benzophenone derivatives such as 4′-bis (diethylamino) benzophenone; thioxanthone derivatives such as 2-chlorothioxanthone and 2-isopropylthioxanthone; anthraquinone derivatives such as 2-chloroanthraquinone and 2-methylanthraquinone; Don, acridone derivatives, such as N- butyl acridone; and, alpha, alpha-diethoxyacetophenone, benzyl, fluorenone, xanthone, uranyl compounds, halogen compounds and the like.
なお、硬化性及び耐候性を向上させるとの観点から、光増感剤の含有量は、保護層を形成する樹脂組成物全体に対して、0質量%以上5質量%以下が好ましく、0質量%以上35質量%以下が特に好ましい。 From the viewpoint of improving curability and weather resistance, the content of the photosensitizer is preferably 0% by mass or more and 5% by mass or less, and 0% by mass with respect to the entire resin composition forming the protective layer. % To 35% by mass is particularly preferable.
エポキシ基以外の光重合性官能基を有する樹脂
本発明に係る保護層は、エポキシ基以外の光重合性官能基を有する樹脂を含有してもよい。即ち、本発明に係る保護層を形成する樹脂組成物は、さらにエポキシ基以外の光重合性官能基を有する樹脂モノマーを含有してもよい。このような樹脂モノマーを含有することにより、光反応性をより一層向上させるとともに、樹脂組成物の粘度を容易に希釈することが可能になる。
Resin having a photopolymerizable functional group other than an epoxy group The protective layer according to the present invention may contain a resin having a photopolymerizable functional group other than an epoxy group. That is, the resin composition forming the protective layer according to the present invention may further contain a resin monomer having a photopolymerizable functional group other than the epoxy group. By containing such a resin monomer, the photoreactivity can be further improved and the viscosity of the resin composition can be easily diluted.
エポキシ基以外の光重合性官能基を有する樹脂としては、例えば、カチオン重合性化合物であるオキセタン樹脂やビニルエーテル樹脂、ラジカル重合性化合物であるアクリル樹脂等が挙げられる。 Examples of the resin having a photopolymerizable functional group other than an epoxy group include oxetane resins and vinyl ether resins that are cationically polymerizable compounds, acrylic resins that are radically polymerizable compounds, and the like.
オキセタン樹脂としては、分子内に少なくとも1個のオキセタニル基を有するものであれば、特に限定されず、例えば、3−エチル−3−(2−エチルヘキシロキシメチル)オキセタン、3−エチル−3−フェノキシメチルオキセタン、3−エチル−3−ヒドロキシメチルオキセタン、3−エチル−3−〔(3−エチルオキセタン−3−イル)メトキシメチル〕オキセタン、1,4−ビス〔(3−エチルオキセタン−3−イル)メトキシメチル〕ベンゼン、1,4−ビス〔(3−エチルオキセタン−3−イル)メトキシ〕ベンゼン、1,3−ビス〔(3−エチルオキセタン−3−イル)メトキシ〕ベンゼン、1,2−ビス〔(3−エチルオキセタン−3−イル)メトキシ〕ベンゼン、4,4’−ビス〔(3−エチルオキセタン−3−イル)メトキシ〕ビフェニル、2,2’−ビス〔(3−エチルオキセタン−3−イル)メトキシ〕ビフェニル、3,3’,5,5’−テトラメチル−4,4’−ビス〔(3−エチルオキセタン−3−イル)メトキシ〕ビフェニル、2,7−ビス〔(3−エチルオキセタン−3−イル)メトキシ〕ナフタレン、ビス〔4−{(3−エチルオキセタン−3−イル)メトキシ}フェニル〕メタン、ビス〔2−{(3−エチルオキセタン−3−イル)メトキシ}フェニル〕メタン、2,2−ビス〔4−{(3−エチルオキセタン−3−イル)メトキシ}フェニル〕プロパン、ノボラック型フェノール−ホルムアルデヒド樹脂の3−クロロメチル−3−エチルオキセタンによるエーテル化変性物、3(4),8(9)−ビス〔(3−エチルオキセタン−3−イル)メトキシメチル〕−トリシクロ[5.2.1.02,6]デカン、2,3−ビス〔(3−エチルオキセタン−3−イル)メトキシメチル〕ノルボルナン、1,1,1−トリス〔(3−エチルオキセタン−3−イル)メトキシメチル〕プロパン、1−ブトキシ−2,2−ビス〔(3−エチルオキセタン−3−イル)メトキシメチル〕ブタン、1,2−ビス〔{2−(3−エチルオキセタン−3−イル)メトキシ}エチルチオ〕エタン、ビス〔{4−(3−エチルオキセタン−3−イル)メチルチオ}フェニル〕スルフィド、1,6−ビス〔(3−エチルオキセタン−3−イル)メトキシ〕−2,2,3,3,4,4,5,5−オクタフルオロヘキサン、3−〔(3−エチルオキセタン−3−イル)メトキシ〕プロピルトリエトキシシランの加水分解縮合物、テトラキス〔(3−エチルオキセタン−3−イル)メチル〕シリケートの縮合物等などを骨格内に有する樹脂が挙げられる。 The oxetane resin is not particularly limited as long as it has at least one oxetanyl group in the molecule. For example, 3-ethyl-3- (2-ethylhexyloxymethyl) oxetane, 3-ethyl-3- Phenoxymethyloxetane, 3-ethyl-3-hydroxymethyloxetane, 3-ethyl-3-[(3-ethyloxetane-3-yl) methoxymethyl] oxetane, 1,4-bis [(3-ethyloxetane-3- Yl) methoxymethyl] benzene, 1,4-bis [(3-ethyloxetane-3-yl) methoxy] benzene, 1,3-bis [(3-ethyloxetane-3-yl) methoxy] benzene, 1,2 -Bis [(3-ethyloxetane-3-yl) methoxy] benzene, 4,4′-bis [(3-ethyloxetane-3-yl) methoxy] biphenyl, 2,2′-bis [(3-ethyloxeta -3-yl) methoxy] biphenyl, 3,3 ′, 5,5′-tetramethyl-4,4′-bis [(3-ethyloxetane-3-yl) methoxy] biphenyl, 2,7-bis [( 3-ethyloxetane-3-yl) methoxy] naphthalene, bis [4-{(3-ethyloxetane-3-yl) methoxy} phenyl] methane, bis [2-{(3-ethyloxetane-3-yl) methoxy } Phenyl] methane, 2,2-bis [4-{(3-ethyloxetane-3-yl) methoxy} phenyl] propane, and etherification modification of novolac phenol-formaldehyde resin with 3-chloromethyl-3-ethyloxetane 3 (4), 8 (9) -bis [(3-ethyloxetane-3-yl) methoxymethyl] -tricyclo [5.2.1.0 2,6 ] decane, 2,3-bis [(3-ethyloxetane -3-yl) methoxymethyl] norvo Lunan, 1,1,1-tris [(3-ethyloxetane-3-yl) methoxymethyl] propane, 1-butoxy-2,2-bis [(3-ethyloxetane-3-yl) methoxymethyl] butane, 1,2-bis [{2- (3-ethyloxetane-3-yl) methoxy} ethylthio] ethane, bis [{4- (3-ethyloxetane-3-yl) methylthio} phenyl] sulfide, 1,6- Bis [(3-ethyloxetane-3-yl) methoxy] -2,2,3,3,4,4,5,5-octafluorohexane, 3-[(3-ethyloxetane-3-yl) methoxy] Examples thereof include a resin having a hydrolyzed condensate of propyltriethoxysilane, a condensate of tetrakis [(3-ethyloxetane-3-yl) methyl] silicate, and the like in the skeleton.
アクリル樹脂としては、ラジカル重合性を示すものであれば従来公知のものを特に制限なく使用できる。典型的には、(メタ)アクリロイル基、(メタ)アクリルアミド基等を骨格内に有する樹脂を挙げることができ、(メタ)アクリル酸およびその誘導体、(メタ)アクリロニトリル、(メタ)アクリルアミドおよびその誘導体などを骨格内に有する樹脂が挙げられる。これらの樹脂は、単独でも、二種以上を用いてもよい。 As the acrylic resin, conventionally known acrylic resins can be used without particular limitation as long as they exhibit radical polymerizability. Typical examples include resins having (meth) acryloyl group, (meth) acrylamide group, etc. in the skeleton, (meth) acrylic acid and derivatives thereof, (meth) acrylonitrile, (meth) acrylamide and derivatives thereof. Etc. in the skeleton. These resins may be used alone or in combination of two or more.
より具体的には、アクリル樹脂としては(メタ)アクリル酸およびその塩が例示される。すなわち、メチル(メタ)アクリレート、エチル(メタ)アクリレート、メチルフェノキシエチル(メタ)アクリレート、n−プロピル(メタ)アクリレート、n−ブチル(メタ)アクリレート、イソブチル(メタ)アクリレート、tert−ブチル(メタ)アクリレート、ペンチル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、2−エチルヘキシル(メタ)アクリレート、ラウリル(メタ)アクリレート、(メタ)アクリレート、2−メトキシエチル(メタ)アクリレート、(メタ)アクリレート、2−ヒドロキシエチル(メタ)アクリレート、2−ヒドロキシプロピル(メタ)アクリレート、2−ヒドロキシブチル(メタ)アクリレート、4−ヒドロキシブチル(メタ)アクリレート、グリセロールモノ(メタ)アクリレート、3−クロロ−2−ヒドロキシプロピル(メタ)アクリレート、2−ヒドロキシ−3−フェノキシプロピル(メタ)アクリレート、エチレングリコールジ(メタ)アクリレート、フェノキシエチレングリコールジ(メタ)アクリレート、ジエチレングリコールジ(メタ)アクリレート、フェノキシジエチレングリコール(メタ)アクリレート、トリエチレングリコールジ(メタ)アクリレート、フェノキシトリエチレングリコールジ(メタ)アクリレート、ブチレングリコールジ(メタ)アクリレート、ノナエチレングリコールジ(メタ)アクリレート、ポリプロピレングリコールジ(メタ)アクリレート、ジプロピレングリコールジ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、1,3−ブタンジオールジ(メタ)アクリレート、1,4−ブタンジオールジ(メタ)アクリレート、1,6−ヘキサンジオールジ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、トリメチロールメタントリ(メタ)アクリレート、イソボルニル(メタ)アクリレート、N−ビニルピロリドン、アクリロイルモルフォリン、ウレタン(メタ)アクリレート、テトラヒドロフルフリル(メタ)アクリレート、テトラヒドロフルフリルアルコールのモノε−カプロラクトン付加物の(メタ)アクリレート、テトラヒドロフルフリルアルコールのジε−カプロラクトン付加物の(メタ)アクリレート、テトラヒドロフルフリルアルコールのモノβ−メチル−δ−バレロラクトン付加物の(メタ)アクリレート、テトラヒドロフルフリルアルコールのジβ−メチル−δ−バレロラクトン付加物の(メタ)アクリレート、ω−カルボキシ−ポリカプロラクトンモノアクリレート等の(メタ)アクリル酸エステル系化合物;アクリロニトリル、メタクリロニトリル等のニトリル基含有ビニル化合物;および(メタ)アクリルアミド、N−メチル(メタ)アクリルアミド、N−エチル(メタ)アクリルアミド、N−プロピル(メタ)アクリルアミド、N−イソプロピル(メタ)アクリルアミド、N−ブチル(メタ)アクリルアミド、N,N−ジメチル(メタ)アクリルアミド、N,N−ジエチル(メタ)アクリルアミド、N,N−ジメチルアミノプロピル(メタ)アクリルアミド、N−(ヒドロキシエチル)アクリルアミド、N−イソプロピル(メタ)アクリルアミド、N−メチロール(メタ)アクリルアミド、ダイアセトン(メタ)アクリルアミド、N,N−メチレンビス(メタ)アクリルアミド等のアミド基含有ビニル化合物などを骨格内に有する樹脂が挙げられる。 More specifically, examples of the acrylic resin include (meth) acrylic acid and salts thereof. That is, methyl (meth) acrylate, ethyl (meth) acrylate, methylphenoxyethyl (meth) acrylate, n-propyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, tert-butyl (meth) Acrylate, pentyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, lauryl (meth) acrylate, (meth) acrylate, 2-methoxyethyl (meth) acrylate, (meth) acrylate, 2-hydroxy Ethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, glycerol mono (meth) acrylate, 3 -Chloro-2-hydroxypropyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, ethylene glycol di (meth) acrylate, phenoxyethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, phenoxy Diethylene glycol (meth) acrylate, triethylene glycol di (meth) acrylate, phenoxytriethylene glycol di (meth) acrylate, butylene glycol di (meth) acrylate, nonaethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, Dipropylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, 1,3-butanediol di (meth) acrylate 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, neopentyl glycol di (meth) acrylate, pentaerythritol tri (meth) Addition of mono-ε-caprolactone to acrylate, trimethylolmethane tri (meth) acrylate, isobornyl (meth) acrylate, N-vinylpyrrolidone, acryloylmorpholine, urethane (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, tetrahydrofurfuryl alcohol (Meth) acrylate, tetrahydrofurfuryl alcohol di-ε-caprolactone adduct (meth) acrylate, tetrahydrofurfuryl alcohol mono β-methyl-δ-valerolacto (Meth) acrylate compounds such as (meth) acrylate of adducts, (meth) acrylates of diβ-methyl-δ-valerolactone adducts of tetrahydrofurfuryl alcohol, ω-carboxy-polycaprolactone monoacrylate, etc .; Nitrile group-containing vinyl compounds such as acrylonitrile and methacrylonitrile; and (meth) acrylamide, N-methyl (meth) acrylamide, N-ethyl (meth) acrylamide, N-propyl (meth) acrylamide, N-isopropyl (meth) acrylamide N-butyl (meth) acrylamide, N, N-dimethyl (meth) acrylamide, N, N-diethyl (meth) acrylamide, N, N-dimethylaminopropyl (meth) acrylamide, N- (hydroxyethyl) acrylamide, N -Resins having amide group-containing vinyl compounds such as isopropyl (meth) acrylamide, N-methylol (meth) acrylamide, diacetone (meth) acrylamide, N, N-methylenebis (meth) acrylamide in the skeleton.
このうち、保護層を形成する樹脂組成物として初期硬化性に優れることおよび偏光子との接着性を向上させるとの観点から、ヒドロキシ基含有アクリル系モノマーおよびフェノキシ基含有アクリル系モノマーの少なくとも一方がより好ましく、特に、2−ヒドロキシエチル(メタ)アクリレート、4−ヒドロキシブチル(メタ)アクリレート、メチルフェノキシエチル(メタ)アクリレートおよびフェノキシジエチレングリコール(メタ)アクリレート、2−ヒドロキシ−3−フェノキシプロピルアクリレートがさらに好ましい。 Among these, from the viewpoint of excellent initial curability as a resin composition for forming a protective layer and improving adhesiveness with a polarizer, at least one of a hydroxy group-containing acrylic monomer and a phenoxy group-containing acrylic monomer is More preferably, 2-hydroxyethyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, methylphenoxyethyl (meth) acrylate and phenoxydiethylene glycol (meth) acrylate, and 2-hydroxy-3-phenoxypropyl acrylate are more preferable. .
ビニルエーテル樹脂としては、ジエチレングリコールジビニルエーテル、トリエチレングリコールジビニルエーテル、シクロヘキシルビニルエーテル、ポリエチレングリコールジビニルエーテル、1,4−シクロヘキサンジメタノールジビニルエーテル等を骨格内に有する樹脂が挙げられる。このうち、特に、入手しやすさや取扱い性の点からトリエチレングリコールジビニルエーテルおよびシクロヘキシルビニルエーテルが好ましい。 Examples of the vinyl ether resin include resins having diethylene glycol divinyl ether, triethylene glycol divinyl ether, cyclohexyl vinyl ether, polyethylene glycol divinyl ether, 1,4-cyclohexanedimethanol divinyl ether in the skeleton. Of these, triethylene glycol divinyl ether and cyclohexyl vinyl ether are particularly preferable from the viewpoint of availability and handling.
なお、硬化性及び耐候性を向上させるとの観点から、エポキシ基以外の光重合性官能基を有する樹脂モノマーの含有量は、保護層を形成する樹脂組成物全体に対して、0質量%以上50質量%以下が好ましく、0質量%以上35質量%以下が特に好ましい。 In addition, from the viewpoint of improving curability and weather resistance, the content of the resin monomer having a photopolymerizable functional group other than an epoxy group is 0% by mass or more based on the entire resin composition forming the protective layer. 50 mass% or less is preferable and 0 mass% or more and 35 mass% or less are especially preferable.
保護層用の樹脂組成物の製造方法
本発明に係る保護層の樹脂組成物を製造する方法は、特に制限はなく、通常は、上述の芳香族エポキシ化合物、芳香族骨格を有しないエポキシ化合物、エポキシ基以外の光重合性官能基を有する樹脂モノマー、光酸発生剤、及び光増感剤とを混合することにより樹脂組成物が得られる。なお、粘度調整のために、適宜、有機溶媒を使用してもよい。また、混合方法にも特に制限はなく、室温(25℃)で、混合物が均一になるまで十分に攪拌混合すればよい。
Method for Producing Resin Composition for Protective Layer The method for producing the resin composition for the protective layer according to the present invention is not particularly limited. Usually, the above-described aromatic epoxy compound, epoxy compound having no aromatic skeleton, A resin composition is obtained by mixing a resin monomer having a photopolymerizable functional group other than an epoxy group, a photoacid generator, and a photosensitizer. In addition, you may use an organic solvent suitably for viscosity adjustment. The mixing method is not particularly limited, and may be sufficiently stirred and mixed at room temperature (25 ° C.) until the mixture becomes uniform.
偏光板の製造方法
図2を参照して、本発明に係る保護層を備えた偏光板の製造方法について説明する。図2に示すように、まず、PETフィルム203とPETフィルム205との間に偏光子201を挟み、得られた保護層用の樹脂組成物207を、PETフィルム203と偏光子201との間、及びPETフィルム205と偏光子201との間に、それぞれスポイトによって適量滴下し、ロールプレス209、201によって貼り合わせる。なお、PETフィルム203、205としては、市販品(例えば、東レ株式会社製、厚み:50μm)を使用することができる。
2. Manufacturing method of polarizing plate With reference to FIG. 2, the manufacturing method of the polarizing plate provided with the protective layer which concerns on this invention is demonstrated. As shown in FIG. 2, first, the polarizer 201 is sandwiched between the PET film 203 and the PET film 205, and the obtained resin composition 207 for the protective layer is placed between the PET film 203 and the polarizer 201. In addition, an appropriate amount is dropped with a dropper between the PET film 205 and the polarizer 201, and bonded by roll presses 209 and 201. In addition, as PET film 203,205, a commercial item (For example, Toray Industries, Inc. thickness: 50 micrometers) can be used.
次に、このようにして貼り合わせた紫外線照射前の偏光板に、300〜3000mJ/cm2、好ましくは、500〜2000mJ/cm2、さらに好ましくは、800〜1500mJ/cm2(356nm基準、メタルハライドランプ使用)の照射量の紫外線を両側から照射した後、PETフィルム203、205を剥離して、図1に示す保護層103、105付きの偏光板100を製造する。 Next, 300 to 3000 mJ / cm 2 , preferably 500 to 2000 mJ / cm 2 , more preferably 800 to 1500 mJ / cm 2 (356 nm standard, metal halide) is applied to the polarizing plate before ultraviolet irradiation thus bonded. 1 is used, and the PET films 203 and 205 are peeled off to produce the polarizing plate 100 with the protective layers 103 and 105 shown in FIG.
なお、図1においては、偏光子100の両面に保護層103、105を設け、保護層103、105により偏光子101を挟持する構成としたが、偏光子101の片面のみに保護層103又は105を設ける構成としてもよい。 In FIG. 1, the protective layers 103 and 105 are provided on both sides of the polarizer 100 and the polarizer 101 is sandwiched between the protective layers 103 and 105. However, the protective layer 103 or 105 is provided only on one side of the polarizer 101. It is good also as a structure which provides.
また、信頼性及び可撓性を向上させるとの観点から、樹脂組成物は、硬化後の保護層103の厚みが25μm以下となるように塗布することが好ましく、15μm以下となるように塗布することが更に好ましい。 Further, from the viewpoint of improving reliability and flexibility, the resin composition is preferably applied so that the thickness of the protective layer 103 after curing is 25 μm or less, and is applied so as to be 15 μm or less. More preferably.
本発明に係る保護層は、芳香族エポキシ化合物を樹脂組成物を硬化させることにより得られる芳香族エポキシ樹脂を含む。芳香族エポキシ化合物は剛直な骨格を有しており、該芳香族エポキシ化合物を硬化することにより得られる芳香族エポキシ樹脂も剛直なポリマーである。そのため、芳香族エポキシ樹脂を含む保護層は、高弾性率を実現することができ、偏光子の熱収縮を抑制することができる。また、本発明に係る保護層は、偏光子に対する接着性も良好であり、基材上に直接保護層を形成することができる。そのため、本発明に係る保護層は、画像表示装置に用いられる偏光板の偏光子を保護する保護膜として適用することができる。また、芳香族エポキシ化合物を主剤として含む場合、樹脂組成物を硬化させることにより得られる芳香族エポキシ樹脂を主成分として含む保護層は、耐久性が向上されるため好ましい。 The protective layer according to the present invention includes an aromatic epoxy resin obtained by curing an aromatic epoxy compound with a resin composition. The aromatic epoxy compound has a rigid skeleton, and the aromatic epoxy resin obtained by curing the aromatic epoxy compound is also a rigid polymer. Therefore, the protective layer containing an aromatic epoxy resin can achieve a high elastic modulus and can suppress thermal contraction of the polarizer. In addition, the protective layer according to the present invention has good adhesion to the polarizer, and the protective layer can be formed directly on the substrate. Therefore, the protective layer according to the present invention can be applied as a protective film for protecting the polarizer of the polarizing plate used in the image display device. Moreover, when an aromatic epoxy compound is included as a main ingredient, a protective layer containing an aromatic epoxy resin as a main component obtained by curing a resin composition is preferable because durability is improved.
本発明に係る偏光板は、偏光子の少なくとも一面上に本発明に係る保護層を備えることにより、偏光子の熱収縮を抑制することができる。その結果、熱衝撃による偏光子のクラックを抑制することができ、耐久性に優れた偏光板を実現することができる。また、本発明に係る保護層は、偏光子に対する接着性が良好であるため、偏光子の表面上に直接保護層を形成することができる。そのため、接着剤を用いる必要がない。したがって、本発明の偏光板は、薄型化及び軽量化を実現することができる。 The polarizing plate which concerns on this invention can suppress the thermal contraction of a polarizer by providing the protective layer which concerns on this invention on at least one surface of a polarizer. As a result, the polarizer can be prevented from cracking due to thermal shock, and a polarizing plate having excellent durability can be realized. In addition, since the protective layer according to the present invention has good adhesion to the polarizer, the protective layer can be formed directly on the surface of the polarizer. Therefore, it is not necessary to use an adhesive. Therefore, the polarizing plate of the present invention can be reduced in thickness and weight.
本発明の係る偏光板は、液晶表示装置などの画像表示装置に用いることができる。例えば、IPS方式の液晶表示装置には、偏光子の両面上に本発明に係る保護層を備えた偏光板を適用してもよい。また、VA方式の液晶表示装置には、偏光子の少なくとも一面上に本発明に係る保護層を備えた偏光板を適用してもよい。本発明の係る画像表示装置は、耐久性が向上された偏光板を備えているため、長寿命化を実現することができる。 The polarizing plate according to the present invention can be used in an image display device such as a liquid crystal display device. For example, a polarizing plate provided with the protective layer according to the present invention on both surfaces of a polarizer may be applied to an IPS liquid crystal display device. Further, a polarizing plate provided with the protective layer according to the present invention may be applied to at least one surface of a polarizer in a VA liquid crystal display device. Since the image display device according to the present invention includes a polarizing plate with improved durability, it is possible to achieve a long life.
以下、本発明に係る偏光板について実施例1〜6及び比較例1〜3に基づいてを説明する。 Hereinafter, the polarizing plates according to the present invention will be described based on Examples 1 to 6 and Comparative Examples 1 to 3.
<実施例1>
樹脂組成物の作製
芳香族エポキシ化合物としてEPICLON HP-4032D(DIC株式会社製)を80質量部、芳香族環を含まないエポキシ化合物としてCel3000(株式会社ダイセル製)を20質量部、光酸発生剤(光カチオン重合開始剤)としてCPI100-P(サンアプロ株式会社製)を4質量部、及び光増感剤としてDETX-S(日本化薬株式会社製)を0.5質量部混合して、樹脂組成物を調製した。
<Example 1>
Preparation of resin composition 80 parts by mass of EPICLON HP-4032D (manufactured by DIC Corporation) as an aromatic epoxy compound, 20 parts by mass of Cel3000 (manufactured by Daicel Corporation) as an epoxy compound not containing an aromatic ring, photoacid generator 4 parts by mass of CPI100-P (manufactured by San Apro Co., Ltd.) as a (photocation polymerization initiator) and 0.5 parts by mass of DETX-S (manufactured by Nippon Kayaku Co., Ltd.) as a photosensitizer are mixed to obtain a resin composition Was prepared.
偏光子の作製
偏光子は、以下の方法で作製した。平均重合度2400、けん化度99.9%、厚み75μmのポリビニルアルコールフィルムを、28℃の温水中に90秒間浸漬し膨潤させ、次いで、ヨウ素/ヨウ化カリウム(重量比2/3)の濃度0.6重量%の水溶液に浸漬し、2.1倍に延伸させながらポリビニルアルコールフィルムを染色した。その後、60℃のホウ酸エステル水溶液中で合計の延伸倍率が5.8倍となるように延伸を行い、水洗した後、45℃で3分間乾燥させて、偏光子(厚み25μm)を作製した。
Production of Polarizer A polarizer was produced by the following method. A polyvinyl alcohol film with an average polymerization degree of 2400, a saponification degree of 99.9% and a thickness of 75 μm is immersed in warm water at 28 ° C. for 90 seconds to swell, then iodine / potassium iodide (weight ratio 2/3) concentration 0.6% by weight The polyvinyl alcohol film was dyed while being dipped in an aqueous solution and stretched 2.1 times. Thereafter, the film was stretched in a boric acid ester aqueous solution at 60 ° C. so that the total stretching ratio was 5.8 times, washed with water, and then dried at 45 ° C. for 3 minutes to prepare a polarizer (thickness 25 μm).
偏光板の作製
次に、室温(25℃)及び湿度50%RHの恒温室内で、上述にように作製した偏光子、及び調製した樹脂組成物を使用して、上述した偏光板の製造方法によって、偏光板を作製した。なお、紫外線照射条件は、両側から各1000mJ/cm2(365nm基準、メタルハライドランプ使用)とし、紫外線照射後、偏光板は上記恒温室内で24時間保管し、樹脂組成物を熟成硬化させることにより、偏光板を完成させた。保護層の一面の厚みは10〜15μmであった。尚、保護層は偏光子の両面に形成させた。
Production of Polarizing Plate Next, using the polarizer produced as described above and the prepared resin composition in a constant temperature room at room temperature (25 ° C.) and a humidity of 50% RH, and by the method for producing a polarizing plate described above. A polarizing plate was prepared. In addition, ultraviolet irradiation conditions are 1000 mJ / cm 2 (365 nm standard, using a metal halide lamp) from both sides, and after ultraviolet irradiation, the polarizing plate is stored in the temperature-controlled room for 24 hours, and the resin composition is aged and cured, A polarizing plate was completed. The thickness of one surface of the protective layer was 10 to 15 μm. The protective layer was formed on both sides of the polarizer.
<実施例2>
芳香族エポキシ化合物としてEPICLON HP-4032D(DIC株式会社製)を70質量部、芳香族環を含まないエポキシ化合物としてEX214L(ナガセケムテックス株式会社製)を30質量部、光酸発生剤としてCPI100-P(サンアプロ株式会社製)を4質量部、及び光増感剤としてDETX-S(日本化薬株式会社製)を0.5質量部混合して、樹脂組成物を調製した。その後、作製した樹脂組成物を用いて上述の実施例1と同様に偏光板を作製した。
<Example 2>
70 parts by mass of EPICLON HP-4032D (manufactured by DIC Corporation) as an aromatic epoxy compound, 30 parts by mass of EX214L (manufactured by Nagase ChemteX Corporation) as an epoxy compound not containing an aromatic ring, and CPI100- as a photoacid generator 4 parts by mass of P (manufactured by San Apro Co., Ltd.) and 0.5 parts by mass of DETX-S (manufactured by Nippon Kayaku Co., Ltd.) as a photosensitizer were mixed to prepare a resin composition. Then, the polarizing plate was produced similarly to the above-mentioned Example 1 using the produced resin composition.
<実施例3>
芳香族エポキシ化合物としてEPICLON HP-4032D(DIC株式会社製)を70質量部、芳香族環を含まないエポキシ化合物としてCel3000(株式会社ダイセル製)を15質量部、その他の樹脂モノマーとしてOXT-221(東亞合成株式会社製)を15質量部、光酸発生剤としてCPI100-P(サンアプロ株式会社製)を4質量部、及び光増感剤としてDETX-S(日本化薬株式会社製)を0.5質量部混合して、樹脂組成物を調製した。その後、作製した樹脂組成物を用いて上述の実施例1と同様に偏光板を作製した。
<Example 3>
70 parts by mass of EPICLON HP-4032D (manufactured by DIC Corporation) as an aromatic epoxy compound, 15 parts by mass of Cel3000 (manufactured by Daicel Corporation) as an epoxy compound not containing an aromatic ring, and OXT-221 (as another resin monomer) 15 parts by mass of Toagosei Co., Ltd., 4 parts by mass of CPI100-P (manufactured by San Apro Co., Ltd.) as a photoacid generator, and 0.5 mass of DETX-S (manufactured by Nippon Kayaku Co., Ltd.) as a photosensitizer Partial mixing was performed to prepare a resin composition. Then, the polarizing plate was produced similarly to the above-mentioned Example 1 using the produced resin composition.
<実施例4>
芳香族エポキシ化合物としてEPICLON HP-4032D(DIC株式会社製)を70質量部、芳香族環を含まないエポキシ化合物としてCel3000(株式会社ダイセル製)を10質量部、その他の樹脂モノマーとしてOXT-121(東亞合成株式会社製)を20質量部、光酸発生剤としてCPI100-P(サンアプロ株式会社製)を4質量部、及び光増感剤としてDETX-S(日本化薬株式会社製)を0.5質量部混合して、樹脂組成物を調製した。その後、作製した樹脂組成物を用いて上述の実施例1と同様に偏光板を作製した。
<Example 4>
70 parts by mass of EPICLON HP-4032D (manufactured by DIC Corporation) as an aromatic epoxy compound, 10 parts by mass of Cel3000 (manufactured by Daicel Corporation) as an epoxy compound not containing an aromatic ring, and OXT-121 (as an other resin monomer) 20 parts by mass of Toagosei Co., Ltd., 4 parts by mass of CPI100-P (manufactured by San Apro Co., Ltd.) as a photoacid generator, and 0.5 mass of DETX-S (manufactured by Nippon Kayaku Co., Ltd.) as a photosensitizer Partial mixing was performed to prepare a resin composition. Then, the polarizing plate was produced similarly to the above-mentioned Example 1 using the produced resin composition.
<実施例5>
芳香族エポキシ化合物としてEPICLON HP-4032D(DIC株式会社製)を60質量部、芳香族環を含まないエポキシ化合物としてCel3000(株式会社ダイセル製)を20質量部、その他の樹脂モノマーとしてOXT-121(東亞合成株式会社製)を20質量部、光酸発生剤としてCPI100-P(サンアプロ株式会社製)を4質量部、及び光増感剤としてDETX-S(日本化薬株式会社製)を0.5質量部混合して、樹脂組成物を調製した。その後、作製した樹脂組成物を用いて上述の実施例1と同様に偏光板を作製した。
<Example 5>
60 parts by mass of EPICLON HP-4032D (manufactured by DIC Corporation) as an aromatic epoxy compound, 20 parts by mass of Cel3000 (manufactured by Daicel Corporation) as an epoxy compound not containing an aromatic ring, and OXT-121 (as another resin monomer) 20 parts by mass of Toagosei Co., Ltd., 4 parts by mass of CPI100-P (manufactured by San Apro Co., Ltd.) as a photoacid generator, and 0.5 mass of DETX-S (manufactured by Nippon Kayaku Co., Ltd.) as a photosensitizer Partial mixing was performed to prepare a resin composition. Then, the polarizing plate was produced similarly to the above-mentioned Example 1 using the produced resin composition.
<実施例6>
芳香族エポキシ化合物としてEPICLON HP-4032D(DIC株式会社製)を50質量部、芳香族環を含まないエポキシ化合物としてEX214L(ナガセケムテックス株式会社製)を25質量部、その他の樹脂モノマーとしてOXT-121(東亞合成株式会社製)を25質量部、光酸発生剤としてCPI100-P(サンアプロ株式会社製)を4質量部、及び光増感剤としてDETX-S(日本化薬株式会社製)を0.5質量部混合して、樹脂組成物を調製した。その後、作製した樹脂組成物を用いて上述の実施例1と同様に偏光板を作製した。
<Example 6>
50 parts by mass of EPICLON HP-4032D (manufactured by DIC Corporation) as an aromatic epoxy compound, 25 parts by mass of EX214L (manufactured by Nagase ChemteX Corporation) as an epoxy compound not containing an aromatic ring, and OXT- as another resin monomer 25 parts by mass of 121 (manufactured by Toagosei Co., Ltd.), 4 parts by mass of CPI100-P (manufactured by San Apro Co., Ltd.) as a photoacid generator, and DETX-S (manufactured by Nippon Kayaku Co., Ltd.) as a photosensitizer A resin composition was prepared by mixing 0.5 parts by mass. Then, the polarizing plate was produced similarly to the above-mentioned Example 1 using the produced resin composition.
<比較例1>
芳香族エポキシ化合物としてEPICLON HP-4032D(DIC株式会社製)を20質量部、芳香族環を含まないエポキシ化合物としてCel3000(株式会社ダイセル製)を30質量部及びCel2021P(株式会社ダイセル製)を25質量部、その他の樹脂モノマーとしてOXT-221(東亞合成株式会社製)を20質量部、光酸発生剤としてCPI100-P(サンアプロ株式会社製)を4質量部、及び光増感剤としてDETX-S(日本化薬株式会社製)を0.5質量部混合して、樹脂組成物を調製した。その後、作製した樹脂組成物を用いて上述の実施例1と同様に偏光板を作製した。
<Comparative Example 1>
20 parts by mass of EPICLON HP-4032D (manufactured by DIC Corporation) as an aromatic epoxy compound, 30 parts by mass of Cel3000 (manufactured by Daicel Corporation) and 25 parts of Cel2021P (manufactured by Daicel Corporation) as an epoxy compound not containing an aromatic ring 20 parts by mass of OXT-221 (manufactured by Toagosei Co., Ltd.), 4 parts by mass of CPI100-P (manufactured by SANAPRO) as a photoacid generator, and DETX- as a photosensitizer 0.5 parts by mass of S (manufactured by Nippon Kayaku Co., Ltd.) was mixed to prepare a resin composition. Then, the polarizing plate was produced similarly to the above-mentioned Example 1 using the produced resin composition.
<比較例2>
芳香族環を含まないエポキシ化合物としてCel2021P(株式会社ダイセル製)を35質量部、その他の樹脂モノマーとしてOXT-221(東亞合成株式会社製)を15質量部及びOXT-121(東亞合成株式会社製)を50質量部、光重合開始剤としてCPI100-P(サンアプロ株式会社製)を2.5質量部及びIrg184(BASF社製)2.5質量部混合して、樹脂組成物を調製した。その後、作製した樹脂組成物を用いて上述の実施例1と同様に偏光板を作製した。
<Comparative Example 2>
35 parts by mass of Cel2021P (manufactured by Daicel Corporation) as an epoxy compound not containing an aromatic ring, 15 parts by mass of OXT-221 (manufactured by Toagosei Co., Ltd.) and OXT-121 (manufactured by Toagosei Co., Ltd.) as other resin monomers 50 parts by mass, 2.5 parts by mass of CPI100-P (manufactured by San Apro Co., Ltd.) and 2.5 parts by mass of Irg184 (manufactured by BASF) as a photopolymerization initiator were mixed to prepare a resin composition. Then, the polarizing plate was produced similarly to the above-mentioned Example 1 using the produced resin composition.
<比較例3>
芳香族環を含まないエポキシ化合物としてCel2021P(株式会社ダイセル製)を75質量部、その他の樹脂モノマーとしてOXT-221(東亞合成株式会社製)を25質量部、光重合開始剤としてCPI100-P(サンアプロ株式会社製)を4質量部及びIrg184(BASF社製)1質量部混合して、樹脂組成物を調製した。その後、作製した樹脂組成物を用いて上述の実施例1と同様に偏光板を作製した。
<Comparative Example 3>
75 parts by mass of Cel2021P (manufactured by Daicel Corporation) as an epoxy compound not containing an aromatic ring, 25 parts by mass of OXT-221 (manufactured by Toagosei Co., Ltd.) as the other resin monomer, and CPI100-P (as a photopolymerization initiator) 4 parts by mass of San Apro Co., Ltd. and 1 part by mass of Irg184 (manufactured by BASF) were mixed to prepare a resin composition. Then, the polarizing plate was produced similarly to the above-mentioned Example 1 using the produced resin composition.
以下の表1に実施例1〜6及び比較例1〜3において作製した樹脂組成物の各材料の配合比(重量比)をまとめる。
(密着性試験)
実施例1〜6及び比較例1〜3で作製した偏光板一方の保護層側に感圧接着剤を介してガラスを貼合し、ガラス面と反対側の偏光板の保護層表面にカッターナイフで1mm角の碁盤目を100個刻み、そこにセロハンテープを貼ってから引き剥がす試験を行い、碁盤目のうち保護層が偏光子から剥がれずに残った碁盤目の数で密着性を評価した。残った碁盤目の数が100/100の場合を○、80〜99/100の場合を△、80未満/100の場合を×と評価した。
(Adhesion test)
Glass was bonded to one protective layer side of the polarizing plate prepared in Examples 1 to 6 and Comparative Examples 1 to 3 via a pressure sensitive adhesive, and a cutter knife was applied to the protective layer surface of the polarizing plate on the side opposite to the glass surface. The test was performed by cutting 100 1mm square grids and applying cellophane tape to them, and then peeling them off, and the adhesion was evaluated by the number of grids where the protective layer remained without peeling off the polarizer. . The case where the number of remaining grids was 100/100 was evaluated as ◯, the case of 80 to 99/100 was evaluated as Δ, and the case of less than 80/100 was evaluated as ×.
(温水浸漬試験)
実施例1〜6及び比較例1〜3で作製した偏光板を、トムソン刃で50mm×50mmの大きさに裁断し、60℃の水槽に浸漬し、2時間保持した。その後、水槽から各サンプルを取り出し、偏光子の収縮の大きさを測定した。評価基準としては、収縮の大きさが1.0mm未満を合格とした。評価結果を以下の表2に示す。好ましい結果は、0.5mm以下であり、より好ましくは0.3mm以下であり、特に好ましくは0mmである。
(Hot water immersion test)
The polarizing plates prepared in Examples 1 to 6 and Comparative Examples 1 to 3 were cut into a size of 50 mm × 50 mm with a Thomson blade, immersed in a water bath at 60 ° C., and held for 2 hours. Then, each sample was taken out from the water tank and the magnitude | size of the shrinkage | contraction of a polarizer was measured. As an evaluation standard, a size of shrinkage of less than 1.0 mm was accepted. The evaluation results are shown in Table 2 below. A preferable result is 0.5 mm or less, more preferably 0.3 mm or less, and particularly preferably 0 mm.
(耐熱性試験)
実施例1〜6及び比較例1〜3で作製した偏光板を、トムソン刃で50mm×50mmの大きさに裁断し、感圧接着剤を介してガラスに貼合した。作製したガラス付き偏光板を85℃の環境下に500時間放置した後、偏光子の割れを確認した。偏光子の割れがない場合は○、割れがある場合は×と評価した。
(Heat resistance test)
The polarizing plates prepared in Examples 1 to 6 and Comparative Examples 1 to 3 were cut into a size of 50 mm × 50 mm with a Thomson blade and bonded to glass via a pressure sensitive adhesive. The produced polarizing plate with glass was left in an environment of 85 ° C. for 500 hours, and then cracking of the polarizer was confirmed. When there was no crack of the polarizer, it was evaluated as ◯, and when there was a crack, it was evaluated as x.
(冷熱衝撃試験)
実施例1〜6及び比較例1〜3で作製した偏光板を、トムソン刃で50mm×50mmの大きさに裁断し、感圧接着剤を介してガラスに貼合した。作製したガラス付き偏光板を-40℃〜85℃、200サイクルの環境下に放置した後、偏光子の割れを確認した。偏光子の割れがない場合は○、割れがある場合は×と評価した。
(Thermal shock test)
The polarizing plates prepared in Examples 1 to 6 and Comparative Examples 1 to 3 were cut into a size of 50 mm × 50 mm with a Thomson blade and bonded to glass via a pressure sensitive adhesive. The produced polarizing plate with glass was left in an environment of −40 ° C. to 85 ° C. for 200 cycles, and then cracking of the polarizer was confirmed. When there was no crack of the polarizer, it was evaluated as ◯, and when there was a crack, it was evaluated as x.
密着性試験、温水浸漬試験、耐熱性試験、冷熱衝撃試験の評価及び結果を以下の表2に示す。
密着性試験の評価を参照すると、実施例1〜6のいずれの偏光板においても、本発明に係る保護層と偏光子との密着性は良好であった。特に、樹脂組成物における芳香族エポキシ化合物の含有量が60質量部以上である実施例1〜5の保護層と偏光子との密着性は良好であった。 With reference to the evaluation of the adhesion test, in any polarizing plate of Examples 1 to 6, the adhesion between the protective layer and the polarizer according to the present invention was good. In particular, the adhesiveness between the protective layer and the polarizer of Examples 1 to 5 in which the content of the aromatic epoxy compound in the resin composition was 60 parts by mass or more was good.
温水浸漬試験の結果を参照すると、比較例1〜3の偏光板では、偏光子の収縮が0.5mmを上回ったのに対し、実施例1〜6の偏光板では、偏光子の収縮がいずれも0.5mm以下となった。したがって、本発明に係る偏光板では、偏光子の収縮が比較例に比べて抑制され、耐久性が向上されたことが分かる。 Referring to the results of the hot water immersion test, in the polarizing plates of Comparative Examples 1 to 3, the polarizer shrinkage exceeded 0.5 mm, whereas in the polarizing plates of Examples 1 to 6, the polarizer shrinkage was all It became 0.5mm or less. Therefore, in the polarizing plate which concerns on this invention, it turns out that shrinkage | contraction of a polarizer was suppressed compared with the comparative example, and durability was improved.
耐熱試験の結果を参照すると、比較例1〜3の偏光板では、偏光子の割れが確認されたのに対し、実施例1〜6の偏光板では、偏光子の割れは確認されなかった。したがって、本発明に係る偏光板では、熱による偏光子の収縮を抑制でき、耐久性が向上されたことが分かる。 Referring to the results of the heat resistance test, the polarizers of Comparative Examples 1 to 3 were confirmed to have cracks in the polarizer, whereas the polarizers of Examples 1 to 6 were not confirmed to have cracks in the polarizer. Therefore, it can be seen that in the polarizing plate according to the present invention, the shrinkage of the polarizer due to heat can be suppressed, and the durability is improved.
冷熱衝撃試験の結果を参照すると、比較例1〜3の偏光板では、偏光子の割れが確認されたのに対し、実施例1〜6の偏光板では、偏光子の割れは確認されなかった。したがって、本発明に係る偏光板では、低温下及び高温下において偏光子の収縮を抑制でき、耐久性が向上されたことが分かる。 Referring to the results of the thermal shock test, in the polarizing plates of Comparative Examples 1 to 3, cracking of the polarizer was confirmed, whereas in the polarizing plates of Examples 1 to 6, cracking of the polarizer was not confirmed. . Therefore, it can be seen that the polarizing plate according to the present invention can suppress the shrinkage of the polarizer at low temperature and high temperature, and the durability is improved.
以上の実施例1〜6及び比較例1〜3の偏光板の各試験の評価及び結果から分かるように、本発明に係る保護層を備える偏光板は、接着性に優れ、且つ耐久性に優れている。よって、本発明に係る偏光板は、液晶表示装置などの画像表示装置に好適に使用することができる。 As can be seen from the evaluation and results of the tests of the polarizing plates of Examples 1 to 6 and Comparative Examples 1 to 3, the polarizing plate provided with the protective layer according to the present invention is excellent in adhesiveness and durability. ing. Therefore, the polarizing plate according to the present invention can be suitably used for an image display device such as a liquid crystal display device.
100:偏光板
101:偏光子
103:保護層
105:保護層
201:偏光子
203:PETフィルム
205:PETフィルム
207:樹脂組成物
209:ロールプレス
2011:ロールプレス
100: Polarizing plate 101: Polarizer 103: Protective layer 105: Protective layer 201: Polarizer 203: PET film 205: PET film 207: Resin composition 209: Roll press 2011: Roll press
Claims (7)
前記偏光子の少なくとも一方の面上に配置されて、芳香族エポキシ化合物を含有する樹脂組成物の硬化物により形成された保護層と、
を含む偏光板。 A polarizer,
A protective layer disposed on at least one surface of the polarizer and formed by a cured product of a resin composition containing an aromatic epoxy compound;
A polarizing plate comprising
前記芳香族エポキシ化合物は、前記樹脂組成物全体に対して40質量%以上90質量%以下含有されることを特徴とする請求項1又は2に記載の偏光板。
The resin composition contains the aromatic epoxy compound as a main component,
The polarizing plate according to claim 1 or 2, wherein the aromatic epoxy compound is contained in an amount of 40% by mass to 90% by mass with respect to the entire resin composition.
An image display apparatus provided with the polarizing plate as described in any one of Claims 1 thru | or 6.
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