JP2015129928A5 - - Google Patents

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Publication number
JP2015129928A5
JP2015129928A5 JP2014252222A JP2014252222A JP2015129928A5 JP 2015129928 A5 JP2015129928 A5 JP 2015129928A5 JP 2014252222 A JP2014252222 A JP 2014252222A JP 2014252222 A JP2014252222 A JP 2014252222A JP 2015129928 A5 JP2015129928 A5 JP 2015129928A5
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JP
Japan
Prior art keywords
microscope
scanning
probe
sample
tunneling
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JP2014252222A
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English (en)
Japanese (ja)
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JP2015129928A (ja
JP6249236B2 (ja
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Priority claimed from DE102013225936.0A external-priority patent/DE102013225936B4/de
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Publication of JP2015129928A5 publication Critical patent/JP2015129928A5/ja
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Publication of JP6249236B2 publication Critical patent/JP6249236B2/ja
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JP2014252222A 2013-12-13 2014-12-12 フォトリソグラフィマスクの画像を相関させるための装置及び方法 Active JP6249236B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102013225936.0A DE102013225936B4 (de) 2013-12-13 2013-12-13 Vorrichtung und Verfahren zum Korrelieren von Abbildungen einer photolithographischen Maske
DE102013225936.0 2013-12-13

Publications (3)

Publication Number Publication Date
JP2015129928A JP2015129928A (ja) 2015-07-16
JP2015129928A5 true JP2015129928A5 (https=) 2016-09-01
JP6249236B2 JP6249236B2 (ja) 2017-12-20

Family

ID=53192316

Family Applications (1)

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JP2014252222A Active JP6249236B2 (ja) 2013-12-13 2014-12-12 フォトリソグラフィマスクの画像を相関させるための装置及び方法

Country Status (3)

Country Link
US (1) US9990737B2 (https=)
JP (1) JP6249236B2 (https=)
DE (1) DE102013225936B4 (https=)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10330581B2 (en) 2007-09-17 2019-06-25 Rave Llc Debris removal from high aspect structures
US10384238B2 (en) 2007-09-17 2019-08-20 Rave Llc Debris removal in high aspect structures
DE102015213045B4 (de) * 2015-07-13 2018-05-24 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Positionsbestimmung von Strukturelementen einer photolithographischen Maske
DE102016205941B4 (de) 2016-04-08 2020-11-05 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zum Analysieren eines Defekts einer fotolithographischen Maske oder eines Wafers
DE102017203879B4 (de) * 2017-03-09 2023-06-07 Carl Zeiss Smt Gmbh Verfahren zum Analysieren einer defekten Stelle einer photolithographischen Maske
DE102017211957A1 (de) * 2017-07-12 2019-01-17 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zum Untersuchen einer Messspitze eines Rastersondenmikroskops
DE102018210098B4 (de) * 2018-06-21 2022-02-03 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zum Untersuchen und/oder zum Bearbeiten einer Probe
EP3627225A1 (en) * 2018-09-19 2020-03-25 ASML Netherlands B.V. Particle beam apparatus, defect repair method, lithographic exposure process and lithographic system
DE102019209394B4 (de) * 2019-06-27 2024-06-20 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zum Überlagern von zumindest zwei Bildern einer fotolithographischen Maske
US11366382B2 (en) * 2020-02-24 2022-06-21 Carl Zeiss Smt Gmbh Method and apparatus for performing an aerial image simulation of a photolithographic mask
CN118043932A (zh) * 2021-09-30 2024-05-14 株式会社日立高新技术 解析系统
JP7828829B2 (ja) * 2022-05-21 2026-03-12 株式会社ホロン フォトマスク修復装置およびフォトマスク修復方法
US11982684B1 (en) * 2022-05-27 2024-05-14 Ut-Battelle, Llc Science-driven automated experiments
DE102022119752B4 (de) * 2022-08-05 2024-11-28 Carl Zeiss Smt Gmbh Verfahren zur Charakterisierung einer Störung in einem Rasterelektronenmikroskop
DE102023130586A1 (de) * 2023-11-06 2025-05-08 Carl Zeiss Smt Gmbh Verfahren zum Untersuchen eines Rohlings einer Photomaske für die Mikrolithographie
DE102024131676A1 (de) 2024-10-30 2026-04-30 Carl Zeiss Smt Gmbh Verfahren zur Inspektion von mikrolithografischen Fotomasken, Computerprogrammprodukt, System zur Inspektion einer mikrolithografischen Fotomaske, Verfahren zum Reparieren einer mikrolithografischen Fotomaske und Verfahren zur Mikrolithografie

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69131528T2 (de) * 1990-05-30 2000-05-04 Hitachi, Ltd. Verfahren und Vorrichtung zur Behandlung eines sehr kleinen Bereichs einer Probe
JP3331596B2 (ja) 1990-05-30 2002-10-07 株式会社日立製作所 微小部処理方法及びその装置
US6868175B1 (en) 1999-08-26 2005-03-15 Nanogeometry Research Pattern inspection apparatus, pattern inspection method, and recording medium
US9721754B2 (en) 2011-04-26 2017-08-01 Carl Zeiss Smt Gmbh Method and apparatus for processing a substrate with a focused particle beam
DE102011079382B4 (de) 2011-07-19 2020-11-12 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zum Analysieren und zum Beseitigen eines Defekts einer EUV Maske

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