JP2016002668A5

JP2016002668A5 -

Info

Publication number: JP2016002668A5
Application number: JP2014122741A
Authority: JP
Filing date: 2014-06-13
Publication date: 2017-07-06
Anticipated expiration: 2034-06-13

Description

上記目的を達成するために、本発明の一側面としてのインプリント装置は、基板上のインプリント材をモールドで成形して前記基板上にパターンを形成するインプリント処理を行うインプリント装置であって、前記基板を保持して移動する基板ステージと、前記基板ステージの位置を計測する第１計測部と、前記基板ステージの前記基板の保持面に対して前記第１計測部よりも近い位置において、前記基板ステージの位置を計測する第２計測部と、前記モールドと前記基板との位置合わせのためのアライメント計測を行う第３計測部と、前記第１計測部の計測結果に基づいて前記基板ステージの位置を制御する第１モード、又は、前記第２計測部の計測結果に基づいて前記基板ステージの位置を制御する第２モードで前記基板ステージの位置を制御する制御部と、前記インプリント処理を行っている間において、前記第３計測部による前記アライメント計測の結果が計測基準を満たしたことを検知する検知部と、を有し、前記制御部は、前記検知部が検知した結果に基づき前記第２モードで前記基板ステージの位置を制御することを特徴とする。 In order to achieve the above object, an imprint apparatus according to one aspect of the present invention is an imprint apparatus that performs an imprint process in which an imprint material on a substrate is molded with a mold to form a pattern on the substrate. A substrate stage that holds and moves the substrate, a first measurement unit that measures the position of the substrate stage, and a position closer to the substrate holding surface of the substrate stage than the first measurement unit. A second measurement unit that measures the position of the substrate stage, a third measurement unit that performs alignment measurement for alignment between the mold and the substrate, and the substrate based on the measurement result of the first measurement unit. first mode for controlling the position of the stage, or the position of the substrate stage in a second mode for controlling the position of said substrate stage based on the measurement result of the second measurement unit A control unit that controls, and a detection unit that detects that a result of the alignment measurement by the third measurement unit satisfies a measurement standard while performing the imprint process, and the control unit includes: The position of the substrate stage is controlled in the second mode based on the result detected by the detection unit.

Claims

An imprint apparatus that performs an imprint process for forming a pattern on the substrate by forming an imprint material on the substrate with a mold,
A substrate stage that holds and moves the substrate;
A first measurement unit for measuring the position of the substrate stage;
A second measuring unit that measures the position of the substrate stage at a position closer to the holding surface of the substrate of the substrate stage than the first measuring unit;
A third measurement unit that performs alignment measurement for alignment between the mold and the substrate;
First mode for controlling the position of said substrate stage based on the measurement result of the first measurement unit, or the substrate in the second mode for controlling the position of said substrate stage based on the measurement result of the second measurement unit A control unit for controlling the position of the stage;
A detection unit that detects that the result of the alignment measurement by the third measurement unit satisfies a measurement standard while performing the imprint process;
The imprint apparatus, wherein the control unit controls the position of the substrate stage in the second mode based on a result detected by the detection unit.

The control unit controls the position of the substrate stage in the first mode until the detection unit detects that the result of the alignment measurement by the third measurement unit satisfies the measurement standard. The imprint apparatus according to claim 1.

The detector is
A sensor for detecting a contact state between the mold and the imprint material;
The timing at which the sensor detects that the mold and the imprint material are in contact with each other, and detects that the result of the alignment measurement by the third measurement unit satisfies the measurement standard. 3. The imprint apparatus according to 2.

The imprint apparatus according to claim 3, wherein the sensor includes a pressure sensor provided on at least one of a mold head that holds the mold and the substrate stage.

The third measuring unit includes an alignment detection system that generates an alignment signal by detecting a mark provided on the mold and a mark provided on the substrate stage,
The detection unit detects that the result of the alignment measurement by the third measurement unit satisfies the measurement standard at a timing when the index of the alignment signal generated by the alignment detection system satisfies a threshold value. The imprint apparatus according to claim 1 or 2.

The imprint apparatus according to claim 5, wherein the index includes at least one of intensity, contrast, and pattern matching correlation of the alignment signal.

The first measurement unit includes an encoder,
The imprint apparatus according to claim 1, wherein the second measurement unit includes an interferometer.

The imprint apparatus according to claim 1, wherein each of the first measurement unit and the second measurement unit includes an encoder.

9. The apparatus according to claim 1, further comprising a supply unit configured to supply a gas that promotes filling of the pattern of the mold with the imprint material into a space between the mold and the substrate. The imprint apparatus according to item.

The imprint apparatus according to claim 9, wherein the gas includes at least one of a permeable gas that permeates the mold during the molding and a condensable gas that liquefies during the molding.

Forming a pattern on a substrate using the imprint apparatus according to claim 1;
Processing the substrate on which the pattern has been formed in the step;
A method for producing an article comprising: