JP2015172751A - Method of producing optical alignment film, optical alignment film and phase difference film - Google Patents
Method of producing optical alignment film, optical alignment film and phase difference film Download PDFInfo
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- JP2015172751A JP2015172751A JP2015079033A JP2015079033A JP2015172751A JP 2015172751 A JP2015172751 A JP 2015172751A JP 2015079033 A JP2015079033 A JP 2015079033A JP 2015079033 A JP2015079033 A JP 2015079033A JP 2015172751 A JP2015172751 A JP 2015172751A
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- film
- alignment film
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- polymer
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 14
- 230000001678 irradiating effect Effects 0.000 claims description 4
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- HWMJTYVELYOWLU-UHFFFAOYSA-N 6-[4-[(4-methoxyphenyl)diazenyl]phenoxy]hexyl 2-methylprop-2-enoate Chemical compound C1=CC(OC)=CC=C1N=NC1=CC=C(OCCCCCCOC(=O)C(C)=C)C=C1 HWMJTYVELYOWLU-UHFFFAOYSA-N 0.000 description 1
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 description 1
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- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- KWIUHFFTVRNATP-UHFFFAOYSA-N Betaine Natural products C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 1
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- MDYZZKVBGRKBBE-LICLKQGHSA-N COc1ccc(OC(=O)\C=C\c2ccc(OCCCCCCOC(=O)C(C)=C)cc2)cc1 Chemical compound COc1ccc(OC(=O)\C=C\c2ccc(OCCCCCCOC(=O)C(C)=C)cc2)cc1 MDYZZKVBGRKBBE-LICLKQGHSA-N 0.000 description 1
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- 241000282693 Cercopithecidae Species 0.000 description 1
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- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- BZMLETGRCRSEDT-UHFFFAOYSA-N FC1=C(C(=O)O)C=CC(=C1)OCCCCCCOC(C(=C)C)=O Chemical compound FC1=C(C(=O)O)C=CC(=C1)OCCCCCCOC(C(=C)C)=O BZMLETGRCRSEDT-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
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- NQSMEZJWJJVYOI-UHFFFAOYSA-N Methyl 2-benzoylbenzoate Chemical compound COC(=O)C1=CC=CC=C1C(=O)C1=CC=CC=C1 NQSMEZJWJJVYOI-UHFFFAOYSA-N 0.000 description 1
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- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
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- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- NWGKJDSIEKMTRX-AAZCQSIUSA-N Sorbitan monooleate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O NWGKJDSIEKMTRX-AAZCQSIUSA-N 0.000 description 1
- VBIIFPGSPJYLRR-UHFFFAOYSA-M Stearyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)C VBIIFPGSPJYLRR-UHFFFAOYSA-M 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
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- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- IPTNXMGXEGQYSY-UHFFFAOYSA-N acetic acid;1-methoxybutan-1-ol Chemical compound CC(O)=O.CCCC(O)OC IPTNXMGXEGQYSY-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
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- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
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- BTBJBAZGXNKLQC-UHFFFAOYSA-N ammonium lauryl sulfate Chemical compound [NH4+].CCCCCCCCCCCCOS([O-])(=O)=O BTBJBAZGXNKLQC-UHFFFAOYSA-N 0.000 description 1
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- VAZSKTXWXKYQJF-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)OOS([O-])=O VAZSKTXWXKYQJF-UHFFFAOYSA-N 0.000 description 1
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- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
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- QDVNNDYBCWZVTI-UHFFFAOYSA-N bis[4-(ethylamino)phenyl]methanone Chemical compound C1=CC(NCC)=CC=C1C(=O)C1=CC=C(NCC)C=C1 QDVNNDYBCWZVTI-UHFFFAOYSA-N 0.000 description 1
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- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- WOWHHFRSBJGXCM-UHFFFAOYSA-M cetyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)C WOWHHFRSBJGXCM-UHFFFAOYSA-M 0.000 description 1
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- MRUAUOIMASANKQ-UHFFFAOYSA-N cocamidopropyl betaine Chemical compound CCCCCCCCCCCC(=O)NCCC[N+](C)(C)CC([O-])=O MRUAUOIMASANKQ-UHFFFAOYSA-N 0.000 description 1
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- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 238000000113 differential scanning calorimetry Methods 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- GLSRFBDXBWZNLH-UHFFFAOYSA-L disodium;2-chloroacetate;2-(4,5-dihydroimidazol-1-yl)ethanol;hydroxide Chemical compound [OH-].[Na+].[Na+].[O-]C(=O)CCl.OCCN1CCN=C1 GLSRFBDXBWZNLH-UHFFFAOYSA-L 0.000 description 1
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- 239000004210 ether based solvent Substances 0.000 description 1
- 125000005448 ethoxyethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- XNICETZFWREDRJ-UHFFFAOYSA-N ethyl 2-[(1-ethoxy-2-methyl-1-oxopropan-2-yl)diazenyl]-2-methylpropanoate Chemical compound CCOC(=O)C(C)(C)N=NC(C)(C)C(=O)OCC XNICETZFWREDRJ-UHFFFAOYSA-N 0.000 description 1
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- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 1
- 238000001641 gel filtration chromatography Methods 0.000 description 1
- 229940074050 glyceryl myristate Drugs 0.000 description 1
- 125000003707 hexyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 229940094506 lauryl betaine Drugs 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- YLHXLHGIAMFFBU-UHFFFAOYSA-N methyl phenylglyoxalate Chemical compound COC(=O)C(=O)C1=CC=CC=C1 YLHXLHGIAMFFBU-UHFFFAOYSA-N 0.000 description 1
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 description 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 1
- DVEKCXOJTLDBFE-UHFFFAOYSA-N n-dodecyl-n,n-dimethylglycinate Chemical compound CCCCCCCCCCCC[N+](C)(C)CC([O-])=O DVEKCXOJTLDBFE-UHFFFAOYSA-N 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 125000001117 oleyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])/C([H])=C([H])\C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002921 oxetanes Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- 229930015698 phenylpropene Natural products 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- 125000004591 piperonyl group Chemical group C(C1=CC=2OCOC2C=C1)* 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- PYJBVGYZXWPIKK-UHFFFAOYSA-M potassium;tetradecanoate Chemical compound [K+].CCCCCCCCCCCCCC([O-])=O PYJBVGYZXWPIKK-UHFFFAOYSA-M 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- DCBSHORRWZKAKO-UHFFFAOYSA-N rac-1-monomyristoylglycerol Chemical compound CCCCCCCCCCCCCC(=O)OCC(O)CO DCBSHORRWZKAKO-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229940096501 sodium cocoamphoacetate Drugs 0.000 description 1
- KSAVQLQVUXSOCR-UHFFFAOYSA-M sodium lauroyl sarcosinate Chemical compound [Na+].CCCCCCCCCCCC(=O)N(C)CC([O-])=O KSAVQLQVUXSOCR-UHFFFAOYSA-M 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- 229950004959 sorbitan oleate Drugs 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- SFVFIFLLYFPGHH-UHFFFAOYSA-M stearalkonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 SFVFIFLLYFPGHH-UHFFFAOYSA-M 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- JLYXXMFPNIAWKQ-UHFFFAOYSA-N γ Benzene hexachloride Chemical compound ClC1C(Cl)C(Cl)C(Cl)C(Cl)C1Cl JLYXXMFPNIAWKQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3016—Polarising elements involving passive liquid crystal elements
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
- C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
-
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Abstract
Description
本発明は、共重合性(メタ)アクリル酸ポリマー、光配向膜及び位相差膜に関し、より詳しくは、末端にカルボキシル基を有する側鎖と末端にアクリル酸エステル部分を有する側鎖とを併せもつ共重合性(メタ)アクリル酸ポリマー、それを含んでなる光配向膜用組成物、該組成物からなる膜に液晶配向能を生じさせた光配向膜及び該光配向膜上に液晶性化合物を配向させた位相差膜に関する。 The present invention relates to a copolymerizable (meth) acrylic acid polymer, a photo-alignment film, and a retardation film. More specifically, the present invention has a side chain having a carboxyl group at the terminal and a side chain having an acrylate moiety at the terminal. Copolymerizable (meth) acrylic acid polymer, composition for photo-alignment film comprising the same, photo-alignment film in which liquid crystal alignment ability is produced in the film comprising the composition, and liquid crystalline compound on the photo-alignment film The present invention relates to an oriented retardation film.
近年、ディスプレー(液晶ディスプレーの他、フレキシブルディスプレーなども含む)分野では、位相差膜(光学異方性膜)が様々な形で利用されている。かかる位相差膜は、液晶配向能を有する膜(又は基板)上に液晶性化合物を塗布して製造されるが、従来、該膜(又は基板)に液晶配向能を付与する方法として、その表面を化学的あるいは物理的に処理する方法が知られている。かかる方法として、例えば、基板表面に被覆したポリイミドなどの高分子樹脂膜を一方向に布などで擦るラビング処理が知られており、液晶表示装置用配向膜等の形成に用いられている。しかしながら、かかる方法においては、微細な埃の発生による液晶製造ラインの汚染や、静電気によるTFT(薄膜トランジスタ)素子の破壊などが、液晶パネルの製造工程における歩留まりの低下を引き起こす原因となったり、定量的な配向制御が困難であることなどの問題があった。 In recent years, retardation films (optically anisotropic films) are used in various forms in the field of displays (including liquid crystal displays as well as flexible displays). Such a retardation film is produced by applying a liquid crystal compound on a film (or substrate) having liquid crystal alignment ability. Conventionally, as a method for imparting liquid crystal alignment ability to the film (or substrate), the surface thereof is used. There is known a method of chemically or physically treating the. As such a method, for example, a rubbing process in which a polymer resin film such as polyimide coated on the substrate surface is rubbed in one direction with a cloth or the like is known and used for forming an alignment film for a liquid crystal display device or the like. However, in such a method, contamination of the liquid crystal production line due to generation of fine dust, destruction of TFT (thin film transistor) elements due to static electricity, or the like may cause a decrease in yield in the manufacturing process of the liquid crystal panel. There are problems such as difficult orientation control.
そこで、ラビング処理に代わり、光照射により、液晶配向能を付与する光配向膜が種々提案されている(特許文献1〜3)。特に、特許文献2には、光反応性側鎖末端にカルボキシル基を有するモノマーを重合させた光配向材が良好な光反応効率を示すものとして記載されている。しかし、かかる光配向材は、原料であるモノマーが高価なため、製造コストを抑えることが難しいという問題があった。そこで、特許文献3には、前記モノマーの一部をより安価な別のモノマーに置き換えることにより、上記問題を解決した共重合性ポリマーが記載されている。かかる別のモノマーは、末端にカルボキシル基を有する点は共通するものの、光反応性を示す構造を含まないものである。 Therefore, various photo-alignment films that provide liquid crystal alignment ability by light irradiation instead of rubbing treatment have been proposed (Patent Documents 1 to 3). In particular, Patent Document 2 describes that a photo-alignment material obtained by polymerizing a monomer having a carboxyl group at a photoreactive side chain end exhibits good photoreaction efficiency. However, such a photo-alignment material has a problem that it is difficult to suppress the manufacturing cost because the monomer as a raw material is expensive. Therefore, Patent Document 3 describes a copolymerizable polymer that solves the above problem by replacing a part of the monomer with another less expensive monomer. Such another monomer is common in that it has a carboxyl group at the terminal, but does not include a photoreactive structure.
一般に、このようなポリマーを用いて位相差フィルムを製造するには、ポリマーを、まず溶媒に溶解し、かかる溶液を基板上に塗布し、乾燥し、直線偏光等を照射し、必要に応じ加熱して光配向膜とする。そして、該光配向膜上に液晶性化合物を塗布し、これを加温して該液晶性化合物を配向させ、さらにUV硬化した後、加熱することにより配向性を向上させ、位相差フィルムとする。かかるプロセスにおいて、最初にポリマーを溶解させる溶媒としては、できるだけ毒性や環境負荷の低いものが望まれるが、上記特許文献2及び特許文献3記載のポリマーは溶解性が悪く、毒性や環境負荷の比較的高い溶媒を使用せざるを得ないという問題があった。 In general, to produce a retardation film using such a polymer, the polymer is first dissolved in a solvent, the solution is applied onto a substrate, dried, irradiated with linearly polarized light, etc., and heated as necessary. Thus, a photo-alignment film is obtained. Then, a liquid crystal compound is applied onto the photo-alignment film, and this is heated to orient the liquid crystal compound, further UV-cured, and then heated to improve the orientation and form a retardation film. . In such a process, as the solvent for dissolving the polymer at first, a solvent having as low toxicity and environmental load as possible is desired. However, the polymers described in Patent Document 2 and Patent Document 3 have poor solubility, and the toxicity and environmental load are compared. There is a problem in that it is necessary to use an expensive solvent.
また、基板上に塗布したポリマーに直線偏光を照射する際の露光量には、光配向膜を製造する上で最適な範囲(最適偏光露光量。本明細書においては、単に、最適露光量ともいう。)がある一方、ある露光量を超えると膜が劣化してしまうという限界値(限界偏光露光量。本明細書においては、単に、限界露光量ともいう。)も存在するため、好適な光配向膜を製造するにはその露光量を適確に調整する必要がある。かかる調整は、偏光を照射する機械により、その露光強度及び露光時間を調整することにより行われるが、最適露光量の値が小さく(光感受性高く)かつ限界露光量との差が小さいと、かかる調整を行うことが極めて困難になるという問題があった。 In addition, the exposure amount when irradiating the polymer coated on the substrate with linearly polarized light is the optimum range for producing the photo-alignment film (optimal polarized light exposure amount. On the other hand, there is also a limit value (a limit polarization exposure amount. In this specification, it is also simply referred to as a limit exposure amount) that a film deteriorates when a certain exposure amount is exceeded. In order to produce the photo-alignment film, it is necessary to adjust the exposure amount appropriately. Such adjustment is performed by adjusting the exposure intensity and exposure time with a machine that irradiates polarized light. However, if the value of the optimum exposure amount is small (high photosensitivity) and the difference from the limit exposure amount is small, the adjustment takes place. There was a problem that it was extremely difficult to make adjustments.
さらに、光配向膜に液晶性化合物を配向させ位相差膜を製造する際には、液晶性化合物をUV硬化させた後、200℃を超える高温に加熱する必要があるが、かかる加熱の過程の前後で、膜の複屈折率が減少する(耐熱性が低い)という問題があった。 Further, when producing a retardation film by aligning a liquid crystalline compound on a photo-alignment film, it is necessary to heat the liquid crystalline compound to a high temperature exceeding 200 ° C. after UV curing. Before and after, there was a problem that the birefringence of the film decreased (low heat resistance).
上記背景において、本発明は、毒性及び環境負荷の低い溶媒に溶解することができる、共重合性(メタ)アクリル酸ポリマー、それを含んでなる光配向膜用組成物、該組成物からなる膜に液晶配向能を生じさせた光配向膜、及び該光配向膜上に液晶性化合物を配向させた位相差膜を提供することを目的とする。 In the above background, the present invention relates to a copolymerizable (meth) acrylic acid polymer that can be dissolved in a solvent having low toxicity and low environmental load, a composition for a photoalignment film comprising the same, and a film comprising the composition An object of the present invention is to provide a photo-alignment film having a liquid crystal alignment ability and a retardation film in which a liquid crystalline compound is aligned on the photo-alignment film.
また、本発明は、液晶膜の製膜プロセス、すなわち膜の加熱(焼成)工程において、複屈折率の減少を抑えることのできる(耐熱性が高い)共重合性(メタ)アクリル酸ポリマー、それを含んでなる光配向膜用組成物、該組成物からなる膜に液晶配向能を生じさせた光配向膜、及び該光配向膜上に液晶性化合物を配向させた位相差膜を提供することを目的とする。 The present invention also provides a copolymerizable (meth) acrylic acid polymer that can suppress a decrease in birefringence (high heat resistance) in a liquid crystal film forming process, that is, a film heating (firing) step, A photoalignment film composition comprising the composition, a photoalignment film in which liquid crystal alignment ability is generated in the film made of the composition, and a retardation film in which a liquid crystalline compound is aligned on the photoalignment film With the goal.
さらに、本発明は、光配向膜を製造する際に照射する偏光の最適露光量の値が比較的大きく(光感受性が低く)及び/又は該最適露光量と限界露光量の差が大きく、露光量の調節が容易である共重合性(メタ)アクリル酸ポリマー、それを含んでなる光配向膜用組成物、該組成物からなる膜に液晶配向能を生じさせた光配向膜、及び該光配向膜上に液晶性化合物を配向させた位相差膜を提供することを目的とする。 Further, according to the present invention, the value of the optimum exposure amount of polarized light irradiated when producing the photo-alignment film is relatively large (low photosensitivity) and / or the difference between the optimum exposure amount and the limit exposure amount is large. Copolymerizable (meth) acrylic acid polymer whose amount can be easily adjusted, composition for photo-alignment film comprising the same, photo-alignment film in which liquid crystal alignment ability is produced in the film comprising the composition, and the light An object is to provide a retardation film in which a liquid crystal compound is aligned on an alignment film.
本発明者らは、鋭意検討を行った結果、末端にカルボキシル基を有する側鎖と末端にアリールアクリル酸エステル(好ましくは、桂皮酸エステル)部分を有する側鎖とを併せもつ、新規な共重合性(メタ)アクリル酸ポリマーを用いれば、上記課題を解決できることを見出し、本発明を完成させた。すなわち、本発明は、 As a result of intensive studies, the present inventors have found that a novel copolymer having both a side chain having a carboxyl group at the terminal and a side chain having an aryl acrylate (preferably cinnamic acid) moiety at the terminal The present inventors have found that the above problems can be solved by using a functional (meth) acrylic acid polymer, and have completed the present invention. That is, the present invention
〔1〕一般式(I)
で示される基であり、Zは−CH=CHCOO−(トランス体)又は−N=N−で示される基であり、p及びqはそれぞれ独立して、1〜12のいずれかの整数であり、m及びnは、0.65≦m≦0.95、0.05≦n≦0.35、m+n=1の関係を満たす共重合体に占める各モノマーのモル分率である。〕
で示される繰り返し単位を有する共重合性(メタ)アクリル酸ポリマー、
Z is a group represented by —CH═CHCOO— (trans isomer) or —N═N—, and p and q are each independently an integer of 1 to 12. , M and n are mole fractions of each monomer in the copolymer satisfying the relationship of 0.65 ≦ m ≦ 0.95, 0.05 ≦ n ≦ 0.35, and m + n = 1. ]
A copolymerizable (meth) acrylic acid polymer having a repeating unit represented by:
〔2〕一般式(I−A)
で示される基であり、Zは−CH=CHCOO−(トランス体)又は−N=N−で示される基であり、p及びqはそれぞれ独立して、1〜12のいずれかの整数であり、m及びnは、0.65≦m≦0.95、0.05≦n≦0.35、m+n=1の関係を満たす共重合体に占める各モノマーのモル分率である。〕
で示される繰り返し単位を有する共重合性(メタ)アクリル酸ポリマー、
Z is a group represented by —CH═CHCOO— (trans isomer) or —N═N—, and p and q are each independently an integer of 1 to 12. , M and n are mole fractions of each monomer in the copolymer satisfying the relationship of 0.65 ≦ m ≦ 0.95, 0.05 ≦ n ≦ 0.35, and m + n = 1. ]
A copolymerizable (meth) acrylic acid polymer having a repeating unit represented by:
〔3〕一般式(I−a)
で示される基であり、p及びqはそれぞれ独立して、1〜12のいずれかの整数であり、m及びnは、0.65≦m≦0.95、0.05≦n≦0.35、m+n=1の関係を満たす共重合体に占める各モノマーのモル分率である。〕
で示される繰り返し単位を有する共重合性(メタ)アクリル酸ポリマー、
P and q are each independently an integer of 1 to 12, and m and n are 0.65 ≦ m ≦ 0.95, 0.05 ≦ n ≦ 0. 35, the molar fraction of each monomer in the copolymer satisfying the relationship of m + n = 1. ]
A copolymerizable (meth) acrylic acid polymer having a repeating unit represented by:
〔4〕一般式(I−b)
で示される繰り返し単位を有する共重合性(メタ)アクリル酸ポリマー、
[4] General formula (Ib)
A copolymerizable (meth) acrylic acid polymer having a repeating unit represented by:
〔5〕一般式(I−c)
で示される繰り返し単位を有する共重合性(メタ)アクリル酸ポリマー、
[5] General formula (Ic)
A copolymerizable (meth) acrylic acid polymer having a repeating unit represented by:
〔6〕上記〔1〕〜〔5〕のいずれか1項に記載の共重合性(メタ)アクリル酸ポリマーを含んでなる、光配向膜用組成物、 [6] A composition for a photo-alignment film, comprising the copolymerizable (meth) acrylic acid polymer according to any one of [1] to [5] above,
〔7〕上記〔6〕の光配向膜用組成物からなる膜に、異方性を有する光を照射し、更にこれを加熱して液晶配向能を生じさせた、光配向膜、 [7] A photo-alignment film obtained by irradiating a film comprising the composition for a photo-alignment film according to [6] above with anisotropy light and further heating the film to generate a liquid crystal alignment ability;
〔8〕上記〔7〕の光配向膜上に液晶性化合物を配向させた位相差膜、
に関する。
[8] A retardation film in which a liquid crystalline compound is aligned on the photo-alignment film of [7],
About.
上記本発明の共重合性(メタ)アクリル酸ポリマー(I)は、毒性が低く環境負荷が低い溶媒であるメチルエチルケトン及び/又はシクロヘキサノン及び/又は1−メトキシ−2−プロパノールに可溶という優れた特長を有する。また、メチルエチルケトンとシクロヘキサノンと1−メトキシ−2−プロパノールは、沸点がそれぞれ約80℃、約155℃、約120℃と低いため、その分、溶媒を留去するための乾燥工程が容易となるという利点を有する。 The copolymerizable (meth) acrylic acid polymer (I) of the present invention has an excellent feature of being soluble in methyl ethyl ketone and / or cyclohexanone and / or 1-methoxy-2-propanol, which are solvents having low toxicity and low environmental impact. Have In addition, since methyl ethyl ketone, cyclohexanone and 1-methoxy-2-propanol have low boiling points of about 80 ° C., about 155 ° C. and about 120 ° C., respectively, the drying process for distilling off the solvent is facilitated accordingly. Have advantages.
あるいは、本発明のポリマーは、これを配向膜として使用して、更に液晶性化合物を配向させて位相差膜を作製すれば、該位相差膜の製膜プロセスにおける加熱工程での膜の複屈折率の減少を抑えることができる(すなわち、膜の耐熱性が高くなる)、並びに/又は、光配向膜を製造する際に照射する偏光の最適露光量の値が比較的大きくなる及び/若しくは該最適露光量と限界露光量の差が大きくなる(すなわち、露光量の調節が容易となる)という優れた特長を有する。 Alternatively, when the polymer of the present invention is used as an alignment film and a liquid crystalline compound is further aligned to produce a retardation film, the birefringence of the film in the heating step in the film formation process of the retardation film Reduction of the rate can be suppressed (that is, the heat resistance of the film is increased), and / or the value of the optimum exposure amount of polarized light irradiated when producing the photo-alignment film is relatively large and / or It has an excellent feature that the difference between the optimum exposure amount and the limit exposure amount becomes large (that is, the exposure amount can be easily adjusted).
本発明のポリマー(1)において、好ましい具体例を以下に示す。 In the polymer (1) of the present invention, preferred specific examples are shown below.
一般式(I−A)
で示される繰り返し単位を有する共重合性(メタ)アクリル酸ポリマー。
General formula (IA)
A copolymerizable (meth) acrylic acid polymer having a repeating unit represented by:
一般式(I−B)
で示される基であり、p及びqはそれぞれ独立して、1〜12のいずれかの整数であり、m及びnは、0.65≦m≦0.95、0.05≦n≦0.35、m+n=1の関係を満たす共重合体に占める各モノマーのモル分率である。〕
で示される繰り返し単位を有する共重合性(メタ)アクリル酸ポリマー。
General formula (IB)
P and q are each independently an integer of 1 to 12, and m and n are 0.65 ≦ m ≦ 0.95, 0.05 ≦ n ≦ 0. 35, the molar fraction of each monomer in the copolymer satisfying the relationship of m + n = 1. ]
A copolymerizable (meth) acrylic acid polymer having a repeating unit represented by:
一般式(I−a)
で示される繰り返し単位を有する共重合性(メタ)アクリル酸ポリマー。
Formula (Ia)
A copolymerizable (meth) acrylic acid polymer having a repeating unit represented by:
一般式(I−b)
で示される繰り返し単位を有する共重合性(メタ)アクリル酸ポリマー。
Formula (Ib)
A copolymerizable (meth) acrylic acid polymer having a repeating unit represented by:
一般式(I−c)
本発明の一般式(I)(一般式(I−A)及び(I−B)並びに一般式(I−a)〜(I−c)を含む。以下同様。)において、R1としては、メチル基が好ましい。R2としては、アルキル基、又はアルキル基、アルコキシ基、シアノ基及びハロゲン原子から選ばれる1の基で置換されたフェニル基が好ましく、このうちアルキル基、又はシアノ基で置換されたフェニル基が好ましく、更に、アルキル基が最も好ましい。R2の他の好ましい例としては、アルキル基、又はアルコキシ基若しくはシアノ基で置換されたフェニル基が挙げられ、このうち、アルキル基、又はアルコキシ基で置換されたフェニル基が好ましい。R2の他の好ましい例としては、アルコキシ基若しくはシアノ基で置換されたフェニル基が挙げられ、このうち、アルコキシ基で置換されたフェニル基が更に好ましい。R2の他の好ましい例は、アルキル基である。X1〜X38としては、いずれも水素原子又はハロゲン原子が好ましい。p及びqとしては、いずれも、3〜9のいずれかの整数が好ましく、このうち5〜7のいずれかの整数が好ましく、6が最も好ましい。mについては、好ましくは約0.75≦m≦約0.85の範囲であり、最も好ましいのは約0.8である。対応するnの好ましい範囲は、m+n=1から自ずと定まる範囲である。すなわち、好ましくは約0.15≦n≦約0.25の範囲であり、最も好ましいのは約0.2である。 In general formula (I) of the present invention (including general formulas (IA) and (IB) and general formulas (Ia) to (Ic), the same shall apply hereinafter)), R 1 is A methyl group is preferred. R 2 is preferably an alkyl group, or a phenyl group substituted with one group selected from an alkyl group, an alkoxy group, a cyano group, and a halogen atom. Among these, an alkyl group or a phenyl group substituted with a cyano group is preferred. Furthermore, an alkyl group is most preferable. Other preferred examples of R 2 include an alkyl group, or a phenyl group substituted with an alkoxy group or a cyano group, and among these, an alkyl group or a phenyl group substituted with an alkoxy group is preferred. Other preferred examples of R 2 include a phenyl group substituted with an alkoxy group or a cyano group, and among these, a phenyl group substituted with an alkoxy group is more preferred. Another preferred example of R 2 is an alkyl group. X 1 to X 38 are each preferably a hydrogen atom or a halogen atom. As p and q, any integer of 3 to 9 is preferable, and any integer of 5 to 7 is preferable, and 6 is most preferable. m is preferably in the range of about 0.75 ≦ m ≦ about 0.85, and most preferably about 0.8. The corresponding preferred range of n is a range that is naturally determined from m + n = 1. That is, preferably in the range of about 0.15 ≦ n ≦ about 0.25, and most preferably about 0.2.
本発明の一般式(I)において、X1A〜X4Aとしては、水素原子又はハロゲン原子が好ましく、特に、X1A〜X4Aのいずれか一つがハロゲン原子であって、その他が水素原子である場合が好ましく、更に全てが水素原子である場合が最も好ましい。また、X31B〜X38Bとしては、水素原子又はハロゲン原子が好ましく、全てが水素原子である場合が最も好ましい。 In the general formula (I) of the present invention, as X 1A to X 4A , a hydrogen atom or a halogen atom is preferable, and any one of X 1A to X 4A is a halogen atom, and the other is a hydrogen atom. The case is preferable, and the case where all are hydrogen atoms is most preferable. X 31B to X 38B are preferably hydrogen atoms or halogen atoms, and most preferably all are hydrogen atoms.
R2のアルキル基又はR2のフェニル基の置換基のアルキル基としては、炭素数1〜12のアルキル基が挙げられ、そのうち、好ましくは炭素数1〜6のものが、更に好ましくは炭素数1〜4のものが、最も好ましくはメチル基が挙げられる。R2のフェニル基の置換基のアルコキシ基としては、炭素数1〜12のアルコキシ基が挙げられ、そのうち、好ましくは炭素数1〜6のものが、更に好ましくは炭素数1〜4のものが、最も好ましくはメトキシ基が挙げられる。R2のフェニル基の置換基のハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子が挙げられ、このうち、フッ素原子が好ましい。X1〜X38において、アルキル基としては、炭素数1〜4のものが挙げられ、そのうちメチル基が最も好ましく、アルコキシ基としては、炭素数1〜4のものが挙げられ、そのうちメトキシ基が最も好ましく、ハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子が挙げられ、このうち、フッ素原子が好ましい。 The alkyl group of the substituents of the phenyl group of the alkyl group or R 2 in R 2, include an alkyl group having 1 to 12 carbon atoms, of which, preferably those having 1 to 6 carbon atoms, more preferably a carbon number A thing of 1-4 is most preferable, and a methyl group is mentioned. Examples of the alkoxy group of the substituent of the phenyl group of R 2 include an alkoxy group having 1 to 12 carbon atoms, and among them, those having 1 to 6 carbon atoms are preferable, and those having 1 to 4 carbon atoms are more preferable. Most preferred is a methoxy group. Examples of the halogen atom for the substituent of the phenyl group of R 2 include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, and among these, a fluorine atom is preferable. In X 1 to X 38 , examples of the alkyl group include those having 1 to 4 carbon atoms, of which a methyl group is most preferable, and examples of the alkoxy group include those having 1 to 4 carbon atoms, of which a methoxy group is Most preferably, examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, and among these, a fluorine atom is preferable.
なお、本明細書において、X1A〜X38Aは、環A又は環B上の置換基であるX1〜X38について、それらが環A上の置換基である場合を表し、X1B〜X38Bは、それらが環B上の置換基である場合を表すものである。したがって、X1〜X38についての説明は、そのままX1A〜X38A及びX1B〜X38Bに対しても適用し得るものである。 In addition, in this specification, X < 1A > -X < 38A > represents the case where they are the substituent on ring A about X < 1 > -X < 38 > which is a substituent on ring A or ring B, X < 1B > -X < 38 > 38B represents the case where they are substituents on ring B. Therefore, description of the X 1 to X 38 are those which can be applied also to directly X 1A to X 38A and X 1B to X 38B.
本発明のポリマー(I)は、一般式(II)
で示される(メタ)アクリル酸モノマー(M1)の所定量と、一般式(III)
で示される(メタ)アクリル酸モノマー(M2)の所定量とを、無溶媒又は溶媒中混合して、重合させることにより、製造することができる。重合は光又は熱を用いて実施することができる。重合工程において、材料や溶媒等を仕込む方法は特に限定されず、重合前に反応容器へ予め全材料を投入した後に重合を開始してもよいし、M1とM2を混合したのち、かかる混合物や溶媒等の一部について重合開始した後に、残りを滴下又は分割投入などの方法により段階的に追加してもよい。
The polymer (I) of the present invention has the general formula (II)
A predetermined amount of (meth) acrylic acid monomer (M1) represented by formula (III)
And a predetermined amount of the (meth) acrylic acid monomer (M2) represented by the formula (1) can be produced by mixing in a solvent-free or solvent and polymerizing. The polymerization can be carried out using light or heat. In the polymerization step, the method of charging the material, the solvent and the like is not particularly limited, and the polymerization may be started after all the materials are charged into the reaction vessel in advance before the polymerization, or after mixing M1 and M2, After the polymerization of a part of the solvent or the like is started, the remainder may be added stepwise by a method such as dropwise addition or divided addition.
また、M1及びM2の重合に際して、必須ではないが、他のモノマーを、含有させてもよく、そのようなモノマーは、重合性のエチレン性不飽和結合を有する化合物である限り、それ以外の点では特に限定されず、液晶性を有するものでなくてもよい。 In addition, other monomers may be included in the polymerization of M1 and M2, but other monomers may be included as long as the monomer is a compound having a polymerizable ethylenically unsaturated bond. Then, it is not particularly limited, and it may not have liquid crystallinity.
そのようなモノマーとしては、例えば、メチル(メタ)アクリレート、t−ブチル(メタ)アクリレート、ステアリル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、エトキシエチル(メタ)アクリレート、ヒドロキシエチル(メタ)アクリレート、フェニル(メタ)アクリレート、N、N−ジメチルアクリルアミドなどの(メタ)アクリルモノマー、スチレン、α−メチルスチレン、p−スチレンスルホン酸、エチルビニルエーテル、N−ビニルイミダゾール、ビニルアセテート、ビニルピリジン、2−ビニルナフタレン、塩化ビニル、フッ化ビニル、N−ビニルカルバゾール、ビニルアミン、ビニルフェノール、N−ビニル−2−ピロリドンなどのビニル系モノマー、4−アリル−1,2−ジメトキシベンゼン、4−アリルフェノール、4−メトキシアリルベンゼンなどのアリル系モノマー、フェニルマレイミド、シクロヘキシルマレイミド等のマレイミド類が挙げられる。 Such monomers include, for example, methyl (meth) acrylate, t-butyl (meth) acrylate, stearyl (meth) acrylate, cyclohexyl (meth) acrylate, ethoxyethyl (meth) acrylate, hydroxyethyl (meth) acrylate, phenyl (Meth) acrylates, (meth) acrylic monomers such as N, N-dimethylacrylamide, styrene, α-methylstyrene, p-styrenesulfonic acid, ethyl vinyl ether, N-vinyl imidazole, vinyl acetate, vinyl pyridine, 2-vinyl naphthalene , Vinyl monomers such as vinyl chloride, vinyl fluoride, N-vinylcarbazole, vinylamine, vinylphenol, N-vinyl-2-pyrrolidone, 4-allyl-1,2-dimethoxybenzene, 4-ary Phenol, 4-allyl-based monomers such as methoxy allyl benzene, phenyl maleimide, maleimide such as cyclohexyl maleimide.
溶液中で重合する場合には、汎用の有機溶媒を特に限定なく用いることができる。溶媒の具体例としては、エタノール、プロパノール、ブタノール等のアルコール系溶媒、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン、シクロペンタノン等のケトン系溶媒、酢酸エチル、ブチルアセテート、プロピレングリコールモノメチルエーテルアセテート等のエステル系溶媒、ジエチルエーテル、ジグリム等のエーテル系溶媒、ヘキサン、シクロヘキサン、メチルシクロヘキサン、トルエン、キシレン等の炭化水素系溶媒、アセトニトリル等のニトリル系溶媒、N−メチルピロリドン、ジメチルアセトアミド等のアミド系溶媒等が挙げられる。これら溶媒は、いずれかを単独で用いてもよく、2種以上を併せて用いてもよい。 When polymerizing in a solution, a general-purpose organic solvent can be used without any particular limitation. Specific examples of the solvent include alcohol solvents such as ethanol, propanol and butanol, ketone solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone and cyclopentanone, ethyl acetate, butyl acetate, propylene glycol monomethyl ether acetate and the like. Ester solvents, ether solvents such as diethyl ether and diglyme, hydrocarbon solvents such as hexane, cyclohexane, methylcyclohexane, toluene and xylene, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone and dimethylacetamide Etc. Any of these solvents may be used alone, or two or more thereof may be used in combination.
上記の重合に際しては、重合開始剤を用いることができる。重合開始剤は、一般的に使用されているものでよく、具体例としては、アゾビスイソブチロニトリル(AIBN)、ジエチル−2,2’−アゾビスイソブチレート(V−601)、2,2’−アゾビス(2,4−ジメチルバレロニトリル)、ジメチルアゾビスメチルプロビオネート等のアゾ系重合開始剤、過酸化ベンゾイル、過酸化水素、過酸化ラウロイル等の過酸化物系重合開始剤、過硫酸カリウム、過硫酸アンモニウムなどの過硫酸塩系重合開始剤などが挙げられる。これらの重合開始剤は、いずれかを単独で用いてもよく、また2種以上を併用することもできる。 In the polymerization, a polymerization initiator can be used. The polymerization initiator may be one generally used. Specific examples thereof include azobisisobutyronitrile (AIBN), diethyl-2,2′-azobisisobutyrate (V-601), 2 , 2'-azobis (2,4-dimethylvaleronitrile), azo polymerization initiators such as dimethylazobismethylpropionate, peroxide polymerization initiators such as benzoyl peroxide, hydrogen peroxide, lauroyl peroxide, Examples thereof include persulfate-based polymerization initiators such as potassium persulfate and ammonium persulfate. Any of these polymerization initiators may be used alone, or two or more thereof may be used in combination.
上記重合の際の温度は、モノマーであるM1及びM2の種類、重合溶媒種、開始剤種などにより異なるが、好ましくは40〜150℃、より好ましくは50〜120℃の範囲である。 The temperature during the polymerization varies depending on the types of monomers M1 and M2, the type of polymerization solvent, the type of initiator, and the like, but is preferably in the range of 40 to 150 ° C, more preferably 50 to 120 ° C.
このようにして得られた本発明のポリマー(1)は、光重合開始剤、界面活性剤、溶媒等の他、光及び熱により重合を起こさせる重合性組成物に通常含まれる成分を適宜添加し、光配向膜用組成物とすることができる。これら任意成分の含有量は特に限定されないが、通常、ポリマー(I)の総重量に対し、光重合開始剤は約1〜約10重量%、界面活性剤は約0.1〜約5重量%、溶媒は約70〜約99重量%含まれていることが好ましい。 The polymer (1) of the present invention thus obtained is appropriately added with components usually contained in a polymerizable composition that causes polymerization by light and heat, in addition to a photopolymerization initiator, a surfactant, a solvent, and the like. And it can be set as the composition for photo-alignment films. The content of these optional components is not particularly limited, but is usually about 1 to about 10% by weight of the photopolymerization initiator and about 0.1 to about 5% by weight of the surfactant based on the total weight of the polymer (I). The solvent is preferably contained in an amount of about 70 to about 99% by weight.
光重合開始剤としては、少量の光照射により均一な膜を形成させるために一般に知られている汎用の光重合剤をいずれも用いることができる。具体例としては、例えば、2,2’−アゾビスイソブチロニトリル、2,2’−アゾビス(2,4−ジメチルバレロニトリル)等のアゾニトリル系光重合開始剤、イルガキュア907(チバ・スペシャルティ・ケミカルズ社製)、イルガキュア369(チバ・スペシャルティ・ケミカルズ社製)等のα−アミノケトン系光重合開始剤、4−フェノキシジクロロアセトフェノン、4−t−ブチル−ジクロロアセトフェノン、ジエトキシアセトフェノン、1−(4−イソプロピルフェニル)−2−ヒドロキシ−2−メチルプロパン−1−オン、1−ヒドロキシシクロヘキシルフェニルケトン、2−ベンジル−2−ジメチルアミノ−1−(4−モルフォリノフェニル)−ブタン−1−オン等のアセトフェノン系光重合開始剤、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、ベンジルジメチルケタール等のベンゾイン系光重合開始剤、ベンゾフェノン、ベンゾイル安息香酸、ベンゾイル安息香酸メチル、4−フェニルベンゾフェノン、ヒドロキシベンゾフェノン、アクリル化ベンゾフェノン、4−ベンゾイル−4’−メチルジフェニルサルファイド等のベンゾフェノン系光重合開始剤、2−クロルチオキサンソン、2−メチルチオキサンソン、イソプロピルチオキサンソン、2,4−ジイソプロピルチオキサンソン等のチオキサンソン系光重合開始剤、2,4,6−トリクロロ−s−トリアジン、2−フェニル−4,6−ビス(トリクロロメチル)−s−トリアジン、2−(p−メトキシフェニル)−4,6−ビス(トリクロロメチル)−s−トリアジン、2−(p−トリル)−4,6−ビス(トリクロロメチル)−s−トリアジン、2−ピペロニル−4,6−ビス(トリクロロメチル)−s−トリアジン、2,4−ビス(トリクロロメチル)−6−スチリル−s−トリアジン、2−(ナフト−1−イル)−4,6−ビス(トリクロロメチル)−s−トリアジン、2−(4−メトキシ−ナフト−1−イル)−4,6−ビス(トリクロロメチル)−s−トリアジン、2,4−トリクロロメチル−(ピペロニル)−6−トリアジン、2,4−トリクロロメチル(4’−メトキシスチリル)−6−トリアジン等のトリアジン系光重合開始剤、カルバゾール系光重合開始剤、イミダゾール系光重合開始剤等;更には、α−アシロキシエステル、アシルフォスフィンオキサイド、メチルフェニルグリオキシレート、ベンジル、9,10−フェナンスレンキノン、カンファーキノン、エチルアンスラキノン、4,4’−ジエチルイソフタロフェノン、3,3’,4,4’−テトラ(t−ブチルパーオキシカルボニル)ベンゾフェノン、4,4’−ジエチルアミノベンゾフェノン、チオキサンソン等の光重合開始剤が挙げられる。光重合開始剤は、いずれかを単独で用いてもよいし、2種以上を併せて用いてもよい。 As the photopolymerization initiator, any general-purpose photopolymerization agent that is generally known for forming a uniform film by irradiation with a small amount of light can be used. Specific examples include, for example, azonitrile photopolymerization initiators such as 2,2′-azobisisobutyronitrile and 2,2′-azobis (2,4-dimethylvaleronitrile), Irgacure 907 (Ciba Specialty). Α-aminoketone photopolymerization initiators such as Irgacure 369 (manufactured by Ciba Specialty Chemicals), 4-phenoxydichloroacetophenone, 4-t-butyl-dichloroacetophenone, diethoxyacetophenone, 1- (4 -Isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, etc. Acetophenone photopolymerization initiators, benzoin, benzoy Benzoin photopolymerization initiators such as methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzyl dimethyl ketal, benzophenone, benzoylbenzoic acid, methyl benzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 4-benzoyl- Benzophenone photopolymerization initiators such as 4′-methyldiphenyl sulfide, thioxanthone photopolymerization initiators such as 2-chlorothioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diisopropylthioxanthone, 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- (p-methoxyphenyl) -4,6-bis (trichloromethyl) ) -S-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -s-triazine, 2-piperonyl-4,6-bis (trichloromethyl) -s-triazine, 2,4 -Bis (trichloromethyl) -6-styryl-s-triazine, 2- (naphth-1-yl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxy-naphth-1-) Yl) -4,6-bis (trichloromethyl) -s-triazine, 2,4-trichloromethyl- (piperonyl) -6-triazine, 2,4-trichloromethyl (4'-methoxystyryl) -6-triazine, etc. Triazine-based photopolymerization initiators, carbazole-based photopolymerization initiators, imidazole-based photopolymerization initiators, and the like; and α-acyloxyesters, acylphosphine oxides, methyl Phenylglyoxylate, benzyl, 9,10-phenanthrenequinone, camphorquinone, ethylanthraquinone, 4,4'-diethylisophthalophenone, 3,3 ', 4,4'-tetra (t-butylperoxy And photopolymerization initiators such as carbonyl) benzophenone, 4,4′-diethylaminobenzophenone, and thioxanthone. Any of the photopolymerization initiators may be used alone, or two or more of them may be used in combination.
界面活性剤としては、均一な膜を形成させるために一般に用いられている界面活性剤をいずれも用いることができる。具体例としては、例えば、ラウリル硫酸ソーダ、ラウリル硫酸アンモニウム、ラウリル硫酸トリエタノールアミン、ポリオキシエチレンアルキルエーテル硫酸塩、アルキルエーテルホスフェート、ナトリウムオレイルスクシネート、ミリスチン酸カリウム、ヤシ油脂肪酸カリウム、ナトリウムラウロイルサルコシネート等のアニオン性界面活性剤;ポリエチレングリコールモノラウレート、ステアリン酸ソルビタン、ミリスチン酸グリセリル、ジオレイン酸グリセリル、ソルビタンステアレート、ソルビタンオレエート等のノニオン性界面活性剤;ステアリルトリメチルアンモニウムクロリド、塩化ベヘニルトリメチルアンモニウム、塩化ステアリルジメチルベンジルアンモニウム、セチルトリメチルアンモニウムクロリド等のカオチン性界面活性剤;ラウリルベタイン、アルキルスルホベタイン、コカミドプロピルベタイン、アルキルジメチルアミノ酢酸ベタイン等のアルキルベタイン、アルキルイミダゾリン、ラウロイルサルコシンナトリウム、ココアンホ酢酸ナトリウム等の両性界面活性剤;更には、BYK−361、BYK−306、BYK−307(ビックケミージャパン社製)、フロラードFC430(住友スリーエム社製)、メガファックF171、R08(大日本インキ化学工業社製)等の界面活性剤が挙げられる。これらの界面活性剤は、いずれかを単独で用いてもよいし、2種以上を併用することもできる。 As the surfactant, any surfactant generally used for forming a uniform film can be used. Specific examples include, for example, sodium lauryl sulfate, ammonium lauryl sulfate, triethanolamine lauryl sulfate, polyoxyethylene alkyl ether sulfate, alkyl ether phosphate, sodium oleyl succinate, potassium myristate, coconut oil fatty acid potassium, sodium lauroyl monkey Anionic surfactants such as cosinates; Nonionic surfactants such as polyethylene glycol monolaurate, sorbitan stearate, glyceryl myristate, glyceryl dioleate, sorbitan stearate, sorbitan oleate; stearyltrimethylammonium chloride, behenyl chloride Chaotic properties such as trimethylammonium, stearyldimethylbenzylammonium chloride, cetyltrimethylammonium chloride Activators; amphoteric surfactants such as alkylbetaines such as laurylbetaine, alkylsulfobetaine, cocamidopropylbetaine, alkyldimethylaminoacetic acid betaine, alkylimidazolines, sodium lauroyl sarcosine, sodium cocoamphoacetate; and BYK-361, BYK -306, BYK-307 (manufactured by Big Chemie Japan), surfactants such as Florard FC430 (manufactured by Sumitomo 3M), MegaFuck F171, R08 (manufactured by Dainippon Ink & Chemicals, Inc.) Any of these surfactants may be used alone, or two or more thereof may be used in combination.
溶媒としては、トルエン、エチルベンゼン、エチレングリコールモノメチルエーテル、エチレングリコールジメチルエーテル、プロピレングリコールメチルエーテル、ジブチルエーテル、アセトン、メチルエチルケトン、エタノール、プロパノール、シクロヘキサン、シクロペンタノン、メチルシクロヘキサン、テトラヒドロフラン、ジオキサン、シクロヘキサノン、n−ヘキサン、酢酸エチル、酢酸ブチル、プロピレングリコールメチルエーテルアセテート、メトキシブチルアセテート、N−メチルピロリドン、ジメチルアセトアミドなどが挙げられるが、このうち、毒性や環境負荷の観点及び/又は樹脂基材(例えば、ポリエチレンテレフタレート(PET)、シクロオレフィンポリマー(COP)など)に対する耐溶解性の観点から、メチルエチルケトン、シクロヘキサノンが好ましい。これらはいずれかを単独で用いることもでき、2種以上を併用することもできる。特に、本発明のポリマー(I)は、メチルエチルケトン、シクロヘキサノン、1−メトキシ−2−プロパノールにも溶解するという優れた特長を有する。 Solvents include toluene, ethylbenzene, ethylene glycol monomethyl ether, ethylene glycol dimethyl ether, propylene glycol methyl ether, dibutyl ether, acetone, methyl ethyl ketone, ethanol, propanol, cyclohexane, cyclopentanone, methylcyclohexane, tetrahydrofuran, dioxane, cyclohexanone, n- Examples include hexane, ethyl acetate, butyl acetate, propylene glycol methyl ether acetate, methoxybutyl acetate, N-methylpyrrolidone, and dimethylacetamide. Among these, viewpoints of toxicity and environmental burden and / or resin base materials (for example, polyethylene From the viewpoint of solubility resistance to terephthalate (PET), cycloolefin polymer (COP), etc., Methyl ethyl ketone, cyclohexanone is preferable. Any of these may be used alone or in combination of two or more. In particular, the polymer (I) of the present invention has an excellent feature of being soluble in methyl ethyl ketone, cyclohexanone, and 1-methoxy-2-propanol.
このようにして得られる本発明の光配向膜用組成物を、基材に塗布し、溶媒を留去して膜とした後、該膜に異方性を有する光を照射し、更にこれを加熱して液晶配向能を生じさせることにより、光配向膜とすることができる。 The composition for photo-alignment film of the present invention thus obtained is applied to a substrate, the solvent is distilled off to form a film, the film is irradiated with anisotropic light, and this is further applied. A photo-alignment film can be obtained by heating to produce liquid crystal alignment ability.
光配向膜用組成物の塗布方法としては、当該分野において一般的に知られているいずれの方法でもよく、例えば、スピンコート法、バーコート法、ダイコーター法、スクリーン印刷法、スプレーコーター法などがある。組成物の塗布後、乾燥して溶剤を留去することにより、組成物の層を形成させる。乾燥工程はこの分野で通常用いられているいずれの方法でもよく、樹脂層が一定の形態で固定化し、膜を形成するまで行う。 As a coating method of the composition for photo-alignment films, any method generally known in the art may be used, for example, a spin coating method, a bar coating method, a die coater method, a screen printing method, a spray coater method, etc. There is. After application of the composition, it is dried and the solvent is distilled off to form a layer of the composition. The drying step may be any method commonly used in this field, and is performed until the resin layer is fixed in a fixed form and a film is formed.
使用できる基材としては、例えば、アルカリガラス、無アルカリガラスなどのガラス基材、ポリイミド、ポリアミド、アクリル樹脂、ポリビニルアルコール、トリアセチルセルロース、ポリエチレンテレフタレート、シクロオレフィンポリマー、ポリエチレン、ポリカーボネート、ポリスチレン、ポリ三フッ化塩化エチレンなどの樹脂基材、鉄、アルミニウム、銅などの金属基材などが挙げられ、ガラス基材がより好ましい。 Examples of the usable substrate include glass substrates such as alkali glass and alkali-free glass, polyimide, polyamide, acrylic resin, polyvinyl alcohol, triacetyl cellulose, polyethylene terephthalate, cycloolefin polymer, polyethylene, polycarbonate, polystyrene, and poly (III). Examples thereof include resin base materials such as fluorinated ethylene chloride, metal base materials such as iron, aluminum, and copper, and glass base materials are more preferable.
異方性を有する光としては、直線偏光の他、例えば、部分偏光などが挙げられる。ここで、直線偏光とは、電場(又は磁場)の振動方向を含む面が一つに特定される光であり、部分偏光とは、電場(又は磁場)の振動の強度が特定方向において他の方向より強いものをいう。直線偏光は、光源からの光に、偏光フィルタや偏光プリズムを用いることで得るこができる。部分偏光は、部分偏光フィルタを使用して得ることができる。本発明においては、異方性を有する光であれば、いずれも用いることができるが、効率よく光配向を行うためには、直線偏光を用いることが好ましい。照射する光は、赤外線、可視光線、紫外線(近紫外線、遠紫外線など)、X線、荷電粒子線(例えば、電子電など)など、照射により化学反応を生じさせることができる照射線であれば、特に限定されないが、通常、照射線は200nm〜500nmの波長を有する場合が多く、光架橋を有効に発生させる点から、350nmから450nmの近紫外線が好ましい。光源としては例えば、キセノンランプ、高圧水銀ランプ、超高圧水銀ランプ、メタルハライドランプなどが挙げられる。このような光源から得た紫外光や可視光は干渉フィルタや色フィルタなどを用いて、照射する波長範囲を制限してもよい。照射エネルギー(最適露光量)は、ポリマー(I)の種類に応じて異なるが、通常は、約5mJ/cm2〜50mJ/cm2である。 Examples of the light having anisotropy include partially polarized light in addition to linearly polarized light. Here, the linearly polarized light is light in which the plane including the vibration direction of the electric field (or magnetic field) is specified as one, and the partially polarized light is the intensity of vibration of the electric field (or magnetic field) in the specific direction. Something stronger than the direction. Linearly polarized light can be obtained by using a polarizing filter or a polarizing prism for the light from the light source. Partial polarization can be obtained using a partial polarization filter. In the present invention, any light having anisotropy can be used, but linearly polarized light is preferably used in order to perform photoalignment efficiently. The irradiation light can be an infrared ray, visible ray, ultraviolet ray (near ultraviolet ray, far ultraviolet ray, etc.), X-ray, charged particle beam (for example, electronic electricity), etc., as long as it can cause a chemical reaction by irradiation. Although not particularly limited, generally, the irradiation radiation often has a wavelength of 200 nm to 500 nm, and near ultraviolet rays of 350 nm to 450 nm are preferable from the viewpoint of effectively generating photocrosslinking. Examples of the light source include a xenon lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, and a metal halide lamp. Ultraviolet light or visible light obtained from such a light source may be irradiated with an interference filter or a color filter to limit the wavelength range to be irradiated. The irradiation energy (optimal exposure amount) varies depending on the type of the polymer (I), but is usually about 5 mJ / cm 2 to 50 mJ / cm 2 .
また、偏光を照射する際に、フォトマスクを使用すれば、光配向膜に、2以上の異なった方向にパターン状に、液晶配向能を生じさせることができる。具体的には、本発明の光配向膜用組成物を塗布、乾燥した後に、その上にフォトマスクを被せて異方性を有する光を照射し、露光部分にのみ液晶配向能を与え、必要に応じて、方向を変えてこれを複数回繰り返すことにより、複数方向にパターン状に液晶配向能を生じさせることができる。 Further, when irradiating polarized light, if a photomask is used, the liquid crystal alignment ability can be generated in a pattern in two or more different directions in the photo-alignment film. Specifically, after applying and drying the composition for photo-alignment film of the present invention, a photomask is placed on the composition and irradiated with anisotropic light to give the liquid crystal alignment ability only to the exposed part. Accordingly, the liquid crystal alignment ability can be generated in a pattern in a plurality of directions by changing the direction and repeating this a plurality of times.
前記光照射の後に、加熱を施すと、加熱重合が進行し、光、熱等に対してより高い耐久性の光配向膜が得られるので好ましい。加熱温度は、重合が進行するのに十分であれば特に制限されないが、一般的には、80〜250℃程度であり、100〜200℃程度が好ましく、120〜170℃程度であることがさらに好ましい。加熱重合を行う場合は、組成物中に一般に用いられる重合開始剤を添加してもよいし、添加しなくてもよい。上記により形成される光配向膜の膜厚は、約10〜約500nmであることが好ましく、より好ましくは、約100〜約500nm、更に好ましくは約100〜約200nmの範囲である。 Heating after the light irradiation is preferable because heat polymerization proceeds and a photo-alignment film having higher durability against light, heat and the like is obtained. The heating temperature is not particularly limited as long as it is sufficient for the polymerization to proceed, but is generally about 80 to 250 ° C, preferably about 100 to 200 ° C, and more preferably about 120 to 170 ° C. preferable. When performing the heat polymerization, a polymerization initiator generally used in the composition may be added or may not be added. The thickness of the photo-alignment film formed as described above is preferably about 10 to about 500 nm, more preferably about 100 to about 500 nm, and still more preferably about 100 to about 200 nm.
上記で得られる光配向膜上に、液晶性化合物を塗布して加温し、UV光を照射し、さらに加熱焼成を行うことで、位相差膜を形成させる。 On the photo-alignment film obtained above, a liquid crystal compound is applied and heated, irradiated with UV light, and further heated and fired to form a retardation film.
液晶性化合物としては、分子中に重合性基を有する多官能液晶性(メタ)アクリレート、液晶性エポキシ化合物、液晶性オキセタン化合物が挙げられる。このうち、多官能液晶性(メタ)アクリレートが好ましい。 Examples of the liquid crystalline compound include polyfunctional liquid crystalline (meth) acrylates having a polymerizable group in the molecule, liquid crystalline epoxy compounds, and liquid crystalline oxetane compounds. Among these, polyfunctional liquid crystalline (meth) acrylate is preferable.
多官能液晶性(メタ)アクリレートとしては、例えば、下式(IV)〜(VI)で示される化合物等が挙げられる。
液晶性エポキシ化合物としては、例えば、下式(VII)で示される化合物等があげられる。
液晶性オキセタン化合物としては、例えば、下式(VIII)で示される化合物等が挙げられる。
液晶性化合物を塗布した後、加温する際の温度としては、通常、50〜100℃程度であり、60〜90℃程度が好ましく、65〜85℃程度であることが更に好ましい。 The temperature for heating after applying the liquid crystalline compound is usually about 50 to 100 ° C, preferably about 60 to 90 ° C, and more preferably about 65 to 85 ° C.
UV光の照射は、上記の光配向膜への照射と同様に実施することができる。加熱焼成も常法により実施することができ、その温度は、通常、150〜300℃程度であり、200〜250℃程度が好ましく、210〜230℃程度であることがさらに好ましい。加熱焼成時間は、0.5〜3時間程度であり、0.6〜2時間程度が好ましく、0.6〜1.5時間程度が最も好ましい。 Irradiation with UV light can be performed in the same manner as the irradiation with the photo-alignment film. Heating and firing can also be performed by a conventional method, and the temperature is usually about 150 to 300 ° C, preferably about 200 to 250 ° C, and more preferably about 210 to 230 ° C. The baking time is about 0.5 to 3 hours, preferably about 0.6 to 2 hours, and most preferably about 0.6 to 1.5 hours.
このようにして得られる本発明の位相差膜について、その膜厚は用途などに応じて異なるが、一般には、0.1〜20.0μmの範囲が好ましく、1.0〜5.0μmの範囲が更に好ましい。 Regarding the retardation film of the present invention thus obtained, the film thickness varies depending on the application and the like, but generally the range of 0.1 to 20.0 μm is preferable, and the range of 1.0 to 5.0 μm. Is more preferable.
本明細書の一般式(I)は、原料モノマーであるM1とM2がm:nのモル比で含まれていることを模式的に表したものであり、M1とM2が必ずしも交互に結合してコポリマーを構成しているわけではない。したがって、一般式(1)は、M1とM2をm:nのモル比で重合させたコポリマー、例えば、交互型、ランダム型、グラフト型などのいずれをも含むものである。また、一般式(I)において、モノマー同士を繋ぐ破線は、通常は単結合手であるが、M1とM2の重合に際して、他のモノマーも含有させる場合には、そのようなモノマーが該波線部分に取り込まれて、存在し得る。 The general formula (I) of the present specification schematically represents that the raw material monomers M1 and M2 are included in a molar ratio of m: n, and M1 and M2 are not necessarily bonded alternately. Does not constitute a copolymer. Accordingly, the general formula (1) includes a copolymer obtained by polymerizing M1 and M2 at a molar ratio of m: n, such as an alternating type, a random type, and a graft type. In the general formula (I), the broken line connecting the monomers is usually a single bond. However, when other monomers are also included in the polymerization of M1 and M2, such a monomer is represented by the wavy line portion. May be present.
以下、実施例を挙げて本発明を具体的に説明するが、本発明はもとより下記実施例に限定されるものではない。 EXAMPLES Hereinafter, although an Example is given and this invention is demonstrated concretely, this invention is not limited to the following Example from the first.
1.共重合性(メタ)アクリル酸ポリマーの合成
[実施例1]
4−[6−(2−メチルアクリロイルオキシ)ヘキシルオキシ]安息香酸4−[(E)−2−メトキシカルボニルビニル]フェニルエステル5g(11ミリモル)、4−[6−(2−メチルアクリロイルオキシ)ヘキシルオキシ]安息香酸29.6g(96ミリモル)及び2,2’−アゾ−ビス−イソブチロニトリル0.35g(2.1ミリモル)をシクロヘキサノン196gに溶解した。この溶液に窒素を1時間通気した。次いで、80℃に加熱した。10時間後反応液を冷却し、激しく攪拌しつつ、ノルマルヘキサン346gに室温で滴下した。分離した重合体を濾取し、減圧下、50℃での乾燥により、重合体1を26g得た。
1. Synthesis of copolymerizable (meth) acrylic acid polymer [Example 1]
4- [6- (2-Methylacryloyloxy) hexyloxy] benzoic acid 4-[(E) -2-methoxycarbonylvinyl] phenyl ester 5 g (11 mmol), 4- [6- (2-methylacryloyloxy) Hexyloxy] benzoic acid 29.6 g (96 mmol) and 2,2′-azo-bis-isobutyronitrile 0.35 g (2.1 mmol) were dissolved in 196 g of cyclohexanone. Nitrogen was bubbled through the solution for 1 hour. It was then heated to 80 ° C. After 10 hours, the reaction solution was cooled and added dropwise to 346 g of normal hexane at room temperature with vigorous stirring. The separated polymer was collected by filtration and dried at 50 ° C. under reduced pressure to obtain 26 g of polymer 1.
<重量平均分子量(MW)の測定>
上記で得られたポリマーの重量平均分子量(MW)を、ゲル濾過クロマトグラフィー(GPC)を用いて測定した。得られた重量平均分子量(MW)は30700であった。
<Measurement of weight average molecular weight (MW)>
The weight average molecular weight (MW) of the polymer obtained above was measured using gel filtration chromatography (GPC). The obtained weight average molecular weight (MW) was 30,700.
<酸価の測定>
測定方法は以下の通りである。すなわち、100mL三角フラスコにTHF約60mLを採り、フェノールフタレインを指示薬として、0.1mol/L水酸化ナトリウム水溶液で中和した。ポリマー約1.5gを精秤し、上記溶液に均一に溶解、攪拌し、0.1mol/L水酸化ナトリウム水溶液で滴定を行い、微赤色が約30秒間消えない点を滴定終点とした。
<Measurement of acid value>
The measuring method is as follows. That is, about 60 mL of THF was taken in a 100 mL Erlenmeyer flask, and neutralized with a 0.1 mol / L sodium hydroxide aqueous solution using phenolphthalein as an indicator. About 1.5 g of polymer was precisely weighed, uniformly dissolved in the above solution, stirred, and titrated with a 0.1 mol / L aqueous sodium hydroxide solution, and the point at which the faint red color did not disappear for about 30 seconds was taken as the titration end point.
次式に従い、酸価を算出した。
酸価=(0.1×f×A×56.1/B)/(C/100)
A:滴定量(mL)
f:水酸化ナトリウム水溶液の力価
B:ポリマー組成物量(g)(ポリマーを含む、滴定終了後の溶液の量)
C:ポリマー濃度(%)(ポリマー量/ポリマー組成物量×100)
上記で得られたポリマーの酸価は、156mgKOH/gであった。
The acid value was calculated according to the following formula.
Acid value = (0.1 × f × A × 56.1 / B) / (C / 100)
A: Titration volume (mL)
f: titer of aqueous sodium hydroxide solution B: amount of polymer composition (g) (amount of solution containing polymer and after titration)
C: Polymer concentration (%) (polymer amount / polymer composition amount × 100)
The acid value of the polymer obtained above was 156 mgKOH / g.
<相転移温度の測定>
上記で得られたポリマーの相転移温度を、示差走査熱量測定(DSC)を用いて測定したところ、160〜180℃であった。
<Measurement of phase transition temperature>
It was 160-180 degreeC when the phase transition temperature of the polymer obtained above was measured using the differential scanning calorimetry (DSC).
[実施例2]
4−[6−(2−メチルアクリロイルオキシ)ヘキシルオキシ]安息香酸4−[(E)−2−メトキシカルボニルビニル]フェニルエステルの使用量を8g(17ミリモル)、4−[6−(2−メチルアクリロイルオキシ)ヘキシルオキシ]安息香酸の使用量を21g(69ミリモル)、2,2’−アゾ−ビス−イソブチロニトリルの使用量を0.28g(1.7ミリモル)、シクロヘキサノンの使用量を116gとする以外は、実施例1と同様に処理して、重合体2を24g得た。
[Example 2]
4- [6- (2-Methylacryloyloxy) hexyloxy] benzoic acid 4-[(E) -2-methoxycarbonylvinyl] phenyl ester was used in an amount of 8 g (17 mmol), 4- [6- (2- Methylacryloyloxy) hexyloxy] benzoic acid is used in an amount of 21 g (69 mmol), 2,2′-azo-bis-isobutyronitrile is used in an amount of 0.28 g (1.7 mmol), and cyclohexanone is used. 24 g of the polymer 2 was obtained in the same manner as in Example 1 except that the amount was 116 g.
得られたポリマーは、重量平均分子量(MW)31700、酸価130mgKOH/g、相転移温度148〜173℃を有していた。 The obtained polymer had a weight average molecular weight (MW) of 31700, an acid value of 130 mgKOH / g, and a phase transition temperature of 148 to 173 ° C.
[実施例3]
4−[6−(2−メチルアクリロイルオキシ)ヘキシルオキシ]安息香酸4−[(E)−2−メトキシカルボニルビニル]フェニルエステルの使用量を10g(21ミリモル)、4−[6−(2−メチルアクリロイルオキシ)ヘキシルオキシ]安息香酸の使用量を15.3g(50ミリモル)、2,2’−アゾ−ビス−イソブチロニトリルの使用量を0.23g(1.4ミリモル)、シクロヘキサノンの使用量を101.2g及びノルマルヘキサンの使用量を253gとする以外は、実施例1と同様に処理して、重合体3を24g得た。
[Example 3]
The amount of 4- [6- (2-methylacryloyloxy) hexyloxy] benzoic acid 4-[(E) -2-methoxycarbonylvinyl] phenyl ester used was 10 g (21 mmol), 4- [6- (2- Methylacryloyloxy) hexyloxy] benzoic acid used in 15.3 g (50 mmol), 2,2′-azo-bis-isobutyronitrile used in 0.23 g (1.4 mmol), cyclohexanone 24 g of Polymer 3 was obtained in the same manner as in Example 1 except that the amount used was 101.2 g and the amount of normal hexane was 253 g.
得られたポリマーは、重量平均分子量(MW)33300、酸価は110mgKOH/g相転移温度155〜166℃を有していた。 The obtained polymer had a weight average molecular weight (MW) of 33300, and an acid value of 110 mg KOH / g phase transition temperature of 155 to 166 ° C.
[実施例4]
4−[6−(2−メチルアクリロイルオキシ)ヘキシルオキシ]安息香酸4−[(E)−2−メトキシカルボニルビニル]フェニルエステル2g(4ミリモル)、2−フルオロ−4−[6−(2−メチルアクリロイルオキシ)ヘキシルオキシ]安息香酸5.6g(17ミリモル)、2,2’−アゾ−ビス−イソブチロニトリル0.11g(0.6ミリモル)、シクロヘキサノン116g及びノルマルヘキサン76gを用いて、実施例1と同様に処理して、重合体4を5g得た。
[Example 4]
2- [6- (2-Methylacryloyloxy) hexyloxy] benzoic acid 4-[(E) -2-methoxycarbonylvinyl] phenyl ester 2 g (4 mmol), 2-fluoro-4- [6- (2- Methylacryloyloxy) hexyloxy] benzoic acid 5.6 g (17 mmol), 2,2′-azo-bis-isobutyronitrile 0.11 g (0.6 mmol), cyclohexanone 116 g and normal hexane 76 g The same treatment as in Example 1 was performed to obtain 5 g of the polymer 4.
得られたポリマーは、重量平均分子量(MW)48200、酸価は132mgKOH/g、相転移温度85〜120℃を有していた。 The obtained polymer had a weight average molecular weight (MW) of 48200, an acid value of 132 mgKOH / g, and a phase transition temperature of 85 to 120 ° C.
[実施例5]
4−[6−(2−メチルアクリロイルオキシ)ヘキシルオキシ]−(E)−桂皮酸4−シアノフェニルエステル10g(23ミリモル)、4−[6−(2−メチルアクリロイルオキシ)ヘキシルオキシ]安息香酸28g(92ミリモル)を用いて、2,2’−アゾ−ビス−イソブチロニトリルの使用量を0.38g(2.3ミリモル)、シクロヘキサノンの使用量を153gとする以外は、実施例1と同様に処理して、重合体5を22g得た。
[Example 5]
4- [6- (2-Methylacryloyloxy) hexyloxy]-(E) -cinnamic acid 4-cyanophenyl ester 10 g (23 mmol), 4- [6- (2-methylacryloyloxy) hexyloxy] benzoic acid Example 1 except that 28 g (92 mmol) was used, 0.38 g (2.3 mmol) of 2,2′-azo-bis-isobutyronitrile was used, and 153 g of cyclohexanone was used. In the same manner as above, 22 g of the polymer 5 was obtained.
得られたポリマーは、重量平均分子量(MW)24800、酸価135mgKOH/g、相転移温度160〜180℃を有していた。 The obtained polymer had a weight average molecular weight (MW) of 24800, an acid value of 135 mgKOH / g, and a phase transition temperature of 160 to 180 ° C.
[比較例1]
ポリ[1−[6−[4−[(E)−2−ヒドロキシカルボニルビニル]フェノキシ]ヘキシルオキシカルボニル]−1−メチルエチレン](重合体6)
4−[6−(2−メチルアクリロイルオキシ)ヘキシルオキシ]−(E)−桂皮酸20g(23ミリモル)を用いて、2,2’−アゾ−ビス−イソブチロニトリルの使用量を0.2g(1.2ミリモル)、シクロヘキサノンの使用量を80gとする以外は、実施例1と同様に処理して、重合体6を17g得た。
[Comparative Example 1]
Poly [1- [6- [4-[(E) -2-hydroxycarbonylvinyl] phenoxy] hexyloxycarbonyl] -1-methylethylene] (polymer 6)
Using 20 g (23 mmol) of 4- [6- (2-methylacryloyloxy) hexyloxy]-(E) -cinnamic acid, the amount of 2,2′-azo-bis-isobutyronitrile was reduced to 0. The same treatment as in Example 1 was carried out except that 2 g (1.2 mmol) and the amount of cyclohexanone used was 80 g, to obtain 17 g of polymer 6.
得られたポリマーは、重量平均分子量(MW)35000、酸価169mgKOH/g、相転移温度162〜197℃を有していた。 The obtained polymer had a weight average molecular weight (MW) of 35000, an acid value of 169 mgKOH / g, and a phase transition temperature of 162 to 197 ° C.
[比較例2]
ポリ[1−[6−[4−[(E)−2−ヒドロキシカルボニルビニル]フェノキシ]ヘキシルオキシカルボニル]−1−メチルエチレン−CO−1−[6−[4−カルボキシフェノキシ]ヘキシルオキシカルボニル]−1−メチルエチレン](重合体7)
4−[6−(2−メチルアクリロイルオキシ)ヘキシルオキシ]−(E)−桂皮酸10g(30ミリモル)、4−[6−(2−メチルアクリロイルオキシ)ヘキシルオキシ]安息香酸37g(120ミリモル)を用いて、2,2’−アゾ−ビス−イソブチロニトリルの使用量を0.5g(3.0ミリモル)、シクロヘキサノンの使用量を187gとする以外は、実施例1と同様に処理して、重合体7を40g得た。
[Comparative Example 2]
Poly [1- [6- [4-[(E) -2-hydroxycarbonylvinyl] phenoxy] hexyloxycarbonyl] -1-methylethylene-CO-1- [6- [4-carboxyphenoxy] hexyloxycarbonyl] -1-methylethylene] (polymer 7)
4- [6- (2-Methylacryloyloxy) hexyloxy]-(E) -cinnamic acid 10 g (30 mmol), 4- [6- (2-methylacryloyloxy) hexyloxy] benzoic acid 37 g (120 mmol) Was used in the same manner as in Example 1 except that the amount of 2,2′-azo-bis-isobutyronitrile used was 0.5 g (3.0 mmol) and the amount of cyclohexanone used was 187 g. As a result, 40 g of the polymer 7 was obtained.
得られたポリマーは、重量平均分子量(MW)31000、酸価178mgKOH/g相転移温度155〜182℃を有していた。 The obtained polymer had a weight average molecular weight (MW) of 31000 and an acid value of 178 mg KOH / g phase transition temperature of 155 to 182 ° C.
[実施例6]
4−[6−(2−メチルアクリロイルオキシ)ヘキシルオキシ]−(E)−桂皮酸4−メトキシフェニルエステル10.0g(23ミリモル)、4−[6−(2−メチルアクリロイルオキシ)ヘキシルオキシ]安息香酸27.9g(91ミリモル)を用いて、2,2’−アゾ−ビス−イソブチロニトリルの使用量を0.5g(3ミリモル)、シクロヘキサノンの使用量を152gとする以外は、実施例1と同様に処理して、重合体8を25g得た。
[Example 6]
4- [6- (2-Methylacryloyloxy) hexyloxy]-(E) -cinnamic acid 4-methoxyphenyl ester 10.0 g (23 mmol), 4- [6- (2-methylacryloyloxy) hexyloxy] The procedure was carried out except that 27.9 g (91 mmol) of benzoic acid was used, 0.5 g (3 mmol) of 2,2′-azo-bis-isobutyronitrile was used, and 152 g of cyclohexanone was used. The same treatment as in Example 1 was carried out to obtain 25 g of polymer 8.
得られたポリマーは、重量平均分子量(MW)46000、酸価135mgKOH/g、相転移温度70〜146℃を有していた。 The obtained polymer had a weight average molecular weight (MW) of 46000, an acid value of 135 mgKOH / g, and a phase transition temperature of 70 to 146 ° C.
[実施例7]
1−(4−メトキシフェニルアゾ)−4−[6−(2−メチルアクリロイルオキシ)ヘキシルオキシ]ベンゼン10.0g(25ミリモル)、4−[6−(2−メチルアクリロイルオキシ)ヘキシルオキシ]安息香酸30.9g(100ミリモル)を用いて、2,2’−アゾ−ビス−イソブチロニトリルの使用量を0.4g(3ミリモル)、シクロヘキサノンの使用量を123gとする以外は、実施例1と同様に処理して、重合体9を33g得た。
[Example 7]
1- (4-Methoxyphenylazo) -4- [6- (2-methylacryloyloxy) hexyloxy] benzene 10.0 g (25 mmol), 4- [6- (2-methylacryloyloxy) hexyloxy] benzoic acid Example 3 except that 30.9 g (100 mmol) of acid was used, 0.4 g (3 mmol) of 2,2′-azo-bis-isobutyronitrile was used, and 123 g of cyclohexanone was used. In the same manner as in No. 1, 33 g of the polymer 9 was obtained.
得られたポリマーは、重量平均分子量(MW)48000、酸価138mgKOH/g、相転移温度72〜148℃を有していた。 The obtained polymer had a weight average molecular weight (MW) of 48000, an acid value of 138 mgKOH / g, and a phase transition temperature of 72 to 148 ° C.
2.光配向膜用組成物の調製
重合体1〜9を、それぞれシクロヘキサノンに5重量%の濃度で溶解させ、光配向膜用組成物1〜9とした。
2. Preparation of composition for photo-alignment film Polymers 1 to 9 were dissolved in cyclohexanone at a concentration of 5% by weight to obtain compositions 1 to 9 for a photo-alignment film.
3.光配向膜の製造
光配向膜用組成物1をガラス基板上にスピンコーターを用いて、約100nmの厚みになるように塗布した。その後、80℃で乾燥させ、続いて直線偏光UV光線を40mJ/cm2照射した。次いで、150℃で10分間加熱処理を行い、配向を誘起し光配向膜1を作製した。
3. Production of photo-alignment film Composition 1 for photo-alignment film was applied on a glass substrate to a thickness of about 100 nm using a spin coater. Thereafter, the film was dried at 80 ° C., and then irradiated with 40 mJ / cm 2 of linearly polarized UV light. Next, heat treatment was performed at 150 ° C. for 10 minutes to induce alignment, and the photo-alignment film 1 was produced.
光配向膜用組成物2を用いて、直線偏光UV光線の照射量を30mJ/cm2、その後の加熱処理温度を140℃とする以外は光配向膜1の製造と同様に処理して、光配向膜2を作製した。 Using composition 2 for photo-alignment film, light was processed in the same manner as in production of photo-alignment film 1 except that the dose of linearly polarized UV light was 30 mJ / cm 2 and the subsequent heat treatment temperature was 140 ° C. An alignment film 2 was produced.
光配向膜用組成物3を用いて、直線偏光UV光線の照射量を20mJ/cm2、その後の加熱処理温度を140℃とする以外は光配向膜1の製造と同様に処理して、光配向膜3を作製した。 The composition for photo-alignment film 3 was used in the same manner as the production of photo-alignment film 1 except that the irradiation amount of linearly polarized UV light was 20 mJ / cm 2 and the subsequent heat treatment temperature was 140 ° C. An alignment film 3 was produced.
光配向膜用組成物4を用いて、直線偏光UV光線の照射量を30mJ/cm2、その後の加熱処理温度を110℃とする以外は光配向膜1の製造と同様に処理して、光配向膜4を作製した。 Using the composition 4 for photo-alignment film, light was processed in the same manner as in the production of the photo-alignment film 1 except that the irradiation amount of linearly polarized UV light was 30 mJ / cm 2 and the subsequent heat treatment temperature was 110 ° C. An alignment film 4 was produced.
光配向膜用組成物5を用いて、直線偏光UV光線の照射量を5mJ/cm2、その後の加熱処理温度を140℃とする以外は光配向膜1の製造と同様に処理して、光配向膜5を作製した。 The composition 5 for photo-alignment film was treated in the same manner as the production of the photo-alignment film 1 except that the irradiation amount of linearly polarized UV light was 5 mJ / cm 2 and the subsequent heat treatment temperature was 140 ° C. An alignment film 5 was produced.
光配向膜用組成物6をガラス基板上にスピンコーターを用いて、約100nmの厚みになるように塗布した。その後、120℃で乾燥させ、続いて直線偏光UV光線を5mJ/cm2照射した。次いで、160℃で10分間加熱処理を行い、配向を誘起し光配向膜6を作製した。 The composition 6 for photo-alignment film | membrane was apply | coated so that it might become a thickness of about 100 nm using the spin coater on the glass substrate. Thereafter, the film was dried at 120 ° C., and subsequently irradiated with linearly polarized UV light at 5 mJ / cm 2 . Next, heat treatment was performed at 160 ° C. for 10 minutes to induce alignment, and the photo-alignment film 6 was produced.
光配向膜用組成物7を用いて、直線偏光UV光線の照射量を15mJ/cm2、その後の加熱処理温度を150℃とする以外は光配向膜6の製造と同様に処理して、光配向膜7を作製した。 The composition 7 for photo-alignment film was treated in the same manner as in the production of the photo-alignment film 6 except that the irradiation amount of linearly polarized UV light was 15 mJ / cm 2 and the subsequent heat treatment temperature was 150 ° C. An alignment film 7 was produced.
光配向膜用組成物8を用いて、直線偏光UV光線の照射量を20mJ/cm2、その後の加熱処理温度を130℃とする以外は光配向膜1の製造と同様に処理して、光配向膜8を作製した。 The composition 8 for photo-alignment film was processed in the same manner as in the production of the photo-alignment film 1 except that the irradiation amount of linearly polarized UV light was 20 mJ / cm 2 and the subsequent heat treatment temperature was 130 ° C. An alignment film 8 was produced.
光配向膜用組成物9を用いて、直線偏光UV光線の照射量を10mJ/cm2、その後の加熱処理温度を130℃とする以外は光配向膜1の製造と同様に処理して、光配向膜9を作製した。 The composition 9 for photo-alignment film was treated in the same manner as the production of the photo-alignment film 1 except that the irradiation amount of linearly polarized UV light was 10 mJ / cm 2 and the subsequent heat treatment temperature was 130 ° C. An alignment film 9 was produced.
4.位相差膜の製造
下記式(VI−a)で示される二官能液晶性アクリレート
調製した位相差膜用組成物を、光配向膜上1に、スピンコーターを用いて、約2μmの厚みになるように塗布した。その後、70℃で配向させ、続いて無偏光UV光線を100mJ/cm2照射した。次いで、230℃で1時間、加熱焼成を行い、位相差膜1を作製した。 The prepared retardation film composition was applied onto the photo-alignment film 1 using a spin coater so as to have a thickness of about 2 μm. Thereafter, the film was oriented at 70 ° C. and subsequently irradiated with non-polarized UV light at 100 mJ / cm 2 . Subsequently, it heat-baked at 230 degreeC for 1 hour, and produced the phase difference film 1. FIG.
同様にして、光配向膜2〜9の上に、それぞれ位相差膜2〜9を作製した。 Similarly, retardation films 2 to 9 were produced on the photo-alignment films 2 to 9, respectively.
5.性能評価
<ポリマーの溶解性>
重合体1〜7の1、5、10、20%における各種溶剤に対する溶解性を目視にて評価し、完全に溶解したものを○、溶け残りがあるものを△、不溶なものが×として記録した。結果を表1に示す(○、△、×の意味するところは、以後の表において同じ)。
5. Performance evaluation <Polymer solubility>
The solubility of each of the polymers 1 to 7 in 1, 5, 10, and 20% in various solvents was visually evaluated, and those that were completely dissolved were recorded as ◯, those that remained undissolved as Δ, and those that were insoluble as x. did. The results are shown in Table 1 (the meanings of ◯, Δ, and X are the same in the following tables).
重合体8及び9の1、5、10、20%における、各種溶剤に対する溶解性を目視にて評価した。結果を表2に示す。 The solubility of the polymers 8 and 9 in various solvents in 1, 5, 10, and 20% was visually evaluated. The results are shown in Table 2.
重合体1〜9の1、5、10、20%における、1−メトキシ−2−プロパノールに対する溶解性を目視にて評価した。結果を表3に示す。 The solubility in 1-methoxy-2-propanol in 1, 5, 10, 20% of the polymers 1 to 9 was visually evaluated. The results are shown in Table 3.
<ポリマーの光感受性(偏光露光量)>
重合体1〜7を用いて作製した光配向膜の最適偏光露光量と限界偏光露光量について、作製した光配向膜上に位相差膜を作製し、その配向性から評価を行った。最も配向性の高い偏光露光量を最適偏光露光量とし、配向性が低下し始める露光量を限界偏光露光量とし、結果を表4に示す。
<Photosensitivity of polymer (polarized light exposure)>
A retardation film was produced on the produced photo-alignment film and evaluated from the orientation of the optimum polarized light exposure amount and the limit polarization exposure amount of the photo-alignment film produced using the polymers 1 to 7. The polarized light exposure with the highest orientation is taken as the optimum polarized light exposure, the exposure at which the orientation begins to decline is taken as the limiting polarized light exposure, and the results are shown in Table 4.
重合体8及び9を用いて作製した光配向膜の最適偏光露光量と限界偏光露光量について、作製した光配向膜上に位相差膜を作製し、その配向性から評価した。結果を表5に示す。 A retardation film was produced on the produced photo-alignment film and evaluated from the orientation of the optimum polarized light exposure amount and the limit polarization exposure amount of the photo-alignment film produced using the polymers 8 and 9. The results are shown in Table 5.
<複屈折率の保持率>
重合体1〜7を用いて作製した光配向膜上への位相差膜の作製に際し、その焼成工程の前後における複屈折率の保持率を評価した。複屈折率の測定は、偏光解析装置OPTIPRO(シンテック株式会社製)を用いて行った(以後の実験において同じ)。結果を表6に示す。
<Retention rate of birefringence>
When producing a retardation film on a photo-alignment film produced using the polymers 1 to 7, the birefringence retention rate before and after the firing step was evaluated. The birefringence was measured using an ellipsometer OPTIPRO (manufactured by Shintech Co., Ltd.) (the same applies in the subsequent experiments). The results are shown in Table 6.
重合体8及び9用いて作製した光配向膜上への位相差膜の作製に際し、その焼成工程の前後における複屈折率の保持率を評価した。結果を表7に示す。 When producing the retardation film on the photo-alignment film produced using the polymers 8 and 9, the retention of the birefringence index before and after the firing step was evaluated. The results are shown in Table 7.
本発明の共重合性(メタ)アクリル酸ポリマーは、これを使用する光配向膜及び位相差膜の原料として有用であり、またかかる本発明の光配向膜及び位相差膜は、各種光学部材として、特に、コンピュータやファクシミリなどのOA機器、携帯電話、電子手帳、液晶テレビ、ビデオカメラなどの液晶表示装置の光学素子として有用である。 The copolymerizable (meth) acrylic acid polymer of the present invention is useful as a raw material for a photo-alignment film and a retardation film using the polymer, and the photo-alignment film and the retardation film of the present invention are used as various optical members. In particular, it is useful as an optical element for liquid crystal display devices such as OA equipment such as computers and facsimiles, mobile phones, electronic notebooks, liquid crystal televisions, and video cameras.
Claims (4)
で示される繰り返し単位を有する共重合性(メタ)アクリル酸ポリマーを含んでなる光配向膜用組成物を基材に塗布して膜を形成する工程、
該膜に異方性を有する光を照射する工程、及び、
該膜を加熱処理する工程
を含んでなる光配向膜の製造方法。 Formula (Ic)
A step of forming a film by applying a composition for a photoalignment film comprising a copolymerizable (meth) acrylic acid polymer having a repeating unit represented by:
Irradiating the film with anisotropic light, and
A method for producing a photo-alignment film, comprising a step of heat-treating the film.
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