JP2016071018A - Manufacturing method of liquid crystal device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a manufacturing method of a liquid crystal device 100 that can reduce deterioration of a liquid crystal material to extend the life of the liquid crystal device.SOLUTION: A manufacturing method of a liquid crystal device includes the steps of: arranging, on one side of a filter 50 having a first liquid crystal material 54a, a liquid crystal panel 100a having a pair of substrates bonded with a photocurable sealing material 14 while sandwiching a second liquid crystal material 15a therebetween; and irradiating the sealing material 14 in the liquid crystal panel 100a with light including an ultraviolet ray L1 from the other side of the filter 50 to cure the sealing material 14 through the filter 50.SELECTED DRAWING: Figure 5

Description

  The present invention relates to a method for manufacturing a liquid crystal device.

  As the liquid crystal device, for example, an active drive type liquid crystal device including a transistor for each pixel as an element for switching control of a pixel electrode is known. Liquid crystal devices are used in, for example, direct-view display devices and light valves of projection display devices (projectors).

  In the manufacturing method of the liquid crystal device, for example, first, a sealing material is applied around the liquid crystal layer on the element substrate. After that, the liquid crystal is supplied into the area surrounded by the sealing material, and the element substrate and the counter substrate are bonded to each other. Then, the sealing material is cured by irradiating the sealing material with ultraviolet rays.

  At this time, when the liquid crystal device is irradiated with ultraviolet rays, if the liquid crystal material close to the sealing material is irradiated with light having a wavelength (for example, 360 nm or less) that easily damages the liquid crystal material, the liquid crystal material is deteriorated and displayed. There is a problem that the quality deteriorates.

  Therefore, for example, there is a method of suppressing transmission of a short wavelength side wavelength by using a material such as neoceram as a filter. For example, Patent Document 1 discloses a method of irradiating light through a filter having a low ultraviolet transmittance.

JP 2002-98975 A

  However, some seal curing initiators for curing the sealing material react in a wavelength region (around 360 nm) that easily damages the liquid crystal material, and it is difficult to damage the liquid crystal material, and to cure the sealing material. There is a problem that the wavelength band of the wavelength to be used is narrow. Further, when the ultraviolet transmittance is lowered as in Patent Document 1, there is a problem that depending on the wavelength band, the sealing material is difficult to be cured or it takes time to be cured.

  An aspect of the present invention has been made to solve at least a part of the above problems, and can be realized as the following forms or application examples.

  Application Example 1 A method for manufacturing a liquid crystal device according to this application example includes a pair of light-curing sealing materials bonded to one side of a filter having a first liquid crystal material with the second liquid crystal material sandwiched therebetween. Arranging a liquid crystal panel having a substrate, and irradiating light containing ultraviolet rays from the other side of the filter to cure the sealing material of the liquid crystal panel through the filter. Features.

  According to this application example, the ultraviolet rays pass through the filter before entering the liquid crystal panel. Therefore, the first liquid crystal material provided in the filter can absorb at least light having a specific wavelength caused by deterioration of the second liquid crystal material, which could not be removed conventionally. Accordingly, when the sealing material is cured, the sealing material can be cured while suppressing damage to the second liquid crystal material even if the second liquid crystal material is irradiated with ultraviolet rays. As a result, the display quality can be improved and the life of the liquid crystal panel can be improved.

  Application Example 2 In the method for manufacturing a liquid crystal device according to the application example, it is preferable that the first liquid crystal material and the second liquid crystal material are the same liquid crystal material.

  According to this application example, since the same liquid crystal material is used, the wavelength that damages the second liquid crystal material can be absorbed by the first liquid crystal material without specifying the wavelength that damages the second liquid crystal material. Thus, damage to the second liquid crystal material can be suppressed.

  Application Example 3 In the method for manufacturing a liquid crystal device according to the application example, it is preferable that the cell thickness of the filter is thicker than the cell thickness of the liquid crystal panel.

  According to this application example, since the cell thickness of the filter is thicker, the wavelength that damages the second liquid crystal material can be more reliably absorbed by the first liquid crystal material provided in the filter.

  Application Example 4 In the method of manufacturing a liquid crystal device according to the application example, it is preferable that the step of curing the sealing material is performed by irradiating the ultraviolet light with the first liquid crystal material in an isotropic phase.

  According to this application example, the first liquid crystal material is heated to pass ultraviolet rays in an isotropic phase state, for example, so that the scattering of incident light can be suppressed and the optical characteristics are greatly affected. Can be suppressed.

  Application Example 5 In the method for manufacturing a liquid crystal device according to the application example described above, the method may include a step of disposing a mask that opens at least in a region overlapping with the sealing material in a plan view between the filter and the liquid crystal panel. preferable.

  According to this application example, the sealing material of the liquid crystal panel can be irradiated with ultraviolet rays. In other words, a region where it is not desired to be irradiated with ultraviolet rays can be prevented from being irradiated with ultraviolet rays by the mask.

  Application Example 6 In the method for manufacturing a liquid crystal device according to the application example described above, it is preferable that the filter has a light shielding film formed in a region other than at least a region overlapping the sealing material in plan view.

  According to this application example, since the light shielding film is formed on the filter, the number of components can be reduced as compared with the case where the mask on which the light shielding film is formed is separately arranged.

FIG. 2 is a schematic plan view illustrating a configuration of a liquid crystal device. FIG. 2 is a schematic cross-sectional view taken along the line H-H ′ of the liquid crystal device illustrated in FIG. 1. It is a schematic diagram which shows the structure of a filter, (a) is a schematic plan view which shows the structure of a filter, (b) is a schematic sectional drawing which shows the structure of a filter, (c) shows the structure of the heater provided in the filter. FIG. 5 is a flowchart showing a method for manufacturing a liquid crystal device in the order of steps. The schematic diagram which shows the method of hardening | curing a sealing material among the manufacturing methods of a liquid crystal device. The graph showing the light transmittance of each filter, and the light absorption amount of a seal hardening initiator. FIG. 3 is a schematic diagram illustrating a configuration of a projection display device including a liquid crystal device. FIG. 5 is a schematic cross-sectional view illustrating a method for manufacturing a liquid crystal device according to a second embodiment.

  DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, embodiments of the invention will be described with reference to the drawings. Note that the drawings to be used are appropriately enlarged or reduced so that the part to be described can be recognized.

  In the following embodiments, for example, when “on the substrate” is described, the substrate is disposed so as to be in contact with the substrate, or is disposed on the substrate via another component, or the substrate. It is assumed that a part is arranged so as to be in contact with each other and a part is arranged via another component.

(First embodiment)
In this embodiment, an active matrix liquid crystal device including a thin film transistor (TFT) as a pixel switching element will be described as an example of the liquid crystal device. This liquid crystal device can be suitably used, for example, as light modulation means (liquid crystal light valve) of a projection display device (liquid crystal projector) described later.

<Configuration of liquid crystal device>
FIG. 1 is a schematic plan view showing the configuration of the liquid crystal device. 2 is a schematic cross-sectional view taken along the line HH ′ of the liquid crystal device shown in FIG. Hereinafter, the configuration of the liquid crystal device will be described with reference to FIGS.

  As shown in FIGS. 1 and 2, the liquid crystal device 100 according to the present embodiment includes an element substrate 10 and a counter substrate 20 that are disposed to face each other, and a second liquid crystal layer 15 that is sandwiched between the pair of substrates. As the first base material 10a of the element substrate 10, for example, a substrate such as a glass substrate, a quartz substrate, or a silicon substrate is used. As the second base material 20a of the counter substrate 20, for example, a transparent substrate such as a glass substrate or a quartz substrate is used.

  The element substrate 10 is larger than the counter substrate 20, and both the substrates are bonded via a sealing material 14 disposed along the outer edge of the counter substrate 20. A second liquid crystal layer 15 is configured by sealing a second liquid crystal material 15 a having positive or negative dielectric anisotropy in the gap.

  For example, an adhesive such as an ultraviolet curable epoxy resin is employed as the sealing material 14. Spacers (not shown) are mixed in the sealing material 14 to keep the distance between the pair of substrates constant.

  A display area E including a plurality of pixels P arranged in a matrix is provided inside the sealing material 14. Further, a parting part 18 is provided between the sealing material 14 and the display area E so as to surround the display area E. The parting part 18 is made of, for example, a light shielding metal or metal oxide.

  Around the display region E, a dummy pixel region (not shown) that does not contribute to display is provided. Although not shown in FIGS. 1 and 2, a light shielding portion (black matrix: BM) that divides a plurality of pixels P in a plane in the display area E is provided on the counter substrate 20.

  The element substrate 10 is provided with a terminal portion in which a plurality of external connection terminals 35 are arranged. A data line driving circuit 22 is provided between the first side portion along the terminal portion and the sealing material 14. In addition, an inspection circuit 25 is provided between the sealing material 14 and the display area E along the second side facing the first side.

  Further, a scanning line driving circuit 24 is provided between the seal material 14 and the display area E along the third side and the fourth side that are orthogonal to the first side and face each other. A plurality of wirings 29 that connect the two scanning line driving circuits 24 are provided between the sealing material 14 on the second side and the inspection circuit 25.

  The wirings connected to the data line driving circuit 22 and the scanning line driving circuit 24 are connected to a plurality of external connection terminals 35 arranged along the first side. Hereinafter, the direction along the one side will be referred to as the X direction, and the direction along the third side and the fourth side that are orthogonal to the one side and face each other will be described as the Y direction. The arrangement of the inspection circuit 25 is not limited to this, and the inspection circuit 25 may be provided between the seal material 14 along the data line driving circuit 22 and the display area E.

  As shown in FIG. 2, on the surface of the first base material 10a on the second liquid crystal layer 15 side, a light-transmitting pixel electrode 27 provided for each pixel P and a thin film transistor (TFT: Thin Film) as a switching element. Transistor, hereinafter referred to as “TFT 30”), signal wiring, and an alignment film 28 covering these are formed.

  In addition, a light shielding structure is employed that prevents light from entering the semiconductor layer in the TFT 30 to make the switching operation unstable. The element substrate 10 includes a first base material 10a, a pixel electrode 27, a TFT 30, a signal wiring, and an alignment film 28 formed on the first base material 10a.

  On the surface of the second base material 20a on the second liquid crystal layer 15 side, there are a parting portion 18, an insulating layer 33 formed so as to cover it, and a counter electrode 31 provided so as to cover the insulating layer 33. An alignment film 32 that covers the counter electrode 31 is provided. The counter substrate 20 in the present invention includes at least the parting part 18, the counter electrode 31, and the alignment film 32.

  As shown in FIG. 1, the parting part 18 surrounds the display area E and is provided at a position overlapping the scanning line driving circuit 24 and the inspection circuit 25 in plan view. Thus, the light incident on these circuits from the counter substrate 20 side is shielded to prevent the circuit from malfunctioning due to the light. Further, unnecessary stray light is shielded from entering the display area E, and high contrast in the display of the display area E is ensured.

  The insulating layer 33 is made of, for example, an inorganic material such as silicon oxide, and is provided so as to cover the parting portion 18 with light transmittance. As a method of forming such an insulating layer 33, for example, a method of forming a film using a plasma CVD (Chemical Vapor Deposition) method or the like can be cited.

  The counter electrode 31 is made of a transparent conductive film such as ITO (Indium Tin Oxide), for example, covers the insulating layer 33 and is electrically connected to the vertical conduction part 26 provided at the corner of the counter substrate 20 as shown in FIG. It is connected. The vertical conduction part 26 is electrically connected to the wiring on the element substrate 10 side.

  The alignment film 28 covering the pixel electrode 27 and the alignment film 32 covering the counter electrode 31 are selected based on the optical design of the liquid crystal device 100. As the alignment films 28 and 32, an alignment film formed by depositing an inorganic material such as SiOx (silicon oxide) by using a vapor phase growth method and approximately perpendicularly aligning with liquid crystal molecules having negative dielectric anisotropy. Is mentioned.

  Such a liquid crystal device 100 is, for example, a transmissive type, and normally white of the pixel P when the voltage is not applied is larger than the transmittance when the voltage is applied, or the pixel P when the voltage is not applied. A normally black mode optical design is adopted in which the transmittance is smaller than the transmittance when a voltage is applied. Polarizing elements are arranged and used in accordance with the optical design on the light incident side and the light exit side of the liquid crystal device 100 including the element substrate 10 and the counter substrate 20, respectively.

  In the present embodiment, an example in which a normally black mode optical design is applied using the alignment film described above as the alignment films 28 and 32 and a liquid crystal having negative dielectric anisotropy will be described.

<Configuration of filter>
FIG. 3 is a schematic diagram showing the configuration of the filter, (a) is a schematic plan view showing the configuration of the filter, (b) is a schematic cross-sectional view showing the configuration of the filter, and (c) is a schematic view of the filter. It is a schematic plan view which shows the structure of the provided heater. The configuration of the filter will be described below with reference to FIG.

  As shown in FIG. 3, the filter 50 includes a first substrate 51, a second substrate 52, and a first substrate 51 sandwiched between the first substrate 51 and the second substrate 52, which are bonded together via a sealing material 53. And a liquid crystal layer 54. The first liquid crystal layer 54 is composed of a first liquid crystal material 54a.

  The first substrate 51 and the second substrate 52 are made of a transparent substrate such as a quartz substrate or a glass substrate. A heater 55 is provided on the surface 51 a opposite to the side facing the first liquid crystal layer 54 of the first substrate 51.

  As shown in FIGS. 3B and 3C, the heater 55 is a resistor formed using, for example, a metal such as aluminum, an alloy containing the metal, or a conductive resin material. . The heater 55 is similarly arranged in a frame shape slightly inside the sealing material 53 arranged in a frame shape along the outer edges of the pair of substrates 51 and 52. The heater 55 has two connection ends 55a and 55b. When a voltage is applied to the two connection ends 55a and 55b, the resistor generates heat and heats the first substrate 51. Thereby, the first liquid crystal layer 54 sandwiched between the first substrate 51 and the second substrate 52 is heated.

  In the filter 50, the size of the pair of substrates 51 and 52 is set so that light from the lamp 61 (see FIG. 5) passes through an area surrounded by the heater 55. In other words, the size of the pair of substrates 51 and 52 and the position of the heater 55 relative to the first substrate 51 are defined so that the light from the lamp 61 is not blocked by the heater 55.

  In the case of this embodiment, the filter 50 is disposed in the vicinity of the lamp 61, so that the heater 55 is formed on the surface of the filter 50 opposite to the light incident side. This is preferable from the viewpoint of effectively using illumination light.

  In the present embodiment, the second liquid crystal material 15 a constituting the second liquid crystal layer 15 of the liquid crystal device 100 and the first liquid crystal material 54 a constituting the first liquid crystal layer 54 of the filter 50 are the same. Further, the thickness d2 (cell thickness) of the first liquid crystal layer 54 of the filter 50 is larger than the thickness d1 (cell thickness, see FIG. 2) of the second liquid crystal layer 15 of the liquid crystal device 100.

  In the filter 50, an alignment film that aligns the first liquid crystal material 54 a (liquid crystal molecules) in a predetermined direction is not provided on the first substrate 51 and the second substrate 52. Therefore, when, for example, nematic liquid crystal molecules having positive or negative dielectric anisotropy are enclosed between the pair of substrates 51 and 52 as the first liquid crystal material 54a, the liquid crystal molecules are aligned in the major axis direction at room temperature due to intermolecular forces. Therefore, the light incident on the first liquid crystal layer 54 is scattered, and the appearance of the first liquid crystal layer 54 becomes clouded.

  If the first liquid crystal layer 54 is heated by applying a voltage to the heater 55 described above and the first liquid crystal layer 54 is set to a temperature equal to or higher than the phase transition point (Ni point), the alignment state of the liquid crystal molecules is changed randomly. One liquid crystal layer 54 can be optically isotropic. Thereby, it can be set as a transparent state by making the 1st liquid crystal layer 54 cloudy at room temperature into more than Ni point.

<Method for manufacturing liquid crystal device>
FIG. 4 is a flowchart showing the method of manufacturing the liquid crystal device in the order of steps. 5A and 5B are schematic views showing a method for curing a sealing material in a method for manufacturing a liquid crystal device, wherein FIG. 5A is a schematic cross-sectional view, and FIG. 5B is a schematic plan view showing a relationship between a planar mask and a liquid crystal panel. FIG. FIG. 6 is a graph showing the light transmittance of each filter and the amount of light absorbed by the seal curing initiator. Hereinafter, a method for manufacturing the liquid crystal device will be described with reference to FIGS.

  First, a manufacturing method on the element substrate 10 side will be described. As shown in FIG. 4, first, in step S11, the TFT 30 is formed on the first base material 10a made of a quartz substrate or the like. Specifically, the TFT 30 is formed on the first base material 10a by using a well-known film forming technique, photolithography technique, and etching technique.

  In step S12, the pixel electrode 27 is formed. As a manufacturing method, similarly to the above, the pixel electrode 27 is formed by using a well-known film formation technique, photolithography technique, and etching technique.

In step S13, the alignment film 28 is formed. Specifically, the alignment film 28 is formed so as to cover the pixel electrode 27. As a manufacturing method of the alignment film 28, for example, an oblique deposition method in which an inorganic material such as silicon oxide (SiO ₂ ) is obliquely deposited is used. Thus, the element substrate 10 side is completed.

  Next, a manufacturing method on the counter substrate 20 side will be described. First, in step S21, the counter electrode 31 is formed. Specifically, the insulating layer 33 made of silicon oxide or the like is formed on the second base material 20a made of a light-transmitting material such as a glass substrate by using, for example, a plasma CVD method. Thereafter, the counter electrode 31 is formed using a known film formation technique so as to cover the insulating layer 33.

  In step S <b> 22, the alignment film 32 is formed so as to cover the counter electrode 31. Specifically, it is the same as the case of the alignment film 28, and is formed by using, for example, an oblique deposition method. Thus, the counter substrate 20 side is completed. Next, a method for bonding the element substrate 10 and the counter substrate 20 will be described.

  In step S <b> 31, the sealing material 14 is applied on the element substrate 10. Specifically, the relative positional relationship between the element substrate 10 and the dispenser (which may be a discharge device) is changed, and the sealing material 14 is applied to the peripheral portion of the display area E (on the seal area) on the element substrate 10. .

  Examples of the sealing material 14 include a photocuring type (ultraviolet curing type). Further, the sealing material 14 includes, for example, a gap material such as a spacer for setting a distance (gap or cell gap) between the element substrate 10 and the counter substrate 20 to a predetermined value.

  In step S <b> 32, the second liquid crystal material 15 a is dropped inside the seal material 14. Specifically, the second liquid crystal material 15a is dropped onto an area surrounded by the sealing material 14 (ODF (One Drop Fill) method). As a dropping method, for example, an ink jet head can be used. Further, it is desirable that the second liquid crystal material 15a is dropped on the central portion of the region (display region E) surrounded by the sealing material 14.

  In step S33, the element substrate 10 and the counter substrate 20 are bonded together. Specifically, the element substrate 10 and the counter substrate 20 are bonded together via the sealing material 14 applied to the element substrate 10.

  In step S34 (the step of arranging the liquid crystal panel and the step of curing the sealing material), the sealing material 14 is irradiated with ultraviolet rays L1 and cured. Specifically, as shown in FIG. 5A, a filter 50 is disposed above a large substrate 100b (liquid crystal panel 100a) on which a plurality of liquid crystal panels 100a before forming the liquid crystal device 100 are formed.

  In addition, as described above, a voltage is applied to the heater 55 of the filter 50 to heat the first liquid crystal layer 54 and to make the first liquid crystal layer 54 optically isotropic. In this state, light including ultraviolet rays is irradiated from the other side of the filter 50. The temperature to heat is about 100 degreeC, for example.

  In addition, a mask 71 having an opening that overlaps with the sealing material 14 in a plan view is disposed between the large substrate 100b and the filter 50. That is, the ultraviolet ray L1 is prevented from being irradiated as much as possible in the region excluding the sealing material 14.

  Specifically, as shown in FIG. 5B, the opening 71a of the mask 71 is arranged in a region overlapping the sealing material 14 of the liquid crystal panel 100a constituting the large substrate 100b in plan view. More specifically, the region of the opening 71a extends from the sealing material 14 to the display region E side (second liquid crystal layer 15 side) in order to cure the sealing material 14 with certainty. That is, the ultraviolet light L1 that damages the second liquid crystal material 15a of the second liquid crystal layer 15 is irradiated.

  However, by passing the ultraviolet ray L1 through the filter 50 having the first liquid crystal material 54a, as shown in FIG. 5, the ultraviolet ray L1 that damages the second liquid crystal material 15a can be changed to the ultraviolet ray L2 that is not easily damaged. .

  In the graph shown in FIG. 6, the horizontal axis indicates the wavelength (nm), and specifically indicates the wavelength in the range of 330 nm to 400 nm. The vertical axis shows the light transmittance (%) and the light absorption amount (arb.unit).

  The curves shown in the graph are the relationship between the wavelength and transmittance of a conventionally used neo-ceram filter, the relationship between the wavelength and transmittance of the filter 50 of the present embodiment, and the relationship between the wavelength and absorption amount of the seal curing initiator. Is shown.

  The wavelength of light that damages the liquid crystal materials 15a and 54a is, for example, 360 nm or less. The wavelength of the lamp 61 used for curing the sealing material 14 is about 350 nm to 400 nm. In the neo-serum curve, the light transmittance is gradually improved as it goes from 340 nm to 400 nm. On the other hand, the transmittance of the curve of the filter 50 is sharply improved as it goes from 355 nm to 365 nm.

  Neoceram can cut light having a wavelength of 340 nm or less. The filter 50 of the present embodiment can cut light having a wavelength of 355 nm or less. Therefore, the filter 50 can cut more light having a wavelength that damages the liquid crystal materials 15a and 54a as compared with neo-serum.

  For example, when viewed at a wavelength near 365 nm, the transmittance of neoceram is 50%, whereas the transmittance of the filter 50 is nearly 90%, and the filter 50 has a wavelength necessary for curing the sealing material 14. Band light can be transmitted with higher transmittance. Therefore, the sealing material 14 can be cured quickly.

  Further, the absorption amount of the seal curing initiator for curing the sealing material 14 is also 0.1 arb.unit, so that it can be reliably absorbed even in the light of a low wavelength region, and curing can be started. Therefore, the second liquid crystal material 15a of the liquid crystal panel 100a can be prevented from being damaged. Thus, the liquid crystal device 100 is completed.

<Configuration of projection display device>
Next, the projection display apparatus of this embodiment will be described with reference to FIG. FIG. 7 is a schematic diagram showing a configuration of a projection display device including the above-described liquid crystal device.

  As shown in FIG. 7, the projection display apparatus 1000 according to the present embodiment includes a polarization illumination apparatus 1100 arranged along the system optical axis L, two dichroic mirrors 1104 and 1105 as light separation elements, and three Reflective mirrors 1106, 1107, 1108, five relay lenses 1201, 1202, 1203, 1204, 1205, three transmissive liquid crystal light valves 1210, 1220, 1230 as light modulation means, and a cross dichroic as a light combiner A prism 1206 and a projection lens 1207 are provided.

  The polarized light illumination device 1100 is generally configured by a lamp unit 1101 as a light source composed of a white light source such as an ultra-high pressure mercury lamp or a halogen lamp, an integrator lens 1102, and a polarization conversion element 1103.

  The dichroic mirror 1104 reflects red light (R) and transmits green light (G) and blue light (B) among the polarized light beams emitted from the polarization illumination device 1100. Another dichroic mirror 1105 reflects the green light (G) transmitted through the dichroic mirror 1104 and transmits the blue light (B).

  The red light (R) reflected by the dichroic mirror 1104 is reflected by the reflection mirror 1106 and then enters the liquid crystal light valve 1210 via the relay lens 1205. Green light (G) reflected by the dichroic mirror 1105 enters the liquid crystal light valve 1220 via the relay lens 1204. The blue light (B) transmitted through the dichroic mirror 1105 enters the liquid crystal light valve 1230 via a light guide system including three relay lenses 1201, 1202, 1203 and two reflection mirrors 1107, 1108.

  The liquid crystal light valves 1210, 1220, and 1230 are disposed to face the incident surfaces of the cross dichroic prism 1206 for each color light. The color light incident on the liquid crystal light valves 1210, 1220, and 1230 is modulated based on video information (video signal) and emitted toward the cross dichroic prism 1206.

  In this prism, four right-angle prisms are bonded together, and a dielectric multilayer film that reflects red light and a dielectric multilayer film that reflects blue light are formed in a cross shape on the inner surface thereof. The three color lights are synthesized by these dielectric multilayer films, and the light representing the color image is synthesized. The synthesized light is projected onto the screen 1300 by the projection lens 1207, which is a projection optical system, and the image is enlarged and displayed.

  The liquid crystal light valve 1210 is the one to which the liquid crystal device 100 described above is applied. The liquid crystal device 100 is arranged with a gap between a pair of polarizing elements arranged in crossed Nicols on the incident side and the emission side of colored light. The same applies to the other liquid crystal light valves 1220 and 1230.

  According to such a projection display apparatus 1000, since the liquid crystal light valves 1210, 1220, and 1230 are used, high display quality can be obtained with a long lifetime.

  As described above in detail, according to the method for manufacturing the liquid crystal device 100 of the first embodiment, the following effects can be obtained.

  (1) According to the method for manufacturing the liquid crystal device 100 of the first embodiment, the ultraviolet rays L1 pass through the filter 50 before entering the liquid crystal panel 100a. Therefore, the first liquid crystal material 54a provided in the filter 50 can absorb (cut) light having a specific wavelength that cannot be removed in the past and is caused by at least deterioration of the second liquid crystal material 15a. . As a result, when the sealing material 14 is cured, the wavelength that damages the liquid crystal material does not reach the liquid crystal panel 100a even if the ultraviolet ray L1 is irradiated, and the sealing material 14 is suppressed while preventing damage to the second liquid crystal material 15a. Can be cured. As a result, display quality can be improved and the life of the liquid crystal device 100 can be improved. Moreover, since the light of the wavelength band required for hardening of the sealing material 14 can be permeate | transmitted with a higher transmittance | permeability, hardening of the sealing material 14 can be performed quickly.

  (2) According to the method for manufacturing the liquid crystal device 100 of the first embodiment, since the second liquid crystal material 15a and the first liquid crystal material 54a are the same liquid crystal material, the wavelength that damages the second liquid crystal material 15a is specified in advance. Even if not, the wavelength that damages the second liquid crystal material 15a can be absorbed by the first liquid crystal material 54a, and damage to the second liquid crystal material 15a can be suppressed.

  (3) According to the method for manufacturing the liquid crystal device 100 of the first embodiment, the cell thickness d2 of the first liquid crystal layer 54 of the filter 50 is greater than the cell thickness d1 of the second liquid crystal layer 15 of the liquid crystal device 100. Since it is thick, it is possible to increase the amount of absorption of the wavelength that damages the second liquid crystal material 15a, and the filter 50 can absorb (cut) more reliably. Moreover, the absorption lifetime of the filter 50 can be extended compared with the case where it makes the same cell thickness.

  (4) According to the manufacturing method of the liquid crystal device 100 of the first embodiment, the first liquid crystal material 54a can be brought into an isotropic phase by providing the filter 50 with the heater 55 and heating it. Therefore, it is possible to prevent the ultraviolet rays incident on the filter 50 from being scattered by irradiating the ultraviolet rays while heating, and to suppress a great influence on the optical characteristics.

(Second Embodiment)
<Method for manufacturing liquid crystal device>
FIG. 8 is a schematic cross-sectional view illustrating the method for manufacturing the liquid crystal device of the second embodiment. Hereinafter, a method of manufacturing the liquid crystal device will be described with reference to FIG.

  The manufacturing method of the liquid crystal device 100 of the second embodiment differs from the manufacturing method of the first embodiment described above in that the mask 71 (the light shielding film 151) is built in the filter 150 and the mask 71 is omitted. The portion is generally the same. Therefore, in the second embodiment, portions different from the first embodiment will be described in detail, and descriptions of other overlapping portions will be omitted as appropriate.

  As shown in FIG. 8, in the filter 150 of the second embodiment, a light-shielding film 151 is formed on the first substrate 51. The light-shielding film 151 opens in a region overlapping with the sealing material 14 of the large substrate 100b (liquid crystal panel 100a) in plan view. ing. In the method for manufacturing the liquid crystal device 100 according to the second embodiment, the filter 150 is disposed above the large substrate 100b without the mask 71 in the curing of the sealing material 14 in step S34 (see FIG. 4).

  Next, the filter 150 is irradiated with the ultraviolet light L1 from the lamp 61, and the ultraviolet light L2 that has passed through the first liquid crystal material 54a and the light shielding film 151 is irradiated onto the sealing material 14. Thereby, the ultraviolet-ray L2 can be irradiated to the area | region where the sealing material 14 of the large sized board | substrate 100b was apply | coated, without using the mask 71. FIG.

  As described above in detail, according to the method for manufacturing the liquid crystal device 100 of the second embodiment, the following effects can be obtained.

  (5) According to the method for manufacturing the liquid crystal device 100 of the second embodiment, since the light shielding film 151 having the same function as the mask 71 is built in the filter 150, the mask 71 on which the light shielding film is formed is disposed separately. In comparison, the number of parts can be reduced.

  The aspect of the present invention is not limited to the above-described embodiment, and can be appropriately changed without departing from the spirit or idea of the invention that can be read from the claims and the entire specification. It is included in the range. Moreover, it can also implement with the following forms.

(Modification 1)
As described above, the second liquid crystal material 15a constituting the second liquid crystal layer 15 of the liquid crystal panel 100a and the first liquid crystal material 54a constituting the first liquid crystal layer 54 of the filter 50 are limited to being the same. It may be different. In this case, it is desirable to confirm the wavelength of the ultraviolet light that passes through the filter 50 in advance.
(Modification 2)
As described above, the filter 50 is not limited to the provision of the heater 55, and for example, a thermocouple or a heating device may be provided. Further, a member that transmits heat of the lamp 61 to the filter 50 may be provided.
(Modification 3)
As described above, the first substrate 51 and the second substrate 52 constituting the filter 50 are not limited to using a quartz substrate or a glass substrate, and for example, neo-ceram glass may be used. According to this, light in a short wavelength region (for example, 330 nm or less) can be cut more reliably.

  DESCRIPTION OF SYMBOLS 10 ... Element substrate, 10a ... 1st base material, 14 ... Sealing material, 15 ... 2nd liquid crystal layer, 15a ... 2nd liquid crystal material, 18 ... Parting part, 20 ... Opposite substrate, 20a ... 2nd base material, 22 ... Data line drive circuit, 24 ... Scanning line drive circuit, 25 ... Inspection circuit, 26 ... Vertical conduction part, 27 ... Pixel electrode, 28,32 ... Alignment film, 29 ... Wiring, 30 ... TFT, 31 ... Counter electrode, 33 ... Insulating layer, 35 ... external connection terminal, 50,150 ... filter, 51 ... first substrate, 51a ... surface, 52 ... second substrate, 53 ... sealing material, 54 ... first liquid crystal layer, 54a ... first liquid crystal material, 55 ... heater, 55a, 55b ... connection end, 61 ... lamp, 71 ... mask, 71a ... opening, 100 ... liquid crystal device, 100a ... liquid crystal panel, 100b ... large substrate, 151 ... light shielding film, 1000 ... projection type display device 1100: Polarized illumination equipment DESCRIPTION OF SYMBOLS 1101 ... Lamp unit 1102 ... Integrator lens 1103 ... Polarization conversion element 1104, 1105 ... Dichroic mirror, 1106, 1107, 1108 ... Reflection mirror, 1201, 1202, 1203, 1204, 1205 ... Relay lens, 1206 ... Cross dichroic Prism, 1207 ... projection lens, 1210, 1220, 1230 ... liquid crystal light valve, 1300 ... screen.

Claims (6)

Disposing a liquid crystal panel having a pair of substrates bonded to each other on one side of a filter having the first liquid crystal material by a photo-curing sealing material in a state of sandwiching the second liquid crystal material;
Irradiating light including ultraviolet rays from the other side of the filter, and curing the sealing material of the liquid crystal panel through the filter;
A method for manufacturing a liquid crystal device, comprising: A manufacturing method of a liquid crystal device according to claim 1,
The method for manufacturing a liquid crystal device, wherein the first liquid crystal material and the second liquid crystal material are the same liquid crystal material. A method of manufacturing a liquid crystal device according to claim 1 or 2,
The method of manufacturing a liquid crystal device, wherein a cell thickness of the filter is thicker than a cell thickness of the liquid crystal panel. A method for manufacturing a liquid crystal device according to any one of claims 1 to 3,
The method of curing the sealing material includes irradiating the ultraviolet light with the first liquid crystal material in an isotropic state. A method for manufacturing a liquid crystal device according to any one of claims 1 to 4,
A method of manufacturing a liquid crystal device, comprising a step of arranging a mask having an opening in an area overlapping with the sealing material at least in a plan view between the filter and the liquid crystal panel. A method for manufacturing a liquid crystal device according to any one of claims 1 to 4,
The method for manufacturing a liquid crystal device, wherein the filter has a light shielding film formed in a region other than a region overlapping at least the sealing material in a plan view.

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