JP2015533897A5 - - Google Patents
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- Publication number
- JP2015533897A5 JP2015533897A5 JP2015534464A JP2015534464A JP2015533897A5 JP 2015533897 A5 JP2015533897 A5 JP 2015533897A5 JP 2015534464 A JP2015534464 A JP 2015534464A JP 2015534464 A JP2015534464 A JP 2015534464A JP 2015533897 A5 JP2015533897 A5 JP 2015533897A5
- Authority
- JP
- Japan
- Prior art keywords
- ink composition
- curable ink
- radiation curable
- item
- range
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 claims description 44
- 230000005855 radiation Effects 0.000 claims description 39
- -1 2,2,6,6-tetramethylpiperidinyl compound Chemical class 0.000 claims description 15
- 125000003277 amino group Chemical group 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 239000003086 colorant Substances 0.000 claims description 3
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims description 2
- 239000007787 solid Substances 0.000 claims description 2
- 230000001588 bifunctional effect Effects 0.000 description 17
- 239000000376 reactant Substances 0.000 description 17
- 230000009477 glass transition Effects 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- MCRZWYDXIGCFKO-UHFFFAOYSA-N 2-butylpropanedioic acid Chemical compound CCCCC(C(O)=O)C(O)=O MCRZWYDXIGCFKO-UHFFFAOYSA-N 0.000 description 1
- FLPKSBDJMLUTEX-UHFFFAOYSA-N bis(1,2,2,6,6-pentamethylpiperidin-4-yl) 2-butyl-2-[(3,5-ditert-butyl-4-hydroxyphenyl)methyl]propanedioate Chemical compound C1C(C)(C)N(C)C(C)(C)CC1OC(=O)C(C(=O)OC1CC(C)(C)N(C)C(C)(C)C1)(CCCC)CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 FLPKSBDJMLUTEX-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000003847 radiation curing Methods 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261705441P | 2012-09-25 | 2012-09-25 | |
| US61/705,441 | 2012-09-25 | ||
| US201361772408P | 2013-03-04 | 2013-03-04 | |
| US61/772,408 | 2013-03-04 | ||
| PCT/US2013/033039 WO2014051702A1 (en) | 2012-09-25 | 2013-03-20 | Radiation curable ink composition |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015533897A JP2015533897A (ja) | 2015-11-26 |
| JP2015533897A5 true JP2015533897A5 (enExample) | 2016-05-19 |
| JP6300805B2 JP6300805B2 (ja) | 2018-03-28 |
Family
ID=50388850
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015534464A Active JP6300805B2 (ja) | 2012-09-25 | 2013-03-20 | 放射線硬化性インク組成物 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9718975B2 (enExample) |
| EP (1) | EP2900774B1 (enExample) |
| JP (1) | JP6300805B2 (enExample) |
| WO (1) | WO2014051702A1 (enExample) |
Families Citing this family (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9961745B2 (en) | 2013-11-21 | 2018-05-01 | Ford Global Technologies, Llc | Printed LED rylene dye welcome/farewell lighting |
| US9873180B2 (en) | 2014-10-17 | 2018-01-23 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
| CN107078048B (zh) | 2014-10-17 | 2021-08-13 | 应用材料公司 | 使用加成制造工艺的具复合材料特性的cmp衬垫建构 |
| US11745302B2 (en) | 2014-10-17 | 2023-09-05 | Applied Materials, Inc. | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
| US9776361B2 (en) | 2014-10-17 | 2017-10-03 | Applied Materials, Inc. | Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles |
| US10875153B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Advanced polishing pad materials and formulations |
| GB201509501D0 (en) * | 2015-06-02 | 2015-07-15 | Fujifilm Speciality Ink Systems Ltd | A printing ink |
| US10492888B2 (en) * | 2015-07-07 | 2019-12-03 | Align Technology, Inc. | Dental materials using thermoset polymers |
| US10457825B2 (en) | 2015-08-17 | 2019-10-29 | Electronics For Imaging, Inc. | UV curable inkjet ink compositions |
| EP4279553A3 (en) * | 2015-09-14 | 2024-02-28 | Maxell, Ltd. | Ink composition, process for producing same, and ink-jet ink set and ink-jet printing system both including said ink composition |
| KR20230169424A (ko) | 2015-10-30 | 2023-12-15 | 어플라이드 머티어리얼스, 인코포레이티드 | 원하는 제타 전위를 가진 연마 제품을 형성하는 장치 및 방법 |
| US10593574B2 (en) | 2015-11-06 | 2020-03-17 | Applied Materials, Inc. | Techniques for combining CMP process tracking data with 3D printed CMP consumables |
| US10391605B2 (en) | 2016-01-19 | 2019-08-27 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
| US10108087B2 (en) | 2016-03-11 | 2018-10-23 | Macdermid Graphics Solutions Llc | Method of improving light stability of flexographic printing plates featuring flat top dots |
| WO2018179947A1 (ja) | 2017-03-30 | 2018-10-04 | 富士フイルム株式会社 | 光硬化性インク組成物及び画像形成方法 |
| GB2562747B (en) * | 2017-05-23 | 2019-06-26 | Henkel IP & Holding GmbH | Low-viscosity photocurable adhesive compositions |
| JP7381187B2 (ja) * | 2017-06-15 | 2023-11-15 | Dic株式会社 | 活性エネルギー線硬化性インク及び印刷物の製造方法 |
| CN110573583B (zh) * | 2017-05-24 | 2022-08-02 | Dic株式会社 | 活性能量射线固化性油墨和印刷物的制造方法 |
| JP7664676B2 (ja) * | 2017-05-24 | 2025-04-18 | Dic株式会社 | 活性エネルギー線硬化性インク及び印刷物の製造方法 |
| JP7713285B2 (ja) * | 2017-06-15 | 2025-07-25 | Dic株式会社 | 活性エネルギー線硬化性インク及び印刷物の製造方法 |
| JP6744360B2 (ja) * | 2017-06-15 | 2020-08-19 | Dic株式会社 | 活性エネルギー線硬化性インク及び印刷物の製造方法 |
| US11471999B2 (en) | 2017-07-26 | 2022-10-18 | Applied Materials, Inc. | Integrated abrasive polishing pads and manufacturing methods |
| CN109321145B (zh) * | 2017-07-31 | 2022-01-04 | 东洋油墨Sc控股株式会社 | 光学用活性能量线聚合性粘接剂及光学用层叠体 |
| WO2019032286A1 (en) | 2017-08-07 | 2019-02-14 | Applied Materials, Inc. | ABRASIVE DISTRIBUTION POLISHING PADS AND METHODS OF MAKING SAME |
| JP6932243B2 (ja) | 2018-03-27 | 2021-09-08 | 富士フイルム株式会社 | 光硬化性インク組成物及び画像形成方法 |
| EP3778792B1 (en) * | 2018-03-27 | 2025-01-22 | FUJIFILM Corporation | Photocurable ink composition and image forming method |
| CN112654655A (zh) | 2018-09-04 | 2021-04-13 | 应用材料公司 | 先进抛光垫配方 |
| JP7320185B2 (ja) * | 2019-02-08 | 2023-08-03 | セイコーエプソン株式会社 | 放射線硬化型インクジェット組成物及び記録方法 |
| JP7338167B2 (ja) * | 2019-02-28 | 2023-09-05 | セイコーエプソン株式会社 | インク組成物 |
| US11851570B2 (en) | 2019-04-12 | 2023-12-26 | Applied Materials, Inc. | Anionic polishing pads formed by printing processes |
| JP7656398B2 (ja) | 2019-06-17 | 2025-04-03 | セイコーエプソン株式会社 | 放射線硬化型インクジェット組成物及びインクジェット方法 |
| DE102019130152A1 (de) * | 2019-11-08 | 2021-05-12 | Heidelberger Druckmaschinen Ag | Verfahren zum Drucken auf eine Schicht mit stabilem radikalischem Photoinitiator |
| JP7648338B2 (ja) | 2019-11-20 | 2025-03-18 | スリーエム イノベイティブ プロパティズ カンパニー | 無機ナノ粒子含有耐摩耗層を含む積層体、及び低粘度の無機ナノ粒子含有放射線硬化型インク |
| JP2021113273A (ja) * | 2020-01-17 | 2021-08-05 | 株式会社リコー | 活性エネルギー線硬化型組成物、活性エネルギー線硬化型インク組成物、活性エネルギー線硬化型インクジェット用インク組成物、2次元または3次元の像形成装置、2次元または3次元の像形成方法、硬化物及び加飾体 |
| JP7435121B2 (ja) | 2020-03-25 | 2024-02-21 | セイコーエプソン株式会社 | 放射線硬化型インクジェット組成物及びインクジェット方法 |
| JP7463795B2 (ja) | 2020-03-25 | 2024-04-09 | セイコーエプソン株式会社 | 放射線硬化型インクジェット組成物及びインクジェット方法 |
| JP2022107267A (ja) * | 2021-01-08 | 2022-07-21 | セイコーエプソン株式会社 | 放射線硬化型インクジェット組成物及びインクセット |
| US11878389B2 (en) | 2021-02-10 | 2024-01-23 | Applied Materials, Inc. | Structures formed using an additive manufacturing process for regenerating surface texture in situ |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002038688A2 (en) | 2000-11-09 | 2002-05-16 | 3M Innovative Properties Company | Weather resistant, ink jettable, radiation curable, fluid compositions particularly suitable for outdoor applications |
| US6869648B2 (en) * | 2002-06-18 | 2005-03-22 | Hewlett-Packard Development Company, L.P. | Use of monomeric and oligomeric additives to stabilize dyes on porous ink jet media |
| US7037952B2 (en) | 2002-08-02 | 2006-05-02 | Seiren Co., Ltd. | Ultraviolet ray curable ink, ink composition for ink jet and process for preparing ink jet printed matter using the same |
| JP4754779B2 (ja) | 2002-09-20 | 2011-08-24 | セーレン株式会社 | 紫外線硬化型インク |
| US20060211788A1 (en) * | 2005-03-18 | 2006-09-21 | Krohn Roy C | UV curable compositions for ink or paint applications |
| GB0608466D0 (en) * | 2006-04-27 | 2006-06-07 | Sericol Ltd | A printing ink |
| JP5189258B2 (ja) | 2006-07-28 | 2013-04-24 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、及び、平版印刷版の製造方法 |
| JP2008105393A (ja) | 2006-09-25 | 2008-05-08 | Fujifilm Corp | 成形印刷物の製造方法及び成形印刷物 |
| JP4335950B2 (ja) * | 2008-02-05 | 2009-09-30 | 日立マクセル株式会社 | エネルギー線硬化型インク組成物 |
| JP2010077228A (ja) * | 2008-09-25 | 2010-04-08 | Fujifilm Corp | インク組成物、インクジェット記録方法、及び、印刷物 |
| JP5461809B2 (ja) * | 2008-09-29 | 2014-04-02 | 富士フイルム株式会社 | インク組成物、及び、インクジェット記録方法 |
| JP5583595B2 (ja) * | 2008-11-21 | 2014-09-03 | 日立マクセル株式会社 | エネルギー線硬化型インクジェットインク組成物 |
| JP5349095B2 (ja) | 2009-03-17 | 2013-11-20 | 富士フイルム株式会社 | インク組成物、及び、インクジェット記録方法 |
| JP5803258B2 (ja) * | 2010-09-30 | 2015-11-04 | セイコーエプソン株式会社 | 紫外線硬化型インクジェット用インク組成物、インクジェット記録方法 |
-
2013
- 2013-03-20 JP JP2015534464A patent/JP6300805B2/ja active Active
- 2013-03-20 EP EP13842410.6A patent/EP2900774B1/en active Active
- 2013-03-20 WO PCT/US2013/033039 patent/WO2014051702A1/en not_active Ceased
- 2013-03-20 US US14/431,203 patent/US9718975B2/en active Active
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