JP2016031412A - Apparatus and method for washing off adhesive of pellicle of photomask - Google Patents
Apparatus and method for washing off adhesive of pellicle of photomask Download PDFInfo
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- JP2016031412A JP2016031412A JP2014152807A JP2014152807A JP2016031412A JP 2016031412 A JP2016031412 A JP 2016031412A JP 2014152807 A JP2014152807 A JP 2014152807A JP 2014152807 A JP2014152807 A JP 2014152807A JP 2016031412 A JP2016031412 A JP 2016031412A
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- photomask
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- pellicle
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- cleaning liquid
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- 239000000853 adhesive Substances 0.000 title claims abstract description 116
- 230000001070 adhesive effect Effects 0.000 title claims abstract description 116
- 238000000034 method Methods 0.000 title claims abstract description 16
- 238000005406 washing Methods 0.000 title abstract description 12
- 238000004140 cleaning Methods 0.000 claims abstract description 150
- 238000005507 spraying Methods 0.000 claims abstract description 10
- 239000007921 spray Substances 0.000 claims abstract description 5
- 239000007788 liquid Substances 0.000 claims description 84
- 238000007664 blowing Methods 0.000 claims description 3
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 16
- 230000000694 effects Effects 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Abstract
Description
本発明は、フォトマスクからペリクルを剥離した際にフォトマスク表面に残るペリクルの粘着剤を洗浄するフォトマスクのペリクルの粘着剤の洗浄装置及びペリクルの粘着剤の洗浄方法に関する。 The present invention relates to a pellicle adhesive cleaning apparatus and a pellicle adhesive cleaning method for cleaning a pellicle adhesive remaining on the surface of a photomask when the pellicle is peeled from the photomask.
微細なパターンをフォトリソグラフィー法により露光して転写するために使用されるフォトマスクにおいて、パターン面に塵埃等の異物が付着すると、異物自体が露光対象基板面に転写されたり、異物が露光を遮って露光対象基板面に影を作ることにより欠陥パターンが転写されたりする。上記の理由により、特に、多数の露光対象基板に影響を及ぼすフォトマスクの面を塵埃の付着から保護するための対策が講じられている。 In a photomask used to expose and transfer a fine pattern by photolithography, if foreign matter such as dust adheres to the pattern surface, the foreign matter itself is transferred to the exposure target substrate surface, or the foreign matter blocks the exposure. The defect pattern is transferred by making a shadow on the exposure target substrate surface. For the above reasons, in particular, measures have been taken to protect the surface of the photomask that affects a large number of exposure target substrates from adhesion of dust.
そのために、特許文献１のように、投影露光に用いるフォトマスクの有効領域外の表面にペリクルフレームと称する枠体を配置し、それを介してフォトマスクの有効領域全面を覆う、露光光源波長に対して透明性な、厚さ数百ｎｍから数μｍのペリクル膜をフォトマスク面とほぼ平行に張設して近接配置する。それにより、有効領域に接触させることなくフォトマスクの表面を保護する。また、ペリクル膜上に付着した異物は、露光時に焦点を外し、異物が露光対象基板面に影を作らないようにできる。 Therefore, as in Patent Document 1, a frame body called a pellicle frame is arranged on the surface outside the effective area of the photomask used for projection exposure, and the entire effective area of the photomask is covered via the frame. On the other hand, a pellicle film having a thickness of several hundreds of nanometers to several μm, which is transparent to the photomask surface, is stretched almost in parallel and is arranged close to the photomask surface. Thereby, the surface of the photomask is protected without contacting the effective area. Further, the foreign matter adhering to the pellicle film can be out of focus at the time of exposure so that the foreign matter does not make a shadow on the exposure target substrate surface.
フォトマスクへ貼付した後のペリクルは、何らかの理由で貼替えが必要になれば剥離しなければならない。しかし、そのペリクルをフォトマスクへ貼付けていた粘着剤の一部はフォトマスク上に付着したまま残ってしまうので、フォトマスクを再利用するために粘着剤を洗浄して完全に除去しておく必要がある。 The pellicle after being attached to the photomask must be peeled off if it is necessary to change the pellicle for some reason. However, since some of the adhesive that was attached to the photomask remains attached to the photomask, the adhesive must be washed and completely removed to reuse the photomask. There is.
そのため、特許文献１では、粘着剤の一部が残ったフォトマスクを洗浄液に浸漬して、粘着剤を除去するフォトマスクの洗浄方法が開示されている。 Therefore, Patent Document 1 discloses a photomask cleaning method in which a photomask in which a part of the adhesive remains is immersed in a cleaning liquid to remove the adhesive.
しかし、フォトマスクを露光した後に特許文献１の方法を用いてペリクルを剥離した場合に、ペリクルの粘着剤がフォトマスクに強く癒着していて、容易にはフォトマスクから剥離できない場合がある。そのため、時には綿棒に硫酸をしみこませ、直接物理的に粘着剤をフォトマスクからこそぎ取るという手法も使っている。 However, when the pellicle is peeled off using the method of Patent Document 1 after exposing the photomask, the pellicle adhesive may be strongly adhered to the photomask and cannot be easily peeled off from the photomask. For this reason, sometimes we use a technique in which sulfuric acid is soaked in a cotton swab and the adhesive is physically peeled off directly from the photomask.
また、粘着剤を洗浄するために硫酸槽にフォトマスクを漬け込んで粘着剤を溶解して除去する場合は、多量の洗浄液を使用するので、そのための洗浄液の消費量が多いという問題があった。 In addition, when the adhesive is dissolved and removed by immersing the photomask in a sulfuric acid tank in order to wash the adhesive, a large amount of cleaning liquid is used, which causes a problem that the consumption of the cleaning liquid is large.
本発明は、上記の問題を改善し、ペリクルを剥がしたフォトマスクの表面に残る粘着剤を洗浄する際に、少ない洗浄液で効果的にフォトマスクを洗浄することを課題とする。 An object of the present invention is to improve the above problems and to effectively clean a photomask with a small amount of cleaning liquid when cleaning the adhesive remaining on the surface of the photomask from which the pellicle has been peeled off.
本発明は、上記の課題を解決するために、フォトマスクのペリクルフレーム跡に残る粘着剤パターンの内側のマスクパターンに覆い被せるカバーと、前記フォトマスクのペリクルフレーム跡に残る粘着剤に、ポンプで圧力を加えた洗浄液を前記フォトマスクの外側に向けた流れで噴出させて噴き付けるノズルを有し、前記ノズルから、前記フォトマスクの面上の粘着剤をフォトマスクの外側に押し流す圧力を加えた洗浄液を噴出させて粘着剤に噴き付けることで、粘着剤をフォトマスクの外側に押し流して剥離し洗浄することを特徴とするフォトマスクのペリクルの粘着剤の洗浄装置である。 In order to solve the above problems, the present invention provides a pump that covers the mask pattern on the inner side of the adhesive pattern remaining on the pellicle frame trace of the photomask and the adhesive remaining on the pellicle frame trace of the photomask. A nozzle for spraying the sprayed cleaning liquid in a flow toward the outside of the photomask, and applying pressure to push the adhesive on the surface of the photomask to the outside of the photomask from the nozzle; An apparatus for cleaning an adhesive for a pellicle of a photomask, wherein the cleaning liquid is ejected and sprayed onto the adhesive to push the adhesive away from the photomask to separate and clean it.
本発明のフォトマスクのペリクルの粘着剤の洗浄装置は、この構成により、比較的少量の洗浄液を用いて、圧力をかけてノズルから勢いよく流出させた洗浄液をフォトマスク上を外側に向けて勢いよく流すことができる。本発明は、その洗浄液の強い流れによってフォトマスクに粘着していた粘着剤を押し流すことでフォトマスクから剥離し、フォトマスクの外側へ押し出して除去できる効果がある。 With this configuration, the photomask pellicle adhesive cleaning apparatus of the present invention uses a relatively small amount of cleaning liquid and vigorously flows the cleaning liquid that has flowed out of the nozzle by applying pressure toward the outside on the photomask. Can flow well. The present invention has an effect that it can be peeled off from the photomask by pushing away the adhesive that has adhered to the photomask by the strong flow of the cleaning liquid, and pushed out to the outside of the photomask to be removed.
また、本発明は、上記のフォトマスクのペリクルの粘着剤の洗浄装置であって、前記カバーの内側に気流用ノズルを有し、気流用ノズルから気流をフォトマスクに吹き付けて、気流用ノズルからフォトマスクに至るエアーカーテンを形成し、気流をフォトマスクの面に沿って前記カバーの外側に流出させ、気流により洗浄液をフォトマスクの外側へ押し出すことを特徴とするフォトマスクのペリクルの粘着剤の洗浄装置である。 Further, the present invention is an apparatus for cleaning an adhesive for a pellicle of the above-described photomask, comprising an airflow nozzle inside the cover, blowing an airflow from the airflow nozzle to the photomask, and from the airflow nozzle An air curtain leading to the photomask is formed, an airflow is caused to flow out of the cover along the surface of the photomask, and the cleaning liquid is pushed out of the photomask by the airflow. It is a cleaning device.
また、本発明は、上記のフォトマスクのペリクルの粘着剤の洗浄装置であって、フォトマスクに残った粘着剤に洗浄液を噴き付けつつ、ブラシで粘着剤を擦り落とす移動式ブラシ装置を前記カバーの端部に備え、前記移動式ブラシ装置を駆動装置で粘着剤に沿って移動させることで、粘着剤を洗浄液で洗浄するのと同時に前記ブラシで擦り落とすことを特徴とするフォトマスクのペリクルの粘着剤の洗浄装置である。 The present invention also provides an apparatus for cleaning an adhesive for a pellicle of the above-described photomask, wherein the movable brush apparatus is configured to rub off the adhesive with a brush while spraying a cleaning liquid onto the adhesive remaining on the photomask. The pellicle of the photomask is characterized in that the movable brush device is moved along the adhesive with a driving device, and the adhesive is washed with the cleaning liquid and simultaneously rubbed off with the brush. It is an adhesive cleaning device.
また、本発明は、フォトマスクのペリクルフレーム跡に残る粘着剤のパターンの内側のマスクパターンにカバーを覆い被せ、前記フォトマスクのペリクルフレーム跡に残る粘着剤に、ポンプで圧力を加えた洗浄液を前記フォトマスクの外側に向けた流れでノズルから噴出させて噴き付けることで、フォトマスクの面上の粘着剤をフォトマスクの外側に押し流す圧力を加えた洗浄液をノズルから噴出させて粘着剤に噴き付け、粘着剤をフォトマスクの外側に押し流して剥離し洗浄することを特徴とするフォトマスクのペリクルの粘着剤の洗浄方法である。 In addition, the present invention covers a mask on the inner side of the adhesive pattern remaining on the pellicle frame trace of the photomask, and a cleaning liquid in which pressure is applied by a pump to the adhesive remaining on the pellicle frame trace of the photomask. By spraying from the nozzle in a flow directed toward the outside of the photomask, a cleaning liquid to which pressure is applied to push the adhesive on the surface of the photomask to the outside of the photomask is ejected from the nozzle and sprayed onto the adhesive. A method for cleaning a pressure sensitive adhesive for a pellicle of a photomask, wherein the pressure sensitive adhesive is pushed to the outside of the photomask, peeled off and cleaned.
また、本発明は、上記のフォトマスクのペリクルの粘着剤の洗浄方法であって、前記カバーの内側の気流用ノズルから気流をフォトマスクに吹き付けて、気流用ノズルからフォトマスクに至るエアーカーテンを形成し、気流をフォトマスクの面に沿ってカバーの外側に流出させ、気流により洗浄液をフォトマスクの外側へ押し出すことを特徴とするフォトマスクのペリクルの粘着剤の洗浄方法である。 Further, the present invention is a method for cleaning an adhesive of a pellicle of the photomask, wherein an air curtain from the airflow nozzle to the photomask is blown by blowing an airflow from the airflow nozzle inside the cover. A method for cleaning an adhesive for a pellicle of a photomask is characterized in that the airflow is formed and allowed to flow along the surface of the photomask to the outside of the cover, and the cleaning liquid is pushed out of the photomask by the airflow.
また、本発明は、上記のフォトマスクのペリクルの粘着剤の洗浄方法であって、フォトマスクに残った粘着剤に洗浄液を噴き付けつつ、前記カバーの端部に設置した移動式ブラシ装置を駆動装置で粘着剤に沿って移動させることで、粘着剤を洗浄液で洗浄するのと同時に移動式ブラシ装置のブラシで粘着剤を擦り落とすことを特徴とするフォトマスクのペリクルの粘着剤の洗浄方法である。 Further, the present invention is a method for cleaning an adhesive of a pellicle of the photomask, and driving a mobile brush device installed at an end of the cover while spraying a cleaning liquid on the adhesive remaining on the photomask. A method for cleaning the adhesive of a pellicle of a photomask, characterized in that the adhesive is washed with a cleaning liquid at the same time as the adhesive is moved by the apparatus, and at the same time, the adhesive is scraped off with the brush of the mobile brush device. is there.
本発明は、ペリクルを剥がしたフォトマスクの表面に残る粘着剤を洗浄する際に、ポンプで圧力を加えた洗浄液をノズルから流出させることで、粘着剤をフォトマスクの外側に押し流す洗浄液の勢いの強い流れを作ることができる。 In the present invention, when cleaning the adhesive remaining on the surface of the photomask from which the pellicle has been peeled, the cleaning liquid applied with pressure by the pump is allowed to flow out of the nozzle, thereby cleaning the momentum of the cleaning liquid that pushes the adhesive to the outside of the photomask. A strong flow can be made.
そして、その洗浄液の強い流れによって粘着剤をフォトマスクから押し流して剥離し、フォトマスクの外側へ押し出して除去する。そのように、本発明によれば、比較的少量の洗浄液を用いてフォトマスクの表面に残る粘着剤を洗浄液の強い流れで押して剥離して速やかに洗浄することができる効果がある。 Then, the adhesive is pushed away from the photomask by the strong flow of the cleaning liquid and peeled off, and pushed out to the outside of the photomask to be removed. As described above, according to the present invention, there is an effect that the adhesive remaining on the surface of the photomask can be pressed and peeled off with a strong flow of the cleaning liquid using a relatively small amount of the cleaning liquid and quickly cleaned.
（洗浄対象のフォトマスク）
図１（ａ）は、ペリクル３を取り付けたフォトマスク１を示す平面図である。図１（ｂ）は、その側面図である。図１（ｃ）は、そのフォトマスク１からペリクル３を剥がした後の状態を示す平面図である。
(Photomask to be cleaned)
FIG. 1A is a plan view showing a photomask 1 to which a pellicle 3 is attached. FIG. 1B is a side view thereof. FIG. 1C is a plan view showing a state after the pellicle 3 is peeled off from the photomask 1.
フォトマスク１のマスクパターン２が作製された面には、ペリクルフレーム３ａにマスクパターン２の保護膜３ｂを張って成るペリクル３を、そのペリクルフレーム３ａを、粘着剤４で接着する。 On the surface of the photomask 1 on which the mask pattern 2 is formed, a pellicle 3 formed by stretching a protective film 3b of the mask pattern 2 on a pellicle frame 3a is bonded to the pellicle frame 3a with an adhesive 4.
ペリクルフレーム３ａをフォトマスク１に接着するために用いる粘着剤４は、熱可塑性があり、熱を加えると柔らかくなるので、フォトマスク１からペリクル３のペリクル３を剥がす際には、フォトマスク１を温め、ペリクルフレーム３ａを冷やしてペリクルフレーム３ａをフォトマスク１から剥がす。 The pressure-sensitive adhesive 4 used for bonding the pellicle frame 3a to the photomask 1 is thermoplastic and softens when heat is applied. Therefore, when the pellicle 3 of the pellicle 3 is peeled off from the photomask 1, the photomask 1 is removed. The pellicle frame 3a is cooled and the pellicle frame 3a is peeled off from the photomask 1.
そうすることで、ペリクル３側に残る粘着剤４を多くし、フォトマスク１側に残る粘着剤４が少なくなるようにしてペリクル３を剥がす。 By doing so, the pressure-sensitive adhesive 4 remaining on the pellicle 3 side is increased, and the pellicle 3 is peeled off so that the pressure-sensitive adhesive 4 remaining on the photomask 1 side is decreased.
そうしてペリクル３をフォトマスク１から剥がしたペリクルフレーム３ａの跡に、図１（ｃ）のように、マスクパターン２の周りのペリクルフレーム３ａの粘着箇所の跡に粘着剤４が残留する。そのため、その残留した粘着剤４を、洗浄液５等を用いて洗浄する。 Thus, the adhesive 4 remains on the trace of the pellicle frame 3a from which the pellicle 3 has been peeled off from the photomask 1 and on the trace of the adhesion portion of the pellicle frame 3a around the mask pattern 2 as shown in FIG. Therefore, the remaining adhesive 4 is cleaned using the cleaning liquid 5 or the like.
＜第１の実施形態＞
図２は、本発明の第１の実施形態の、ペリクル３の粘着剤の洗浄装置１０の洗浄部を示す図である。図２（ａ）は、ペリクル３を外したフォトマスク１に粘着剤の洗浄装置１０の洗浄部を設置した状態を示す図である。
<First Embodiment>
FIG. 2 is a diagram illustrating a cleaning unit of the adhesive cleaning device 10 of the pellicle 3 according to the first embodiment of the present invention. FIG. 2A is a diagram illustrating a state where the cleaning unit of the adhesive cleaning device 10 is installed on the photomask 1 from which the pellicle 3 is removed.
ここで、粘着剤の洗浄装置１０に設置するフォトマスク１は、粘着剤４が付着した面でマスクパターン２が形成されている面を上側に向けて、粘着剤の洗浄装置１０に設置する。ペリクル３の粘着剤の洗浄装置１０からは、フォトマスク１に向けて、粘着剤の洗浄装置１０のカバー１０ａの外側に向けて流れる洗浄液５を流出させる。 Here, the photomask 1 installed in the adhesive cleaning device 10 is installed in the adhesive cleaning device 10 with the surface on which the mask pattern 2 is formed on the surface to which the adhesive 4 is attached facing upward. From the adhesive cleaning device 10 of the pellicle 3, the cleaning liquid 5 that flows toward the outside of the cover 10 a of the adhesive cleaning device 10 flows out toward the photomask 1.
（粘着剤の洗浄装置）
図２（ｂ）は、粘着剤の洗浄装置１０の洗浄部の横断面図であり、図２（ｃ）は、粘着剤の洗浄装置１０の洗浄部の側断面図である。図３に、洗浄部とポンプ１１とから成る粘着剤の洗浄装置１０の全体構成を示す。
(Adhesive cleaning equipment)
FIG. 2B is a cross-sectional view of the cleaning unit of the pressure-sensitive adhesive cleaning device 10, and FIG. 2C is a side cross-sectional view of the cleaning unit of the pressure-sensitive adhesive cleaning device 10. FIG. 3 shows an overall configuration of the pressure sensitive adhesive cleaning apparatus 10 including a cleaning unit and a pump 11.
図３のように、粘着剤の洗浄装置１０を、洗浄液５に圧力をかけて供給するポンプ１１と洗浄部で構成する。粘着剤の洗浄装置１０の洗浄部は、箱型に成形したカバー１０ａと、洗浄液５を流入させる洗浄液注入口１３と、カバー１０ａの側部の、洗浄液５を、フォトマスク１上の粘着剤４に噴き付けるノズル１２と、その洗浄液注入口１３とノズル１２をつなぐ洗浄液用流路１４で構成する。 As shown in FIG. 3, the pressure sensitive adhesive cleaning device 10 includes a pump 11 that supplies pressure to the cleaning liquid 5 and a cleaning unit. The cleaning unit of the adhesive cleaning apparatus 10 includes a cover 10a formed in a box shape, a cleaning liquid inlet 13 through which the cleaning liquid 5 flows, and the cleaning liquid 5 on the side of the cover 10a. And a cleaning liquid flow path 14 connecting the cleaning liquid inlet 13 and the nozzle 12 to each other.
ノズル１２は、洗浄液５がフォトマスク１上をその外側に向けて流出するように、洗浄液５をカバー１０ａの外側に向けて流出させるために、洗浄液５の流路をフォトマスク１の面に垂直な方向からカバー１０ａの外側に傾けたノズル１２に形成する。 The nozzle 12 allows the flow of the cleaning liquid 5 to be perpendicular to the surface of the photomask 1 so that the cleaning liquid 5 flows out toward the outside of the cover 10a so that the cleaning liquid 5 flows out toward the outside of the photomask 1. The nozzle 12 is formed to be inclined to the outside of the cover 10a from any direction.
粘着剤の洗浄装置１０は、この構成により、ポンプ１１で圧力をかけた洗浄液５をノズル１２からカバー１０ａの外側に流出させる。ポンプ１１で圧力をかけた洗浄液５を噴き付けることでフォトマスク１上に粘着剤４に、フォトマスク１の外側へ押し流す圧力（摩擦力）を加える。その洗浄液５の流れの圧力により粘着剤４をフォトマスク１から剥離してフォトマスク１の外に押し流す。 With this configuration, the adhesive cleaning device 10 causes the cleaning liquid 5 applied with pressure by the pump 11 to flow out of the cover 10 a from the nozzle 12. By spraying the cleaning liquid 5 applied with pressure by the pump 11, pressure (frictional force) is applied to the pressure-sensitive adhesive 4 on the photomask 1 and pushes it outward of the photomask 1. The pressure-sensitive adhesive 4 is peeled from the photomask 1 by the pressure of the flow of the cleaning liquid 5 and pushed out of the photomask 1.
ポンプ１１が洗浄液５に加える圧力を高くすることで、洗浄液５が粘着剤４に加える、フォトマスク１の外側へ押し流す圧力（摩擦力）を強くすることができる。 By increasing the pressure that the pump 11 applies to the cleaning liquid 5, the pressure (frictional force) that the cleaning liquid 5 applies to the adhesive 4 and that flows to the outside of the photomask 1 can be increased.
こうして、ポンプ１１で圧力を加えた洗浄液５をノズル１２から流出させることで、洗浄液５をフォトマスク１の外側に流す洗浄液５の勢いの強い流れを作り、その強い流れで粘着剤４を押し流すことができる効果がある。 In this way, the cleaning liquid 5 to which pressure is applied by the pump 11 is caused to flow out of the nozzle 12, thereby creating a strong flow of the cleaning liquid 5 that flows the cleaning liquid 5 to the outside of the photomask 1, and the adhesive 4 is pushed away by the strong flow. There is an effect that can.
粘着剤の洗浄装置１０のカバー１０ａを、図１のフォトマスク１のペリクル３跡に残る粘着剤４の一部が残る領域の内側に、図２のようにマスクパターン２を覆ってフォトマスク１に被せる。カバー１０ａの設置は、フォトマスク１に接触させても良く、またカバー１０ａの端部をフォトマスク１から僅かな隙間を開けて、フォトマスク１に非接触な状態で設置しても良い。 The cover 10a of the adhesive cleaning apparatus 10 is covered with the mask pattern 2 as shown in FIG. 2 inside the region where a part of the adhesive 4 remaining on the trace of the pellicle 3 of the photomask 1 in FIG. Put on. The cover 10 a may be placed in contact with the photomask 1, or the end of the cover 10 a may be placed in a non-contact state with a slight gap from the photomask 1.
粘着剤の洗浄装置１０は、カバー１０ａの上面に空けた洗浄液注入口１３からカバー１０ａ内の洗浄液用流路１４に洗浄液５を注入する。これにより、洗浄液５を、洗浄液注入口１３からカバー１０ａ内に注入し、洗浄液用流路１４を介してノズル１２からフォトマスク１上の粘着剤４に洗浄液５を噴き付け、粘着剤４にフォトマスク１の外側に押し流す圧力を加える。 The adhesive cleaning device 10 injects the cleaning liquid 5 into the cleaning liquid flow path 14 in the cover 10a from the cleaning liquid inlet 13 formed in the upper surface of the cover 10a. As a result, the cleaning liquid 5 is injected into the cover 10 a from the cleaning liquid inlet 13, and the cleaning liquid 5 is sprayed from the nozzle 12 to the adhesive 4 on the photomask 1 via the cleaning liquid flow path 14, A pressure that pushes the outside of the mask 1 is applied.
粘着剤の洗浄装置１０は、この構成により、ノズル１２から洗浄液５をカバー１０ａの外側に向けて粘着剤４に噴き付け、すなわち、洗浄液５によって粘着剤４にフォトマスク１の外側に押し流す圧力を加えて粘着剤４を剥離し、剥離した粘着剤４をフォトマスク１の外側へ押し流す。 With this configuration, the adhesive cleaning device 10 sprays the cleaning liquid 5 from the nozzle 12 toward the outside of the cover 10 a onto the adhesive 4, that is, presses the cleaning liquid 5 against the adhesive 4 to the outside of the photomask 1. In addition, the pressure-sensitive adhesive 4 is peeled off, and the peeled pressure-sensitive adhesive 4 is pushed out of the photomask 1.
粘着剤４を剥離するために用いる洗浄液５は、例えば硫酸系の液体などを使用することができる。また、粘着剤４の種類に応じて、キシレンやトルエン等を、その粘着剤４を綺麗に洗浄する効果が大きい洗浄液５として用いることもできる。 As the cleaning liquid 5 used for peeling off the pressure-sensitive adhesive 4, for example, a sulfuric acid-based liquid can be used. Moreover, xylene, toluene, etc. can also be used as the washing | cleaning liquid 5 with the big effect which cleans the adhesive 4 neatly according to the kind of adhesive 4. FIG.
洗浄液５は、マスクパターン２に接触しないように流出させる。それにより、洗浄液５を、マスクパターン２に被害を与えるか否かに関わらず、粘着剤４を効果的に洗浄できる洗浄液５を使用することができる。 The cleaning liquid 5 is caused to flow out so as not to contact the mask pattern 2. Accordingly, it is possible to use the cleaning liquid 5 that can effectively clean the adhesive 4 regardless of whether the cleaning liquid 5 damages the mask pattern 2 or not.
また、洗浄液５は加熱して温度を高くした洗浄液を用いることが望ましい。そうすることで、粘着剤４を、加熱したフォトマスク１からの熱で加熱するとともに、洗浄液によっても加熱することで柔らかくして粘着剤４の洗浄効果を高めることができる。 Further, it is desirable to use a cleaning liquid that is heated to raise the temperature. By doing so, while heating the adhesive 4 with the heat from the heated photomask 1, it can also be softened by heating with a washing | cleaning liquid, and the cleaning effect of the adhesive 4 can be improved.
こうして、フォトマスク１のマスクパターンをカバー１０ａで覆って保護し、比較的少量の洗浄液５を用いて、ノズル１２からカバー１０ａの外側に流出させる洗浄液５の流れによってフォトマスク１から粘着剤４を剥離し、フォトマスク１の外側へ押し流して除去できる効果がある。 Thus, the mask pattern of the photomask 1 is covered and protected by the cover 10a, and the adhesive 4 is removed from the photomask 1 by the flow of the cleaning liquid 5 that flows out of the cover 10a from the nozzle 12 using a relatively small amount of the cleaning liquid 5. There is an effect that it can be peeled off and pushed away to the outside of the photomask 1.
（変形例１）
図４は、本発明の第１の実施形態の変形例１の粘着剤の洗浄装置１０の側断面図である。変形例１は、カバー１０ａの側面を、フォトマスク１の面に垂直な方向から傾ける。そして、その側面に沿った洗浄液用流路１４に洗浄液５を流しノズル１２から流出させる。
(Modification 1)
FIG. 4 is a sectional side view of the pressure sensitive adhesive cleaning apparatus 10 according to Modification 1 of the first embodiment of the present invention. In the first modification, the side surface of the cover 10 a is tilted from the direction perpendicular to the surface of the photomask 1. Then, the cleaning liquid 5 is caused to flow through the cleaning liquid flow path 14 along the side surface thereof, and is discharged from the nozzle 12.
それにより、洗浄液５のノズル１２から粘着剤４への噴出方向を、フォトマスク１の面に垂直な方向からカバー１０ａの外側に傾けて流出させる。この洗浄液５の、フォトマスク１の外側へ流れる流れの圧力によって、粘着剤４をカバー１０ａの外側（フォトマスク１の外側）へ押し流す。 Thereby, the ejection direction of the cleaning liquid 5 from the nozzle 12 to the adhesive 4 is inclined to the outside of the cover 10 a from the direction perpendicular to the surface of the photomask 1 and flows out. The pressure of the flow of the cleaning liquid 5 flowing outside the photomask 1 pushes the adhesive 4 to the outside of the cover 10a (outside the photomask 1).
＜第２の実施形態＞
図５は、本発明の第２の実施形態の粘着剤の洗浄装置１０の側断面図である。第２の実施形態は、カバー１０ａの内側の気流用ノズル１７から気流６をフォトマスク１に吹き付けて、気流用ノズル１７からフォトマスク１に至るエアーカーテンを形成する。そして、その気流６をフォトマスク１の面に沿ってカバー１０ａの下端から、カバー１０ａの外側に流出させる。
<Second Embodiment>
FIG. 5 is a sectional side view of the pressure-sensitive adhesive cleaning device 10 according to the second embodiment of the present invention. In the second embodiment, the airflow 6 from the airflow nozzle 17 inside the cover 10 a is blown onto the photomask 1 to form an air curtain that extends from the airflow nozzle 17 to the photomask 1. Then, the air flow 6 flows out from the lower end of the cover 10a along the surface of the photomask 1 to the outside of the cover 10a.
こうすることで、本実施形態では、カバー１０ａ内の洗浄液５がカバー１０ａの縁の隙間からカバー１０ａ内に逆流してマスクパターン２に接触することが無いようにできる効果がある。 By doing so, in the present embodiment, there is an effect that the cleaning liquid 5 in the cover 10 a can be prevented from flowing back into the cover 10 a from the gap between the edges of the cover 10 a and coming into contact with the mask pattern 2.
また、図５に示すカバー１０ａに、気流６を流入させる気流注入口１５を設ける。そして、気流６を、気流注入口１５から、カバー１０ａの内側に設けた気流用流路１６を介して、ノズル１２よりもカバー１０ａの内側に設けた気流用ノズル１７から流出させる。それにより、その気流６をカバー１０ａの下端とフォトマスク１との間の隙間からカバー１０ａの外側に流出させる。 Further, the air flow inlet 15 through which the air flow 6 flows is provided in the cover 10a shown in FIG. Then, the airflow 6 is caused to flow out of the airflow nozzle 17 provided inside the cover 10 a rather than the nozzle 12 through the airflow channel 16 provided inside the cover 10 a from the airflow inlet 15. Thereby, the air flow 6 is caused to flow out of the cover 10a from the gap between the lower end of the cover 10a and the photomask 1.
気流６は、フォトマスク１のマスクパターン２に接する。そのため、気流６には、マスクパターン２に被害を与えない窒素やクリーンエア等の気体を用いる。 The airflow 6 is in contact with the mask pattern 2 of the photomask 1. Therefore, a gas such as nitrogen or clean air that does not damage the mask pattern 2 is used for the airflow 6.
こうして、カバー１０ａの気流用ノズル１７から流出させた気流６により気体の壁のエアーカーテンを形成し、気流６をフォトマスク１上をカバー１０ａの外側に流す。この気流６流路にあたるカバー１０ａの端部とフォトマスク１の間に隙間を開け、気流６をその隙間からカバー１０ａの外側に流出させる。 In this way, an air curtain of a gas wall is formed by the airflow 6 that has flowed out from the airflow nozzle 17 of the cover 10a, and the airflow 6 is flowed over the photomask 1 to the outside of the cover 10a. A gap is formed between the end of the cover 10a corresponding to the airflow 6 flow path and the photomask 1, and the airflow 6 flows out of the cover 10a from the gap.
この気流６の流れによって、洗浄液５をフォトマスク１の外側へ押し流す。このように本実施形態は、気流６の流体圧によりカバー１０ａ内のフォトマスク１のマスクパターン２の領域に洗浄液５を浸入させない効果がある。 The cleaning liquid 5 is pushed out of the photomask 1 by the flow of the airflow 6. Thus, this embodiment has an effect of preventing the cleaning liquid 5 from entering the region of the mask pattern 2 of the photomask 1 in the cover 10 a due to the fluid pressure of the airflow 6.
ここで、気流用ノズル１７の開口の形はカバー１０ａの内側のマスクパターン２の領域を囲むスリット型の開口にすることが望ましい。気流用ノズル１７の開口をスリット型の開口にすることで、マスクパターン２の領域を囲む均一な厚さの気流６のカーテンが形成され、マスクパターン２の領域を洗浄液５から漏れなく保護できる効果がある。 Here, the shape of the opening of the airflow nozzle 17 is preferably a slit-type opening surrounding the area of the mask pattern 2 inside the cover 10a. By making the opening of the airflow nozzle 17 into a slit-type opening, a curtain of airflow 6 having a uniform thickness surrounding the area of the mask pattern 2 is formed, and the area of the mask pattern 2 can be protected from the cleaning liquid 5 without omission. There is.
＜第３の実施形態＞
図６（ａ）は、本発明の第３の実施形態の粘着剤の洗浄装置１０の平面図であり、図６（ｂ）は、その側断面図である。
<Third Embodiment>
Fig.6 (a) is a top view of the washing | cleaning apparatus 10 of the adhesive of the 3rd Embodiment of this invention, FIG.6 (b) is the sectional side view.
本実施形態の粘着剤の洗浄装置１０は、フォトマスク１の粘着剤５に洗浄液５を噴き付けながらブラシ１８ａで粘着剤４を擦り落とす移動式ブラシ装置１８をカバー１０ａの端部に設置して使用する。この移動式ブラシ装置１８は、駆動装置を用いて粘着剤４に沿って移動させる。 The adhesive cleaning device 10 according to the present embodiment is provided with a movable brush device 18 that scrapes the adhesive 4 with a brush 18a while spraying the cleaning liquid 5 onto the adhesive 5 of the photomask 1 at the end of the cover 10a. use. The movable brush device 18 is moved along the adhesive 4 using a driving device.
移動式ブラシ装置１８は、フォトマスク１を洗浄液５で洗浄するのと同時に、カバー１０ａの端に沿って移動させて、フォトマスク１上に残留した粘着剤４を洗浄液５によって軟化させつつブラシ１８ａで擦り落とす。 The mobile brush device 18 moves the photomask 1 along the edge of the cover 10 a at the same time as cleaning the photomask 1 with the cleaning liquid 5, and softens the adhesive 4 remaining on the photomask 1 with the cleaning liquid 5. Scrub off with.
１・・・フォトマスク
２・・・マスクパターン
３・・・ペリクル
３ａ・・・ペリクルフレーム
３ｂ・・・保護膜
４・・・粘着剤
５・・・洗浄液
６・・・気流
１０・・・粘着剤の洗浄装置
１０ａ・・・カバー
１１・・・ポンプ
１２・・・ノズル
１３・・・洗浄液注入口
１４・・・洗浄液用流路
１５・・・気流注入口
１６・・・気流用流路
１７・・・気流用ノズル
１８・・・移動式ブラシ装置
１８ａ・・・ブラシ
DESCRIPTION OF SYMBOLS 1 ... Photomask 2 ... Mask pattern 3 ... Pellicle 3a ... Pellicle frame 3b ... Protective film 4 ... Adhesive 5 ... Cleaning liquid 6 ... Air flow 10 ... Adhesion Agent cleaning device 10a ... cover 11 ... pump 12 ... nozzle 13 ... cleaning liquid inlet 14 ... cleaning liquid channel 15 ... air flow inlet 16 ... air flow channel 17 ... Airflow nozzle 18 ... Moving brush device 18a ... Brush
Claims (6)
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| JP2014152807A JP2016031412A (en) | 2014-07-28 | 2014-07-28 | Apparatus and method for washing off adhesive of pellicle of photomask |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014152807A JP2016031412A (en) | 2014-07-28 | 2014-07-28 | Apparatus and method for washing off adhesive of pellicle of photomask |
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| Publication Number | Publication Date |
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| JP2016031412A true JP2016031412A (en) | 2016-03-07 |
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