JP2016027635A5

JP2016027635A5 -

Info

Publication number: JP2016027635A5
Application number: JP2015128498A
Authority: JP
Filing date: 2015-06-26
Publication date: 2018-08-09
Anticipated expiration: 2035-06-26

Description

また、本発明は、
（２）前記供給管内に、または所望により前記供給管に併設されている成長室内に、前記基板を保持するサセプタを備え、
前記サセプタが、ミストを前記基板まで加速させるためのミスト加速部を備えていることを特徴とする前記（１）記載の成膜装置、
（３）前記サセプタが占めるサセプタ領域と、前記基板領域と、未反応のミストを排出する排出領域とに分けられる前記供給管または前記成長室内の断面において、前記サセプタ領域と前記基板との総面積が、前記排出領域の面積よりも大きいことを特徴とする前記（２）記載の成膜装置、
（４）前記サセプタの外周形状の全部または一部が、前記供給管または前記成長室の内周に沿って略同一となるような形状である前記（２）または（３）に記載の成膜装置、
（５）前記供給管内に前記サセプタを備え、前記サセプタの外周形状の全部または一部が、前記供給管の内周に沿って略同一となるような略円状である前記（１）〜（４）のいずれかに記載の成膜装置、
（６）前記サセプタの前記基板側表面の外周形状が略半円状である前記（５）記載の成膜装置、
（７）前記サセプタが前記基板を傾斜させて保持する手段を有していることを特徴とする前記（２）〜（６）のいずれかに記載の成膜装置、
（８）前記基板の傾斜角が５°〜６０°である前記（７）記載の成膜装置、
（９）前記サセプタが前記基板を埋め込んで保持する手段を有する前記（２）〜（８）のいずれかに記載の成膜装置、
に関する。
The present invention also provides:
(2) A susceptor for holding the substrate is provided in the supply pipe or in a growth chamber provided in the supply pipe if desired.
Said susceptor, said characterized in that it comprises a mist accelerator for accelerating mist to said substrate (1) film-forming apparatus according,
(3) The total area of the susceptor region and the substrate in a cross section of the supply pipe or the growth chamber divided into a susceptor region occupied by the susceptor, the substrate region, and a discharge region for discharging unreacted mist. but the film forming apparatus before SL (2) Symbol mounting which being greater than the area of the discharge region,
(4) The film formation according to ( 2 ) or (3 ) , wherein all or part of the outer peripheral shape of the susceptor has a shape that is substantially the same along the inner periphery of the supply pipe or the growth chamber. apparatus,
(5) provided with the susceptor to the supply pipe, all or part of the outer peripheral shape of the susceptor, said a substantially circular such that substantially the same along the inner periphery of the supply pipe (1) to ( 4) The film forming apparatus according to any one of
(6) the peripheral shape of the substrate-side surface of the susceptor is substantially semicircular (5) film formation apparatus according,
(7) film deposition apparatus according to any one of the said susceptor, characterized in that it comprises a means for holding by tilting the substrate (2) to (6),
(8) The film forming apparatus according to (7), wherein an inclination angle of the substrate is 5 ° to 60 °,
(9) film deposition apparatus according to any one of the above said susceptor has a means for holding embed the substrate (2) to (8),
About.

また、本発明は、
（１０）ミスト加速手段が、キャリアガスによって搬送されているミストに対し、さらに、０．１〜１０ｍ／ｓ^２の加速度を付与する前記（１）〜（９）のいずれかに記載の成膜装置、
（１１）加速させるミストの流路方向が、前記基板に対して、平行または略平行である前記（１）〜（１０）のいずれかに記載の成膜装置、
（１２）原料を霧化して発生したミストをキャリアガスによって基板上に搬送して成膜する成膜方法であって、
前記原料を霧化してミストを発生させる工程と、
キャリアガスを供給するキャリアガス供給工程と、
前記ミスト発生器で発生したミストをキャリアガスによって前記基板へ供給するミスト供給工程と、
を含み、
前記ミスト供給工程にて、キャリアガスによって搬送されているミストを基板までさらに加速させることを特徴とする成膜方法、
（１３）前記（１２）記載の成膜方法によって形成された膜、
に関する。 The present invention also provides:
(10) The film formation according to any one of (1) to (9), wherein the mist acceleration unit further applies an acceleration of 0.1 to 10 m / s ² to the mist conveyed by the carrier gas. apparatus,
(11) The film forming apparatus according to any one of (1) to (10), wherein a flow path direction of the mist to be accelerated is parallel or substantially parallel to the substrate.
(12) A film forming method for forming a film by transporting a mist generated by atomizing a raw material onto a substrate by a carrier gas,
A step of atomizing the raw material to generate mist;
A carrier gas supply step for supplying a carrier gas;
A mist supply step of supplying the mist generated by the mist generator to the substrate by a carrier gas;
Including
In the mist supply step, the mist transported by carrier gas is further accelerated to the substrate,
(13) A film formed by the film forming method according to (12),
About.

Claims

A film forming apparatus for forming a film by conveying a mist made of a raw material onto a substrate with a carrier gas,
A mist generator that atomizes the raw material to generate mist;
A carrier gas supply means for supplying the carrier gas;
A supply pipe for supplying the mist generated by the mist generator to the substrate by the carrier gas;
With
A film forming apparatus comprising mist accelerating means for further accelerating the mist conveyed by the carrier gas to the substrate.

A susceptor for holding the substrate is provided in the supply pipe or in a growth chamber attached to the supply pipe as required.
The susceptor film forming apparatus according to claim 1, characterized in that it comprises a mist accelerator for accelerating mist to the substrate.

In the cross section of the supply pipe or the growth chamber divided into a susceptor region occupied by the susceptor, the substrate region, and a discharge region for discharging unreacted mist, the total area of the susceptor region and the substrate is claim 2 Symbol placing the film deposition apparatus being greater than the area of the discharge region.

4. The film forming apparatus according to claim 2 , wherein all or a part of an outer peripheral shape of the susceptor has a shape that is substantially the same along an inner periphery of the supply pipe or the growth chamber.

With the susceptor to the supply pipe, all or part of the outer peripheral shape of the susceptor is substantially circular or a portion thereof so as to be substantially the same along the inner periphery of the supply pipe according to claim 2-4 The film-forming apparatus in any one of.

The film forming apparatus according to claim 5, wherein an outer peripheral shape of the substrate side surface of the susceptor is substantially semicircular.

Film forming apparatus according to any one of claims 2-6, characterized in that the susceptor has a means for holding by tilting the substrate.

The film forming apparatus according to claim 7, wherein an inclination angle of the substrate is 5 ° to 60 °.

Film forming apparatus according to any one of claims 2-8 having means to said susceptor holds embed the substrate.

The film forming apparatus according to claim 1, wherein the mist accelerating unit further imparts an acceleration of 0.1 to 10 m / s ² to the mist conveyed by the carrier gas.

The film forming apparatus according to claim 1, wherein a flow direction of the mist to be accelerated is parallel or substantially parallel to the substrate.

A film forming method for forming a film by transporting a mist generated by atomizing a raw material onto a substrate by a carrier gas,
A step of atomizing the raw material to generate mist;
A carrier gas supply step for supplying the carrier gas;
A mist supply step of supplying the mist generated by the mist generator to the substrate by a carrier gas;
Including
In the mist supply step, the mist transported by the carrier gas is further accelerated to the substrate.

A film formed by the film forming method according to claim 12.