JP2016002668A5 - - Google Patents

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Publication number
JP2016002668A5
JP2016002668A5 JP2014122741A JP2014122741A JP2016002668A5 JP 2016002668 A5 JP2016002668 A5 JP 2016002668A5 JP 2014122741 A JP2014122741 A JP 2014122741A JP 2014122741 A JP2014122741 A JP 2014122741A JP 2016002668 A5 JP2016002668 A5 JP 2016002668A5
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JP
Japan
Prior art keywords
measurement
substrate
mold
alignment
unit
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JP2014122741A
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English (en)
Japanese (ja)
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JP6445792B2 (ja
JP2016002668A (ja
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Priority claimed from JP2014122741A external-priority patent/JP6445792B2/ja
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Publication of JP2016002668A5 publication Critical patent/JP2016002668A5/ja
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Publication of JP6445792B2 publication Critical patent/JP6445792B2/ja
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JP2014122741A 2014-06-13 2014-06-13 インプリント装置及び物品の製造方法 Active JP6445792B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014122741A JP6445792B2 (ja) 2014-06-13 2014-06-13 インプリント装置及び物品の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014122741A JP6445792B2 (ja) 2014-06-13 2014-06-13 インプリント装置及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2016002668A JP2016002668A (ja) 2016-01-12
JP2016002668A5 true JP2016002668A5 (cg-RX-API-DMAC10.html) 2017-07-06
JP6445792B2 JP6445792B2 (ja) 2018-12-26

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Family Applications (1)

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JP2014122741A Active JP6445792B2 (ja) 2014-06-13 2014-06-13 インプリント装置及び物品の製造方法

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JP (1) JP6445792B2 (cg-RX-API-DMAC10.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6818522B2 (ja) * 2016-11-17 2021-01-20 キヤノン株式会社 インプリント装置、および物品製造方法
JP6818523B2 (ja) * 2016-11-17 2021-01-20 キヤノン株式会社 インプリント装置及び物品の製造方法
JP6716484B2 (ja) * 2017-03-14 2020-07-01 キオクシア株式会社 インプリント方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2963498B8 (en) * 2006-01-19 2017-07-26 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
WO2009078443A1 (ja) * 2007-12-17 2009-06-25 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
JP5284212B2 (ja) * 2009-07-29 2013-09-11 株式会社東芝 半導体装置の製造方法
JP6018405B2 (ja) * 2012-04-25 2016-11-02 キヤノン株式会社 インプリント装置、インプリント方法および物品製造方法

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