JP2016042598A - Substrate processing method and substrate processing system - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate processing method and a substrate processing system which enables the effective recovery and recycling of an etching process liquid even when the concentration of a substrate component is high in the etching process liquid after use.SOLUTION: A substrate processing method comprises: a process liquid-recovering step for recovering a used etching process liquid used in a process for etching a substrate in a substrate-processing mechanism; a process liquid feedback step for feeding the used etching process liquid thus recovered back to the substrate-processing mechanism as a new etching process liquid; and a substrate component-removing step for removing a component of the substrate in the used etching process liquid before feeding the recovered used etching process liquid back to the substrate-processing mechanism.SELECTED DRAWING: Figure 6

Description

  The present invention relates to a substrate processing method for processing a substrate by supplying a processing liquid to a substrate such as a semiconductor wafer and a substrate processing system for processing the substrate according to the method.

  Conventionally, a substrate surface processing apparatus as disclosed in Patent Document 1 is known. In this substrate processing apparatus, a processing liquid is supplied to a processing apparatus (spinner) for processing a substrate such as a semiconductor, and the processing waste liquid is collected and reused for processing the substrate. And the new process liquid is replenished according to the change of the component density | concentration in the liquid of the collect | recovered process waste liquid. For example, when an etching treatment liquid containing hydrobromic acid is used as the treatment liquid, the decrease in the hydrobromic acid concentration in the treatment waste liquid is detected by a conductivity meter, and the hydrobromic acid concentration is higher than that in the treatment waste liquid. A stock solution of a high etching treatment solution is replenished. In addition, a substance dissolved by etching, for example, an increase in the concentration of dissolved indium is detected by an absorptiometer, and a stock solution of an etching treatment solution that does not contain indium is supplied.

  According to such a substrate surface treatment apparatus, since the stock solution of the treatment liquid is replenished according to the change in the component concentration in the collected treatment waste liquid, even if the treatment liquid is repeatedly used for the treatment of the substrate, The performance can be maintained to some extent.

JP 2000-338684 A

  In the conventional substrate surface processing apparatus described above, when the concentration of the substrate component dissolved in the etching processing solution repeatedly used for the etching processing becomes high, the etching processing solution is supplied by replenishing the stock solution of the etching processing solution. The concentration of dissolved substance (substrate component) is relatively lowered. However, for example, when a large amount of substrate components are produced in the etching solution, such as when the substrate is thinned only by etching instead of a grinder or CMP (Chemical Mechanical Polishing), the etching solution It is difficult to effectively recover and reuse the etching solution only by replenishing the stock solution.

  The present invention has been made in view of such circumstances, and a substrate processing method that enables effective recovery and reuse of an etching treatment liquid even when the concentration of a substrate component in the etching treatment liquid after use becomes high. And a substrate processing system.

  The substrate processing method according to the present invention is a substrate processing method for processing a substrate using a processing liquid in a substrate processing mechanism, wherein the post-use processing liquid used for processing the substrate is recovered in the substrate processing mechanism. A liquid recovery step, a processing liquid return step for returning the recovered post-use processing liquid to the substrate processing mechanism as a new processing liquid, and before returning the recovered post-use processing liquid to the substrate processing mechanism, And a substrate component removal step for removing the components of the substrate dissolved in the post-use processing liquid, and the post-use processing liquid that has passed through the substrate component removal step is used for the processing liquid return step.

  The substrate processing system according to the present invention includes a substrate processing mechanism for processing a substrate using a processing liquid, and a processing liquid recovery mechanism for recovering a post-use processing liquid used for processing the substrate in the substrate processing mechanism. A processing liquid return mechanism for returning the recovered post-use processing liquid to the substrate processing mechanism as a new processing liquid; and before returning the recovered post-use processing liquid to the substrate processing mechanism, the post-use processing liquid A substrate component removal mechanism that removes the components of the substrate dissolved therein, and the post-use treatment liquid that has passed through the substrate component removal mechanism is provided to the treatment liquid return mechanism.

  According to the substrate processing method and the substrate processing system of the present invention, the absolute concentration of the components of the substrate in the etching processing solution used can be kept low, and the etching processing solution can be effectively recovered and reused. It becomes.

1 is a block diagram showing a basic configuration of a substrate processing system according to an embodiment of the present invention. FIG. 2 is a piping route diagram showing a detailed configuration example of a processing liquid supply unit in the substrate processing system shown in FIG. 1. It is a flowchart which shows the procedure (the 1) of the etching process performed with the substrate processing system shown in FIG. It is a flowchart which shows the procedure (the 2) of the etching process performed with the substrate processing system shown in FIG. It is a flowchart which shows the procedure (the 3) of the etching process performed with the substrate processing system shown in FIG. It is a flowchart which shows the procedure of the process which concerns on the silicon removal in the etching process made with the substrate processing system shown in FIG. It is a flowchart which shows the procedure of the process which concerns on the electrode silicon removal in the etching process made with the substrate processing system shown in FIG. It is a flowchart which shows the procedure (the 4) of the etching process performed with the substrate processing system shown in FIG. FIG. 2 is an operation state diagram showing an operation state (No. 1) of a processing liquid supply unit in the substrate processing system shown in FIG. FIG. 6 is an operation state diagram showing an operation state (No. 2) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 6 is an operation state diagram showing an operation state (No. 3) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 6 is an operation state diagram showing an operation state (No. 4) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 7 is an operation state diagram showing an operation state (No. 5) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 10 is an operation state diagram showing an operation state (No. 6) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 8 is an operation state diagram showing an operation state (No. 7) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 8 is an operation state diagram showing an operation state (No. 8) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 10 is an operation state diagram showing an operation state (No. 9) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 10 is an operation state diagram showing an operation state (No. 10) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 12 is an operation state diagram showing an operation state (No. 11) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 12 is an operation state diagram showing an operation state (No. 12) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 14 is an operation state diagram showing an operation state (No. 13) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 14 is an operation state diagram showing an operation state (No. 14) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 17 is an operation state diagram showing an operation state (No. 15) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 16 is an operation state diagram showing an operation state (No. 16) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 18 is an operation state diagram showing an operation state (No. 17) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 22 is an operation state diagram showing an operation state (No. 18) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 22 is an operation state diagram showing an operation state (No. 19) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 21 is an operation state diagram showing an operation state (No. 20) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 22 is an operation state diagram showing an operation state (No. 21) of the processing liquid supply unit in the substrate processing system shown in FIG. 1. FIG. 22 is an operation state diagram showing an operation state (No. 22) of the processing liquid supply unit in the substrate processing system shown in FIG. 1.

  Embodiments of the present invention will be described with reference to the drawings.

  A substrate processing system according to an embodiment of the present invention is configured as shown in FIG. This substrate processing system performs an etching process on a silicon semiconductor wafer (silicon substrate).

  In FIG. 1, the substrate processing system includes a spin processing apparatus 10 (substrate processing mechanism), a processing liquid supply unit 20, a processing liquid recovery mechanism 30, and a control unit 40. The spin processing apparatus 10 has a structure in which a wafer chuck 13 that supports a silicon semiconductor wafer (hereinafter simply referred to as a silicon wafer) W in a cup body 11 is rotated by a motor 12. Then, as will be described later, the etching processing liquid supplied from the processing liquid supply unit 20 is supplied to the silicon wafer W from the nozzle 14 disposed above the silicon wafer W. The etching process liquid etches the surface of the silicon wafer W rotated by the rotation of the wafer chuck 13.

  The processing liquid recovery mechanism 30 is a mechanism that recovers the used etching processing liquid (waste liquid) discharged from the spin processing apparatus 10 and supplies it to the processing liquid supply unit 20, from the cup body 11 of the spin processing apparatus 10. It has a drain tank 31 for storing the used etching processing liquid discharged and a pump 32 for supplying the used etching processing liquid stored in the drain tank 31 to the processing liquid supply unit 20. The control unit 40 controls the drive of the motor 12 of the spin processing apparatus 10, the pump 32 of the processing liquid recovery mechanism 30, and various valves and pumps (details of which will be described later) in the processing liquid supply unit 20.

  The processing liquid supply unit 20 is configured as shown in FIG.

  In FIG. 2, the processing liquid supply unit 20 includes a recovery tank 21, a first supply tank 22, a second supply tank 23, and a silicon removal tank 24. The used etching processing liquid recovered from the spin processing apparatus 10 by the processing liquid recovery mechanism 30 (see FIG. 1) flows into the recovery tank 21 (IN), and the used etching processing liquid flows into the recovery tank 21. Can be stored. The recovery tank 21 is connected in parallel to the first supply tank 22 and the second supply tank 23 by a feed pipe. By the operation of the pump P1, the used etching treatment liquid stored in the recovery tank 21 is changed. It can be supplied to the first supply tank 22 through the control valve Vc1 and to the second supply tank 23 through the control valve Vc2.

  A chemical solution supply unit (not shown) is coupled to the first supply tank 22 by a delivery tube group, and hydrofluoric acid as each chemical solution for preparing an etching treatment solution from the chemical solution supply unit through the control valve group SVc1. Each of (HF), nitric acid (HNO3), acetic acid (CH3COOH) and pure water (H2O) can be supplied to the first supply tank 22. The chemical supply unit is also coupled to the second supply tank 23 by a delivery pipe group, and the chemicals can be supplied from the chemical supply unit to the second supply tank 23 through the control valve group SVc2.

  The first supply tank 22 is coupled to the spin processing apparatus 10 (see FIG. 1) by a feed pipe, and the etching process liquid in the first supply tank 22 is spun through the control valve Vc3 by the operation of the pump P3. It can be supplied (OUT) to the device 10 (nozzle 14). Further, the second supply tank 23 is also coupled to the spin processing apparatus 10 (see FIG. 1) by a feed pipe, and the etching processing liquid in the second supply tank 23 is passed through the control valve Vc4 by the operation of the pump P3. It can be supplied (OUT) to the spin processing apparatus 10 (nozzle 14).

  Further, the first supply tank 22 is coupled to the silicon removal tank 24 by a feed pipe, and the etching treatment liquid in the first supply tank 22 is passed through the on-off valves V1 and V3 by the operation of the pump P4. 24. The second supply tank 23 is also connected to the silicon removal tank 24 by a transmission pipe, and the etching processing liquid in the second supply tank 23 is passed through the on-off valves V2 and V3 by the operation of the pump P4. 24.

  In the silicon removal tank 24, electrodes 25a and 25b used for electrolyzing the etching solution are disposed. The silicon removal tank 24 is connected in parallel with the first supply tank 22 and the second supply tank 23 by a transmission pipe, and the etching process in which the silicon is removed in the silicon removal tank 24 by the operation of the pump P2. The liquid can be supplied to the first supply tank 22 through the control valve Vc5 and to the second supply tank 23 through the control valve Vc6. Further, the chemical solution supply unit (not shown) is coupled to the silicon removal tank 24 by a delivery tube group SVc3, and each chemical solution for preparing an etching treatment solution from the chemical solution supply unit through the control valve group SVc3. Each of hydrofluoric acid (HF), nitric acid (HNO3), acetic acid (CH3COOH), and pure water (H2O) can be supplied to the silicon removal tank 24. Further, the etching processing liquid in the silicon removal tank 24 can be circulated through the control valve Vc7 by the operation of the pump P2.

  The etching solution in the first supply tank 22 can be drained through the on-off valves V1 and V5 by the operation of the pump P4 (Drain), and the etching solution in the second supply tank 23 can also be discharged by the operation of the pump P4. Draining is possible through V2 and V5. Further, dilution water (pure water) can be supplied to the recovery tank 21 through the control valve Vc8, and the used etching solution stored in the recovery tank 21 is drained through the on-off valve V6. be able to. Further, the processing liquid stored in the silicon removal tank 24 can be drained through the on-off valve V4.

  The control unit 40 can monitor the amount of the etching processing liquid stored in the recovery tank 21, the first supply tank 22, the second supply tank 23, and the silicon removal tank 24 by a sensor (not shown) or the like. Then, the control unit 40 includes information on the amount of the etching processing solution stored in each of the tanks 21 to 24 and information on processing such as the processing time in the spin processing apparatus 10 and the number of etched silicon wafers W. Based on the drive motor 12 in the spin processing device 10 and the drive control of the pump 32 in the processing liquid recovery mechanism 30, the drive control of the pumps P1 to P4 in the processing liquid supply unit 20, the open / close control of the on-off valves V1 to V6, The opening adjustment control of the control valves Vc1 to Vc8 and the control valve groups SVc1 to SVc3 and the electrolysis control using the electrodes 25a and 25b in the silicon removal tank 24 are performed.

  Hereinafter, the etching process of the silicon wafer W performed in the substrate processing system having the above-described configuration will be described.

  Under the control of the control unit 40, the processing liquid supply unit 20 operates according to the procedure shown in FIGS.

  In FIG. 3, each chemical solution of hydrofluoric acid (HF), nitric acid (HNO3), acetic acid (CH3COOH) and pure water (H2O) flows from the chemical solution supply unit through the control valve group SVc1 as shown by the thick line in FIG. Is supplied to the first supply tank 22 while being adjusted, and is supplied to the second supply tank 23 while adjusting the flow rate through the adjustment valve group SVc2. Then, in each of the first supply tank 22 and the second supply tank 23, hydrofluoric acid (HF) and nitric acid (HNO3) are diluted with acetic acid (CH3COOH) and pure water (H2O) to obtain hydrofluoric acid (HF) and nitric acid ( A new etching process liquid in which the concentration of HNO3) is adjusted to a predetermined value is generated (S11). Thereafter, the control valve groups SVc1 and SVc2 are closed, and the etching process liquid is brought to a predetermined temperature in each of the first supply tank 22 and the second supply tank 23 in which the supply of each chemical liquid is stopped, as shown in FIG. It is circulated while being adjusted (S12), and the concentration of the etching treatment liquid is made uniform.

  When the etching process liquid having a uniform concentration is stored in the first supply tank 22 and the second supply tank 23 as described above, an etching process is performed from the process liquid supply unit 20 (see FIG. 1) to the spin processing apparatus 10. The liquid is supplied (S13), and in the spin processing apparatus 10, the silicon wafer W is etched by the supplied etching processing liquid. Specifically, the etching process liquid is supplied to the spin processing apparatus 10 as follows.

  The pump P3 operates in a state where the control valve Vc3 is controlled to a predetermined opening, and as shown by a thick line in FIG. 11, the etching processing liquid is flowed from the first supply tank 22 at a flow rate corresponding to the opening of the control valve Vc3. Is supplied to the spin processing apparatus 10 (SPM) (S131). In the spin processing apparatus 10, the etching processing liquid supplied from the processing liquid supply unit 20 (first supply tank 22) is sprayed on the rotating silicon wafer W from the nozzle 14, and includes the etching processing liquid (hydrofluoric acid HF, nitric acid HNO 3). ) Reacts with the silicon wafer W (Si), and the surface of the silicon wafer W is sequentially etched. Silicon (Si) is dissolved in the etching solution used in the course of the etching process in the spin processing apparatus 10 (state of H2SiF6).

  The silicon (Si) -dissolved etching processing liquid discharged during the etching process of the silicon wafer W in the spin processing apparatus 10 is recovered by the processing liquid recovery mechanism 30 (see FIG. 1) and processed into a processing liquid supply unit. 20 is stored in the recovery tank 21 (processing liquid recovery step). Then, as shown by the thick line in FIG. 12, the used etching treatment liquid is supplied from the recovery tank 21 to the first supply tank 22 at a flow rate corresponding to the opening of the control valve Vc1 by the operation of the pump P1. (S132). Further, the used etching processing liquid is returned from the first supply tank 22 to the spin processing apparatus 10 at a flow rate corresponding to the opening of the control valve Vc3 by the operation of the pump P3 (processing liquid return step, processing liquid return mechanism). . Thereafter, the operation of step S13 (step 131 and step 132) shown in FIG. 3 is continuously performed (state shown in FIG. 12), so that the etching processing liquid is supplied from the first supply tank 22 to the spin processing apparatus 10. Meanwhile, the state where the used etching processing liquid recovered from the spin processing apparatus 10 is returned to the first supply tank 22 via the recovery tank 21 is continued.

  As described above, while the etching processing liquid is circulating between the spin processing apparatus 10 and the processing liquid supply unit 20, while the silicon wafer W is being etched in the spin processing apparatus 10, the control unit 40 While performing drive control (see FIG. 12) of the pumps P1 and P3 and the control valves Vc1 and Vc3 in the supply unit 20, processing is performed in accordance with the procedure shown in FIG.

  In FIG. 4, the control unit 40, as described above, based on whether or not the etching process in the spin processing apparatus 10 is completed (S21), the processing time in the spin processing apparatus 10, the number of processed silicon wafers W, and the like. It is determined whether or not the lifetime of the etching processing solution used in circulation has expired, that is, whether or not the used etching processing solution is effective as an etching processing solution for processing the silicon wafer W (S22: determination means, (Determination step), and whether or not it is time to compensate for a decrease in the etching rate of the etching processing solution used based on the number of processed silicon wafers W and the processing time in the spin processing apparatus 10 (S23). Judgment is repeated. In the process, if it is determined that it is time to compensate for the decrease in the etching rate (YES in S23), the control unit 40 further supplies the etching solution at the first supply tank 22 and the second supply. It is determined which of the supply tanks 23 (S24).

  Here, if it is determined that the etching solution is supplied from the first supply tank 22 (first supply tank in S24), the control unit 40 uses an amount of hydrofluoric acid (HF) to compensate for the decrease in the etching rate. And nitric acid (HNO3) and an amount of the etching treatment solution (HF, HNO3, CH3COOH, H2O) to compensate for the loss of the etching treatment solution due to the recovery rate of the etching treatment solution being lower than 100%. The opening degree and drive control of the regulating valve group SVc1 are performed so as to be supplied to the one supply tank 22 (S25). As a result, in the processing liquid supply unit 20, as shown by the thick line in FIG. 13, the used etching processing liquid recovered from the spin processing apparatus 10 is supplied from the recovery tank 21 to the first supply tank 22, In a state where the etching processing liquid is supplied from the supply tank 22 to the spin processing apparatus 10, each of the chemical liquids (HF, HNO3, CH3COOH, H2O) from the chemical liquid supply unit reduces the etching rate through the controlled control valve group SVc1. In addition, the first supply tank 22 is supplied to the first supply tank 22 in an amount that compensates for the loss of the etching solution.

  Thereafter, the etching process liquid is circulated through the spin processing apparatus 10 and the processing liquid supply unit 20, and the silicon wafer W is etched by the etching process liquid in the spin processing apparatus 10. In the process, the control unit 40 determines whether or not the etching process in the spin processing apparatus 10 has been completed as described above (S21), whether or not the lifetime of the etching process liquid has expired (S22), It is repeatedly determined whether or not it is time to compensate for the decrease in the etching rate of the etching treatment liquid (S23). If the control unit 40 determines that the lifetime of the circulating etching processing solution has expired (YES in S22), the control unit 40 stops the pumps P1 and P3, closes the control valves Vc1 and Vc3, and starts the recovery tank 21 from the recovery tank 21. The supply of the etching processing liquid after use to the one supply tank 22 is stopped, and the supply of the etching processing liquid from the first supply tank 22 to the spin processing apparatus 10 is stopped.

  By etching the silicon wafer W in the spin processing apparatus 10, silicon (Si) is dissolved in the etching solution (including HF and HNO3) (in the state of H2SiF6), and the processing capability of the etching solution is reduced. To do. For example, if it is determined based on the number of processed silicon wafers W and the processing time that the circulating etching processing liquid has been used for the etching processing so as to be ineffective as the processing liquid for etching the silicon wafer W, It can be determined that the lifetime of the etching treatment solution has expired.

  When the supply of the etching process liquid from the first supply tank 22 to the spin processing apparatus 10 is stopped based on the determination that the lifetime of the etching process liquid from the first supply tank 22 has expired as described above. The control unit 40 starts the process shown in FIG. 5 and the process shown in FIG. 6 in parallel. In the process shown in FIG. 5, an etching process liquid is newly supplied from the second supply tank 23 to the spin processing apparatus 10 (S31). Specifically, the control unit 40 operates the pump P3 to control the adjustment valve Vc4 to a predetermined opening. Accordingly, as shown by the thick line in FIG. 14, instead of the first supply tank 22, the etching process liquid is supplied from the second supply tank 23 to the spin processing apparatus 10 at a flow rate corresponding to the opening of the control valve Vc 4. (S311). Further, the control unit 40 operates the pump P1 to control the adjustment valve Vc2 to a predetermined opening. Thereby, the used etching processing liquid is supplied from the collection tank 21 to the second supply tank 23 at a flow rate corresponding to the opening of the control valve Vc2 by the operation of the pump P1 (S312: see FIG. 14).

  In this way, the circulation of the etching processing liquid between the spin processing apparatus 10 and the processing liquid supply unit 20 (the state where the first supply tank 22 is switched to the second supply tank 23) is maintained, and the spin processing apparatus 10 is maintained. Then, the etching process of the silicon wafer W is continued with the etching process liquid.

  In parallel with the switching from the first supply tank 22 to the second supply tank 23 as described above, the control unit 40 performs processing according to FIG. The control unit 40 determines whether or not the current etching processing solution can be regenerated as an effective etching processing solution by removing the silicon based on, for example, the number of times of silicon removal described later with respect to the etching processing solution currently used. That is, it is determined whether or not silicon removal for the currently used etching treatment solution is effective (S41). If it is determined that the silicon removal for the currently used etching solution is effective (YES in S41), the control unit 40 opens the on-off valves V1 and V3 and operates the pump P4. As a result, as shown by the thick line in FIG. 15, the used etching treatment liquid is transferred from the first supply tank 22 to the silicon removal tank 24 (electrolysis apparatus) through the on-off valves V1 and V3 (S42).

  When the transfer of the etching solution after use from the first supply tank 22 to the silicon removal tank 24 is completed, the control unit 40 closes the on-off valves V1 and V3 and stops the pump P4, and then sets the control valve Vc7 to a predetermined value. The pump P2 is operated under the control of the opening degree. Then, the control unit 40 applies a predetermined voltage to the electrodes 25a and 25b (electrolysis equipment) in the silicon removal tank 24. As a result, the etching treatment solution in which silicon (Si) dissolved in the silicon removal tank 24 is circulated at a flow rate corresponding to the opening degree of the control valve Vc7 as shown by the thick line in FIG. Then, electrolysis is performed (S43). By this electrolysis of the etching treatment solution, silicon (Si) dissolved in the etching treatment solution is deposited and adheres to the anode (+) side electrode (for example, the electrode 25a), and the silicon (Si) from the etching treatment solution is deposited. Is removed.

  When the electrolysis of the etching treatment liquid in the silicon removal tank 24 is performed for a predetermined time, the control unit 40 ends the electrolysis, and as shown in FIG. 17, a concentration meter ( The concentration of the chemical solution (including HF and HNO3) in the etching processing solution is measured by (not shown) (S44). And the control unit 40 controls the opening degree of the regulating valve group SVc3 in order to add the insufficient chemical solution. As a result, each chemical solution from the chemical solution supply unit is supplied to the silicon removal tank 24 in which the etching processing solution is circulated while the flow rate is adjusted through the adjustment valve group SVc3 as indicated by the thick line in FIG. S45).

  As shown in FIG. 19, the control unit 40 again measures the chemical solution (HF, HNO3) concentration in the etching treatment solution in the silicon removal tank 24 and confirms that the chemical solution concentration is normal (S46). The regulating valve Vc7 is closed and the regulating valve Vc5 is controlled to a predetermined opening degree. As a result, as shown by the thick line in FIG. 20, the etching treatment liquid from which the silicon (Si) in the silicon removal tank 24 has been removed is changed by the operation of the pump P2 at a flow rate corresponding to the opening of the adjustment valve Vc5. 1 is transferred to the supply tank 22 (S47). When the etching process liquid from which silicon has been removed is filled in the first supply tank 22, the control unit 40 closes the control valve Vc5 to stop the pump P2, and then opens the on-off valve V4. As a result, as shown by the bold line in FIG. 21, the silicon-removed etching solution remaining in the silicon removal tank 24 is drained through the on-off valve V4 (S48).

  As described above, when the removal of silicon (Si) in the etching solution by electrolysis is completed, the control unit 40 closes the on-off valve V4 as shown in FIG. Then, the control unit 40 performs processing for removing silicon deposited from the etching processing solution and attached to the electrode 25a (anode side electrode) according to the procedure shown in FIG.

  The control unit 40 adjusts the opening degree of the control valve group SVc3 as indicated by the thick line in FIG. As a result, each chemical solution (HF, HNO3, CH3COOH, H2O) of the etching processing solution is supplied from the chemical solution supply unit to the silicon removal tank 24 at a flow rate corresponding to the opening of the control valve SVc3 (S51). When the etching solution is filled in the silicon removal tank 24 to such an extent that the electrodes 25a and 25b are sufficiently immersed, the adjustment valve group SVc3 is closed and the supply of each chemical solution from the chemical solution supply unit is stopped. And the control unit 40 controls the opening degree of the control valve Vc7, and operates the pump P2. Thereby, as shown by the thick line in FIG. 24, the etching solution in the silicon removal tank 24 circulates (S52). In the process in which the etching treatment liquid circulates in the silicon removal tank 24, silicon (Si) adhering to the electrode 25a (anode side electrode) is removed by etching.

  Then, after the circulation of the etching treatment liquid in the silicon removal tank 24 is started, when a time when it is expected that all of the silicon (Si) attached to the electrode 25a (anode side electrode) is peeled off (removed) has passed, As shown in FIG. 25, the unit 40 closes the control valve Vc7 to stop the pump P2, and then opens the on-off valve V4. As a result, as shown in FIG. 26, the etching solution in the silicon removal tank 24 is discharged (Drain) (S53). Then, when the discharge of the etching treatment liquid in the silicon removal tank 24 is completed, the control unit 40 closes the on-off valve V4.

  In this way, as shown in FIG. 27, the etching process liquid from which silicon (Si) has been removed is stored in the first supply tank 22, and in this state, the etching process liquid is continuously supplied from the second supply tank 23. It is supplied to the spin processing device 10.

  In the process shown in FIG. 6, for example, the control unit 40 determines that the number of times of silicon removal with respect to the current etching processing liquid (in the first supply tank 22) exceeds a predetermined number, and the current etching processing liquid is effective for removing silicon. If it is determined that it cannot be regenerated as an etching solution (NO in S41), the first supply tank 22 is replaced by the procedure shown in FIG. 8 in place of the above-described silicon removal process by electrolysis (see FIGS. 6 and 7). Store a new etching solution.

  The control unit 40 switches the supply of the etching processing liquid to the spin processing apparatus 10 from the first supply tank 22 to the second supply tank 23 (see FIG. 14), and then etches from the second supply tank 23 to the spin processing apparatus 10. While maintaining the supply of the processing liquid, the on-off valves V1 and V5 are opened to operate the pump P4. As a result, the etching solution in the first supply tank 23 is not transferred to the silicon removal tank 24 described above, but is discharged (Drain) (S61). When the discharge of the etching processing liquid in the first supply tank 22 is finished, the control unit 40 closes the on-off valves V1 and V5 and stops the pump P4, and then controls the opening degree of the control valve group SVc1. As a result, each chemical liquid (HF, HNO3, CH3COOH, H2O) of the etching processing liquid is supplied from the chemical liquid supply unit to the first supply tank 22 while the flow rate is adjusted through the control valve group SVc1, as shown by the thick line in FIG. Then, a new etching solution is prepared in the first supply tank 22 (S62). Thereafter, the control valve group SVc1 is closed, and in the first supply tank 22 from which the supply of each chemical solution is stopped, as shown in FIG. 30, the etching treatment liquid is circulated while being adjusted to a predetermined temperature (S63). The concentration of the treatment liquid can be made uniform.

  In this way, with the new etching processing solution stored in the first supply tank 22 (see FIG. 30), the etching processing solution is continuously supplied from the second supply tank 23 to the spin processing apparatus 10.

  As described above, when the lifetime of the etching solution in the first supply tank 22 expires, the silicon (Si) removal process is performed on the etching solution in the first supply tank 22 (see FIG. 6 and FIG. 7) or a new etching solution is prepared in the first supply tank 22 (see FIG. 8). Thereafter, the control unit 40 returns to the process shown in FIG. Thereafter, after the etching process liquid from which silicon (Si) has been removed or a new etching process liquid is stored in the first supply tank 22, the used etching process liquid is transferred from the recovery tank 21 to the second supply tank 23. Is supplied from the second supply tank 23 to the spin processing apparatus 10 at a flow rate corresponding to the opening of the control valve Vc4 by the operation of the pump P3 (S31 (S311 and S312 in FIG. 5)). And FIG. 27). While such a state is maintained, the control unit 40 determines whether or not the etching process in the spin processing apparatus 10 has been completed (S21) and whether or not the lifetime of the etching process liquid has expired (S22). In addition, it is repeatedly determined whether or not it is time to compensate for the decrease in the etching rate of the etching treatment liquid (S23).

  In the process, every time it is determined that it is time to compensate for the decrease in the etching rate of the etching processing solution in the second supply tank 23 (YES in S23), as in the case of the first supply tank 22 described above. Etching due to the fact that the recovery rate of the predetermined amount of hydrofluoric acid (HF) and nitric acid (HNO3) and the etching treatment solution for the second supply tank 23 is lower than 100% to compensate for the lowering of the etching rate. A predetermined amount of the etching processing liquid (HF, HNO3, CH3COOH, H2O) for compensating for the decrease in the processing liquid is supplied to the second supply tank 23 (S26).

  If it is determined that the lifetime of the etching process liquid in the second supply tank 23 has expired (YES in S22), the supply of the etching process liquid to the spin processing apparatus 10 is supplied from the second supply tank 23 to the first supply. It is switched to the tank 22 (proceeds to the process of S13 in FIG. 3). Then, according to the procedure shown in FIG. 6, the silicon (Si) of the etching processing liquid in the second supply tank 23 is removed by electrolysis in the silicon removal tank 24 as in the case of the first supply tank 22 ( S41-S48). Then, the silicon deposited by the electrolysis and attached to the electrode 25a (anode side electrode) is removed according to the procedure shown in FIG. 7 (S51 to S53). If it is determined that the silicon removal by electrolysis is not effective in the second supply tank 23 (NO in S41 in FIG. 6), as in the case of the first supply tank 22, The etching treatment liquid that has been repeatedly used up to now and the silicon removed repeatedly is discharged, and a new etching treatment liquid is stored in the second supply tank 23.

  As described above, the supply of the etching processing liquid to the spin processing apparatus 10 is switched between the first supply tank 22 and the second supply tank 23, and the silicon wafers W that are sequentially supplied and set in the spin processing apparatus 10. The etching process is repeated. And in the process, if the control unit 40 inputs the end signal from the spin processing apparatus 10 (YES in S21 in FIG. 4), the process is ended.

  In the substrate processing system as described above, the etching processing liquid (HF, HNO3) is circulated between the spin processing apparatus 10 and the processing liquid supply unit 20, and the silicon wafer W is etched by the etching processing liquid in the spin processing apparatus 10. If it is determined in the process that the lifetime of the etching solution has expired, the used etching solution is electrolyzed in the silicon removal tank 24, and silicon (Si) dissolved from the etching solution is dissolved. Is removed. Then, the etching processing liquid from which the silicon (Si) has been removed is again subjected to the etching processing of the silicon wafer W in the spin processing apparatus 10. Thus, before the etching process liquid determined to have expired is returned to the spin processing apparatus 10, silicon (Si), which is a component of the silicon wafer W, is removed from the etching process liquid. Even if the concentration of silicon (Si) dissolved in the etching solution after use becomes high, the absolute concentration of silicon (Si) in the etching solution used can be kept low. Effective recovery and reuse of the processing liquid becomes possible.

  Further, when the electrolysis (silicon removal) of the etching solution in the silicon removal tank 24 is completed, the silicon (Si) adhering to the electrode 25a (anode side electrode) is removed by the new etching solution, so that the electrolysis apparatus In the silicon removal tank 24, the electrodes 25a and 25b can be maintained in a state where no silicon adheres. As a result, the normal function as an electrolysis apparatus using the silicon removal tank 24 and the electrodes 25a and 25b can be maintained for a longer time.

  Further, the etching rate is determined when it is determined that it is time to compensate for the decrease in the etching rate of the circulating etching processing solution based on the number of processed silicon wafers W and the processing time in the spin processing apparatus 10. Along with hydrofluoric acid (HF) and nitric acid (HNO3) to compensate for the decrease, an etching treatment liquid (HF, HNO3, CH3COOH, H2O) corresponding to the reduced amount of the etching treatment liquid is added. 10, a larger number of silicon wafers W can be etched at a stable etching rate.

  The target of processing is not limited to the silicon wafer W, and is not particularly limited as long as it is a substrate whose surface is to be processed. In that case, the substrate component that has come out in the etching treatment liquid is removed by the etching treatment, and the etching treatment solution is again subjected to the etching treatment of the substrate with the substrate component removed.

10 Spin processing equipment (substrate processing mechanism)
DESCRIPTION OF SYMBOLS 11 Cup body 12 Motor 13 Wafer chuck 14 Nozzle 20 Process liquid supply unit 21 Recovery tank 22 1st supply tank 23 2nd supply tank 24 Silicon removal tank 30 Process liquid recovery mechanism 31 Drain tank 32 Pump 40 Control unit

The present invention provides a substrate processing method and a substrate processing system that enable effective recovery and reuse of an etching processing solution .

The substrate processing method according to the present invention comprises:
A substrate processing method for processing a substrate using a processing liquid in a substrate processing mechanism,
A processing liquid recovery step of recovering a post-use processing liquid used for processing the substrate in the substrate processing mechanism;
A treatment liquid return step for returning the recovered post-use treatment liquid to the substrate processing mechanism as a new treatment liquid;
A determination step of determining whether the recovered post-use processing liquid is effective as a processing liquid for processing the substrate;
Treatment liquid concentration adjustment that adjusts the component concentration of the post-use treatment liquid by adding one or more components of the treatment liquid to the collected post-use treatment liquid on the condition that it is judged to be effective in the judgment step Steps,
It is characterized by having.

A substrate processing system according to the present invention includes:
A substrate processing mechanism for processing a substrate using a processing liquid;
A processing liquid recovery mechanism for recovering a post-use processing liquid used for processing the substrate in the substrate processing mechanism;
A treatment liquid return mechanism for returning the collected post-use treatment liquid to the substrate treatment mechanism as a new treatment liquid;
Determination means for determining whether the recovered post-use processing liquid is effective as a processing liquid for processing the substrate;
Treatment liquid concentration adjustment that adjusts the component concentration of the post-use treatment liquid by adding one or more components of the treatment liquid to the collected post-use treatment liquid on the condition that the judgment means determines that it is effective Means,
It is characterized by having.

According to the substrate processing method and the substrate processing system according to the present invention, it is possible to effectively recover and reuse the etching processing solution .

The control unit 40 switches the supply of the etching processing liquid to the spin processing apparatus 10 from the first supply tank 22 to the second supply tank 23 (see FIG. 14), and then etches from the second supply tank 23 to the spin processing apparatus 10. While maintaining the supply of the processing liquid, the on-off valves V1 and V5 are opened to operate the pump P4. As a result, as shown in FIG. 28, the etching solution in the first supply tank 22 is not transferred to the silicon removal tank 24 described above, but is drained (Drain) (S61). When the discharge of the etching processing liquid in the first supply tank 22 is finished, the control unit 40 closes the on-off valves V1 and V5 and stops the pump P4, and then controls the opening degree of the control valve group SVc1. As a result, the chemical solution (HF, HNO ₃ , CH ₃ COOH, H ₂ O) from the chemical solution supply unit is adjusted while the flow rate is adjusted through the control valve group SVc1, as shown by the thick line in FIG. 1 is supplied to the first supply tank 22, and a new etching processing solution is prepared in the first supply tank 22 (S62). Thereafter, the control valve group SVc1 is closed, and in the first supply tank 22 from which the supply of each chemical solution is stopped, as shown in FIG. 30, the etching treatment liquid is circulated while being adjusted to a predetermined temperature (S63). The concentration of the treatment liquid can be made uniform.

Claims (18)

A substrate processing method for processing a substrate using a processing liquid in a substrate processing mechanism,
A processing liquid recovery step of recovering a post-use processing liquid used for processing the substrate in the substrate processing mechanism;
A treatment liquid return step for returning the recovered post-use treatment liquid to the substrate processing mechanism as a new treatment liquid;
A substrate component removal step for removing the components of the substrate dissolved in the post-use processing solution before returning the recovered post-use processing solution to the substrate processing mechanism;
The substrate processing method which uses the said post-use process liquid which passed through the said board | substrate component removal step for the said process liquid return step. A determination step of determining whether a processing liquid used in the substrate processing mechanism is effective as a processing liquid for processing the substrate;
The substrate processing method according to claim 1, further comprising: a control step of executing the substrate component removal step when the determination step determines that the processing solution is not effective as a processing solution for processing the substrate.   3. A processing liquid concentration adjusting step of adjusting a component concentration of the processing liquid by adding one or a plurality of components of the processing liquid to the processing liquid from which the components of the substrate have been removed by the substrate component removing step. The substrate processing method as described. The substrate processing mechanism is for etching a substrate using an etching processing solution,
The substrate processing method according to claim 1, wherein an etching processing liquid is used as the processing liquid. The substrate processing mechanism is for etching a silicon substrate as the substrate with an etching treatment liquid containing hydrofluoric acid (HF) and nitric acid (HNO3),
The substrate processing method according to claim 1, wherein the substrate component removing step removes silicon in the post-use etching solution. A determination step for determining whether or not an etching processing solution used in the substrate processing mechanism is effective as a processing solution for etching the silicon substrate;
6. The substrate processing according to claim 5, further comprising a control step of executing the substrate component removal step when the determination step determines that the etching processing solution is not effective as a processing solution for etching the silicon substrate. Method.   2. An etching treatment solution concentration adjusting step of adjusting a component concentration of the etching treatment solution by adding hydrofluoric acid (HF) and nitric acid (HNO3) to the etching treatment solution from which the silicon has been removed by the substrate component removal step. 7. The substrate processing method according to 5 or 6.   8. The substrate etching method according to claim 5, wherein the substrate component removing step electrolyzes the post-use etching treatment liquid to deposit silicon in the post-use etching treatment liquid.   9. The substrate etching method according to claim 8, further comprising an electrode silicon removal step of removing silicon adhering to the electrode used for the electrolysis with a new etching treatment liquid containing hydrofluoric acid (HF) and nitric acid (HNO3). A substrate processing mechanism for processing a substrate using a processing liquid;
A processing liquid recovery mechanism for recovering a post-use processing liquid used for processing the substrate in the substrate processing mechanism;
A treatment liquid return mechanism for returning the collected post-use treatment liquid to the substrate treatment mechanism as a new treatment liquid;
A substrate component removal mechanism that removes the components of the substrate dissolved in the post-use processing solution before returning the collected post-use processing solution to the substrate processing mechanism;
A substrate processing system that provides the post-use processing liquid that has passed through the substrate component removal mechanism to the processing liquid return mechanism. Determination means for determining whether or not a processing liquid used in the substrate processing mechanism is effective as a processing liquid for processing the substrate;
Control means for causing the substrate component removal mechanism to remove a component of the substrate in the post-use processing liquid when the determination means determines that the processing liquid is not effective as a processing liquid for processing the substrate; The substrate processing system according to claim 10.   12. A processing liquid concentration adjusting means for adjusting a component concentration of the processing liquid by adding one or a plurality of components of the processing liquid to the processing liquid from which the components of the substrate have been removed by the substrate component removing mechanism. The substrate processing system as described. Etching the substrate using an etching solution,
The substrate processing system according to claim 10, wherein an etching processing liquid is used as the processing liquid. The substrate processing mechanism is for etching a silicon substrate as the substrate with an etching treatment liquid containing hydrofluoric acid (HF) and nitric acid (HNO3),
The substrate processing system according to claim 10, wherein the substrate component removing mechanism removes silicon in the post-use etching processing solution. Determining means for determining whether or not an etching processing liquid used in the substrate processing mechanism is effective as a processing liquid for etching the silicon substrate;
Control for causing the substrate component removal mechanism to remove silicon in the post-use etching processing liquid when the determination means determines that the etching processing liquid is not effective as a processing liquid for etching the silicon substrate. 15. The substrate processing system according to claim 14, further comprising: means.   15. An etching processing solution concentration adjusting means for adjusting the concentration of the etching processing solution by adding hydrofluoric acid (HF) and nitric acid (HNO3) to the etching processing solution from which the silicon has been removed by the substrate component removal mechanism. Or the substrate processing system of 15.   The substrate processing system according to any one of claims 14 to 16, wherein the substrate component removal mechanism includes an electrolysis device that electrolyzes the post-use etching treatment liquid to deposit silicon in the post-use etching treatment liquid.   18. The substrate processing system according to claim 17, further comprising an electrode silicon removing mechanism that removes silicon adhering to the electrode of the electrolysis apparatus with a new etching processing solution containing hydrofluoric acid (HF) and nitric acid (HNO3).

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