JP2016012649A5 - - Google Patents

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Publication number
JP2016012649A5
JP2016012649A5 JP2014133284A JP2014133284A JP2016012649A5 JP 2016012649 A5 JP2016012649 A5 JP 2016012649A5 JP 2014133284 A JP2014133284 A JP 2014133284A JP 2014133284 A JP2014133284 A JP 2014133284A JP 2016012649 A5 JP2016012649 A5 JP 2016012649A5
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JP
Japan
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command data
section
track
constant speed
data
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JP2014133284A
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English (en)
Japanese (ja)
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JP2016012649A (ja
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Priority to JP2014133284A priority Critical patent/JP2016012649A/ja
Priority claimed from JP2014133284A external-priority patent/JP2016012649A/ja
Priority to US14/749,357 priority patent/US20150378342A1/en
Publication of JP2016012649A publication Critical patent/JP2016012649A/ja
Publication of JP2016012649A5 publication Critical patent/JP2016012649A5/ja
Pending legal-status Critical Current

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JP2014133284A 2014-06-27 2014-06-27 指令データの作成方法、位置決め装置、リソグラフィ装置、物品の製造方法 Pending JP2016012649A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2014133284A JP2016012649A (ja) 2014-06-27 2014-06-27 指令データの作成方法、位置決め装置、リソグラフィ装置、物品の製造方法
US14/749,357 US20150378342A1 (en) 2014-06-27 2015-06-24 Command data generation method, positioning apparatus, lithography apparatus, and article manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014133284A JP2016012649A (ja) 2014-06-27 2014-06-27 指令データの作成方法、位置決め装置、リソグラフィ装置、物品の製造方法

Publications (2)

Publication Number Publication Date
JP2016012649A JP2016012649A (ja) 2016-01-21
JP2016012649A5 true JP2016012649A5 (cg-RX-API-DMAC7.html) 2017-08-03

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JP2014133284A Pending JP2016012649A (ja) 2014-06-27 2014-06-27 指令データの作成方法、位置決め装置、リソグラフィ装置、物品の製造方法

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US (1) US20150378342A1 (cg-RX-API-DMAC7.html)
JP (1) JP2016012649A (cg-RX-API-DMAC7.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6861508B2 (ja) * 2016-12-08 2021-04-21 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム露光方法及びマルチ荷電粒子ビーム露光装置
CN110147043B (zh) * 2019-05-31 2021-11-16 中国工程物理研究院计算机应用研究所 一种数据驱动的复杂控制系统扰动解耦容错控制方法
US12362131B2 (en) * 2019-10-21 2025-07-15 Applied Materials Israel Ltd Method for inspecting a specimen and charged particle beam device
JP7508325B2 (ja) * 2020-10-02 2024-07-01 キヤノン株式会社 フィードバック制御装置、リソグラフィ装置、測定装置、加工装置、平坦化装置、物品の製造方法、コンピュータプログラム、およびフィードバック制御方法
JP7645658B2 (ja) * 2021-02-24 2025-03-14 キヤノン株式会社 制御装置、位置決め装置、リソグラフィー装置および物品製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6280710A (ja) * 1985-10-04 1987-04-14 San Esu Shoko Co Ltd デジタルサ−ボ制御法
JP3320276B2 (ja) * 1995-09-04 2002-09-03 キヤノン株式会社 精密制御装置
JPH11114858A (ja) * 1997-10-07 1999-04-27 Toyoda Mach Works Ltd 軌跡制御方法および軌跡制御装置
US20050231706A1 (en) * 2004-04-14 2005-10-20 Nikon Corporation Feedforward control with reduced learning time for lithographic system to improve throughput and accuracy
US7774287B2 (en) * 2006-03-14 2010-08-10 Asml Netherlands B.V. System and method for moving a component through a setpoint profile, lithographic apparatus and device manufacturing method
US7818073B2 (en) * 2006-04-20 2010-10-19 Asml Netherlands B.V. Method for obtaining improved feedforward data, a lithographic apparatus for carrying out the method and a device manufacturing method

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