JP2016011671A - Driving device, machine tool, and semiconductor manufacturing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a driving device capable of suppressing degradation of sealing performance even in a state that a slider is not supported by a bearing device in a prescribed attitude.SOLUTION: A driving device 1 includes a slider 4 disposed on an opening 2A formed on a housing 2 of a process chamber P, an actuator 5 disposed outside of the process chamber and capable of driving the slider, a bearing device 7 having a bearing face 6 disposed around the slider, supporting the slider movably to at least one of a straight direction in parallel with a prescribed axis and a rotating direction on a central axis in parallel with the prescribed axis in a state that an outer face of the slider and the bearing face are opposed to each other through a clearance gap, and a differential exhaust seal device 9 disposed in adjacent to the bearing device with respect to the direction in parallel with the prescribed axis, having an opposite face 8 opposed to the outer face 10 and an exhaust port 13 for discharging a gas between the outer face and the opposite face, and sealing between the housing and the slider.

Description

  The present invention relates to a drive device, a machine tool, and a semiconductor manufacturing apparatus.

  In a machine tool or a semiconductor manufacturing apparatus, a workpiece is processed in a process chamber. The process chamber is adjusted to a predetermined environment such as a vacuum or a special gas atmosphere. In the process chamber, the workpiece is held on a stage that is moved by a driving device. Lubricant may be supplied to at least a portion of the drive device in the process chamber. If the lubricant splashes, the process chamber can become contaminated.

  Therefore, a slider disposed in an opening provided in the housing of the process chamber, an actuator provided on the outside of the process chamber and capable of driving the slider, a bearing device that movably supports the slider, and between the housing and the slider And a differential exhaust seal device that seals the drive. The stage is connected to the slider in the process chamber. As the slider moves, the stage holding the workpiece in the process chamber moves. Thereby, in a state where the process chamber is sealed, the stage moves while suppressing contamination of the process chamber.

  A shaft that penetrates the vacuum vessel, a substrate holder connected to the shaft inside the vacuum vessel, an actuator that is provided outside the vacuum vessel and drives the shaft, and a gas bearing device that seals a portion where the shaft penetrates the vacuum vessel Is disclosed in Patent Literature 1.

U.S. Pat. No. 4,726,689

  For example, if an unexpected load is applied to the slider or the function of the bearing device is impaired, the slider may not be supported by the bearing device in an intended posture. For example, if the slider tilts and contacts the differential exhaust seal device, the sealing performance of the differential exhaust seal device may be reduced. As a result, there is a possibility that the performance of the machine tool and the semiconductor manufacturing apparatus provided with the drive device will deteriorate.

  An object of an aspect of the present invention is to provide a drive device in which a decrease in sealing performance is suppressed even when a slider is not supported by a bearing device in an intended posture. Another object of the present invention is to provide a machine tool and a semiconductor manufacturing apparatus in which deterioration in performance is suppressed.

  A first aspect of the present invention is a slider disposed in an opening provided in a housing of a process chamber, an actuator provided outside the process chamber and capable of driving the slider, and disposed around the slider. A bearing surface, wherein the outer surface of the slider and the bearing surface face each other with a gap in at least one of a straight direction parallel to a predetermined axis and a rotational direction centering on a central axis parallel to the predetermined axis A bearing device that movably supports the slider, a bearing surface that is arranged next to the bearing device in a direction parallel to the predetermined axis, and that faces the outer surface and gas between the outer surface and the facing surface. A differential exhaust seal device that seals between the housing and the slider, the slider being inclined with respect to the predetermined axis and the front surface In a state where the bearing surfaces are in contact, said facing surface to provide a driving device which faces through the outer surface and the gap.

  According to the first aspect of the present invention, in a state where the outer surface of the slider and the bearing surface are opposed to each other with a gap, the bearing device has at least a linear direction parallel to the predetermined axis and a rotational direction about the central axis. On one side, the slider can be supported so that it can move smoothly. That is, since the slider is supported by the bearing device in a non-contact manner, the slider can move smoothly. Due to the gap between the outer surface of the slider and the bearing surface, the slider may be inclined with respect to a predetermined axis. Even if the slider is not supported by the bearing device in an intended posture and is inclined with respect to a predetermined axis, the slider is not attached to the bearing surface of the bearing device before contacting the opposite surface of the differential exhaust seal device. Contact. The facing surface is disposed so as to contact the bearing surface and to face the outer surface of the slider supported by the bearing surface via a gap. Therefore, contact between the slider and the differential exhaust seal device is suppressed, and so-called galling and image sticking are suppressed. Therefore, the deterioration of the sealing performance of the differential exhaust seal device is suppressed.

  The differential exhaust seal is an atmosphere (for example, large on both sides) sandwiching the opposing surface in a state where the outer surface and the opposing surface of the slider are not in contact with each other by discharging gas in a minute gap between the outer surface of the slider and the opposing surface. (Atmospheric pressure and high vacuum) The one that functions to maintain a constant state.

  In the first aspect of the present invention, the bearing surface and the facing surface are disposed around a central axis parallel to the predetermined axis, and the differential exhaust seal device is in a first direction with respect to the bearing device. The opposed surface includes a first region and a second region disposed in the first direction with respect to the first region, and the distance between the central axis and the second region is It may be larger than the distance between the central axis and the first region.

  As a result, the bearing surface and the opposing surface are arranged concentrically so as to surround the central axis, so that the contact between the slider and the differential exhaust seal device is suppressed regardless of the direction of inclination of the slider. Further, when the slider is inclined, the movement amount (inclination amount) of the first portion of the slider far from the bearing device is larger than the movement amount of the second portion closer to the bearing device than the first portion. Therefore, the contact surface is formed such that the distance between the central axis and the second region is larger than the distance between the central axis and the first region, thereby suppressing contact between the slider and the differential exhaust seal device. .

  In the first aspect of the present invention, the facing surface may be inclined so that the distance from the central axis increases in the first direction.

  Thereby, when the slider is inclined, the dimension of the gap between the outer surface of the slider and the opposing surface gradually increases in the first direction. Thereby, generation | occurrence | production of the useless escape part of gas is suppressed. Therefore, high sealing performance can be obtained. When the slider is inclined, the dimension of the gap between the outer surface of the slider and the opposing surface may be uniform.

  A second aspect of the present invention provides a machine tool including the drive device according to the first aspect.

  According to the 2nd aspect of this invention, the fall of the performance of a machine tool is suppressed.

  According to a third aspect of the present invention, there is provided a semiconductor manufacturing apparatus including the driving device according to the first aspect.

  According to the 3rd aspect of this invention, the fall of the performance of a semiconductor manufacturing apparatus is suppressed.

  According to the aspect of the present invention, a drive device in which a decrease in sealing performance is suppressed is provided. Moreover, according to the aspect of this invention, the machine tool and semiconductor manufacturing apparatus with which the fall of performance is suppressed are provided.

FIG. 1 is a perspective view schematically showing an example of a process chamber according to the first embodiment. FIG. 2 is a cross-sectional view schematically showing an example of a process chamber according to the first embodiment. FIG. 3 is a cross-sectional view illustrating an example of the drive device according to the first embodiment. FIG. 4 is a cross-sectional view illustrating an example of the drive device according to the first embodiment. FIG. 5 is a cross-sectional view illustrating an example of a drive device according to the second embodiment. FIG. 6 is a cross-sectional view illustrating an example of a drive device according to the second embodiment. FIG. 7 is a schematic diagram illustrating an example of the operation of the drive device according to the third embodiment. FIG. 8 is a perspective view schematically showing an example of a process chamber according to the fourth embodiment. FIG. 9 is a cross-sectional view schematically showing an example of a process chamber according to the fourth embodiment. FIG. 10 is a cross-sectional view illustrating an example of a drive device according to the fourth embodiment. FIG. 11 is a diagram illustrating an example of a semiconductor manufacturing apparatus according to the fifth embodiment. FIG. 12 is a diagram illustrating an example of a measurement apparatus according to the fifth embodiment. FIG. 13 is a diagram illustrating an example of a machine tool according to the fifth embodiment.

  Hereinafter, embodiments according to the present invention will be described with reference to the drawings, but the present invention is not limited thereto. The components of each embodiment described below can be combined as appropriate. Some components may not be used. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each part will be described with reference to this XYZ orthogonal coordinate system. A direction parallel to the first axis in the predetermined plane is the X axis direction, and a direction parallel to the second axis in the predetermined plane orthogonal to the X axis is the Y axis direction, a third axis orthogonal to each of the X axis and the Y axis. The direction parallel to the Z-axis direction is taken as the Z-axis direction. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively. The X axis is orthogonal to the YZ plane. The Y axis is orthogonal to the XZ plane. The Z axis is orthogonal to the XY plane. The XY plane is parallel to the predetermined plane.

<First Embodiment>
A first embodiment will be described. FIG. 1 is a perspective view schematically showing an example of a process chamber P according to the present embodiment. FIG. 2 is a cross-sectional view schematically showing an example of the process chamber P according to the present embodiment.

  As shown in FIGS. 1 and 2, the driving device 1 is connected to the process chamber P. The process chamber P is a space inside the housing 2. In the process chamber P, the workpiece W is processed. The workpiece W is held on the stage 3. The stage 3 is disposed in the process chamber P. The stage 3 is moved by the driving device 1 while holding the workpiece W. In FIG. 1, the stage 3 and the workpiece W are not shown.

  The process chamber P is adjusted to a predetermined environment based on the processing conditions of the workpiece W. For example, the process chamber P may be adjusted to a vacuum state, may be filled with clean dry air, or may be filled with a special gas.

  The housing 2 has an opening 2A in which at least a part of the driving device 1 is disposed. The process chamber P and the space Q outside the housing 2 are connected through the opening 2A. In the present embodiment, the drive device 1 has a movable slider 4. In the present embodiment, a part of the slider 4 is disposed in the opening 2 </ b> A of the housing 2. The stage 3 is connected to the slider 4 in the process chamber P. As the slider 4 moves, the stage 3 that holds the workpiece W in the process chamber P moves.

  FIG. 3 is a cross-sectional view illustrating an example of the drive device 1 according to the present embodiment. As shown in FIG. 3, the driving device 1 is provided in a slider 4 disposed in an opening 2 </ b> A provided in the housing 2 of the process chamber P and a space Q outside the process chamber P, and can drive the slider 4. The actuator 5 has a bearing surface 6 disposed around the slider 4 and supports the slider 4 movably. The bearing device 7 is disposed next to the bearing device 7 in the X-axis direction. A differential exhaust seal device 9 having a facing surface 8 to be disposed and sealing between the housing 2 and the slider 4 is provided.

  The slider 4 is a rod-shaped member that is long in the X-axis direction. The slider 4 has an outer surface 10. In the present embodiment, the shape (outer shape) of the slider 4 in the YZ plane is a circle. That is, in this embodiment, the slider 4 is a circular shaft member. The shape (outer shape) of the slider 4 in the YZ plane may be a polygon such as a triangle, a quadrangle, or a pentagon.

  The actuator 5 generates power for moving the slider 4. In the present embodiment, the slider 4 moves in the X-axis direction by the operation of the actuator 5. The slider 4 goes straight in the X-axis direction. The X-axis direction may be referred to as a straight traveling direction.

  One end of the slider 4 is disposed in the process chamber P. The other end of the slider 4 is disposed in the space Q. The actuator 5 is provided outside the process chamber P. The actuator 5 is connected to at least a part of the slider 4 in the space Q. The actuator 5 may be connected to the other end of the slider 4. When the slider 4 moves in the X axis direction by the operation of the actuator 5, one end of the slider 4 arranged in the process chamber P moves in the X axis direction in the process chamber P.

  In the present embodiment, the drive device 1 includes a cylindrical support member 20 disposed around the slider 4. The support member 20 is disposed in the space Q. The support member 20 is connected to the housing 2 so that the opening 20A of the support member 20 and the opening 2A of the housing 2 are connected. In the present embodiment, the support member 20 has a flange portion 20F. The flange portion 20F and the outer surface of the housing 2 are connected. The slider 4 is movable in the X-axis direction inside the support member 20.

  The bearing device 7 includes a gas hydrostatic bearing, and can supply the gas between the outer surface 10 of the slider 4 and the bearing surface 6 to support the slider 4 in a non-contact manner. The bearing surface 6 is disposed on a cylindrical bearing member 60. The bearing member 60 is supported by the support member 20. The bearing surface 6 of the bearing member 60 faces the outer surface 10 of the slider 4. The bearing device 7 includes an air supply groove 11 that supplies gas between the outer surface 10 and the bearing surface 6. The air supply groove 11 is disposed on the outer surface of the bearing member 60. In the present embodiment, two air supply grooves 11 are arranged. The air supply groove 11 is connected to the gas supply device 12 via the supply flow path 11R. The gas supplied from the gas supply device 12 is supplied from the air supply groove 11 to the space between the bearing surface 6 and the outer surface 10.

  The restriction of the bearing device 7 may be an orifice restriction, a surface restriction, a porous restriction, or a self-contained restriction. In the case of a porous throttle, the bearing member 60 includes a porous member. In the case of the porous throttle, the bearing surface 6 includes the surface of the porous member, and the gas supplied from the air supply groove 11 is supplied to the space between the bearing surface 6 and the outer surface 10 through the hole of the porous member. Is done.

  Further, the bearing device 7 includes an exhaust groove 18 that discharges gas between the outer surface 10 and the bearing surface 6. The exhaust groove 18 is disposed on the bearing surface 6. In the present embodiment, the exhaust groove 18 is disposed between the two air supply grooves 11. The exhaust groove 18 is opened to the atmosphere via the discharge channel 19R. At least a part of the gas supplied between the bearing surface 6 and the outer surface 10 from the air supply groove 11 of the bearing device 7 is discharged through the exhaust groove 18.

  The differential exhaust seal device 9 is configured so that the pressure in the space between the outer surface 10 and the facing surface 8 and the pressure in the space outside the space are in a state where the outer surface 10 and the facing surface 8 of the slider 4 are not in contact with each other. Is maintained constant, the gas between the outer surface 10 and the opposing surface 8 is discharged to seal between the housing 2 and the slider 4. The differential exhaust seal device 9 includes a facing surface 8 that faces the outer surface 10 through a gap, and an exhaust port 13 that discharges gas between the outer surface 10 and the facing surface 8. In the present embodiment, the differential exhaust seal device 9 has an exhaust groove 14 formed in the facing surface 8 so as to surround the outer surface 10. A plurality of exhaust grooves 14 (three in the present embodiment) are formed in the X-axis direction. The exhaust port 13 is disposed in each of the plurality of exhaust grooves 14. The exhaust port 13 is connected to the gas exhaust device 15 through the exhaust flow path 13R. The gas discharge device 15 includes a vacuum device and can suck the gas between the outer surface 10 and the facing surface 8 through the exhaust port 13. The gas between the facing surface 8 and the outer surface 10 discharged from the exhaust port 13 is collected by the gas discharge device 15.

  The slider 4, the bearing device 7, and the differential exhaust seal device 9 may be collectively referred to as a seal unit.

  The facing surface 8 may be disposed on the support member 20 or may be disposed on a member (seal member) supported by the support member 20. The sealing member may be a porous member, graphite, or synthetic resin.

  In the present embodiment, the differential exhaust seal device 9 is disposed next to the bearing device 7 in the X-axis direction. The differential exhaust seal device 9 is disposed in the −X direction (−X side) with respect to the bearing device 7.

  In the present embodiment, the differential exhaust seal device 9 is disposed between the housing 2 and the bearing device 7. That is, the differential exhaust seal device 9 is disposed closer to the process chamber P than the bearing device 7.

  In the present embodiment, an exhaust port 16 is formed between the bearing device 7 and the differential exhaust seal device 9. The support member 20 has an exhaust groove 17 formed so as to surround the outer surface 10. The exhaust groove 17 is formed on the inner surface of the support member 20. The exhaust port 16 is disposed in the exhaust groove 17. The exhaust port 16 is open to the atmosphere via the flow path 16R. At least a part of the gas supplied between the air bearing groove 11 of the bearing device 7 and the bearing surface 6 and the outer surface 10 is exhausted through the exhaust port 16.

  In the present embodiment, since the drive device 1 including the actuator 5, the bearing device 7, and the differential exhaust seal device 9 is provided outside the process chamber P, a lubricant is applied to the drive device 1 for maintenance. Even if supplied, contamination of the process chamber P is suppressed.

  In the present embodiment, the bearing surface 6 and the facing surface 8 are disposed around a central axis AX parallel to the X axis. The bearing surface 6 and the facing surface 8 are disposed concentrically so as to surround the central axis AX.

  The facing surface 8 includes a first region 8A, a second region 8B, a third region 8C, and a fourth region 8D. The first region 8A, the second region 8B, the third region 8C, and the fourth region 8D are each disposed so as to surround the outer surface 10 (central axis AX). Of the first region 8A, the second region 8B, the third region 8C, and the fourth region 8D, the first region 8A is arranged in the + X direction most. The second region 8B is arranged in the −X direction with respect to the first region 8A. The third region 8C is arranged in the −X direction with respect to the second region 8B. The fourth region 8D is arranged in the −X direction with respect to the third region 8C.

  That is, in the X-axis direction parallel to the central axis AX, the first region 8A is the bearing device 7 (bearing surface 6) among the first region 8A, the second region 8B, the third region 8C, and the fourth region 8D. The second region 8B is disposed at a position close to the bearing device 7 next to the first region 8A, the third region 8C is disposed at a position close to the bearing device 7 next to the second region 8B, Four regions 8D are arranged at positions closest to the housing 2.

  In the present embodiment, the distance between the central axis AX and the fourth region 8D is larger than the distance between the central axis AX and the third region 8C. The distance between the central axis AX and the third region 8C is larger than the distance between the central axis AX and the second region 8B. The distance between the central axis AX and the second region 8B is larger than the distance between the central axis AX and the first region 8A.

  That is, with respect to the radial direction with respect to the central axis AX, the first region 8A is disposed at a position closest to the central axis AX among the first region 8A, the second region 8B, the third region 8C, and the fourth region 8D. Next to the first region 8A, the second region 8B is disposed at a position close to the central axis AX, after the second region 8B, the third region 8C is disposed at a position close to the central axis AX, and the fourth region 8D is separated from the central axis AX. It is arranged at the farthest position.

  In the present embodiment, the distance between the central axis AX and the first region 8A is larger than the distance between the central axis AX and the bearing surface 6. That is, with respect to the radial direction with respect to the central axis AX, the facing surface 8 is disposed at a position farther from the central axis AX than the bearing surface 6.

  In the present embodiment, the outer surface 10 of the slider 4 and the bearing surface 6 face each other with a gap in a state where the function of the bearing device 7 is normally exhibited, and the central axis AX and the axis of the slider 4 coincide with each other. To do. That is, in a state where the function of the bearing device 7 is normally exhibited, the slider 4 (the axis of the slider 4) is not inclined with respect to the central axis AX, and the dimension of the gap between the outer surface 10 and the bearing surface 6 is constant. Maintained.

  In the following description, the state where the function of the bearing device 7 is normally exhibited, the outer surface 10 of the slider 4 and the bearing surface 6 face each other with a gap, and the center axis AX and the axis of the slider 4 coincide with each other as appropriate. It is called a normal state. In a normal state, the slider 4 (the axis of the slider 4) is not inclined with respect to the central axis AX, and the dimension of the gap between the outer surface 10 and the bearing surface 6 is kept constant.

  Further, the posture when the slider 4 is supported by the bearing device 7 in a normal state is appropriately referred to as a desired posture. In the slider 4 in the desired posture, the axis of the slider 4 coincides with the central axis AX. In the slider 4 in the desired posture, the dimension of the gap between the outer surface 10 and the bearing surface 6 is kept constant.

  In the slider 4 in the desired posture, the state in which the dimension of the gap between the outer surface 10 and the bearing surface 6 is maintained constant is a state in which the central axis AX and the vertical axis (axis orthogonal to the horizontal plane) are parallel. Including. In the state where the central axis AX and the horizontal plane are parallel, the slider 4 in the intended posture may be displaced from the axis of the slider 4 due to the weight of the slider 4. The state in which the axis of the slider 4 and the central axis AX deviate includes one or both of the eccentricity and declination of the axis of the slider 4 with respect to the central axis AX.

  Therefore, when the slider 4 is supported by the bearing device 7 in a normal state, the outer surface 10 of the slider 4 and the bearing surface 6 face each other with a gap. When the slider 4 is supported by the bearing device 7 in a normal state, the bearing device 7 can move the slider 4 in the X-axis direction with the outer surface 10 of the slider 4 and the bearing surface 6 facing each other with a gap. To support.

  In a normal state in which the outer surface 10 of the slider 4 and the bearing surface 6 face each other with a gap, the bearing device 7 can support the slider 4 so as to be able to move smoothly in the X-axis direction. In a normal state, the slider 4 is supported by the bearing device 7 in a non-contact manner, and thus can move smoothly.

  FIG. 4 is a diagram illustrating an example of the operation of the slider 4 according to the present embodiment. As shown in FIG. 4, the slider 4 may be inclined with respect to the X axis (center axis AX). As shown in FIG. 3, a gap is provided between the outer surface 10 of the slider 4 and the bearing surface 6 in a normal state. The slider 4 may be inclined due to the gap.

  In the following description, a state where the center axis AX and the axis of the slider 4 do not coincide with each other as shown in FIG. 4 and the slider 4 is inclined with respect to the center axis AX is appropriately referred to as an inclined state or an abnormal state. In the inclined state, the slider 4 (the axis of the slider 4) is inclined with respect to the central axis AX, and the dimension of the gap between the outer surface 10 and the bearing surface 6 becomes uneven.

  In addition, the cause of the tilted state includes an unexpected load acting on the slider 4 and the function of the bearing device 7 being impaired.

  That is, the slider 4 is in a state in which the outer surface 10 and the bearing surface 6 are in contact with each other as shown in FIG. 4 from a state in which the outer surface 10 and the bearing surface 6 are not in contact with each other as shown in FIG. There is a possibility of tilting with respect to the X axis so as to change to (contact state). Further, the slider 4 can change its posture so that the outer surface 10 and the bearing surface 6 are in contact (contact state) and the outer surface 10 and the bearing surface 6 are not in contact (non-contact state). There is also sex.

  In the present embodiment, as shown in FIG. 4, the facing surface 8 faces the outer surface 10 with a gap in a state where the slider 4 is inclined with respect to the X axis and the outer surface 10 and the bearing surface 6 are in contact with each other. To do. That is, the facing surface 8 is disposed so as not to contact the outer surface 10 in a state where the slider 4 is inclined so that the outer surface 10 and the bearing surface 6 are in contact with each other. In other words, in the state where the slider 4 is inclined so that the outer surface 10 and the bearing surface 6 are in contact with each other, the shape of the opposing surface 8 and the opposing surface 8 and the bearing surface are prevented so that the opposing surface 8 and the outer surface 10 are not in contact with each other. The positional relationship of 6 is defined.

  That is, even if the slider 4 is not supported by the bearing device 7 in an intended posture and is inclined with respect to the X axis, the slider 4 contacts the bearing surface 6 before contacting the facing surface 8. The shape of the facing surface 8 and the positional relationship between the facing surface 8 and the bearing surface 6 are determined. Even when the slider 4 is inclined, the slider 4 is supported by the bearing surface 6, so that contact between the slider 4 and the facing surface 8 is suppressed.

  In the present embodiment, the facing surface 8 is disposed at a position farther from the central axis AX than the bearing surface 6 in the radial direction with respect to the central axis AX. The facing surface 8 includes a first region 8A, a second region 8B, a third region 8C, and a fourth region 8D. When the facing surface 8 is separated from the bearing device 7 with respect to the X-axis direction, the central axis AX with respect to the radial direction with respect to the central axis AX. And have a shape that increases the distance between them.

  Therefore, when the slider 4 is inclined, the outer surface 10 and the bearing surface 6 are in contact with each other, but the contact between the outer surface 10 and the facing surface 8 is suppressed.

  As described above, according to the present embodiment, the slider 4 includes the bearing device 7 including the gas hydrostatic bearing in a state where the outer surface 10 of the slider 4 and the bearing surface 6 face each other with a gap therebetween. 7 can be smoothly moved in the X-axis direction while being supported in a non-contact manner. Further, even when the slider 4 is not supported by the bearing device 7 in an intended posture and is inclined with respect to the X axis (center axis AX), the slider 4 is placed on the opposing surface 8 of the differential exhaust seal device 9. Prior to contact, it contacts the bearing surface 6 of the bearing device 7. Since the slider 4 is supported by the bearing surface 6 even in the inclined state, the contact between the slider 4 and the differential exhaust seal device 9 is suppressed. Therefore, the occurrence of so-called galling and image sticking is suppressed. Therefore, the deterioration of the sealing performance of the differential exhaust seal device 9 is suppressed.

  In the present embodiment, the bearing surface 6 and the facing surface 8 are concentrically disposed around the central axis AX, so that the slider 4 and the differential exhaust seal can be used regardless of which direction the slider 4 is inclined. Contact with the device 9 is suppressed.

  In the present embodiment, the differential exhaust seal device 9 is disposed in the −X direction with respect to the bearing device 7, and the facing surface 8 is in the −X direction with respect to the first region 8 </ b> A and the first region 8 </ b> A. The distance between the central axis AX and the second area 8B is greater than the distance between the central axis AX and the first area 8A. When the slider 4 is inclined, the movement amount (inclination amount) of the portion on the −X side of the slider 4 far from the bearing device 7 is larger than the movement amount of the portion on the + X side of the slider 4 close to the bearing device 7. Accordingly, the opposing surface 8 is formed such that the distance between the central axis AX and the second region 8B is larger than the distance between the central axis AX and the first region 8A, whereby the slider 4 and the differential exhaust seal device 9 are formed. Contact with is suppressed.

  In the present embodiment, the facing surface 8 has four regions (8A, 8B, 8C, 8D) having different distances from the central axis AX. The facing surface 8 may have two regions (first region 8A and second region 8B) having different distances from the central axis AX, may have three regions, or may have five or more It may have a plurality of regions.

Second Embodiment
A second embodiment will be described. In the following description, the same or equivalent components as those in the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  5 and 6 are cross-sectional views showing an example of the drive device 1B according to the present embodiment. FIG. 5 shows an example of the drive device 1B in a normal state. FIG. 6 shows an example of the driving device 1B in an inclined state. As illustrated in FIGS. 5 and 6, the facing surface 8 is inclined so that the distance from the central axis AX increases in the −X direction.

  That is, in the example described with reference to FIGS. 3 and 4, the facing surface 8 is between the first region 8A and the second region 8B, between the second region 8B and the third region 8C, and There is a step between the third region 8C and the fourth region 8D. The facing surface 8 shown in FIGS. 5 and 6 is tilted away from the central axis AX in the −X direction.

  As shown in FIG. 6, according to the present embodiment, when the slider 4 is in an inclined state, the size of the gap between the outer surface 10 of the slider 4 and the facing surface 8 gradually increases in the −X direction. Thereby, generation | occurrence | production of the useless escape part of gas is suppressed. Therefore, the differential exhaust seal device 9 can obtain high sealing performance. When the slider 4 is in an inclined state, the size of the gap between the outer surface 10 of the slider 4 and the facing surface 8 may be uniform.

<Third Embodiment>
A third embodiment will be described. In the following description, the same or equivalent components as those in the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 7 is a schematic diagram illustrating an example of the operation of the driving device 1 (1B) according to the present embodiment. As shown in FIG. 7, the slider 4 may be movable (rotatable) in the rotation direction (θX direction) about the central axis AX. The bearing device 7 can support the slider 4 so as to be rotatable in the θX direction. The actuator 5 can rotate the slider 4 in the θX direction.

  The slider 4 may be movable only in the X axis direction, may be movable only in the θX direction, or may be movable in both the X axis direction and the θX direction. The same applies to the following embodiments.

<Fourth embodiment>
A fourth embodiment will be described. In the following description, the same or equivalent components as those in the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  In the above-described embodiment, the slider 4 is moved in one or both of the X-axis direction and the θX direction. In the present embodiment, an example in which the slider 4 moves also in the Z-axis direction will be described.

  FIG. 8 is a perspective view schematically showing an example of the drive device 1C according to the present embodiment. FIG. 9 is a cross-sectional view parallel to the XY plane schematically showing an example of the driving apparatus 1C according to the present embodiment. FIG. 10 is a cross-sectional view parallel to the XZ plane schematically showing an example of the drive device 1C according to the present embodiment.

  As shown in FIGS. 8, 9, and 10, the driving device 1 </ b> C is connected to the process chamber P. The driving device 1C includes a movable member 30 that can move in the Z-axis direction with respect to the housing 2, an actuator 33 that can drive the movable member 30, and a slider 4 that can move in one or both of the X-axis direction and the θX direction. , An actuator 5 that can drive the slider 4, a bearing device 7 that supports the slider 4 movably, a differential exhaust seal device 40 that seals between the housing 2 and the movable member 30, and the movable member 30 and the slider 4. And a differential exhaust seal device 9 for sealing between the two. A stage 3 that holds the workpiece W is connected to one end of the slider 4. In FIG. 8, the stage 3 and the workpiece W are not shown.

  The movable member 30 is disposed so as to face the outer surface of the housing 2. In the present embodiment, the support member 20 is connected to the movable member 30. As in the above-described embodiment, the support member 20 supports at least a part of the differential exhaust seal device 9 and the bearing device 7.

  The movable member 30 has an opening 30A in which a part of the slider 4 is disposed. The support member 20 is connected to the movable member 30 so that the opening 20A of the support member 20 and the opening 30A of the movable member 30 are connected.

  The housing 2 has an opening 2B in which a part of the slider 4 is disposed. In the present embodiment, the opening 2B is long in the Z-axis direction. The movable member 30 is arranged so that the opening 30A of the movable member 30, the opening 20A of the support member 20, and the opening 2B of the housing 2 are connected.

  The movable member 30 is movable in the Z axis direction. In the present embodiment, a guide rail 31 is provided on the outer surface of the housing 2. The movable member 30 has a slider 32 guided by a guide rail 31. The movable member 30 is guided in the Z-axis direction with respect to the housing 2 by a guide device including a guide rail 31 and a slider 32. The movable member 30 moves in the Z-axis direction by the operation of the actuator 33.

  The differential exhaust seal device 40 has an exhaust groove provided on the outer surface of the housing 2 and an exhaust port disposed in the exhaust groove. The differential exhaust seal device 40 seals between the housing 2 and the movable member 30. Further, the differential exhaust seal device 9 seals between the movable member 30 and the slider 4 and between the housing 2 and the slider 4.

  When the movable member 30 moves in the Z-axis direction, the support member 20 (the bearing device 7 and the differential exhaust seal device 9) connected to the movable member 30 also moves in the Z-axis direction together with the movable member 30. To do. Further, when the movable member 30 moves in the Z-axis direction, the slider 4 also moves in the Z-axis direction together with the support member 20 and the movable member 30.

  As described above, in the present embodiment, the slider 4 can move not only in at least one of the X-axis direction and the θX direction but also in the Z-axis direction. Also in this embodiment, even when the slider 4 is inclined, the contact between the slider 4 and the differential exhaust seal device 9 is suppressed. For this reason, a decrease in the sealing performance of the differential exhaust seal device 9 is suppressed.

<Fifth Embodiment>
A fifth embodiment will be described. In the following description, the same or equivalent components as those in the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 11 is a diagram illustrating an example of a semiconductor manufacturing apparatus 500 including the driving apparatus 1 according to the present embodiment. The semiconductor manufacturing apparatus 500 includes a semiconductor device manufacturing apparatus capable of manufacturing a semiconductor device. The semiconductor manufacturing apparatus 500 includes a stage 3 that holds a workpiece W for manufacturing a semiconductor device. The stage 3 is disposed in the process chamber P of the semiconductor manufacturing apparatus 500. The process chamber P is maintained in a vacuum or a special gas atmosphere, for example. The stage 3 is moved by the driving device 1. In addition, in FIG. 11, the drive device 1 is illustrated in a simplified manner.

  In the present embodiment, the workpiece W is a substrate for manufacturing a semiconductor device. A semiconductor device is manufactured from the workpiece W. The workpiece W may include a semiconductor wafer or a glass plate. By forming a device pattern (wiring pattern) on the workpiece W, a semiconductor device is manufactured.

  The semiconductor manufacturing apparatus 500 performs a process for forming a device pattern on the workpiece W arranged at the processing position PJ1 in the process chamber P. The driving device 1 places the workpiece W held on the stage 3 at the processing position PJ1.

  For example, when the semiconductor manufacturing apparatus 500 includes an exposure apparatus that projects a device pattern image onto the workpiece W via the optical system 501, the processing position PJ1 includes the position (exposure position) of the image plane of the optical system 501. By disposing the workpiece W at the processing position PJ1, the semiconductor manufacturing apparatus 500 can form a device pattern on the workpiece W via the optical system 501. When the semiconductor manufacturing apparatus 500 includes a film forming apparatus that forms a film on the workpiece W, the processing position PJ1 is a position where a material for forming the film can be supplied. By disposing the workpiece W at the processing position PJ1, a film for forming a device pattern is formed on the workpiece W.

  In the present embodiment, since the drive device 1 is provided outside the process chamber P, contamination of the process chamber P is suppressed even if a lubricant is supplied to the drive device 1 for maintenance. Further, the differential exhaust seal device 9 suppresses foreign matter (contaminants) in the space Q from entering the process chamber P. Further, even when the slider 4 is inclined, the contact between the slider 4 and the differential exhaust seal device 9 is suppressed. For this reason, a decrease in the sealing performance of the differential exhaust seal device 9 is suppressed. Thereby, the work W is processed while the contamination of the process chamber P is suppressed while the process chamber P is sealed. Therefore, a decrease in performance of the semiconductor manufacturing apparatus 500 is suppressed, and a defective product is suppressed from being manufactured.

  FIG. 12 is a diagram illustrating an example of a measuring apparatus 700 including the driving apparatus 1 according to the present embodiment. The measuring apparatus 700 measures the workpiece (semiconductor device) W manufactured by the semiconductor manufacturing apparatus 500. The measuring apparatus 700 has a stage 3 that holds a workpiece W to be measured. The stage 3 is disposed in the process chamber P of the measuring apparatus 700. The process chamber P is maintained in a vacuum or a special gas atmosphere, for example. The stage 3 is moved by the driving device 1. In addition, in FIG. 12, the drive device 1 is illustrated in a simplified manner.

  The measuring device 700 measures the workpiece W arranged at the measurement position PJ2. The driving device 1 places the workpiece W held on the stage 3 at the measurement position PJ2.

  In the present embodiment, the measuring apparatus 700 optically measures the workpiece W using detection light. The measuring device 700 includes an irradiation device 701 capable of emitting detection light and a light receiving device 702 capable of receiving at least part of the detection light emitted from the irradiation device 701 and reflected by the workpiece W. In the present embodiment, the measurement position PJ2 includes a detection light irradiation position. By disposing the workpiece W at the measurement position PJ2, the state of the workpiece W is optically measured.

  In the present embodiment, the workpiece W is measured while the contamination of the process chamber P is suppressed while the process chamber P is sealed. Therefore, a decrease in the performance of the measuring device 700 is suppressed. That is, the measuring apparatus 700 can determine well whether or not the work W is defective. Thereby, for example, it is suppressed that the defective workpiece | work W is conveyed or shipped to a post process.

  FIG. 13 is a diagram illustrating an example of a machine tool 800 including the drive device 1 according to the present embodiment. The machine tool 800 processes the workpiece W. The machine tool 800 is a machining center, and includes a stage 3 that holds a workpiece W and a machining head 801. The processing head 801 has a processing tool and processes the workpiece W held on the stage 3 with the processing tool. The processing head 801 is a mechanism for cutting the workpiece W. The machining head 801 moves the machining tool in the Z-axis direction. The stage 3 and the processing head 801 are disposed in the process chamber P of the machine tool 800.

  The machine tool 800 moves the processing tool and the workpiece W relatively by moving the stage 3 holding the workpiece W in the XY plane by the driving device 1 and moving the machining head 801 in the Z-axis direction. Can do.

  Since the machine tool 800 can process the workpiece W on the stage 3 arranged at the target position by the drive device 1, the workpiece W can be precisely processed. In the present embodiment, the workpiece W is processed while the process chamber P is sealed and contamination of the process chamber P is suppressed. Therefore, a decrease in performance of machine tool 800 is suppressed. Thereby, the machine tool 800 can process the workpiece W precisely.

DESCRIPTION OF SYMBOLS 1 Drive device 2 Housing 2A Opening 2B Opening 3 Stage 4 Slider 5 Actuator 6 Bearing surface 7 Bearing device 8 Opposing surface 8A 1st area | region 8B 2nd area | region 8C 3rd area | region 8D 4th area | region 9 Differential exhaust seal apparatus 10 Outer surface 11 Supply Air groove 11R Supply channel 12 Gas supply device 13 Exhaust port 13R Exhaust channel 14 Exhaust groove 15 Gas exhaust device 16 Exhaust port 20 Support member 20F Flange 30 Movable member 31 Guide rail 32 Slider 33 Actuator 40 Differential exhaust seal device 60 Bearing member 500 Semiconductor manufacturing device 700 Measuring device 800 Machine tool P Process chamber Q Space W Workpiece

Claims (5)

A slider disposed in an opening provided in the housing of the process chamber;
An actuator provided outside the process chamber and capable of driving the slider;
A bearing surface disposed around the slider, wherein the slider and the outer surface of the slider face each other with a gap between them and a straight direction parallel to a predetermined axis and a central axis parallel to the predetermined axis; A bearing device that movably supports the slider in at least one of the rotational directions
A housing that is disposed next to the bearing device in a direction parallel to the predetermined axis and that faces the outer surface, and an exhaust port that discharges gas between the outer surface and the facing surface; And a differential exhaust seal device that seals between the slider and the slider,
The drive device in which the opposed surface opposes the outer surface via a gap in a state where the slider is inclined with respect to the predetermined axis and the outer surface and the bearing surface are in contact with each other. The bearing surface and the facing surface are disposed around the central axis,
The differential exhaust seal device is disposed in a first direction with respect to the bearing device;
The facing surface includes a first region and a second region disposed in the first direction with respect to the first region,
The drive device according to claim 1, wherein a distance between the central axis and the second region is larger than a distance between the central axis and the first region.   The driving apparatus according to claim 2, wherein the facing surface is inclined so as to increase a distance from the central axis in the first direction.   A machine tool comprising the drive device according to any one of claims 1 to 3.   A semiconductor manufacturing apparatus provided with the drive device as described in any one of Claims 1-3.

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