JP2015177108A5 - - Google Patents

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Publication number
JP2015177108A5
JP2015177108A5 JP2014053680A JP2014053680A JP2015177108A5 JP 2015177108 A5 JP2015177108 A5 JP 2015177108A5 JP 2014053680 A JP2014053680 A JP 2014053680A JP 2014053680 A JP2014053680 A JP 2014053680A JP 2015177108 A5 JP2015177108 A5 JP 2015177108A5
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JP
Japan
Prior art keywords
gate valve
chamber
cover
processing chamber
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014053680A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015177108A (ja
JP6352012B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2014053680A priority Critical patent/JP6352012B2/ja
Priority claimed from JP2014053680A external-priority patent/JP6352012B2/ja
Publication of JP2015177108A publication Critical patent/JP2015177108A/ja
Publication of JP2015177108A5 publication Critical patent/JP2015177108A5/ja
Application granted granted Critical
Publication of JP6352012B2 publication Critical patent/JP6352012B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2014053680A 2014-03-17 2014-03-17 プラズマ処理装置 Expired - Fee Related JP6352012B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014053680A JP6352012B2 (ja) 2014-03-17 2014-03-17 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014053680A JP6352012B2 (ja) 2014-03-17 2014-03-17 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2015177108A JP2015177108A (ja) 2015-10-05
JP2015177108A5 true JP2015177108A5 (https=) 2017-02-23
JP6352012B2 JP6352012B2 (ja) 2018-07-04

Family

ID=54255981

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014053680A Expired - Fee Related JP6352012B2 (ja) 2014-03-17 2014-03-17 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JP6352012B2 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025009345A1 (ja) * 2023-07-05 2025-01-09 東京エレクトロン株式会社 プラズマ処理システム、基板処理システムおよびゲートバルブユニット

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5000555B2 (ja) * 2008-03-12 2012-08-15 東京エレクトロン株式会社 ゲートバルブおよび半導体製造装置
JP5190387B2 (ja) * 2009-01-16 2013-04-24 東京エレクトロン株式会社 真空装置及び基板処理装置
JP2011035415A (ja) * 2010-10-18 2011-02-17 Hitachi High-Technologies Corp 真空処理装置
JP5593418B2 (ja) * 2013-05-08 2014-09-24 東京エレクトロン株式会社 処理容器およびプラズマ処理装置

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