JP2015204416A - Opening/closing mechanism for carrying-in/carrying-out port, and cleaning device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an opening/closing mechanism for a carrying-in/carrying-out port capable of suppressing production of dust at a low cost, and a cleaning device.SOLUTION: A cleaning device includes: a housing in which a carrying-in/carrying-out port is formed; and an opening/closing mechanism 100 for the carrying-in/carrying-out port. The opening/closing mechanism 100 for the carrying-in/carrying-out port opens/closes the carrying-in/carrying-out port. The opening/closing mechanism 100 for the carrying-in/carrying-out port includes vertical moving means 110 which is fixed to a door plate 101 capable of shutting the carrying-in/carrying-out port and to a sidewall, and vertically moves the door plate 101. The vertical moving means 110 includes a vertically movable slider 111 and a base plate 112 which is fixed to the slider 111 and supports the door plate 101. The base plate 112 includes a spring member 116 which supports the door plate 101 while suspending it in a slidable state, and a link arm 117 of which the one end is pin-joined to the door plate 101 in a turnable manner and presses the door plate 101 against the carrying-in/carrying-out port when turned.

Description

  The present invention relates to an opening / closing mechanism for a carry-in / out entrance and a cleaning device.

  A cleaning device such as a semiconductor wafer cleans a wafer or the like that has been ground, polished, or cut. Since the processing chamber of the cleaning device contains mist containing processing waste scattered by cleaning and chemical mist used for cleaning in the atmosphere, it is in another area (for example, an adjacent transport area or grinding area). It is necessary to prevent mist from flowing out (see Patent Document 1). Therefore, the cleaning apparatus disclosed in Patent Document 1 has been used to carry in / out with the minimum necessary carry-in / out entrance, and the carry-out / out entrance is sealed with a door plate.

JP 2013-175658 A

  By the way, although the washing | cleaning apparatus shown by patent document 1 is a sliding-type opening-and-closing door in order to implement | achieve opening and closing in a space-saving normally, a door plate is used as a carrying-in / out opening in order to seal a carrying-in / out opening. When sliding and moving, dust will be generated by sliding, so after moving up and down a position slightly away from the carry-in entrance and covering the carry-out entrance, consider pressing the door plate toward the carry-out entrance Is done. However, in this case, since the door plate has two moving directions, there is a problem that the structure is complicated and expensive.

  The present invention has been considered in view of the above problems, and an object thereof is to provide a loading / unloading opening / closing mechanism and a cleaning device capable of suppressing dust generation at low cost.

  In order to solve the above-mentioned problems and achieve the object, the opening / closing mechanism for the loading / unloading port according to the present invention is an opening / closing mechanism for the loading / unloading port that opens and closes the loading / unloading port opened on the side wall of the housing with a door that moves up and down. A door plate capable of shielding the carry-in / out opening, and a vertical movement means fixed to the side wall and moving the door plate up and down. The vertical movement means is fixed to the slider and a slider that moves up and down, A base plate that supports the door plate, and the base plate is a spring member that suspends and supports the door plate in a slidable state, and one end of which is pivoted on the door plate. And a link arm that presses the door plate against the carry-in / out port when rotated, and when the carry-in / out port is shielded, the door plate slightly spaced from the carry-in / out port is moved by the vertical movement means Hit the regulation After that, when the base plate is further moved against the spring force of the spring member, the link arm is rotated and guided away from the base plate in a direction to press the carry-in / out port. The door plate is in contact with the carry-in / out opening and is sealed.

  The cleaning device of the present invention comprises a holding means for holding a plate-like object, a cleaning means for cleaning the plate-like object held by the holding means, an upper wall, a bottom wall, and a side wall. And a housing for housing the cleaning means, wherein a carrying-in / outlet through which a plate-like object can pass is formed on a side wall of the housing, and the opening / closing is opened and closed according to claim 1 It is characterized by being opened and closed by a mechanism.

  Therefore, by using the opening / closing mechanism for the carry-in / out port according to the present invention, the door plate can be opened / closed (up / down movement) and the door plate is brought into close contact with the carry-in / out port only by the vertical drive shaft (moving in the direction of approaching and separating from the carry-in / out port) Is possible, and the door plate can be moved in two directions with a simple structure.

FIG. 1 is a perspective view of a configuration example of a cleaning device according to an embodiment. FIG. 2 is a perspective view illustrating a state where the opening / closing mechanism for the carry-in / out entrance is removed from the cleaning device according to the embodiment. FIG. 3 is a cross-sectional view of a configuration example of the cleaning device according to the embodiment. FIG. 4 is a perspective view showing a configuration example of a loading / unloading opening / closing mechanism according to the embodiment. FIG. 5 is a perspective view showing a state in which the door plate of the opening / closing mechanism for the carry-in / out port shown in FIG. 4 opens the carry-in / out port. 6A is a side sectional view showing a state in which the door plate of the opening / closing mechanism for the carry-in / out port shown in FIG. 5 is moving in a direction to close the carry-in / out port, and FIG. FIG. 6C is a side sectional view showing a state where the door plate of the opening / closing mechanism for the carry-in / out port shown in FIG. 6A is in contact with the regulating wall, and FIG. 6C is an opening / closing mechanism for the carry-in / out port shown in FIG. It is a sectional side view which shows the state which closed the door plate in contact with the carrying in / out opening.

  DESCRIPTION OF EMBODIMENTS Embodiments (embodiments) for carrying out the present invention will be described in detail with reference to the drawings. The present invention is not limited by the contents described in the following embodiments. The constituent elements described below include those that can be easily assumed by those skilled in the art and those that are substantially the same. Furthermore, the structures described below can be combined as appropriate. Various omissions, substitutions, or changes in the configuration can be made without departing from the scope of the present invention.

Embodiment
An opening / closing mechanism and a cleaning device for a carry-in / out port according to an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a perspective view of a configuration example of a cleaning device according to an embodiment. FIG. 2 is a perspective view illustrating a state where the opening / closing mechanism for the carry-in / out entrance is removed from the cleaning device according to the embodiment. FIG. 3 is a cross-sectional view of a configuration example of the cleaning device according to the embodiment.

  An opening / closing mechanism 100 (hereinafter simply referred to as an opening / closing mechanism) for a carry-in / out port according to the embodiment constitutes the cleaning apparatus 1 shown in FIGS. 1, 2, and 3. The cleaning apparatus 1 cleans the surface WS of a wafer W (shown in FIG. 3 and corresponding to a plate-like object) that has been subjected to chemical mechanical polishing, for example. In chemical mechanical polishing (CMP), an abrasive containing colloidal silica in an alkaline aqueous solution such as sodium hydroxide (NaOH) or potassium hydroxide (KOH) is mainly used. Accordingly, the polishing agent remaining on the surface of the polished wafer contains sodium (Na) and potassium (K) that adversely affect mobile ions in the semiconductor device. The cleaning apparatus 1 is for cleaning a wafer in which an abrasive remains with a cleaning solution such as a mixed solution of ammonia water and hydrogen peroxide solution for the purpose of preventing heavy metal contamination and generation of particles.

  In this embodiment, the wafer W whose surface WS is cleaned by the cleaning apparatus 1 is a disk-shaped semiconductor wafer or optical device wafer using silicon, sapphire, gallium or the like as a base material, and is subjected to chemical mechanical polishing. After being applied, it is cleaned by the cleaning device 1. In the wafer W, for example, a device is formed in each region partitioned by a plurality of planned division lines on the back surface WR, cut along the planned division lines, and divided into individual devices.

  The cleaning apparatus 1 is a so-called spinner cleaning apparatus that cleans the surface WS of the wafer W by spraying a cleaning liquid while rotating the wafer W. As shown in FIGS. 1, 2, and 3, the cleaning apparatus 1 includes a holding unit 10 that holds the wafer W (shown only in FIG. 3) and a cleaning unit 20 that cleans the wafer W held by the holding unit 10. (Shown only in FIG. 3), a housing 30 that houses the holding means 10 and the cleaning means 20, a fan means 40, an exhaust means 50 (shown only in FIG. 3), an opening / closing mechanism 100, and a control means 60. Etc.

  The holding means 10 holds the back surface WR side of the wafer W and can rotate about an axis parallel to the vertical direction. The holding means 10 has a disk shape in which a part constituting the surface is made of porous ceramic or the like, and is connected to a vacuum suction source (not shown) via a vacuum suction path (not shown) to suck the wafer W placed on the surface. Is what you hold. The holding means 10 is connected to the table driving means 11.

  The table driving means 11 rotates the holding means 10 and raises and lowers the holding means 10 in the housing 30. The table driving means 11 has a rotating shaft 12 to which the holding means 10 is connected at one end. The rotary shaft 12 is rotatably and vertically movable and is connected to a table rotation drive source and a table vertical drive source (not shown), and a rotational force generated by the table rotary drive source and a drive force generated by the table vertical drive source. Rotation driving and elevation driving are performed by

  The cleaning means 20 is for cleaning the surface W of the wafer W held by the holding means 10 by spraying a cleaning liquid. The cleaning means 20 includes an injection nozzle 21 in which an injection port (not shown) is formed on a surface facing the surface WS of the wafer W. The injection nozzle 21 is provided so as to be swingable around a position where the injection port faces the surface WS of the wafer W and a position where the injection nozzle 21 retreats from the surface WS with the base end portion as the center. The injection nozzle 21 is connected to a tank (not shown). The spray nozzle 21 is supplied with the pressurized cleaning liquid from the tank and sprays the spray nozzle 21 toward the surface of the wafer W from the spray port. Here, there are a plurality of types of cleaning liquids depending on the state of the surface WS of the wafer W to be carried in. For example, ozone water, dilute hydrofluoric acid, SC-1 (ammonia hydrogen peroxide solution), pure water or the like is used.

  The housing 30 is for performing the wafer W cleaning process in a state of being isolated from the outside. In this embodiment, the housing 30 has a rectangular parallelepiped shape, and includes an upper wall 31, a bottom wall 32 that faces the upper wall 31, and a plurality of side walls 33 that are continuous with the upper wall 31 and the bottom wall 32. ing. On one side wall 33 (hereinafter referred to as reference numeral 33a), a carry-in / out port 34 through which the wafer W can pass is formed. The carry-in / out port 34 is a hole formed in a rectangular shape and opened in the side wall 33a.

  The fan means 40 is a fan filter device that includes a fan (not shown) and a filter 41, and is disposed on the upper wall 31 of the housing 30. The fan has its discharge flow rate controlled by the control means 60, the filter 41 is provided on the suction side, and the discharge side is disposed inside the housing 30. The fan means 40 sucks the atmosphere outside the housing 30 from which dust has been removed by the filter 41 when the fan is driven, and discharges it into the housing 30. The discharged gas generates a downward flow, that is, a downflow in the housing 30.

  The exhaust means 50 exhausts the inside of the housing 30 and exhausts from the lower side of the housing 30. As shown in FIG. 3, the exhaust means 50 includes an exhaust port 51 provided at the lower end of the other side wall 33 of the housing 30 and an exhaust pipe 52 connected to the exhaust port 51 and a suction pump (not shown). Yes. The exhaust means 50 sucks the atmosphere in the housing 30 through the exhaust pipe 52 and the exhaust port 51 by the suction pump, that is, the internal atmosphere, and the impurities (wafer W) contained in the internal atmosphere by an exhaust processing unit (not shown). After removing adhering substances and substances contained in the cleaning solution, etc., exhaust to the outside.

  Next, the opening / closing mechanism 100 will be described with reference to the drawings. FIG. 4 is a perspective view showing a configuration example of a loading / unloading opening / closing mechanism according to the embodiment. FIG. 5 is a perspective view showing a state in which the door plate of the opening / closing mechanism for the carry-in / out port shown in FIG. 4 opens the carry-in / out port. 6A is a side sectional view showing a state in which the door plate of the opening / closing mechanism for the carry-in / out port shown in FIG. 5 is moving in a direction to close the carry-in / out port, and FIG. FIG. 6C is a side sectional view showing a state where the door plate of the opening / closing mechanism for the carry-in / out port shown in FIG. 6A is in contact with the regulating wall, and FIG. 6C is an opening / closing mechanism for the carry-in / out port shown in FIG. It is a sectional side view which shows the state which closed the door plate in contact with the carrying in / out opening.

  The opening / closing mechanism 100 opens and closes the carry-in / out port 34 formed in the side wall 33 a of the housing 30. That is, the opening / closing mechanism 100 opens and closes the carry-in / out opening 34 opened in the side wall 33 a of the housing 30 by the door 102 that moves up and down. A regulating wall 35 as a regulating means is provided above the carry-in / out entrance 34 of the side wall 33a. The restriction wall 35 is provided so as to protrude from the outer surface of the side wall 33 and to extend over the entire length of the carry-in / out port 34 in the width direction. The upper end of the door plate 101 that opens and closes the carry-in / out entrance 34 can contact the restriction wall 35.

  As shown in FIGS. 4 and 5, the opening / closing mechanism 100 includes a door plate 101 and vertical movement means 110. The door plate 101 is formed in a plate shape that can shield the carry-in / out entrance 34. The vertical movement means 110 is fixed to the side wall 33a in which the carry-in / out entrance 34 is formed, and moves the door plate 101 up and down. The vertical movement means 110 includes a slider 111 that moves up and down, and a base plate 112 that is fixed to the slider 111 and supports the door plate 101. The slider 111 is moved up and down by a slide cylinder 113 disposed on one side of the carry-in / out port 34 provided in the side wall 33a. The slider 111 is provided so as to be movable along the rod 114 of the slide cylinder 113.

  The base plate 112 includes a plate body 115, a spring member 116, and a link arm 117. The plate body 115 is formed in a plate shape in which one end portion in the longitudinal direction is fixed to the slider 111. The longitudinal direction of the plate body 115 is parallel to the carry-in / out entrance 34. In this embodiment, the plate main body 115 is fixed to the slider 111 via the fixing plate 118. The door plate 101 and the base plate 112 constitute the door 102 described above.

  The spring member 116 suspends and supports the door plate 101 in a slidable state with respect to the plate body 115. The spring member 116 is constituted by a coil spring, and one end is provided on the end surface 115b of the opening 115a of the plate body 115 and is rotatably attached to a support pin 119 extending in the width direction. The other end of the spring member 116 is attached to the door plate 101. The longitudinal direction of the spring member 116 extends downward from the plate body 115 and toward the side wall 33 in a direction intersecting both the vertical direction and the horizontal direction.

  A plurality of spring members 116 are provided at intervals in the width direction of the carry-in / out entrance 34. The spring member 116 is in a state in which the longitudinal direction of the plate body 115, that is, the base plate 112, and the longitudinal direction of the door plate 101 are parallel, and the surface of the plate body 115, that is, the base plate 112, and the surface of the door plate 101 are parallel. Thus, the door plate 101 is suspended from and supported by the base plate 112. Further, the spring member 116 can slide in a direction in which the door plate 101 approaches or separates from the side wall 33 with respect to the plate body 115, that is, the base plate 112, by expanding and contracting and rotating one end with respect to the support pin 119. It will be supported in a state. Further, the spring member 116 is biased in the direction in which the door plate 101 approaches the plate body 115, that is, the base plate 112 by the spring force, and in the state where no external force is applied to the door plate 101, in this embodiment, the plate body 115. That is, the door plate 101 is kept in contact with and overlapped with the base plate 112.

  One end of the link arm 117 is pivotally connected to the door plate 101 so as to press the door plate 101 against the carry-in / out entrance 34 when the link arm 117 rotates. The link arm 117 is formed in a rod shape, and one end of the link arm 117 is provided on the beam 101a and the end surface 101b of the door plate 101 and is pivotally connected to a pin 120 extending in the width direction. The other end of the link arm 117 is rotatably joined to a support pin 119 provided on the plate body 115. The longitudinal direction of the link arm 117 intersects both the vertical direction and the horizontal direction upward from the plate main body 115 toward the side wall 33 by the spring force of the spring member 116 when no external force acts on the door plate 101. Extending in the direction.

  A plurality of link arms 117 are provided at intervals in the width direction of the carry-in / out entrance 34. One end of the link arm 117 rotates with respect to the door plate 101 and the other end rotates with respect to the plate body 115, so that the door plate 101 is moved to the side wall 33 a with respect to the plate body 115, that is, the base plate 112. It will be supported in a state where it can slide in the direction of approaching or leaving.

  Also, magnet type sensors 121a and 121b (shown in FIG. 6) capable of detecting whether the door plate 101 opens or shields the carry-in / out port 34 are attached to the door plate 101 and the side wall 33a. Yes. Further, the housing 30 of the cleaning apparatus 1 is provided with a discharge port (not shown) for discharging the cleaning liquid and the like and a differential pressure measuring means (not shown) for detecting a pressure difference between the inside and outside of the housing 30.

  The control means 60 controls each component constituting the cleaning device 1. In the present embodiment, the control means 60 controls the fan means 40 so that the pressure difference between the inside and outside of the housing 30 measured by the differential pressure measurement means (not shown) becomes zero. The control means 60 also controls the opening / closing operation of the carry-in / out port 34 by the opening / closing mechanism 100. The control means 60 is mainly composed of an arithmetic processing unit constituted by, for example, a CPU, a microprocessor (not shown) provided with a ROM, a RAM, etc., and a display means for displaying the state of the cleaning process of the cleaning apparatus 1 or an operator Is connected to operation means used when registering cleaning processing information and the like.

  Next, a cleaning method using the cleaning apparatus 1 according to the embodiment, that is, a wafer processing method for performing a wafer W cleaning process using the cleaning apparatus 1 will be described. The cleaning method as the wafer processing method starts when the operator registers the cleaning processing information and gives an instruction to start the cleaning processing.

  In the cleaning operation, first, the control means 60 lowers the door plate 101 of the opening / closing mechanism 100 to open the carry-in / out entrance 34. Then, as shown in FIG. 3, the control means 60 carries the wafer W held by the carry-in / out means 140 into the housing 30 and conveys it to the holding means 10 that has been raised in advance by the table driving means 11. The control means 60 causes the carry-in / out means 140 to release the wafer W, places the wafer W on the holding means 10, and then causes the holding means 10 to hold the wafer W.

  And the control means 60 moves the carrying in / out means 140 out of the housing | casing 30, and raises the door plate 101, as shown to Fig.6 (a). In the state shown in FIG. 6A, since no external force is applied to the door plate 101, the door plate 101 overlaps the base plate 112 and is spaced from the side wall 33a. When the opening / closing mechanism 100 shields the carry-in / out entrance 34, the door plate 101 slightly separated from the carry-in / out entrance 34 moves upward by the vertical movement means 110. Then, as shown in FIG. 6B, the door plate 101 abuts against the regulation wall 35. After the door plate 101 hits the regulation wall 35, the base plate 112 is further moved upward. Then, since the link arm 117 extends upward from the base plate 112 and toward the side wall 33a, when the base plate 112 is further moved upward against the spring force of the spring member 116, one end is at the base plate. The link arm 117 is rotated so that the other end is lowered relative to 112 and the other end is raised relative to the door plate 101. Then, the door plate 101 moves away from the base plate 112 and approaches the carry-in / out entrance 34. Then, the door plate 101 guided in the direction of pressing the carry-in / out port 34 comes into contact with the carry-in / out port 34 to seal the inside of the housing 30. When the sensors 121a and 121b detect that the door plate 101 blocks the carry-in / out entrance 34, the ascending movement of the base plate 112 is stopped.

  Further, the control means 60 lowers the holding means 10 holding the wafer W by the table driving means 11 and rotates around the axis by the table driving means 11. When the holding means 10 holding the wafer W is lowered, the control means 60 moves the spray nozzle 21 of the cleaning means 20 that has been retracted to a position facing the surface WS of the wafer W, so that the cleaning liquid rotates. The surface WS of the wafer W is cleaned by spraying on the surface WS. When the cleaning of the wafer W is completed, the control means 60 lifts the holding means 10 by the table driving means 11 after the ejection nozzle 21 of the cleaning means 20 is retracted, and releases the holding by the holding means 10 of the wafer W after cleaning. The carry-in / out means 140 that has entered the housing 30 is again held and carried out of the housing 30.

  As described above, according to the opening / closing mechanism 100 and the cleaning apparatus 1 according to the embodiment, the door plate 101 and the plate main body 115 of the base plate 112 are connected to each other by the link arm 117 rotatably attached thereto. Yes. For this reason, according to the opening / closing mechanism 100 and the cleaning device 1, the base plate 112 is raised even after the door plate 101 is abutted against the regulating wall 35, so that the door plate 101 is pressed against the side wall 33a. It is possible to guide and seal the carry-in / out entrance 34. Therefore, by providing one slide cylinder 113 that moves the base plate 112 up and down, the door plate 101 can be moved up and down and moved in a direction toward and away from the side wall 33a. Can be moved in two directions. Therefore, according to the opening / closing mechanism 100 and the cleaning device 1, dust generation can be suppressed at low cost.

  Furthermore, a spring member 116 that urges the door plate 101 toward the plate body 115 of the base plate 112 is provided. For this reason, according to the opening / closing mechanism 100 and the cleaning device 1, when no external force is applied to the door plate 101, that is, when the door plate 101 does not abut against the regulating wall 35, the door plate 101 is the base plate. It approaches 112 and is reliably separated from the side wall 33a. Therefore, according to the opening / closing mechanism 100 and the cleaning device 1, the door plate 101 can be prevented from sliding on the side wall 33 a, and the carry-in / out entrance 34 can be opened / closed while dust generation of the door plate 101 is suppressed.

  The link arm 117 extends from the plate main body 115 of the base plate 112 upward and in the direction intersecting both the vertical direction and the horizontal direction toward the side wall 33a, and the spring member 116 is connected to the plate main body of the base plate 112. The spring member 116 has one end attached to a support pin 119 to which the other end of the link arm 117 is attached, extending in a direction intersecting both the vertical direction and the horizontal direction from 115 toward the side wall 33a. For this reason, according to the opening / closing mechanism 100 and the cleaning device 1, when no external force is applied to the door plate 101, that is, when the door plate 101 is not in contact with the regulating wall 35, the door plate 101 is used as the base plate. It can approach to 112 and can be reliably separated from the side wall 33a. Further, according to the opening / closing mechanism 100 and the cleaning device 1, when the door plate 101 abuts against the regulating wall 35 and the base plate 112 is further raised, the door plate 101 is reliably guided in the direction of pressing against the side wall 33a. be able to.

  In the embodiment described above, the wafer W that has been subjected to chemical mechanical polishing is cleaned. However, the present invention is not limited to this, and the protective film is removed after the protective film is applied to the surface WS of the wafer W. The present invention may be applied to various cleaning apparatuses such as a protective film forming and cleaning apparatus. In the above embodiment, the case where the cleaning device 1 is used alone has been described. However, the cleaning device 1 according to the present invention may be incorporated as a unit in a cutting device, a grinding device, a chemical mechanical polishing device, or the like. Good.

  In addition, this invention is not limited to the said embodiment and modification. That is, various modifications can be made without departing from the scope of the present invention.

DESCRIPTION OF SYMBOLS 1 Cleaning apparatus 10 Holding means 20 Cleaning means 30 Housing | casing 31 Upper wall 32 Bottom wall 33,33a Side wall 34 Carry-in / out port 35 Restriction wall (regulation means)
DESCRIPTION OF SYMBOLS 100 Opening / Closing mechanism of entrance / exit 101 Door plate 102 Door 110 Vertical movement means 111 Slider 112 Base plate 116 Spring member 117 Link arm W Wafer (plate-shaped object)

Claims (2)

An opening / closing mechanism for a loading / unloading port that opens and closes with a door that moves up and down a loading / unloading port that opens in a side wall of the housing,
A door plate capable of shielding the loading / unloading port;
A vertical movement means fixed to the side wall and moving the door plate up and down;
The vertical movement means is
A slider that moves up and down;
A base plate fixed to the slider and supporting the door plate,
The base plate is
A spring member that suspends and supports the door plate in a slidable state;
One end is pivotally connected to the door plate, and a link arm that presses the door plate against the loading / unloading port when rotated,
When shielding the entrance / exit,
After the door plate slightly spaced from the carry-in / out entrance hits the regulating means by the movement by the vertical movement means, the link arm is moved when the base plate is further moved against the spring force of the spring member. An opening / closing mechanism for a loading / unloading port, wherein the door plate guided in a direction to rotate and separate from the base plate and press the loading / unloading port contacts and seals the loading / unloading port. A holding means for holding a plate-like object, a cleaning means for cleaning the plate-like object held by the holding means, and a housing having an upper wall, a bottom wall, and a side wall and containing the holding means and the cleaning means A cleaning device comprising:
2. A cleaning apparatus according to claim 1, wherein a carry-in / out port through which a plate-like object can pass is formed on a side wall of the housing, and the carry-in / out port is opened and closed by the opening / closing mechanism according to claim 1.

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